JPH07331061A - Heat-resistant resin composition - Google Patents
Heat-resistant resin compositionInfo
- Publication number
- JPH07331061A JPH07331061A JP12388494A JP12388494A JPH07331061A JP H07331061 A JPH07331061 A JP H07331061A JP 12388494 A JP12388494 A JP 12388494A JP 12388494 A JP12388494 A JP 12388494A JP H07331061 A JPH07331061 A JP H07331061A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- resin composition
- polyamide resin
- sol
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 14
- 229920006015 heat resistant resin Polymers 0.000 title claims abstract description 11
- 229920006122 polyamide resin Polymers 0.000 claims abstract description 25
- -1 silane compound Chemical class 0.000 claims abstract description 25
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 19
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 19
- 229910000077 silane Inorganic materials 0.000 claims abstract description 15
- 239000002245 particle Substances 0.000 claims abstract description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 abstract description 10
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract description 2
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 description 14
- 239000000243 solution Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- JILPJDVXYVTZDQ-UHFFFAOYSA-N lithium methoxide Chemical compound [Li+].[O-]C JILPJDVXYVTZDQ-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- NKNIZOPLGAJLRV-UHFFFAOYSA-N 2,2-diphenylpropane-1,1-diamine Chemical compound C=1C=CC=CC=1C(C(N)N)(C)C1=CC=CC=C1 NKNIZOPLGAJLRV-UHFFFAOYSA-N 0.000 description 1
- YJGUVTBNQCVSQB-UHFFFAOYSA-N 2,2-diphenylpropanedioic acid Chemical compound C=1C=CC=CC=1C(C(O)=O)(C(=O)O)C1=CC=CC=C1 YJGUVTBNQCVSQB-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- XVBLEUZLLURXTF-UHFFFAOYSA-N 2,4-dimethylbenzene-1,3-diamine Chemical compound CC1=CC=C(N)C(C)=C1N XVBLEUZLLURXTF-UHFFFAOYSA-N 0.000 description 1
- UPQDHGRRFJDNOG-UHFFFAOYSA-N 2-(1,1-diphenylethyl)propanedioic acid Chemical compound C=1C=CC=CC=1C(C(C(O)=O)C(O)=O)(C)C1=CC=CC=C1 UPQDHGRRFJDNOG-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- GYFHQBFGEGTOGN-UHFFFAOYSA-N 2-n,2-n'-diphenylpropane-2,2-diamine Chemical compound C=1C=CC=CC=1NC(C)(C)NC1=CC=CC=C1 GYFHQBFGEGTOGN-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- NYRFBMFAUFUULG-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=C(N)C=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC(N)=C1 NYRFBMFAUFUULG-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- WAELEWZJUIEYHE-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline;4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1.NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WAELEWZJUIEYHE-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- KTFJPMPXSYUEIP-UHFFFAOYSA-N 3-benzoylphthalic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1C(O)=O KTFJPMPXSYUEIP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- INSQMADOBZFAJV-UHFFFAOYSA-N 4,4-diamino-n-phenylcyclohexa-1,5-diene-1-carboxamide Chemical compound C1=CC(N)(N)CC=C1C(=O)NC1=CC=CC=C1 INSQMADOBZFAJV-UHFFFAOYSA-N 0.000 description 1
- YQIMPOZJASMUNN-UHFFFAOYSA-N 4-(4,4-diaminocyclohexa-1,5-dien-1-yl)sulfonylcyclohexa-2,4-diene-1,1-diamine Chemical compound C1=CC(N)(N)CC=C1S(=O)(=O)C1=CCC(N)(N)C=C1 YQIMPOZJASMUNN-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- KYEFUIBOKLKQPD-UHFFFAOYSA-N 4-phenylbenzene-1,2-diamine Chemical group C1=C(N)C(N)=CC=C1C1=CC=CC=C1 KYEFUIBOKLKQPD-UHFFFAOYSA-N 0.000 description 1
- OAANYBFXMWXERP-UHFFFAOYSA-N 5,5-diamino-n-phenylcyclohexa-1,3-diene-1-carboxamide Chemical compound C1=CC(N)(N)CC(C(=O)NC=2C=CC=CC=2)=C1 OAANYBFXMWXERP-UHFFFAOYSA-N 0.000 description 1
- VZNUCJOYPXKLTA-UHFFFAOYSA-N 5-chlorobenzene-1,3-diamine Chemical compound NC1=CC(N)=CC(Cl)=C1 VZNUCJOYPXKLTA-UHFFFAOYSA-N 0.000 description 1
