JPH0738013A - Composite base member and power semiconductor device - Google Patents
Composite base member and power semiconductor deviceInfo
- Publication number
- JPH0738013A JPH0738013A JP5201741A JP20174193A JPH0738013A JP H0738013 A JPH0738013 A JP H0738013A JP 5201741 A JP5201741 A JP 5201741A JP 20174193 A JP20174193 A JP 20174193A JP H0738013 A JPH0738013 A JP H0738013A
- Authority
- JP
- Japan
- Prior art keywords
- electrode pad
- insulating plate
- electrode
- electric insulating
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/501—Inductive arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/20—Arrangements for cooling
- H10W40/25—Arrangements for cooling characterised by their materials
- H10W40/255—Arrangements for cooling characterised by their materials having a laminate or multilayered structure, e.g. direct bond copper [DBC] ceramic substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/5363—Shapes of wire connectors the connected ends being wedge-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
- H10W72/5475—Dispositions of multiple bond wires multiple bond wires connected to common bond pads at both ends of the wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/59—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/926—Multiple bond pads having different sizes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/931—Shapes of bond pads
- H10W72/932—Plan-view shape, i.e. in top view
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
Landscapes
- Wire Bonding (AREA)
Abstract
(57)【要約】
【目的】インダクタンスが小さく,かつ複雑な回路構成
の半導体装置を比較的簡易で少ないな配線で構成するこ
とができるマウントベース及び電力用半導体装置を得る
こと。
【構成】一方の面に薄い金属部材の固着された第1の電
気絶縁板1と,この第1の電気絶縁板の他方の面に固着
された第1の電極パッド2と,第1の電極パッド2を挟
むように第1の電気絶縁板1上に配置され第1の電極パ
ッド2と固着される第2の電気絶縁板6と,第2の電気
絶縁板6に固着される第2の電極パッド3とを備え,第
1の電極パッド2はその一部分から延びる同体の導電端
子を有し,第2の電気絶縁板6は第1の電極パッド2の
少なくとも一部分を露出させる開口部を有するマウント
ベース,及び第1の電極パッド2に半導体素子5を固着
した電力用半導体装置。
(57) [Abstract] [Purpose] To obtain a mount base and a power semiconductor device, which can form a semiconductor device having a small inductance and a complicated circuit configuration with relatively simple and few wiring. A first electric insulating plate (1) having a thin metal member fixed to one surface, a first electrode pad (2) fixed to the other surface of the first electric insulating plate, and a first electrode. A second electric insulating plate 6 fixed to the first electrode pad 2 and arranged on the first electric insulating plate 1 so as to sandwich the pad 2, and a second electric insulating plate 6 fixed to the second electric insulating plate 6. An electrode pad (3), the first electrode pad (2) has a conductive terminal extending from a part thereof, and the second electrically insulating plate (6) has an opening exposing at least a part of the first electrode pad (2). A power semiconductor device having a semiconductor element 5 fixed to a mount base and a first electrode pad 2.
Description
【0001】[0001]
【産業上の利用分野】本発明は,セラミック基板のよう
な電気絶縁板に電極パッドを固着してなる複合ベース部
材,又はその複合ベース部材に固着された半導体素子を
備えた電力用半導体装置,特に大電力用のMOSFET
のような高速スイッチング半導体モジュールに適した電
力用半導体装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite base member formed by fixing electrode pads to an electric insulating plate such as a ceramic substrate, or a power semiconductor device having a semiconductor element fixed to the composite base member. Especially high power MOSFET
The present invention relates to a power semiconductor device suitable for such a high-speed switching semiconductor module.
【0002】[0002]
【従来の技術】電気絶縁板上に種々の方法で固着した金
属板からなる電極パッドに半導体素子をろう付してなる
電力用半導体装置としては,特開昭60ー103649
号公報,特開昭61ー140158号公報,特開昭62
ー209834号公報,或いは特開平4ー287952
号公報などに開示されたものがある。2. Description of the Related Art As a power semiconductor device in which a semiconductor element is brazed to an electrode pad made of a metal plate fixed on an electric insulating plate by various methods, there is disclosed in Japanese Patent Laid-Open No. 60-103649.
JP-A-61-140158, JP-A-62-140158
-209834, or Japanese Patent Laid-Open No. 4-287952
Some of them are disclosed in Japanese publications.
【0003】これらに開示された構造について,図9を
用いて電界効果トランジスタ(以下FETという)の例
を説明する。比較的厚い金属板からなる放熱板(図示せ
ず)に固着された電気絶縁板1の一方の主面1Aに,第
1の電極パッド2であるドレイン用電極パッド,第2の
電極パッド3であるソース用電極パッド,及び第3の電
極パッド4であるゲート用電極パッドが固着されてい
る。半導体素子5であるFETチップはその下面にドレ
イン電極(図示せず)を,またその上面に複数のソース
用小電極5Aとゲート電極5Bを備えており,ドレイン
電極はドレイン用電極パッド2にハンダ付けされ,ソー
ス用小電極5Aとゲート電極5Bはそれぞれソース用電
極パッド3,ゲート用電極パッド4にボンディングワイ
ヤ(図示せず)により接続される。そして第1,第2,
第3の電極パッド2,3,4それぞれにL字形の第1の
導電端子2A,第2の導電端子3A,第3の導電端子4
Aがハンダ付けされる。なお,3A’はソース用電極パ
ッド3にハンダ付けされる別の導電端子である。なお,
図示していないが,複数のソース用小電極5Aはそれぞ
れのボンディングワイヤで単一のソース用電極パッド3
に接続され,ゲート電極5Bもボンディングワイヤで第
3の電極パッド4に接続される。With respect to the structures disclosed in these documents, an example of a field effect transistor (hereinafter referred to as FET) will be described with reference to FIG. A drain electrode pad, which is the first electrode pad 2, and a second electrode pad 3 are formed on one main surface 1A of the electric insulating plate 1 fixed to a heat dissipation plate (not shown) made of a relatively thick metal plate. An electrode pad for a source and an electrode pad for a gate which is the third electrode pad 4 are fixed. The FET chip which is the semiconductor element 5 has a drain electrode (not shown) on its lower surface and a plurality of small source electrodes 5A and gate electrodes 5B on its upper surface. The drain electrode is soldered to the drain electrode pad 2 The source small electrode 5A and the gate electrode 5B are connected to the source electrode pad 3 and the gate electrode pad 4, respectively, by bonding wires (not shown). And first, second,
Each of the third electrode pads 2, 3 and 4 has an L-shaped first conductive terminal 2A, a second conductive terminal 3A, and a third conductive terminal 4
A is soldered. 3A ′ is another conductive terminal soldered to the source electrode pad 3. In addition,
Although not shown, the plurality of small source electrodes 5A are connected to a single source electrode pad 3 by each bonding wire.
The gate electrode 5B is also connected to the third electrode pad 4 by a bonding wire.
