JPH0735016B2 - Wrapping method - Google Patents

Wrapping method

Info

Publication number
JPH0735016B2
JPH0735016B2 JP63266884A JP26688488A JPH0735016B2 JP H0735016 B2 JPH0735016 B2 JP H0735016B2 JP 63266884 A JP63266884 A JP 63266884A JP 26688488 A JP26688488 A JP 26688488A JP H0735016 B2 JPH0735016 B2 JP H0735016B2
Authority
JP
Japan
Prior art keywords
processing
granite
lapping
surface plate
abrasive grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63266884A
Other languages
Japanese (ja)
Other versions
JPH02116468A (en
Inventor
文康 北野
正宏 池田
賢 西川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP63266884A priority Critical patent/JPH0735016B2/en
Publication of JPH02116468A publication Critical patent/JPH02116468A/en
Publication of JPH0735016B2 publication Critical patent/JPH0735016B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 利用産業分野 この発明は、ガラス、セラミックスなどのラッピング方
法に係り、定盤に加工中の砥粒の保持効果が高いみかげ
石を用い、すぐれた加工能率を有するラッピング加工方
法に関する。
Description: TECHNICAL FIELD The present invention relates to a lapping method for glass, ceramics, etc., which uses granite, which has a high effect of holding abrasive grains during processing, on a surface plate and has a high processing efficiency. Regarding

背景技術 ラッピングとは、被加工物を研磨基準面となる加工用定
盤(ラップ)と被加工物との間に、遊離研磨材たる所要
性状からなる砥粒を含むラップ液を介在させて、両者の
相対的運動により加工するもので、比較的簡単な設備、
機械にて極めて表面を寸法精度の正しい滑らかな仕上げ
面に加工することができ、現在の量産的な加工法のなか
では最も高い加工精度を得ることができる。
BACKGROUND ART Lapping is a lapping liquid containing abrasive grains having a required property as a free abrasive material, which is interposed between a processing surface plate (lap) serving as a polishing reference surface of a workpiece and the workpiece, It is processed by the relative movement of the two.
It is possible to machine the surface to a smooth finished surface with the correct dimensional accuracy, and it is possible to obtain the highest processing accuracy among the current mass-production processing methods.

例えば、ラッピングは、ブロックゲージを初めとするゲ
ージ類やボール、レンズ、オプティカルフラット等の光
学製品あるいは半導体結晶、フェライト等のセラミック
ス電子材料などの高精度加工に用いられる。
For example, lapping is used for high precision processing of gauges such as block gauges, balls, lenses, optical products such as optical flats, or semiconductor electronic materials and ceramic electronic materials such as ferrites.

従来技術の問題点 かかるラッピングには、研磨効率の高いこと、被加工材
の寸法、形状性が良いことが要求されるため、研磨中の
砥粒保持能力が問われ、ラップ液の性状並びに加工用定
盤の選定が重要とされていた。
Problems of the prior art Since such lapping requires high polishing efficiency and good size and shape of the work material, the ability to hold the abrasive grains during polishing is required, and the properties and processing of the lapping liquid It was considered important to select a surface plate.

かかるラッピングの定盤に用いられる材料の特性として
は、均質で緻密でキズや介在物がないこと、被加工材の
正確な寸法や形状を保つために不均一な磨耗がし難いこ
と、研磨中に砥粒を保持する能力を持つことなどが要求
されている。
The characteristics of the material used for the lapping platen are that it is homogeneous and dense, that there are no scratches or inclusions, that it is difficult to wear unevenly to maintain the correct size and shape of the workpiece, It is required to have the ability to hold abrasive grains.

従来は、定盤の材質として軟鉄、銅、すず、アルミニウ
ム等の金属材又は生ガラス、ソーダガラス等の非金属ラ
ップ材が用いられていた。
Conventionally, a metal material such as soft iron, copper, tin, or aluminum, or a non-metal wrap material such as raw glass or soda glass has been used as the material of the surface plate.

例えば、磁気ヘッド用フェライト素材の加工には、鏡面
ラップ等の精密ラップを必要とし、その前加工として砂
(WA,GC等)磨りの工程を必要とするが、この工程での
砂磨り用定盤の材質として、従来はSiO2を主成分とする
生ガラスを用いていた。
For example, the processing of ferrite material for magnetic heads requires precision laps such as mirror surface laps, and the sanding (WA, GC, etc.) polishing process is required as the pre-processing. Conventionally, raw glass containing SiO 2 as a main component has been used as the material of the board.

しかし、生ガラスの定盤を用いたラッピングでは、 1.研磨能率が低い。However, lapping using a raw glass surface plate has a low polishing efficiency.

2.砥粒(GC,WA等)の消費量が多い。2. High consumption of abrasive grains (GC, WA, etc.).

3.定盤の寿命が短い。3. The platen has a short life.

4.定盤材料が高価でかつ入手し難い、 等の欠点を有していた。4. The platen material had drawbacks such as being expensive and difficult to obtain.

