JPH07233461A - Method for producing stainless steel sheet with excellent corrosion resistance - Google Patents
Method for producing stainless steel sheet with excellent corrosion resistanceInfo
- Publication number
- JPH07233461A JPH07233461A JP2573294A JP2573294A JPH07233461A JP H07233461 A JPH07233461 A JP H07233461A JP 2573294 A JP2573294 A JP 2573294A JP 2573294 A JP2573294 A JP 2573294A JP H07233461 A JPH07233461 A JP H07233461A
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- JP
- Japan
- Prior art keywords
- stainless steel
- nitrogen
- steel sheet
- corrosion resistance
- steel plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ステンレス鋼板表面の
耐食性を向上することにより、高耐候性が要求される建
築材等へ応用分野が拡大する極めて利用価値の高いステ
ンレス鋼板の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a stainless steel sheet having an extremely high utility value, which has an expanded field of application to building materials and the like requiring high weather resistance by improving the corrosion resistance of the surface of the stainless steel sheet. Is.
【０００２】[0002]
【従来の技術】ステンレス鋼板の代表的なものとして
は、Ｆｅ−Ｃｒを主成分とするフェライト系のＳＵＳ４
３０鋼板やＦｅ−Ｃｒ−Ｎｉを主成分とするオーステナ
イト系のＳＵＳ３０４鋼板がある。これらのステンレス
鋼板はその表面に酸化クロムを主成分とする不動態皮膜
を形成することにより、通常の鉄鋼材料に比べて高耐食
性を示すことが知られている。従って、ステンレス鋼板
は、耐食性を要求される、建築物の各種外装材や流し
台、風呂桶等の調度品、あるいはナイフ、フォーク等の
家庭用品にと幅広く用いられている。2. Description of the Related Art A typical stainless steel plate is a ferrite SUS4 containing Fe-Cr as a main component.
There are 30 steel plates and an austenitic SUS304 steel plate containing Fe-Cr-Ni as a main component. It is known that these stainless steel sheets exhibit higher corrosion resistance than ordinary steel materials by forming a passivation film containing chromium oxide as a main component on the surface thereof. Therefore, stainless steel sheets are widely used for various exterior materials for buildings, furniture such as sinks and bath tubs, and household products such as knives and forks, which require corrosion resistance.
【０００３】特に、最近は建材に使用される例が増加し
てきている。建材は、風雨や湿度サイクル等の過酷な条
件下にさらされており、より高い耐食性が要求される。
この用途に光輝焼鈍されたステンレス鋼板が用いられる
のは、酸洗や研磨仕上げ等を施された材料に見られる厚
い酸化スケールの生成が防止されているとともに、より
耐食性に優れた表面不動態皮膜が形成されているからで
ある。しかしながら、用途の拡大に伴い、上記の光輝焼
鈍されたステンレス鋼板においても錆の発生が問題とな
る過酷な環境での使用例がしばしば見受けられるように
なってきた。さらに、ユーザーの耐食性に対する要求は
厳しくなってきており、ステンレス鋼板のより一層の高
耐食性化が求められてきている。Particularly, recently, the number of examples used for building materials has been increasing. Building materials are exposed to harsh conditions such as wind and rain and humidity cycles, and higher corrosion resistance is required.
The brightly annealed stainless steel plate is used for this purpose because it prevents the formation of thick oxide scales found in materials that have been pickled and polished, and has a more excellent corrosion resistance. Is formed. However, with the expansion of applications, examples of use in the harsh environment in which rust is a problem is often found in the brightly annealed stainless steel sheets. In addition, users' demands for corrosion resistance are becoming stricter, and further higher corrosion resistance of stainless steel sheets is required.
【０００４】ステンレス鋼板の耐食性向上方法として
は、例えば、化学気相蒸着法により、ＳｉＯ2 薄膜やＳ
ｉ3 Ｎ4 薄膜等の化合物皮膜を形成する方法が知られて
いる（例えば、宮本靖史：“プラズマ気相蒸着法による
ステンレス表面改質”，熱プラズマ部会報告書，日本鉄
鋼協会編（１９９３））。これは適当な前処理を行った
ステンレス鋼板の表面に前記化合物の薄膜を厚さ約２０
０nm程度堆積させ、ステンレス鋼板と外界環境とが直接
接触することを防御しようとするものである。As a method for improving the corrosion resistance of a stainless steel sheet, for example, a chemical vapor deposition method is used to form a SiO 2 thin film or S.