【0004】[0004]
【発明が解決しようとする課題】しかしこの構造をもつ
電力用半導体装置に限らず,従来の複合ベース部材にあ
っては電気絶縁板1の一方の主面1Aに,第1の電極パ
ッド2であるドレイン用電極パッド,第2の電極パッド
3であるソース用電極パッド,及び第3の電極パッド4
であるゲート用電極パッドすべてを平面的に固着してお
り,それらの大きさを必要以上に小さくできないので,
半導体装置のインダクタンスを十分に小さくできず,し
たがって高周波での動作に難点があった。また,ドレイ
ン用電極パッド2への半導体素子5の搭載位置決めに位
置決め工具を用いて行わねばならず,その上,第3の電
極パッド2,3,4それぞれに第1,第2,第3の導電
端子2A,3A,3A’,4Aをハンダ付けする工程が
必要なために,製造し難いという問題点があった。ま
た,複数の半導体素子及び他の電子部品素子を組み込む
場合にボンディングワイヤが交差したり,長くならざる
を得ないという欠点があった。However, not only the power semiconductor device having this structure but also the conventional composite base member is provided with the first electrode pad 2 on one main surface 1A of the electric insulating plate 1. A certain drain electrode pad, a source electrode pad that is the second electrode pad 3, and a third electrode pad 4
Since all of the gate electrode pads are fixed in a plane, and their size cannot be reduced more than necessary,
Since the inductance of the semiconductor device cannot be reduced sufficiently, there is a difficulty in operating at high frequencies. In addition, the positioning of the semiconductor element 5 on the drain electrode pad 2 must be performed by using a positioning tool, and the first, second, and third electrode pads 2, 3 and 4 can be mounted on the third electrode pad 2, 3, 4, respectively. Since the step of soldering the conductive terminals 2A, 3A, 3A ', 4A is required, there is a problem that it is difficult to manufacture. In addition, when incorporating a plurality of semiconductor elements and other electronic component elements, there are drawbacks in that the bonding wires must intersect and become longer.
【0005】本発明はこのような従来の問題点を解決
し,インダクタンスが小さく,比較的簡単な配線構成で
製造のし易い電力用半導体装置,及びこのような電力用
半導体装置を可能とする複合ベース部材を提供すること
を目的としている。The present invention solves the conventional problems described above, and has a small inductance, is easy to manufacture with a relatively simple wiring structure, and a composite that enables such a power semiconductor device. It is intended to provide a base member.
【0006】[0006]
【問題を解決するための手段】本発明は前述のような問
題を解決するため,一方の面に薄い金属板の固着された
第1の電気絶縁板と,該第1の電気絶縁板の他方の面に
固着された第1の電極パッドと,該第1の電極パッドを
挟むように前記第1の電気絶縁板上に配置され前記第1
の電極パッドと固着される第2の電気絶縁板と,該第2
の電気絶縁板に固着される第2の電極パッドとを備え,
前記第1の電極パッドはその一部分から延びる同体の導
電端子を有し,前記第2の電気絶縁板は前記第1の電極
パッドを露出させる開口部を有する複合ベース部材,又
はこの複合ベース部材を用いた電力用半導体装置を提供
するものである。In order to solve the above-mentioned problems, the present invention provides a first electric insulating plate having a thin metal plate adhered to one surface and the other of the first electric insulating plate. A first electrode pad fixed to the surface of the first electrode, and the first electrode pad disposed on the first electrical insulating plate so as to sandwich the first electrode pad.
A second electric insulating plate fixed to the electrode pad of the
A second electrode pad fixed to the electrical insulating plate of
The first electrode pad has a conductive terminal of the same body extending from a part thereof, and the second electrically insulating plate has a composite base member having an opening exposing the first electrode pad, or the composite base member. The present invention provides a power semiconductor device used.
【0007】[0007]
【実施例】以下図面により本発明の実施例を説明する。
先ず図1及び図2により本発明の一実施例を説明する
と,第1の電気絶縁板1は通常の方法でその金属化され
た裏面が薄い金属板1’を介して熱電導の良好な銅板な
どからなる放熱板(図示せず)に固着されるセラミック
基板のようなものからなり,第1の電気絶縁板1の予め
金属化された表面には薄い銅板などからなる第1の電極
パッド2がろう材などで固着される。第1の電極パッド
2からは,金属板の打ち抜き工程で第1の電極パッド2
と同時に形成された導電端子2Aが延び,導電端子2A
は取り付け用の丸穴2aを有する。Embodiments of the present invention will be described below with reference to the drawings.
First, referring to FIG. 1 and FIG. 2, an embodiment of the present invention will be described. The first electrical insulating plate 1 is a copper plate having a good thermal conductivity through a metal plate 1'having a thin metallized back surface in a usual manner. A first electrode pad 2 made of a thin copper plate or the like on the pre-metallized surface of the first electrically insulating plate 1 Is fixed with brazing material. From the first electrode pad 2, the first electrode pad 2 is punched in the metal plate punching process.
The conductive terminal 2A formed at the same time extends and the conductive terminal 2A
Has a round hole 2a for mounting.
【0008】次に本発明の特徴でもある開口部6Aを有
する第2の電気絶縁板6が第1の電極パッド2上に固着
される。第2の電気絶縁板6も表面及び裏面が予め金属
化されたセラミック基板のようなものであり,前述と同
様にろう材で固着される。開口部6Aは後述するが,半
導体素子5がその開口部内に入る大きさ以上の大きさを
持ち,開口部6Aが半導体素子5より若干大きい程度で
あれば,開口部6Aは半導体素子5の位置決めを行え
る。ここで,第1の電極パッド2は第2の電気絶縁板6
の開口部6Aより大きな面を持ち,開口部6A全面にわ
たって第1の電極パッド2が露出している。Next, the second electrically insulating plate 6 having the opening 6A, which is also a feature of the present invention, is fixed onto the first electrode pad 2. The second electric insulating plate 6 is also like a ceramic substrate whose front and back surfaces are metallized in advance, and is fixed with a brazing material as described above. Although the opening 6A will be described later, if the size of the semiconductor element 5 is larger than that of the semiconductor element 5 and the size of the opening 6A is slightly larger than that of the semiconductor element 5, the opening 6A is positioned for positioning the semiconductor element 5. Can be done. Here, the first electrode pad 2 is the second electrical insulating plate 6
Has a larger surface than the opening 6A, and the first electrode pad 2 is exposed over the entire surface of the opening 6A.
【0009】第2の電極パッド3はコの字状の部分を有
し,そのコの字状の部分は半導体素子5に沿って配置さ
れる。第2の電極パッド3は導電端子3A,3A’を有
し,第3の電極パッド4は導電端子4Aを有する。これ
ら電極パッド3と4は第2の電気絶縁板6にろう材など
により固着される。導電端子3A’と導電端子4Aは,
この間に制御信号電力が供給されるので,制御信号路を
できるだけ短くしてインダクタンスを小さくするため,
互いに近くに配置される。ここでは説明の都合上,それ
ぞれの部材を順次ろう付けしたが,実際の製造工程では
各部材,あるいはそれらの内の一部分の部材をろう材を
介して順次積み重ね,加圧力を加えた状態で加熱処理を
行うことにより,半導体素子5を搭載する複合ベース部
材7を作るのが合理的である。The second electrode pad 3 has a U-shaped portion, and the U-shaped portion is arranged along the semiconductor element 5. The second electrode pad 3 has conductive terminals 3A and 3A ', and the third electrode pad 4 has conductive terminals 4A. The electrode pads 3 and 4 are fixed to the second electric insulating plate 6 with a brazing material or the like. The conductive terminal 3A 'and the conductive terminal 4A are
Since the control signal power is supplied during this time, in order to minimize the inductance by making the control signal path as short as possible,
Placed close to each other. Here, for convenience of explanation, the respective members are sequentially brazed, but in the actual manufacturing process, the respective members, or a part of them, are sequentially stacked through the brazing material, and heated in a state in which a pressing force is applied. It is rational to make the composite base member 7 on which the semiconductor element 5 is mounted by performing the processing.
