JPH0724973U - Metal roll etching equipment - Google Patents

Abstract

(57) [Abstract] [Purpose] In a rolling roll etching treatment device for rolling a resin film coated on the roll surface with a YAG laser and performing etching treatment with a corrosive liquid, the etching amount at the end and the center of the roll can be adjusted. Uniform etching with no difference is performed, and the entire roll width direction is etched with high accuracy. A two-fluid fine spray nozzle 3 is used, and overrun cases 1 are attached to both ends of an etching liquid scattering prevention cover 10 to avoid a decrease in the flow rate of the etching liquid at the end of a roll 11.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a metal roll etching apparatus for forming a myriad of accurate uneven patterns on the surface of a rolling roll.

[0002]

[Prior art]

 Generally, as a metal roll etching technique, a method of immersing the roll in a container filled with an etching solution and a spray device for spray-coating the etching solution on the roll are known. As a dipping method, there is a technique disclosed in Japanese Patent Laid-Open No. 1-283389, in which only the body of the roll is dipped and rotated in an etching liquid filled in a shallow dish. As a technique of spray coating, there is a technique of spraying an etching liquid onto a roll surface from a plurality of two-fluid spray nozzles while slowly rotating the roll, as disclosed in JP-A-60-239753.

Further, Japanese Patent Publication No. 4-191383 describes that a centrifugal force is applied to the roll surface during the etching process to improve the etching rate and accuracy. Furthermore, Japanese Patent Application No. 3-317645 describes that oxygen is mixed with the assist gas. However, none of the conventional techniques mentions the uniformity of etching accuracy in the width direction of the roll.

[0004]

[Problems to be solved by the device]

 An object of the present invention is to provide a technique for supplying an etching solution that improves the uniformity of etching accuracy in the roll width direction in a gas-liquid mixed spray coating type metal roll etching apparatus for etching the roll surface. In the roll surface roughening technology, the resin is applied to the roll surface so as to form a thin film, then the resin film is evaporated by a YAG laser, and then etching is performed with a corrosive solution. In the etching equipment, the purpose of making the flow rate of the etching solution uniform in the entire width direction to be treated is to make the roll surface shape uniform after etching. Then, it is intended to obtain a steel plate having a uniform uneven pattern in the plate width direction.

The etching liquid supply technology of the metal roll etching apparatus described above is arranged such that a plurality of two-fluid spray nozzles are arranged at equal intervals in order to make the flow rate of the spray liquid uniform in the roll width direction. The matching spray patterns are overlapped. However, since there is no overlap portion at the end of the arranged two-fluid spray nozzle row, there is a problem that the flow rate of the etching liquid decreases, and as a result, the etching amount at the end of this roll decreases. Furthermore, in order to make the etching amount more uniform over the entire roll width, it is necessary to arrange a plurality of two-fluid spray nozzles at equal intervals and overlap the adjacent spray patterns only by the technique of overlapping. Since the flow rate of the liquid changes, there is also a problem that the etching amount partially varies.

[0006]

[Means for Solving the Problems]

 In order to solve such a problem, the present invention uses a two-fluid spray nozzle in an apparatus for etching a rolling roll and uses a two-fluid spray nozzle at both ends of an etching solution scattering prevention cover. By installing an overrun case, it is intended to avoid a region where the flow rate of the etching solution is reduced at the edge portion described above and supply a stable etching solution to the etching portion on the entire surface of the roll. Further, in the second invention, a mechanism for reciprocating the two-fluid spray nozzle array in the width direction of the roll is added to the above device.

[0007]

[Action]

 As the etching liquid, for example, ferric chloride aqueous solution is used for steel products. It is widely known that an aqueous solution of ferric chloride is etched by chemical dissolution in the material, and that it has a close relationship with the etchant concentration / temperature conditions, etching speed, and finish.