A method for forming a compound film such as an i 3 N 4 thin film is known (for example, Yasufumi Miyamoto: “Stainless steel surface modification by plasma vapor deposition method”, thermal plasma subcommittee report, edited by the Iron and Steel Institute of Japan (1993). ). This is a thin film of the above compound with a thickness of about 20
It is intended to prevent the direct contact between the stainless steel plate and the external environment by depositing about 0 nm.
【０００５】すなわち、この技術ではステンレス鋼の表
面を前記化合物薄膜で完全に覆うことが必須である。も
しも前記薄膜に穴のあいた部分や割れのような微細な欠
陥が存在すると、これらの欠陥から内部に向かって腐食
が進行するために、もはや高耐食特性発現用皮膜として
の機能を発揮しない。前記欠陥の全く存在しない無欠陥
薄膜を実用材料上に形成することは実際上困難であるの
で、しばしば化合物薄膜被覆ステンレス鋼板の一部が部
分的に腐食してしまうという問題点がある。また、前記
薄膜とステンレス鋼板との密着性が十分ではない場合も
多く、ステンレス鋼板の使用中にしばしば前記薄膜が自
然剥離して、そこから腐食が進行するという問題点もあ
る。以上のように化合物薄膜被覆ステンレス鋼板は材料
としての信頼性に問題があり、その改善が必要となって
いる。That is, in this technique, it is essential to completely cover the surface of stainless steel with the compound thin film. If fine defects such as holes and cracks are present in the thin film, corrosion progresses inward from these defects, and the thin film no longer functions as a film for exhibiting high corrosion resistance. Since it is practically difficult to form a defect-free thin film having no defects on a practical material, there is often a problem that a part of the compound thin film-coated stainless steel plate is partially corroded. In addition, the adhesion between the thin film and the stainless steel plate is often insufficient, and the thin film often spontaneously peels off during use of the stainless steel plate, and there is a problem that corrosion progresses from there. As described above, the compound thin film-coated stainless steel sheet has a problem in reliability as a material, and its improvement is required.
【０００６】[0006]
【発明が解決しようとする課題】本発明はかかる現状に
鑑み、化合物薄膜の完全被覆によらずに、高耐食化した
ステンレス鋼板の製造方法を提供することを目的とす
る。SUMMARY OF THE INVENTION In view of the above situation, it is an object of the present invention to provide a method for producing a stainless steel sheet having a high corrosion resistance, without depending on the complete coating of the compound thin film.
【０００７】[0007]
【課題を解決するための手段】従来、厳しい耐食性環境
で使用されるステンレス鋼板は、表面の耐食性を確保す
るために、塗料を塗布するか、ステンレス鋼板に耐食性
に有効な成分を合金組成として含有させる等の方法が一
般的である。発明者らは、窒化クロムの島状分布がステ
ンレス表面の耐食性を向上させるという本発明者らの知
見に基づき（特願平５−２４３２７３号）、窒素と水素
を含む混合ガスをプラズマ化し、水素と窒素ガスの混合
比、プラズマ化電力、ステンレス鋼板に印加するバイア
スならびにステンレス鋼板温度等の窒化条件とステンレ
ス鋼板の表面窒素量、およびその腐食特性との関連につ
いて種々の実験を試みた。[Means for Solving the Problems] Conventionally, stainless steel sheets used in a severe corrosion resistance environment are coated with a paint or the stainless steel sheets contain a component effective for corrosion resistance as an alloy composition in order to secure the surface corrosion resistance. Generally, the method of making it do so. Based on the findings of the present inventors that the island-shaped distribution of chromium nitride improves the corrosion resistance of the stainless steel surface (Japanese Patent Application No. 5-243273), the mixed gas containing nitrogen and hydrogen is converted into plasma and hydrogen. Various experiments were conducted on the relationship between the nitriding conditions such as the mixture ratio of nitrogen gas and nitrogen gas, the plasma power, the bias applied to the stainless steel sheet and the temperature of the stainless steel sheet, the surface nitrogen content of the stainless steel sheet, and its corrosion characteristics.