- DFWXYHZQNLIBLY-UHFFFAOYSA-N 5-nitrobenzene-1,3-diamine Chemical compound NC1=CC(N)=CC([N+]([O-])=O)=C1 DFWXYHZQNLIBLY-UHFFFAOYSA-N 0.000 description 1
- KOQDZLJGORGLNW-UHFFFAOYSA-N 5-phenylcyclohexa-2,4-diene-1,1-diamine Chemical group C1=CC(N)(N)CC(C=2C=CC=CC=2)=C1 KOQDZLJGORGLNW-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical class NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 1
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- YMHQVDAATAEZLO-UHFFFAOYSA-N cyclohexane-1,1-diamine Chemical compound NC1(N)CCCCC1 YMHQVDAATAEZLO-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000000578 dry spinning Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001891 gel spinning Methods 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical compound Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002737 metalloid compounds Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- HBJPJUGOYJOSLR-UHFFFAOYSA-N naphthalene-2,7-diamine Chemical compound C1=CC(N)=CC2=CC(N)=CC=C21 HBJPJUGOYJOSLR-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000002166 wet spinning Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は耐熱性の改良されたポリ
アミド系樹脂組成物に関する。更に詳しくはプリント配
線板の関連材料などとしても十分使用できる耐熱性を有
するポリアミドイミド樹脂に関する。FIELD OF THE INVENTION The present invention relates to a polyamide resin composition having improved heat resistance. More specifically, it relates to a polyamide-imide resin having heat resistance that can be sufficiently used as a material related to a printed wiring board.
【0002】[0002]
【従来の技術】ポリアミド樹脂、特に芳香族ポリアミド
樹脂は電気特性、機械特性、耐熱性に優れ、かつ加工性
に優れる為に繊維、フィルム、成形材等として幅広く利
用されている。しかし、例えばプリント配線板用の関連
材料として使用する場合は260℃以上の半田浴に耐
え、又、300℃以上の熱圧着にも耐えなければならな
いが、現在知られているポリアミド樹脂にはこの様な耐
熱性(熱軟化特性:例えば高温での弾性率等)はない。
さらに、一般的にポリアミド樹脂は熱分解特性、熱膨張
係数などの特性もポリイミド樹脂、或は無機材料等に比
べ劣っているのが現状である。2. Description of the Related Art Polyamide resins, particularly aromatic polyamide resins, are widely used as fibers, films, molding materials and the like because they are excellent in electrical properties, mechanical properties, heat resistance and processability. However, for example, when it is used as a related material for a printed wiring board, it must withstand a solder bath at 260 ° C or higher and thermocompression bonding at 300 ° C or higher. It does not have such heat resistance (heat softening property: elastic modulus at high temperature, etc.).
Furthermore, in general, polyamide resins are inferior in properties such as thermal decomposition characteristics and thermal expansion coefficient to polyimide resins or inorganic materials.
【0003】[0003]
【発明が解決しようとする課題】本発明の目的は、ポリ
アミド樹脂に金属酸化物を均一に分散させることによ
り、ポリアミド樹脂が本来有する良好な加工性を損なう
ことなく耐熱軟化特性(例えば高温での弾性率等)、耐
熱分解特性、熱寸法安定性などの耐熱性を改良すること
にある。An object of the present invention is to uniformly disperse a metal oxide in a polyamide resin so that heat softening characteristics (for example, at high temperature) can be obtained without impairing the good workability inherent in the polyamide resin. It is intended to improve heat resistance such as elastic modulus), thermal decomposition resistance, and thermal dimensional stability.
【0004】[0004]
【課題を解決するための手段】本発明者らは、前記目的
を達成する為に鋭意研究した結果、本発明に至った。即
ち、本発明は、ポリアミド樹脂に金属酸化物ゾルが分散
されてなる耐熱性樹脂組成物であり、又、シラン化合物
の存在下、或はあらかじめポリアミド樹脂にシラン化合
物を反応させてから金属酸化物ゾルが分散されている事
を特徴とする前記の耐熱性樹脂組成物であって、更には
金属酸化物ゾルの粒子径が10nmから100nmであ
ることを特徴とする前記の耐熱性樹脂組成物に関するも
のである。The present inventors have accomplished the present invention as a result of earnest research for achieving the above object. That is, the present invention is a heat resistant resin composition in which a metal oxide sol is dispersed in a polyamide resin, and the metal oxide is present in the presence of a silane compound or after the silane compound is reacted with the polyamide resin in advance. A heat-resistant resin composition as described above, characterized in that a sol is dispersed, and further characterized in that the metal oxide sol has a particle size of 10 nm to 100 nm. It is a thing.
