JPH074485B2 - Batch distillation method and batch distillation apparatus - Google Patents

Batch distillation method and batch distillation apparatus

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Publication number
JPH074485B2
JPH074485B2 JP2165393A JP2165393A JPH074485B2 JP H074485 B2 JPH074485 B2 JP H074485B2 JP 2165393 A JP2165393 A JP 2165393A JP 2165393 A JP2165393 A JP 2165393A JP H074485 B2 JPH074485 B2 JP H074485B2
Authority
JP
Japan
Prior art keywords
rectification column
vapor
liquid
fraction
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2165393A
Other languages
Japanese (ja)
Other versions
JPH06210101A (en
Inventor
武次 関沢
雅敏 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Corp
Original Assignee
JGC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JGC Corp filed Critical JGC Corp
Priority to JP2165393A priority Critical patent/JPH074485B2/en
Publication of JPH06210101A publication Critical patent/JPH06210101A/en
Publication of JPH074485B2 publication Critical patent/JPH074485B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、沸点の異なる成分を2
以上含有する原料を回分式で蒸留分離するに当り、製品
回収率又は製品純度を向上させる蒸留方法及び蒸留装置
に関するものである。
BACKGROUND OF THE INVENTION The present invention uses two components having different boiling points.
The present invention relates to a distillation method and a distillation apparatus for improving a product recovery rate or a product purity when a raw material contained above is separated by distillation in a batch system.

【0002】[0002]

【従来の技術】従来行われている装置及び方法を原料が
相対的に高沸点の留分(重質留分)、中間沸点の留分
(中間留分)及び相対的に低沸点の留分(軽質留分)よ
りなる場合について、図3に従って説明する。従来の回
分式蒸留装置は、原料を加熱する手段、例えばリボイラ
ー1を設けたドラム2、ドラム2で発生する蒸気の精留
塔3、精留塔3の頂部蒸気凝縮還流装置(コンデンサ
4、精留塔3の頂部蒸気をコンデンサへ供給する配管及
びコンデンサ4の凝縮液を精留塔3上部へ還流する配管
よりなる)から構成され、コンデンサ4の凝縮液を精留
塔3上部へ還流する配管に設けられた還流制御弁V6、
製品(中間留分)抜き出し弁V5、サンプル抜き出し弁
V9、軽質留分抜き出し弁V7、塔底液(重質留分)抜
き出し弁V8及び塔底液ポンプ5を有する。
2. Description of the Related Art Conventional apparatuses and methods are used to compare a raw material with a relatively high boiling point fraction (heavy fraction), an intermediate boiling point fraction (intermediate fraction) and a relatively low boiling point fraction. A case of (light fraction) will be described with reference to FIG. A conventional batch-type distillation apparatus is a means for heating a raw material, for example, a drum 2 provided with a reboiler 1, a rectification column 3 for vapor generated in the drum 2, a top vapor condensing / refluxing apparatus (condenser 4, rectification column 3) of the rectification column 3. A pipe for supplying the top vapor of the distillation column 3 to the condenser and a pipe for refluxing the condensate of the condenser 4 to the upper part of the rectification column 3, and a pipe for refluxing the condensate of the condenser 4 to the upper part of the rectification column 3. A reflux control valve V6 provided in
It has a product (middle distillate) withdrawal valve V5, a sample withdrawal valve V9, a light distillate withdrawal valve V7, a column bottom liquid (heavy fraction) withdrawal valve V8, and a column bottom liquid pump 5.

【0003】ドラム2に蒸留用の原料を充填し、軽質留
分抜き出し弁V7及び製品(中間留分)抜き出し弁V5
を閉じ、還流制御弁V6を開いた状態で、リボイラー1
にスチームを通してドラム2内の原料を加熱する。ドラ
ム2内の原料は蒸気となり、精留塔3の上部からコンデ
サ4を経由して精留塔3の上部へ全還流される。精留塔
内が定常状態になったところでV7を開き、所定の還流
比で還流を行いながら軽質留分を抜き出す。その後、随
時、弁V9からサンプリングし、留出物中の軽質留分が
規定以下になったら留出物を製品と見なし、弁V7を閉
じ弁V5を開いて抜き出しを軽質留分側から製品側へ切
り替えて回収する。しかしこの従来法では塔内に滞留し
ている軽質留分を流出させるために多量の製品(中間留
分)が軽質留分と共に流出してしまう。
A drum 2 is filled with a raw material for distillation, a light distillate withdrawal valve V7 and a product (middle distillate) withdrawal valve V5
Closed and the recirculation control valve V6 opened, the reboiler 1
The raw material in the drum 2 is heated through steam. The raw material in the drum 2 becomes vapor and is totally refluxed from the upper part of the rectification column 3 to the upper part of the rectification column 3 via the condenser 4. When the inside of the rectification column has reached a steady state, V7 is opened, and the light fraction is withdrawn while performing reflux at a predetermined reflux ratio. Thereafter, sample from the valve V9 at any time, consider the distillate as a product when the light fraction in the distillate falls below the regulation, close the valve V7 and open the valve V5, and extract from the light fraction side to the product side. Switch to and collect. However, in this conventional method, a large amount of product (intermediate fraction) flows out together with the light fraction because the light fraction accumulated in the column is discharged.

【0004】[0004]

【発明が解決しようとする課題】このように従来の方法
では製品回収率が低くなる。この対策として精留塔の段
数を増加することが考えられるが、設備費の増加となり
好ましい手段ではない。本発明者らは、留出物中の軽質
留分が規定値以下になる前に、ドラム及び精留塔下部に
おける軽質留分が規定以下になることに着目し、製品回
収率の向上又は製品の純度の向上を計ることができる本
発明をなすに至った。
As described above, the product recovery rate is low in the conventional method. As a countermeasure for this, it is conceivable to increase the number of stages of the rectification column, but this is not a preferable means because it increases the equipment cost. The inventors of the present invention focused on that the light fraction in the drum and the lower part of the rectification column was below the specification before the light fraction in the distillate was below the specified value, improving the product recovery rate or the product. The present invention has made it possible to improve the purity of

【0005】[0005]