【０００８】その結果、窒素および水素をプラズマ化す
るとともに、ステンレス鋼板を所望の温度に加熱しステ
ンレス鋼板にマイナスのバイアスを印加し、ステンレス
鋼板表面に窒素を富化することにより、耐食性に優れた
ステンレス鋼板が得られることを見いだした。なお、本
発明において対象とされるステンレス鋼は、その化学成
分を特に限定されるものではない。フェライト系ステン
レス鋼、オーステナイト系ステンレス鋼、フェライト、
オーステナイト２相ステンレス鋼等あらゆる鋼種を対象
とすることができる。As a result, the corrosion resistance was excellent by converting nitrogen and hydrogen into plasma, heating the stainless steel plate to a desired temperature, applying a negative bias to the stainless steel plate, and enriching the surface of the stainless steel plate with nitrogen. It has been found that a stainless steel plate can be obtained. The chemical composition of the stainless steel targeted by the present invention is not particularly limited. Ferritic stainless steel, austenitic stainless steel, ferrite,
All types of steel such as austenitic duplex stainless steel can be targeted.
【０００９】以下、本発明の製造方法について詳細に説
明する。まず、本発明の装置の基本構成について述べ
る。図１に本発明の装置の基本構成を示す。図中１は所
望の圧力に調節可能な密閉容器、２−ａ，ｂはガスをプ
ラズマ化させる放電用電極、３はＮ化されるステンレス
鋼板、４は密閉容器から電気的に独立した電極、５はス
テンレス鋼板３と電極４に印加するバイアス用の直流電
源、６はプラズマ発生用電源、７−ａ，ｂはステンレス
鋼板３を所望の温度に制御する加熱制御機構、８は窒素
を含むガス流入口、９はガスの流量、組成を調節する制
御機構、１０はガス流出口、１１は密閉容器のガスを排
気し、かつ密閉容器内の圧力を所望の圧力に調節する機
構を示す。１２は密閉容器のリークバルブを示す。The manufacturing method of the present invention will be described in detail below. First, the basic configuration of the device of the present invention will be described. FIG. 1 shows the basic configuration of the device of the present invention. In the figure, 1 is a closed container that can be adjusted to a desired pressure, 2-a and b are discharge electrodes for converting gas into plasma, 3 is a stainless steel plate to be N-ized, 4 is an electrode electrically independent from the closed container, 5 is a DC power supply for bias applied to the stainless steel plate 3 and the electrode 4, 6 is a power supply for plasma generation, 7-a and 7-b are heating control mechanisms for controlling the stainless steel plate 3 to a desired temperature, and 8 is a gas containing nitrogen. An inlet, 9 is a control mechanism for adjusting the flow rate and composition of gas, 10 is a gas outlet, and 11 is a mechanism for exhausting the gas in the closed container and adjusting the pressure in the closed container to a desired pressure. Reference numeral 12 represents a leak valve of a closed container.
【００１０】次に、本発明の装置によるステンレス鋼板
表面に窒素富化層を形成させる手順について説明する。
まず、窒化するステンレス鋼板３を設置した後、ガス流
入口８を閉じ、１１により密閉容器内のガスを排気す
る。密閉容器内の真空度が所望の圧力に到達した後、９
を制御し、窒素を含む所望の組成、流量をガス流入口８
を開き、密閉容器内に流入させ、１１を制御し密閉容器
内の圧力を所望の圧力とする。密閉容器内を排気し到達
させる真空度は、ロータリーポンプで容易に到達する１
０-3Torrよりも高い真空度であれば良い。また、窒素富
化処理時の容器内圧力は０．５Torr以上、１０Torr以下
であれば良い。全圧力が０．５Torr以下では窒素富化表
面に損傷が発生し、１０Torr以上では窒素富化速度が著
しく低下する。水素／窒素圧力比は、０．５以上で５．
０以下が良い。また、水素／窒素圧力比が０．５以下で
は酸化反応が、５．０以上では脱窒反応が優先し、窒化
富化反応が抑制される。Next, the procedure for forming the nitrogen-enriched layer on the surface of the stainless steel plate by the apparatus of the present invention will be described.
First, after the stainless steel plate 3 to be nitrided is installed, the gas inlet 8 is closed and the gas in the closed container is exhausted by 11. After the degree of vacuum in the closed container reaches the desired pressure,
To control the desired composition including nitrogen and the flow rate to the gas inlet 8
Is opened and allowed to flow into the closed container, and 11 is controlled to set the pressure inside the closed container to a desired pressure. The degree of vacuum that can be exhausted and reached in a closed container is easily reached with a rotary pump. 1
A vacuum degree higher than 0 -3 Torr is sufficient. The pressure in the container during the nitrogen enrichment treatment may be 0.5 Torr or more and 10 Torr or less. When the total pressure is 0.5 Torr or less, the nitrogen-enriched surface is damaged, and when it is 10 Torr or more, the nitrogen-enriching rate is remarkably reduced. The hydrogen / nitrogen pressure ratio is 0.5 or more and 5.
