JPH0721560A - Method of manufacturing magnetic recording medium - Google Patents
Method of manufacturing magnetic recording mediumInfo
- Publication number
- JPH0721560A JPH0721560A JP18331693A JP18331693A JPH0721560A JP H0721560 A JPH0721560 A JP H0721560A JP 18331693 A JP18331693 A JP 18331693A JP 18331693 A JP18331693 A JP 18331693A JP H0721560 A JPH0721560 A JP H0721560A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- magnetic
- magnetic support
- vapor
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】
【構成】 連続走行する非磁性支持体2に対向して蒸着
源7を配置し、該蒸着源から蒸発する金属蒸気流を略垂
直方向から非磁性支持体2上に被着するに際し、蒸着源
から蒸発する金属蒸気流に非磁性支持体の長手方向と平
行な向きの磁界を印加する。
【効果】 磁化容易軸が斜めに傾いた蒸着膜が効率良く
成膜され、記録再生特性に優れた磁気記録媒体を高い生
産性をもって製造することが可能である。
(57) [Summary] [Structure] The vapor deposition source 7 is arranged so as to face the continuously running non-magnetic support 2, and a metal vapor flow evaporated from the vapor deposition source is applied onto the non-magnetic support 2 from a substantially vertical direction. Upon deposition, a magnetic field oriented parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor stream evaporating from the vapor deposition source. [Effect] It is possible to efficiently manufacture a vapor deposition film having an oblique axis of easy magnetization and to manufacture a magnetic recording medium having excellent recording and reproducing characteristics with high productivity.
Description
【0001】[0001]
【産業上の利用分野】本発明は、非磁性支持体上に真空
蒸着法によって磁性層を形成する磁気記録媒体の製造方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetic recording medium in which a magnetic layer is formed on a non-magnetic support by vacuum deposition.
【0002】[0002]
【従来の技術】例えばビデオテープレコーダ等の分野に
おいては、高画質化を図るために、高密度化が一層強く
要求されており、これに対応する磁気記録媒体として、
金属あるいはCo−Ni系合金等の磁性材料をメッキや
真空薄膜形成技術(真空蒸着法,スパッリング法,イオ
ンプレーティング法等)により、直接非磁性支持体上に
被着せしめて磁性層が形成される,いわゆる金属薄膜型
の磁気記録媒体が提案されている。2. Description of the Related Art In the field of video tape recorders, for example, there is a strong demand for higher density in order to achieve higher image quality.
A magnetic layer is formed by directly depositing a magnetic material such as metal or Co-Ni alloy on the non-magnetic support by plating or vacuum thin film forming technology (vacuum deposition method, sparring method, ion plating method, etc.). A so-called metal thin film type magnetic recording medium has been proposed.
【0003】この金属薄膜型の磁気記録媒体は、保磁
力,角形比及び短波長域における電磁変換特性に優れる
ばかりでなく、磁性層の薄膜化が可能であるために磁性
材料の充填密度を高くできること等、数々の利点を有し
ている。中でも真空蒸着法によって磁性層が形成される
蒸着タイプの磁気記録媒体は、優れた短波長記録再生特
性と安定した物理特性を有していることから既にハイバ
ンド8ミリ用テープやディジタルマイクロテープとして
商品化されている。This metal thin film type magnetic recording medium is excellent not only in coercive force, squareness ratio and electromagnetic conversion characteristics in a short wavelength region, but also because the magnetic layer can be thinned, the packing density of the magnetic material is high. It has many advantages such as being able to do it. Among them, the magnetic recording medium of the vapor deposition type in which the magnetic layer is formed by the vacuum vapor deposition method has already been used as a high band 8 mm tape or a digital microtape because it has excellent short wavelength recording / reproducing characteristics and stable physical characteristics. It has been commercialized.
【0004】ところで、上記蒸着タイプの磁気テープを
作製するには、図2に示すように、冷却キャン21に掛
け渡された非磁性支持体22と、蒸着源23とを対向配
置し、連続走行する非磁性支持体22に蒸着源23から
蒸発する金属蒸気を被着させ金属組織を成長させること
で蒸着膜を形成する。By the way, in order to manufacture the above vapor deposition type magnetic tape, as shown in FIG. 2, the non-magnetic support member 22 hung over the cooling can 21 and the vapor deposition source 23 are arranged to face each other and continuously run. A vapor deposition film is formed by depositing metal vapor evaporated from the vapor deposition source 23 on the non-magnetic support 22 to grow a metal structure.