【課題を解決するための手段】本発明の回分式蒸留方法
は、沸点の異なる2以上の成分よりなる原料を加熱して
発生した蒸気を第1の精留塔に導き、その頂部蒸気を凝
縮することなく頂部蒸気凝縮還流装置を備えた第2の精
留塔に導き、第2の精留塔の頂部蒸気を凝縮して第2の
精留塔に還流し、第2の精留塔の底部液を第1の精留塔
の上部へ戻しながら留分の抜き出しを行わずに蒸留操作
を行って定常状態に達した後、必要に応じて第2の精留
塔の頂部蒸気の凝縮液の一部を断続的に抜き出し、第1
の精留塔頂部付近における液又は蒸気の純度が所定値以
上になったところで第1の精留塔と第2の精留塔間にお
ける液及び蒸気の流れを閉鎖し、相対的に低沸点の留分
を第2の精留塔の内部に封じ込めた状態で第1の精留塔
から蒸気又は液を抜き出すことを特徴とする。
In the batch distillation method of the present invention, a vapor generated by heating a raw material composed of two or more components having different boiling points is introduced into a first rectification column and the top vapor is condensed. To a second rectification column equipped with a top vapor condensing / refluxing device, condensing the top vapor of the second rectification column and refluxing it to the second rectification column. While returning the bottom liquid to the upper part of the first rectification column, a distillation operation was performed without extracting the distillate to reach a steady state, and then a condensate of the top vapor of the second rectification column, if necessary. Intermittently withdraw a part of
When the purity of the liquid or vapor near the top of the rectification column exceeds a predetermined value, the flow of liquid and vapor between the first rectification column and the second rectification column is closed, It is characterized in that vapor or liquid is extracted from the first rectification column in a state where the distillate is contained in the second rectification column.

【0006】回分式蒸留用の原料としては沸点の異なる
2以上の成分よりなるものであれば良く、特に目的とす
る成分とそれより低沸点の成分(軽質留分)を含むもの
や、目的とする成分(中間留分)と軽質留分の他に目的
とする成分よりも高沸点の成分(重質留分)を含むもの
が適する。
As a raw material for batch distillation, any material having two or more components having different boiling points may be used. Particularly, a component containing a target component and a component having a lower boiling point (light fraction) or a target component may be used. In addition to the component (intermediate fraction) and the light fraction, a component having a higher boiling point than the target component (heavy fraction) is suitable.

【0007】本発明の回分式蒸留方法においては、精留
塔として第1の精留塔及び第2の精留塔の2つを設け、
原料を第1の精留塔に供給し、加熱により原料から発生
した蒸気が順次第1の精留塔と第2の精留塔を通過する
ように接続されている装置を用いる。第2の精留塔は頂
部蒸気凝縮還流装置を備えており、第2の精留塔の頂部
蒸気を凝縮して第2の精留塔に全還流させ、必要により
第2の精留塔の頂部蒸気の凝縮液の一部を断続的に抜き
出して第1の精留塔頂部付近における液又は蒸気の純度
が所定値以上になるまで軽質留分を第2の精留塔に濃縮
させる。第1の精留塔頂部付近における液又は蒸気の純
度が所定値以上になったら、第1の精留塔及び第2の精
留塔間における液及び蒸気の流れを閉鎖し、軽質留分を
第2の精留塔の内部に封じ込めた状態で第1の精留塔か
ら目的とする留分を抜き出す。
In the batch distillation method of the present invention, two rectification columns, a first rectification column and a second rectification column, are provided,
A raw material is supplied to the first rectification column, and an apparatus connected so that vapor generated from the raw material by heating passes through the first rectification column and the second rectification column in sequence is used. The second rectification column is equipped with a top vapor condensing / refluxing device, condenses the top vapor of the second rectification column and totally recirculates it to the second rectification column, and if necessary, of the second rectification column. A part of the condensate of the top vapor is intermittently withdrawn and the light fraction is concentrated in the second rectification column until the purity of the liquid or vapor near the top of the first rectification column reaches a predetermined value or higher. When the purity of the liquid or vapor in the vicinity of the top of the first rectification column exceeds a predetermined value, the flow of liquid and vapor between the first rectification column and the second rectification column is closed, and the light fraction is removed. The target fraction is extracted from the first rectification column while being contained in the second rectification column.

【0008】上記の回分式蒸留方法により、軽質留分を
多く含む蒸気を第2の精留塔の内部に封じ込めた状態で
目的とする成分が第1の精留塔から抜き出されるので、
軽質留分が規定値以下になった製品が得られる。
By the above batch distillation method, the target component is extracted from the first rectification column while the vapor containing a large amount of the light fraction is contained in the second rectification column.
A product with a light fraction below the specified value can be obtained.

【0009】また本発明の回分式蒸留装置は、原料を加
熱する手段を有し頂部蒸気凝縮還流装置を備えた第1の
精留塔、頂部蒸気凝縮還流装置を備えた第2の精留塔、
第1の精留塔の頂部蒸気を第2の精留塔の下部へ供給す
る配管、第2の精留塔の底部液を第1の精留塔の上部へ
供給する配管、第2の精留塔の頂部蒸気凝縮還流装置の
凝縮液を抜き出す配管、第1の精留塔から蒸気又は液を
抜き出す配管及び第1の精留塔の残留液を抜き出す配管
を有し、第1の精留塔に供給された原料から発生する蒸
気が順次第1の精留塔と第2の精留塔を通過するように
接続されている装置であって、第1の精留塔の頂部蒸気
を第2の精留塔の下部へ供給する配管及び第2の精留塔
の底部液を第1の精留塔の上部へ供給する配管のそれぞ
れに開閉手段を設けたものであることを特徴とする。
Further, the batch distillation apparatus of the present invention comprises a first rectification column having means for heating the raw materials and having a top vapor condensing / refluxing apparatus, and a second rectification column having a top vapor condensing / refluxing apparatus. ,
Pipe for supplying the top vapor of the first rectification column to the lower part of the second rectification column, pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column, second rectification The first rectification has a pipe for extracting the condensate of the vapor condensing / refluxing device at the top of the distillation column, a pipe for extracting the vapor or the liquid from the first rectification column, and a pipe for extracting the residual liquid of the first rectification column. A device in which vapor generated from the raw material supplied to the column is connected so as to sequentially pass through the first rectification column and the second rectification column, and the top vapor of the first rectification column is 2 is a pipe for supplying the lower part of the rectification column and a pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column, each of which is provided with an opening / closing means. .

