JPH07281165A - Method for sticking plane substrate and production of flat plate type lens array - Google Patents
Method for sticking plane substrate and production of flat plate type lens arrayInfo
- Publication number
- JPH07281165A JPH07281165A JP6074966A JP7496694A JPH07281165A JP H07281165 A JPH07281165 A JP H07281165A JP 6074966 A JP6074966 A JP 6074966A JP 7496694 A JP7496694 A JP 7496694A JP H07281165 A JPH07281165 A JP H07281165A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- substrate
- flat
- glass substrate
- laminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 221
- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229920005989 resin Polymers 0.000 claims abstract description 115
- 239000011347 resin Substances 0.000 claims abstract description 115
- 229920006223 adhesive resin Polymers 0.000 claims abstract description 30
- 239000004840 adhesive resin Substances 0.000 claims abstract description 28
- 229920000642 polymer Polymers 0.000 claims abstract description 15
- 239000005357 flat glass Substances 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims description 93
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- 238000010030 laminating Methods 0.000 claims description 21
- 238000003825 pressing Methods 0.000 claims description 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000012530 fluid Substances 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 4
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 239000013013 elastic material Substances 0.000 abstract description 3
- 230000013011 mating Effects 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- 230000002706 hydrostatic effect Effects 0.000 description 23
- 239000004973 liquid crystal related substance Substances 0.000 description 21
- 239000004593 Epoxy Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000005340 laminated glass Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133526—Lenses, e.g. microlenses or Fresnel lenses
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、平面基板と平面薄板ガ
ラス基板を、接着性樹脂で貼り合わせる方法に関し、特
に、液晶表示素子を構成するための、平板マイクロレン
ズアレイとそれを用いた液晶表示素子を作製する際に、
有効な平面基板の貼り合わせ方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for laminating a flat substrate and a flat thin glass substrate with an adhesive resin, and more particularly to a flat microlens array for forming a liquid crystal display device and a liquid crystal using the same. When making a display element,
The present invention relates to an effective method for laminating flat substrates.
【0002】[0002]
【従来の技術】従来、平面基板どうしを接着性樹脂によ
り貼り合わせ方法、特に一方の平面基板が薄板である場
合においては、平面基板表面上に接着性樹脂を滴下し、
別の薄板基板をその上に配置した後、鏡面研磨されたガ
ラス盤等の平坦な加圧台で加圧し、密着加圧した状態の
ままで光照射するかあるいは加熱することにより、樹脂
を硬化させ接着する方法が一般的であった。2. Description of the Related Art Conventionally, a method of attaching flat substrates to each other with an adhesive resin, particularly when one of the flat substrates is a thin plate, dropping the adhesive resin on the surface of the flat substrate,
After placing another thin plate on it, press it on a flat press table such as a mirror-polished glass plate, and irradiate light or heat it in the state of close contact pressure to cure the resin. The common method is to bond them.
【0003】[0003]
【発明が解決しようとする課題】前記の貼り合わせ方法
において、貼り合わせようとする平面基板の少なくとも
一方が、板厚0.5mm以下の平面薄板ガラスである場
合について考えてみる。加圧定盤を加圧密着した時に、
平面薄板ガラスには加圧定盤の平坦度を反映して、微小
うねりが生じることになる。なお、この加圧定盤は、研
磨加工にて仕上げられている場合が多く、その平坦度は
研磨の精度によることになるが、コストとの兼ね合いで
10μm程度に仕上げられているのが一般的である。通
常はこの精度で十分である。Consider the case where, in the above-mentioned bonding method, at least one of the flat substrates to be bonded is flat thin glass having a plate thickness of 0.5 mm or less. When the pressure platen is pressed and adhered,
The flat thin glass reflects the flatness of the pressure platen, which causes minute waviness. The pressure platen is often finished by polishing, and its flatness depends on the precision of polishing, but it is generally finished to about 10 μm in consideration of cost. Is. This precision is usually sufficient.
【0004】平面薄板ガラスと平面基板との間に樹脂を
展開させる場合、この微小うねりがそのまま平面薄板ガ
ラスの樹脂側の面に浮き出てしまうことになる。よっ
て、展開される樹脂の厚みが、微妙にばらついてしま
い、その状態で樹脂は硬化することになる。したがっ
て、平面薄板ガラス基板には、この樹脂の厚みのばらつ
きがそのまま反映されてしまい、前記薄板ガラス基板表
面には微小うねりが発生してしまうという現象を、本発
明者らは見いだした。前記現象は、貼り合わせる平面薄
板ガラス基板の板厚が薄くなればなるほど、その影響が
大きくなることになることは云うまでもない。When the resin is spread between the flat thin glass sheet and the flat substrate, the minute undulations are directly projected on the resin side surface of the flat thin glass sheet. Therefore, the thickness of the developed resin varies delicately, and the resin is cured in that state. Therefore, the present inventors have found that the variation in the thickness of the resin is reflected as it is on the flat thin glass substrate, and a microwaviness is generated on the surface of the thin glass substrate. Needless to say, the above-mentioned phenomenon has a greater influence as the plate thickness of the flat thin glass substrate to be bonded becomes thinner.
【0005】例えば、平面基板として厚み0.5mmの
石英ガラス基板と、厚み0.2mmの平面薄板ガラス基
板を、上述の方法で貼り合わせた場合、振幅が2〜4μ
m,周期が10〜25mmの微小うねりが生じる。図7
参照のこと。このような微小うねりは、通常の用途では
特に問題とはなっていない。For example, when a flat glass substrate having a thickness of 0.5 mm and a flat thin glass substrate having a thickness of 0.2 mm are bonded by the above method, the amplitude is 2 to 4 μm.
Micro waviness with a m of 10 to 25 mm occurs. Figure 7
See. Such minute waviness does not pose a particular problem in normal use.
【0006】しかし、前記平面基板が複数のアレイ状凹
部を有する石英ガラス基板であり、その凹部を樹脂等で
充填することで凸レンズとする平板型マイクロレンズの
機能を具備するものであり、これを平面薄板ガラス基板
と貼り合わせ、この貼り合せ基板を液晶表示素子用基板
として利用する場合には、基板表面の微小うねりが表示
品質を劣化させることになる。これは、前記2〜4μm
の振幅が、液晶層の厚みである3〜5μmに比べて無視
できない値であるためである。However, the above-mentioned flat substrate is a quartz glass substrate having a plurality of array-shaped recesses, and has the function of a flat plate type microlens which becomes a convex lens by filling the recesses with resin or the like. When it is bonded to a flat thin glass substrate and this bonded substrate is used as a substrate for a liquid crystal display element, minute waviness on the substrate surface deteriorates the display quality. This is 2 to 4 μm
This is because the amplitude of is a value that cannot be ignored as compared with the thickness of the liquid crystal layer of 3 to 5 μm.
【0007】そこで本発明では、平面基板と平面薄板ガ
ラス基板とを、微小うねりを生じることなく貼り合わせ
る方法を提供することを目的とする。Therefore, it is an object of the present invention to provide a method for bonding a flat substrate and a flat thin glass substrate without causing microwaviness.
【0008】[0008]
【課題を解決するための手段】前記問題点を解決するた
めに、本発明では、2枚の基板の間に樹脂を加圧展開
後、加圧を完全に除去した状態で、樹脂の硬化および貼
り合わせを行う。In order to solve the above-mentioned problems, in the present invention, after the resin is pressure-developed between the two substrates, the resin is cured and cured while the pressure is completely removed. Stick together.
【0009】さらに、前記薄板ガラス基板側を、静水圧
で直接あるいは高分子弾性体を介して加圧して樹脂を展
開し、さらに加圧状態のままで樹脂を硬化させ貼り合わ
せを行う。Further, the thin glass substrate side is hydrostatically pressed directly or through a polymeric elastic body to develop the resin, and the resin is further cured in the pressed state for bonding.
【0010】まず、本発明に用いることができる平面基
板としては、ガラス,セラミック,金属,樹脂等の材質
の基板を挙げることができる。特に、液晶表示素子を作
製するときには、平面基板としてガラス基板が用いられ
る。そのガラス基板としては、ソーダライムガラス、ア
ルカリアルミノシリケートガラス、アルカリボロシリケ
ートガラス、無アルカリガラス、結晶化ガラスおよび石
英ガラス等任意のガラス基板が挙げられる。板厚につい
ては特に制限はなく、板自体の剛性が大きな厚みを有す
る基板でも、板自体の剛性が小さい薄板ガラス基板でも
よい。First, examples of the flat substrate that can be used in the present invention include substrates made of materials such as glass, ceramics, metals and resins. In particular, when manufacturing a liquid crystal display element, a glass substrate is used as a flat substrate. Examples of the glass substrate include soda lime glass, alkali aluminosilicate glass, alkali borosilicate glass, non-alkali glass, crystallized glass and quartz glass. The plate thickness is not particularly limited and may be a substrate having a large rigidity of the plate itself or a thin glass substrate having a small rigidity of the plate itself.
