JPH0720905B2 - Method for producing 2-chloropropionaldehyde - Google Patents
Method for producing 2-chloropropionaldehydeInfo
- Publication number
- JPH0720905B2 JPH0720905B2 JP61113544A JP11354486A JPH0720905B2 JP H0720905 B2 JPH0720905 B2 JP H0720905B2 JP 61113544 A JP61113544 A JP 61113544A JP 11354486 A JP11354486 A JP 11354486A JP H0720905 B2 JPH0720905 B2 JP H0720905B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- reaction
- rhodium
- range
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- UAARVZGODBESIF-UHFFFAOYSA-N 2-chloropropanal Chemical compound CC(Cl)C=O UAARVZGODBESIF-UHFFFAOYSA-N 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title description 6
- 238000006243 chemical reaction Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 36
- -1 nitrogen-containing compound Chemical class 0.000 claims description 28
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 22
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 18
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 17
- 150000003284 rhodium compounds Chemical class 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 12
- 150000002903 organophosphorus compounds Chemical class 0.000 claims description 12
- 239000007810 chemical reaction solvent Substances 0.000 claims description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 7
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Natural products C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N anhydrous quinoline Natural products N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 150000001735 carboxylic acids Chemical class 0.000 claims description 2
- 239000002585 base Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 12
- 239000010948 rhodium Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 10
- 229910052703 rhodium Inorganic materials 0.000 description 10
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 2
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 2
- FSEXLNMNADBYJU-UHFFFAOYSA-N 2-phenylquinoline Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=N1 FSEXLNMNADBYJU-UHFFFAOYSA-N 0.000 description 2
- GRFNBEZIAWKNCO-UHFFFAOYSA-N 3-pyridinol Chemical compound OC1=CC=CN=C1 GRFNBEZIAWKNCO-UHFFFAOYSA-N 0.000 description 2
- MUDSDYNRBDKLGK-UHFFFAOYSA-N 4-methylquinoline Chemical compound C1=CC=C2C(C)=CC=NC2=C1 MUDSDYNRBDKLGK-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 125000000000 cycloalkoxy group Chemical group 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- FBOFHVFMPNNIKN-UHFFFAOYSA-N dimethylquinoline Natural products C1=CC=C2N=C(C)C(C)=CC2=C1 FBOFHVFMPNNIKN-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 2
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 2
- 229910003450 rhodium oxide Inorganic materials 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- MNZAKDODWSQONA-UHFFFAOYSA-N 1-dibutylphosphorylbutane Chemical compound CCCCP(=O)(CCCC)CCCC MNZAKDODWSQONA-UHFFFAOYSA-N 0.000 description 1
- ZSSWXNPRLJLCDU-UHFFFAOYSA-N 1-diethylphosphorylethane Chemical compound CCP(=O)(CC)CC ZSSWXNPRLJLCDU-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical group C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- IWDFHWZHHOSSGR-UHFFFAOYSA-N 1-ethylimidazole Chemical compound CCN1C=CN=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-N 0.000 description 1
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- PCFUWBOSXMKGIP-UHFFFAOYSA-N 2-benzylpyridine Chemical compound C=1C=CC=NC=1CC1=CC=CC=C1 PCFUWBOSXMKGIP-UHFFFAOYSA-N 0.000 description 1
- GAWAYYRQGQZKCR-UHFFFAOYSA-N 2-chloropropionic acid Chemical compound CC(Cl)C(O)=O GAWAYYRQGQZKCR-UHFFFAOYSA-N 0.000 description 1
- HUTHUTALXJNNRS-UHFFFAOYSA-N 2-cyclohexylpyridine Chemical compound C1CCCCC1C1=CC=CC=N1 HUTHUTALXJNNRS-UHFFFAOYSA-N 0.000 description 1
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 1
- XCIZVKSCLVSDHN-UHFFFAOYSA-N 2-ethylquinoline Chemical compound C1=CC=CC2=NC(CC)=CC=C21 XCIZVKSCLVSDHN-UHFFFAOYSA-N 0.000 description 1
- NSTREUWFTAOOKS-UHFFFAOYSA-N 2-fluorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1F NSTREUWFTAOOKS-UHFFFAOYSA-N 0.000 description 1
- IWTFOFMTUOBLHG-UHFFFAOYSA-N 2-methoxypyridine Chemical compound COC1=CC=CC=N1 IWTFOFMTUOBLHG-UHFFFAOYSA-N 0.000 description 1
- ZTQNUTNKGQGWCM-UHFFFAOYSA-N 2-methoxyquinoline Chemical compound C1=CC=CC2=NC(OC)=CC=C21 ZTQNUTNKGQGWCM-UHFFFAOYSA-N 0.000 description 1
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- MEAAWTRWNWSLPF-UHFFFAOYSA-N 2-phenoxypyridine Chemical compound C=1C=CC=NC=1OC1=CC=CC=C1 MEAAWTRWNWSLPF-UHFFFAOYSA-N 0.000 description 1
- DWYHDSLIWMUSOO-UHFFFAOYSA-N 2-phenyl-1h-benzimidazole Chemical compound C1=CC=CC=C1C1=NC2=CC=CC=C2N1 DWYHDSLIWMUSOO-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000002879 Lewis base Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 150000003927 aminopyridines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- HOPRXXXSABQWAV-UHFFFAOYSA-N anhydrous collidine Natural products CC1=CC=NC(C)=C1C HOPRXXXSABQWAV-UHFFFAOYSA-N 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- GGRQQHADVSXBQN-FGSKAQBVSA-N carbon monoxide;(z)-4-hydroxypent-3-en-2-one;rhodium Chemical compound [Rh].[O+]#[C-].[O+]#[C-].C\C(O)=C\C(C)=O GGRQQHADVSXBQN-FGSKAQBVSA-N 0.000 description 1