【0010】第1の精留塔と第2の精留塔は、図1に示
すように上下に重ねて設置されていても、図2に示すよ
うに個別に設置されていても良いが、両者は機能的に独
立した精留塔である。
The first rectification column and the second rectification column may be installed one above the other as shown in FIG. 1 or may be installed individually as shown in FIG. Both are functionally independent rectification towers.

【0011】第1図により具体的に説明すると、本発明
の回分式蒸留装置は、原料が供給されるドラム2に原料
を加熱する手段としてリボイラー1を設け頂部蒸気凝縮
還流装置(コンデンサ4A、精留塔3Aの頂部蒸気をコ
ンデンサ4Aへ供給する配管及びコンデンサ4Aの凝縮
液を精留塔3A上部へ還流する配管よりなる)を備えた
第1の精留塔3A、頂部蒸気凝縮還流装置(コンデンサ
4B、精留塔3Bの頂部蒸気をコンデンサ4Bへ供給す
る配管及びコンデンサ4Bの凝縮液を精留塔3B上部へ
還流する配管よりなる)を備えた第2の精留塔3B、第
1の精留塔3Aの頂部蒸気を第2の精留塔3Bの下部へ
供給する配管、第2の精留塔3Bの底部液を第1の精留
塔3Aの上部へ供給する配管、第2の精留塔3Bの頂部
蒸気凝縮還流装置の凝縮液を弁V7を経て抜き出す配
管、第1の精留塔3Aから蒸気又は液を抜き出す配管と
して頂部蒸気凝縮還流装置の凝縮液を弁V5を経て抜き
出す配管、及び第1の精留塔3Aの残留液をドラム2か
ら弁V8を経て抜き出す配管を有し、ドラム2から第1
の精留塔3Aに供給された原料から発生する蒸気が順次
第1の精留塔3Aと第2の精留塔3Bを通過するように
接続されている装置であって、第1の精留塔3Aの頂部
蒸気を第2の精留塔3Bの下部へ供給する配管に弁V
2、第2の精留塔の底部液を第1の精留塔の上部へ供給
する配管に弁V3を設けてある。第2の精留塔における
頂部蒸気凝縮還流装置としては、コンデンサ4Bの出口
に凝縮液のレシーバーを設け、このレシーバーを介し
て、凝縮液を精留塔3B上部へ還流するようにしても良
い。第1の精留塔から蒸気又は液を抜き出す配管として
は、上記の頂部蒸気凝縮還流装置の凝縮液抜き出し配管
に限らず、第1の精留塔の頂部蒸気を凝縮せずに抜き出
すように設けることもでき、また第1の精留塔の内部還
流液、特に頂部付近の内部還流液を抜き出すように設け
ても良い。原料の加熱手段は、図1のように第1の精留
塔の内部に設けても良いが、例えば図2のように精留塔
とは別に設けることもできる。記号5はドラム2から塔
底液を抜き出すためのポンプ、弁V9はサンプル抜き出
し弁である。なお弁V1は第1のコンデンサ4Aへの蒸
気供給を閉鎖する弁、弁V4は第1のコンデンサ4Aか
らの還流液を制御する弁、弁V6は第2のコンデンサ4
Bからの還流液を制御する弁である。
More specifically, referring to FIG. 1, the batch distillation apparatus of the present invention is provided with a reboiler 1 as a means for heating a raw material to a drum 2 to which the raw material is supplied. A first rectification column 3A equipped with a pipe for supplying the top vapor of the distillation column 3A to the condenser 4A and a pipe for refluxing the condensate of the condenser 4A to the upper part of the rectification column 3A, a top vapor condensing / refluxing device (condenser) 4B, a pipe for supplying the top vapor of the rectification column 3B to the condenser 4B, and a pipe for refluxing the condensate of the condenser 4B to the upper part of the rectification column 3B). A pipe for supplying the top vapor of the distillation column 3A to the lower part of the second rectification column 3B, a pipe for supplying the bottom liquid of the second rectification column 3B to the upper part of the first rectification column 3A, the second rectification Top vapor condensing / refluxing device of distillation column 3B A pipe for withdrawing the condensate through the valve V7, a pipe for withdrawing the condensate from the top vapor condensing / refluxing device through the valve V5 as a pipe for withdrawing vapor or liquid from the first rectification column 3A, and a pipe for the first rectification column 3A. It has a pipe for extracting the residual liquid from the drum 2 through the valve V8,
Is a device connected so that the vapor generated from the raw material supplied to the rectification column 3A of FIG. 1 sequentially passes through the first rectification column 3A and the second rectification column 3B. A valve V is provided in a pipe for supplying the top vapor of the tower 3A to the lower part of the second rectification tower 3B.
2. A valve V3 is provided in the pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column. As the top vapor condensing / refluxing device in the second rectification column, a condensate receiver may be provided at the outlet of the condenser 4B, and the condensate may be recirculated to the upper part of the rectification column 3B via this receiver. The pipe for withdrawing vapor or liquid from the first rectification column is not limited to the condensate withdrawal pipe of the top vapor condensing / refluxing device, but is provided so as to withdraw the top vapor of the first rectification column without condensing. Alternatively, the internal reflux liquid of the first rectification column, particularly the internal reflux liquid near the top, may be provided so as to be extracted. The heating means for the raw material may be provided inside the first rectification column as shown in FIG. 1, but may be provided separately from the rectification column as shown in FIG. 2, for example. Reference numeral 5 is a pump for withdrawing the bottom liquid from the drum 2, and valve V9 is a sample withdrawal valve. Note that the valve V1 is a valve that closes the supply of steam to the first condenser 4A, the valve V4 is a valve that controls the reflux liquid from the first condenser 4A, and the valve V6 is the second condenser 4A.
This is a valve for controlling the reflux liquid from B.

【0012】図2に示した装置は、第1の精留塔と第2
の精留塔が個別に設置されている以外は図1に示した装
置と同じ構成で、第2の精留塔の底部液を第1の精留塔
の上部へ供給するために精留ポンプ6を設けたものであ
る。
The apparatus shown in FIG. 2 comprises a first rectification column and a second rectification column.
The rectification pump has the same configuration as that shown in FIG. 1 except that the rectification towers are separately installed, and the bottom liquid of the second rectification tower is supplied to the upper part of the first rectification tower. 6 is provided.

