JPH07119623B2 - Displacement measuring device - Google Patents
Displacement measuring deviceInfo
- Publication number
- JPH07119623B2 JPH07119623B2 JP61005736A JP573686A JPH07119623B2 JP H07119623 B2 JPH07119623 B2 JP H07119623B2 JP 61005736 A JP61005736 A JP 61005736A JP 573686 A JP573686 A JP 573686A JP H07119623 B2 JPH07119623 B2 JP H07119623B2
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- optical path
- divided
- reflecting
- optical system
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Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は変位測定装置に関し、特に円周上に例えば透光
部と反射部の格子模様を複数個、周期的に刻んだ放射格
子を回転物体に取付け、該放射格子に例えばレーザーか
らの光束を照射し、該放射格子からの回折光を利用し
て、放射格子若しくは回転物体の回転速度や回転速度の
変動量等の回転状態を光電的に検出する変位測定装置に
良好に適用できるものである。Description: TECHNICAL FIELD The present invention relates to a displacement measuring device, and more particularly, to rotating a radiation grating in which a plurality of grating patterns of a light transmitting portion and a reflecting portion are periodically engraved on a circumference. It is attached to an object, and the radiation grating is irradiated with a light flux from a laser, for example, and the diffracted light from the radiation grating is used to photoelectrically determine the rotation state of the radiation grating or the rotating object such as the rotation speed and the fluctuation amount of the rotation speed. It can be favorably applied to the displacement measuring device for detecting the above.
(従来の技術) 従来よりフロッピーデスクの駆動等のコンピューター機
器、プリンター等の事務機器、あるいはNC工作機械さら
にはVTRのキャプステンモーターや回転ドラム等の回転
機構の回転速度や回転速度の変動量を検出する為の手段
として光電的なロータリーエンコーダーが利用されてき
ている。(Prior art) Conventionally, computer equipment such as drive of floppy desks, office equipment such as printers, NC machine tools, and rotation speed of rotation mechanism such as capstain motor of VTR and rotating drum, and fluctuation amount of rotation speed have been used. A photoelectric rotary encoder has been used as a means for detecting.
光電的なロータリーエンコーダーは例えば第3図に示す
ように回転軸30に連絡した円板35の周囲に透光部と遮光
部を等間隔に設けた、所謂メインスケール31とこれに対
応してメインスケールと等しい間隔で透光部と遮光部と
を設けた所謂固定のインデックススケール32との双方の
スケールを投光手段33と受光手段34で挟んで対向配置し
た所謂インデックススケール方式の構成を採っている。
この方法はメインスケールの回転に伴って双方のスケー
ルの透光部と遮光部の間隔に同期した信号が得られ、こ
の信号を周波数解折して回転軸の回転速度の変動を検出
している。この為、双方のスケールの透光部と遮光部と
のスケール間隔を細かくすればする程、検出精度を高め
ることができる。しかしながらスケール間隔を細かくす
ると回折光の影響で受光手段からの出力信号のS/N比が
低下し、検出精度が低下してしまう欠点があった。この
為メインスケールの透光部と遮光部の格子の総本数を固
定させ、透光部と遮光部の間隔を回折光の影響を受けな
い程度まで拡大しようとするとメインスケールの円板の
直径が増大し更に厚さも増大し装置全体が大型化し、こ
の結果被検回転物体への負荷が大きくなってくる等の欠
点があった。The photoelectric rotary encoder is, for example, as shown in FIG. 3, a so-called main scale 31 in which a light-transmitting portion and a light-shielding portion are provided at equal intervals around a disk 35 connected to a rotating shaft 30 and a main scale corresponding thereto. By adopting a so-called index scale system configuration in which both scales of a so-called fixed index scale 32 provided with a light-transmitting portion and a light-shielding portion at the same interval as the scale are sandwiched between the light projecting means 33 and the light receiving means 34 and are opposed to each other. There is.