【0011】一方、平面薄板ガラス基板にも、上述した
種類のガラス基板を用いることができる。また、本発明
の効果が、有効に発揮される平面薄板ガラスの板厚につ
いては、使用するガラス基板の剛性によって変化する
が、一般的には板厚0.5mm以下の場合であり、さら
に板厚0.2mm以下である場合にはその効果が顕著で
ある。On the other hand, as the flat thin glass substrate, the above-mentioned glass substrate can be used. In addition, the plate thickness of the flat thin glass that effectively exhibits the effect of the present invention varies depending on the rigidity of the glass substrate used, but in general, the plate thickness is 0.5 mm or less. The effect is remarkable when the thickness is 0.2 mm or less.
【0012】平面薄板ガラス基板の板厚が、0.5mm
を越え0.7mm以上の場合では、板自体の剛性が大き
いため、加圧定盤を加圧密着したときに、加圧定盤の平
坦度に依存した微小うねりが生じにくいため、展開され
る樹脂厚みにもばらつきが少なくなり、貼り合わせた基
板表面には、微小うねりが発生しにくいことになる。The flat thin glass substrate has a thickness of 0.5 mm.
In the case of exceeding 0.7 mm and more than 0.7 mm, since the plate itself has a large rigidity, when the pressure platen is pressed and brought into close contact with the platen, minute undulations depending on the flatness of the pressure platen are unlikely to occur, and therefore the plate is developed. The variation in resin thickness is reduced, and minute waviness is less likely to occur on the surfaces of the bonded substrates.
【0013】本発明で使用する接着性樹脂としては、ポ
リエステル系樹脂、エポキシ系樹脂、シリコーン系樹
脂、フォスファゼン樹脂、フェノール樹脂、ポリイミド
系樹脂等光硬化性および熱硬化性の任意の樹脂が使用で
きる。なかでもポリエステル系樹脂、エポキシ系樹脂、
シリコーン系樹脂等の光硬化性樹脂は、短時間で硬化す
るため生産性の面から好ましい。As the adhesive resin used in the present invention, polyester resin, epoxy resin, silicone resin, phosphazene resin, phenol resin, polyimide resin, or any other photocurable and thermosetting resin can be used. . Among them, polyester resin, epoxy resin,
A photocurable resin such as a silicone resin is preferable in terms of productivity because it cures in a short time.
【0014】使用する樹脂の粘性の特性からは、0.1
ポアズから100ポアズ程度までの幅広い粘性の範囲の
ものが使用できる。樹脂の粘性が低い場合には、樹脂層
厚みのばらつきは発生しにくいが、その反面樹脂層厚み
を厚くすることが難しい。一方、樹脂の粘性が高い場合
には、樹脂層厚みを厚くすることが可能であるが、その
反面樹脂層厚みのばらつきが生じやすい。実作業では1
ポアズから50ポアズ程度の粘性を有する樹脂が好まし
い。From the characteristics of the viscosity of the resin used, 0.1
A wide range of viscosity from Poise to about 100 Poise can be used. When the viscosity of the resin is low, variations in the resin layer thickness are unlikely to occur, but on the other hand, it is difficult to increase the resin layer thickness. On the other hand, when the viscosity of the resin is high, it is possible to increase the thickness of the resin layer, but on the other hand, variations in the thickness of the resin layer tend to occur. 1 in actual work
A resin having a viscosity of about poise to about 50 poise is preferable.
【0015】また、その表面に2次元に配列した略球面
状の複数のアレイ状凹部を有するガラス基板と、前記ガ
ラス基板よりも屈折率が高い透明樹脂で前記アレイの凹
部を充填することで、凸レンズとする平板マイクロレン
ズアレイを形成する。さらに、液晶表示素子の石英基板
と、前記平板マイクロレンズアレイを貼り合わせる場合
を考える。この場合、使用する透明樹脂は、前記ガラス
基板よりも大きな屈折率を有していなければならない。
このような樹脂は、ある程度高い粘性を有しているもの
しか、入手できないのが現状である。したがって、上述
のように、樹脂層厚みのばらつきが生じ、基板表面の微
小うねりが表示品質を劣化させることになる。Further, by filling a glass substrate having a plurality of substantially spherical array-shaped concave portions arranged two-dimensionally on its surface and the concave portions of the array with a transparent resin having a refractive index higher than that of the glass substrate, A flat plate microlens array that is a convex lens is formed. Further, consider a case where the quartz substrate of the liquid crystal display device and the flat plate microlens array are bonded together. In this case, the transparent resin used must have a refractive index higher than that of the glass substrate.
Currently, such resins are available only if they have a high viscosity to some extent. Therefore, as described above, variations in the resin layer thickness occur, and minute waviness on the substrate surface deteriorates display quality.
【0016】つぎに、静水圧を直接作用させる方法にお
いて、静水圧としては、空気、窒素、ヘリウム等の常温
で気体の原子あるいは分子およびこれらの混合物を用い
ることができる。また、水、油等の液体を用いることも
可能である。Next, in the method in which the hydrostatic pressure is directly applied, as the hydrostatic pressure, it is possible to use air or nitrogen, helium or the like gas or atoms of a gas at room temperature and a mixture thereof. It is also possible to use liquids such as water and oil.
【0017】さらに、高分子弾性体を介して加圧を行う
場合では、高分子弾性体としては、天然ゴム、ブタジエ
ンゴム、シリコンゴム、フッ素ゴム等のゴムあるいはポ
リカーボネート、ポリメチルメタクリレート、ポリ塩化
ビニル、ポリエチレン等のプラスチックスを用いること
ができる。Further, when pressure is applied through the elastic polymer, the elastic polymer may be rubber such as natural rubber, butadiene rubber, silicon rubber, fluororubber, or polycarbonate, polymethylmethacrylate, polyvinyl chloride. Plastics such as polyethylene can be used.
【0018】一般に、接着しようとする平面薄板ガラス
の反り量が小さい場合には、樹脂展開後加圧を完全に除
去する方法が、基板表面の微小うねりを低減する上で最
も有効である。しかし、基板の反り量が大きく、加圧を
除去すると基板同士が接着性樹脂から剥離してしまうよ
うな場合には、静水圧あるいは高分子弾性体を介した加
圧を用い、加圧した状態で硬化を行わせる方法が、樹脂
硬化前の基板剥離を防止する上で有効である。In general, when the amount of warpage of the flat thin glass sheet to be bonded is small, the method of completely removing the pressure after the resin development is most effective in reducing the microwaviness of the substrate surface. However, if the warpage of the substrate is large and the substrates are separated from the adhesive resin when the pressure is removed, hydrostatic pressure or pressure via a polymer elastic body is used to apply pressure. The method of curing with is effective for preventing the peeling of the substrate before the resin is cured.
【0019】[0019]
【作用】本発明によれば、樹脂展開後加圧を完全に除去
した状態で樹脂の硬化および基板貼り合わせを行う場合
は、平面基板と平面薄板ガラスの間の樹脂厚みのばらつ
きが生じることはなく、よって貼り合わせ後の基板に樹
脂厚みのばらつきに起因した微小うねりを生じることが
ない。According to the present invention, when the resin is cured and the substrates are bonded together in the state where the pressure is completely removed after the development of the resin, the resin thickness between the flat substrate and the flat thin glass is not varied. Therefore, the micro-waviness due to the variation in the resin thickness does not occur on the substrates after bonding.
【0020】また、樹脂展開に静水圧を直接作用加圧す
る場合には、加圧状態にあるものの、極めて均一に加圧
されているため、樹脂厚みのばらつきを生じることはな
く、よって貼り合わせ後の基板には、樹脂厚みのばらつ
きに起因した微小うねりを生じることがない。また、樹
脂展開に高分子弾性体を介して加圧する場合にも、均一
に加圧されているため、樹脂厚みのばらつきを生じるこ
とはなく、よって貼り合わせ後の基板に樹脂厚みのばら
つきに起因した微小うねりを生じることがない。When hydrostatic pressure is applied directly to the resin development, the resin is in a pressurized state, but since it is pressed extremely uniformly, there is no variation in resin thickness, and therefore, after bonding, The substrate does not have minute waviness due to variations in resin thickness. Further, even when pressure is applied to the resin development through the elastic polymer, since the pressure is uniformly applied, there is no variation in the resin thickness, and therefore the variation in the resin thickness on the substrate after bonding is caused. The micro waviness does not occur.