【0013】上記のような装置を用いて、沸点の異なる
2以上の成分よりなる原料、例えば相対的に高沸点の留
分(重質留分)、中間沸点の留分(中間留分)及び相対
的に低沸点の留分(軽質留分)よりなる原料を回分蒸留
し中間留分を製品として得る方法を図1及び図2を参照
しながら説明する。
Using the above apparatus, a raw material composed of two or more components having different boiling points, for example, a relatively high boiling fraction (heavy fraction), an intermediate boiling fraction (intermediate fraction) and A method of batch-distilling a raw material composed of a relatively low boiling point fraction (light fraction) to obtain an intermediate fraction as a product will be described with reference to FIGS. 1 and 2.

【0014】上記原料をリボイラー1を設けたドラム2
に入れ、加熱して発生した蒸気を頂部蒸気凝縮還流装置
(コンデンサ4A、精留塔3Aの頂部蒸気をコンデンサ
4Aへ供給する配管及びコンデンサ4Aの凝縮液を精留
塔3A上部へ還流する配管よりなる)を備えた第1の精
留塔3Aに導く。第1の精留塔3Aの頂部蒸気は凝縮さ
せることなく(即ちコンデンサ4Aへ通じる弁V1及び
弁V4を閉鎖した状態で)、弁V2(開)を経て頂部蒸
気凝縮還流装置(コンデンサ4B、精留塔3Bの頂部蒸
気をコンデンサ4Bへ供給する配管及びコンデンサ4B
の凝縮液を精留塔3B上部へ還流する配管よりなる)を
備えた第2の精留塔3Bに導き、その頂部蒸気を凝縮し
て第2の精留塔3Bに還流する。第2の精留塔3Bの底
部液を弁V3(開)を経て第1の精留塔3Aの上部へ戻
しながら、留分の抜き出しを行わずに、即ち弁V7、弁
V5及び弁V8を閉鎖した状態で蒸留操作を行う。定常
状態に達した後、必要に応じて(定常状態では第1の精
留塔3Aの頂部付近の液又は蒸気の純度が所定値に達し
ない場合)弁V7を開いて第2の精留塔3Bの頂部蒸気
の凝縮液の一部を断続的に抜き出す。この凝縮液(軽質
留分)の抜き出しの際は還流を行いながら抜き出しても
良いし、還流を行わずに抜き出しても良い。第1の精留
塔3Aの頂部付近の液又は蒸気の純度が所定値に達した
かどうかは、例えば、第2の精留塔3Bの底部液を第1
の精留塔3Aの上部へ戻す配管に接続する弁V9からサ
ンプルを抜き出して分析することにより確認できる。ま
た第1の精留塔3Aの頂部蒸気を第2の精留塔3Bの下
部へ供給する配管からサンプルを抜き出して蒸気の純度
が所定値に達したかどうかを確認しても良い。第1の精
留塔3Aの内部の所定の位置における蒸気或いは内部還
流液の濃度を指標とすることもできる。
A drum 2 provided with a reboiler 1 containing the above raw materials.
In the top vapor condensing / refluxing device (condenser 4A, a pipe for supplying the top vapor of the rectification column 3A to the condenser 4A and a pipe for refluxing the condensate of the condenser 4A to the upper part of the rectification column 3A). To the first rectification column 3A. Without condensing the top vapor of the first rectification column 3A (that is, with the valves V1 and V4 leading to the condenser 4A closed), through the valve V2 (open), the top vapor condensing / reflux device (condenser 4B, refinement). Pipe for supplying top vapor of distillation column 3B to condenser 4B and condenser 4B
Of the condensate to the upper part of the rectification column 3B), and the top vapor thereof is condensed and refluxed to the second rectification column 3B. While returning the bottom liquid of the second rectification column 3B to the upper part of the first rectification column 3A via the valve V3 (open), the fraction is not extracted, that is, the valves V7, V5 and V8 are Distillation is performed in the closed state. After reaching the steady state, the valve V7 is opened as necessary (when the purity of the liquid or vapor near the top of the first rectification column 3A does not reach a predetermined value in the steady state), and the second rectification column is opened. A portion of the condensate of the top vapor of 3B is withdrawn intermittently. When the condensate (light fraction) is withdrawn, it may be withdrawn under reflux, or may be withdrawn without reflux. Whether or not the purity of the liquid or vapor near the top of the first rectification column 3A has reached a predetermined value is determined by, for example, determining whether the bottom liquid of the second rectification column 3B is
This can be confirmed by extracting the sample from the valve V9 connected to the pipe returning to the upper part of the rectification column 3A and analyzing it. Further, a sample may be extracted from a pipe for supplying the top vapor of the first rectification column 3A to the lower part of the second rectification column 3B to check whether or not the vapor purity has reached a predetermined value. The concentration of vapor or internal reflux liquid at a predetermined position inside the first rectification column 3A can also be used as an index.

【0015】第1の精留塔3Aの頂部付近の液又は蒸
気、図では、第2の精留塔3Bの塔底液の純度が所定値
以上になったところで弁V2及び弁V3を閉じて第1の
精留塔3Aと第2の精留塔3B間における液及び蒸気の
流れを閉鎖し、軽質留分を第2の精留塔3Bの内部に封
じ込める。このように軽質留分を封じ込めた状態で、弁
V1及び弁V4を開いて第1の精留塔の頂部蒸気凝縮還
流装置を働かせ第1の精留塔の頂部蒸気を凝縮して第1
の精留塔に還流しながら第1の精留塔3Aの頂部蒸気の
凝縮液を製品として抜き出す。製品は、弁V5を開いて
コンデンサ4Aの凝縮液を抜き出しても良いし、精留塔
3Aの頂部から直接蒸気を抜き出しても良い。また第1
の精留塔3A内から直接、例えば内部還流液を製品とし
て抜き出すこともできる。その場合抜き出しは塔頂に近
い所で行う方が好ましい。製品は気体の状態で回収する
こともでき、目的に応じて適宜選択できる。製品の回収
後は蒸留を終了し、弁V8を開いて塔底液ポンプ5によ
り重質留分を抜き出す。第2の精留塔3Bの内部に封じ
込められた軽質留分は、次回の蒸溜操作の際に、第2の
精留塔3Bの頂部から抜き出される。
When the purity of the liquid or vapor near the top of the first rectification column 3A, that is, the bottom liquid of the second rectification column 3B in the figure becomes a predetermined value or higher, the valves V2 and V3 are closed. The flow of liquid and vapor between the first rectification column 3A and the second rectification column 3B is closed, and the light fraction is contained inside the second rectification column 3B. With the light distillate thus contained, the valves V1 and V4 are opened to operate the top vapor condensing / refluxing device of the first rectification column to condense the top vapor of the first rectification column to
The condensate of the top vapor of the first rectification column 3A is withdrawn as a product while refluxing to the rectification column. For the product, the valve V5 may be opened to withdraw the condensate from the condenser 4A, or the vapor may be withdrawn directly from the top of the rectification column 3A. Also the first
The internal reflux liquid, for example, can be directly withdrawn as a product from the rectification column 3A. In that case, it is preferable to carry out the withdrawal near the top of the tower. The product can be collected in a gaseous state and can be appropriately selected depending on the purpose. After the product is recovered, the distillation is completed, the valve V8 is opened, and the heavy fraction is extracted by the column bottom liquid pump 5. The light fraction confined inside the second rectification column 3B is withdrawn from the top of the second rectification column 3B in the next distillation operation.