With this method, a signal synchronized with the distance between the light-transmitting portion and the light-shielding portion of both scales is obtained with the rotation of the main scale, and this signal is subjected to frequency analysis to detect fluctuations in the rotation speed of the rotating shaft. . Therefore, the finer the scale interval between the light-transmitting portion and the light-shielding portion of both scales, the higher the detection accuracy can be. However, if the scale interval is made fine, there is a drawback that the S / N ratio of the output signal from the light receiving means is lowered due to the influence of the diffracted light, and the detection accuracy is lowered. For this reason, if the total number of gratings of the light-transmitting part and the light-shielding part of the main scale is fixed and the distance between the light-transmitting part and the light-shielding part is expanded to the extent that it is not affected by the diffracted light, the diameter of the disk of the main scale will change. There is a defect that the load is increased and the thickness is increased, the size of the entire apparatus is increased, and as a result, the load on the rotating object to be inspected is increased.
又ロータリーエンコーダーには光源としてレーザーが多
く用いられている。このうちレーザーからの光速を被検
回転物体に入射させ、該被検回転物体からの光束より干
渉縞を形成し、この干渉縞を利用して被検回転物体の回
転状態を測定する場合にはレーザーの発振波長の安定性
及び干渉させるべき2光束間の光路長を厳密に設定して
おく必要がある。レーザー光源として半導体レーザーは
小型で装置全体の小型化を図るには有利であるが発振波
長が例えば温度により変動してくる。この為、半導体レ
ーザーを用いて装置全体の小型化を図ろうとすると干渉
させる2光束の光路長が変化し、測定精度を低下させる
原因となってくる。A laser is often used as a light source in the rotary encoder. When the speed of light from the laser is incident on the rotating object to be inspected, interference fringes are formed from the light flux from the rotating object to be inspected, and the rotation state of the rotating object to be inspected is measured using this interference fringe. It is necessary to strictly set the stability of the oscillation wavelength of the laser and the optical path length between the two light beams to be interfered with each other. A semiconductor laser is a small-sized laser light source and is advantageous for downsizing the entire apparatus, but the oscillation wavelength fluctuates depending on, for example, temperature. For this reason, if the semiconductor laser is used to reduce the size of the entire apparatus, the optical path lengths of the two light fluxes that interfere with each other change, which causes a decrease in measurement accuracy.
(発明が解決しようとする問題点) 本発明は上述従来例の欠点に鑑み、高精度の測定が可能
でしかも被検物体の不可が小さく、装置全体の小型化が
容易であり、特に半導体レーザー等の光源を用い複数光
束による干渉縞を利用して変位測定を行う際に光源の発
振波長が多少変化しても光束間の光路長を容易に調整で
きる変位測定装置の提供を目的とする。(Problems to be Solved by the Invention) In view of the above-mentioned drawbacks of the conventional example, the present invention enables high-accuracy measurement, the size of the object to be inspected is small, and the size of the entire apparatus is easily reduced. It is an object of the present invention to provide a displacement measuring device capable of easily adjusting the optical path length between light fluxes even when the oscillation wavelength of the light source is slightly changed when displacement measurement is performed by using interference fringes of a plurality of light fluxes using a light source such as.
(問題点を解決するための手段) 可干渉光を発生する光源と、該光源から出射し所定分割
位置で形成される複数の分割光束それぞれを集光レンズ
と該集光レンズの焦点面近傍に配置した反射平面とを有
した反射手段を用いて反射させて光路を逆行させること
により該複数の分割光束を略前記分割位置にて重ね合わ
せるように配置された光学系と、該光学系によって重ね
合わされた光束を検出する受光手段とを有し、前記分割
光束それぞれは前記光学系中の光路において相対変位測
定の対象となるべき回折格子上の略同一位置を2度経由
することによって特定次数の回折作用を付与され、該受
光手段からの出力信号を利用して前記回折格子との相対
変位情報を測定するための変位測定装置において、該複
数の分割光束間の光路長を一致させるべく該複数の分割
光束の内の少なくとも一光束に関して前記反射手段を往
復光路を変化させない方向に変位させることにより重ね
合わされるまでの光路の光路長を調整する調整手段を設
けたことである。(Means for Solving the Problems) A light source that generates coherent light, and a plurality of split light beams that are emitted from the light source and are formed at predetermined split positions are provided in a condenser lens and in the vicinity of the focal plane of the condenser lens. An optical system arranged to superimpose the plurality of divided luminous fluxes at substantially the dividing positions by causing reflection using a reflecting means having the arranged reflection plane to reverse the optical path, and superimposing by the optical system. And a light receiving means for detecting the separated luminous flux, and each of the divided luminous fluxes has a specific order by passing twice through substantially the same position on the diffraction grating to be the target of relative displacement measurement in the optical path in the optical system. In a displacement measuring device which is given a diffracting action and which uses the output signal from the light receiving means to measure relative displacement information with respect to the diffraction grating, it is necessary to match the optical path lengths of the plurality of divided light beams. Further, the adjusting means is provided for adjusting the optical path length of the optical paths until they are superposed by displacing the reflecting means in a direction that does not change the reciprocating optical path for at least one light beam of the plurality of divided light beams.