【0005】このとき、蒸着源から蒸発する金属蒸気流
を非磁性支持体22面に対して垂直方向から入射させる
と、金属組織が垂直方向に成長して磁化容易軸が膜厚方
向と一致する蒸着膜が成膜される。一方、図2に示すよ
うに、非磁性支持体22面に対して遮蔽板24にて入射
角θを規制しつつ金属蒸気流を斜めに入射させると、金
属組織が斜め方向に成長し、磁化容易軸の向きが蒸着膜
の厚み方向に対して斜めに傾いた蒸着膜が成膜される。
このようにして成膜された蒸着膜は、磁化容易軸が蒸着
膜の厚み方向と同一な蒸着膜に比べて、長手記録用の磁
性層として良好な記録再生特性を発揮する。特に、磁化
容易軸が非磁性支持体面と約20°の角度をなすように
成膜された蒸着膜は、極めて記録再生特性に優れている
ことが実験によって確認されている。At this time, when the metal vapor flow evaporated from the vapor deposition source is made incident on the surface of the non-magnetic support 22 in a direction perpendicular to the surface, the metal structure grows in a direction perpendicular to the axis of easy magnetization in the film thickness direction. A vapor deposition film is formed. On the other hand, as shown in FIG. 2, when the metal vapor flow is obliquely incident on the surface of the non-magnetic support 22 while the incident angle θ is regulated by the shielding plate 24, the metal structure grows in an oblique direction and the magnetization is increased. A vapor deposition film in which the direction of the easy axis is inclined with respect to the thickness direction of the vapor deposition film is formed.
The vapor-deposited film thus formed exhibits excellent recording / reproducing characteristics as a magnetic layer for longitudinal recording, as compared with a vapor-deposited film whose easy axis is the same as the thickness direction of the vapor-deposited film. In particular, it has been confirmed by experiments that a vapor-deposited film formed so that the easy axis of magnetization forms an angle of about 20 ° with the surface of the non-magnetic support has excellent recording and reproducing characteristics.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、金属蒸
気流を非磁性支持体面に対して斜め方向から入射させる
と、良好な記録再生特性を発揮する磁性層が形成される
ものの、垂直方向から入射させる場合に比べて金属蒸気
流の被着効率が低く、金属組織の成長速度が遅い。この
ため、所定の厚さにまで成長させるには非磁性支持体の
走行速度を遅くしてある程度の時間をかけなければなら
ない。このため、生産効率の向上に制限があるといった
問題がある。However, when the metal vapor flow is obliquely incident on the surface of the non-magnetic support, a magnetic layer exhibiting excellent recording / reproducing characteristics is formed, but it is incident perpendicularly. Compared with the case, the deposition efficiency of the metal vapor flow is low and the growth rate of the metal structure is slow. Therefore, in order to grow to a predetermined thickness, it is necessary to slow down the running speed of the non-magnetic support and take a certain amount of time. Therefore, there is a problem that there is a limit to improvement in production efficiency.
【0007】そこで、本発明はこのような従来の実情に
鑑みて提案されたものであり、磁化容易軸が厚さ方向に
対して斜めに傾いた蒸着膜が効率良く成膜され、記録再
生特性に優れた磁気記録媒体が高い生産性をもって製造
できる磁気記録媒体の製造方法を提供することを目的と
する。Therefore, the present invention has been proposed in view of such a conventional situation, and a vapor deposition film in which the axis of easy magnetization is obliquely inclined with respect to the thickness direction is efficiently formed, and recording / reproducing characteristics are improved. An object of the present invention is to provide a method of manufacturing a magnetic recording medium, which can manufacture an excellent magnetic recording medium with high productivity.
【0008】[0008]
【課題を解決するための手段】上述の目的を達成するた
めに、本発明者らが鋭意検討を重ねた結果、蒸着を行う
に際して、非磁性支持体面に対して金属蒸気流を垂直方
向に入射させるとともに、金属蒸気気流を、非磁性支持
体面に被着するのに先行して非磁性支持体の長手方向と
平行な向きの磁界中を通過させることにより、磁化容易
軸が厚さ方向に対して斜めに傾いた蒸着膜が効率良く成
膜されるとの知見を得るに至った。In order to achieve the above-mentioned object, the inventors of the present invention have conducted extensive studies, and as a result, when performing vapor deposition, a metal vapor flow is vertically incident on the surface of a non-magnetic support. In addition, by allowing the metal vapor stream to pass through the magnetic field in a direction parallel to the longitudinal direction of the non-magnetic support prior to the deposition on the surface of the non-magnetic support, the easy axis of magnetization with respect to the thickness direction. Thus, we have come to the knowledge that a vapor-deposited film that is obliquely inclined can be efficiently formed.