【0010】しかる後,半導体素子5を第2の電気絶縁
板6の開口部6Aに入れて半導体素子5の裏面に備えら
れた第1の主電流電極(図示せず)を第1の電極パッド
2にろう付けする。半導体素子5の上面には第2の主電
流電極5Aを備え,この第2の主電流電極5Aは半導体
素子5の上面にほぼ平行に2列に配置された複数の小電
極からなり,これら複数の小電極はそれぞれ長さの等し
いボンディングワイヤ8A,8Bにより,第2の電極パ
ッド3のコの字状部分の接続される。また,半導体素子
5の上面に形成された制御電極5Bはボンディングワイ
ヤ8Cにより第3の電極パッド4に接続される。その
後,半導体素子5は通常の絶縁処理が施され,必要があ
れば各導電端子2A,3A,3A’,4Aはほぼ直角に
折り曲げられる。Thereafter, the semiconductor element 5 is put in the opening 6A of the second electric insulating plate 6 and the first main current electrode (not shown) provided on the back surface of the semiconductor element 5 is attached to the first electrode pad. Braze to 2. A second main current electrode 5A is provided on the upper surface of the semiconductor element 5, and the second main current electrode 5A is composed of a plurality of small electrodes arranged in two rows substantially parallel to the upper surface of the semiconductor element 5. The small electrodes are connected to the U-shaped portion of the second electrode pad 3 by bonding wires 8A and 8B having the same length. The control electrode 5B formed on the upper surface of the semiconductor element 5 is connected to the third electrode pad 4 by the bonding wire 8C. After that, the semiconductor element 5 is subjected to the usual insulation treatment, and if necessary, the conductive terminals 2A, 3A, 3A ', 4A are bent at a substantially right angle.
【0011】この実施例では,第1の電極パッド2と第
2の電極パッド3とが第2の電気絶縁板6を挟んで向き
合っているので,第1の電極パッド2と第2の電極パッ
ド3を含む主電流路のインダクタンスは小さくなる。In this embodiment, the first electrode pad 2 and the second electrode pad 3 face each other with the second electric insulating plate 6 sandwiched therebetween, so that the first electrode pad 2 and the second electrode pad 3 are opposed to each other. The inductance of the main current path including 3 becomes small.
【0012】また,第2の電気絶縁板6の開口部6Aの
大きさを半導体素子5より若干大きくしておくことによ
り,開口部6Aで半導体素子5の位置決めをかなり正確
にできる。Also, by making the size of the opening 6A of the second electric insulating plate 6 slightly larger than that of the semiconductor element 5, the positioning of the semiconductor element 5 at the opening 6A can be made quite accurate.
【0013】さらに,半導体素子5の複数の小電極が長
さの等しいボンディングワイヤ8A,8Bにより第2の
電極パッド3のコの字状部分に接続されているので,更
にインダクタンスが小さくなり,良好な高周波動作を行
うことができる。Furthermore, since the plurality of small electrodes of the semiconductor element 5 are connected to the U-shaped portion of the second electrode pad 3 by the bonding wires 8A and 8B having the same length, the inductance can be further reduced, which is favorable. A high frequency operation can be performed.
【0014】さらにまた,制御信号用の導電端子4Aと
主電流の流れない導電端子3A’との間に制御信号を印
加する構造になっており,制御信号電流路のインダクタ
ンスが低減されているので,このことがさらに一層良好
な高周波動作を可能としている。なお,2a,3a,3
a’,4aは対応する導電端子2A,3A,3A’,4
Aにそれぞれ備えられた取付け用の丸穴である。Furthermore, the control signal is applied between the control signal conductive terminal 4A and the conductive terminal 3A 'through which the main current does not flow, and the inductance of the control signal current path is reduced. , This enables even better high frequency operation. In addition, 2a, 3a, 3
a ', 4a are corresponding conductive terminals 2A, 3A, 3A', 4
It is a round hole for attachment provided in each A.
【0015】次に図3により他の一実施例について説明
する。図1及び図2に示した記号と同一の記号は相当す
る部材を示すものとする。この実施例では第1の電気絶
縁板1上に導電端子2Aを備えた第1の電極パッド2と
導電端子4Aをもつ第3の電極パッド4とが配置され,
固着される。その上に開口部6Aとこれに比べて小さい
開口部6Bを備えた第2の電気絶縁板6が配置され固着
される。この状態では開口部6Aからは第1の電極パッ
ド2の一部分が露出し,小さい開口部6Bからは第3の
電極パッド4の一部分が露出する。その露出した第1の
電極パッド2に半導体素子5を固着し,また露出した第
3の電極パッド4に抵抗チップ9を固着する。Next, another embodiment will be described with reference to FIG. The same symbols as those shown in FIGS. 1 and 2 indicate corresponding members. In this embodiment, a first electrode pad 2 having a conductive terminal 2A and a third electrode pad 4 having a conductive terminal 4A are arranged on a first electrically insulating plate 1.
It is fixed. A second electric insulating plate 6 having an opening 6A and an opening 6B smaller than the opening 6A is arranged and fixed thereon. In this state, a part of the first electrode pad 2 is exposed from the opening 6A, and a part of the third electrode pad 4 is exposed from the small opening 6B. The semiconductor element 5 is fixed to the exposed first electrode pad 2, and the resistance chip 9 is fixed to the exposed third electrode pad 4.
【0016】次に第2の電気絶縁板6上に,半導体素子
5及び抵抗チップ9を露出させる大きさの窓部をもつ第
2の電極パッド3が固着され,この第2の電極パッド3
は対辺に導電端子3A,3A’を備えている。半導体素
子5の各第2の主電流電極5Aはそれぞれのボンディン
グワイヤ8A,8Bにより至近の第2の電極パッド3の
接続される。また,半導体素子5の制御電極5Bはボン
ディングワイヤ8Cにより抵抗チップ9に接続される。
したがって,制御電極5Bは抵抗チップ9を介して第3
の電極パッド4に接続されることになる。ここで流れる
電流に対するインダクタンスのバランスを図るため,導
電端子2Aは第1の電極パッド2の一辺のほぼ中央から
延び,導電端子3A,3A’は第2の電極パッド3の各
対辺のほぼ中央から延びている。導電端子4Aも同様に
第3の電極パッド4のほぼ中央から延びている。Next, a second electrode pad 3 having a window having a size exposing the semiconductor element 5 and the resistance chip 9 is fixed on the second electric insulating plate 6, and the second electrode pad 3 is fixed.
Has conductive terminals 3A and 3A 'on opposite sides. Each second main current electrode 5A of the semiconductor element 5 is connected to the adjacent second electrode pad 3 by the respective bonding wires 8A and 8B. The control electrode 5B of the semiconductor element 5 is connected to the resistance chip 9 by the bonding wire 8C.
Therefore, the control electrode 5B is connected to the third electrode via the resistor chip 9.
Will be connected to the electrode pad 4 of. In order to balance the inductance with respect to the current flowing here, the conductive terminal 2A extends from approximately the center of one side of the first electrode pad 2, and the conductive terminals 3A and 3A 'extend from approximately the center of each opposite side of the second electrode pad 3. It is extended. Similarly, the conductive terminal 4A extends from substantially the center of the third electrode pad 4.
【0017】ここで重要なことは,第1の電極パッド2
の導電端子2Aと第2の電極パッド3の導電端子3Aと
が空間を隔てて対向しており,かつ第2の電極パッド3
の導電端子3A’と第3の電極パッド4の導電端子4A
とが空間を隔てて対向していることである。これにより
主電流が流れる導電端子2Aと導電端子3Aのインダク
タンスは小さくなるから,この半導体装置の高周波応答
を更に改善でき,また,抵抗チップ9の位置決めが容易
となり,その機械的保護もできる。What is important here is that the first electrode pad 2
Of the second electrode pad 3 and the conductive terminal 3A of the second electrode pad 3 face each other with a space therebetween.
Conductive terminal 3A 'and conductive terminal 4A of the third electrode pad 4
And are facing each other across a space. This reduces the inductance of the conductive terminals 2A and 3A through which the main current flows, so that the high frequency response of this semiconductor device can be further improved, and the resistance chip 9 can be easily positioned and mechanically protected.