この他、本発明の特徴は実施例において記載されてい
る。Besides, the features of the present invention are described in the embodiments.
(実施例) 第1図(A)は本発明の一実施例の光学系の概略図であ
る。第1図(B)は同図(A)の一部の側面図である。(Example) FIG. 1A is a schematic view of an optical system of an example of the present invention. FIG. 1 (B) is a partial side view of FIG. 1 (A).
本実施例ではレーザー1より放射された光束をコリメー
ターレンズ2によって平行光束とし光分割手段としての
偏光ビームスプリッター3に入射させ、略等光量の反射
光束と透過光束の2つの直線偏光の光束に分割してい
る。このうち反射した光束は1/4波長板4を経て、円偏
光とし、プリズム16,18を介した後、被測定回転物体と
連結した円板6上の放射状の回折格子が設けられている
放射格子7の位置M1に入射させている。このとき放射格
子7からの特定次数の回折光が放射格子7から略垂直に
射出するように光束を入射させている。そして放射格子
7に入射し回折した透過回折光のうち特定次数の回折光
を反射手段8により反射させ、同一光路を逆行させ放射
格子7上の略同一位置M1に再入射させている。そして放
射格子7により再回折された特定次数の回折光を1/4波
長板4を介して入射したときと90度偏光方位の異なる直
線偏光とし偏光ビームスプリッター3に入射させてい
る。In this embodiment, the light beam emitted from the laser 1 is made into a parallel light beam by the collimator lens 2 and is incident on the polarization beam splitter 3 as a light splitting means, and is converted into two linearly polarized light beams, that is, a reflected light beam and a transmitted light beam having substantially equal light amounts. It is divided. The reflected light beam passes through the quarter-wave plate 4 to be circularly polarized light, passes through prisms 16 and 18, and is then provided with a radial diffraction grating on the circular plate 6 connected to the rotating object to be measured. It is incident on the position M 1 of the grating 7. At this time, the luminous flux is made incident so that the diffracted light of the specific order from the radiation grating 7 is emitted from the radiation grating 7 substantially vertically. Then, the diffracted light of a specific order out of the transmitted diffracted light that is incident on the radiation grating 7 and diffracted is reflected by the reflecting means 8 and the same optical path is reversed so that it is re-incident on the substantially same position M 1 on the radiation grating 7. Then, the diffracted light of the specific order re-diffracted by the radiation grating 7 is made to be linearly polarized light having a 90 ° polarization direction different from that when the diffracted light is made incident through the 1/4 wavelength plate 4, and is made incident on the polarization beam splitter 3.
本実施例では偏光ビームスプリッター3から反射手段8
に至る特定次数の回折光の往復光路を同一としている。
第2図は第1図で示した反射手段の一実施例の説明図で
ある。In this embodiment, the polarization beam splitter 3 to the reflection means 8 are used.
The same round-trip optical path of the diffracted light of a specific order leading to.
FIG. 2 is an illustration of an embodiment of the reflecting means shown in FIG.