0 or less is good. When the hydrogen / nitrogen pressure ratio is 0.5 or less, the oxidation reaction has priority, and when the hydrogen / nitrogen pressure ratio is 5.0 or more, the denitrification reaction has priority, and the nitriding enrichment reaction is suppressed.
【００１１】次に、加熱制御機構７を用いて窒化するス
テンレス鋼板３を所望の温度に加熱する。加熱温度は、
３００℃以上、６００℃以下が良い。窒素富化は常温に
おいても生じるが、窒素富化量が少なく窒素富化による
改善効果が低い。また、高い温度ではステンレス鋼板表
面での元素との反応が活発となり窒素富化反応ととも
に、水素による脱窒素、および密閉容器内の残留酸素に
よる酸化反応も活発となり、窒素富化効果が低下する。
加熱温度に保定した後、電極２−ａ，ｂ間に６の電流を
用いて所望の電力を与え、プラズマを発生させる。Next, the stainless steel plate 3 to be nitrided is heated to a desired temperature by using the heating control mechanism 7. The heating temperature is
The temperature is preferably 300 ° C or higher and 600 ° C or lower. Nitrogen enrichment occurs even at room temperature, but the amount of nitrogen enrichment is small and the effect of improvement by nitrogen enrichment is low. Further, at a high temperature, the reaction with the element on the surface of the stainless steel plate becomes active and the nitrogen enrichment reaction becomes active, as well as the denitrification by hydrogen and the oxidation reaction by the residual oxygen in the closed container become active, and the nitrogen enrichment effect decreases.
After holding at the heating temperature, a desired electric power is applied between the electrodes 2-a and b by using a current of 6 to generate plasma.
【００１２】プラズマ化電力は、５（Ｗ／cm2 ）以上、
５０（Ｗ／cm2 ）以下が良い。５（Ｗ／cm2 ）以下で
は、窒素富化反応に必要なガス電離が十分でなく窒素富
化効果が低い。５０（Ｗ／cm2 ）以上では窒素富化表面
に損傷を与える。同時に、ステンレス鋼板３と電極４に
ステンレス鋼板をマイナスとする直流電圧を印加する。Plasmaizing power is 5 (W / cm 2 ) or more,
50 (W / cm 2 ) or less is preferable. When it is 5 (W / cm 2 ) or less, the gas ionization necessary for the nitrogen enrichment reaction is not sufficient and the nitrogen enrichment effect is low. Above 50 (W / cm 2 ), the nitrogen-rich surface is damaged. At the same time, a DC voltage that makes the stainless steel plate negative is applied to the stainless steel plate 3 and the electrode 4.
【００１３】サンプルに印加するバイアスは、マイナス
で、かつその値は、５Ｖ以上、１００Ｖ以下が良い。サ
ンプルに印加する極性は、プラズマ窒素がプラスに電離
することから、サンプルにマイナスの極性を与えること
により、活性化したプラズマ窒素をサンプル表面への引
き寄せを促進させる。バイアスがマイナス５Ｖ以下では
引き寄せ効果が小さく窒素富化効果が低い。１００Ｖ以
上では、窒素富化表面を損傷させる。所望の時間保定の
後、プラズマ電源をＯＦＦ、加熱電源をＯＦＦ、バイア
ス電源をＯＦＦとし、ステンレス鋼板の温度が十分低下
した後、流入口、流出口を閉じ、リークバルブ１２を開
き密閉容器内を大気圧とし、密閉容器内からステンレス
鋼板を取り出す。The bias applied to the sample is negative, and its value is preferably 5 V or more and 100 V or less. The polarity applied to the sample promotes the attraction of the activated plasma nitrogen to the sample surface by giving the sample a negative polarity because the plasma nitrogen ionizes positively. When the bias is -5 V or less, the attracting effect is small and the nitrogen enriching effect is low. Above 100V, it damages the nitrogen-rich surface. After holding for a desired time, the plasma power supply is turned off, the heating power supply is turned off, the bias power supply is turned off, and after the temperature of the stainless steel plate is sufficiently lowered, the inlet and the outlet are closed, the leak valve 12 is opened, and the inside of the closed container is closed. Atmospheric pressure is set and the stainless steel plate is taken out from the closed container.