【0018】次に図4により本発明の他の一実施例につ
いて説明する。図1乃至図3に示した記号と同一の記号
は相当する部材を示すものとする。この半導体装置は,
図4(A)に示すようにMOS形電界効果トランジスタ
Tのゲートに抵抗Rを接続すると共に,そのドレインと
直列にショットキバリアダイオードSを直列に接続し,
かつそれらに跨がって高速のダイオードDを逆並列に接
続した実施例である。Next, another embodiment of the present invention will be described with reference to FIG. The same symbols as those shown in FIGS. 1 to 3 indicate corresponding members. This semiconductor device is
As shown in FIG. 4 (A), a resistor R is connected to the gate of the MOS field effect transistor T, and a Schottky barrier diode S is connected in series with its drain.
In addition, it is an embodiment in which a high-speed diode D is connected in anti-parallel across them.
【0019】同図(D)に示すように第1の電気絶縁板
1の上面には第1の電極パッド2,第3の電極パッド
4,及び第4の電極パッド10がろう材で固着されてい
る。電極パッド4,電極パッド10からはそれぞれ導電
端子4A,10Aが延びている。各電極パッドにおける
鎖線で囲んだ枠は後でMOS形電界効果トランジスタの
半導体ーチップなどが搭載される箇所を示している。As shown in FIG. 2D, the first electrode pad 2, the third electrode pad 4, and the fourth electrode pad 10 are fixed to the upper surface of the first electric insulating plate 1 by a brazing material. ing. Conductive terminals 4A and 10A extend from the electrode pad 4 and the electrode pad 10, respectively. A frame surrounded by a chain line in each electrode pad indicates a portion where a semiconductor chip of a MOS field effect transistor or the like will be mounted later.
【0020】第2の電気絶縁板6は,同図(C)に示す
ようにMOS形電界効果トランジスタTの半導体チップ
5が受け入れられる開口部6A,抵抗Rの抵抗チップ9
が受け入れられる開口部6B,ショットキバリアダイオ
ードSの半導体チップ11が受け入れられる開口部6
C,及びダイオードDの半導体チップ12が受け入れら
れる開口部6Dを備える。開口部6Dは後述するが,ボ
ンディングのためのスペース6dも有する。このような
第2の電気絶縁板6が同図(D)に示すようなアセンブ
リの上に配置され,ろう材などで各電極パッド2,4,
10及び導電端子4A,10Aの一部分に固着される。The second electrically insulating plate 6 has an opening 6A for receiving the semiconductor chip 5 of the MOS field effect transistor T and a resistor chip 9 of a resistor R, as shown in FIG.
6B for receiving the semiconductor chip 11 of the Schottky barrier diode S.
The semiconductor chip 12 including the diode C and the diode D is provided with an opening 6D. The opening 6D also has a space 6d for bonding, which will be described later. Such a second electric insulating plate 6 is arranged on the assembly as shown in FIG. 3D, and each electrode pad 2, 4, is made of a brazing material or the like.
10 and the conductive terminals 4A and 10A are partially fixed.
【0021】次に同図(B)に示すように,図3の実施
例と同様の第2の電極パッド3が第2の電気絶縁板6上
に固着され,第2の電気絶縁板6の各開口部6A〜6D
において露出せる各電極パッドに電子部品チップが搭載
され固着される。つまり,開口部6Aを通してMOS形
電界効果トランジスタTの半導体チップ5のドレイン電
極が第1の電極パッド2に固着され,開口部6Bを通し
て抵抗Rの抵抗チップ9が第3の電極パッド4に固着さ
れ,そして開口部6Cを通してショットキバリアダイオ
ードSの半導体チップ11のカソード電極が第1の電極
パッド2に固着され,さらにダイオードDの半導体チッ
プ12カソード電極が開口部6Dを通して第4の電極パ
ッド10に固着される。Next, as shown in FIG. 3B, the second electrode pad 3 similar to that of the embodiment of FIG. 3 is fixed on the second electric insulating plate 6, and the second electric insulating plate 6 is attached. Each opening 6A to 6D
An electronic component chip is mounted and fixed on each electrode pad exposed at. That is, the drain electrode of the semiconductor chip 5 of the MOS field effect transistor T is fixed to the first electrode pad 2 through the opening 6A, and the resistance chip 9 of the resistor R is fixed to the third electrode pad 4 through the opening 6B. , And the cathode electrode of the semiconductor chip 11 of the Schottky barrier diode S is fixed to the first electrode pad 2 through the opening 6C, and the cathode electrode of the semiconductor chip 12 of the diode D is fixed to the fourth electrode pad 10 through the opening 6D. To be done.
【0022】次にボンディングワイヤによる接続が行わ
れるが,半導体チップ5及び抵抗チップ9については図
3と同様であるので説明を省く。ショットキバリアダイ
オードSの半導体チップ11のアノード電極(図示せ
ず)は,複数の短いボンディングワイヤ8Dにより第4
の電極パッド10に接続される。そしてダイオードDの
半導体チップ12のアノード電極(図示せず)が複数の
短いボンディングワイヤ8Eにより第2の電極パッド3
に接続される。この実施例でも前に述べた効果が得られ
ると共に,半導体チップ11,12の位置決めも容易に
できる。Next, a bonding wire is used for connection, but the semiconductor chip 5 and the resistance chip 9 are the same as those in FIG. The anode electrode (not shown) of the semiconductor chip 11 of the Schottky barrier diode S is connected to the fourth electrode by a plurality of short bonding wires 8D.
Is connected to the electrode pad 10. The anode electrode (not shown) of the semiconductor chip 12 of the diode D is connected to the second electrode pad 3 by a plurality of short bonding wires 8E.
Connected to. In this embodiment as well, the effects described above can be obtained, and the semiconductor chips 11 and 12 can be easily positioned.
【0023】次に図5により半導体素子を並列配置にし
た他の一実施例について説明する。図1乃至図4に示し
た記号と同一の記号は相当する部材を示すものとする。
この実施例は基本的には図3のものと同じであり,第1
の電極パッド2には第2の電気絶縁板6の各開口部6
A,6A’を通して2つの半導体素子5と5’とが搭載
されると共に,開口部6B,6B’を通して2つの抵抗
チップ9,9’が搭載される。第2の電極パッド3は半
導体素子5と抵抗チップ9,半導体素子5’と抵抗チッ
プ9’に対応する2つの窓部を備えている。半導体素子
5’の複数の第2の主電流電極5A’のそれぞれも対応
するボンディングワイヤ8A’,8B’により至近の第
2の電極パッド3の接続され,制御電極5B’もボンデ
ィングワイヤ8C’により抵抗チップ9’に接続され
る。この実施例でも図3の半導体装置と同等の効果が得
られる。Next, another embodiment in which semiconductor elements are arranged in parallel will be described with reference to FIG. The same symbols as those shown in FIGS. 1 to 4 indicate corresponding members.
This embodiment is basically the same as that of FIG.
The electrode pad 2 of each of the openings 6 of the second electrical insulating plate 6
Two semiconductor elements 5 and 5 ′ are mounted through A and 6A ′, and two resistance chips 9 and 9 ′ are mounted through the openings 6B and 6B ′. The second electrode pad 3 is provided with the semiconductor element 5 and the resistance chip 9, and two windows corresponding to the semiconductor element 5'and the resistance chip 9 '. Each of the plurality of second main current electrodes 5A 'of the semiconductor element 5'is also connected to the corresponding second electrode pad 3 by the corresponding bonding wire 8A', 8B ', and the control electrode 5B' is also connected by the bonding wire 8C '. It is connected to the resistance chip 9 '. Also in this embodiment, the same effect as that of the semiconductor device of FIG. 3 can be obtained.