【0009】本発明は、前記知見に基づいて完成された
ものであって、連続走行する非磁性支持体に対向して蒸
着源を配置し、該蒸着源から蒸発する金属蒸気流を略垂
直方向から非磁性支持体上に被着するに際し、蒸着源か
ら蒸発する金属蒸気流に非磁性支持体の長手方向と平行
な向きの磁界を印加することを特徴とするものである。The present invention has been completed on the basis of the above-mentioned findings, and a vapor deposition source is arranged so as to face a continuously running non-magnetic support, and a metal vapor flow vaporized from the vapor deposition source is directed in a substantially vertical direction. In depositing on the non-magnetic support, a magnetic field oriented parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor flow evaporated from the vapor deposition source.
【0010】また、蒸着源がCoNi合金であることを
特徴とするものである。さらに、金属蒸気流に印加する
磁界の強さが500Oe以上であることを特徴とするも
のである。The vapor deposition source is a CoNi alloy. Further, the strength of the magnetic field applied to the metal vapor flow is 500 Oe or more.
【0011】[0011]
【作用】本発明では、蒸着膜を成膜するに当たって、連
続走行する非磁性支持体に対向して蒸着源を配置し、該
蒸着源から蒸発する金属蒸気流を略垂直方向から非磁性
支持体上に被着させるとともに蒸着源から蒸発する金属
蒸気流に非磁性支持体の長手方向と平行な向きの磁界を
印加する。In the present invention, when forming a vapor deposition film, the vapor deposition source is arranged so as to face a continuously running non-magnetic support, and the metal vapor flow vaporized from the vapor deposition source is applied in a substantially vertical direction to the non-magnetic support. A magnetic field oriented parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor stream that is deposited on and vaporizes from the vapor deposition source.
【0012】連続走行する非磁性支持体に加熱蒸発した
金属蒸気流を略垂直方向から入射させると、非磁性支持
体面に金属蒸気流が効率良く被着し、金属組織が速い速
度で成長する。この非磁性支持体に金属蒸気流が被着す
るのに先行して、金属蒸気流に非磁性支持体の長手方向
と平行な向きの磁界が印加されると、金属蒸気流が凝固
する段階でこの磁界の向きに磁化されて配向し、金属組
織が斜めに傾いて成長する。したがって、磁化容易軸の
向きが厚み方向に対して斜めに傾き、記録再生特性に優
れた蒸着膜が効率良く成膜されることになる。When the vaporized metal vapor flow heated and evaporated is made to enter the continuously running non-magnetic support from a substantially vertical direction, the metal vapor flow efficiently adheres to the surface of the non-magnetic support and the metal structure grows at a high speed. Prior to the deposition of the metal vapor flow on the non-magnetic support, when a magnetic field in a direction parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor flow, the metal vapor flow is solidified. It is magnetized and oriented in the direction of this magnetic field, and the metal structure grows with an inclination. Therefore, the direction of the easy axis of magnetization tilts obliquely with respect to the thickness direction, and a vapor deposition film having excellent recording / reproducing characteristics can be efficiently formed.
【0013】[0013]
【実施例】本発明の好適な実施例について図面を参照し
ながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described with reference to the drawings.
【0014】まず、本実施例において使用される真空蒸
着装置を図1に示す。すなわち、上記蒸着装置は、内部
が高真空状態となされたチャンバー内に、巻き出しロー
ル3,巻き取りロール4,冷却キャン5よりなる走行系
と、蒸発源である金属磁性材料7が収容された坩堝6と
を収容することにより構成されている。First, a vacuum vapor deposition apparatus used in this embodiment is shown in FIG. That is, in the vapor deposition apparatus, a traveling system including an unwinding roll 3, a winding roll 4, and a cooling can 5 and a metallic magnetic material 7 serving as an evaporation source are housed in a chamber whose inside is in a high vacuum state. It is configured by accommodating a crucible 6 and the like.
【0015】上記巻き出しロール3,冷却キャン5,巻
き取りロール4には、長尺状の非磁性支持体2が順次掛
け渡され、前記巻き出しロール3より冷却キャン5側に
送り出されて最終的に前記巻き取りロール4に巻き取ら
れるようになされている。また、上記冷却キャン5の内
部には、図示しない冷却装置が設けられ、前記非磁性支
持体2の温度上昇による変形等を制御するようになされ
ている。A long non-magnetic support 2 is successively wound around the unwind roll 3, the cooling can 5 and the take-up roll 4, and is delivered from the unwind roll 3 to the cooling can 5 side to finally finish. It is designed to be wound around the winding roll 4. Further, a cooling device (not shown) is provided inside the cooling can 5 so as to control the deformation and the like of the non-magnetic support 2 due to the temperature rise.