同図においては反射鏡40を集光レンズ41の略焦点面上に
配置し、集光レンズ41に平行に入射してきた特定次数の
回折光のみをマスク42の開口部43を通過させ反射鏡40で
反射させた後、元の光路を逆戻りするようにしている。
そして、その他の次数の回折光をマスク42により遮光し
ている。反射手段としては、この他第2図に示す機能と
同一のものであれば、例えばキャッツアイ光学系等どの
ような構成のものでも良い。このような光学系を用いれ
ば例えばレーザーの発振波長が変化し、回折角が多少変
化しても略同じ光路で戻すことができる特徴がある。In the figure, the reflecting mirror 40 is arranged on the substantially focal plane of the condensing lens 41, and only the diffracted light of a specific order incident in parallel to the condensing lens 41 is passed through the opening 43 of the mask 42 and the reflecting mirror 40 After being reflected at, the original optical path is reversed.
The diffracted light of other orders is blocked by the mask 42. As the reflecting means, any other structure such as a cat's eye optical system may be used as long as it has the same function as shown in FIG. If such an optical system is used, for example, the oscillation wavelength of the laser is changed, and even if the diffraction angle is changed a little, it is possible to return the light beam in substantially the same optical path.
又、キャッツアイ光学系に、屈折率分布型レンズ、例え
ば日本板硝子社製のセルフォックマイクロレンズ(商品
名)等を適用し、その両端平面な点に着目して片面に反
射膜を設けることにより、構成が簡便で且つ又生産性に
富む光学素子として本発明に有効に適用することができ
る。Also, by applying a gradient index lens, for example, SELFOC micro lens (trade name) manufactured by Nippon Sheet Glass Co., Ltd. to the cat's eye optical system, and providing a reflective film on one side by paying attention to the flat points at both ends. The optical element having a simple structure and high productivity can be effectively applied to the present invention.
第1図に戻り偏光ビームスプリッター3で分割された2
つの光束のうち透過した光束は1/4波長板5を介し円偏
光とし、プリズム17,19を介した後円板6上の放射格子
7上の位置M1と回転軸50に対して略点対称の位置M2に入
射させている。そして放射格子7に入射し回折した透過
回折光のうち特定次数の回折光を前述の反射手段8と同
様の反射手段9により同一光路を逆行させて、放射格子
7の略同一位置M2に再入射させている。そして放射格子
7より再回折された特定次数の回折光を1/4波長板5を
介し入射したときとは90度偏光方位の異なる直線偏光と
し偏光ビームスプリッター3に入射させている。Returning to FIG. 1, 2 split by the polarization beam splitter 3
The transmitted light beam out of the two light beams is circularly polarized through the quarter-wave plate 5 and is approximately a point with respect to the position M 1 on the radiation grating 7 on the rear disk 6 via the prisms 17 and 19 and the rotation axis 50. It is incident on the symmetrical position M 2 . Then, the diffracted light of a specific order among the transmitted diffracted light that is incident on the radiation grating 7 and diffracted is made to go back to the same position M 2 of the radiation grating 7 by reversing the same optical path by the reflecting means 9 similar to the above-mentioned reflecting means 8. It is incident. Then, the diffracted light of the specific order re-diffracted by the radiation grating 7 is made into linearly polarized light having a 90 ° polarization direction different from that when it is incident through the quarter-wave plate 5, and is made incident on the polarization beam splitter 3.
このとき、透過光束も前述の反射光束と同様に偏光ビー
ムスプリッター3から反射手段9に至る特定次数の回折
光の往復光路を同一としている。そして反射手段8を介
し入射してきた回折光と重なり合わせた後、1/4波長板1
0を介し円偏光とし、光分割器11で2つの光束に分割
し、各々の光束を互いの偏光方位を45度傾けて配置した
偏光板12,13を介し双方の光束に90度の位相差を付けた
直線偏光として各々の受光手段14,15に入射させてい
る。そして受光手段14,15により形成された2光束の干
渉縞の強度を検出している。At this time, similarly to the above-described reflected light flux, the transmitted light flux has the same round-trip optical path of the diffracted light of a specific order from the polarization beam splitter 3 to the reflection means 9. Then, after overlapping with the diffracted light that has entered through the reflecting means 8, the 1/4 wavelength plate 1
Circularly polarized light through 0, split into two light beams by the light splitter 11, and each light beam is passed through the polarizing plates 12 and 13 which are arranged with their polarization directions inclined by 45 degrees. A linearly polarized light with a mark is incident on each of the light receiving means 14 and 15. Then, the intensity of the interference fringes of the two light fluxes formed by the light receiving means 14 and 15 is detected.