【0005】本発明に用いるポリアミド樹脂は従来公知
の方法で合成することができる。例えばジイソシアネー
ト法、酸クロライド法、直接重合法等がある。工業的に
有利なジイソシアネート法の場合、ジイソシアネートの
1種或は2種以上と、ジカルボン酸の1種或は2種以上
とを有機溶媒中200℃以下の温度で互いに反応させる
ことによりえられる。The polyamide resin used in the present invention can be synthesized by a conventionally known method. For example, there are a diisocyanate method, an acid chloride method, a direct polymerization method and the like. The industrially advantageous diisocyanate method can be obtained by reacting one or more diisocyanates with one or more dicarboxylic acids in an organic solvent at a temperature of 200 ° C. or lower.
【0006】反応に使用される有機極性溶媒としてはジ
エチレングリコールジエチルエーテル、ジエチレングリ
コールジメチルエーテル等のエーテル類、シクロヘキサ
ノン、メチルエチルケトン等のケトン類、γ−ブチロラ
クトン、酢酸セロソルブ等のエステル類、N−メチル−
2−ピロリドン、ジメチルアセトアミド等のアミド類、
キシレン、トルエン等の芳香族炭化水素類、ジメチルス
ルホオキシド、スルホラン等のイオウ類、フェノール、
クレゾール等のフェノール類等が挙げられ、単独或は混
合物として用いるのが好ましい。Examples of the organic polar solvent used in the reaction include ethers such as diethylene glycol diethyl ether and diethylene glycol dimethyl ether, ketones such as cyclohexanone and methyl ethyl ketone, esters such as γ-butyrolactone and cellosolve acetate, and N-methyl-
Amides such as 2-pyrrolidone and dimethylacetamide,
Aromatic hydrocarbons such as xylene and toluene, sulfur such as dimethyl sulfoxide and sulfolane, phenol,
Examples thereof include phenols such as cresol and the like, and it is preferable to use them alone or as a mixture.
【0007】反応温度は通常50から200℃が好まし
く、また反応はイソシアネートと活性水素化合物の反応
にたいする触媒、例えばトリエチルアミン、ルチジン、
ピコリン、ウンデセン、トリエチレンジアミン等の3級
アミン類、リチウムメチラート、ナトリウムメチラー
ト、カリウムブトキサイト、フッ化カリウム、フッ化ナ
トリウム等のアルカリ金属、アルカリ土類金属化合物、
或はコバルト、チタニウム、スズ、亜鉛等の金属、半金
属化合物の存在下行ってもよい。The reaction temperature is usually preferably 50 to 200 ° C., and the reaction is a catalyst for the reaction of isocyanate with an active hydrogen compound, such as triethylamine, lutidine,
Tertiary amines such as picoline, undecene and triethylenediamine, alkali metal such as lithium methylate, sodium methylate, potassium butoxite, potassium fluoride and sodium fluoride, alkaline earth metal compound,
Alternatively, it may be carried out in the presence of a metal such as cobalt, titanium, tin or zinc, or a metalloid compound.
【0008】本発明に用いるポリアミド樹脂の組成につ
いては特に限定はないが、以下に示す酸成分、イソシア
ネート成分(或はアミン成分)の1種或は2種以上が好
適に使用できる。The composition of the polyamide resin used in the present invention is not particularly limited, but one or more of the following acid components and isocyanate components (or amine components) can be preferably used.
【0009】酸成分としては、シュウ酸、マロン酸、ア
ジピン酸、アゼライン酸、セバシン酸、ドデカン酸、イ
ソフタル酸、テレフタル酸、ジフェニルメタンジカルボ
ン酸、ジフェニルスルホンジカルボン酸、ジフェニルエ
ーテルジカルボン酸、ジフェニルスルフィドジカルボン
酸、ジフェニルエーテルジカルボン酸、ジフェニルスル
フィドジカルボン酸、ジフェニルプロパンジカルボン
酸、ベンゾフェノンジカルボン酸等のジカルボン酸の1
種或は2種以上が挙げられる。As the acid component, oxalic acid, malonic acid, adipic acid, azelaic acid, sebacic acid, dodecanoic acid, isophthalic acid, terephthalic acid, diphenylmethanedicarboxylic acid, diphenylsulfonedicarboxylic acid, diphenyletherdicarboxylic acid, diphenylsulfidedicarboxylic acid, 1 of dicarboxylic acids such as diphenyl ether dicarboxylic acid, diphenyl sulfide dicarboxylic acid, diphenyl propane dicarboxylic acid and benzophenone dicarboxylic acid
Species or two or more species may be mentioned.