- SZQABOJVTZVBHE-UHFFFAOYSA-N carbon monoxide;rhodium Chemical compound [Rh].[Rh].[Rh].[Rh].[Rh].[Rh].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] SZQABOJVTZVBHE-UHFFFAOYSA-N 0.000 description 1
- IETKMTGYQIVLRF-UHFFFAOYSA-N carbon monoxide;rhodium;triphenylphosphane Chemical compound [Rh].[O+]#[C-].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 IETKMTGYQIVLRF-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- UTBIMNXEDGNJFE-UHFFFAOYSA-N collidine Natural products CC1=CC=C(C)C(C)=N1 UTBIMNXEDGNJFE-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000002283 diesel fuel Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002537 isoquinolines Chemical class 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000003279 phenylacetic acid Substances 0.000 description 1
- 229960003424 phenylacetic acid Drugs 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical compound [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- KXAHUXSHRWNTOD-UHFFFAOYSA-K rhodium(3+);triiodide Chemical compound [Rh+3].[I-].[I-].[I-] KXAHUXSHRWNTOD-UHFFFAOYSA-K 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- GFYHSKONPJXCDE-UHFFFAOYSA-N sym-collidine Natural products CC1=CN=C(C)C(C)=C1 GFYHSKONPJXCDE-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- KKFOMYPMTJLQGA-UHFFFAOYSA-N tribenzyl phosphite Chemical compound C=1C=CC=CC=1COP(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 KKFOMYPMTJLQGA-UHFFFAOYSA-N 0.000 description 1
- IFXORIIYQORRMJ-UHFFFAOYSA-N tribenzylphosphane Chemical compound C=1C=CC=CC=1CP(CC=1C=CC=CC=1)CC1=CC=CC=C1 IFXORIIYQORRMJ-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- FICPQAZLPKLOLH-UHFFFAOYSA-N tricyclohexyl phosphite Chemical compound C1CCCCC1OP(OC1CCCCC1)OC1CCCCC1 FICPQAZLPKLOLH-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- ZMBHCYHQLYEYDV-UHFFFAOYSA-N trioctylphosphine oxide Chemical compound CCCCCCCCP(=O)(CCCCCCCC)CCCCCCCC ZMBHCYHQLYEYDV-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- QOPBTFMUVTXWFF-UHFFFAOYSA-N tripropyl phosphite Chemical compound CCCOP(OCCC)OCCC QOPBTFMUVTXWFF-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、次の反応式 (1) CH2=CHCl+CO+H2 CH3−CHCl−CHO (1) に従った塩化ビニル、一酸化炭素および水素を原料とす
る2-クロロプロピオンアルデヒドの製造方法に関する。
2−クロロプロピオンアルデヒドは化学品および農医薬
等の有用な中間体として用いることができる。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention relates to vinyl chloride, carbon monoxide and hydrogen according to the following reaction formula (1) CH 2 = CHCl + CO + H 2 CH 3 -CHCl-CHO (1). The present invention relates to a method for producing 2-chloropropionaldehyde using as a raw material.
2-Chloropropionaldehyde can be used as a useful intermediate for chemicals and agricultural medicine.
(従来の技術) 塩化ビニル、一酸化炭素および水素を原料とする2−ク
ロロプロピオンアルデヒドの製造方法は公知で、例え
ば、フランス特許第1,397,779号やヘルベチカ・キミカ
・アクタ(HELVETICA CHIMICA ACTA),48巻,第5号,11
51頁〜1157頁に示されている。これらの方法は、いずれ
もコバルトカルボニルを触媒として用い、例えば、前記
フランス特許第1,397,779号によれば、反応温度110℃、
反応圧力200気圧の条件下において、90分間反応を行わ
せ、塩化ビニルの転化率57.4%、2-クロロプロピオンア
ルデヒドの選択率86.2%の反応成績を得ている。(Prior Art) A method for producing 2-chloropropionaldehyde using vinyl chloride, carbon monoxide and hydrogen as a raw material is known, and for example, French Patent No. 1,397,779 and HELVETICA CHIMICA ACTA, 48 volumes. , No. 5, 11
It is shown on pages 51 to 1157. These methods all use cobalt carbonyl as a catalyst, for example, according to the above-mentioned French Patent No. 1,397,779, a reaction temperature of 110 ° C.,
The reaction was performed under a reaction pressure of 200 atm for 90 minutes, and the reaction results were 57.4% conversion of vinyl chloride and 86.2% selectivity of 2-chloropropionaldehyde.
(発明が解決しようとする問題点) しかし、これらのコバルトカルボニルを触媒として用い
る方法では、コバルト当りの触媒活性はきわめて低く、
このために多量のコバルトカルボニルと160〜200気圧と
いう高い反応圧力を必要とす上に、反応温度75〜125℃
のもとで90〜120分間にわたり反応を行わせる方法がと
られている。目的生成物である2−クロロプロピオンア
ルデヒドは熱的に不安定な物質で、このような反応温と
反応時間のもとでは、かなりの割合が逐次反応で消費さ
れて反応収率を低めるために、この方法は再現性に乏し
く、更にはこの逐次反応または他の副反応により塩化水
素が副生し、これが反応器の材料を激しく腐食する上に
コバルトカルボニル触媒と反応して塩化コバルトとなる
ために触媒の再使用にも支障をきたすという問題点を有
している。(Problems to be solved by the invention) However, in the method using these cobalt carbonyls as a catalyst, the catalytic activity per cobalt is extremely low,
For this reason, a large amount of cobalt carbonyl and a high reaction pressure of 160 to 200 atm are required, and the reaction temperature is 75 to 125 ° C.
The method is such that the reaction is carried out for 90 to 120 minutes under heat. The target product, 2-chloropropionaldehyde, is a thermally unstable substance, and under such a reaction temperature and reaction time, a considerable proportion is consumed in the sequential reaction, so that the reaction yield is lowered. , This method is not reproducible, and hydrogen chloride is by-produced by this sequential reaction or other side reaction, which violently corrodes the material of the reactor and reacts with the cobalt carbonyl catalyst to form cobalt chloride. In addition, there is a problem in that the reuse of the catalyst is also hindered.