本実施例では偏光ビームスプリッター3を2つの光束の
放射格子7上への入射点M1,M2を結ぶ線上の放射格子7
に対する略垂直2等分線上に若しくはその略2等分線に
直交する方向に配置して、2つの光束間の光路長を等し
くしている。In this embodiment, the polarization beam splitter 3 is used to radiate two light beams onto the radiation grating 7 and the radiation grating 7 on a line connecting the incident points M 1 and M 2 to each other.
Are arranged on a substantially perpendicular bisector or in a direction orthogonal to the bisector to make the optical path lengths between the two light beams equal.
本実施例において被測定回転物体が放射格子7の1ピッ
チ分だけ回転するとm次の回折光の位相は2mπだけ変化
する。同様に放射格子7により再回折されたn次の回折
光の位相は2nπだけ変化する。これにより全体として受
光手段からは(2m−2n)個の正弦波形が得られる。本実
施例ではこのときの正弦波形を検出することにより回転
量を測定している。In this embodiment, when the rotating object to be measured rotates by one pitch of the radiation grating 7, the phase of the m-th order diffracted light changes by 2mπ. Similarly, the phase of the diffracted light of the nth order re-diffracted by the radiation grating 7 changes by 2nπ. As a result, (2m-2n) sinusoidal waveforms are obtained from the light receiving means as a whole. In this embodiment, the rotation amount is measured by detecting the sine waveform at this time.
例えば回折格子のピッチが3.2μm、回折光として1次
及び−1次を利用したとすれば回転物体がピッチの3.2
μm分だけ回転したとき受光素子からは4個の正弦波形
が得られる。即ち正弦波形1個当りの分解能として回折
格子の1ピッチの1/4の3.2/4=0.8μmが得られる。For example, if the diffraction grating has a pitch of 3.2 μm and the first and −1st orders are used as diffracted light, the rotating object has a pitch of 3.2 μm.
When rotated by .mu.m, four sine waveforms are obtained from the light receiving element. That is, the resolution per sine waveform is 3.2 / 4 = 0.8 μm, which is 1/4 of one pitch of the diffraction grating.
しかしながら、例えば光源であるレーザーの発振波長λ
が温度等の影響によりΔλ変動したとすると、2光束の
位相ずれΔφは、2光束間の光路長差をdとしたとき となる。However, for example, the oscillation wavelength λ of the laser that is the light source
Is changed by Δλ due to the influence of temperature and the like, the phase shift Δφ of the two light fluxes is given by the difference in optical path length between the two light fluxes. Becomes
受光手段から出力される周期信号を例えば電気分割によ
りx分割して数値化したとすればレーザーの発振波長の
変動による2光束間の位相ずれΔφは なる不等式を満たせば略影響しなくなる。If the periodic signal output from the light receiving means is numerically divided by, for example, electrical division, the phase shift Δφ between the two light beams due to fluctuations in the oscillation wavelength of the laser is If the inequality becomes
例えばλ=780mn,Δλ=0.3nm(モードホップによる),
x=4とすると となる本実施例では前記条件を満たすように調整手段を
設けて2光束間の光路長が略等しくなるように調整して
いる。For example, λ = 780mn, Δλ = 0.3nm (depending on mode hop),
If x = 4 In this embodiment, the adjusting means is provided so as to satisfy the above condition, and the optical path lengths between the two light beams are adjusted to be substantially equal.
調整手段及びその調整方法としては、例えば (イ)反射手段8,9の一方を第1図に示す矢印Y1の如く
光軸方向に移動させる。As the adjusting means and the adjusting method, for example, (a) one of the reflecting means 8 and 9 is moved in the optical axis direction as indicated by an arrow Y1 shown in FIG.