【0016】また原料が相対的に高沸点の留分及び相対
的に低沸点の留分のみよりなる場合の蒸留装置として
は、原料を加熱する手段を有する第1の精留塔、頂部蒸
気凝縮還流装置を備えた第2の精留塔、第1の精留塔の
頂部蒸気を第2の精留塔の下部へ供給する配管、第2の
精留塔の底部液を第1の精留塔の上部へ供給する配管、
第2の精留塔の頂部蒸気凝縮還流装置の凝縮液を抜き出
す配管及び第1の精留塔の残留液を抜き出す配管を有
し、第1の精留塔に供給された原料から発生する蒸気が
順次第1の精留塔と第2の精留塔を通過するように接続
されている装置であって、第1の精留塔の頂部蒸気を第
2の精留塔の下部へ供給する配管及び第2の精留塔の底
部液を第1の精留塔の上部へ供給する配管のそれぞれに
開閉手段を設けたもの、即ち第1の精留塔には頂部蒸気
凝縮還流装置を設けず、高沸点の留分(製品)は第1の
精留塔の底部から抜き出すようにしたものであって良
い。図1及び図2に則して説明すれば、コンデンサ4
A、弁V1、弁V4及び弁V5を設けず、弁V8を製品
抜き出し弁としたものである。
Further, as a distillation apparatus in the case where the raw material consists of a fraction having a relatively high boiling point and a fraction having a relatively low boiling point, the first rectification column having means for heating the raw material, top vapor condensation A second rectification column equipped with a reflux device, a pipe for supplying the top vapor of the first rectification column to the lower part of the second rectification column, and the first rectification of the bottom liquid of the second rectification column. Piping to supply to the top of the tower,
Vapor generated from the raw material supplied to the first rectification column, having a pipe for extracting the condensate of the top vapor condensing / refluxing device of the second rectification column and a pipe for extracting the residual liquid of the first rectification column Is a device connected so as to sequentially pass through the first rectification column and the second rectification column, and the top vapor of the first rectification column is supplied to the lower part of the second rectification column. An opening / closing means is provided in each of the pipe and the pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column, that is, the first rectification column is provided with a top vapor condensation reflux device. Alternatively, the high-boiling fraction (product) may be extracted from the bottom of the first rectification column. Referring to FIGS. 1 and 2, the capacitor 4
A, the valve V1, the valve V4, and the valve V5 are not provided, and the valve V8 is a product withdrawal valve.

【0017】原料が相対的に高沸点の留分(製品)及び
相対的に低沸点の留分(軽質留分)のみよりなる場合の
蒸留方法は、上記原料を、リボイラー1を設けたドラム
2に入れ、加熱して発生した蒸気を第1の精留塔3Aに
導き、その頂部蒸気を弁V2(開)を経て頂部蒸気凝縮
還流装置(コンデンサ4B、精留塔3Bの頂部蒸気をコ
ンデンサ4Bへ供給する配管及びコンデンサ4Bの凝縮
液を精留塔3B上部へ還流する配管よりなる)を備えた
第2の精留塔3Bに導く。第2の精留塔3Bの頂部蒸気
を凝縮して第2の精留塔3Bに還流し、第2の精留塔3
Bの底部液を弁V3(開)を経て第1の精留塔3Aの上
部へ戻しながら、留分の抜き出しを行わずに、即ち弁V
7及び弁V8を閉鎖した状態で蒸留操作を行う。定常状
態に達した後、必要に応じて(定常状態では第1の精留
塔3Aの塔頂付近の液又は蒸気の純度が所定値に達しな
い場合)弁V7を開いて第2の精留塔3Bの頂部蒸気の
凝縮液の一部を断続的に抜き出す。この凝縮液(軽質留
分)の抜き出しの際は還流を行いながら抜き出しても良
いし、還流を行わずに抜き出しても良い。第1の精留塔
3Aの頂部付近の液又は蒸気の純度が所定値に達したか
どうかは、例えば、第2の精留塔3Bの底部液を第1の
精留塔3Aの上部へ戻す配管に接続する弁V9からサン
プルを抜き出して分析することで確認できる。
The distillation method in the case where the raw material consists only of a relatively high-boiling fraction (product) and a relatively low-boiling fraction (light fraction) is as follows. The steam generated by heating is introduced into the first rectification column 3A, and the top vapor thereof is passed through the valve V2 (open) to the top vapor condensing / refluxing device (condenser 4B, top vapor of the rectification column 3B to the condenser 4B). To the second rectification column 3B). The top vapor of the second rectification column 3B is condensed and refluxed to the second rectification column 3B,
While returning the bottom liquid of B through the valve V3 (open) to the upper part of the first rectification column 3A, without extracting the fraction, that is, the valve V
The distillation operation is performed with 7 and the valve V8 closed. After reaching the steady state, if necessary (in the steady state, the purity of the liquid or vapor near the top of the first rectification column 3A does not reach a predetermined value), the valve V7 is opened to perform the second rectification. Part of the condensate of the top vapor of column 3B is withdrawn intermittently. When the condensate (light fraction) is withdrawn, it may be withdrawn under reflux, or may be withdrawn without reflux. Whether the purity of the liquid or vapor near the top of the first rectification column 3A has reached a predetermined value is determined by, for example, returning the bottom liquid of the second rectification column 3B to the upper part of the first rectification column 3A. This can be confirmed by extracting the sample from the valve V9 connected to the pipe and analyzing it.