【００１４】[0014]
【作用】本発明により、ステンレス鋼表面に窒素富化層
を形成することにより、高耐食性を有するステンレス鋼
板を製造することが可能となった。According to the present invention, it becomes possible to manufacture a stainless steel plate having high corrosion resistance by forming a nitrogen-enriched layer on the surface of stainless steel.
【００１５】[0015]
【実施例】図１に示す本発明の基本構成を有する装置を
用い、ＳＵＳ３０４光輝焼鈍板をステンレス鋼板として
用い、それに窒素富化し、その鋼板表面の耐食性を孔食
電位で評価した実施例について説明する。また、窒素富
化に用いたガス組成は、窒素と水素の二種混合ガスを用
い、密閉容器内の全圧力は、１．０Torr、窒素富化時間
は３０分とした。EXAMPLE An example in which the apparatus having the basic constitution of the present invention shown in FIG. 1 was used, a SUS304 bright annealed plate was used as a stainless steel plate, nitrogen was enriched in the stainless steel plate, and the corrosion resistance of the steel plate surface was evaluated by the pitting potential was described. To do. The gas composition used for nitrogen enrichment was a mixed gas of nitrogen and hydrogen, the total pressure in the closed container was 1.0 Torr, and the nitrogen enrichment time was 30 minutes.
【００１６】（実施例１）図２に、孔食電位と水素／窒
素の圧力比との関連を示す。ステンレス鋼板の加熱温度
４５０℃、バイアスはマイナス６０Ｖ、プラズマ化電力
２０Ｗ／cm2 とした。図中のＡは光輝焼鈍板（処理前）
の孔食電位を示す。曲線Ｂは、本発明のプラズマ窒化法
により処理した光輝焼鈍板（処理後）の孔食電位を示
す。曲線Ｂは、水素／窒素の圧力比が０．５以上５．０
以下の範囲で、図中Ａよりも孔食電位が大きな値を示し
ている。さらに、曲線Ｂは、水素／窒素の圧力比が１．
５以上３．５以下の範囲で孔食電位が１．０よりも大き
な値を示している。従って、耐食性に優れたステンレス
鋼板表面が得られる水素／窒素の圧力比の適正範囲は、
０．５以上５．０以下の範囲で効果が認められるもの
の、１．５以上３．５以下の範囲で優れた効果が認めら
れる。Example 1 FIG. 2 shows the relationship between the pitting potential and the hydrogen / nitrogen pressure ratio. The heating temperature of the stainless steel sheet was 450 ° C., the bias was −60 V, and the plasma power was 20 W / cm 2 . A in the figure is a bright annealed plate (before processing)
The pitting potential of Curve B shows the pitting potential of the bright annealed plate (after treatment) treated by the plasma nitriding method of the present invention. Curve B has a hydrogen / nitrogen pressure ratio of 0.5 to 5.0.
In the following range, the pitting potential shows a larger value than A in the figure. In addition, curve B has a hydrogen / nitrogen pressure ratio of 1.
The pitting potential is larger than 1.0 in the range of 5 or more and 3.5 or less. Therefore, the proper range of the hydrogen / nitrogen pressure ratio that can obtain a stainless steel plate surface with excellent corrosion resistance is
Although the effect is recognized in the range of 0.5 or more and 5.0 or less, the excellent effect is recognized in the range of 1.5 or more and 3.5 or less.
【００１７】（実施例２）図３に、孔食電位とバイアス
との関連を示す。ステンレス鋼板の加熱温度４５０℃、
プラズマ化電力２０Ｗ／cm2 、水素／窒素の圧力比は
２．５とした。図中のＣは、光輝焼鈍板（処理前）の孔
食電位を示す。曲線Ｄは、本発明のプラズマ窒化法によ
り処理した光輝焼鈍板（処理後）の孔食電位を示す。曲
線Ｄは、バイアスがプラス側では、処理前との差異が認
められないものの、マイナス側では、バイアス値が５．
０Ｖ以上１００Ｖで、図中Ｃよりも孔食電位が大きな値
を示している。さらに、曲線Ｄは、バイアスが１５Ｖ以
上９０Ｖ以下の範囲で孔食電位が１．０よりも大きな値
を示している。従って、耐食性に優れたステンレス鋼板
表面が得られるバイアスの適正範囲は、５．０Ｖ以上１
００Ｖ以下の範囲で効果が認められるものの、１５Ｖ以
上９０Ｖ以下の範囲で優れた効果が認められる。Example 2 FIG. 3 shows the relationship between pitting potential and bias. Heating temperature of stainless steel plate 450 ℃,
The plasma conversion power was 20 W / cm 2 , and the hydrogen / nitrogen pressure ratio was 2.5. C in the figure indicates the pitting potential of the bright annealed plate (before treatment). Curve D shows the pitting potential of the bright annealed plate (after the treatment) treated by the plasma nitriding method of the present invention. In the curve D, on the plus side of the bias, no difference from the pre-treatment was observed, but on the minus side, the bias value was 5.