(ロ)第1図に点線100で囲まれる各要素を一体的に同
図の矢印Y2の如く傾動させる。(B) Each element surrounded by the dotted line 100 in FIG. 1 is integrally tilted as indicated by an arrow Y2 in FIG.
(ハ)放射格子7の近傍に楔形のプリズム18を矢印Y3の
方向に出し入れして、その厚さを変えて行う。(C) A wedge-shaped prism 18 is put in and taken out in the direction of arrow Y3 in the vicinity of the radiation grating 7 and the thickness thereof is changed.
(ニ)放射格子7の近傍に2つ楔形のプリズム19,20を
平行平面板となるように重ね合わせ、少なくとも一方の
プリズムを矢印Y4の方向にスライドさせる。(D) Two wedge-shaped prisms 19 and 20 are superposed in the vicinity of the radiation grating 7 so as to form a plane parallel plate, and at least one prism is slid in the direction of arrow Y4.
(ホ)2枚の反射鏡、若しくは2つの反射面を有するプ
リズムを用いて一方の光路長を変える。(E) One optical path length is changed by using two reflecting mirrors or a prism having two reflecting surfaces.
本発明では特に(イ)の構成をとることにより往復光路
を変化させない光路長調整が可能になり、他の光学要素
を不必要に変位させることのない簡便な調整手段が可能
になるものである。In the present invention, particularly by adopting the configuration of (a), it becomes possible to adjust the optical path length without changing the reciprocating optical path, and it becomes possible to provide a simple adjusting means that does not unnecessarily displace other optical elements. .
本実施例では光分割器11により光束を2分割し各々の光
束間に90度の位相差をつけることにより回転物体の回転
方向も判別出来るようにしている。In the present embodiment, the light splitter 11 divides the light flux into two and gives a 90-degree phase difference between the light fluxes so that the rotation direction of the rotating object can also be determined.
尚、回転量のみを測定するのであれば光分割器11、偏光
板12,13及び一方の受光手段は不要である。If only the amount of rotation is measured, the light splitter 11, the polarizing plates 12 and 13, and one light receiving means are unnecessary.
本実施例では回転中心に対して略点対称の2つの位置
M1,M2からの回折光を利用することにより回転物体の回
転中心と放射格子の中心との偏心による測定誤差を軽減
させている。In this embodiment, there are two positions that are substantially point-symmetric with respect to the center of rotation.
By utilizing the diffracted light from M 1 and M 2 , the measurement error due to the eccentricity between the center of rotation of the rotating object and the center of the radiation grating is reduced.
尚、本実施例に於る構成は略点対称な2点からの回折光
を利用しているわけであるが、略点対称に限らず複数の
位置からの回折光を用いることにより略同等の効果を得
ることが出来る。例えば、互いに120゜の角度を成す3
点からの回折光を利用したり、近接しない任意の2点か
らの回折光を利用するのも有効である。Note that the configuration of this embodiment utilizes diffracted light from two points that are substantially point-symmetrical, but it is not limited to being substantially point-symmetrical. You can get the effect. For example, 3 forming an angle of 120 ° with each other
It is also effective to use diffracted light from a point or diffracted light from any two points that are not close to each other.
更に一方の光束の回転軸中心寄りの光束要素と略点対称
な位置に入射させた他方の光束の回転軸中心寄りの光束
要素とを互いに重なり合わせ、同様に回転中心の外側寄
りの光束要素同志を重ね合わせることにより、放射格子
の外側と内側のピッチの違いより生じる波面収差の影響
を除去している。Further, the light beam element near the center of the rotation axis of one light beam and the light beam element near the center of the rotation axis of the other light beam incident at a position substantially point-symmetrical are overlapped with each other. The effect of the wavefront aberration caused by the difference in pitch between the outer side and the inner side of the radiation grating is eliminated by superimposing them on each other.
