JPH0715077A - Harmonic generator - Google Patents

Harmonic generator

Info

Publication number
JPH0715077A
JPH0715077A JP17623593A JP17623593A JPH0715077A JP H0715077 A JPH0715077 A JP H0715077A JP 17623593 A JP17623593 A JP 17623593A JP 17623593 A JP17623593 A JP 17623593A JP H0715077 A JPH0715077 A JP H0715077A
Authority
JP
Japan
Prior art keywords
resonator
range
frequency
harmonic
fundamental wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17623593A
Other languages
Japanese (ja)
Inventor
Yousuke Fujino
陽輔 藤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP17623593A priority Critical patent/JPH0715077A/en
Publication of JPH0715077A publication Critical patent/JPH0715077A/en
Pending legal-status Critical Current

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  • Lasers (AREA)
  • Semiconductor Lasers (AREA)

Abstract

(57)【要約】 【目的】半導体レーザ(LD)の周波数制御を光帰還法
で行う際、LDの周波数変動許容幅(ロッキングレン
ジ)を拡大しより高調波出力を安定化させる。 【構成】従来約2GHz程度のロッキングレンジ(LD
1の注入電流変動許容幅、温度変動許容幅は約±1. 4
mA、±0. 06℃)を、端面反射率を2%とすること
により、約3. 4GHz(同約±2. 4mA、約±0.
1℃)に拡大することができた。
(57) [Abstract] [Purpose] When the frequency control of the semiconductor laser (LD) is performed by the optical feedback method, the frequency fluctuation permissible range (rocking range) of the LD is expanded to further stabilize the harmonic output. [Structure] Conventional locking range of about 2 GHz (LD
1. Allowable range of injection current fluctuation and allowable temperature fluctuation range are about ± 1.4.
mA, ± 0.06 ° C) and end face reflectance of 2%, about 3.4 GHz (about ± 2.4 mA, about ± 0.0)
1 ° C).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体レーザの基本波
をKNbO3 結晶等の非線形光学材料に入射させて高調
波を発生させる高調波発生装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a harmonic generator for generating a harmonic by making a fundamental wave of a semiconductor laser incident on a nonlinear optical material such as KNbO 3 crystal.

【0002】[0002]

【従来の技術】従来の第2高調波発生装置を図4に示
す。従来の第2高調波発生装置は、半導体レーザ(共振
器側端面反射率Rf =5%、後面反射率Rr =90%、
以下LDと称す)1、KNbO3 結晶等自体から構成さ
れるモノリシック型共振器4、LD1及び共振器4それ
ぞれの温調装置(ペルチェ素子)2a、2b、結合光学
系3とから構成されている。
2. Description of the Related Art A conventional second harmonic generator is shown in FIG. The conventional second harmonic generator is a semiconductor laser (resonator side end face reflectance R f = 5%, rear face reflectance R r = 90%,
Hereinafter, referred to as LD) 1, a monolithic resonator 4 composed of KNbO 3 crystal itself, LD 1 and temperature control devices (Peltier elements) 2a and 2b of the resonator 4 respectively, and a coupling optical system 3. .

【0003】LD1の発振周波数と共振器4の共振周波
数を一致させる周波数制御(周波数安定化)は、共振器
4内部の散乱光によって生じる逆回り共振光を戻り光5
としてLD1に戻す光帰還法(ロッキング)によって行
っている。図4において、6a及び6bは酸化防止膜で
ある。
The frequency control (frequency stabilization) for matching the oscillation frequency of the LD 1 with the resonance frequency of the resonator 4 causes the counterclockwise resonance light generated by the scattered light inside the resonator 4 to return to the return light 5.
The optical feedback method (rocking) for returning to LD1 is performed. In FIG. 4, 6a and 6b are antioxidant films.

【0004】[0004]

【発明が解決しようとする課題】従来の装置において
は、LDの周波数制御を光帰還法で行う際、LDの周波
数変動許容幅(ロッキングレンジ)が狭いため、環境温
度変化等の外乱によりロッキングがはずれ、高調波出力
が不安定化しやすいという問題点があった。
In the conventional device, when the frequency control of the LD is performed by the optical feedback method, the LD frequency fluctuation permissible width (locking range) is narrow, so that the locking is prevented by disturbance such as environmental temperature change. There is a problem that the harmonic output is likely to be destabilized and become unstable.

【0005】[0005]

【課題を解決するための手段】本発明は、前述の問題点
を解決すべくなされたものであり、基本波発生用の半導
体レーザと、前記基本波を高調波へ変換する非線形光学
材料を含み複数の反射面で基本波を共振させる共振器と
を有してなる高調波発生装置において、前記半導体レー
ザの基本波出射側の端面反射率を低下させたことを特徴
とする高調波発生装置を提供するものである。
The present invention has been made to solve the above-mentioned problems, and includes a semiconductor laser for generating a fundamental wave and a nonlinear optical material for converting the fundamental wave into a harmonic wave. A harmonic generation device comprising a resonator for resonating a fundamental wave with a plurality of reflection surfaces, wherein the end face reflectance of the semiconductor laser on the fundamental wave emission side is reduced. It is provided.