Looking at the spray amount distribution of the spray pattern of the two-fluid spray nozzle used in the first invention, it can be said that in the central part and the peripheral part of the spray pattern, the peripheral part has a smaller amount of flow-down than the central part. Due to the phenomenon, in order to make the flow rate of the spray liquid uniform in the roll width direction, we adopted a technology in which multiple two-fluid spray nozzles are arranged at equal intervals and adjacent spray patterns overlap. In this case, since there is no overlap portion of the spray pattern at the end of the arranged two-fluid spray nozzle row, the flow amount of the etching solution decreases. Therefore, the center of the spray pattern is located at the position of the end of the roll so that the amount of liquid flowing down is substantially equal at the end of the roll to be etched and its center. In this case, an overrun case is attached to the scattering prevention cover in order to capture the liquid of the part that comes off the roll in the pattern generated from the two-fluid spray nozzles located at the end of the two-fluid spray nozzle row. In the second invention, by adding a mechanism for reciprocating the two-fluid spray nozzle row in the roll width direction to the first invention, the flow rate of the etching liquid locally changes due to the movement of the position of the two-fluid spray nozzle. It can be eliminated.

[0009]

【Example】

 [Embodiment 1] FIG. 2 shows an apparatus according to an embodiment of the present invention. 2A is a plan view of the etching apparatus, FIG. 2B is an elevation view, FIG. 2C is a side view, and FIG. 2D is a side view showing a state in which the shatterproof cover 10 is vertically disassembled. In FIG. 2, the roll 11 is sprayed with the etching liquid in the scattering prevention cover 10 by a large number of two-fluid spray nozzles 3 provided above. As shown in FIG. 2, a ferric chloride aqueous solution 4 and air (or pressurized air) 5 were connected to a two-fluid spray nozzle 3 for etching by a pipe 6. The total length of the cast iron roll 7 was 1400 mm, the roll diameter 8 was 60 mmφ, the etching width 9 was 1260 mm, and the number of the two-fluid spray nozzles 3 was 16.

In a general rolling roll, a chock when it is attached to a rolling mill is thinner than that in the center, but the rolling roll of the present invention has a roll having substantially the same overall width. In order to allow the roll 11 to be etched up to the very end of the roll width, the present invention has devised an etching case so that the scattering prevention cover 10 does not touch the chucking head 2 when chucking the roll, and the etching is performed. The overrun case 1 was attached so that the flow rate of the etching solution was uniform to the edge of the process. FIG. 1 is a partially cutaway perspective view showing how the overrun case is mounted. The overrun case 1 receives the etching solution of the spray pattern which is separated from the end of the roll 11 of the two-fluid spray nozzle (not shown in FIG. 1) at the end, and passes the drainage passage 13 from the drainage outlet 12 of the etching liquid. Pass through and flow back into the shatterproof cover 10.

FIG. 3 shows changes in the liquid flow rate in the present embodiment and the case where the overrun case is not mounted as the prior art. Examples are indicated by black circles, and comparative examples are indicated by black squares. At the roll end 23, since there is no overrun case in the comparative example, a part of the liquid sprayed from the two-fluid spray nozzle at the end of the two-fluid spray nozzle row 3 collided with the side wall of the scattering prevention cover. Due to the return of the liquid due to, the flow-down amount 24 increases at both ends. On the other hand, when the device of the present invention is adopted, the liquid flow-down amount at both ends is 25, which is almost equal to that at the center.

Example 2 In the apparatus shown in Example 1, a mechanism as shown in FIG. 4 was adopted in order to further move the two-fluid spray nozzle row in the width direction. This mechanism is composed of a motor 22 for rotating the roll, a device for reciprocating the two-fluid spray nozzle, and a device for controlling them. The roll is fixed by a chuck of a rotating device and is rotated at 150 rpm. The reciprocating motion of the two-fluid spray nozzle 3 transmits the driving force of the forward / reverse nozzle reciprocating motor 14 to the screw screw 16 via the gear box 15, and causes the reciprocating carriage 18 screwed to the screw screw 16 to move. The two-fluid spray nozzle 3 is connected to this reciprocating carriage 18 by reciprocating. The movement of the reciprocating carriage 18 is restricted by bringing the reciprocating distance adjusting shaft 19 into contact with the limiter 17. For example, the reciprocating distance 21 is adjusted to 1/2 of the nozzle pitch 20 of the two-fluid spray nozzle 3 for etching.