本実施例では偏光ビームスプリッター3から反射手段8,
9に至る特定次数の回折光の往復の光路を同一とするこ
とにより、偏光ビームスプリッター3における2つの回
折光束の重なり具合を容易にし、装置全体の組立精度を
向上させている。In this embodiment, the polarization beam splitter 3 to the reflecting means 8,
By making the round-trip optical paths of the diffracted light of the specific order up to 9 the same, the degree of overlap of the two diffracted light beams in the polarization beam splitter 3 is facilitated, and the assembly accuracy of the entire device is improved.
尚、以上の実施例において1/4波長板4,5は偏光ビームス
プリッター3又は偏光プリズム22と反射手段との間であ
ればどこに配置しても良い。In the above embodiments, the quarter-wave plates 4 and 5 may be arranged anywhere between the polarizing beam splitter 3 or the polarizing prism 22 and the reflecting means.
又、実施例においては透過回折光の代わりに反射回折光
を利用しても良い。Further, in the embodiment, reflected diffracted light may be used instead of transmitted diffracted light.
尚、本発明において使用する回折格子は、透光部と遮光
部から成る所謂振幅型の回折格子、互いに異なる屈折率
を有する部分から成る位相型の回折格子である。特に位
相型の回折格子は、例えば透明円板の円周上に凹凸のレ
リーフパターンを形成することにより作成出来、エンボ
ス、スタンパ等のプロセスにより量産が可能である。The diffraction grating used in the present invention is a so-called amplitude type diffraction grating including a light transmitting portion and a light shielding portion, and a phase type diffraction grating including portions having different refractive indexes. In particular, a phase type diffraction grating can be produced, for example, by forming an uneven relief pattern on the circumference of a transparent disc, and can be mass-produced by processes such as embossing and stamper.
(発明の効果) 本発明によれば調整手段を用い複数の分割光束の少なく
とも一光束の光路長を変化させて複数光束間の光路長を
調整できるようにしたことにより、半導体レーザー等の
発振波長が変動する光源を用いたときの測定精度の低下
を防止でき、高精度な測定が可能になり、更に本発明に
よって装置全体の小型化が可能な変位測定装置が可能に
なった。(Effect of the invention) According to the present invention, the adjusting means is used to change the optical path length of at least one of the plurality of divided light beams so that the optical path length between the plurality of light beams can be adjusted. It is possible to prevent the measurement accuracy from deteriorating when a light source with a variable fluctuation is used, and it is possible to perform highly accurate measurement. Further, according to the present invention, it is possible to provide a displacement measuring apparatus capable of downsizing the entire apparatus.
また調整手段が、複数の分割光束の内の少なくとも一光
束に関して反射手段を往復光路を変化させない方向に変
位させることにより重ね合わされるまでの光路の光路長
を調整する構成なので、他の光学要素を不必要に変位さ
せることのない簡便な調整手段が可能になる。Further, since the adjusting means is configured to adjust the optical path length of the optical paths until they are superposed by displacing the reflecting means in a direction that does not change the reciprocating optical path for at least one light beam of the plurality of divided light beams, other optical elements can be used. A simple adjusting means that does not unnecessarily displace becomes possible.
第1図は本発明の一実施例の光学系の概略図、第2図は
第1図の一部分の説明図、第3図は従来の光電的ロータ
リーエンコーダーの説明図である。図中1はレーザー、
2はコリメーターレンズ、3は偏光ビームスプリッタ
ー、4,5,10は1/4波長板、6は円板、7は放射格子、8,9
は各々反射手段、12,13は各々偏光板、14,15は各々受光
手段である。FIG. 1 is a schematic view of an optical system according to an embodiment of the present invention, FIG. 2 is a partial explanatory view of FIG. 1, and FIG. 3 is an explanatory view of a conventional photoelectric rotary encoder. In the figure, 1 is a laser,
2 is a collimator lens, 3 is a polarization beam splitter, 4, 5 and 10 are quarter-wave plates, 6 is a disc, 7 is a radiation grating, and 8 and 9
Are reflecting means, 12 and 13 are polarizing plates, and 14 and 15 are light receiving means.
