JPH0744919Y2 - Hydrogen gas discharge device - Google Patents

Hydrogen gas discharge device

Info

Publication number
JPH0744919Y2
JPH0744919Y2 JP1988145041U JP14504188U JPH0744919Y2 JP H0744919 Y2 JPH0744919 Y2 JP H0744919Y2 JP 1988145041 U JP1988145041 U JP 1988145041U JP 14504188 U JP14504188 U JP 14504188U JP H0744919 Y2 JPH0744919 Y2 JP H0744919Y2
Authority
JP
Japan
Prior art keywords
hydrogen gas
palladium
gas discharge
tank
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1988145041U
Other languages
Japanese (ja)
Other versions
JPH0264858U (en
Inventor
正弥 伊豆
隆志 小平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP1988145041U priority Critical patent/JPH0744919Y2/en
Publication of JPH0264858U publication Critical patent/JPH0264858U/ja
Application granted granted Critical
Publication of JPH0744919Y2 publication Critical patent/JPH0744919Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25BREFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B43/00Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat
    • F25B43/04Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat for withdrawing non-condensible gases
    • F25B43/046Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat for withdrawing non-condensible gases for sorption type systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressor (AREA)
  • Sorption Type Refrigeration Machines (AREA)

Description

【考案の詳細な説明】 (イ) 産業上の利用分野 本考案は吸収冷凍機内、あるいは、吸収ヒートポンプ内
で発生する水素ガスを排出する水素ガス排出装置に関す
る。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a hydrogen gas discharge device for discharging hydrogen gas generated in an absorption refrigerator or an absorption heat pump.

(ロ) 従来の技術 例えば、実公昭63-11574号公報には、吸収冷凍機内で発
生する不凝縮ガスに含まれる水素ガスをヒータにより加
熱されたパラジウム管(水素ガス排出管)を介して大気
に放出する水素ガス排出装置が開示されている。
(B) Conventional technology For example, in Japanese Utility Model Publication No. 63-11574, the hydrogen gas contained in the non-condensable gas generated in the absorption refrigerator is heated to the atmosphere via a palladium tube (hydrogen gas exhaust tube) heated by a heater. A hydrogen gas discharge device for discharging hydrogen is disclosed.

(ハ) 考案が解決しようとする課題 上記従来の技術において、不凝縮ガスに水素ガスと共に
含まれていた水、あるいは吸収液である臭化リチウム溶
液等の液状粒子が水素ガス排出管の表面に付着すると、
パラジウム管表面の水素ガス吸着点である活性点が液状
粒子により覆われ、パラジウム管表面への水素ガスの吸
着が妨げられ、水素ガスの排出能力が低下する虞れがあ
った。
(C) Problems to be Solved by the Invention In the above-mentioned conventional technique, water contained in the non-condensable gas together with hydrogen gas or liquid particles such as lithium bromide solution as an absorbing liquid are present on the surface of the hydrogen gas discharge pipe. When attached,
There is a possibility that the active points, which are the adsorption points of hydrogen gas on the surface of the palladium tube, are covered with the liquid particles, the adsorption of hydrogen gas on the surface of the palladium tube is hindered, and the discharge capacity of hydrogen gas is reduced.

本考案は、水等が水素ガス排出管の表面に付着すること
を防止し、水素ガスの排出能力を向上させることを目的
とする。
An object of the present invention is to prevent water and the like from adhering to the surface of the hydrogen gas discharge pipe and improve the discharge capacity of hydrogen gas.

(ニ) 課題を解決するための手段 本考案は、上記課題を解決するために、吸収冷凍機内、
あるいは吸収ヒートポンプ内で発生した水素ガスなどの
不凝縮ガスを貯留するタンク(27)と、このタンクに配
管接続された水素ガス排出管(パラジウム管)(39),
(39)とを備え、この水素ガス排出管を介して水素を排
出する水素ガス排出装置において、タンク(27)から水
素ガス排出管(39),(39)に至る流路の途中にフィル
ター(F)を設けた水素ガス排出装置を提供するもので
ある。
(D) Means for Solving the Problems In order to solve the above problems, the present invention provides
Alternatively, a tank (27) for storing non-condensable gas such as hydrogen gas generated in the absorption heat pump, and a hydrogen gas discharge pipe (palladium pipe) (39) connected to the tank by pipes,
(39), and in the hydrogen gas discharge device for discharging hydrogen through the hydrogen gas discharge pipe, in the middle of the flow path from the tank (27) to the hydrogen gas discharge pipes (39), (39) ( The present invention provides a hydrogen gas discharge device provided with F).