本発明の課題は従来技術のこのような問題点を解決した
2−クロロプロピオンアルデヒドの製造方法を提供する
ことである。An object of the present invention is to provide a method for producing 2-chloropropionaldehyde, which solves the above problems of the prior art.
(問題点を解決するための手段) 本発明者等は、これらの課題解決のため詳細な研究を行
った。その結果、塩化ビニル、一酸化炭素および水素と
を、ロジウム化合物、塩基およびカルボン酸の存在下に
反応させると、従来のコバルトカルボニル触媒を用いる
方法にくらべ、より低温・低圧下で反応が進行し、かつ
充分な目的生成物への選択性が得られることを見出し、
本発明にいたった。(Means for Solving Problems) The present inventors have conducted detailed research for solving these problems. As a result, when vinyl chloride, carbon monoxide and hydrogen are reacted in the presence of a rhodium compound, a base and a carboxylic acid, the reaction proceeds at a lower temperature and lower pressure than the conventional method using a cobalt carbonyl catalyst. , And found that sufficient selectivity to the desired product is obtained,
This led to the present invention.
すなわち、本発明は、塩化ビニル、一酸化炭素および水
素をロジウム化合物、塩基およびカルボン酸の存在下に
反応させることを特徴とする2−クロロプロピオンアル
デヒドの製造方法である。That is, the present invention is a method for producing 2-chloropropionaldehyde, which comprises reacting vinyl chloride, carbon monoxide and hydrogen in the presence of a rhodium compound, a base and a carboxylic acid.
本発明の方法においては、反応系内においてロジウム化
合物に塩基およびカルボン酸を組合せた触媒を用いるこ
とが重要である。In the method of the present invention, it is important to use a catalyst in which a rhodium compound is combined with a base and a carboxylic acid in the reaction system.
ここに述べる塩基とは、一般に窒素、燐、または砒素な
どの周期律第VB族元素を含有するルイス塩基を意味す
る。これらの塩基の不存在下では、ロジウム化合物は上
記反応に対して全く触媒作用を示さない。本発明の方法
において用いる塩基として好ましいものは、三価の有機
燐化合物もしくは三価の有機燐化合物のオキサイド、ま
たは、pKaが3〜11の範囲にある含窒素化合物である。
特に、塩基が三価の有機燐化合物もしくは三価の有機燐
化合物のオキサイドと、pKaが3〜11の範囲にある含窒
素化合物と組合せであることが更に好ましい。The base described here generally means a Lewis base containing a periodic VB group element such as nitrogen, phosphorus, or arsenic. In the absence of these bases, rhodium compounds do not catalyze the above reaction at all. Preferred as the base used in the method of the present invention is a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound, or a nitrogen-containing compound having a pKa in the range of 3 to 11.
In particular, it is more preferable that the base is a combination of a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound and a nitrogen-containing compound having a pKa in the range of 3 to 11.
ここに述べる三価の有機燐化合物とは、一般式P(R1R2
R3)(ここに、Pは燐原子を示し、R1、R2、R3はそれ
ぞれ同一あるいは異種アルキル、アリール、シクロアル
キル、アルコキシ、アリールオキシまたはシクロアルコ
キシ基を示す)で表わされる化合物に代表される三価の
有機燐化合物を指し、具体的な例としては、トリメチル
ホスフィン、トリエチルホスフィン、トリプロピルホス
フィン、トリブチルホスフィン、トリオクチルホスフィ
ン、トリフェニルホスフィン、トリシクロヘキシルホス
フィン、トリベンジルホスフィンなどのホスフィン類
や、トリメチルホスファイト、トリエチルホスファイ
ト、トリプロピルホスファイト、トリブチルホスファイ
ト、トリオクチルホスファイト、トリフェニルホスファ
イト、トリシクロヘキシルホスファイト、トリベンジル
ホスファイトなどのホスファイト類があげられる。ま
た、ホスフィン類の特殊なものとして、上記一般式P
(R1R2R3)で表わされるもののほかに、ビスジフェニル
ホスフィノメタン、ビスジフェニルホスフィノエタンな
どのジホスフィン類や、架橋ポリスチレンに結合したホ
スフィン類等も好ましく用いられる。The trivalent organophosphorus compound described here is a compound represented by the general formula P (R 1 R 2
R 3 ) (wherein P represents a phosphorus atom, and R 1 , R 2 and R 3 represent the same or different alkyl, aryl, cycloalkyl, alkoxy, aryloxy or cycloalkoxy groups) A representative trivalent organophosphorus compound, and specific examples include phosphines such as trimethylphosphine, triethylphosphine, tripropylphosphine, tributylphosphine, trioctylphosphine, triphenylphosphine, tricyclohexylphosphine, and tribenzylphosphine. And trimethyl phosphite, triethyl phosphite, tripropyl phosphite, tributyl phosphite, trioctyl phosphite, triphenyl phosphite, tricyclohexyl phosphite, tribenzyl phosphite, etc. Examples include phosphites. As a special kind of phosphine, the above general formula P
In addition to those represented by (R 1 R 2 R 3 ), diphosphines such as bisdiphenylphosphinomethane and bisdiphenylphosphinoethane, and phosphines bonded to crosslinked polystyrene are also preferably used.