【0010】アミン成分としては、ヘキサメチレンジア
ミン、テトラメチレンジアミン、4,4−ジアミノシク
ロヘキサン、4,4−ジアミノジシクロヘキシルメタ
ン、1,3−ビス−(アミノメチル)シクロヘキサン、
1,4−ビス(アミノメチル)シクロヘキサン、p−フ
ェニレンジアミン、m−フェニレンジアミン、4,4−
ジアミノジフェニルエーテル、3,3−ジアミノジフェ
ニルエーテル、4,4−ジアミノジフェニルメタン、
3,3−ジアミノジフェニルメタン、2,4−ジメチル
メタフェニレンジアミン、5−ニトロ−メタフェニレン
ジアミン、5−クロロ−メタフェニレンジアミン、4,
4−ジアミノジフェニルヘキサフルオロプロパン、3,
3−ジアミノジフェニルヘキサフルオロプロパン、4,
4−ジアミノフェニルスルホン、3,3−ジアミノジフ
ェニルスルホン、4,4−ジアミノジフェニルスルフィ
ド、3,3−ジアミノジフェニルスルフィド、4,4−
ジアミノベンゾフェノン、3,3−ジアミノベンゾフェ
ノン、3,4−ジアミノビフェニル、3,3−ジアミノ
ビフェニル、イソプロピリデンジアニリン、3,3−ジ
アミノジフェニルプロパン、2,4−トリレンジアミ
ン、3,3−ジアミノベンズアニリドロ、4,4−ジア
ミノベンズアニリド、0−トリジン、1,4−ナフタレ
ンジアミン、1,5−ナフタレンジアミン、2,6−ナ
フタレンジアミン、2,7−ナフタレンジアミン、2,
2−ビス(4−アミノフェニル)プロパン、2,2−ビ
ス(4−アミノフェニル)ヘキサフルオロプロパン、
1,3−ビス(3−アミノフェノキシ)ベンゼン、1,
4−ビス(4−アミノフェノキシ)ベンゼン、1,3−
ビス(4−アミノフェノキシ)ベンゼン、4,4−
〔1,3−フェニレンビス(1−メチルエチリデン)〕
ビスアニリン、4,4−〔1,4−フェニレンビス(1
−メチルエチリデン)〕ビスアニリン、3,3−〔1,
3−フェニレンビス(1−メチルエチリデン)〕ビスア
ニリン、2,2−ビス〔4−(4−アミノフェノキシ)
フェニル〕プロパン、ビス〔4−(3−アミノフェノキ
シ)フェニル〕プロパン、ビス〔4−(4−アミノフェ
ノキシ)フェニル〕スルホンビス〔4−(3−アミノフ
ェノキシ)フェニル〕スルホン、2,2−ビス〔4−
(4−アミノフェノキシ)フェニル〕ヘキサフルオロプ
ロパン、ビス〔4−(3−アミノフェノキシ)フェニ
ル〕スルホン、4,4−ビス(3−アミノフェノキシ)
ビフェニル、4,4−ビス(4−アミノフェノキシ)ビ
フェニル等、或はこれらのジイソシアネートの1種或は
2種以上の混合物が挙げられる。As the amine component, hexamethylenediamine, tetramethylenediamine, 4,4-diaminocyclohexane, 4,4-diaminodicyclohexylmethane, 1,3-bis- (aminomethyl) cyclohexane,
1,4-bis (aminomethyl) cyclohexane, p-phenylenediamine, m-phenylenediamine, 4,4-
Diaminodiphenyl ether, 3,3-diaminodiphenyl ether, 4,4-diaminodiphenylmethane,
3,3-diaminodiphenylmethane, 2,4-dimethylmetaphenylenediamine, 5-nitro-metaphenylenediamine, 5-chloro-metaphenylenediamine, 4,
4-diaminodiphenylhexafluoropropane, 3,
3-diaminodiphenylhexafluoropropane, 4,
4-diaminophenyl sulfone, 3,3-diaminodiphenyl sulfone, 4,4-diaminodiphenyl sulfide, 3,3-diaminodiphenyl sulfide, 4,4-
Diaminobenzophenone, 3,3-diaminobenzophenone, 3,4-diaminobiphenyl, 3,3-diaminobiphenyl, isopropylidene dianiline, 3,3-diaminodiphenylpropane, 2,4-tolylenediamine, 3,3-diamino Benzanilide, 4,4-diaminobenzanilide, 0-tolidine, 1,4-naphthalenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, 2,7-naphthalenediamine, 2,
2-bis (4-aminophenyl) propane, 2,2-bis (4-aminophenyl) hexafluoropropane,
1,3-bis (3-aminophenoxy) benzene, 1,