【0018】第1の精留塔3Aの頂部付近の液又は蒸
気、図では第2の精留塔3Bの塔底液の純度が所定値以
上になったところで弁V2及び弁V3を閉じて、第1の
精留塔3Aと第2の精留塔3B間における液及び蒸気の
流れを閉鎖し、軽質留分を第2の精留塔3Bの内部に封
じ込めた状態で弁V8を開いて第1の精留塔の塔底液を
製品として抜き出す。第1の精留塔3Aの頂部付近の液
或いは蒸気の純度の確認は、第2の精留塔3Bの塔底液
以外に第1の精留塔3Aの頂部蒸気や第1の精留塔3A
の内部の所定の位置における蒸気或いは内部還流液の濃
度を対象とすることもできる。
When the purity of the liquid or vapor in the vicinity of the top of the first rectification column 3A, that is, the bottom liquid of the second rectification column 3B in the figure exceeds a predetermined value, the valves V2 and V3 are closed, The flow of liquid and vapor between the first rectification column 3A and the second rectification column 3B is closed, and the valve V8 is opened with the light distillate contained in the second rectification column 3B. The bottom liquid of the rectification column 1 is withdrawn as a product. The confirmation of the purity of the liquid or vapor in the vicinity of the top of the first rectification column 3A is performed by checking the top vapor of the first rectification column 3A or the first rectification column in addition to the bottom liquid of the second rectification column 3B. 3A
It is also possible to target the concentration of the vapor or the internal reflux liquid at a predetermined position inside.

【0019】以下実施例(コンピュータによるシミュレ
ーションの結果)により本発明を具体的に説明するが、
本発明は下記の実施例に限定されるものではない。
The present invention will be specifically described below with reference to examples (results of computer simulation).
The present invention is not limited to the examples below.

【0020】[0020]

【実施例1】パラキシレン(軽質留分)1000重量p
pm、オルトキシレン(軽質留分)1000重量pp
m、プロピルベンゼン(中間留分)99.75重量%、
ドデカン(重質留分)500重量ppmを含む原料か
ら、純度99.96重量%のプロピルベンゼンを回収す
る場合について説明する(図1又は図2参照)。この操
作条件は圧力は常圧、温度は160〜170℃で行っ
た。なお精留塔は段数15の第1の精留塔3A及び段数
5の第2の精留塔3Bを用いた。原料をドラム2に仕込
みリボイラー1にスチームを通して加熱した。ドラム2
内の液は蒸気となって第1の精留塔3Aを通り、第2の
精留塔3Bを通って上部コンデンサ4Bにより凝縮し、
第2の精留塔3Bの上部へ戻る。この時、弁V1〜V9
の内、開放弁はV2、V3、V6であり、製品(プロピ
ルベンゼン)及び軽質留分(パラキシレン及びオルトキ
シレン)の留出がないので全還流の状態であった。全還
流の運転によって塔内の温度と流量が安定した後、第2
の精留塔3Bの底部液を第1の精留塔3Aの上部へ供給
する配管に設けた弁V9からサンプリングし、プロピル
ベンゼンが99.96重量%以上になるまで軽質留分抜
き出し弁V7を断続的に開閉し軽質留分を抜き出した。
弁V9のサンプリングでプロピルベンゼンが99.96
重量%以上になったところで、弁V1、V4、V5、V
6は開の状態、弁V2、V3、V7、V8、V9は閉の
状態になるように弁を操作し、第2の精留塔3Bに流体
を封じ込めたまま、コンデンサ4Aから製品を回収し
た。その後の操作は、従来法と同様、第1の精留塔の温
度が所定値以上になったところでリボイラー1のスチー
ム供給を停止し蒸留を停止した。蒸留終了後、弁V8を
開いて塔底液ポンプ5により重質留分を抜き出した。
Example 1 Paraxylene (light fraction) 1000 p
pm, orthoxylene (light fraction) 1000 weight pp
m, propylbenzene (middle distillate) 99.75% by weight,
A case where propylbenzene having a purity of 99.96 wt% is recovered from a raw material containing 500 wt ppm of dodecane (heavy fraction) will be described (see FIG. 1 or 2). The operating conditions were that the pressure was normal pressure and the temperature was 160 to 170 ° C. As the rectification column, a first rectification column 3A having 15 plates and a second rectification column 3B having 5 plates were used. The raw material was charged into a drum 2 and steam was passed through a reboiler 1 to heat it. Drum 2
The liquid inside becomes vapor and passes through the first rectification column 3A and the second rectification column 3B and is condensed by the upper condenser 4B,
Return to the upper part of the second rectification column 3B. At this time, the valves V1 to V9
Among them, the open valves were V2, V3, and V6, and there was no distillation of the product (propylbenzene) and the light fractions (paraxylene and orthoxylene), so it was in the state of total reflux. After the temperature and flow rate inside the tower were stabilized by the operation of total reflux, the second
The bottom liquid of the rectification column 3B is sampled from a valve V9 provided in a pipe for supplying the upper part of the first rectification column 3A, and a light distillate withdrawal valve V7 is used until the propylbenzene content becomes 99.96% by weight or more. The light fraction was extracted by intermittently opening and closing.
Propylbenzene is 99.96 by sampling of valve V9.
Valves V1, V4, V5, V at the point where the weight is over
6 was opened, and valves V2, V3, V7, V8 and V9 were operated to be closed, and the product was recovered from the condenser 4A while keeping the fluid in the second rectification column 3B. . In the subsequent operation, the steam supply to the reboiler 1 was stopped and the distillation was stopped when the temperature in the first rectification column reached a predetermined value or higher, as in the conventional method. After the distillation was completed, the valve V8 was opened and the column bottom liquid pump 5 extracted the heavy fraction.

【0021】実施例から次のことが判明した。原料を1
0m3 ドラム2に仕込んだ場合、純度99.96重量%
の製品の回収量は従来法における8.3m3 から9.8
3に向上した。従って製品回収率としては83%から
98%に向上した。さらに、軽質留分の流出量が少なく
なることから蒸留時間が8時間から7時間に短縮され
た。なお製品の回収率を従来通り83%にした場合、製
品純度は99.96重量%から99.976重量%に向
上し、不純物の含有量は400ppmから240ppm
に減少する。
From the examples, the following was found. 1 raw material
Purity of 99.96% by weight when charged to 0 m 3 drum 2
The amount of product recovered from 8.3m 3 in the conventional method is 9.8m 3.
improved to m 3 . Therefore, the product recovery rate improved from 83% to 98%. Furthermore, the distillation time was shortened from 8 hours to 7 hours because the outflow amount of the light fraction was reduced. When the product recovery rate is set to 83% as before, the product purity is improved from 99.96% by weight to 99.976% by weight, and the content of impurities is 400 to 240 ppm.
Decrease to.