【0016】上記坩堝6は、前記冷却キャン5の下方で
あって、該冷却キャン5の接線方向と略平行となるよう
な位置に冷却キャンに対して対向配置されている。そし
て、この坩堝6内に収容される金属磁性材料7が電子銃
等によって加熱蒸発させられ、前記冷却キャン5の外周
囲を走行する非磁性支持体2上に磁性層として被着形成
されるようになされている。The crucible 6 is disposed below the cooling can 5 and is opposed to the cooling can 5 at a position substantially parallel to the tangential direction of the cooling can 5. Then, the metallic magnetic material 7 contained in the crucible 6 is heated and evaporated by an electron gun or the like, and is deposited and formed as a magnetic layer on the non-magnetic support 2 traveling around the outer periphery of the cooling can 5. Has been done.
【0017】また、上記冷却キャン5と坩堝6の間に
は、前記金属磁性材料7の加熱蒸発による金属蒸気流を
遮蔽する遮蔽板8が配設されている。上記遮蔽板8は、
金属蒸気流が前記非磁性支持体2に対して所定角度範囲
で蒸着されるように当該非磁性支持体2の所定範囲を覆
うものである。Between the cooling can 5 and the crucible 6 is provided a shield plate 8 for shielding the metal vapor flow due to the heating and evaporation of the metal magnetic material 7. The shielding plate 8 is
It covers a predetermined range of the non-magnetic support 2 so that the metal vapor flow is deposited on the non-magnetic support 2 within a predetermined angle range.
【0018】そして、さらに上記蒸着装置においては、
遮蔽板8と冷却キャン5の間に一対のコイル9が配さ
れ、この遮蔽板8と冷却キャン5の間に非磁性支持体2
の長手方向と平行な向きの磁界が形成されるようになさ
れている。これら一対のコイル9は、遮蔽板8の開口部
を通過した金属蒸気流を、非磁性支持体2に到達する前
に非磁性支持体2の長手方向に対して平行な向きに磁
化,配向させるためのものである。Further, in the above vapor deposition apparatus,
A pair of coils 9 are arranged between the shielding plate 8 and the cooling can 5, and the non-magnetic support 2 is arranged between the shielding plate 8 and the cooling can 5.
The magnetic field is formed in a direction parallel to the longitudinal direction of the. The pair of coils 9 magnetize and orient the metal vapor flow passing through the opening of the shield plate 8 in a direction parallel to the longitudinal direction of the non-magnetic support 2 before reaching the non-magnetic support 2. It is for.
【0019】このように構成された蒸着装置を用いて非
磁性支持体2上に蒸着膜を形成するには、先ずチャンバ
ー内を真空状態とした後、巻き出しロール3側から巻き
取りロール4側に亘って非磁性支持体2を走行させる。
そして、電子銃等によって坩堝6内の金属磁性材料7を
加熱蒸発させる。加熱蒸発した金属蒸気流のうち遮蔽板
8の開口部を通過した金属蒸気流は、遮蔽板8と冷却キ
ャン5の間に配設された一対のコイル9によって形成さ
れた磁界中を通過する。これにより、金属蒸気流は磁化
され、その後、非磁性支持体2上に垂直方向に入射して
被着し、蒸着膜が形成される。In order to form a vapor deposition film on the non-magnetic support 2 by using the vapor deposition apparatus constructed as above, first the inside of the chamber is evacuated and then the unwinding roll 3 side to the winding roll 4 side. The non-magnetic support 2 is caused to travel over the entire length.
Then, the metal magnetic material 7 in the crucible 6 is heated and evaporated by an electron gun or the like. Of the heated and evaporated metal vapor flow, the metal vapor flow that has passed through the opening of the shield plate 8 passes through the magnetic field formed by the pair of coils 9 arranged between the shield plate 8 and the cooling can 5. As a result, the metal vapor flow is magnetized, and then vertically incident on and deposited on the non-magnetic support 2 to form a vapor deposition film.