【0024】次に図6に示す実施例は,図4と図5の実
施例を組み合わせた半導体モジュールであり,同図
(A)に示すような回路を単一の半導体装置としたもの
である。図1乃至図5に示した記号と同一の記号は相当
する部材を示すものとする。Next, the embodiment shown in FIG. 6 is a semiconductor module in which the embodiments of FIGS. 4 and 5 are combined, and the circuit shown in FIG. 6A is made into a single semiconductor device. . The same symbols as those shown in FIGS. 1 to 5 indicate corresponding members.
【0025】同図(D)は,前記実施例と同様に単一の
第1の電気絶縁板(図示せず)に固着された第1の電極
パッド2,導電端子4Aを備える第3の電極パッド4及
び導電端子10Aを備える第4の電極パッド10を示
す。第1の電極パッド2には,MOS形電界効果トラン
ジスタT1,T2の半導体チップ5,5’,及びショッ
トキバリアダイオードS1,S2の半導体チップ11,
11’が搭載され,第3の電極パッド4には抵抗R1,
R2の抵抗チップ9,9’が固着される。そして第4の
電極パッド10上にはダイオードD1,D2のダイオー
ドチップ12,12’が搭載され固着される。第2の電
極パッド3は図4に示したものと同様に2つの窓部を有
し,第2の電気絶縁板6は図4に示したものを2枚並置
した構造になっている。この実施例も前記実施例と同様
な効果が得られる。FIG. 6D shows a third electrode having a first electrode pad 2 and a conductive terminal 4A fixed to a single first electrical insulating plate (not shown) as in the above embodiment. The 4th electrode pad 10 provided with the pad 4 and the conductive terminal 10A is shown. On the first electrode pad 2, semiconductor chips 5, 5'of MOS field effect transistors T1, T2, and semiconductor chips 11, Schottky barrier diodes S1, S2,
11 'is mounted, and the resistor R1,
The resistance chips 9, 9'of R2 are fixed. Then, the diode chips 12, 12 ′ of the diodes D 1, D 2 are mounted and fixed on the fourth electrode pad 10. The second electrode pad 3 has two windows similarly to that shown in FIG. 4, and the second electric insulating plate 6 has a structure in which two sheets shown in FIG. 4 are juxtaposed. In this embodiment, the same effect as the above embodiment can be obtained.
【0026】次に図7に示す実施例は,同図(A)に示
すようにMOS形電界効果トランジスタT1,T2を直
列接続してハーフブリッジ構成にした実施例であり,図
1乃至図6に示した記号と同一の記号は相当する部材を
示すものとする。Next, the embodiment shown in FIG. 7 is an embodiment in which MOS field effect transistors T1 and T2 are connected in series to form a half bridge structure as shown in FIG. Symbols that are the same as those shown in () indicate corresponding members.
【0027】同図(D)は,導電端子2Aを備える電極
パッド2,導電端子2’Aを備える電極パッド2’,導
電端子4Aを備える電極パッド4及び導電端子4’Aを
備える電極パッド4’を示し,前記実施例と同様に単一
の第1の電気絶縁板(図示せず)に固着される。電極パ
ッド2には,MOS形電界効果トランジスタT1の半導
体チップ5,電極パッド2’にはMOS形電界効果トラ
ンジスタT2の半導体チップ5’が搭載され,そして電
極パッド4には抵抗R1の抵抗チップ9,電極パッド
4’にはR2の抵抗チップ9’がそれぞれ固着される。FIG. 3D shows an electrode pad 2 having a conductive terminal 2A, an electrode pad 2'having a conductive terminal 2'A, an electrode pad 4 having a conductive terminal 4A and an electrode pad 4 having a conductive terminal 4'A. ', And is fixed to a single first electrical insulating plate (not shown) as in the previous embodiment. The semiconductor chip 5 of the MOS field effect transistor T1 is mounted on the electrode pad 2, the semiconductor chip 5'of the MOS field effect transistor T2 is mounted on the electrode pad 2 ', and the resistor chip 9 of the resistor R1 is mounted on the electrode pad 4. , R2 resistor chips 9'are fixed to the electrode pads 4 '.
【0028】同図(C)は,MOS形電界効果トランジ
スタT1の半導体チップ5のソース用の電極パッド3と
MOS形電界効果トランジスタT2の半導体チップ5’
ソース用の電極パッド3’を示す。電極パッド3は導電
端子3A’を有し,電極パッド3’は導電端子3’Aと
3’A’を有する。第2の電気絶縁板6は,開口部6A
と6B,6A’と6B’を有する他に,その中央部にボ
ンディング用の開口部6Eを備えている。その開口部6
Eを通して電極パッド2’の一部分が露出しており,ボ
ンディングワイヤ8BはMOS形電界効果トランジスタ
T1の半導体チップ5のソース用電極から電極パッド3
にボンディングされた後,続けて開口部6Eを通して一
部分が露出した電極パッド2’にボンディングされる。FIG. 3C shows the source electrode pad 3 of the semiconductor chip 5 of the MOS field effect transistor T1 and the semiconductor chip 5'of the MOS field effect transistor T2.
The electrode pad 3'for a source is shown. The electrode pad 3 has conductive terminals 3A ', and the electrode pad 3'has conductive terminals 3'A and 3'A'. The second electric insulating plate 6 has an opening 6A.
And 6B, 6A 'and 6B', and an opening 6E for bonding is provided in the center thereof. The opening 6
A part of the electrode pad 2'is exposed through E, and the bonding wire 8B extends from the source electrode of the semiconductor chip 5 of the MOS field effect transistor T1 to the electrode pad 3 '.
After being bonded to the electrode pad 2 ', a part of the electrode pad 2'is exposed through the opening 6E.
【0029】したがってこの構成によれば,MOS形電
界効果トランジスタT1とT2はボンディングワイヤ8
Bと電極パッド2’を通して直列接続され,導電端子2
Aと3’Aとが一対の主電流端子となり,導電端子2’
Aが交流出力端子となる。また,導電端子3A’と4
A,導電端子3’A’と4’Aの間に第1,第2のゲー
ト信号が印加される。この実施例においても,半導体モ
ジュール単体でハーフブリッジを構成し,できる限り電
流路及びゲート信号路を短くしたのでインダクタンスを
最小にでき,したがって高周波動作が可能な電力用MO
S形電界効果トランジスタを得ることができる。Therefore, according to this structure, the MOS field effect transistors T1 and T2 are connected by the bonding wire 8
B is connected in series through the electrode pad 2'and the conductive terminal 2
A and 3'A serve as a pair of main current terminals, and conductive terminals 2 '
A serves as an AC output terminal. In addition, the conductive terminals 3A 'and 4
A, first and second gate signals are applied between the conductive terminals 3'A 'and 4'A. Also in this embodiment, since the semiconductor module alone constitutes the half bridge and the current path and the gate signal path are made as short as possible, the inductance can be minimized, and therefore the power MO can be operated at a high frequency.
An S-type field effect transistor can be obtained.
【0030】次に図8に示す実施例は,図4(A)に示
す回路を2つ直列してハーフブリッジ構成にした実施例
であり,図1乃至図7に示した記号と同一の記号は相当
する部材を示すものとする。Next, the embodiment shown in FIG. 8 is an embodiment in which two circuits shown in FIG. 4A are connected in series to form a half-bridge structure, and the same symbols as those shown in FIGS. Indicates a corresponding member.