【0022】[0022]

【発明の効果】本発明の効果は、上記の例から、次のこ
とが挙げられる。 (1)製品の回収量が向上し、製品回収率の向上を計る
ことができる。 (2)軽質留分の留出量が少なくなり、蒸留時間の短縮
ができる。 (3)製品の純度の向上を計ることができる。 (4)上記(1)、(2)に伴い、機器のサイズを小さ
くすることができる。具体的には、軽質留分の留出液受
タンク及びドラムの容量を小さくすることができる。
The effects of the present invention are as follows from the above examples. (1) The recovery amount of products is improved, and the product recovery rate can be improved. (2) The distillation amount of the light fraction is reduced, and the distillation time can be shortened. (3) The purity of the product can be improved. (4) Due to the above (1) and (2), the size of the device can be reduced. Specifically, the capacities of the light distillate distillate receiving tank and the drum can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の回分式蒸留装置及び蒸留方法の一例を
説明する為の図である。
FIG. 1 is a diagram for explaining an example of a batch distillation apparatus and a distillation method of the present invention.

【図2】本発明の回分式蒸留装置及び蒸留方法の他の例
を説明する為の図である。
FIG. 2 is a diagram for explaining another example of the batch distillation apparatus and the distillation method of the present invention.

【図3】従来の回分式蒸留装置及び蒸留方法を説明する
為の図である。
FIG. 3 is a diagram for explaining a conventional batch distillation apparatus and distillation method.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 沸点の異なる2以上の成分よりなる原料
を加熱して発生した蒸気を第1の精留塔に導き、その頂
部蒸気を凝縮することなく頂部蒸気凝縮還流装置を備え
た第2の精留塔に導き、第2の精留塔の頂部蒸気を凝縮
して第2の精留塔に還流し、第2の精留塔の底部液を第
1の精留塔の上部へ戻しながら留分の抜き出しを行わず
に蒸留操作を行って定常状態に達した後、必要に応じて
第2の精留塔の頂部蒸気の凝縮液の一部を断続的に抜き
出し、第1の精留塔頂部付近における液又は蒸気の純度
が所定値以上になったところで第1の精留塔と第2の精
留塔間における液及び蒸気の流れを閉鎖し、相対的に低
沸点の留分を第2の精留塔の内部に封じ込めた状態で第
1の精留塔から蒸気又は液を抜き出すことを特徴とする
回分式蒸留方法。
1. A vapor generated by heating a raw material composed of two or more components having different boiling points is introduced into a first rectification column, and a top vapor condensing / refluxing device is provided without condensing the top vapor. To the second rectification column, condense the top vapor of the second rectification column and return to the second rectification column, and return the bottom liquid of the second rectification column to the upper part of the first rectification column. However, after the distillation operation was performed without extracting the distillate fraction to reach a steady state, a part of the condensate of the top vapor of the second rectification column was intermittently withdrawn as needed to remove the first fraction. When the purity of the liquid or vapor in the vicinity of the top of the distillation column exceeds a specified value, the flow of the liquid and vapor between the first and second rectification columns is closed, and the fraction with a relatively low boiling point A batch distillation method, wherein vapor or liquid is extracted from the first rectification column in a state where the is contained in the second rectification column.
【請求項2】 沸点の異なる2以上の成分よりなる原料
が相対的に高沸点の留分、中間沸点の留分及び相対的に
低沸点の留分よりなり、これを加熱して発生した蒸気を
頂部蒸気凝縮還流装置を備えた第1の精留塔に導き、そ
の頂部蒸気を凝縮することなく頂部蒸気凝縮還流装置を
備えた第2の精留塔に導き、第2の精留塔の頂部蒸気を
凝縮して第2の精留塔に還流し、第2の精留塔の底部液
を第1の精留塔の上部へ戻しながら留分の抜き出しを行
わずに蒸留操作を行って定常状態に達した後、必要に応
じて第2の精留塔の頂部蒸気の凝縮液の一部を断続的に
抜き出し、第1の精留塔頂部付近における液又は蒸気の
純度が所定値以上になったところで第1の精留塔と第2
の精留塔間における液及び蒸気の流れを閉鎖し、相対的
に低沸点の留分を第2の精留塔の内部に封じ込めた状態
で第1の精留塔の頂部蒸気を凝縮して第1の精留塔に還
流しながら第1の精留塔から中間沸点の留分の蒸気又は
液を抜き出すことを特徴とする請求項1に記載の回分式
蒸留方法。
2. A vapor generated by heating a raw material composed of two or more components having different boiling points, a fraction having a relatively high boiling point, a fraction having an intermediate boiling point and a fraction having a relatively low boiling point. To a first rectification column equipped with a top vapor condensing / refluxing device, and without condensing the top vapor to a second rectification column equipped with a top vapor condensing / refluxing device, The top vapor is condensed and refluxed to the second rectification column, the bottom liquid of the second rectification column is returned to the upper part of the first rectification column, and the distillation operation is performed without extracting the fraction. After reaching a steady state, if necessary, a part of the condensate of the top vapor of the second rectification column is intermittently withdrawn, and the purity of the liquid or vapor in the vicinity of the top of the first rectification column is above a prescribed value. The first rectification tower and the second
The liquid and vapor flows between the rectifying towers are closed, and the top vapor of the first rectifying tower is condensed while the relatively low-boiling fraction is contained inside the second rectifying tower. The batch distillation method according to claim 1, wherein vapor or liquid of a fraction having an intermediate boiling point is extracted from the first rectification column while refluxing to the first rectification column.
【請求項3】 沸点の異なる2以上の成分よりなる原料
が相対的に高沸点の留分及び相対的に低沸点の留分より
なり、これを加熱して発生した蒸気を第1の精留塔に導
き、その頂部蒸気を頂部蒸気凝縮還流装置を備えた第2
の精留塔に導き、第2の精留塔の頂部蒸気を凝縮して第
2の精留塔に還流し、第2の精留塔の底部液を第1の精
留塔の上部へ戻しながら留分の抜き出しを行わずに蒸留
操作を行って定常状態に達した後、必要に応じて第2の
精留塔の頂部蒸気の凝縮液の一部を断続的に抜き出し、
第1の精留塔頂部付近における液又は蒸気の純度が所定
値以上になったところで第1の精留塔と第2の精留塔間
における液及び蒸気の流れを閉鎖し、相対的に低沸点の
留分を第2の精留塔の内部に封じ込めた状態で第1の精
留塔の塔底から相対的に高沸点の留分を抜き出すことを
特徴とする請求項1に記載の回分式蒸留方法。
3. A raw material composed of two or more components having different boiling points is composed of a fraction having a relatively high boiling point and a fraction having a relatively low boiling point, and steam generated by heating this is first rectified. 2nd equipped with top vapor condensing and refluxing device