【0006】本発明において、共振器は、非線形光学材
料の複数の面に基本波の反射面を誘電体多層膜により形
成したモノリシック型共振器でもよく、複数の共振用ミ
ラー間の光軸上に非線形光学材料を配置したディスクリ
ート型共振器であってもよい。また本発明は第2高調波
発生装置ばかりでなく、より高次の高調波発生装置にも
応用できる。
In the present invention, the resonator may be a monolithic resonator in which a plurality of surfaces of a non-linear optical material are provided with reflecting surfaces of the fundamental wave by a dielectric multilayer film, and the resonators are arranged on the optical axis between the plurality of resonance mirrors. It may be a discrete resonator in which a nonlinear optical material is arranged. The present invention can be applied not only to the second harmonic generator but also to higher harmonic generators.

【0007】[0007]

【作用】本発明の高調波発生装置は、LDの端面反射率
を低下させることにより、LDへ帰還する戻り光の量を
増加させることができ、その結果LDの周波数変動許容
幅(ロッキングレンジ)を拡大できるものである。
The harmonic generator of the present invention can increase the amount of return light returned to the LD by lowering the end face reflectance of the LD, and as a result, the LD frequency fluctuation allowable width (rocking range). Can be expanded.

【0008】[0008]

【実施例】本発明装置の基本構成を図1に示す。図1に
おいて、従来例の図4と同じ部品については同じ符号を
付してその説明を省略する。発振波長が860nmで、
ペルチェ素子2aを用いて温調したLD(共振器側端面
反射率Rf =2%、後面反射率Rr =99%)1の光
を、結合光学系3により一周期の光路長12mmのKN
bO3 共振器(モノリシック型共振器)4の共振モード
と整合するようにして入射させた。LD1の基本波の出
射面には低反射膜7aが設けられ、LDの前記出射面と
反対面(後面)には高反射膜7bが設けられている。前
記低反射膜7aは、アモルファスシリコン、アルミナ等
の単体の膜、あるいはそれらを組み合わせて構成した膜
等が好ましく用いられる。
FIG. 1 shows the basic structure of the device of the present invention. In FIG. 1, the same parts as those in FIG. 4 of the conventional example are designated by the same reference numerals, and the description thereof will be omitted. The oscillation wavelength is 860 nm,
The light of the LD (resonator side facet reflectivity R f = 2%, rear face reflectivity R r = 99%) 1 adjusted by using the Peltier element 2a is converted by the coupling optical system 3 into a KN having an optical path length of 12 mm.
The incident light was made to match the resonance mode of the bO 3 resonator (monolithic resonator) 4. A low reflection film 7a is provided on the emission surface of the fundamental wave of the LD1, and a high reflection film 7b is provided on the surface (rear surface) opposite to the emission surface of the LD. As the low-reflection film 7a, a single film of amorphous silicon, alumina or the like, or a film formed by combining them is preferably used.

【0009】LDの後面反射率は、しきい値電流の増大
を極力抑えるために99%とした。また、共振器4の入
射面での直接の反射光は光軸が異なるためにLDに戻ら
ない。基本波(λ1 =860nm)は、共振器4内で図
1において時計回りに共振増倍され、第2高調波(λ2
=430nm)に変換される。この時、KNbO3 共振
器4は、位相整合条件及び共振条件を満足するように、
ペルチェ素子2bにより27℃に保持するよう温調を行
った。基本波は結晶のb軸と平行な偏光方向で入射させ
ており、第2高調波はそれと直交する偏光方向で出射さ
れる。
The rear surface reflectance of the LD is set to 99% in order to suppress the increase of the threshold current as much as possible. Further, the light directly reflected on the incident surface of the resonator 4 does not return to the LD because the optical axis is different. Fundamental wave (lambda 1 = 860 nm) is resonant multiplication clockwise in FIG. 1 in the resonator 4, the second harmonic (lambda 2
= 430 nm). At this time, the KNbO 3 resonator 4 satisfies the phase matching condition and the resonance condition,
The temperature was controlled by the Peltier device 2b so that the temperature was maintained at 27 ° C. The fundamental wave is incident in the polarization direction parallel to the b-axis of the crystal, and the second harmonic is emitted in the polarization direction orthogonal to it.