【0021】さらに、得られた貼り合わせ基板の内部に
平板型マイクロレンズの機能を具備させ、液晶表示素子
用の対向基板として使用する場合には、液晶層の厚みば
らつきを低減できるため、基板の微小うねりに起因する
色むら等を発生させることがなく、表示品質を劣化させ
ない。Further, in the case where the obtained bonded substrate is provided with the function of a flat plate type microlens and is used as a counter substrate for a liquid crystal display element, variations in the thickness of the liquid crystal layer can be reduced, so that Color unevenness and the like due to minute waviness are not generated, and display quality is not deteriorated.
【0022】[0022]
【実施例】まず、本発明を各方法毎にその概略の工程を
説明する。 (除圧状態で貼り合わせる方法)図1に、本発明による
加圧を完全に除去した条件下での、平面薄板ガラスの貼
り合わせ工程の概略を示す。 (1)まず、平面基板11を加圧装置の下部加圧定盤3
1の上に設置し、平面基板11上に接着性樹脂21を滴
下する。 (2)つぎに、平面薄板ガラス12を気泡が入らないよ
うに、平面薄板ガラス12の中心部より接着性樹脂21
に接合する。 (3)続いて、静かに平面基板11と平面薄板ガラス1
2を接着性樹脂21により接合し、これを上部加圧定盤
32により加圧する。 (4)さらに、加圧により接着性樹脂21が平面基板1
1と平面薄板ガラス12の間に均一に展開したのち、加
圧装置の上部加圧定盤32による加圧を取り除き、下部
加圧定盤31上で貼り合わせた平面薄板ガラス基板10
に、加圧装置に組み込まれた紫外線照射装置によって紫
外線を照射するか、あるいは同じく加圧装置に組み込ま
れた加熱装置(図示せず)によって加熱処理を行うこと
により、接着性樹脂の硬化を行う。First, the outline steps of the present invention will be described for each method. (Method of Bonding in Depressurized State) FIG. 1 shows an outline of a bonding process of flat thin glass sheets under the condition that the pressure according to the present invention is completely removed. (1) First, the flat substrate 11 is attached to the lower pressure platen 3 of the pressure device.
1, and the adhesive resin 21 is dropped on the flat substrate 11. (2) Next, in order to prevent air bubbles from entering the flat thin glass sheet 12, the adhesive resin 21 is applied from the central portion of the flat thin glass sheet 12.
To join. (3) Then, the flat substrate 11 and the flat thin glass sheet 1 are gently placed.
The two are bonded by the adhesive resin 21, and this is pressed by the upper pressing platen 32. (4) Furthermore, the pressure-sensitive adhesive resin 21 causes the planar substrate 1 to be pressed.
1 and the flat thin glass plate 12 are spread uniformly, the pressure applied by the upper pressing platen 32 of the pressing device is removed, and the flat thin plate glass substrate 10 is bonded on the lower pressing platen 31.
Then, the adhesive resin is cured by irradiating ultraviolet rays with an ultraviolet ray irradiating device incorporated in the pressure device, or by performing heat treatment with a heating device (not shown) also incorporated in the pressure device. .
【0023】なお、前記紫外線照射装置は、加圧装置の
上部加圧定盤,下部加圧定盤のいずれか一方、あるいは
両方に組み込まれていることが望ましい。また、上述の
方法では、加圧定盤上で前記樹脂の硬化を行ったが、必
ずしもその必要はなく、加熱によって前記樹脂を硬化さ
せる場合などでは、別の加熱炉等で加熱硬化させてもよ
い。The ultraviolet irradiation device is preferably incorporated in either the upper pressure platen or the lower pressure platen of the pressure device, or both. Further, in the above-mentioned method, the resin was cured on the pressure platen, but it is not always necessary, and in the case of curing the resin by heating, it may be cured by heating in another heating furnace or the like. Good.
【0024】(静水圧による加圧状態で貼り合わせる方
法)図2に、本発明の流体による静水圧を加圧に用い
た、平面薄板ガラスの貼り合わせ工程の概略を示す。 (1)まず、平面基板11を下部加圧定盤31の上に設
置し、平面基板11上に接着性樹脂21を滴下する。 (2)つぎに、平面薄板ガラス12を気泡が入らないよ
うに平面薄板ガラス12の中心部より接着性樹脂21に
接合する。 (3)続いて、これに静水圧装置40を下降させ、さら
に外部より流体42(例えば気体)を導入加圧すること
により、静水圧を静水圧容器41とOリング43の空間
に存在する流体33を介して保持した基板12に直接作
用させる。 (4)さらに、上記の加圧により接着性樹脂21を平面
基板11と平面薄板ガラス12の間に均一に展開させた
のち、静水圧を作用させたままの状態で、貼り合わせた
平面薄板ガラス基板10に紫外線を照射する、または熱
処理を行うことにより接着性樹脂の硬化を行う。(Method of Bonding under Pressurization by Hydrostatic Pressure) FIG. 2 shows an outline of a bonding process of flat thin glass sheets using the hydrostatic pressure of the fluid of the present invention for pressurization. (1) First, the flat substrate 11 is placed on the lower pressure platen 31, and the adhesive resin 21 is dropped on the flat substrate 11. (2) Next, the flat thin glass sheet 12 is bonded to the adhesive resin 21 from the center of the flat thin glass sheet 12 so that air bubbles do not enter. (3) Subsequently, the hydrostatic device 40 is lowered to this, and a fluid 42 (for example, gas) is introduced from the outside to pressurize the hydrostatic pressure device 40, so that the hydrostatic pressure exists in the space between the hydrostatic container 41 and the O-ring 43. It directly acts on the substrate 12 held via the. (4) Further, after the adhesive resin 21 is uniformly spread between the flat substrate 11 and the flat thin glass sheet 12 by the above-mentioned pressurization, the flat thin glass sheets bonded together under the condition that hydrostatic pressure is applied. The adhesive resin is cured by irradiating the substrate 10 with ultraviolet rays or performing heat treatment.
【0025】なお、貼り合わせる基板が両方とも薄板ガ
ラス基板である場合には、両基板とも均等な圧で加圧す
る必要がでてくる。このような場合、加圧手段として両
基板面とも、静水圧を利用することは困難である。それ
は、両基板面で加圧状態のバランスをとることがきわめ
て困難であり、微小なうねりは発生しないものの、基板
全体が反ることが考えられる。したがって、このように
両基板が薄板ガラス基板である場合には、少なくとも一
方の加圧手段は後述する高分子弾性体による加圧を利用
するとよい。When both substrates to be bonded are thin glass substrates, it is necessary to apply a uniform pressure to both substrates. In such a case, it is difficult to use the hydrostatic pressure on both substrate surfaces as the pressing means. It is extremely difficult to balance the pressurization state on both substrate surfaces, and although micro waviness does not occur, it is considered that the entire substrate warps. Therefore, when both substrates are thin glass substrates as described above, it is preferable that at least one of the pressurizing means uses pressurization by a polymer elastic body described later.
【0026】図2に示した装置例では、流体に気体を用
いる場合に好適な装置である。一方、流体に液体を用い
る場合には、図3に示したような装置が好適である。 (1)まず、加圧装置の下部に設けられた静水圧装置4
0に、平面薄板ガラス基板12を設置し、この上に接着
性樹脂21を滴下する。 (2)つぎに、平面基板11を気泡が入らないように平
面基板11の中心部より接着性樹脂21に接合する。 (3)さらに、上部加圧定盤32を下降させ、静水圧容
器41内の流体42(液体)に、下部加圧定盤31に設
けたピストン45を介して、平面薄板ガラス基板12を
加圧する。 (4)さらに、上記の加圧により接着性樹脂21を平面
基板11と平面薄板ガラス12の間に均一に展開させた
のち、静水圧を作用させた状態のままで、貼り合わせた
平面薄板ガラス基板10に紫外線を照射する、または熱
処理を行うことにより接着性樹脂の硬化を行う。なおこ
の場合、平面基板11も透明であれば、光硬化性樹脂を
利用することができる。The example of the apparatus shown in FIG. 2 is suitable when a gas is used as the fluid. On the other hand, when a liquid is used as the fluid, the device shown in FIG. 3 is suitable. (1) First, the hydrostatic pressure device 4 provided below the pressurizing device.
