JPH07308647A - Cleaning device support for cleaning equipment - Google Patents
Cleaning device support for cleaning equipmentInfo
- Publication number
- JPH07308647A JPH07308647A JP12819794A JP12819794A JPH07308647A JP H07308647 A JPH07308647 A JP H07308647A JP 12819794 A JP12819794 A JP 12819794A JP 12819794 A JP12819794 A JP 12819794A JP H07308647 A JPH07308647 A JP H07308647A
- Authority
- JP
- Japan
- Prior art keywords
- cleaned
- cleaning
- support
- objects
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning In General (AREA)
Abstract
(57)【要約】
【目的】 被洗浄物の液切りが確実にかつ容易に行える
被洗浄物支持具を提供する。
【構成】 ベース状の金属板を被洗浄物14とする被洗
浄物支持具の架台4の水平部に対し、5ないし20度の
角度を有する網板6とこの網板と並行して被洗浄物より
広く被洗浄物の2枚分より狭い間隙をもった複数の丸棒
の仕切り台8,10で構成した。
(57) [Summary] [Purpose] To provide a support for an object to be cleaned that can reliably and easily drain the object to be cleaned. Constitution: A net plate 6 having an angle of 5 to 20 degrees with respect to a horizontal portion of a pedestal 4 of an object-to-be-cleaned support having a base metal plate as an object to be cleaned 14, and a net plate 6 to be cleaned in parallel with the net plate. It is composed of a plurality of round bar partitions 8 and 10 having a gap wider than the object to be cleaned and narrower than two objects to be cleaned.
Description
【0001】[0001]
【産業上の利用分野】この発明は、液切り台が容易な洗
浄装置の被洗浄物支持具に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a support for an object to be cleaned of a cleaning device having an easy draining table.
【0002】[0002]
【従来の技術】被洗浄物は、水,アルカリ液,有機溶剤
等の洗浄液を満たした洗浄槽に被洗浄物が浸けられ、超
音波照射,撹拌,加熱等によって洗浄される。従来この
ようにして洗浄された被洗浄物は、洗浄液から引き上げ
られた後、すすぎ液によりすすがれた後、直接に熱風又
は真空乾燥される。2. Description of the Related Art An object to be cleaned is immersed in a cleaning tank filled with a cleaning solution such as water, an alkaline solution, an organic solvent, etc., and cleaned by ultrasonic irradiation, stirring, heating or the like. The object to be cleaned, which has been conventionally cleaned in this manner, is lifted from the cleaning liquid, rinsed with a rinse liquid, and then directly dried with hot air or vacuum.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、従来の
洗浄装置では被洗浄物は洗浄バスケット又はバレル用バ
スケットに入れられて洗浄されるので乾燥時に被洗浄物
どうしが重なっている部分は洗浄液又はすすぎ液が表面
張力を伴って乾燥しにくく、しみが発生する要因となっ
ていた。とくに被洗浄物が電力用半導体モジュール等に
使用される銅,鉄,アルミニウム等の金属板である場
合、被洗浄物どうしが重なりやすくしみの発生が多かっ
た。そこで複数の金属板の被洗浄物が接触しないように
複数の仕切り棒と下部に網目のバスケット又はバスケッ
ト内の支持具を設け、仕切り棒と仕切り棒との間に金属
板の被洗浄物をセットし洗浄を行い洗浄後乾燥させてい
る。However, in the conventional cleaning device, the objects to be cleaned are put into the cleaning basket or the basket for the barrel for cleaning, and therefore, the portions where the objects to be cleaned are overlapped at the time of drying are the cleaning liquid or the rinsing liquid. Was difficult to dry due to the surface tension, which was a factor causing stains. In particular, when the object to be cleaned is a metal plate such as copper, iron or aluminum used for a power semiconductor module or the like, the objects to be cleaned are likely to overlap with each other and stains often occur. Therefore, to prevent the objects to be cleaned of multiple metal plates from coming into contact with each other, install a plurality of partition bars and a mesh basket or a support in the basket at the bottom, and set the objects to be cleaned of metal plates between the partition bars. It is washed and dried after washing.
【0004】ところが、仕切り棒を設けたバスケット又
は支持具は水平にセットされるため金属板に付着した液
が金属板の下部の広い面積に付着するため液切りが不十
分となり洗浄液又はすすぎ液によるしみが発生しやすか
った。特に真空乾燥させる場合、しみの発生が多かっ
た。However, since the basket or the support provided with the partition bar is set horizontally, the liquid adhering to the metal plate adheres to a large area under the metal plate, so that the liquid draining is insufficient and the cleaning liquid or the rinsing liquid is used. Blots were easy to occur. In particular, when vacuum-dried, stains were often generated.