また、三価の有機燐化合物のオキサイドとは先に述べた
三価の有機燐化合物に対応するオキサイドをさし、具体
的な例としてはトリエチルホスフィンオキサイド、トリ
ブチルホスフィンオキサイド、トリオクチルホスフィン
オキサイド等のアルキルホスフィンオキサイド、トリフ
ェニルホスフィンオキサイド、トリトリルホスフィンオ
キサイド等のアリールホスフィンオキサイド、またはア
ルキル基とアリール基とを合わせもつアルキルアリール
ホスフィンオキサイド等が挙げられる。またこのほか、
トリエチルホスファイトオキサイド、トリブチルホスフ
ァイトオキサイド、トリフェニルホスファイトオキサイ
ド等のアルキルあるいはアリールホスファイトオキサイ
ド類や、アルキル基とアリール基とを合わせもつアルキ
ルアリールホスファイトオキサイド類等も挙げることが
できる。またさらには、ビス‐1,2-ジフェニルホスフィ
ノメタンジオキサイドなどの多座ホスフィンのオキサイ
ド等もこれらの例に含まれる。Further, the oxide of a trivalent organic phosphorus compound refers to an oxide corresponding to the above-mentioned trivalent organic phosphorus compound, and specific examples thereof include triethylphosphine oxide, tributylphosphine oxide, trioctylphosphine oxide and the like. Examples thereof include arylphosphine oxides such as alkylphosphine oxide, triphenylphosphine oxide and tritolylphosphine oxide, and alkylarylphosphine oxides having an alkyl group and an aryl group in combination. In addition to this,
Examples thereof also include alkyl or aryl phosphite oxides such as triethyl phosphite oxide, tributyl phosphite oxide, and triphenyl phosphite oxide, and alkylaryl phosphite oxides having both an alkyl group and an aryl group. Furthermore, oxides of polydentate phosphines such as bis-1,2-diphenylphosphinomethanedioxide are also included in these examples.
一方、ここに述べるpKaが3〜11の範囲にあるアミン類
としては、一般に、アミノ基を含有する化合物、例え
ば、脂肪族アミン類、芳香族アミン類、ジアミン類、ト
リアミン類、アミノアルコール類、アミノ酸類、アミド
類、尿素化合物、グアニジン類、アミジン類、あるいは
これらの化合物の窒素原子あるは炭素原子等にアルキル
基、アリール基、カルボキシル基、ヒドロキシル基また
はハロゲンなど置換基の入った含窒素化合物の中で、pK
aが3〜11の範囲にある化合物があげられる。また、こ
のほか窒素‐原子以上を含む複素環式化合物の中で、pK
aが3〜11の範囲にある化合物も好ましい。中でも、pKa
が3〜11の範囲にあるピリジン化合物、キノリン化合
物、イミダゾール化合物、またはモルホリン化合物の少
なくとも一種以上であることが更に好ましい。On the other hand, as amines having a pKa in the range of 3 to 11, compounds having an amino group, such as aliphatic amines, aromatic amines, diamines, triamines, amino alcohols, are generally used. Amino acids, amides, urea compounds, guanidines, amidines, or nitrogen-containing compounds in which a nitrogen atom or a carbon atom of these compounds has a substituent such as an alkyl group, an aryl group, a carboxyl group, a hydroxyl group or a halogen. In the pK
Examples thereof include compounds in which a is in the range of 3 to 11. In addition, among other heterocyclic compounds containing more than nitrogen-atoms, pK
A compound in which a is in the range of 3 to 11 is also preferable. Above all, pKa
Is more preferably at least one of a pyridine compound, a quinoline compound, an imidazole compound, and a morpholine compound in the range of 3 to 11.
これらの、pKaが3〜11の範囲にあるピリジン化合物、
キノリン化合物、イミダゾール化合物、またはモルホリ
ン化合物は、次のように例示される。A pyridine compound having a pKa in the range of 3 to 11,
The quinoline compound, the imidazole compound, or the morpholine compound is exemplified as follows.
即ち、ピリジン化合物としては、一般式 (式中、R1、R2、R3、R4およびR5は、それぞれ、水素、
アルキル基、アリール基、シクロアルキル基、ハロゲ
ン、ヒドロキシル基、アルコキシ基、アリールオキシ
基、シクロアルコキシ基、カルボキシ基またはアセチル
基を示す)で表わされる化合物の中でpKaが3〜11の範
囲のピリジン化合物があり、これらの例としては、ピリ
ジン、ピコリン、エチルピリジン、2,4-ルチジン、α‐
コリジン、フェニルピリジン、シクロヘキシルピリジ
ン、ベンジルピリジン,3-ピリジノール,メトキシピリ
ジン,フェノキシピリジン、アミノピリジンなどがあ
る。このほか、2,2′‐ビスピリジンなどの多核ピリジ
ン類もピリジン化合物の一例として挙げられる。That is, the pyridine compound has the general formula (In the formula, R 1 , R 2 , R 3 , R 4 and R 5 are each hydrogen,
A compound represented by an alkyl group, an aryl group, a cycloalkyl group, a halogen, a hydroxyl group, an alkoxy group, an aryloxy group, a cycloalkoxy group, a carboxy group or an acetyl group) having a pKa in the range of 3 to 11 There are compounds, examples of which are pyridine, picoline, ethylpyridine, 2,4-lutidine, α-
Examples include collidine, phenylpyridine, cyclohexylpyridine, benzylpyridine, 3-pyridinol, methoxypyridine, phenoxypyridine, and aminopyridine. In addition, polynuclear pyridines such as 2,2'-bispyridine are also mentioned as an example of the pyridine compound.
また、キノリン化合物の例としてはキノリンのほかに2-
メチルキノリン、4-メチルキノリン、ジメチルキノリ
ン、2-エチルキノリン、フェニルキノリン、メトキシキ
ノリンなどがあり、このほか各種のイソキノリン化合物
も使用できる。In addition to quinoline, examples of quinoline compounds include 2-
There are methylquinoline, 4-methylquinoline, dimethylquinoline, 2-ethylquinoline, phenylquinoline, methoxyquinoline and the like, and various isoquinoline compounds can also be used.