To the second rectification column, condense the top vapor of the second rectification column and return to the second rectification column, and return the bottom liquid of the second rectification column to the upper part of the first rectification column. However, after performing a distillation operation without extracting the fraction to reach a steady state, if necessary, a part of the condensate of the top vapor of the second rectification column is intermittently withdrawn,
When the purity of the liquid or vapor near the top of the first rectification column exceeds a predetermined value, the flow of the liquid and vapor between the first rectification column and the second rectification column is closed, and the relative low The batch having a relatively high boiling point is withdrawn from the bottom of the first rectification column in a state where the boiling point fraction is contained in the second rectification column. Formula distillation method.
【請求項4】 第1の精留塔の頂部付近における液又は
蒸気の純度が、第1の精留塔と第2の精留塔間における
液或いは蒸気、又は第1の精留塔内の蒸気或いは内部還
流液の純度である請求項1、2又は3のいずれかに記載
の回分式蒸留方法。
4. The purity of the liquid or vapor in the vicinity of the top of the first rectification column is the liquid or vapor between the first rectification column and the second rectification column, or in the first rectification column. The batch distillation method according to claim 1, 2 or 3, wherein the purity is vapor or internal reflux liquid.
【請求項5】 原料を加熱する手段を有し頂部蒸気凝縮
還流装置を備えた第1の精留塔、頂部蒸気凝縮還流装置
を備えた第2の精留塔、第1の精留塔の頂部蒸気を第2
の精留塔の下部へ供給する配管、第2の精留塔の底部液
を第1の精留塔の上部へ供給する配管、第2の精留塔の
頂部蒸気凝縮還流装置の凝縮液を抜き出す配管、第1の
精留塔から蒸気又は液を抜き出す配管及び第1の精留塔
の残留液を抜き出す配管を有し、第1の精留塔に供給さ
れた原料から発生する蒸気が順次第1の精留塔と第2の
精留塔を通過するように接続されている装置であって、
第1の精留塔の頂部蒸気を第2の精留塔の下部へ供給す
る配管及び第2の精留塔の底部液を第1の精留塔の上部
へ供給する配管のそれぞれに開閉手段を設けたものであ
ることを特徴とする回分式蒸留装置。
5. A first rectification column having a means for heating a raw material and having a top vapor condensing / refluxing device, a second rectification column having a top vapor condensing / refluxing device, and a first rectification column. Second top steam
Pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column, and the condensate for the top vapor condensation reflux device of the second rectification column. It has a pipe for withdrawing, a pipe for withdrawing vapor or liquid from the first rectification column, and a pipe for withdrawing residual liquid of the first rectification column, and the vapor generated from the raw material supplied to the first rectification column is sequentially A device connected to pass through a first rectification column and a second rectification column,
Opening / closing means for each of the pipe for supplying the top vapor of the first rectification column to the lower part of the second rectification column and the pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column A batch-type distillation apparatus characterized by being provided with.
【請求項6】 第1の精留塔から蒸気又は液を抜き出す
配管が、第1の精留塔頂部における蒸気、内部還流液又
は頂部蒸気凝縮還流装置の凝縮液のいずれかを抜き出す
配管である請求項5記載の回分式蒸留装置。
6. The pipe for withdrawing vapor or liquid from the first rectification column is a pipe for withdrawing either vapor at the top of the first rectification column, internal reflux liquid or condensate of the top vapor condensation reflux device. The batch distillation apparatus according to claim 5.
【請求項7】 原料を加熱する手段を有する第1の精留
塔、頂部蒸気凝縮還流装置を備えた第2の精留塔、第1
の精留塔の頂部蒸気を第2の精留塔の下部へ供給する配
管、第2の精留塔の底部液を第1の精留塔の上部へ供給
する配管、第2の精留塔の頂部蒸気凝縮還流装置の凝縮
液を抜き出す配管及び第1の精留塔の残留液を抜き出す
配管を有し、第1の精留塔に供給された原料から発生す
る蒸気が順次第1の精留塔と第2の精留塔を通過するよ
うに接続されている装置であって、第1の精留塔の頂部
蒸気を第2の精留塔の下部へ供給する配管及び第2の精
留塔の底部液を第1の精留塔の上部へ供給する配管のそ
れぞれに開閉手段を設けたことを特徴とする回分式蒸留
装置。
7. A first rectification column having means for heating a raw material, a second rectification column having a top vapor condensing / refluxing device, and a first rectification column.
For supplying the top vapor of the rectification column to the lower part of the second rectification column, the pipe for supplying the bottom liquid of the second rectification column to the upper part of the first rectification column, the second rectification column Has a pipe for extracting the condensate of the top vapor condensing / refluxing device and a pipe for extracting the residual liquid of the first rectification column, and the vapor generated from the raw material supplied to the first rectification column is sequentially supplied to the first rectification column. An apparatus connected so as to pass through the distillation column and the second rectification column, which is a pipe for supplying the top vapor of the first rectification column to the lower part of the second rectification column and the second rectification column. A batch distillation apparatus, characterized in that an opening / closing means is provided in each of the pipes for supplying the bottom liquid of the distillation column to the upper part of the first rectification column.
JP2165393A 1993-01-18 1993-01-18 Batch distillation method and batch distillation apparatus Expired - Lifetime JPH074485B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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JPH06210101A JPH06210101A (en) 1994-08-02
JPH074485B2 true JPH074485B2 (en) 1995-01-25

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