【0031】同図(D)は,電極パッド2と2’,導電
端子4Aを備える電極パッド4と導電端子4’Aを備え
る電極パッド4’,及び導電端子10Aを備える電極パ
ッド10と導電端子10’Aを備える電極パッド10’
を示し,前記実施例と同様に単一の第1の電気絶縁板
(図示せず)に固着される。電極パッド2にはMOS形
電界効果トランジスタT1の半導体チップ5とショット
キバリアダイオードS1の半導体チップ11が,また電
極パッド2’にはMOS形電界効果トランジスタT2の
半導体チップ5’とショットキバリアダイオードS2の
半導体チップ11’が搭載される。電極パッド4,4’
にはそれぞれ抵抗R1,R2の抵抗チップ9,9’が固
着され,また電極パッド10と10’にはそれぞれダイ
オードD1とD2のダイオードチップ12,12’が固
着される。FIG. 3D shows electrode pads 2 and 2 ', electrode pad 4 having conductive terminals 4A and electrode pad 4'having conductive terminals 4'A, and electrode pad 10 having conductive terminals 10A and conductive terminals. Electrode pad 10 'provided with 10'A
And is fixed to a single first electrical insulating plate (not shown) as in the previous embodiment. The semiconductor chip 5 of the MOS field effect transistor T1 and the semiconductor chip 11 of the Schottky barrier diode S1 are provided on the electrode pad 2, and the semiconductor chip 5'of the MOS field effect transistor T2 and the Schottky barrier diode S2 are provided on the electrode pad 2 '. A semiconductor chip 11 'is mounted. Electrode pad 4, 4 '
To the electrode pads 10 and 10 ', and the diode chips 12 and 12' of the diodes D1 and D2 are fixed to the electrode pads 10 and 10 ', respectively.
【0032】複数のボンディングワイヤ8Dは,ショッ
トキバリアダイオードS1の半導体チップ11のアノー
ド電極を第2の電気絶縁板6の開口部6Dのボンディン
グ用のスペース6dから露出する電極パッド10に接続
する。複数のボンディングワイヤ8Eは,ダイオードD
1のダイオードチップ12のアノード電極を電極パッド
3に接続した後,続いて第2の電気絶縁板6の中央部の
開口部6Eを通して電極パッド10に接続する。半導体
チップ11’とダイオードチップ12’については,ボ
ンディングワイヤ8D’8E’により図4と同様に接続
される。この実施例も前述実施例と同様な効果が得られ
る。The plurality of bonding wires 8D connect the anode electrode of the semiconductor chip 11 of the Schottky barrier diode S1 to the electrode pad 10 exposed from the bonding space 6d of the opening 6D of the second electric insulating plate 6. The plurality of bonding wires 8E are diodes D
After connecting the anode electrode of the first diode chip 12 to the electrode pad 3, it is subsequently connected to the electrode pad 10 through the opening 6E at the center of the second electric insulating plate 6. The semiconductor chip 11 'and the diode chip 12' are connected by bonding wires 8D'8E 'in the same manner as in FIG. In this embodiment, the same effect as the above-mentioned embodiment can be obtained.
【0033】なお,以上の実施例では半導体素子として
MOS形電界効果トランジスタについて述べたが,静電
誘導形半導体装置及びIGBT(絶縁ゲート形バイポー
ラトランジスタ)など比較的高周波応答の良好な電力用
半導体装置に適用しても前述と同様な効果が得られる。
また,図5乃至図8の実施例で,第2の電気絶縁板6は
標準化のために半導体素子と同数の電気絶縁板からなっ
ても良い。この場合,電気絶縁板と電気絶縁板との間に
適当な間隔を設けることにより,開口部6Eの代わりと
することができる。さらに,各電子部品素子の位置決め
がさほど要求されない場合には,第2の開口部はそれが
受け入れる電子部品素子よりかなり大きな面積のもので
も良く,また複数の電子部品素子を受け入れる任意の形
状でも良い。Although the MOS type field effect transistor has been described as the semiconductor element in the above embodiments, a power semiconductor device having a relatively high frequency response such as an electrostatic induction type semiconductor device and an IGBT (insulated gate type bipolar transistor). The same effect as described above can be obtained even when applied to.
Further, in the embodiment of FIGS. 5 to 8, the second electric insulating plate 6 may be composed of the same number of electric insulating plates as the semiconductor elements for standardization. In this case, the opening 6E can be used in place by providing an appropriate gap between the electric insulating plates. Further, if the positioning of each electronic component element is not so required, the second opening may have a considerably larger area than the electronic component element it receives, or it may have any shape for receiving a plurality of electronic component elements. .
【0034】[0034]
【発明の効果】以上述べたように,本発明によれば,主
電流路及び制御電流路のインダクタンスを小さくできる
ので,高周波応答の良好な電力用半導体装置を得ること
ができる。また,複雑な回路構成の半導体装置を比較的
簡易で少ないな配線で構成することができると同時に,
第2の電気絶縁板で各電子部品素子の位置決めもできる
ので,製造が容易となる。As described above, according to the present invention, since the inductance of the main current path and the control current path can be reduced, a power semiconductor device having a good high frequency response can be obtained. In addition, a semiconductor device having a complicated circuit configuration can be configured relatively easily with a small amount of wiring, and at the same time,
Since each electronic component element can be positioned by the second electric insulating plate, the manufacturing becomes easy.
【図1】本発明の一実施例を説明するための図である。FIG. 1 is a diagram for explaining an embodiment of the present invention.
【図2】本発明の他の一実施例を説明するための図であ
る。FIG. 2 is a diagram for explaining another embodiment of the present invention.
【図3】本発明の他の一実施例を説明するための図であ
る。FIG. 3 is a diagram for explaining another embodiment of the present invention.
【図4】本発明の他の一実施例を説明するための図であ
る。FIG. 4 is a diagram for explaining another embodiment of the present invention.
【図5】本発明の他の一実施例を説明するための図であ
る。FIG. 5 is a diagram for explaining another embodiment of the present invention.
【図6】本発明の他の一実施例を説明するための図であ
る。FIG. 6 is a diagram for explaining another embodiment of the present invention.
【図7】本発明の他の一実施例を説明するための図であ
る。FIG. 7 is a diagram for explaining another embodiment of the present invention.
【図8】本発明の他の一実施例を説明するための図であ
る。FIG. 8 is a diagram for explaining another embodiment of the present invention.
【図9】従来の半導体装置の一例を説明するための図で
ある。FIG. 9 is a diagram for explaining an example of a conventional semiconductor device.
1・・・・第1の電気絶縁板 2・・・・第1の電極パッド 2A・・・導電端子 3・・・・第2の電極パッド 3A・・・導電端子 4・・・・第3の電極パッド 4A・・・導電端子 5・・・・半導体素子 6・・・・第2の電気絶縁板 6A〜6E・・第2の電気絶縁板の開口部 7・・・・複合ベース部材 8A〜8E・・ボンディングワイヤ 9・・・・抵抗チップ 10・・・・第4の電極パッド 10A・・・導電端子 11・・・・半導体チップ 12・・・・ダイオードチップ 1 ... 1st electric insulation board 2 ... 1st electrode pad 2A ... conductive terminal 3 ... 2nd electrode pad 3A ... conductive terminal 4 ... 3rd Electrode pad 4A ... Conductive terminal 5 ... Semiconductor element 6 ... Second electrical insulating plate 6A to 6E ... Opening of second electrical insulating plate 7 ... Composite base member 8A 8E ... Bonding wire 9 ... Resistor chip 10 ... 4th electrode pad 10A ... Conductive terminal 11 ... Semiconductor chip 12 ... Diode chip
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 25/18 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication H01L 25/18
Claims (10)
1の電気絶縁板と,該第1の電気絶縁板の他方の面に固
着された第1の電極パッドと,該第1の電極パッドを挟
むように前記第1の電気絶縁板上に配置され前記第1の
電極パッドと固着される第2の電気絶縁板と,該第2の
電気絶縁板に固着される第2の電極パッドとを備え,前
記第1の電極パッドはその一部分から延びる導電端子を
有し,前記第2の電気絶縁板は前記第1の電極パッドの
少なくとも一部分を露出させる開口部を有することを特
徴とする複合ベース部材。1. A first electric insulating plate having a thin metal member fixed to one surface thereof, a first electrode pad fixed to the other surface of the first electric insulating plate, and the first electric insulating plate. A second electric insulating plate which is arranged on the first electric insulating plate so as to sandwich the electrode pad and is fixed to the first electrode pad, and a second electrode which is fixed to the second electric insulating plate. A pad, the first electrode pad has a conductive terminal extending from a portion thereof, and the second electrically insulating plate has an opening exposing at least a portion of the first electrode pad. Composite base member to be.