一方、イミダゾール化合物としては、一般式 (式中、R1、R2、R3およびR4はそれぞれ、水素、アルキ
ル基、アリール基またはシクロアルキル基を示し、また
R3およびR4がイミダゾール環の4,5位の炭素を含む環を
形成する縮環イミダゾールを形成してもよい)で示され
る化合物のなかでpKaが3〜11の範囲にあるものがあ
り、これらの例としては、イミダゾール、N-メチルイミ
ダゾール、N-エチルイミダゾール、2-メチルイミダゾー
ル、22-エチル‐4-メチルイミダゾール、2-フェニルイ
ミダゾール、2-ウンデシルイミダゾール、N-ベンジル‐
2-メチルイミダゾール、2,4,5-トリフェニルイミダゾー
ル、ベンゾイミダゾール、2-メチルベンゾイミダゾー
ル、2-フェニルベンゾイミダゾール等が挙げられる。On the other hand, the imidazole compound has the general formula (In the formula, R 1 , R 2 , R 3 and R 4 each represent hydrogen, an alkyl group, an aryl group or a cycloalkyl group, and
R 3 and R 4 may form a condensed imidazole which forms a ring containing carbons at positions 4 and 5 of the imidazole ring), and some have a pKa in the range of 3 to 11 , Examples of these include imidazole, N-methylimidazole, N-ethylimidazole, 2-methylimidazole, 22-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, N-benzyl-
2-Methylimidazole, 2,4,5-triphenylimidazole, benzimidazole, 2-methylbenzimidazole, 2-phenylbenzimidazole and the like can be mentioned.
更に、モルホリン化合物の例としては、モルホリンのほ
かに、N-メチルモルホリン、N-エチルモルホリンなどが
挙げられる。Furthermore, examples of the morpholine compound include N-methylmorpholine, N-ethylmorpholine, and the like, in addition to morpholine.
本発明の方法ではカルボン酸としては、脂肪族または芳
香族の、一価または多価カルボン酸が用いられ、特に水
溶液中でのpKaが1.5〜5.0の範囲にあるものが更に好ま
しい。また、水溶液中でのpKaがこの範囲にあるもので
あれば、上記カルボン酸には各種の置換基が入っていて
もよい。これらの置換基の例としては、ハロゲン、アミ
ノ基、アリール基、ヒドロキシル基またはニトロ基など
がある。また、脂肪族カルボン酸は飽和または不飽和の
いずれもが使用できる。具体的には酢酸、プロピオン
酸、酪酸、吉草酸等の脂肪族飽和モノカルボン酸、アク
リル酸、クロトン酸等の脂肪族不飽和モノカルボン酸、
アジピン酸、クエン酸、コハク酸等の脂肪族ポリカルボ
ン酸、安息香酸、o-フタル酸、p-フタル酸、1-ナフトエ
酸等の芳香族モノまたはポリカルボン酸が挙げられる。
また、置換基の入ったカルボン酸の例としては、モノフ
ルオロ酢酸、2-クロロプロピオン酸、o-フルオロ安息香
酸、乳酸、フェニル酢酸等が挙げられる。これらのカル
ボン酸の中でも、o-フタル酸が特に好ましく用いられ
る。In the method of the present invention, as the carboxylic acid, an aliphatic or aromatic monovalent or polyvalent carboxylic acid is used, and one having a pKa in an aqueous solution of 1.5 to 5.0 is more preferable. Further, if the pKa in the aqueous solution is within this range, the carboxylic acid may contain various substituents. Examples of these substituents include halogen, amino group, aryl group, hydroxyl group or nitro group. Further, the aliphatic carboxylic acid may be saturated or unsaturated. Specifically, acetic acid, propionic acid, butyric acid, aliphatic saturated monocarboxylic acids such as valeric acid, acrylic acid, aliphatic unsaturated monocarboxylic acids such as crotonic acid,
Examples thereof include aliphatic polycarboxylic acids such as adipic acid, citric acid and succinic acid, and aromatic mono- or polycarboxylic acids such as benzoic acid, o-phthalic acid, p-phthalic acid and 1-naphthoic acid.
Further, examples of the carboxylic acid having a substituent include monofluoroacetic acid, 2-chloropropionic acid, o-fluorobenzoic acid, lactic acid, phenylacetic acid and the like. Among these carboxylic acids, o-phthalic acid is particularly preferably used.
本発明の方法に用いられるロジウム化合物としては、ロ
ジウムの酸化物、鉱酸塩、有機酸塩またはロジウム錯化
合物などがある。これらの各種ロジウム化合物の中で
も、特に、ハロゲンを含まないロジウム化合物が好まし
い。これらの例としては、酸化ロジウム、硝酸ロジウ
ム、硫酸ロジウム、酢酸ロジウム、トリアセチルアセト
ナートロジウム、ジカルボニルアセチルアセトナートロ
ジウム、ドデカカルボニルテトラロジウム、ヘキサデカ
カルボニルヘキサロジウム等が挙げられる。また、塩化
ロジウム、臭化ロジウム、沃化ロジウムまたはジクロロ
テトラカルボニルジロジウムなどのハロゲン含有ロジウ
ム化合物を用い、反応系内にこれらのハロゲン原子に対
し等量以上のアルカリ性化合物、たとえば、水酸化ナト
リウム、水酸化カリウム、炭酸カリウム、トリメチルア
ミン、トリエチルアミン等を加えることも、ハロゲンを
含有しないロジウム化合物を反応系内において生成させ
る手段として用いることができる。また、本発明の方法
においては、ロジウム化合物は、ロジウム化合物とこれ
らの塩基の少なくとも一部とで錯化合物を形成したもの
も更に好ましく用いられる。これらの例としては、例え
ば、ヒドリドカルボニルトリストリフェニルホスフィン
ロジウム[RhH(CO)(PPh3)3]、ニトロシルトリス
トリフェニルホスフィンロジウム[Rh(NO)(PP
h3)3]、η‐シクロペンタジエニルビストリフェニル
ホスフィンロジウム[Rh(C5H5)(PPh3)2]などが挙
げられる。本発明の方法では、前記ロジウム化合物は、
反応系内の液相1リットルあたりロジウム原子として、
0.0001〜1000ミリグラム原子、好ましくは、0.001〜100
ミリグラム原子の範囲に相当する量で使用される。ま
た、本発明の方法において使用される前記塩基は、それ
ぞれロジウム1グラム原子に対し0.1〜50モル、好まし
くは0.5〜100モルの範囲で使用される。一方、本発明の
方法で使用される前記カルボン酸の量は、カルボン酸の
種類にもよるが、通常はロジウム1グラム原子に対し1
〜200モル、好ましくは5〜50モルの範囲で使用され
る。Examples of the rhodium compound used in the method of the present invention include rhodium oxide, mineral acid salt, organic acid salt, and rhodium complex compound. Among these various rhodium compounds, a halogen-free rhodium compound is particularly preferable. Examples of these include rhodium oxide, rhodium nitrate, rhodium sulfate, rhodium acetate, triacetylacetonato rhodium, dicarbonylacetylacetonato rhodium, dodecacarbonyl tetrarhodium, hexadecacarbonyl hexarhodium and the like. Further, using a halogen-containing rhodium compound such as rhodium chloride, rhodium bromide, rhodium iodide or dichlorotetracarbonyl dirhodium, an alkaline compound in an equivalent amount or more to these halogen atoms in the reaction system, for example, sodium hydroxide, Addition of potassium hydroxide, potassium carbonate, trimethylamine, triethylamine or the like can also be used as a means for producing a halogen-free rhodium compound in the reaction system. Further, in the method of the present invention, as the rhodium compound, a compound in which a rhodium compound and at least a part of these bases form a complex compound is more preferably used. Examples of these include hydridocarbonyltristriphenylphosphine rhodium [RhH (CO) (PPh 3 ) 3 ], nitrosyltristriphenylphosphine rhodium [Rh (NO) (PP