【0010】このような共振器を用いた第2高調波発生
装置においては、共振器の共振周波数とLDの発振周波
数を一致させることが必要となる。ここでは、共振器か
ら生じる反時計回り(図1において共振光と逆方向)の
共振光をLDに戻し、LDの発振周波数を共振器の共振
周波数にロックする光帰還制御を行っている。
In the second harmonic generator using such a resonator, it is necessary to make the resonance frequency of the resonator and the oscillation frequency of the LD match. Here, counterclockwise (reverse to the resonance light in FIG. 1) resonance light generated from the resonator is returned to the LD, and optical feedback control is performed to lock the oscillation frequency of the LD to the resonance frequency of the resonator.

【0011】図2(a)、(b)にその原理の模式図を
示す。これらの図では、戻り光が存在しない場合と存在
する場合をそれぞれ破線、実線で示している。図2
(a)の横軸はLDへの注入電流及び温度によって決ま
るLD単体の発振周波数(ωN )であり、縦軸は共振器
からの戻り光が存在する場合の複合共振器系(LD+共
振器)における周波数(ω)である。
2 (a) and 2 (b) show schematic diagrams of the principle. In these figures, the case where the returning light does not exist and the case where the returning light exists are shown by a broken line and a solid line, respectively. Figure 2
The horizontal axis of (a) is the oscillation frequency (ω N ) of the LD alone, which is determined by the current injected into the LD and the temperature, and the vertical axis is the composite resonator system (LD + resonator when there is return light from the resonator). ) Is the frequency (ω).

【0012】図2(b)はこのときの共振器透過スペク
トルを示している。共振器からの共振周波数という情報
をもった光をLDに戻すことにより、LDの発振周波数
は共振器の共振周波数に引き込まれ、その周波数にロッ
クされていることがわかる。この時、共振器透過スペク
トルはロッキングレンジと呼ばれる帯域を持ち、この範
囲内ではLD注入電流あるいは温度が変化してLD単体
の周波数がずれたとしても、LDの周波数と共振器の共
振周波数は一致してロックがはずれない。
FIG. 2B shows the resonator transmission spectrum at this time. By returning the light having the information of the resonance frequency from the resonator to the LD, the oscillation frequency of the LD is drawn to the resonance frequency of the resonator and is locked at that frequency. At this time, the resonator transmission spectrum has a band called a rocking range. Within this range, even if the LD injection current or temperature changes and the frequency of the LD itself shifts, the LD frequency and the resonance frequency of the resonator are equal. I can't release the lock.

【0013】このロッキングレンジは、LDの共振器側
の端面反射率(Rf )を減少させることにより拡大する
ことができる。図3には、LDの端面反射率(Rf )と
ロッキングレンジとの関係を示している。なお図中のロ
ッキングレンジの値は、実験値及び計算値共に5%の時
の値で規格化している。この図より、端面反射率を2%
に減少させることによりロッキングレンジを約1. 7倍
に拡大することができた。
This rocking range can be expanded by reducing the end face reflectance (R f ) of the LD on the resonator side. FIG. 3 shows the relationship between the end surface reflectance (R f ) of the LD and the rocking range. The values of the rocking range in the figure are both standardized by the value when the experimental value and the calculated value are 5%. From this figure, the end face reflectance is 2%
The rocking range could be expanded by about 1.7 times by reducing to 10.

【0014】すなわち、従来において約2GHz程度の
ロッキングレンジ(これに相当するLDの注入電流変動
許容幅、温度変動許容幅は約±1. 4mA、±0. 06
℃)を、この例のように端面反射率を2%とすることに
より、ロッキングレンジを約3. 4GHz(LDの注入
電流変動許容幅、温度変動許容幅は約±2. 4mA、約
±0. 1℃)に拡大することができ、系全体の安定性の
向上、電流制御及び温調精度の緩和の点で効果があっ
た。
That is, in the conventional case, a rocking range of about 2 GHz (corresponding to the LD injection current fluctuation allowance and temperature fluctuation allowance is about ± 1.4 mA and ± 0.06).
By setting the end face reflectance to 2% as in this example, the rocking range is about 3.4 GHz (LD injection current fluctuation allowable range, temperature fluctuation allowable range is about ± 2.4 mA, about ± 0). It was effective in improving the stability of the entire system, controlling the current, and relaxing the temperature control accuracy.

【0015】また、図3に示されるように、端面反射率
をさらに低下させることによりロッキングレンジを拡大
することが可能である。
Further, as shown in FIG. 3, the rocking range can be expanded by further lowering the end face reflectance.