The flat thin glass substrate 12 is placed at 0, and the adhesive resin 21 is dropped on the flat glass substrate 12. (2) Next, the flat substrate 11 is bonded to the adhesive resin 21 from the center of the flat substrate 11 so that air bubbles do not enter. (3) Further, the upper pressure platen 32 is lowered, and the flat thin glass substrate 12 is added to the fluid 42 (liquid) in the hydrostatic container 41 via the piston 45 provided in the lower pressure platen 31. Press. (4) Further, the adhesive resin 21 is uniformly spread between the flat substrate 11 and the flat thin glass sheet 12 by the above-mentioned pressurization, and then the flat thin glass sheets bonded together under the condition that hydrostatic pressure is applied. The adhesive resin is cured by irradiating the substrate 10 with ultraviolet rays or performing heat treatment. In this case, if the flat substrate 11 is also transparent, a photocurable resin can be used.
【0027】(高分子弾性体による加圧状態で貼り合わ
せる方法)図4に、本発明の高分子弾性体による加圧を
用いた平面薄板ガラスの貼り合わせ工程の概略を示す。 (1)まず、平面基板11を下部加圧定盤41の上に設
置し、平面基板11上に接着性樹脂21を滴下する。 (2)つぎに、平面薄板ガラス12を気泡が入らないよ
うに平面薄板ガラス12の中心部より接着性樹脂21に
接合する。 (3)続いて、これをその表面が平坦な高分子弾性体5
1を有する上部加圧定盤42により加圧する。 (4)さらに、加圧により接着性樹脂21が平面基板1
1と平面薄板ガラス12の間に均一に展開したのち、弾
性体による加圧を作用させた状態で、貼り合わせた平面
薄板ガラス基板10に紫外線を照射する、または熱処理
を行うことにより接着性樹脂の硬化を行う。(Method of Bonding under Pressure with Polymer Elastic Material) FIG. 4 shows an outline of a bonding process of flat thin glass sheets using the pressure by the polymer elastic material of the present invention. (1) First, the flat substrate 11 is placed on the lower pressure platen 41, and the adhesive resin 21 is dropped on the flat substrate 11. (2) Next, the flat thin glass sheet 12 is bonded to the adhesive resin 21 from the center of the flat thin glass sheet 12 so that air bubbles do not enter. (3) Subsequently, this is applied to the polymer elastic body 5 having a flat surface.
The pressure is applied by the upper pressure platen 42 having the number 1. (4) Furthermore, the pressure-sensitive adhesive resin 21 causes the planar substrate 1 to be pressed.
1 and the flat thin glass sheet 12 are uniformly spread, and then the flat thin glass substrate 10 bonded to the flat thin glass substrate 10 is irradiated with ultraviolet rays or subjected to heat treatment in a state where pressure is applied by an elastic body, so that the adhesive resin Cure.
【0028】なおこの場合、平面基板11も透明であれ
ば、光硬化性樹脂を利用することができる。また、貼り
合わせる両方の基板が、ともに薄板である場合には、上
部・下部加圧定盤の両方に、高分子弾性体を設ければよ
い。In this case, if the flat substrate 11 is also transparent, a photocurable resin can be used. When both substrates to be bonded are thin plates, a polymeric elastic body may be provided on both the upper and lower pressing plates.
【0029】以上の説明では、基板11には平面基板以
外に特に制限はなかったが、本発明による貼り合わせ基
板に平板型マイクロレンズの機能を具備させ、液晶表示
素子等の対向基板として使用する場合には、基板11は
石英ガラスなどの低膨張ガラス基板であることが望まし
い。またこのように、平面基板に微小凹凸がある場合で
も、本発明による貼り合わせ方法は有効である。In the above description, the substrate 11 is not particularly limited to a flat substrate, but the bonded substrate according to the present invention is provided with the function of a flat plate type microlens and is used as a counter substrate for a liquid crystal display element or the like. In this case, the substrate 11 is preferably a low expansion glass substrate such as quartz glass. Further, as described above, the bonding method according to the present invention is effective even when the flat substrate has minute irregularities.
【0030】以下に、具体的実施例について説明する。 (実施例1)除圧状態で貼り合わせる方法の具体例を示
す。まず、石英ガラス基板(外径125mm、板厚0.
5±0.01mm)を平面基板として、表面研磨された
ガラス製下部加圧定盤の上に設置した。次に、エポキシ
系光硬化性樹脂(粘度1400cP)0.5mlをシリ
ンダより滴下した。続いて、石英ガラス基板(外径12
5mm、板厚0.2mm±0.01mm)を平面薄板基
板として、気泡が入らないように前記光硬化性樹脂と中
心部より接合した。これを表面研磨されたガラス製上部
部加圧台により、圧力5kgf/cm2 で加圧した。な
お、この加圧機には、日化エンジニアリング(株)製2
P成形機を用いた。Specific examples will be described below. (Example 1) A specific example of a method of bonding in a depressurized state will be described. First, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.
5 ± 0.01 mm) was used as a flat substrate, and the flat substrate was placed on a surface-polished glass lower pressing platen. Next, 0.5 ml of the epoxy photocurable resin (viscosity 1400 cP) was dropped from the cylinder. Subsequently, a quartz glass substrate (outer diameter 12
5 mm and a plate thickness of 0.2 mm ± 0.01 mm) was used as a flat thin plate substrate and was bonded to the photo-curable resin from the center so as to prevent air bubbles from entering. This was pressed at a pressure of 5 kgf / cm 2 by means of a surface-polished glass upper part pressure table. In addition, this pressurizer is manufactured by Nikka Engineering Co., Ltd. 2
A P molding machine was used.
【0031】これにより、2枚の石英基板に挟み込まれ
た光硬化性樹脂は、外径125mmの基板面内に展開し
た。樹脂の展開がなされた後、ガラス製上部部加圧台に
よる加圧を中止し、完全に圧力を除去した後、紫外線照
射を行った。紫外線の照射条件は、53mW/cm2 で
150秒とした。硬化後の樹脂厚みは、約38μmであ
った。また今回の硬化条件において、光硬化性樹脂のシ
ョアD硬度は87程度、ガラス基板に対する接着強度は
約80kgf/cm2 になっていた。As a result, the photo-curable resin sandwiched between the two quartz substrates was spread on the substrate surface having an outer diameter of 125 mm. After the resin was developed, the pressurization by the glass upper part pressure table was stopped, the pressure was completely removed, and then the ultraviolet irradiation was performed. The ultraviolet irradiation conditions were 53 mW / cm 2 and 150 seconds. The resin thickness after curing was about 38 μm. Under the curing conditions of this time, the Shore D hardness of the photocurable resin was about 87, and the adhesive strength to the glass substrate was about 80 kgf / cm 2 .
【0032】上述の実施例1により得られた薄板貼り合
わせ基板の表面凹凸を、触針式粗さ計(東京精密製:サ
ーフコム 型番1500A)で、縦倍率2000倍,横
倍率1倍,走査距離120mmにて測定した。その結果
を図5に示す。図に示されたプロファイルにより、貼り
合わせによる微小うねりの発生は、全く観察されないこ
とがわかる。The surface unevenness of the thin laminated substrate obtained in the above-mentioned Example 1 was measured by a stylus type roughness meter (Tokyo Seimitsu: Surfcom model number 1500A) with a vertical magnification of 2000 times, a horizontal magnification of 1 time, and a scanning distance. It was measured at 120 mm. The result is shown in FIG. From the profile shown in the figure, it can be seen that the generation of microwaviness due to bonding is not observed at all.
【0033】(実施例2)静水圧による加圧状態で貼り
合わせる方法の具体例を示す。まず、石英ガラス基板
(外径125mm、板厚0.7±0.01mm)を平面
基板として、表面研磨されたガラス製下部加圧定盤の上
に設置した。次に、エポキシ系光硬化性樹脂(粘度14
00cP)0.5mlをシリンダより滴下した。続い
て、石英ガラス基板(外径125mm、板厚0.2mm
±0.01mm)を平面薄板基板として、気泡が入らな
いように光硬化性樹脂と中心部より接合し、これを加圧
装置を用いて、静水圧0.2kgf/cm2 で加圧し
た。(Embodiment 2) A specific example of a method for laminating under a hydrostatic pressure is shown. First, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.7 ± 0.01 mm) was used as a flat substrate and placed on a surface-polished glass lower pressing platen. Next, an epoxy photocurable resin (viscosity 14
(00 cP) 0.5 ml was dripped from the cylinder. Subsequently, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.2 mm
± 0.01 mm) was used as a flat thin plate substrate and was bonded to a photo-curable resin from the center so as to prevent air bubbles from entering, and this was pressed at a hydrostatic pressure of 0.2 kgf / cm 2 using a pressure device.