4-bis (4-aminophenoxy) benzene, 1,3-
Bis (4-aminophenoxy) benzene, 4,4-
[1,3-Phenylenebis (1-methylethylidene)]
Bisaniline, 4,4- [1,4-phenylenebis (1
-Methylethylidene)] bisaniline, 3,3- [1,
3-phenylene bis (1-methylethylidene)] bisaniline, 2,2-bis [4- (4-aminophenoxy)
Phenyl] propane, bis [4- (3-aminophenoxy) phenyl] propane, bis [4- (4-aminophenoxy) phenyl] sulfone bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [ 4-
(4-Aminophenoxy) phenyl] hexafluoropropane, bis [4- (3-aminophenoxy) phenyl] sulfone, 4,4-bis (3-aminophenoxy)
Examples thereof include biphenyl, 4,4-bis (4-aminophenoxy) biphenyl, and the like, or one or a mixture of two or more of these diisocyanates.
【0011】本発明に用いるポリアミド樹脂の分子量の
最適値は、各組成及び用途によって異なるがNーメチル
−2−ピロリドン中、30℃での対数粘度値で0.1か
ら3.0dl/g、好ましくは0.4から1.0dl/
gの範囲である。The optimum value of the molecular weight of the polyamide resin used in the present invention varies depending on each composition and use, but it is 0.1 to 3.0 dl / g in N-methyl-2-pyrrolidone at a logarithmic viscosity value at 30 ° C., preferably. Is 0.4 to 1.0 dl /
It is in the range of g.
【0012】本発明の耐熱性樹脂組成物において、ポリ
アミド樹脂中に分散されるゾルとしては例えば、シリ
カ、アルミナ、チタン、スズ、ボロン、ジルコニア等の
金属酸化物の1種或は2種以上の混合物が挙げられるが
特にシリカゾルが好ましい。In the heat-resistant resin composition of the present invention, the sol dispersed in the polyamide resin is, for example, one or more metal oxides such as silica, alumina, titanium, tin, boron and zirconia. A mixture may be mentioned, but silica sol is particularly preferable.
【0013】金属酸化物ゾルの平均粒子系は10nmか
ら100nmが好ましく、叉分散量は10wt%から4
0wt%が好ましい。粒子系が100nmをこえると耐
熱性の改良効果が少なく、叉分散性が悪くなる為フィル
ム等成形物の透明性が著しく損なわれる。叉、分散量が
40wt%をこえると成形物の機械的性質が損なわれ、
10wt%以下では耐熱性の改良効果が少ない。The average particle size of the metal oxide sol is preferably 10 nm to 100 nm, and the dispersion amount is 10 wt% to 4 nm.
0 wt% is preferable. When the particle size exceeds 100 nm, the heat resistance improving effect is small and the dispersibility is poor, so that the transparency of the molded product such as a film is significantly impaired. Moreover, if the dispersion amount exceeds 40 wt%, the mechanical properties of the molded product are impaired,
If it is 10 wt% or less, the effect of improving heat resistance is small.