【0005】[0005]
【課題を解決するための手段】上記課題を解決するため
に、本発明は、ベース状の金属板を被洗浄物とする洗浄
装置の被洗浄物支持具において、架台の水平部に対し5
ないし20度の角度を有する網板と、この網板と並行し
て上記被洗浄物より広く被洗浄物の2枚分より狭い間隙
を有する複数の丸棒で構成される仕切り台を設けたもの
である。In order to solve the above-mentioned problems, the present invention provides an object to be cleaned support of a cleaning apparatus having a base metal plate as an object to be cleaned, in which the horizontal portion of the pedestal is 5 times.
Or a partition board composed of a net plate having an angle of 20 degrees and a plurality of round bars arranged in parallel with the net plate and having a gap wider than the object to be cleaned and narrower than two objects to be cleaned. Is.
【0006】また、仕切り台がテフロンコーティングさ
れている。Further, the partition table is coated with Teflon.
【0007】[0007]
【作用】仕切り台の隣り合う丸棒の間の間隙により被洗
浄物を1枚毎セットすることができ、被洗浄物がそれぞ
れ重なることがなく洗浄及び液切りが行える。また、網
板が架台に対し5ないし20度の角度を設けられて洗浄
液が液切り時最下部に移動し確実に液切りされる。The objects to be cleaned can be set one by one by the gap between the adjacent round bars on the partitioning table, and the objects to be cleaned can be washed and drained without overlapping. Further, the net plate is provided at an angle of 5 to 20 degrees with respect to the gantry, so that the cleaning liquid moves to the lowermost portion when the liquid is drained, so that the liquid is drained reliably.
【0008】また、仕切り台のテフロン加工により洗浄
液が仕切り台から弾かれ確実な液切りになる。Further, the cleaning liquid is repelled from the partition by Teflon processing of the partition to ensure reliable drainage.
【0009】[0009]
【実施例】次にこの発明をその一実施例を示した図1と
ともに説明する。2は電力用半導体モジュール等に使用
される銅,鉄,アルミニウム等のベース状の金属板の被
洗浄物を支持する支持具本体である。4は支持具本体の
架台でありこの架台4には架台の水平部5に対してゆる
やかな角度たとえば5〜20度を有する網板6とこの網
板6と並行して例えばステンレス製で機械的強度を持ち
かつ細い経の丸棒を複数個並列に並べた仕切り台8,1
0を2段に設ける。また、隣り合う丸棒の間隙は被洗浄
物の厚みよりやや広く2枚分の厚みより狭い間隙に選ば
れている。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to FIG. Reference numeral 2 denotes a support body for supporting an object to be cleaned, which is a base-shaped metal plate made of copper, iron, aluminum or the like used in a power semiconductor module or the like. Reference numeral 4 denotes a frame of the main body of the support, and the frame 4 has a mesh plate 6 having a gentle angle, for example, 5 to 20 degrees with respect to the horizontal portion 5 of the frame, and a mesh plate made of stainless steel in parallel with the mesh plate 6 mechanically A partitioning stand with a number of round rods of strong strength and thin side by side arranged in parallel
0 is set in two stages. The gap between the adjacent round bars is selected to be slightly wider than the thickness of the objects to be cleaned and narrower than the thickness of two sheets.
【0010】被洗浄物を洗浄する場合には、仕切り台
8,10を構成する丸棒と隣り合う丸棒との間の間隙1
2に金属板の被洗浄物14を挿入し、被洗浄物をセット
し、図示しない洗浄槽の洗浄液に浸潰し、超音波照射,
洗浄液の撹拌,加熱等によって洗浄する。洗浄後支持具
本体を洗浄槽から引き上げると、洗浄液は下に移動し網
板を介して落下する。When cleaning the object to be cleaned, a gap 1 between the round bars forming the partitioning stands 8 and 10 and the adjacent round bars.
2, the object to be cleaned 14 of a metal plate is inserted, the object to be cleaned is set, and the object is immersed in a cleaning solution in a cleaning tank (not shown), and ultrasonic waves are applied.
Wash the washing solution by stirring and heating. When the support body is pulled up from the cleaning tank after cleaning, the cleaning liquid moves downward and drops through the mesh plate.
【0011】このとき洗浄液は、被洗浄物の最下部に移
動するので、液切りが確実に行われしみが残りにくい。
また、被洗浄物間が接触することもなく被切り台と被洗
浄物の接触する面積が小さいので、乾燥が容易でしみが
残りにくい。また、仕切り台が丸棒で構成されているの
で被洗浄物を支持具本体に挿入及び取り出す際に傷を付
けることが少なくなる。At this time, the cleaning liquid moves to the lowermost part of the object to be cleaned, so that the liquid is surely drained and stains are less likely to remain.
Further, since the areas to be cleaned and the objects to be cleaned are small without contact between the objects to be cleaned, drying is easy and stains are less likely to remain. In addition, since the partition table is formed of a round bar, it is less likely to damage the object to be cleaned when inserting and removing it from the support body.