【0034】これにより、2枚の石英基板に挟み込れた
光硬化性樹脂は、外径125mmの基板面内に展開し
た。樹脂の展開がなされた後、静水圧を作用させた状態
で紫外線照射を行った。紫外線の照射条件は、53mW
/cm2 で150秒とした。硬化後の樹脂厚みは、約4
0μmであった。また、今回の硬化条件において、光硬
化性樹脂のショアD硬度は87程度、ガラス基板に対す
る接着強度は約80kgf/cm2 になっていた。As a result, the photo-curable resin sandwiched between the two quartz substrates was spread within the substrate surface having an outer diameter of 125 mm. After the resin was developed, it was irradiated with ultraviolet rays under a hydrostatic pressure. UV irradiation conditions are 53mW
/ Cm 2 and 150 seconds. The resin thickness after curing is about 4
It was 0 μm. Under the curing conditions of this time, the Shore D hardness of the photocurable resin was about 87, and the adhesive strength to the glass substrate was about 80 kgf / cm 2 .
【0035】前記実施例2により得られた薄板貼り合わ
せ基板の表面凹凸を、触針式粗さ計に測定した。測定条
件は、実施例1と同様である。その結果、図5に示した
プロファイルと同様の結果が得られ、貼り合わせによる
微小うねりの発生は全く観察されなかった。The surface irregularities of the laminated thin substrate obtained in Example 2 were measured with a stylus roughness meter. The measurement conditions are the same as in Example 1. As a result, the same result as the profile shown in FIG. 5 was obtained, and the generation of microwaviness due to bonding was not observed at all.
【0036】(実施例3)高分子弾性体による加圧状態
で貼り合わせる方法の具体例を示す。まず、石英ガラス
基板(外径125mm、板厚0.5±0.01mm)を
平面基板として、表面研磨されたガラス製下部加圧定盤
の上に設置した。次に、エポキシ系光硬化性樹脂(粘度
1400cP)0.5mlをシリンダより滴下した。続
いて、石英ガラス基板(外径125mm、板厚0.2m
m±0.01mm)平面薄板基板として、気泡が入らな
いように光硬化性樹脂と中心部より接合し、これを厚み
5mmのシリコンゴムを介して、上部加圧定盤により圧
力10kgf/cm2 で加圧した。(Embodiment 3) A specific example of a method of laminating a polymer elastic body under pressure will be described. First, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.5 ± 0.01 mm) was used as a flat substrate and set on a surface-polished glass lower pressing platen. Next, 0.5 ml of the epoxy photocurable resin (viscosity 1400 cP) was dropped from the cylinder. Subsequently, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.2 m
(m ± 0.01 mm) As a flat thin plate substrate, it is bonded to a photo-curable resin from the center so that air bubbles do not enter, and this is pressed through a silicon rubber having a thickness of 5 mm with an upper pressure platen at a pressure of 10 kgf / cm 2. Pressurized with.
【0037】これにより、2枚の石英基板に挟み込れた
光硬化性樹脂は、外径125mmの基板面内に展開し
た。樹脂の展開がなされた後、加圧された状態で紫外線
照射を行った。紫外線の照射条件は、53mW/cm2
で150秒とした。硬化後の樹脂厚みは、約24μmで
あった。また、今回の硬化条件において、光硬化性樹脂
のショアD硬度は87程度、ガラス基板に対する接着強
度は約80kgf/cm2 になっていた。As a result, the photocurable resin sandwiched between the two quartz substrates was spread on the substrate surface having an outer diameter of 125 mm. After the development of the resin, ultraviolet irradiation was carried out under pressure. The ultraviolet irradiation conditions are 53 mW / cm 2
At 150 seconds. The resin thickness after curing was about 24 μm. Under the curing conditions of this time, the Shore D hardness of the photocurable resin was about 87, and the adhesive strength to the glass substrate was about 80 kgf / cm 2 .
【0038】前記実施例3により得られた薄板貼り合わ
せ基板の表面凹凸を、触針式粗さ計に測定した。測定条
件は、実施例1と同様である。その結果、図5に示した
プロファイルと同様の結果が得られ、貼り合わせによる
微小うねりの発生は全く観察されなかった。The surface irregularities of the laminated thin substrate obtained in Example 3 were measured with a stylus roughness meter. The measurement conditions are the same as in Example 1. As a result, the same result as the profile shown in FIG. 5 was obtained, and the generation of microwaviness due to bonding was not observed at all.
【0039】(実施例4)実施例1で示した、除圧状態
で貼り合わせる方法を用いて、平板型レンズアレイを製
造する方法の例を示す。まず、石英ガラス基板の表面
に、スパッタリング法により耐フッ酸性保護膜として、
Cr膜を形成した。次に、フォトレジストを塗布、露
光、現像をおこなうフォトリソグラフィによって、Cr
膜に所定のレンズ配列パターンで小開口を形成した。形
成した小開口配列は、六方格子配列であり、これにより
ハニカム型レンズアレイが得られる。この小開口の直径
は、最終的に得ようとするレンズの径よりも十分小さい
ことが望ましい。(Embodiment 4) An example of a method for manufacturing a flat lens array using the method of bonding in the depressurized state shown in Embodiment 1 will be described. First, as a hydrofluoric acid-resistant protective film on the surface of the quartz glass substrate by the sputtering method,
A Cr film was formed. Next, by photolithography in which a photoresist is applied, exposed, and developed, Cr
Small openings were formed in the film with a predetermined lens array pattern. The formed small aperture array is a hexagonal lattice array, whereby a honeycomb lens array is obtained. It is desirable that the diameter of the small opening is sufficiently smaller than the diameter of the lens to be finally obtained.
【0040】前記小開口を有するCr膜付き基板を、フ
ッ酸(HF)および界面活性剤としてドデシルベンゼン
スルホン酸ナトリウム(DBS)を含むエッチャントに
浸漬して、化学エッチングを行った。ここで、フッ酸お
よびドデシルベンゼンスルホン酸ナトリウムの濃度は、
それぞれ10重量%および0.1重量%とした。これに
より、Cr膜の小開口を始点として、石英ガラス基板の
表面が等方的にエッチングされ、ほぼ球体の一部分であ
る凹部が得られる。この第1段階のエッチングは、隣接
する凹部間に若干の幅をもった平坦な境界部を残した状
態で止める。The Cr film-coated substrate having the small openings was immersed in an etchant containing hydrofluoric acid (HF) and sodium dodecylbenzenesulfonate (DBS) as a surfactant to carry out chemical etching. Here, the concentrations of hydrofluoric acid and sodium dodecylbenzene sulfonate are
It was set to 10% by weight and 0.1% by weight, respectively. As a result, the surface of the quartz glass substrate is isotropically etched starting from the small opening of the Cr film, and a concave portion that is substantially a part of a sphere is obtained. This first-stage etching is stopped while leaving a flat boundary portion having a slight width between the adjacent concave portions.
【0041】次いで、石英ガラス基板表面からCr膜を
除去した後、先のエッチャントに再び浸漬して基板表面
全体をエッチングした。この2段階エッチングにより、
凹部周辺部でのエッチングが進行して、隣接凹部間の境
界部は、上端が先鋭な稜線となった。すなわち、平面視
でそれぞれが同一の6角形をなし、隣接する凹部同士が
密接した稠密充填配列となった。Then, after removing the Cr film from the surface of the quartz glass substrate, it was immersed again in the above etchant to etch the entire surface of the substrate. By this two-step etching,
Etching progressed in the peripheral portion of the recess, and the boundary between adjacent recesses became a ridgeline with a sharp upper end. That is, in a plan view, each has the same hexagonal shape, and the adjacent recesses are in a close-packed arrangement in which the adjacent recesses are in close contact with each other.