発明の目的 この発明は、従来の加工用定盤の欠点をなくし、ガラ
ス、セラミックス、フェライト等の精密加工、砂磨り加
工時に、被加工材の寸法、形状性よく、高い研磨能率で
加工でき、さらに、加工用定盤の長寿命化を図ったラッ
ピング方法の提供を目的としている。
Object of the Invention This invention eliminates the drawbacks of conventional processing surface plates, glass, ceramics, precision processing of ferrite, etc., during sanding, the size of the workpiece, good shape, can be processed with high polishing efficiency, Further, another object of the present invention is to provide a lapping method for extending the service life of the processing surface plate.

発明の概要 この発明は、 被加工物の研磨基準面となる加工用定盤と被加工物との
間に砥粒を含むラップ液を介在させて、両者の相対的運
動により加工するラッピング方法において、 表面粗度が2μm以上のみかげ石にて構成した定盤を用
いることを特徴とするラッピング方法である。
SUMMARY OF THE INVENTION The present invention is a lapping method in which a lapping liquid containing abrasive grains is interposed between a processing surface plate, which serves as a polishing reference surface of a work piece, and the work piece, and the work is performed by relative motion of the two. The lapping method is characterized by using a surface plate composed of granite having a surface roughness of 2 μm or more.

発明の構成 この発明において、加工用定盤に用いるみかげ石は、花
崗岩あるいはこれに近似の石材を総称し、白みかげ石及
び黒みかげ石に大別される。
Structure of the Invention In this invention, granite used for the processing surface plate is a general term for granite or a stone material similar thereto, and is roughly classified into white granite and black granite.

花崗岩は、粒状の深成岩として知られ、カリ長石、曹長
石、灰曹長石、石英、黒雲母、白雲母などを含み、石
英、カリ長石、雲母の含有量によって、グレー、白、黒
等その石のみかけの色が決まる。
Granite is known as granular plutonic rock and includes potassium feldspar, albite, syenite feldspar, quartz, biotite, muscovite, etc. Depending on the content of quartz, potassium feldspar, and mica, the stones are gray, white, black, etc. The apparent color is decided.

黒みかげ石は、厳密には花崗岩とは別の、閃緑岩質から
斑れい岩質岩石のものをいい、暗緑色から灰黒色を呈し
ている。
Strictly speaking, black granite is a dioritic to gabbroic rock, which is different from granite, and is dark green to grayish black.

閃緑岩とは、中性斜長石、角閃石、および輝石を最も普
通の主成分とし、灰緑から暗緑色の中性深成岩である。
斑れい岩とは、カルシウム分の多い斜長石と、輝石を最
も普通の主成分鉱石として、かんらん石や角閃石も主成
分とすることがある。
Diorite is a neutral plutonic rock from grey-green to dark green, with neutral plagioclase, amphibolite, and pyroxene as the most common main components.
Gabbro is composed of plagioclase with high calcium content and pyroxene as the most common main component ore, and may also contain olivine and amphibolite as main components.

このようなみかげ石は、天然に多く存在し、また、みか
げ石は他に多くの用途を有しているが、この発明に用い
る場合は、数百mmの直径と数十mmの厚みが採れれば十分
であるため、容易に入手することができる。また、本発
明に用いるみかげ石は、白みかげ石でも黒みかげ石でも
よいが、黒みかげ石のほうが硬くなく、定盤の材質とし
て望ましい。
Such granite is abundant in nature, and granite has many other uses, but when used in the present invention, if a diameter of several hundred mm and a thickness of several tens of mm can be taken. Since it is sufficient, it can be easily obtained. The granite used in the present invention may be white granite or black granite, but black granite is not so hard and is preferable as a material for the surface plate.

この発明による定盤は、みかげ石を、例えば数百mmφお
よび数十の厚mmみに切り出して、表面をマスターラップ
等により研磨して、表面粗度2〜20μmにして用いる。
For the surface plate according to the present invention, granite is cut into, for example, several hundreds of mmφ and several tens of mm in thickness, and the surface is polished by a master lap or the like to have a surface roughness of 2 to 20 μm.

この発明において、みかげ石は、石を構成している粒子
が不均一のため、加工時において磨耗に対して弱い部分
が先に磨耗、又は脱落し、この部分が研磨の際の砥粒溜
まりとなって、加工中の砥粒の保持に著しい効果を有す
るものと考えられる。
In the present invention, granite, since the particles that make up the stone are non-uniform, the portion vulnerable to abrasion during processing is worn or dropped first, and this portion becomes an abrasive grain pool during polishing. Therefore, it is considered that it has a remarkable effect on the retention of the abrasive grains during processing.