【0014】本発明の耐熱性樹脂組成物において、ポリ
アミド樹脂中に金属酸化物ゾルを含有させる方法として
は、ポリマーの有機溶媒中、例えばN−メチル−2−ピ
ロリドン、ジメチルアセトアミド、フェノール、クレゾ
ール、ジエチレングリコールジメチルエーテル、キシレ
ン、シクロヘキサノン、ジメチルスルホオキシド、γ−
ブチロラクトンなどのポリマー溶液中で金属アルコキシ
ドのゾル−ゲル反応を行う方法、或は金属酸化物ゾル溶
液、例えばメタノール、イソプロピルアルコール、ブタ
ノール、エチレングリコール、キシレン、トルエン、メ
チルイソブチルケトン、ジメチルホルムアミド、ジメチ
ルアセトアミド、ジエチレングリコールジエチルエーテ
ル等の有機溶媒のゾル溶液或は水溶液を直接上記ポリマ
ーの有機溶媒溶液に配合、分散させる方法などがある
が、特に限定されるものではない。叉、上記のポリマー
溶液濃度、金属酸化物ゾル溶液濃度も特に限定されるも
のではないが、それぞれ、およそ10wt%から50w
t%の範囲である。In the heat-resistant resin composition of the present invention, the method for incorporating the metal oxide sol in the polyamide resin is, for example, N-methyl-2-pyrrolidone, dimethylacetamide, phenol, cresol, in an organic solvent of the polymer. Diethylene glycol dimethyl ether, xylene, cyclohexanone, dimethyl sulfoxide, γ-
Method for carrying out sol-gel reaction of metal alkoxide in polymer solution such as butyrolactone, or metal oxide sol solution such as methanol, isopropyl alcohol, butanol, ethylene glycol, xylene, toluene, methyl isobutyl ketone, dimethylformamide, dimethylacetamide , A sol solution or an aqueous solution of an organic solvent such as diethylene glycol diethyl ether, etc. may be directly blended and dispersed in the organic solvent solution of the above polymer, but the method is not particularly limited. Also, the concentration of the polymer solution and the concentration of the metal oxide sol solution are not particularly limited, but each is about 10 wt% to 50 w.
It is in the range of t%.
【0015】本発明において、ポリアミド樹脂中に金属
酸化物ゾルを含有させる場合、シラン化合物の存在下、
或はあらかじめポリアミド樹脂にシラン化合物を反応さ
せてから行うことにより、より均一な分散性が得られ
る。叉、シラン化合物に適当な反応性基を導入すること
によりポリマーの架橋反応がおこる為に、さらに耐熱性
が向上する。In the present invention, when the metal oxide sol is contained in the polyamide resin, in the presence of the silane compound,
Alternatively, a more uniform dispersibility can be obtained by previously reacting the polyamide resin with a silane compound. In addition, the introduction of a suitable reactive group into the silane compound causes a crosslinking reaction of the polymer, which further improves the heat resistance.
【0016】用いるシラン化合物としては、γ−グリシ
ドキシプロピルメチルジエトキシシラン、γ−グリシド
キシプロピルトリメトキシシラン、β−(3、4エポキ
シシクロヘキシル)エチルトリメトキシシラン、γ−メ
タクリロキシプロピルトリメトキシシラン、γ−アミノ
プロピルトリエトキシシラン、N−β(アミノエチル)
γ−アミノプロピルトリメトキシシラン、N−β(アミ
ノエチル)γ−アミノプロピルメチルジメトキシシラ
ン、N−フェニル−γ−アミノプロピルトリメトキシシ
ラン、γ−メルカプトプロピルトリメトキシシランなど
のシランカップリング剤、或はカルボキシル基、アミノ
基、シラノール基、メトキシ基、酸無水物基、エポキシ
基など適当な反応性基を導入したポリシロキサンのオイ
ル、ワニスなどの1種或は2種以上の混合物が挙げられ
る。The silane compound used is γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, β- (3,4epoxycyclohexyl) ethyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane. Methoxysilane, γ-aminopropyltriethoxysilane, N-β (aminoethyl)
A silane coupling agent such as γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane or γ-mercaptopropyltrimethoxysilane, or Examples thereof include one or a mixture of two or more such as polysiloxane oil and varnish into which a suitable reactive group such as a carboxyl group, an amino group, a silanol group, a methoxy group, an acid anhydride group and an epoxy group is introduced.
【0017】あらかじめポリアミド樹脂にシラン化合物
を反応させる場合にはポリマー重合前、適当な反応性基
を有するシラン化合物を添加し、重合と同時に反応させ
るか、あるいは重合終了後添加し、そのまま50から2
00℃の温度で反応させることにより達成できる。When the silane compound is reacted with the polyamide resin in advance, the silane compound having a suitable reactive group is added before the polymer is polymerized and reacted at the same time as the polymerization, or after the completion of the polymerization, 50 to 2 as it is.
This can be achieved by reacting at a temperature of 00 ° C.
【0018】シラン化合物の添加量の最適値は、ポリア
ミド樹脂及びシラン化合物の組成、分子量にもよるが、
ポリアミド樹脂固形分中1から50wt%、好ましくは
1から10wt%の範囲である。The optimum amount of the silane compound added depends on the composition and molecular weight of the polyamide resin and the silane compound,
It is in the range of 1 to 50 wt%, preferably 1 to 10 wt% in the polyamide resin solid content.