【0042】上述の石英ガラス基板を、表面研磨された
ガラス製下部加圧定盤の上に設置した。次に、エポキシ
系光硬化性樹脂(粘度1400cP)0.5mlをシリ
ンダより滴下した。続いて、石英ガラス基板(外径12
5mm、板厚0.2mm±0.01mm)を平面薄板基
板として、気泡が入らないように前記光硬化性樹脂と中
心部より接合した。これを表面研磨されたガラス製上部
部加圧台により、圧力5kgf/cm2 で加圧した。The above-mentioned quartz glass substrate was placed on a glass lower pressure platen whose surface was polished. Next, 0.5 ml of the epoxy photocurable resin (viscosity 1400 cP) was dropped from the cylinder. Subsequently, a quartz glass substrate (outer diameter 12
5 mm and a plate thickness of 0.2 mm ± 0.01 mm) was used as a flat thin plate substrate and was bonded to the photo-curable resin from the center so as to prevent air bubbles from entering. This was pressed at a pressure of 5 kgf / cm 2 by means of a surface-polished glass upper part pressure table.
【0043】これにより、2枚の石英基板に挟み込まれ
た光硬化性樹脂は、外径125mmの基板面内に展開し
た。樹脂の展開がなされた後、ガラス製上部部加圧台に
よる加圧を中止し、完全に圧力を除去した後、紫外線照
射を行った。紫外線の照射条件は、53mW/cm2 で
150秒とした。硬化後の樹脂厚みは、約38μmであ
った。As a result, the photocurable resin sandwiched between the two quartz substrates was spread on the substrate surface having an outer diameter of 125 mm. After the resin was developed, the pressurization by the glass upper part pressure table was stopped, the pressure was completely removed, and then the ultraviolet irradiation was performed. The ultraviolet irradiation conditions were 53 mW / cm 2 and 150 seconds. The resin thickness after curing was about 38 μm.
【0044】以上実施例4により得られたマイクロレン
ズ機能を有する薄板貼り合わせ基板の表面凹凸を、触針
式粗さ計にて測定した。測定条件は、実施例1と同様で
ある。その結果、その表面に凹凸を有する平面基板を貼
り合わせた場合でも、図5に示したプロファイルと同様
の結果が得られ、貼り合わせによる微小うねりの発生は
全く観察されなかった。The surface roughness of the thin-plate laminated substrate having the microlens function obtained in Example 4 was measured with a stylus roughness meter. The measurement conditions are the same as in Example 1. As a result, even when a flat substrate having concavities and convexities on its surface was attached, the same result as the profile shown in FIG. 5 was obtained, and the generation of microwaviness due to the attachment was not observed at all.
【0045】今回作製したマイクロレンズアレイのレン
ズ凸部の曲率半径は24.3μmであり、石英ガラスの
屈折率は1.46であり、充填した前記エポキシ系樹脂
の屈折率は1.595であった。He−Neレーザを用
いて平行光線を照射し、この前記レンズの焦点距離を測
定したところ、180μm(空気中)であることが分か
った。さらに、焦点位置付近におけるスポット径は5.
3μmであり、回折限界程度の優れた集光特性を有して
いることが分かった。The radius of curvature of the convex portion of the lens of the microlens array manufactured this time is 24.3 μm, the refractive index of quartz glass is 1.46, and the refractive index of the filled epoxy resin is 1.595. It was A He-Ne laser was used to irradiate parallel rays and the focal length of this lens was measured and found to be 180 μm (in air). Furthermore, the spot diameter near the focal position is 5.
It was 3 μm, and it was found that it had an excellent light-condensing property of about the diffraction limit.
【0046】さらに、得られたマイクロレンズ機能を有
する薄板貼り合わせ基板を用いて、液晶表示素子を構成
することができる。まず、前記貼り合わせ基板に、ブラ
ックマトリクス(遮光層)と透明対向電極をスパッタリ
ング法により形成し、液晶表示素子の対向基板とした液
晶表示素子を試作し、その光学特性評価を行った。Further, a liquid crystal display device can be constructed by using the obtained laminated thin substrate having a microlens function. First, a black matrix (light-shielding layer) and a transparent counter electrode were formed on the bonded substrate by a sputtering method, and a liquid crystal display element as a counter substrate of the liquid crystal display element was prototyped and its optical characteristics were evaluated.
【0047】その結果、このマイクロレンズ機能を有す
る薄板貼り合わせ基板を用いることによって、例えば入
射白色光の広がり角が±6度の場合でも、前記液晶表示
素子の明るさは、前記基板を用いない場合のそれに比べ
て、2.8倍明るいことが分かった。また、この液晶表
示素子は、微小うねりのない前記基板とTFT用石英ガ
ラス基板との間に液晶層を挟み込んだので、当該の液晶
層の厚みのバラツキが極力抑えられている。したがっ
て、表示の色ムラはまったく認められなかった。As a result, by using this thin-plate laminated substrate having a microlens function, the brightness of the liquid crystal display element does not use the substrate even when the spread angle of incident white light is ± 6 degrees. It was found to be 2.8 times brighter than that of the case. Further, in this liquid crystal display element, since the liquid crystal layer is sandwiched between the substrate having no minute waviness and the quartz glass substrate for TFT, the variation in the thickness of the liquid crystal layer is suppressed as much as possible. Therefore, no display color unevenness was observed.
【0048】以上の実施例4の例では、石英ガラス基板
にエッチング法により凹部を形成したが、同じく基板上
にゾルゲル溶液を供給し、これにスタンパーの形状を転
写する方法でも、凹部を形成することができる。In the above example of Example 4, the recess was formed in the quartz glass substrate by the etching method, but the recess is also formed by the method of supplying the sol-gel solution onto the substrate and transferring the stamper shape to the same. be able to.
【0049】また以上の実施例4の例では、マイクロレ
ンズ機能を有する基板は上述のエッチング法により形成
されたものであったが、イオン拡散法を用いたマイクロ
レンズ機能を有する基板でもよい。この場合、前記基板
はイオン拡散により反りを有していることが多いので、
上述した除圧状態で樹脂を硬化させる方法は用いること
ができない。したがって、実施例3に示した高分子弾性
体を介して加圧する方法を用いるとよい。Although the substrate having the microlens function is formed by the above-described etching method in the example of the fourth embodiment, it may be a substrate having the microlens function using the ion diffusion method. In this case, since the substrate often has a warp due to ion diffusion,
The above method of curing the resin in the depressurized state cannot be used. Therefore, it is preferable to use the method of applying pressure through the elastic polymer as shown in Example 3.
【0050】(比較例1)比較例として、加圧状態で硬
化、貼り合わせた例を示す。まず、石英ガラス基板(外
径125mm、板厚0.5±0.01mm)を、表面研
磨されたガラス製下部加圧定盤の上に設置した。次に、
エポキシ系光硬化性樹脂(粘度1400cP)0.5m
lをシリンダより滴下した。続いて、石英ガラス基板
(外径125mm、板厚0.2mm±0.01mm)
を、気泡が入らないように光硬化性樹脂と中心部より接
合し、これを表面研磨されたガラス製上部部加圧台によ
り、圧力5kgf/cm2 で加圧した。(Comparative Example 1) As a comparative example, an example of curing and bonding under pressure will be shown. First, a quartz glass substrate (outer diameter 125 mm, plate thickness 0.5 ± 0.01 mm) was placed on a surface-polished glass lower pressure platen. next,
Epoxy photocurable resin (viscosity 1400 cP) 0.5 m
1 was dropped from the cylinder. Subsequently, quartz glass substrate (outer diameter 125 mm, plate thickness 0.2 mm ± 0.01 mm)
Was bonded to the photo-curable resin from the center so that air bubbles did not enter, and this was pressed at a pressure of 5 kgf / cm 2 by a surface-polished glass upper part pressure table.
【0051】これにより、2枚の石英基板に挟み込れた
光硬化性樹脂は、外径125mmの基板面内に展開し
た。ガラス製上部加圧定盤により加圧された状態で、紫
外線照射による樹脂硬化を行った。紫外線の照射条件
は、53mW/cm2 で150秒とした。As a result, the photocurable resin sandwiched between the two quartz substrates was spread on the substrate surface having an outer diameter of 125 mm. The resin was cured by ultraviolet irradiation while being pressed by the upper press plate made of glass. The ultraviolet irradiation conditions were 53 mW / cm 2 and 150 seconds.