従って、表面粗度が2μm未満では、加工時における砥
粒溜まりの効果がなく、また、20μmを越えると、被加
工物のエッジ部にチッピング等の欠けが発生するため好
ましくない。定盤の表面粗度が3μm〜10μmであるこ
とは、精度のよい加工表面を得るために好ましい。
Therefore, when the surface roughness is less than 2 μm, there is no effect of accumulating abrasive grains during processing, and when it exceeds 20 μm, chipping or the like is generated at the edge of the workpiece, which is not preferable. It is preferable that the surface roughness of the surface plate is 3 μm to 10 μm in order to obtain a processed surface with high accuracy.

被加工物としては、ガラス、各種セラミックス、粉末冶
金法による合金などに適用できるが、特に、フェライ
ト、Ti−Ba磁器などのセラミックスが適している。
The work piece can be applied to glass, various ceramics, alloys by powder metallurgy, etc., but ceramics such as ferrite and Ti—Ba porcelain are particularly suitable.

また、ラッピング剤としては、G.Cの#1500〜6000の砥
粒が好ましい。
Further, as the lapping agent, GC # 1500 to 6000 abrasive grains are preferable.

発明の効果 この発明によるラッピングは、定盤の材質が従来材と比
べて硬くないため、加工が容易で、安定した平面を有す
る定盤を容易に作成することができる。
EFFECTS OF THE INVENTION In the lapping according to the present invention, since the material of the surface plate is not harder than that of the conventional material, the processing is easy and the surface plate having a stable flat surface can be easily prepared.

さらに、ラップ液種類にかかわらず、被加工面の仕上が
り面にキズ等が生じにくく、且つ加工能率がよい。
Furthermore, regardless of the type of the lapping liquid, scratches and the like are unlikely to occur on the finished surface of the processed surface, and the processing efficiency is good.

また、研磨時に用いられるWAやGCなどの砥粒の消費量が
激減し、加工に要するコストが低減される。
Further, the consumption of abrasive grains such as WA and GC used during polishing is drastically reduced, and the cost required for processing is reduced.

実 施 例 以下、実施例を用いて本発明を詳述する。Examples Hereinafter, the present invention will be described in detail with reference to Examples.

生ガラス及び黒みかげ石を用いて、380mmφ×25mmtの定
盤を作成した。この定盤を用いて、180mmφのワーク張
り付け用円板に、ワークとして9×34×1.2tのMn−Znフ
ェライトを張り付け用円板に31本を放射状に張り付け
た。
A 380 mmφ × 25 mmt surface plate was made using raw glass and black granite. Using this surface plate, 9 × 34 × 1.2t Mn-Zn ferrite as a work was radially attached to the work attachment disk of 180 mmφ, and 31 pieces were radially attached to the attachment disk.

砥粒にはGC#3000を用いて、加工圧50g/cm2の条件で加
工を行った。ラップ加工の研磨代15μmを加工した結果
を第1表に示す。
GC # 3000 was used as the abrasive grains, and processing was performed under the processing pressure of 50 g / cm 2 . Table 1 shows the results of processing the lapping allowance of 15 μm.

第1表より明らかな如く、この発明のラッピングによ
り、砥石供給量は従来の72%で済み、加工時間は61%に
短縮され、それに伴い加工能率は165%に上昇した。
As is clear from Table 1, by the lapping of the present invention, the grindstone supply amount was 72% of the conventional amount, the processing time was shortened to 61%, and the processing efficiency was increased to 165% accordingly.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】被加工物の研磨基準面となる加工用定盤と
被加工物との間に砥粒を含むラップ液を介在させて、両
者の相対的運動により加工するラッピング方法におい
て、表面粗度が2μm以上のみかげ石にて構成した定盤
を用いることを特徴とするラッピング方法。
1. A lapping method in which a lapping liquid containing abrasive grains is interposed between a work surface plate serving as a polishing reference surface of a work piece and the work piece, and the work is performed by relative movement of the two. A lapping method characterized by using a surface plate composed of granite having a roughness of 2 μm or more.
JP63266884A 1988-10-21 1988-10-21 Wrapping method Expired - Lifetime JPH0735016B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63266884A JPH0735016B2 (en) 1988-10-21 1988-10-21 Wrapping method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63266884A JPH0735016B2 (en) 1988-10-21 1988-10-21 Wrapping method

Publications (2)

Publication Number Publication Date
JPH02116468A JPH02116468A (en) 1990-05-01
JPH0735016B2 true JPH0735016B2 (en) 1995-04-19

Family

ID=17436997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63266884A Expired - Lifetime JPH0735016B2 (en) 1988-10-21 1988-10-21 Wrapping method

Country Status (1)

Country Link
JP (1) JPH0735016B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6874490B2 (en) 2002-06-04 2005-04-05 Ford Global Technologies, Llc Method and system of adaptive learning for engine exhaust gas sensors

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6083083A (en) * 1994-04-22 2000-07-04 Kabushiki Kaisha Toshiba Separation type grinding surface plate and grinding apparatus using same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6874490B2 (en) 2002-06-04 2005-04-05 Ford Global Technologies, Llc Method and system of adaptive learning for engine exhaust gas sensors

Also Published As

Publication number Publication date
JPH02116468A (en) 1990-05-01

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