【0020】このとき、上記金属蒸気流は非磁性支持体
2面に対して垂直方向に入射するので非磁性支持体2面
に効率良く被着し、金属組織が速い成長速度で成長す
る。また、この被着する金属蒸気流は非磁性支持体の長
手方向に対して平行な向きに磁化され配向しており、金
属組織は斜めに傾いて成長する。したがって、磁化容易
軸が膜厚方向に対して斜めに傾き、記録再生特性に優れ
た蒸着膜が効率良く成膜されることになる。At this time, since the metal vapor flow is incident on the surface of the non-magnetic support 2 in a direction perpendicular thereto, the metal vapor is efficiently deposited on the surface of the non-magnetic support 2 and the metal structure grows at a high growth rate. Further, the deposited metal vapor flow is magnetized and oriented in a direction parallel to the longitudinal direction of the non-magnetic support, and the metal structure grows obliquely. Therefore, the axis of easy magnetization is obliquely inclined with respect to the film thickness direction, and the vapor deposition film having excellent recording and reproducing characteristics can be efficiently formed.
【0021】なお、記録再生特性がより優れたものとす
るには、蒸着膜の磁化容易軸が非磁性支持体面に対して
約20°傾くように蒸着膜を成膜することが好ましい。
蒸着膜の磁化容易軸は、例えばコイルより発生する磁界
の大きさを制御することによって調整することができ、
この磁界の大きさを500Oe以上とすることによって
磁化容易軸が非磁性支持体面と約20°の角度をなす蒸
着膜が形成できる。In order to improve the recording / reproducing characteristics, it is preferable to form the vapor deposition film so that the easy axis of magnetization of the vapor deposition film is inclined by about 20 ° with respect to the surface of the non-magnetic support.
The easy axis of magnetization of the deposited film can be adjusted by controlling the magnitude of the magnetic field generated by the coil,
By setting the magnitude of this magnetic field to be 500 Oe or more, a vapor deposition film can be formed in which the easy axis of magnetization makes an angle of about 20 ° with the surface of the non-magnetic support.
【0022】また、上記蒸着装置によって斜方蒸着する
金属材料としては、通常この主の媒体で使用されるもの
がいずれも使用可能である。例示すれば、Co−Ni合
金の他、Co−Pt合金,Co−Ni−Pt合金,Fe
−Co合金,Fe−Ni合金,Fe−Co−Ni合金,
Fe−Co−B合金,Co−Ni−Fe−B合金等が使
用可能である。As the metal material obliquely vapor-deposited by the vapor deposition apparatus, any of those usually used in the main medium can be used. For example, in addition to Co—Ni alloys, Co—Pt alloys, Co—Ni—Pt alloys, Fe
-Co alloy, Fe-Ni alloy, Fe-Co-Ni alloy,
Fe-Co-B alloy, Co-Ni-Fe-B alloy, etc. can be used.
【0023】蒸着膜が成膜される非磁性支持体として
は、やはりこの種の媒体で通常使用されるものが使用で
き、例えばポリエチレンテレフタレート(PET)フィ
ルム,ポリエチレン−2,6−ナフタレート等のポリエ
ステルフィルムや芳香族ポリアミドフィルム,ポリイミ
ド樹脂フィルム等が挙げられる。As the non-magnetic support on which the vapor-deposited film is formed, those normally used in this type of medium can be used, for example, polyethylene terephthalate (PET) film, polyester such as polyethylene-2,6-naphthalate. Examples thereof include films, aromatic polyamide films, polyimide resin films and the like.
【0024】次に、実際に上記蒸着装置を用いて磁気テ
ープを作製し、磁気特性,記録再生特性を調べた。Next, a magnetic tape was actually manufactured using the above vapor deposition apparatus, and its magnetic characteristics and recording / reproducing characteristics were examined.
【0025】実験例1〜実験例4 先ず、上記蒸着装置の坩堝6内にCo−Ni系合金を収
容するとともに巻き出しロール3,冷却キャン5,巻き
取りロール4に亘って非磁性支持体2となるポリエチレ
ンテフレタレート(PET)フィルムを巻回した。そし
て、上記チャンバー内を10-9気圧となるまで排気した
後、コイルに電流を供給して所定の大きさの磁界を発生
させるとともに坩堝6内に載置したCo−Ni系合金を
電子ビームで加熱溶解して蒸発させ、PETフィルム上
に被着させることで膜厚200nmの蒸着膜を成膜し
た。 Experimental Example 1 to Experimental Example 4 First, the non-magnetic support 2 is housed in the crucible 6 of the above-mentioned vapor deposition apparatus while the Co--Ni type alloy is accommodated and the unwinding roll 3, the cooling can 5 and the winding roll 4 are covered. A polyethylene terephthalate (PET) film was wound. Then, after exhausting the inside of the chamber to 10 −9 atm, a current is supplied to the coil to generate a magnetic field of a predetermined magnitude, and the Co—Ni-based alloy placed in the crucible 6 is irradiated with an electron beam. A 200-nm-thick vapor deposition film was formed by heating, melting and evaporating, and depositing on a PET film.