The overrun cases 1 are attached to both ends of the anti-scattering cover 10 for the etching liquid, and the etching liquid sprayed here is made to flow into the main body of the anti-scattering cover 10 so that the inside of the anti-scattering cover 10 is covered. It was recovered and recycled in the same manner as the etching solution. In addition, as shown in FIG. 2 (d), when the roll is attached or detached, the shatterproof cover 10 is divided into upper and lower parts. Using the apparatus of FIG. 4, the reciprocating movement of the two-fluid spray nozzle was set to a distance of 90 mm, which was the same as the pitch of the nozzle, and moved at a speed of 200 mm / min. The etching treatment temperature is 30 ° C., the air (or pressurized air) flow rate of the two-fluid spray nozzle is 6 l / min per nozzle, and the etching width of the roll surface is 10 min. The flow rate distribution of the etching solution is shown in FIG. Due to the stable spray flow rate between the two-fluid spray nozzles and the removal of the flow rate reduction area at both edges from the etching process width, a uniform spray state is achieved within the etching process width 7.

FIG. 6 shows three-dimensional roughness profile data of the roll surface after etching. 6 (a) and 6 (c) show both end portions of the roll, and FIG. 6 (b) shows the central portion of the roll. It can be seen that uniform processing is performed overall. In addition, as a mechanism for reciprocating other than this, the nozzle fixing plate may be reciprocating using a wire and a pulley.

[0015]

[Effect of device]

 According to the present invention, there is no difference in the etching amount between the end of the roll to be etched of the metal roll and the center thereof, and uniform etching is possible, and furthermore, there is no local fluctuation in etching. Therefore, it is possible to perform etching with extremely high precision over the entire roll width direction.

[Brief description of drawings]

FIG. 1 is a partially cutaway perspective view showing a position of an overrun case.

FIG. 2 is a diagram showing the entire apparatus of the embodiment, and is a plan view (a), an elevation view (b), a side view (c), and a side view when a shatterproof cover is disassembled.

FIG. 3 is a graph showing a spray amount distribution in the roll width direction.

FIG. 4 is a side view of another embodiment.

FIG. 5 is a graph showing a spray flow rate distribution of an etching liquid in a roll width direction.

FIG. 6 is three-dimensional roughness profile data of the roll surface showing the etching result by this apparatus.

[Explanation of symbols]

 1 Overrun Case 2 Roll Chucking Head 3 Two-fluid Spray Nozzle 4 Ferric Chloride Aqueous Solution 5 Air (or Pressurized Air) 6 Piping 7 Roll Length 8 Roll Diameter 9 Etching Width 10 Scatter Prevention Cover 11 Roll 12 Etching Solution Drainage port 13 Drainage passage 14 Nozzle reciprocating motor 15 Gear box 16 Screw screw 17 Limiter 18 Reciprocating table 19 Reciprocating distance adjusting shaft 20 Nozzle pitch 21 Reciprocating moving distance 22 Roll rotation motor 26 Nozzle fixing plate

Claims (2)

[Scope of utility model registration request] 1. A roll etching apparatus having a two-fluid spray nozzle row that is parallel to the width direction of a metal roll and is located above the metal roll, and a rotation holding mechanism that holds and rotates the metal roll. A metal roll etching apparatus comprising: a scattering prevention cover for covering a roll, and overrun cases attached to both ends of the scattering prevention cover. 2. The metal roll etching apparatus according to claim 1, further comprising a mechanism for reciprocating the two-fluid spray nozzle row in the roll width direction.