h 3 ) 3 ], η-cyclopentadienylbistriphenylphosphine rhodium [Rh (C 5 H 5 ) (PPh 3 ) 2 ] and the like. In the method of the present invention, the rhodium compound is
As rhodium atom per 1 liter of liquid phase in the reaction system,
0.0001-1000 mg atom, preferably 0.001-100
Used in amounts equivalent to the milligram atom range. The base used in the method of the present invention is used in an amount of 0.1 to 50 mol, preferably 0.5 to 100 mol, per 1 gram atom of rhodium. On the other hand, although the amount of the carboxylic acid used in the method of the present invention depends on the kind of the carboxylic acid, it is usually 1 gram atom of rhodium.
It is used in the range of -200 mol, preferably 5-50 mol.
本発明の方法においては、反応溶媒を用いなくとも反応
は進行するが、通常は反応溶媒の存在下に反応を行わせ
る。反応溶媒としては、反応に悪影響を及ぼさないもの
であればいずれも用いることが可能である。このような
溶媒としてとくに好ましいのは炭化水素類である。より
具体的には、ヘキサン、ヘプタン、オクタン、ノナン、
デカン等の飽和炭化水素や、ベンゼン、トルエン、キシ
レン等の芳香族炭化水素などが好ましく用いられ、ま
た、炭化水素類の混合物として工業的に得られるリグロ
イン、ケロシン、軽油、ディーゼル油なども、これらの
例に含まれる。このほか、ジプロピルエーテル、ジブチ
ルエーテルなどのエーテル類、ジイソブチルケトン、ホ
ロンなどのケトン類、酪酸ブチル、安息香酸ブチルなど
のエステル類なども好ましい溶媒の例として挙げられ
る。In the method of the present invention, the reaction proceeds without using a reaction solvent, but the reaction is usually performed in the presence of the reaction solvent. Any reaction solvent can be used as long as it does not adversely affect the reaction. Hydrocarbons are particularly preferable as such a solvent. More specifically, hexane, heptane, octane, nonane,
Saturated hydrocarbons such as decane and aromatic hydrocarbons such as benzene, toluene and xylene are preferably used, and ligroin, kerosene, gas oil, diesel oil and the like which are industrially obtained as a mixture of hydrocarbons are also used. Included in the example. In addition to these, ethers such as dipropyl ether and dibutyl ether, ketones such as diisobutyl ketone and holone, and esters such as butyl butyrate and butyl benzoate are also exemplified as preferable solvents.
本発明の方法においては、水の不存在下においても反応
は進行するが好ましくは水の存在下に反応を行わせる。
水の存在は触媒活性を向上させる。本発明の方法では、
反応溶媒として水に不溶性または難溶性の液体媒体を用
い、反応系内に水を共存させる方法が更に好ましい。こ
のような方法をとることにより触媒活性はさらに向上す
る。本発明の方法において反応時に存在させる水の量に
ついては、特に制限はないが、極端に少量の場合には、
その効果は小さくなり、また、極端に多量用いても反応
成績はある程度以上は上がらない。通常、水の量は原料
として反応器へ供給する塩化ビニルに対して重量比で0.
01以上、1000以下の範囲が好ましい。特に、0.1〜100の
範囲が更に好ましく用いられる。In the method of the present invention, the reaction proceeds even in the absence of water, but the reaction is preferably performed in the presence of water.
The presence of water improves the catalytic activity. In the method of the present invention,
A method in which a liquid medium insoluble or slightly soluble in water is used as a reaction solvent and water is allowed to coexist in the reaction system is more preferable. By taking such a method, the catalytic activity is further improved. The amount of water to be present during the reaction in the method of the present invention is not particularly limited, but in the case of an extremely small amount,
The effect is small, and the reaction results do not improve beyond a certain level even if used in an extremely large amount. Usually, the amount of water is 0 by weight with respect to vinyl chloride supplied to the reactor as a raw material.
The range of 01 or more and 1000 or less is preferable. Particularly, the range of 0.1 to 100 is more preferably used.
また、本発明において用いる塩基やカルボン酸が水溶性
の場合には、該塩基やカルボン酸の少なくとも一部を反
応系に供給する水に溶解させた形で供給することも好ま
しく行われる。たとえば、塩基としてイミダゾールを用
いる場合には、これをイミダゾール水溶液の形で反応器
へ供給することが好ましく、また、カルボン酸としてo-
フタル酸を用いる場合には、これをo-フタル酸水溶液の
形で反応器へ供給することが好ましい。また、塩基とカ
ルボン酸の両方を溶解した水溶液の形で用いることも可
能である。When the base or carboxylic acid used in the present invention is water-soluble, it is also preferably carried out by dissolving at least a part of the base or carboxylic acid in water to be supplied to the reaction system. For example, when imidazole is used as the base, it is preferably supplied to the reactor in the form of an imidazole aqueous solution, and as carboxylic acid, o-
When phthalic acid is used, it is preferably fed to the reactor in the form of o-phthalic acid aqueous solution. It is also possible to use it in the form of an aqueous solution in which both a base and a carboxylic acid are dissolved.