【0026】なお、このとき蒸着源を加熱蒸発させるた
めの電子ビームに供給する電流は、1.0Aに設定し
た。上記蒸着装置では、ビーム電流をこのように設定し
たときには、非磁性支持体の送り速度を30m/分とす
ることにより膜厚200nmの蒸着膜が成膜される。ま
た、コイルより発生させた磁界の大きさは表1に示す通
りである。At this time, the current supplied to the electron beam for heating and vaporizing the vapor deposition source was set to 1.0 A. In the above vapor deposition apparatus, when the beam current is set in this way, a vapor deposition film having a film thickness of 200 nm is formed by setting the feeding speed of the nonmagnetic support to 30 m / min. The magnitude of the magnetic field generated by the coil is shown in Table 1.
【0027】以上のようにして蒸着膜が成膜された非磁
性支持体を所定のテープ幅に裁断して磁気テープを作製
した。The non-magnetic support on which the vapor deposition film was formed as described above was cut into a predetermined tape width to prepare a magnetic tape.
【0028】実験例5 蒸着源から発生する金属蒸気流を非磁性支持体面に対し
て斜めに入射させる斜方型の蒸着装置を用いて非磁性支
持体上に膜厚200nmのCo−Ni系合金よりなる蒸
着膜を成膜した。そして蒸着膜が成膜された非磁性支持
体を所定のテープ幅に裁断して磁気テープを作製した。 Experimental Example 5 A Co-Ni alloy having a film thickness of 200 nm was formed on a non-magnetic support by using an orthorhombic vapor deposition apparatus in which a metal vapor flow generated from a vapor deposition source was obliquely incident on the surface of the non-magnetic support. Was formed into a vapor deposition film. Then, the non-magnetic support on which the vapor deposition film was formed was cut into a predetermined tape width to prepare a magnetic tape.
【0029】なお、蒸着源を加熱蒸発させるための電子
ビームに供給する電流は、1.0Aに設定した。上記斜
方型の蒸着装置では、ビーム電流をこのように設定した
としたきには、非磁性支持体の送り速度を7m/分に設
定することにより、膜厚200nmの蒸着膜が成膜され
る。The current supplied to the electron beam for heating and vaporizing the vapor deposition source was set to 1.0A. In the above-mentioned orthorhombic vapor deposition apparatus, if the beam current is set in this way, the feed rate of the non-magnetic support is set to 7 m / min to form a 200 nm-thick vapor deposition film. It
【0030】以上のようにして作製された各磁気テープ
について、磁化容易軸,保磁力,再生出力を測定した。
その結果を蒸着膜の成膜に際して設定した冷却キャンと
シャッターの間に発生させる磁界の大きさ,非磁性支持
体の走行速度と併せて表1に示す。The magnetic easy axis, the coercive force, and the reproduction output of each magnetic tape produced as described above were measured.
The results are shown in Table 1 together with the magnitude of the magnetic field generated between the cooling can and the shutter set during the deposition of the deposited film and the traveling speed of the non-magnetic support.
【0031】なお、表1中、磁化容易軸方向は、非磁性
支持体面と磁化容易軸のなす角度を試料振動型磁力計に
て測定したものである。また、再生出力は、ハイバンド
8ミリビデオデッキ(ソニー社製,商品名EVS−90
0改造機)を用い、相対速度3.8m/秒、記録周波数
7MHzの条件で、再生時に7MHz信号として再生さ
れた信号の出力を再生出力として測定したものである。
なお、再生出力の測定に際して、各磁気テープに記録を
行うための記録電流は再生出力が最も高くなるときの値
に設定した。In Table 1, the direction of the easy axis of magnetization is the angle between the surface of the non-magnetic support and the easy axis of magnetization measured by a sample vibrating magnetometer. Also, the playback output is a high-band 8 mm video deck (manufactured by Sony Corporation, trade name EVS-90.
0 remodeling machine), the output of a signal reproduced as a 7 MHz signal during reproduction was measured as a reproduction output under the conditions of a relative speed of 3.8 m / sec and a recording frequency of 7 MHz.