フロントページの続き (72)発明者 笠原 修 神奈川県川崎市高津区下野毛770番地 キ ヤノン株式会社玉川事業所内 (56)参考文献 実開 昭59−53209(JP,U)Front page continued (72) Inventor Osamu Kasahara 770 Shimonoge, Takatsu-ku, Kawasaki-shi, Kanagawa Canon Inc. Tamagawa Plant (56) References
Claims (1)
射し所定分割位置で形成される複数の分割光束それぞれ
を集光レンズと該集光レンズの焦点面近傍に配置した反
射平面とを有した反射手段を用いて反射させて光路を逆
行させることにより該複数の分割光束を略前記分割位置
にて重ね合わせるように配置された光学系と、該光学系
によって重ね合わされた光束を検出する受光手段とを有
し、前記分割光束それぞれは前記光学系中の光路におい
て相対変位測定の対象となるべき回折格子上の略同一位
置を2度経由することによって特定次数の回折作用を付
与され、該受光手段からの出力信号を利用して前記回折
格子との相対変位情報を測定するための変位測定装置に
おいて、該複数の分割光束間の光路長を一致させるべく
該複数の分割光束の内の少なくとも一光束に関して前記
反射手段を往復光路を変化させない方向に変位させるこ
とにより重ね合わされるまでの光路の光路長を調整する
調整手段を設けたことを特徴とする変位測定装置。1. A light source for generating coherent light, a condenser lens for each of a plurality of divided light fluxes emitted from the light source and formed at predetermined division positions, and a reflection plane for arranging in the vicinity of the focal plane of the condenser lens. An optical system arranged to superimpose the plurality of divided luminous fluxes at approximately the dividing position by reflecting the light by using a reflecting means having, and detecting the luminous fluxes superposed by the optical system. Each of the divided luminous fluxes is given a diffracting action of a specific order by passing twice through substantially the same position on the diffraction grating to be the target of relative displacement measurement in the optical path in the optical system. In a displacement measuring device for measuring relative displacement information with respect to the diffraction grating by using an output signal from the light receiving means, the plurality of divided light beams so as to match optical path lengths between the plurality of divided light beams. Displacement measuring apparatus being characterized in that an adjusting means for adjusting the optical path length of the optical path to be superimposed by displacing the reflecting means in a direction that does not change a reciprocating optical path with respect to at least Ikko bundle of inner.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61005736A JPH07119623B2 (en) | 1986-01-14 | 1986-01-14 | Displacement measuring device |
| GB8700784A GB2185314B (en) | 1986-01-14 | 1987-01-14 | Encoder |
| DE3700906A DE3700906C2 (en) | 1986-01-14 | 1987-01-14 | Encryptor |
| US07/608,629 US5036192A (en) | 1986-01-14 | 1990-11-06 | Rotary encoder using reflected light |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61005736A JPH07119623B2 (en) | 1986-01-14 | 1986-01-14 | Displacement measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62163921A JPS62163921A (en) | 1987-07-20 |
| JPH07119623B2 true JPH07119623B2 (en) | 1995-12-20 |
Family
ID=11619383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61005736A Expired - Fee Related JPH07119623B2 (en) | 1986-01-14 | 1986-01-14 | Displacement measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07119623B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5442172A (en) * | 1994-05-27 | 1995-08-15 | International Business Machines Corporation | Wavefront reconstruction optics for use in a disk drive position measurement system |
| TW256914B (en) * | 1994-05-27 | 1995-09-11 | Ibm | Servo-writing system for use in a data recording disk drive |
| JP5235554B2 (en) * | 2008-08-01 | 2013-07-10 | 株式会社森精機製作所 | Optical displacement measuring device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5953209U (en) * | 1982-10-01 | 1984-04-07 | ソニ−マグネスケ−ル株式会社 | optical length measurement scale |
| JPS6049406A (en) * | 1983-08-29 | 1985-03-18 | Kubota Ltd | Automatic driving truck |
| US4735505A (en) * | 1983-08-30 | 1988-04-05 | The Perkin-Elmer Corporation | Assembly for adjusting an optical element |
-
1986
- 1986-01-14 JP JP61005736A patent/JPH07119623B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62163921A (en) | 1987-07-20 |
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