【0052】前記比較例1により得られた薄板貼り合わ
せ基板の表面凹凸を、触針式粗さ計に測定した。測定条
件は、実施例1と同様である。その結果、図7に示した
ように、振幅2μm周期10mm程度の短周期の微小う
ねりの発生が観察された。この短周期の微小うねりは、
基板間の樹脂の厚みのばらつきを反映したものである。The surface roughness of the laminated thin substrate obtained in Comparative Example 1 was measured with a stylus roughness meter. The measurement conditions are the same as in Example 1. As a result, as shown in FIG. 7, it was observed that minute undulations having a short period with an amplitude of 2 μm and a period of about 10 mm were generated. This short cycle of micro waviness
This reflects variations in resin thickness between substrates.
【0053】[0053]
【発明の効果】本発明によれば、樹脂展開後加圧を完全
に除去した状態で樹脂の光硬化および基板貼り合わせを
行う場合、加圧を行う上部加圧定盤、下部加圧定盤およ
び貼り合わせを行う平面薄板ガラスの表面凹凸に関係な
く挟み込んだ樹脂には不均一加圧が作用しないため樹脂
厚みのばらつきを生じることはなく、よって貼り合わせ
後の基板に樹脂厚みのばらつきに起因した微小うねりを
生じることがない。According to the present invention, when the resin is photo-cured and the substrates are bonded together after the pressure is completely removed after the resin is developed, the pressure is applied to the upper pressure platen and the lower pressure platen. Also, regardless of the surface irregularities of the flat thin glass to be bonded, uneven resin is not applied to the sandwiched resin, so there is no variation in resin thickness.Therefore, due to variation in resin thickness on the substrates after lamination The micro waviness does not occur.
【0054】また、加圧に静水圧を用いる場合や高分子
弾性体をもちいて加圧を行う場合には、加圧は作用する
ものの、極めて均一に作用するため樹脂厚みのばらつき
を生じることはなく、よって貼り合わせ後の基板に樹脂
厚みのばらつきに起因した微小うねりを生じることがな
い。When hydrostatic pressure is used for pressurization or when a polymer elastic body is used for pressurization, the pressurization works, but since it works extremely uniformly, variations in resin thickness are not caused. Therefore, the micro-waviness due to the variation in the resin thickness does not occur on the substrates after bonding.
【0055】さらに、得られた平面薄板ガラスの貼り合
わせ基板に平板型マイクロレンズの機能を具備させ、液
晶表示素子等の対向基板として使用する場合には、液晶
層の厚みばらつきを低減できるため表示素子の液晶層ば
らつきに起因した色むらを低減することができる。Furthermore, when the obtained laminated substrate of flat thin glass is provided with the function of a flat plate type microlens and is used as an opposing substrate for a liquid crystal display element or the like, it is possible to reduce variations in the thickness of the liquid crystal layer and display. It is possible to reduce color unevenness due to variations in the liquid crystal layer of the device.
【図1】加圧を完全に除去した条件下での平面薄板ガラ
スの貼り合わせ工程の概略。FIG. 1 is an outline of a process for laminating flat thin glass sheets under the condition that pressure is completely removed.
【図2】静水圧を加圧に用いた平面薄板ガラスの貼り合
わせ工程の概略。FIG. 2 is a schematic view of a process of laminating flat thin glass sheets using hydrostatic pressure for pressurization.
【図3】別の静水圧を加圧に用いた平面薄板ガラスの貼
り合わせ装置の例。FIG. 3 shows an example of a flat thin glass laminating apparatus using another hydrostatic pressure for pressurization.
【図4】高分子弾性体による加圧を用いた平面薄板ガラ
スの貼り合わせ工程の概略。FIG. 4 is a schematic view of a step of laminating flat thin glass sheets using pressure by a polymer elastic body.
【図5】本発明による貼り合わせガラスの表面プロファ
イル。FIG. 5 is a surface profile of a laminated glass according to the present invention.
【図6】本発明による貼り合わせガラスを用いた液晶表
示素子。FIG. 6 is a liquid crystal display device using a laminated glass according to the present invention.
【図7】従来法による貼り合わせガラスの表面プロファ
イル。FIG. 7 is a surface profile of a laminated glass according to a conventional method.
10 貼り合わせた平面基板 11 平面基板 12 平面薄板ガラス 13 マイクロレンズ機能を有する貼り合わせ基板 14 凹部を有する石英ガラス基板 15 薄厚石英ガラス基板 21 (透明)接着性樹脂 22 (エポキシ系)光硬化性樹脂 30 加圧装置 31 下部加圧定盤 32 上部加圧定盤 33 UV装置 34 UV線 40 静水圧装置 41 静水圧容器 42 流体(液体,気体) 43 Oリング 44 バルブ 45 ピストン 51 高分子弾性体 61 ブラックマトリクス 62 透明対向電極 63 薄膜トランジスタ(p−SiTFT) 64 透明画素電極 65 液晶層 71 TFT用石英ガラス基板 10 Laminated Flat Substrate 11 Flat Substrate 12 Flat Thin Glass 13 Laminated Substrate with Microlens Function 14 Quartz Glass Substrate with Recesses 15 Thin Quartz Glass Substrate 21 (Transparent) Adhesive Resin 22 (Epoxy) Photocurable Resin 30 Pressurizing Device 31 Lower Pressurizing Surface Plate 32 Upper Pressurizing Surface Plate 33 UV Device 34 UV Ray 40 Hydrostatic Pressure Device 41 Hydrostatic Pressure Container 42 Fluid (Liquid, Gas) 43 O Ring 44 Valve 45 Piston 51 Polymer Elastic Body 61 Black matrix 62 Transparent counter electrode 63 Thin film transistor (p-Si TFT) 64 Transparent pixel electrode 65 Liquid crystal layer 71 Quartz glass substrate for TFT
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松中 一郎 大阪府大阪市中央区道修町3丁目5番11号 日本板硝子株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ichiro Matsunaka 3-5-11 Doshomachi, Chuo-ku, Osaka-shi, Osaka Inside Nippon Sheet Glass Co., Ltd.
Claims (9)
板の片面に接着性樹脂を供給し、前記基板と前記平面薄
板ガラス基板とを前記樹脂供給面を挟み込むように配置
し、加圧手段により加圧して挟み込んだ前記樹脂を展開
した後、前記樹脂を硬化させて、前記基板と前記平面薄
板ガラス基板を貼り合わせる方法であって、 前記樹脂の展開は、平坦な加圧定盤を介して加圧される
ことにより行い、その後加圧を完全に除去した状態で、
樹脂の硬化および貼り合わせを行うことを特徴とする平
面基板の貼り合わせ方法。1. An adhesive resin is supplied to one surface of a flat substrate and / or a flat thin glass substrate, the flat thin glass substrate and the flat glass substrate are arranged so as to sandwich the resin feeding surface, and a pressing means is used to apply the resin. A method of expanding the resin sandwiched by pressing, curing the resin, and bonding the substrate and the flat thin glass substrate to each other, wherein the expansion of the resin is performed by applying a flat pressure platen. It is performed by being pressed, and after that, the pressure is completely removed,
A method for laminating a flat substrate, which comprises curing and laminating a resin.
板の片面に接着性樹脂を供給し、前記基板と前記平面薄
板ガラス基板とを前記樹脂供給面を挟み込むように配置
し、加圧手段により加圧して挟み込んだ前記樹脂を展開
した後、前記樹脂を硬化させて、前記基板と前記平面薄
板ガラス基板を貼り合わせる方法であって、 前記樹脂の展開は、少なくとも前記平面薄板ガラス基板
表面に、剛体を介することなく、加圧された流体を直接
作用させることによって行われ、さらにその加圧状態の
ままで、樹脂の硬化および貼り合わせを行うことを特徴
とする平面基板の貼り合わせ方法。2. An adhesive resin is supplied to one surface of a flat substrate and / or a flat thin glass substrate, the flat thin glass substrate and the flat glass substrate are arranged so as to sandwich the resin feeding surface, and pressure is applied by a pressing means. A method of adhering the substrate and the flat thin glass substrate after curing the resin sandwiched by pressing, curing the resin, and developing the resin, at least on the flat thin glass substrate surface, a rigid body. A method for laminating a flat substrate, which is carried out by directly acting a pressurized fluid without intervening, and further curing and laminating the resin in the pressurized state.