本発明の方法は、通常、反応温度20〜150℃、反応圧力1
0〜200Kg/cm2ゲージの範囲、好ましくは30〜150Kg/cm2
ゲージの範囲で行われる。反応温度は生成する2-クロロ
プロピオンアルデヒドの熱安定性の面から、低温ほど好
ましく、このため、20〜100℃が特に好ましい温度範囲
である。また、原料の一酸化炭素および水素の混合モル
比は、通常、10〜0.1の範囲であり、好ましくは、4〜
0.2の範囲である。一酸化炭素および水素は前記の組成
比で両成分を含有する混合ガスであればよく、水性ガス
や、水性ガスにメタン、窒素などの反応に不活性なガ
ス、または二酸化炭素などが含有されたものが用いられ
る。もう一方の原料である塩化ビニルは、ガス状、液状
または反応に用いる溶媒に溶解した溶液の形で使用され
る。The method of the present invention is usually carried out at a reaction temperature of 20 to 150 ° C and a reaction pressure of
0-200 Kg / cm 2 gauge range, preferably 30-150 Kg / cm 2
It is done in the gauge range. The reaction temperature is preferably as low as possible from the viewpoint of the thermal stability of the 2-chloropropionaldehyde produced, and therefore, 20-100 ° C is a particularly preferred temperature range. The mixing molar ratio of carbon monoxide and hydrogen of the raw materials is usually in the range of 10 to 0.1, preferably 4 to
It is in the range of 0.2. Carbon monoxide and hydrogen may be any mixed gas containing both components in the above composition ratio, and water gas, a gas such as methane, a gas inert to the reaction such as nitrogen, or carbon dioxide was contained. Things are used. The other raw material, vinyl chloride, is used in the form of a gas, a liquid, or a solution dissolved in a solvent used for the reaction.
本発明の方法は、回分法、半回分法、連続法のいずれの
方法によっても実施できる。例えば、回分法の場合の例
としては、ロジウム化合物、塩基、カルボン酸および必
要に応じて反応溶媒および水を仕込んだオートクレーブ
に、塩化ビニルをガス、液、あるいは溶液状で加え、こ
れに一酸化炭素および水素を含有するガスを所定の圧力
まで導入し、好ましくは撹拌下で加温することにより反
応は進行する。また、連続法の場合の例としては、ロジ
ウム化合物、塩基、カルボン酸および必要に応じて反応
溶媒および水と、原料の塩化ビニル、一酸化炭素および
水素とを、耐圧の反応器の一方に連続的に供給し、他方
から反応混合物と、未反応塩化ビニル、一酸化炭素およ
び水素とを連続的に抜出すことにより反応が行われる。The method of the present invention can be carried out by any of a batch method, a semi-batch method and a continuous method. For example, in the case of the batch method, vinyl chloride is added to an autoclave charged with a rhodium compound, a base, a carboxylic acid, and optionally a reaction solvent and water in a gas, liquid, or solution form, and then monooxidized. The reaction proceeds by introducing a gas containing carbon and hydrogen up to a predetermined pressure, and preferably heating with stirring. As an example of the continuous method, a rhodium compound, a base, a carboxylic acid, and optionally a reaction solvent and water, and raw materials vinyl chloride, carbon monoxide, and hydrogen are continuously supplied to one of the pressure-resistant reactors. Reaction is carried out by continuously withdrawing unreacted vinyl chloride, carbon monoxide, and hydrogen from the other side.
(作用および発明の効果) 本発明により、塩化ビニル、一酸化炭素および水素を原
料として、より低温・低圧下において高収率で2-クロロ
プロピオンアルデヒドを製造することができる。特に、
本発明の方法により、従来よりも高い触媒活性および2-
クロロプロピオンアルデヒドへの選択性のもとで反応を
進行させることが可能となる。(Operation and Effect of the Invention) According to the present invention, 2-chloropropionaldehyde can be produced in high yield at a lower temperature and a lower pressure using vinyl chloride, carbon monoxide and hydrogen as raw materials. In particular,
By the method of the present invention, higher catalytic activity and 2-
It is possible to proceed the reaction under the selectivity to chloropropionaldehyde.
(実施例) 以下、実施例により本発明の方法を更に具体的に説明す
る。(Examples) Hereinafter, the method of the present invention will be described more specifically with reference to Examples.
実施例1 撹拌装置を備えた内容積100mlのステンレス製オートク
レーブの内部を窒素ガスで置換した後、ヒドリドカルボ
ニルトリストリフェニルホスフィンロジウム184mg(Rh
0.2ミリグラム原子)とトリフェニルホスフィン262mg
(1ミリモル)、イミダゾール510mg(7.5ミリモル)、
o-フタル酸640mg(4ミリモル)および水20gを入れ、こ
れに塩化ビニル3.75g(45ミリモル)を含む塩化ビニル
のトルエン溶液20mlを加えた。このオートクレーブに、
一酸化炭素および水素のモル比が1:2の混合ガスを室温
で圧力が75kg/cm2ゲージになるまで圧入した後に50℃ま
で昇温し、60分間反応させた。オートクレーブを室温ま
で冷却してから未反応の原料混合ガスをガスサンプリン
グ用袋に捕集した後オートクレーブを開け、触媒、溶媒
及び反応生成物を含む反応混合液を取り出した。ガスお
よび液をガスクロマトグラフィーで定量した結果、塩化
ビニルの転化率は22.5%であり、2-クロロプロピオンア
ルデヒドの生成量は12.9ミリモル(転化した塩化ビニル
基準の選択率は95.6%)で、主な副生物としてプロピオ
ンアルデヒドが選択率1.7%で生成していることが認め
られた。Example 1 After the inside of a stainless steel autoclave with an internal volume of 100 ml equipped with a stirrer was replaced with nitrogen gas, hydridocarbonyltristriphenylphosphine rhodium 184 mg (Rh
0.2 mg atom) and triphenylphosphine 262 mg
(1 mmol), 510 mg of imidazole (7.5 mmol),
640 mg (4 mmol) of o-phthalic acid and 20 g of water were added, and to this was added 20 ml of a toluene solution of vinyl chloride containing 3.75 g (45 mmol) of vinyl chloride. In this autoclave,
A mixed gas of carbon monoxide and hydrogen in a molar ratio of 1: 2 was injected at room temperature until the pressure reached 75 kg / cm 2 gauge, then the temperature was raised to 50 ° C., and the reaction was performed for 60 minutes. After cooling the autoclave to room temperature, the unreacted raw material mixed gas was collected in a gas sampling bag, the autoclave was opened, and the reaction mixed solution containing the catalyst, the solvent and the reaction product was taken out. As a result of quantifying the gas and liquid by gas chromatography, the conversion rate of vinyl chloride was 22.5%, the production amount of 2-chloropropionaldehyde was 12.9 mmol (selectivity based on the converted vinyl chloride was 95.6%). It was confirmed that propionaldehyde was produced as a by-product with a selectivity of 1.7%.