When measuring the reproduction output, the recording current for recording on each magnetic tape was set to a value at which the reproduction output was the highest.
【0032】[0032]
【表1】 [Table 1]
【0033】表1において、まず、蒸着を非磁性支持体
面に対して略垂直方向から行った実験例1〜実験例4と
蒸着を非磁性支持体面に対して斜め方向から行った実験
例5の磁気テープとを、蒸着に際する非磁性支持体の走
行速度について比較すると、膜厚200nmの蒸着膜を
成膜するには実験例5では非磁性支持体の走行速度を7
m/分と遅く設定しなければならなかったのに対して、
実験例1〜実験例4では非磁性支持体の走行速度を実験
例5の場合の約4倍に相当する30m/分と速く設定す
ることができる。このことから、蒸着膜を効率良く成膜
するには、蒸着は非磁性支持体面に対して垂直方向から
行う方が有利であることがわかる。In Table 1, first, Experimental Examples 1 to 4 in which vapor deposition was performed in a direction substantially perpendicular to the surface of the non-magnetic support and Experimental Example 5 in which vapor deposition was performed in a direction oblique to the surface of the non-magnetic support. Comparing the magnetic tape and the running speed of the non-magnetic support during vapor deposition, in Experimental Example 5, the running speed of the non-magnetic support was set to 7 in order to form a vapor deposition film having a thickness of 200 nm.
Whereas I had to set it slower to m / min,
In Experimental Example 1 to Experimental Example 4, the traveling speed of the non-magnetic support can be set as high as 30 m / min, which is about four times that in Experimental Example 5. From this, it is understood that it is more advantageous to perform vapor deposition in the direction perpendicular to the surface of the non-magnetic support in order to efficiently form the vapor deposited film.
【0034】次に、蒸着を非磁性支持体面に対して略垂
直方向から行った実験例1〜実験例4を、印加磁界の大
きさ,磁化容易軸,保磁力,再生出力について比較する
と、磁化容易軸,保磁力,再生出力は、蒸着に際して金
属蒸気流に印加した磁界の大きさによって変化すること
がわかる。すなわち、金属蒸気流に全く磁界を印加しな
い場合(実験例1)には、蒸着膜の磁化容易軸が非磁性
支持体面に対して垂直であり、保磁力,再生出力が小さ
い値を示す。そして、金属蒸気流に印加する磁界の大き
さが大きい場合程、蒸着膜の磁化容易軸が垂直から斜め
に傾き、それに伴って保磁力,再生出力が高い値とな
る。特に、金属蒸気流に1000Oeの磁界を印加した
場合(実験例4)には、斜めから蒸着を行った場合と同
等の保磁力,再生出力が得られる。Next, comparing Experiment Example 1 to Experiment Example 4 in which vapor deposition was performed in a direction substantially perpendicular to the surface of the non-magnetic support with respect to the magnitude of the applied magnetic field, the easy axis of magnetization, the coercive force, and the reproduction output, It can be seen that the easy axis, the coercive force, and the reproduction output change depending on the magnitude of the magnetic field applied to the metal vapor flow during vapor deposition. That is, when no magnetic field is applied to the metal vapor flow (Experimental Example 1), the axis of easy magnetization of the deposited film is perpendicular to the surface of the non-magnetic support, and the coercive force and the reproduction output show small values. When the magnitude of the magnetic field applied to the metal vapor flow is larger, the axis of easy magnetization of the vapor deposition film is inclined from the vertical to obliquely, and the coercive force and the reproduction output become higher accordingly. In particular, when a magnetic field of 1000 Oe is applied to the metal vapor flow (Experimental Example 4), a coercive force and a reproduction output equivalent to those obtained when vapor deposition is performed obliquely are obtained.
【0035】以上のことから、蒸着を垂直方向から行う
場合でも、金属蒸気流に非磁性支持体の長手方向と平行
な磁界を印加すれば、磁化容易軸が厚さ方向に対して斜
めに傾いた蒸着膜が形成でき、記録再生特性に優れた磁
気記録媒体が高い生産性をもって製造することが可能と
なることがわかった。From the above, even when vapor deposition is performed in the vertical direction, the easy axis of magnetization tilts obliquely with respect to the thickness direction when a magnetic field parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor flow. It has been found that a vapor-deposited film can be formed and a magnetic recording medium having excellent recording and reproducing characteristics can be manufactured with high productivity.