【0019】本発明の耐熱性樹脂組成物は、上記の如く
得られた金属酸化物ゾルが分散された樹脂溶液を、その
まま溶液キャスティング、湿式紡糸、乾式紡糸、ゲル紡
糸など従来公知の方法で成形加工できる。The heat-resistant resin composition of the present invention is obtained by molding the resin solution in which the metal oxide sol obtained as described above is dispersed by a known method such as solution casting, wet spinning, dry spinning or gel spinning. Can be processed.
【0020】成形品の形態には、特に限定はないが、フ
ィルム、繊維、中空繊維、パイプ、ボトル、などの成形
品である。用途についても、特に限定はないが、自動
車、化学プラント、航空・宇宙、機械、情報、電気・電
子用の部品、素材として使用できる。The form of the molded product is not particularly limited, but it may be a molded product such as a film, a fiber, a hollow fiber, a pipe or a bottle. The application is also not particularly limited, but it can be used as parts and materials for automobiles, chemical plants, aviation / space, machinery, information, electric / electronics.
【0021】以下、実施例により本発明をさらに詳しく
説明するが、これら実施例により本発明が限定されるも
のではない。Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.
【0022】[0022]
実施例1 ポリアミドイミドの重合 反応容器に下記重合成分を仕込み、窒素下、撹拌しなが
ら約1時間かけて180℃まで昇温した。その後約3時
間撹拌し、重合を終了した。 重合成分 アゼライン酸 1モル イソホロンジイソシアネート 1モル リチウムメチラート 0.001モル N−メチル−2−ピロリドン 1.5リットル 金属酸化物ゾルの分散 上記重合ワニスに、平均粒子径12.5nmのシリカゾ
ルのキシレン溶液(固形分濃度30%)を全固形分中シ
リカゾル固形分が20wt%となる様配合し、その後三
本ロールを1回通し分散した。 フィルムの作製 上記のポリアミド/シリカゾル溶液を、離型性ポリエス
テルフィルム上に乾燥後の厚みが20μmになるよう
に、アプリケータを用いて塗布し100℃で5分、14
0℃で10分乾燥した後、該離型性フィルムから剥離し
た。その後、完全に溶媒を除去する為に真空下、160
℃にて10時間、180℃にて10時間乾燥した。この
様にしてえられたフィルムの各種特性値を表1に示す。Example 1 Polymerization of Polyamideimide The following polymerization components were charged in a reaction vessel, and the temperature was raised to 180 ° C. under nitrogen with stirring for about 1 hour. Then, the mixture was stirred for about 3 hours to complete the polymerization. Polymerization component Azelaic acid 1 mol Isophorone diisocyanate 1 mol Lithium methylate 0.001 mol N-methyl-2-pyrrolidone 1.5 liter Dispersion of metal oxide sol Xylene solution of silica sol having an average particle diameter of 12.5 nm in the above-mentioned polymerization varnish. (Solid content concentration 30%) was blended so that the silica sol solid content was 20 wt% in the total solid content, and then dispersed by passing through a triple roll once. Preparation of Film The above polyamide / silica sol solution was applied on a releasable polyester film using an applicator so that the thickness after drying was 20 μm, and the temperature was 100 ° C. for 5 minutes.
After drying at 0 ° C. for 10 minutes, it was peeled from the release film. Then, under vacuum to completely remove the solvent, 160
It dried at 10 degreeC and 10 hours at 180 degreeC. Table 1 shows various characteristic values of the film thus obtained.
【0023】実施例2、3 ポリアミド樹脂、シリカゾルを表1の様に変える以外は
実施例1と同様にしてフィルムを作製した。各種特性値
を表1に示す。Examples 2 and 3 Films were prepared in the same manner as in Example 1 except that the polyamide resin and silica sol were changed as shown in Table 1. Table 1 shows various characteristic values.
【0024】実施例4 ポリアミドの重合 反応容器に、下記重合成分及びシラン化合物を仕込み、
窒素下、撹拌しながら約1時間かけて180℃まで昇温
し、その後約3時間撹拌し重合を終了した。 重合成分 アゼライン酸 1モル イソホロンジイソシアネート 1モル カルボキシル変性ポリジメチルシロキサン 1wt% (製品名:X−22−162A 信越化学(株)製) リチウムメチラート 0.001モル N−メチル−2−ピロリドン 1.5L 金属酸化物ゾルの分散 実施例1と同様にして、シリカゾルを分散溶液を調製し
た。 フィルムの作製 実施例1と同様にして、フィルムを作製した。得られた
フィルムの特性値を表1に示す。Example 4 Polymerization of Polyamide A reactor was charged with the following polymerization components and a silane compound,
Under nitrogen, the temperature was raised to 180 ° C. over about 1 hour with stirring, and then the mixture was stirred for about 3 hours to complete the polymerization. Polymerization component Azelaic acid 1 mol Isophorone diisocyanate 1 mol Carboxyl-modified polydimethylsiloxane 1 wt% (Product name: X-22-162A manufactured by Shin-Etsu Chemical Co., Ltd.) Lithium methylate 0.001 mol N-methyl-2-pyrrolidone 1.5L Dispersion of metal oxide sol In the same manner as in Example 1, a dispersion solution of silica sol was prepared. Production of Film A film was produced in the same manner as in Example 1. The characteristic values of the obtained film are shown in Table 1.