At 0 V or more and 100 V, the pitting potential shows a larger value than C in the figure. Further, the curve D shows that the pitting potential is larger than 1.0 in the range of the bias of 15 V or more and 90 V or less. Therefore, the proper range of bias to obtain a stainless steel plate surface with excellent corrosion resistance is 5.0 V or more 1
Although the effect is recognized in the range of 00V or less, the excellent effect is recognized in the range of 15V or more and 90V or less.
【００１８】（実施例３）図４に、孔食電位とステンレ
ス鋼板温度との関連を示す。プラズマ化電力２０Ｗ／cm
2 、水素／窒素の圧力比は２．５、バイアスはマイナス
６０Ｖとした。図中のＥは、光輝焼鈍板（処理前）の孔
食電位を示す。曲線Ｆは、本発明のプラズマ窒化法によ
り処理した光輝焼鈍板（処理後）の孔食電位を示す。曲
線Ｆは、基板温度が３００℃以下、５５０℃以上では、
処理前との差異が認められないものの、３００℃以上、
５５０℃以下では、図中Ｅよりも孔食電位が大きな値を
示している。さらに、曲線Ｆは、基板温度が３５０℃以
上、５００℃以下の範囲で孔食電位が１．０よりも大き
な値を示している。従って、耐食性に優れたステンレス
鋼板表面が得られる基板温度の適正範囲は、３００℃以
上、５５０℃以下の範囲で効果が認められるものの、３
５０℃以上、５００℃以下の範囲で優れた効果が認めら
れる。(Embodiment 3) FIG. 4 shows the relationship between pitting potential and stainless steel plate temperature. Plasmaization power 20W / cm
2 , the pressure ratio of hydrogen / nitrogen was 2.5, and the bias was -60V. E in the figure indicates the pitting potential of the bright annealed plate (before treatment). Curve F shows the pitting potential of the bright annealed plate (after the treatment) treated by the plasma nitriding method of the present invention. The curve F shows that when the substrate temperature is 300 ° C. or lower and 550 ° C. or higher,
Although no difference from before treatment is observed, 300 ° C or higher,
At 550 ° C. or lower, the pitting potential is larger than that in E in the figure. Further, the curve F shows that the pitting potential is larger than 1.0 in the range of the substrate temperature of 350 ° C. or higher and 500 ° C. or lower. Therefore, although the proper range of the substrate temperature at which the surface of the stainless steel plate having excellent corrosion resistance is obtained is 300 ° C. or higher and 550 ° C. or lower, the effect is recognized.
An excellent effect is recognized in the range of 50 ° C or higher and 500 ° C or lower.
【００１９】（実施例４）図５に、孔食電位とプラズマ
化電力密度との関連を示す。ステンレス鋼板の加熱温度
４５０℃、水素／窒素の圧力比は２．５、バイアスはマ
イナス６０Ｖとした。図中のＧは、光輝焼鈍板（処理
前）の孔食電位を示す。曲線Ｈは、本発明のプラズマ窒
化法により処理した光輝焼鈍板（処理後）の孔食電位を
示す。曲線Ｈは、プラズマ化電力密度が５．０Ｗ／cm2
以下、６０Ｗ／cm2 以上では、処理前との差異が認めら
れないものの、５．０Ｗ／cm2 以上、６０Ｗ／cm2 以下
では、図中Ｇよりも孔食電位が大きな値を示している。
さらに、曲線Ｈは、プラズマ化電力密度が１０Ｗ／cm2
以上、５０Ｗ／cm2 以下の範囲で孔食電位が１．０より
も大きな値を示している。従って、耐食性に優れたステ
ンレス鋼板表面が得られるプラズマ化電力密度の適正範
囲は、５．０Ｗ／cm2 以上、６０Ｗ／cm2 以下の範囲で
効果が認められ、１０Ｗ／cm2 以上、５０Ｗ／cm2 以下
の範囲で優れた効果が認められる。(Embodiment 4) FIG. 5 shows the relationship between the pitting potential and the plasmaization power density. The heating temperature of the stainless steel plate was 450 ° C., the hydrogen / nitrogen pressure ratio was 2.5, and the bias was −60V. G in the figure indicates the pitting potential of the bright annealed plate (before treatment). Curve H represents the pitting potential of the bright annealed plate (after the treatment) treated by the plasma nitriding method of the present invention. Curve H has a plasmaization power density of 5.0 W / cm 2
Hereinafter, the 60 W / cm 2 or more, but not observed differences between pretreatment, 5.0 W / cm 2 or more, 60 W / cm 2 in the following, pitting potential than in Figure G indicates a large value .