板の片面に接着性樹脂を供給し、前記基板と前記平面薄
板ガラス基板とを前記樹脂供給面を挟み込むように配置
し、加圧手段により加圧して挟み込んだ前記樹脂を展開
した後、前記樹脂を硬化させて、前記基板と前記平面薄
板ガラス基板を貼り合わせる方法であって、 前記樹脂の展開は、少なくとも前記薄板基板が平坦な高
分子弾性体を介して加圧されることによって行われ、さ
らにその加圧状態のままで、樹脂の硬化および貼り合わ
せを行うことを特徴とする平面基板の貼り合わせ方法。3. An adhesive resin is supplied to one surface of a flat substrate and / or a flat thin glass substrate, the flat thin glass substrate and the flat glass substrate are arranged so as to sandwich the resin feeding surface, and a pressing means is used to apply the resin. A method of laminating the resin sandwiched by pressing, curing the resin, and bonding the substrate and the flat thin glass substrate to each other. A method for laminating a flat substrate, which is performed by applying pressure through a body, and further curing and laminating the resin in the pressurized state.
合わせ方法において、 前記基板は石英ガラス基板であり、前記平面薄板ガラス
基板の板厚が、0.5mm以下である平面基板の貼り合
わせ方法。4. The method for laminating flat substrates according to claim 1, wherein the substrate is a quartz glass substrate, and the flat thin glass substrate has a thickness of 0.5 mm or less. How to match.
法において、 前記基板は石英ガラス基板であり、該基板の貼り合わせ
面側の表面は、微細な凹凸パターンを有しており、前記
接着性樹脂が前記微細凹凸パターンを埋める平面基板の
貼り合わせ方法。5. The method for laminating a flat substrate according to claim 4, wherein the substrate is a quartz glass substrate, and the surface on the laminating surface side of the substrate has a fine concavo-convex pattern. A method for laminating a flat substrate in which an adhesive resin fills the fine concavo-convex pattern.
わせ方法において、 前記接着性樹脂は、光硬化性樹脂であり、その粘性が1
から50ポアズである平面基板の貼り合わせ方法。6. The method for laminating flat substrates according to claim 1, wherein the adhesive resin is a photocurable resin and has a viscosity of 1
To 50 poise flat substrate bonding method.
わせ方法において、 前記接着性樹脂は、熱硬化性樹脂であり、その粘性が1
から50ポアズである平面基板の貼り合わせ方法。7. The method for laminating flat substrates according to claim 1, wherein the adhesive resin is a thermosetting resin and has a viscosity of 1
To 50 poise flat substrate bonding method.
略球面状または略円筒状の複数のアレイ状凹部を有する
ガラス基板と、前記ガラス基板よりも屈折率が高い透明
樹脂を前記アレイの凹部に充填することで凸またはレン
チキュラーレンズとする平板型レンズアレイの製造方法
において、 (a)前記ガラス基板が石英ガラスであり、該基板上に
耐フッ酸性保護膜を形成する工程 (b)前記保護膜に、所望のパターンを形成する工程 (c)前記ガラス基板を、フッ酸を含むエッチング液に
浸漬する工程 (d)凹部を形成した前記基板面に、前記基板より屈折
率の大きな硬化性透明樹脂を供給する工程 (e)平面薄板石英ガラス基板を気泡が入らないよう
に、前記薄板ガラス基板の中心部より前記樹脂に接合
し、続いて、平坦な加圧定盤を介して加圧されることに
より前記樹脂の展開を行う工程 (f)前記樹脂の展開後、その後加圧を完全に除去した
状態で、紫外線を照射するか加熱処理を行うことによ
り、樹脂の硬化および貼り合わせを行う工程 以上の工程を有することを特徴とする平板型レンズアレ
イの製造方法。8. A glass substrate having on its surface a plurality of substantially spherical or substantially cylindrical array-shaped recesses arranged one-dimensionally or two-dimensionally, and a transparent resin having a refractive index higher than that of the glass substrate of the array. In the method of manufacturing a flat-plate lens array in which concave portions are filled to form convex or lenticular lenses, (a) the glass substrate is quartz glass, and a hydrofluoric acid-resistant protective film is formed on the substrate (b) A step of forming a desired pattern on the protective film (c) A step of immersing the glass substrate in an etching solution containing hydrofluoric acid (d) A curability having a refractive index larger than that of the substrate on the surface of the substrate where the concave portion is formed Step of supplying transparent resin (e) A flat thin plate quartz glass substrate is bonded to the resin from the center of the thin glass substrate so that air bubbles do not enter, and then a flat pressure platen is attached. (F) After the resin is developed, the resin is cured by irradiating ultraviolet rays or performing heat treatment after the pressure is completely removed. And the process of bonding together The manufacturing method of the flat type lens array characterized by having the above process.
形成されたその断面形状が略半円形状を有する凸または
レンチキュラーレンズを1次元または2次元に配列した
平板型レンズアレイの製造方法において、 (a)前記ガラス基板は1価のアルカリイオンを含むガ
ラスであり、該基板上にイオン拡散阻止機能を有するチ
タン膜を形成する工程 (b)前記保護膜に、所望のパターンを形成する工程 (c)前記ガラス基板を、前記アルカリイオンより大き
なイオン半径を有する溶融塩中に浸漬し、レンズを形成
する工程 (d)レンズを形成した前記基板面上に、硬化性透明樹
脂を供給する工程 (e)平面薄板石英ガラス基板を気泡が入らないよう
に、前記薄板ガラス基板の中心部より前記樹脂に接合す
る工程 (f)前記樹脂の展開は、少なくとも前記薄板石英ガラ
ス基板が平坦な高分子弾性体を介して加圧されることに
よって行う工程 (g)前記樹脂の展開後、そのままの状態で、紫外線を
照射するか加熱処理を行うことにより、樹脂の硬化およ
び貼り合わせを行う工程 以上の工程を有することを特徴とする平板型レンズアレ
イの製造方法。9. A method of manufacturing a flat plate type lens array in which convex or lenticular lenses having a substantially semicircular cross section formed on the surface of a plane substrate by an ion diffusion method are arranged one-dimensionally or two-dimensionally, a) the glass substrate is a glass containing monovalent alkali ions, and a step of forming a titanium film having an ion diffusion blocking function on the substrate. b) a step of forming a desired pattern on the protective film. ) A step of immersing the glass substrate in a molten salt having an ionic radius larger than the alkali ion to form a lens (d) A step of supplying a curable transparent resin onto the surface of the substrate on which the lens is formed (e) ) Bonding the flat thin quartz glass substrate to the resin from the center of the thin glass substrate so that air bubbles do not enter (f) The development of the resin is small. Both are performed by pressing the thin quartz glass substrate through a flat polymer elastic body. (G) After the resin is developed, it is irradiated with ultraviolet rays or is subjected to heat treatment as it is, Steps of curing and bonding resin A method of manufacturing a flat lens array having the above steps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6074966A JPH07281165A (en) | 1994-04-13 | 1994-04-13 | Method for sticking plane substrate and production of flat plate type lens array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6074966A JPH07281165A (en) | 1994-04-13 | 1994-04-13 | Method for sticking plane substrate and production of flat plate type lens array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07281165A true JPH07281165A (en) | 1995-10-27 |
Family
ID=13562552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6074966A Pending JPH07281165A (en) | 1994-04-13 | 1994-04-13 | Method for sticking plane substrate and production of flat plate type lens array |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07281165A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004059350A1 (en) * | 2002-12-30 | 2004-07-15 | Koninklijke Philips Electronics N.V. | Liquid crystal component |
| KR100503903B1 (en) * | 2000-03-31 | 2005-07-26 | 미놀타가부시키가이샤 | Method and apparatus for producing a display panel |
| JP2007199609A (en) * | 2006-01-30 | 2007-08-09 | Dainippon Printing Co Ltd | Microlens evaluation board |
| WO2009078195A1 (en) * | 2007-12-14 | 2009-06-25 | Sharp Kabushiki Kaisha | Adhesive sheet and display device |
-
1994
- 1994-04-13 JP JP6074966A patent/JPH07281165A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100503903B1 (en) * | 2000-03-31 | 2005-07-26 | 미놀타가부시키가이샤 | Method and apparatus for producing a display panel |
| WO2004059350A1 (en) * | 2002-12-30 | 2004-07-15 | Koninklijke Philips Electronics N.V. | Liquid crystal component |
| JP2007199609A (en) * | 2006-01-30 | 2007-08-09 | Dainippon Printing Co Ltd | Microlens evaluation board |
| WO2009078195A1 (en) * | 2007-12-14 | 2009-06-25 | Sharp Kabushiki Kaisha | Adhesive sheet and display device |
| CN101883829A (en) * | 2007-12-14 | 2010-11-10 | 夏普株式会社 | Adhesive sheet and display device |
| JPWO2009078195A1 (en) * | 2007-12-14 | 2011-04-28 | シャープ株式会社 | Adhesive sheet and display device |
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