【0025】実施例5 重合成分のシラン化合物、シリカゾルを表1の様に変え
る以外は実施例4と同様にしてフィルムを作製した。各
種特性値を表1に示す。Example 5 A film was prepared in the same manner as in Example 4 except that the silane compound and the silica sol as the polymerization components were changed as shown in Table 1. Table 1 shows various characteristic values.
【0026】比較例1 重合成分を表1の様にする以外は、実施例1と同様にし
てフィルムを作製した。各種特性値を表1に示す。Comparative Example 1 A film was prepared in the same manner as in Example 1 except that the polymerization components shown in Table 1 were used. Table 1 shows various characteristic values.
【0027】[0027]
【表1】 [Table 1]
【0028】[0028]
【発明の効果】本発明の耐熱性樹脂組成物はポリアミド
樹脂に金属酸化物ゾルを均一に分散させているため、従
来のポリアミド樹脂に比べ、加工適性を損なうことな
く、熱軟化特性(例えば300℃での弾性率)、熱寸法
安定性、熱分解特性などの耐熱性が著しく改良すること
ができる。Since the heat-resistant resin composition of the present invention uniformly disperses the metal oxide sol in the polyamide resin, it has a heat-softening property (for example, 300) as compared with conventional polyamide resins without impairing processability. It is possible to remarkably improve heat resistance such as elastic modulus at ° C), thermal dimensional stability, and thermal decomposition characteristics.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山口 裕樹 滋賀県大津市堅田二丁目1番1号 東洋紡 績株式会社総合研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroki Yamaguchi 2-1-1 Katata, Otsu City, Shiga Prefecture Toyobo Co., Ltd.
Claims (3)
されてなる耐熱性樹脂組成物。1. A heat resistant resin composition comprising a metal oxide sol dispersed in a polyamide resin.
ポリアミド樹脂にシラン化合物を反応させてから金属酸
化物ゾルが分散されている事を特徴とする請求項1記載
の耐熱性樹脂組成物。2. The heat-resistant resin composition according to claim 1, wherein the metal oxide sol is dispersed in the presence of the silane compound or after the polyamide resin is reacted with the silane compound in advance.
100nmであることを特徴とする請求項1又は2記載
の耐熱性樹脂組成物。3. The heat resistant resin composition according to claim 1, wherein the metal oxide sol has a particle size of 10 nm to 100 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12388494A JPH07331061A (en) | 1994-06-06 | 1994-06-06 | Heat-resistant resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12388494A JPH07331061A (en) | 1994-06-06 | 1994-06-06 | Heat-resistant resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07331061A true JPH07331061A (en) | 1995-12-19 |
Family
ID=14871756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12388494A Pending JPH07331061A (en) | 1994-06-06 | 1994-06-06 | Heat-resistant resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07331061A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005120213A (en) * | 2003-10-16 | 2005-05-12 | Teijin Techno Products Ltd | Thermoplastic resin composition having excellent thermal dimensional stability |
| JP2006241473A (en) * | 2006-06-19 | 2006-09-14 | Dainippon Ink & Chem Inc | Composite of glass and polyamide |
| JP2023183788A (en) * | 2022-06-16 | 2023-12-28 | 住友化学株式会社 | Laminate, resin composition, and display device |
-
1994
- 1994-06-06 JP JP12388494A patent/JPH07331061A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005120213A (en) * | 2003-10-16 | 2005-05-12 | Teijin Techno Products Ltd | Thermoplastic resin composition having excellent thermal dimensional stability |
| JP2006241473A (en) * | 2006-06-19 | 2006-09-14 | Dainippon Ink & Chem Inc | Composite of glass and polyamide |
| JP2023183788A (en) * | 2022-06-16 | 2023-12-28 | 住友化学株式会社 | Laminate, resin composition, and display device |
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