JPH0729630Y2 - 基板の回転乾燥装置 - Google Patents

基板の回転乾燥装置

Info

Publication number
JPH0729630Y2
JPH0729630Y2 JP1986070586U JP7058686U JPH0729630Y2 JP H0729630 Y2 JPH0729630 Y2 JP H0729630Y2 JP 1986070586 U JP1986070586 U JP 1986070586U JP 7058686 U JP7058686 U JP 7058686U JP H0729630 Y2 JPH0729630 Y2 JP H0729630Y2
Authority
JP
Japan
Prior art keywords
chamber
air
exhaust
substrate
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986070586U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62182539U (2
Inventor
徳幸 林
栄一郎 林
久雄 西沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP1986070586U priority Critical patent/JPH0729630Y2/ja
Priority to KR1019870004472A priority patent/KR920000678B1/ko
Priority to US07/047,169 priority patent/US4735000A/en
Publication of JPS62182539U publication Critical patent/JPS62182539U/ja
Application granted granted Critical
Publication of JPH0729630Y2 publication Critical patent/JPH0729630Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP1986070586U 1986-05-09 1986-05-09 基板の回転乾燥装置 Expired - Lifetime JPH0729630Y2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1986070586U JPH0729630Y2 (ja) 1986-05-09 1986-05-09 基板の回転乾燥装置
KR1019870004472A KR920000678B1 (ko) 1986-05-09 1987-05-07 기판의 회전 건조 장치
US07/047,169 US4735000A (en) 1986-05-09 1987-05-07 Apparatus for drying substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986070586U JPH0729630Y2 (ja) 1986-05-09 1986-05-09 基板の回転乾燥装置

Publications (2)

Publication Number Publication Date
JPS62182539U JPS62182539U (2) 1987-11-19
JPH0729630Y2 true JPH0729630Y2 (ja) 1995-07-05

Family

ID=13435810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986070586U Expired - Lifetime JPH0729630Y2 (ja) 1986-05-09 1986-05-09 基板の回転乾燥装置

Country Status (3)

Country Link
US (1) US4735000A (2)
JP (1) JPH0729630Y2 (2)
KR (1) KR920000678B1 (2)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03238819A (ja) * 1990-02-15 1991-10-24 Seiichiro Sogo 半導体材料の乾燥方法および装置
KR100248564B1 (ko) * 1992-04-07 2000-03-15 다카시마 히로시 스핀 드라이어
TW472296B (en) * 1999-05-25 2002-01-11 Ebara Corp Substrate treating apparatus and method of operating the same
US6272768B1 (en) 1999-11-12 2001-08-14 Michael J. Danese Apparatus for treating an object using ultra-violet light
US6457478B1 (en) 1999-11-12 2002-10-01 Michael J. Danese Method for treating an object using ultra-violet light
CN110762974B (zh) * 2019-11-07 2021-02-09 杭州晨昊纺织整理有限公司 一种用于纺织加工的布料烘干装置
CN112460949A (zh) * 2020-11-25 2021-03-09 江门市美亚纺织材料有限公司 一种用于纺织助剂加工的烘干设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1143151B (de) * 1954-02-10 1963-01-31 Licentia Gmbh Haushaltwaescheschleuder
JPS59115967A (ja) * 1982-12-20 1984-07-04 三菱電機株式会社 回転形乾燥機
JPS6210439U (2) * 1985-07-03 1987-01-22
JPS629635A (ja) * 1985-07-08 1987-01-17 Oki Electric Ind Co Ltd 半導体ウエハの回転乾燥装置
JPS6263930U (2) * 1985-10-14 1987-04-21

Also Published As

Publication number Publication date
KR870011662A (ko) 1987-12-26
JPS62182539U (2) 1987-11-19
KR920000678B1 (ko) 1992-01-20
US4735000A (en) 1988-04-05

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