実施例2〜7 実施例1の方法において、反応温度、反応圧力、一酸化
炭素と水素のモル比および反応時間を変えて反応を行わ
せた。結果を表1に示した。Examples 2 to 7 In the method of Example 1, the reaction was performed by changing the reaction temperature, the reaction pressure, the molar ratio of carbon monoxide and hydrogen, and the reaction time. The results are shown in Table 1.
実施例8〜11 実施例1の方法において、反応温度を60℃、反応時間を
30分とし、ロジウム化合物、および塩基の量・種類、を
変えて反応を行わせた。ロジウム化合物の量はいずれも
ロジウムが0.2ミリグラム原子となるような量とした。
結果を表2に示す。 Examples 8 to 11 In the method of Example 1, the reaction temperature was 60 ° C and the reaction time was
The reaction was carried out for 30 minutes by changing the amount and type of the rhodium compound and the base. The amount of the rhodium compound was set to such an amount that rhodium was 0.2 mg atom.
The results are shown in Table 2.
実施例12〜15 実施例1の方法で、カルボン酸の種類および量を変えて
反応を行わせた。結果を表3に示した。 Examples 12 to 15 By the method of Example 1, the reaction was carried out by changing the kind and amount of the carboxylic acid. The results are shown in Table 3.
実施例16 実施例1の方法において、トリフェニルホスフィンおよ
び水の不存在以外は同方法で反応を行わせた。 Example 16 The reaction was performed in the same manner as in Example 1 except that triphenylphosphine and water were not present.
分析の結果、塩化ビニル転化率14.7%、2-クロロプロピ
オンアルデヒド選択率92.8%の反応成績を得た。As a result of the analysis, the reaction results of vinyl chloride conversion 14.7% and 2-chloropropionaldehyde selectivity 92.8% were obtained.
Claims (8)
ウム化合物、塩基およびカルボン酸の存在下に反応させ
ることを特徴とする2−クロロプロピオンアルデヒドの
製造方法。1. A process for producing 2-chloropropionaldehyde, which comprises reacting vinyl chloride, carbon monoxide and hydrogen in the presence of a rhodium compound, a base and a carboxylic acid.
有機燐化合物のオキサイドである特許請求の範囲第1項
記載の方法。2. The method according to claim 1, wherein the base is a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound.
合物である特許請求の範囲第1項記載の方法。3. The method according to claim 1, wherein the base is a nitrogen-containing compound having a pKa in the range of 3-11.
有機燐化合物のオキサイドの少なくとも一種以上と、pK
aが3〜11の範囲にある含窒素化合物の少なくとも一種
以上との組合せである特許請求の範囲第1項記載の方
法。4. A pK containing at least one trivalent organic phosphorus compound or at least one oxide of a trivalent organic phosphorus compound as a base.
The method according to claim 1, wherein a is a combination with at least one nitrogen-containing compound in the range of 3 to 11.
が、pKaが3〜11の範囲にあるピリジン化合物、キノリ
ン化合物、イミダゾール化合物またはモルホリン化合物
の少なくとも一種以上である特許請求の範囲第3項ある
いは第4項記載の方法。5. A nitrogen-containing compound having a pKa in the range of 3 to 11 is at least one of a pyridine compound, a quinoline compound, an imidazole compound and a morpholine compound having a pKa in the range of 3 to 11. The method according to item 3 or 4.
0のカルボン酸である特許請求の範囲第1項ないし第5
項記載の方法。6. The carboxylic acid has a pKa in an aqueous solution of 1.5 to 5.
Claims 1 to 5 which are carboxylic acids of 0
Method described in section.
第1項ないし第6項記載の方法。7. The method according to any one of claims 1 to 6, wherein water coexists in the reaction system.
の液体媒体を用い、反応系内に水を共存させる特許請求
の範囲第1項ないし第7項記載の方法。8. The method according to claim 1, wherein a liquid medium insoluble or hardly soluble in water is used as a reaction solvent, and water is allowed to coexist in the reaction system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61113544A JPH0720905B2 (en) | 1986-05-20 | 1986-05-20 | Method for producing 2-chloropropionaldehyde |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61113544A JPH0720905B2 (en) | 1986-05-20 | 1986-05-20 | Method for producing 2-chloropropionaldehyde |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62270541A JPS62270541A (en) | 1987-11-24 |
| JPH0720905B2 true JPH0720905B2 (en) | 1995-03-08 |
Family
ID=14615001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61113544A Expired - Lifetime JPH0720905B2 (en) | 1986-05-20 | 1986-05-20 | Method for producing 2-chloropropionaldehyde |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0720905B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6255007B2 (en) * | 2013-03-27 | 2017-12-27 | 株式会社クラレ | Method for producing dialdehyde |
-
1986
- 1986-05-20 JP JP61113544A patent/JPH0720905B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62270541A (en) | 1987-11-24 |
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