【0036】[0036]
【発明の効果】以上の説明からも明らかなように、本発
明の磁気記録媒体の製造方法では、連続走行する非磁性
支持体に対向して蒸着源を配置し、該蒸着源から蒸発す
る金属蒸気流を略垂直方向から非磁性支持体上に被着す
るに際し、蒸着源から蒸発する金属蒸気流に非磁性支持
体の長手方向と平行な向きの磁界を印加するので、磁化
容易軸が斜めに傾いた蒸着膜が効率良く成膜され、記録
再生特性に優れた磁気記録媒体を高い生産性をもって製
造することが可能である。As is apparent from the above description, in the method of manufacturing a magnetic recording medium of the present invention, a vapor deposition source is arranged so as to face a continuously running non-magnetic support, and a metal vaporized from the vapor source is disposed. When depositing a vapor stream on a non-magnetic support from a substantially vertical direction, a magnetic field in a direction parallel to the longitudinal direction of the non-magnetic support is applied to the metal vapor stream evaporated from the evaporation source, so that the easy axis of magnetization is oblique. It is possible to efficiently form a vapor-deposited film that is tilted toward and to manufacture a magnetic recording medium having excellent recording and reproducing characteristics with high productivity.
【図1】従来の蒸着装置の構成を示す模式図である。FIG. 1 is a schematic diagram showing a configuration of a conventional vapor deposition device.
【図2】本発明を適用した蒸着装置の一構成例を示す模
式図である。FIG. 2 is a schematic diagram showing a configuration example of a vapor deposition device to which the present invention is applied.
2・・・非磁性支持体 5・・・冷却キャン 7・・・蒸着源 8・・・遮蔽板 9・・・コイル 2 ... Non-magnetic support 5 ... Cooling can 7 ... Evaporation source 8 ... Shielding plate 9 ... Coil
Claims (3)
着源を配置し、該蒸着源から蒸発する金属蒸気流を略垂
直方向から非磁性支持体上に被着するに際し、蒸着源か
ら蒸発する金属蒸気流に非磁性支持体の長手方向と平行
な向きの磁界を印加することを特徴とする磁気記録媒体
の製造方法。1. A vapor deposition source is arranged so as to face a continuously running non-magnetic support, and a metal vapor flow vaporized from the vapor deposition source is applied from the vapor deposition source to the non-magnetic support in a substantially vertical direction. A method for manufacturing a magnetic recording medium, which comprises applying a magnetic field in a direction parallel to a longitudinal direction of a non-magnetic support to a vaporized metal vapor flow.
とする請求項1記載の磁気記録媒体の製造方法。2. The method of manufacturing a magnetic recording medium according to claim 1, wherein the vapor deposition source is a CoNi alloy.
0Oe以上であることを特徴とする請求項1記載の磁気
記録媒体の製造方法。3. The strength of the magnetic field applied to the metal vapor flow is 50.
The method of manufacturing a magnetic recording medium according to claim 1, wherein the magnetic recording medium is 0 Oe or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18331693A JPH0721560A (en) | 1993-06-30 | 1993-06-30 | Method of manufacturing magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18331693A JPH0721560A (en) | 1993-06-30 | 1993-06-30 | Method of manufacturing magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0721560A true JPH0721560A (en) | 1995-01-24 |
Family
ID=16133570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18331693A Withdrawn JPH0721560A (en) | 1993-06-30 | 1993-06-30 | Method of manufacturing magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0721560A (en) |
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1993
- 1993-06-30 JP JP18331693A patent/JPH0721560A/en not_active Withdrawn
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| US6429430B2 (en) | 1998-06-18 | 2002-08-06 | Hamamatsu Photonics K.K. | Scintillator panel, radiation image sensor, and methods of making the same |
| US6531225B1 (en) | 1998-06-18 | 2003-03-11 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
| US7034306B2 (en) | 1998-06-18 | 2006-04-25 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
| US6849336B2 (en) | 1998-06-18 | 2005-02-01 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
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| US7705315B2 (en) | 1998-06-18 | 2010-04-27 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
| US6469307B2 (en) | 1998-06-18 | 2002-10-22 | Hamamatsu Photonics K.K. | Scintillator panel, radiation image sensor, and methods of making the same |
| US6469305B2 (en) | 1998-06-19 | 2002-10-22 | Hamamatsu Photonics K.K. | Radiation image sensor |
| US6753531B2 (en) | 1999-04-09 | 2004-06-22 | Hamamatsu Photonics K.K. | Scintillator panel and radiation image sensor |
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| US9557424B2 (en) | 2013-02-28 | 2017-01-31 | Konica Minolta, Inc. | Deposition substrate and scintillator panel |
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