【0016】本実施例では、モノリシック型共振器とし
てKNbO3 結晶を用いたが、LiNbO3 、β−BB
O、LBO、KTP等の非線形光学結晶によって構成し
たモノリシック型共振器においても本発明構成は有効で
ある。さらに、LDに関しても、ファブリペロー型、D
FB型、DBR型のいずれにおいても有効である。
In this embodiment, KNbO 3 crystal was used as the monolithic resonator, but LiNbO 3 and β-BB were used.
The structure of the present invention is also effective in a monolithic resonator formed of a non-linear optical crystal such as O, LBO, or KTP. Furthermore, regarding LD, Fabry-Perot type, D
It is effective for both FB type and DBR type.

【0017】[0017]

【発明の効果】本発明は、従来の第2高調波発生装置に
対して、LDの端面反射率低減に伴うロッキングレンジ
の拡大及び光帰還の強化が図られ、LDの周波数変動許
容幅が約1. 7倍程度拡大し、系全体の安定性が向上し
た。
According to the present invention, compared with the conventional second harmonic generator, the rocking range is expanded and the optical feedback is strengthened with the reduction of the end facet reflectivity of the LD, and the allowable range of the frequency fluctuation of the LD is about. It expanded about 1.7 times and improved the stability of the entire system.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第2高調波発生装置の基本構成を示す
側面図。
FIG. 1 is a side view showing a basic configuration of a second harmonic generation device of the present invention.

【図2】光帰還法を説明するものであり、(a)は共振
器からの戻り光が存在する場合と存在しない場合のLD
単体の周波数と複合系の周波数の関係を示すグラフで、
(b)はLD単体の周波数と共振器の透過光強度の関係
を表したグラフである。
FIG. 2 illustrates an optical feedback method, and FIG. 2A illustrates an LD in the case where the return light from the resonator is present and in the case where the return light is not present.
A graph showing the relationship between a single frequency and a composite frequency,
(B) is a graph showing the relationship between the frequency of the LD alone and the transmitted light intensity of the resonator.

【図3】LDの端面反射率とロッキングレンジの関係を
示すグラフ。
FIG. 3 is a graph showing a relationship between an LD end face reflectance and a rocking range.

【図4】従来の第2高調波発生装置の基本構成の側面
図。
FIG. 4 is a side view of the basic configuration of a conventional second harmonic generation device.

【符号の説明】[Explanation of symbols]

1:半導体レーザ(LD) 2a:温調装置(ペルチェ素子) 2b:温調装置(ペルチェ素子) 3:結合光学系 4:モノリシック型共振器 5:共振器からの戻り光 6a:酸化防止膜 6b:酸化防止膜 7a:低反射膜 7b:高反射膜 1: Semiconductor laser (LD) 2a: Temperature controller (Peltier element) 2b: Temperature controller (Peltier element) 3: Coupling optical system 4: Monolithic resonator 5: Return light from resonator 6a: Antioxidant film 6b : Antioxidant film 7a: Low reflective film 7b: High reflective film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】基本波発生用の半導体レーザと、前記基本
波を高調波へ変換する非線形光学材料を含み複数の反射
面で基本波を共振させる共振器とを有してなる高調波発
生装置において、前記半導体レーザの基本波出射側の端
面反射率を低下させたことを特徴とする高調波発生装
置。
1. A harmonic generator comprising a semiconductor laser for generating a fundamental wave, and a resonator which includes a nonlinear optical material for converting the fundamental wave into a harmonic wave and resonates the fundamental wave with a plurality of reflecting surfaces. 2. A harmonic generation device according to claim 1, wherein the end face reflectance of the semiconductor laser on the fundamental wave emission side is reduced.
JP17623593A 1993-06-23 1993-06-23 Harmonic generator Pending JPH0715077A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17623593A JPH0715077A (en) 1993-06-23 1993-06-23 Harmonic generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17623593A JPH0715077A (en) 1993-06-23 1993-06-23 Harmonic generator

Publications (1)

Publication Number Publication Date
JPH0715077A true JPH0715077A (en) 1995-01-17

Family

ID=16010006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17623593A Pending JPH0715077A (en) 1993-06-23 1993-06-23 Harmonic generator

Country Status (1)

Country Link
JP (1) JPH0715077A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6914918B2 (en) 1995-06-02 2005-07-05 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6914918B2 (en) 1995-06-02 2005-07-05 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device
US7101723B2 (en) 1995-06-02 2006-09-05 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device
US7295583B2 (en) 1995-06-02 2007-11-13 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device
US7339960B2 (en) 1995-06-02 2008-03-04 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device
US7382811B2 (en) 1995-06-02 2008-06-03 Matsushita Electric Industrial Co., Ltd. Optical device, laser beam source, laser apparatus and method of producing optical device
US7570677B2 (en) 1995-06-02 2009-08-04 Panasonic Corporation Optical device, laser beam source, laser apparatus and method of producing optical device
US7623559B2 (en) 1995-06-02 2009-11-24 Panasonic Corporation Optical device, laser beam source, laser apparatus and method of producing optical device

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