Further, the curve H shows that the plasma power density is 10 W / cm 2
As described above, the pitting potential is larger than 1.0 in the range of 50 W / cm 2 or less. Therefore, the proper range of plasma power density is superior stainless steel surface corrosion resistance resulting, 5.0 W / cm 2 or more, the effect is observed at 60 W / cm 2 or less in the range, 10 W / cm 2 or more, 50 W / An excellent effect is recognized in the range of cm 2 or less.
【００２０】[0020]
【発明の効果】本発明により、ステンレス鋼板の耐食性
を大幅に向上させることができた。本発明は、ステンレ
ス鋼板の応用分野全般、特に建築建材分野への応用に関
して大変有益な技術を開示したものであり、これらの分
野に大きく寄与するものである。According to the present invention, the corrosion resistance of the stainless steel sheet can be greatly improved. The present invention discloses a very useful technique for general application fields of stainless steel sheets, particularly in the field of building materials, and makes a great contribution to these fields.
【図１】本発明の装置の基本構成を示す説明図。FIG. 1 is an explanatory diagram showing the basic configuration of an apparatus of the present invention.
【図２】孔食電位と水素／窒素の圧力比との関連を示す
図表。FIG. 2 is a chart showing the relationship between pitting potential and hydrogen / nitrogen pressure ratio.
【図３】孔食電位とバイアスとの関連を示す図表。FIG. 3 is a diagram showing the relationship between pitting potential and bias.
【図４】孔食電位とステンレス鋼板温度との関連を示す
図表。FIG. 4 is a chart showing the relationship between pitting potential and stainless steel plate temperature.
【図５】孔食電位とプラズマ化電力密度との関連を示す
図表。FIG. 5 is a graph showing the relationship between pitting potential and plasma power density.
１ 密閉容器 ２−ａ，ｂ 放電用電極 ３ ステンレス鋼板 ４ 電極 ５ 直流電源 ６ 電源 ７−ａ，ｂ 加熱制御機構 ８ ガス流入口 ９ ガス組成を調節する制御機構 １０ ガス流出口 １１ 排気および圧力を調節する機構 １２ リークバルブ 1 Airtight container 2-a, b Discharge electrode 3 Stainless steel plate 4 Electrode 5 DC power source 6 Power source 7-a, b Heating control mechanism 8 Gas inlet 9 Control mechanism for adjusting gas composition 10 Gas outlet 11 Exhaust and pressure Adjusting mechanism 12 Leak valve
Claims (2)
おいて、ステンレス鋼板を所望の温度に加熱し、放電極
と放電極とは独立した一対のステンレス鋼板を設置する
ことのできる極と対極を設置し、ステンレス鋼板を設置
することのできる極をマイナス、対極をプラスとしたバ
イアスを印加しステンレス鋼板表面に窒素を富化するこ
とを特徴とする耐食性に優れたステンレス鋼板の製造方
法。1. A stainless steel plate is heated to a desired temperature in a plasma containing nitrogen and hydrogen gas, and a pole and a counter electrode are provided which can set a discharge electrode and a pair of stainless steel plates independent of the discharge electrode. A method for producing a stainless steel plate having excellent corrosion resistance, which comprises applying a bias with a negative pole on which a stainless steel sheet can be installed and a positive pole on a counter electrode to enrich the surface of the stainless steel sheet with nitrogen.