から延びる導電端子を備えることを特徴とする請求項1
に記載の複合ベース部材。2. A conductive terminal extending from one or more of the first and second electrode pads is provided.
The composite base member according to 1.
子と前記第2の電極パッドから延びる導電端子とが対向
することを特徴とする請求項1に記載の複合ベース部
材。3. The composite base member according to claim 1, wherein a conductive terminal extending from the first electrode pad and a conductive terminal extending from the second electrode pad face each other.
子と前記第3の電極パッドから延びる導電端子とが対向
することを特徴とする請求項1に記載の複合ベース部
材。4. The composite base member according to claim 1, wherein a conductive terminal extending from the second electrode pad and a conductive terminal extending from the third electrode pad face each other.
絶縁板の第1の開口部より大きい窓部を有し,そのほぼ
中央部分から延びる第1の導電端子と第2の導電端子と
を備えたことを特徴とする請求項1に記載の複合ベース
部材。5. The first conductive terminal and the second conductive terminal, wherein the second electrode pad has a window portion larger than the first opening portion of the second electric insulating plate, and extends from a substantially central portion thereof. The composite base member according to claim 1, further comprising:
を受け入れるための複数の開口部を備えたことを特徴と
する請求項1に記載の複合ベース部材。6. The composite base member according to claim 1, wherein the second electrically insulating plate has a plurality of openings for receiving the electronic component elements.
主電流電極,制御信号電極をそれぞれ対応する第1,第
2,第3の電極パッドに電気的に接続してなる半導体装
置において,前記第1の電極パッドは第1の電気絶縁板
に固着され,前記半導体素子面積以上の大きさの開口部
を有する第2の電気絶縁板が前記第1の電極パッドを挟
んで前記第1の電気絶縁板の上に配置され,前記半導体
素子は前記第2の電気絶縁板の前記開口部における前記
第1の電極パッドに固着され,該第2の電気絶縁板に前
記第2の電極パッドが固着されたことを特徴とする電力
用半導体装置。7. A semiconductor device in which a first main current electrode, a second main current electrode, and a control signal electrode of a semiconductor element are electrically connected to corresponding first, second, and third electrode pads, respectively. In the above, the first electrode pad is fixed to the first electric insulating plate, and the second electric insulating plate having an opening larger than the semiconductor element area sandwiches the first electrode pad. Is disposed on the first electric insulating plate, the semiconductor element is fixed to the first electrode pad in the opening of the second electric insulating plate, and the second electrode is attached to the second electric insulating plate. A power semiconductor device having a fixed pad.
主電流電極,制御信号電極をそれぞれ対応する第1,第
2,第3の電極パッドに電気的に接続してなる半導体装
置において,前記第1の電極パッド及び第3の電極パッ
ドは第1の電気絶縁板に固着され,前記半導体素子面積
以上の大きさの第1の開口部とこれより小さい第2の開
口部とを有する第2の電気絶縁板が前記第1の電極パッ
ド及び第3の電極パッドを挟んで前記第1の電気絶縁板
の上に配置され,前記半導体素子が前記第2の電気絶縁
板の前記第1の開口部における前記第1の電極パッドに
固着されると共に,他の電子部品素子が前記第2の開口
部における前記第1の電極パッドに固着され,前記第2
の電気絶縁板に前記第2の電極パッドが固着されること
を特徴とする電力用半導体装置。8. A semiconductor device in which a first main current electrode, a second main current electrode, and a control signal electrode of a semiconductor element are electrically connected to corresponding first, second, and third electrode pads, respectively. In the above, the first electrode pad and the third electrode pad are fixed to the first electrical insulating plate, and the first opening having a size larger than the semiconductor element area and the second opening having a size smaller than the area are formed. A second electric insulating plate having the second electric insulating plate is disposed on the first electric insulating plate with the first electrode pad and the third electrode pad interposed therebetween, and the semiconductor element has the second electric insulating plate of the second electric insulating plate. The second electronic component is fixed to the first electrode pad in the first opening, and the other electronic component element is fixed to the first electrode pad in the second opening.
The semiconductor device for electric power, wherein the second electrode pad is fixed to the electric insulating plate.
端子を有し,前記第3の電極パッドから延びる導電端子
と前記第2の電極パッドの第2の導電端子間に制御信号
が印加されることを特徴とする請求項7又は請求項8の
いずれかに記載の電力用半導体装置。9. The second electrode pad has first and second conductive terminals, and is controlled between a conductive terminal extending from the third electrode pad and a second conductive terminal of the second electrode pad. 9. The power semiconductor device according to claim 7, wherein a signal is applied.
記半導体素子の他に1つ以上の電子部品素子が固着さ
れ,その電子部品素子が導電部材により第4の電極パッ
ドに接続されたことを特徴とする請求項7又は請求項8
に記載の電力用半導体装置。10. One or more electronic component elements other than the one or more semiconductor elements are fixed to the first electrode pad, and the electronic component element is connected to the fourth electrode pad by a conductive member. Claim 7 or claim 8 characterized in that
The power semiconductor device according to item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5201741A JPH0738013A (en) | 1993-07-22 | 1993-07-22 | Composite base member and power semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5201741A JPH0738013A (en) | 1993-07-22 | 1993-07-22 | Composite base member and power semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0738013A true JPH0738013A (en) | 1995-02-07 |
Family
ID=16446173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5201741A Withdrawn JPH0738013A (en) | 1993-07-22 | 1993-07-22 | Composite base member and power semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0738013A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11121684A (en) * | 1997-10-16 | 1999-04-30 | Nissan Motor Co Ltd | Mounting structure of power transistor |
| US6072240A (en) * | 1998-10-16 | 2000-06-06 | Denso Corporation | Semiconductor chip package |
| JP2002522924A (en) * | 1998-08-10 | 2002-07-23 | ジョンソン コントロールズ テクノロジー カンパニー | MOSFET device integrated with positive temperature coefficient resistor |
| US6538308B1 (en) | 1998-07-14 | 2003-03-25 | Denso Corporation | Semiconductor apparatus with heat radiation structure for removing heat from semiconductor element |
| JP2003124436A (en) * | 2001-10-19 | 2003-04-25 | Hitachi Ltd | Semiconductor device |
| US6693350B2 (en) | 1999-11-24 | 2004-02-17 | Denso Corporation | Semiconductor device having radiation structure and method for manufacturing semiconductor device having radiation structure |
| US6703707B1 (en) | 1999-11-24 | 2004-03-09 | Denso Corporation | Semiconductor device having radiation structure |
| JP2005093698A (en) * | 2003-09-17 | 2005-04-07 | Fuji Electric Holdings Co Ltd | Power semiconductor module |
| US6946730B2 (en) | 2001-04-25 | 2005-09-20 | Denso Corporation | Semiconductor device having heat conducting plate |
| JP2007236044A (en) * | 2006-02-28 | 2007-09-13 | Mitsubishi Electric Corp | Power semiconductor device and inverter bridge module using the same |