【0012】上記実施例では仕切り台を2段にしている
が被洗浄物の支持がしにくくなるが1段でもよい。ま
た、経済的に不利であるが3段以上でもよい。なお、網
板及び仕切り台の架台の水平部に対する角度が大きいと
被洗浄物が転がりやすくなり、また角度が小さいと液切
りが悪くなり5〜20度に選んでいる。また、仕切り台
及び網板のうち少なくとも仕切り台をテフロン加工する
と洗浄液あるいはすすぎ時のすすぎ液が液切り時に弾か
れ確実に短時間に液切りされるとともに被洗浄物を支持
具本体に挿入する際及び取り出す際に被洗浄物を傷付け
ることがない。また、仕切り台8、10は楕円等の丸い
丸棒又は円筒状の丸棒であってもよい。In the above-mentioned embodiment, the partitioning base has two stages, but it is difficult to support the object to be cleaned, but one stage may be used. Further, it is economically disadvantageous, but the number of stages may be three or more. If the angle of the mesh plate and the partition table with respect to the horizontal part of the gantry is large, the object to be cleaned is likely to roll, and if the angle is small, the drainage is poor and the range is selected to be 5 to 20 degrees. Also, if at least the partition of the partition and the mesh plate is made of Teflon, the cleaning liquid or the rinse liquid at the time of rinsing is repelled at the time of draining and surely drains in a short time and at the time of inserting the object to be cleaned into the support body. Also, the object to be cleaned is not damaged when taken out. The partitions 8 and 10 may be round bars such as ellipses or cylindrical bars.
【0013】[0013]
【発明の効果】この発明によると被洗浄物どうしが重な
ることがなくセットされ、従って被洗浄物の洗浄後及び
すすぎ後の液切りが確実にかつ容易に行うことができ
る。また被洗浄物を傷付けすることがない。According to the present invention, the objects to be cleaned are set without overlapping with each other, so that the liquid draining after cleaning and rinsing the objects to be cleaned can be reliably and easily performed. Moreover, the object to be cleaned is not damaged.
【図1】この発明の洗浄装置の被洗浄物の支持具の一実
施例の斜視図である。FIG. 1 is a perspective view of an embodiment of a support for an object to be cleaned of a cleaning device according to the present invention.
2 支持具本体 4 架台 6 網板 8,10 仕切り台 12 間隙 14 被洗浄物 2 Support body 4 Frame 6 Net plate 8 and 10 Partition table 12 Gap 14 Object to be cleaned
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 達規 大阪府大阪市東淀川区淡路2丁目14番3号 株式会社三社電機製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tatsunori Ito 2-14-3 Awaji, Higashiyodogawa-ku, Osaka-shi, Osaka Sansha Electric Co., Ltd.
Claims (2)
装置の被洗浄物支持具において、架台の水平部に対し5
〜20度の角度を有する網板と、この網板と並行して上
記被洗浄物よりやや広く上記被洗浄物の2枚分より狭い
間隙を有する複数の丸棒で構成される仕切り台を設けた
ことを特徴とする洗浄装置の被洗浄物支持具。1. In an object to be cleaned support of a cleaning device, wherein a base metal plate is used as an object to be cleaned.
There is provided a partition table composed of a mesh plate having an angle of -20 degrees and a plurality of round bars arranged in parallel with the mesh plate and having a gap slightly wider than the object to be cleaned and smaller than two sheets of the object to be cleaned. An object to be cleaned support for a cleaning device.
れている請求項1記載の洗浄装置の被洗浄物支持具。2. The cleaning object support for a cleaning device according to claim 1, wherein the partition table is coated with Teflon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12819794A JPH07308647A (en) | 1994-05-18 | 1994-05-18 | Cleaning device support for cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12819794A JPH07308647A (en) | 1994-05-18 | 1994-05-18 | Cleaning device support for cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07308647A true JPH07308647A (en) | 1995-11-28 |
Family
ID=14978866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12819794A Pending JPH07308647A (en) | 1994-05-18 | 1994-05-18 | Cleaning device support for cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07308647A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6129835B2 (en) * | 1980-10-24 | 1986-07-09 | Kobe Steel Ltd | |
| JPH062742B2 (en) * | 1987-06-17 | 1994-01-12 | 三井東圧化学株式会社 | Novel 2-pyrazolines and cerebrovascular disorder therapeutic agents containing the same |
-
1994
- 1994-05-18 JP JP12819794A patent/JPH07308647A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6129835B2 (en) * | 1980-10-24 | 1986-07-09 | Kobe Steel Ltd | |
| JPH062742B2 (en) * | 1987-06-17 | 1994-01-12 | 三井東圧化学株式会社 | Novel 2-pyrazolines and cerebrovascular disorder therapeutic agents containing the same |
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