密度の範囲が５（Ｗ／cm2 ）以上で５０（Ｗ／cm2 ）以
下、全圧力の範囲が０．５Torr以上で１０．０Torr以
下、水素／窒素ガスの分圧比の範囲が０．５以上で５．
０以下、ステンレス鋼板に印加するマイナスのバイアス
の範囲が５．０Ｖ以上で１００Ｖ以下、ステンレス鋼板
温度の範囲が３００℃以上で６００℃以下のステンレス
鋼板表面に窒素を富化することを特徴とする耐食性に優
れたステンレス鋼板の製造方法。2. The plasma power density range of 5 (W / cm 2 ) or more and 50 (W / cm 2 ) or less and the total pressure range of 0.5 Torr or more and 10.0 Torr or less according to claim 1. 5. When the partial pressure ratio range of hydrogen / nitrogen gas is 0.5 or more, 5.
0 or less, the range of the negative bias applied to the stainless steel plate is 5.0 V or more and 100 V or less, and the temperature range of the stainless steel plate is 300 ° C. or more and 600 ° C. or less, the surface of the stainless steel plate is enriched with nitrogen. A method of manufacturing a stainless steel sheet having excellent corrosion resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2573294A JPH07233461A (en) | 1994-02-23 | 1994-02-23 | Method for producing stainless steel sheet with excellent corrosion resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2573294A JPH07233461A (en) | 1994-02-23 | 1994-02-23 | Method for producing stainless steel sheet with excellent corrosion resistance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07233461A true JPH07233461A (en) | 1995-09-05 |
Family
ID=12173993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2573294A Withdrawn JPH07233461A (en) | 1994-02-23 | 1994-02-23 | Method for producing stainless steel sheet with excellent corrosion resistance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07233461A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0872569A1 (en) * | 1997-04-18 | 1998-10-21 | Plasma Metal S.A. | Nitriding process and nitriding furnace thereof |
| KR100288320B1 (en) * | 1998-12-31 | 2001-05-02 | 김덕중 | Nitriding process method and apparatus using plasma which forms hardening depth from metal surface by 1mm or more |
| JP2008308759A (en) * | 2007-06-12 | 2008-12-25 | Korea Inst Of Industrial Technology | Plasma nitriding method with low current and high density and plasma nitriding apparatus with low current and high density |
| JP2013154367A (en) * | 2012-01-30 | 2013-08-15 | Kiden Technos:Kk | Method for manufacturing vacuum structure and vacuum structure |
| JP2013234370A (en) * | 2012-05-10 | 2013-11-21 | Yamanashi Prefecture | Method for plasma nitriding of iron and steel, and iron and steel subjected to plasma nitridation treatment |
| WO2015037877A1 (en) * | 2013-09-10 | 2015-03-19 | 가천대학교 산학협력단 | Surface treatment apparatus and surface treatment method |
| CN105658841A (en) * | 2013-09-10 | 2016-06-08 | 嘉泉大学敎产学协力团 | Surface treatment apparatus and surface treatment method |
| DE102022123825A1 (en) | 2022-09-16 | 2024-03-21 | Oerlikon Surface Solutions Ag, Pfäffikon | Device and method for plasma treatment of metal surfaces |
-
1994
- 1994-02-23 JP JP2573294A patent/JPH07233461A/en not_active Withdrawn
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0872569A1 (en) * | 1997-04-18 | 1998-10-21 | Plasma Metal S.A. | Nitriding process and nitriding furnace thereof |
| KR100288320B1 (en) * | 1998-12-31 | 2001-05-02 | 김덕중 | Nitriding process method and apparatus using plasma which forms hardening depth from metal surface by 1mm or more |
| JP2008308759A (en) * | 2007-06-12 | 2008-12-25 | Korea Inst Of Industrial Technology | Plasma nitriding method with low current and high density and plasma nitriding apparatus with low current and high density |
| JP2013154367A (en) * | 2012-01-30 | 2013-08-15 | Kiden Technos:Kk | Method for manufacturing vacuum structure and vacuum structure |
| JP2013234370A (en) * | 2012-05-10 | 2013-11-21 | Yamanashi Prefecture | Method for plasma nitriding of iron and steel, and iron and steel subjected to plasma nitridation treatment |
| WO2015037877A1 (en) * | 2013-09-10 | 2015-03-19 | 가천대학교 산학협력단 | Surface treatment apparatus and surface treatment method |
| CN105658841A (en) * | 2013-09-10 | 2016-06-08 | 嘉泉大学敎产学协力团 | Surface treatment apparatus and surface treatment method |
| DE102022123825A1 (en) | 2022-09-16 | 2024-03-21 | Oerlikon Surface Solutions Ag, Pfäffikon | Device and method for plasma treatment of metal surfaces |
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