| WO2016002385A1 (en) * | 2014-07-03 | 2016-01-07 | 日産自動車株式会社 | Half-bridge power semiconductor module and manufacturing method therefor |
| WO2016084241A1 (en) * | 2014-11-28 | 2016-06-02 | 日産自動車株式会社 | Half-bridge power semiconductor module and method for manufacturing same |
| WO2019021731A1 (en) * | 2017-07-27 | 2019-01-31 | 株式会社デンソー | SEMICONDUCTOR MODULE |
| JP2021072293A (en) * | 2019-10-29 | 2021-05-06 | 三菱電機株式会社 | Semiconductor power module |
| WO2026076560A1 (en) * | 2024-10-08 | 2026-04-16 | Nexperia B.V. | A power package comprising an auxiliary substrate |
-
1993
- 1993-07-22 JP JP5201741A patent/JPH0738013A/en not_active Withdrawn
Cited By (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11121684A (en) * | 1997-10-16 | 1999-04-30 | Nissan Motor Co Ltd | Mounting structure of power transistor |
| US6538308B1 (en) | 1998-07-14 | 2003-03-25 | Denso Corporation | Semiconductor apparatus with heat radiation structure for removing heat from semiconductor element |
| US7009284B2 (en) | 1998-07-14 | 2006-03-07 | Denso Corporation | Semiconductor apparatus with heat radiation structure for removing heat from semiconductor element |
| JP2002522924A (en) * | 1998-08-10 | 2002-07-23 | ジョンソン コントロールズ テクノロジー カンパニー | MOSFET device integrated with positive temperature coefficient resistor |
| US6072240A (en) * | 1998-10-16 | 2000-06-06 | Denso Corporation | Semiconductor chip package |
| US6448645B1 (en) | 1998-10-16 | 2002-09-10 | Denso Corporation | Semiconductor device |
| US6998707B2 (en) | 1999-11-24 | 2006-02-14 | Denso Corporation | Semiconductor device having radiation structure |
| US6703707B1 (en) | 1999-11-24 | 2004-03-09 | Denso Corporation | Semiconductor device having radiation structure |
| US6798062B2 (en) | 1999-11-24 | 2004-09-28 | Denso Corporation | Semiconductor device having radiation structure |
| US6891265B2 (en) | 1999-11-24 | 2005-05-10 | Denso Corporation | Semiconductor device having radiation structure |
| US6960825B2 (en) | 1999-11-24 | 2005-11-01 | Denso Corporation | Semiconductor device having radiation structure |
| US6967404B2 (en) | 1999-11-24 | 2005-11-22 | Denso Corporation | Semiconductor device having radiation structure |
| US6992383B2 (en) | 1999-11-24 | 2006-01-31 | Denso Corporation | Semiconductor device having radiation structure |
| US6693350B2 (en) | 1999-11-24 | 2004-02-17 | Denso Corporation | Semiconductor device having radiation structure and method for manufacturing semiconductor device having radiation structure |
| US6946730B2 (en) | 2001-04-25 | 2005-09-20 | Denso Corporation | Semiconductor device having heat conducting plate |
| US6963133B2 (en) | 2001-04-25 | 2005-11-08 | Denso Corporation | Semiconductor device and method for manufacturing semiconductor device |
| JP2003124436A (en) * | 2001-10-19 | 2003-04-25 | Hitachi Ltd | Semiconductor device |
| JP2005093698A (en) * | 2003-09-17 | 2005-04-07 | Fuji Electric Holdings Co Ltd | Power semiconductor module |
| JP2007236044A (en) * | 2006-02-28 | 2007-09-13 | Mitsubishi Electric Corp | Power semiconductor device and inverter bridge module using the same |
| CN106489203A (en) * | 2014-07-03 | 2017-03-08 | 日产自动车株式会社 | Semibridge system power semiconductor modular and its manufacture method |
| CN106489203B (en) * | 2014-07-03 | 2018-09-18 | 日产自动车株式会社 | Semibridge system power semiconductor modular and its manufacturing method |
| WO2016002385A1 (en) * | 2014-07-03 | 2016-01-07 | 日産自動車株式会社 | Half-bridge power semiconductor module and manufacturing method therefor |
| JPWO2016002385A1 (en) * | 2014-07-03 | 2017-06-08 | 日産自動車株式会社 | Half-bridge power semiconductor module and manufacturing method thereof |
| US10522517B2 (en) | 2014-07-03 | 2019-12-31 | Nissan Motor Co., Ltd. | Half-bridge power semiconductor module and manufacturing method therefor |
| US10756057B2 (en) | 2014-11-28 | 2020-08-25 | Nissan Motor Co., Ltd. | Half-bridge power semiconductor module and method of manufacturing same |
| JPWO2016084241A1 (en) * | 2014-11-28 | 2017-10-26 | 日産自動車株式会社 | Half-bridge power semiconductor module and manufacturing method thereof |
| WO2016084241A1 (en) * | 2014-11-28 | 2016-06-02 | 日産自動車株式会社 | Half-bridge power semiconductor module and method for manufacturing same |
| WO2019021731A1 (en) * | 2017-07-27 | 2019-01-31 | 株式会社デンソー | SEMICONDUCTOR MODULE |
| JP2019029457A (en) * | 2017-07-27 | 2019-02-21 | 株式会社デンソー | Semiconductor module |
| EP3660899A4 (en) * | 2017-07-27 | 2020-06-03 | Denso Corporation | SEMICONDUCTOR MODULE |
| US11270984B2 (en) | 2017-07-27 | 2022-03-08 | Denso Corporation | Semiconductor module |
| EP4471841A3 (en) * | 2017-07-27 | 2025-02-26 | Denso Corporation | Semiconductor module |
| EP4471842A3 (en) * | 2017-07-27 | 2025-02-26 | Denso Corporation | Semiconductor module |
| JP2021072293A (en) * | 2019-10-29 | 2021-05-06 | 三菱電機株式会社 | Semiconductor power module |
| WO2026076560A1 (en) * | 2024-10-08 | 2026-04-16 | Nexperia B.V. | A power package comprising an auxiliary substrate |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6975023B2 (en) | Co-packaged control circuit, transistor and inverted diode | |
| JP3596388B2 (en) | Semiconductor device | |
| US20260053029A1 (en) | Semiconductor device | |
| JP7519356B2 (en) | Semiconductor Device | |
| US20210407954A1 (en) | Semiconductor device | |
| JPH0738013A (en) | Composite base member and power semiconductor device | |
| US12456691B2 (en) | Semiconductor device | |
| US11456244B2 (en) | Semiconductor device | |
| JP2021190505A (en) | Semiconductor device | |
| JP3801989B2 (en) | Semiconductor device package having a die protruding from a lead frame pad | |
| US6822338B2 (en) | Wiring structure of semiconductor device | |
| US20240047433A1 (en) | Semiconductor device | |
| JPH08148839A (en) | Hybrid integrated circuit device | |
| JP2020519027A (en) | Semiconductor module | |
| JP2735912B2 (en) | Inverter device | |
| JPH08274228A (en) | Semiconductor mounting board, power semiconductor device and electronic circuit device | |
| JPH08125116A (en) | Power semiconductor device | |
| WO2021182016A1 (en) | Semiconductor device | |
| US7473990B2 (en) | Semiconductor device featuring electrode terminals forming superior heat-radiation system | |
| JPH09181253A (en) | Packaging equipment for semiconductor devices | |
| JPH08340082A (en) | Power semiconductor device | |
| JPH104167A (en) | Semiconductor device | |
| WO2023017708A1 (en) | Semiconductor device | |
| JP2001284395A (en) | Semiconductor device | |
| JP3523094B2 (en) | Semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20001003 |