又、吸収冷凍機内、あるいは吸収ヒートポンプ内で発生
した水素ガスなどの不凝縮ガスを貯留するタンク(27)
と、このタンクに配管接続され、パラジウム管(39),
(39)及びパラジウム管を加熱するヒータ(H)を有し
たパラジウムセル(37)とを備え、パラジウムセルを介
して水素を排出する水素ガス排出装置において、タンク
(27)からパラジウムセル(37)に至る流路の途中に冷
却装置(41)を設け、かつ冷却装置(41)の上方にパラ
ジウムセル(37)を設けた水素ガス排出装置を提供する
ものである。
Further, a tank (27) for storing non-condensable gas such as hydrogen gas generated in the absorption refrigerator or the absorption heat pump.
And, connected to this tank by a pipe, a palladium pipe (39),
(39) and a palladium cell (37) having a heater (H) for heating a palladium tube, the hydrogen gas discharging device discharging hydrogen through the palladium cell, the palladium cell (37) from the tank (27). (EN) A hydrogen gas discharge device is provided in which a cooling device (41) is provided in the middle of a flow path leading to and a palladium cell (37) is provided above the cooling device (41).

(ホ) 作用 上記水素ガス排出装置において、水素ガスを含む不凝縮
ガス中の水又は吸収液の粒子がタンク(27)から水素ガ
ス排出管(39),(39)に達する前にフィルター(F)
により除かれるため、水素ガス排出管(39),(39)の
表面に水、又は吸収液が付着することを防止でき、水素
ガスが水又は吸収液に妨げられることなく水素ガス排出
管(39),(39)の表面に吸着し、水素ガス排出能力を
向上させることが可能になる。
(E) Action In the above hydrogen gas discharge device, before the particles of water or absorbing liquid in the non-condensable gas containing hydrogen gas reach the hydrogen gas discharge pipes (39), (39) from the tank (27), the filter (F )
The hydrogen gas exhaust pipes (39) and (39) can be prevented from adhering to the surface of the hydrogen gas exhaust pipes (39) and (39), and the hydrogen gas exhaust pipe (39 ), (39) is adsorbed on the surface, and it becomes possible to improve the hydrogen gas discharge capacity.

又、水素ガスがタンク(27)からパラジウムセル(37)
に至るまでの流路の途中に冷却装置(41)を設け、冷却
装置(41)より上方にパラジウムセル(37)を設けるこ
とにより、不凝縮ガスに含まれていた水粒子が冷却装置
(41)により冷却されて凝縮し、冷却装置(41)の上方
に設けられたパラジウムセル(37)に達することなく水
素ガスの流路を下方へ流れ、パラジウム管(39),(3
9)の表面に付着する水の粒子を大幅に減少させること
ができ、水素ガス排出能力を向上させることが可能にな
る。
Also, hydrogen gas is passed from the tank (27) to the palladium cell (37).
By providing the cooling device (41) in the middle of the flow path leading up to, and providing the palladium cell (37) above the cooling device (41), the water particles contained in the non-condensable gas are cooled. ) Cools and condenses and flows downward in the hydrogen gas flow path without reaching the palladium cell (37) provided above the cooling device (41), and the palladium pipes (39), (3
Particles of water adhering to the surface of 9) can be greatly reduced, and the hydrogen gas discharge capacity can be improved.

(ヘ) 実施例 以下、本考案の一実施例を図面に基づいて詳細に説明す
る。
(F) Embodiment Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第2図は冷媒に水(H2O)、吸収液(溶液)に臭化リチ
ウム(LiBr)溶液を使用して吸収冷凍機を示したもので
ある。
FIG. 2 shows an absorption refrigerator using water (H 2 O) as a refrigerant and a lithium bromide (LiBr) solution as an absorbing liquid (solution).

第2図において、(1)は高温再生器、(2)は低温再
生器、(3)は凝縮器、(4)は蒸発吸収器胴、(5)
は蒸発器、(6)は蒸発器、(7)は高温熱交換器、
(8)は低温熱交換器であり、それぞれが、冷媒蒸気管
(10)、冷媒管(11),(12)、稀吸収液管(13)乃至
(16)、中間液管(18),(19)、濃吸収液管(20),
(21)により配管接続されている。又、(22)は吸収器
(6)、及び凝縮器(3)に配管された冷却水管、(2
5)は蒸発器(5)に配管されて冷水管である。又、(2
6)は不凝縮ガスの抽気装置であり、(27)はタンク、
(28)はエゼクタ、(30),(31),及び(32)はそれ
ぞれエゼクタ(28)に接続された不凝縮ガスの導入管、
稀吸収液管(14)から分岐した吸収液管、及び気液流下
管である。さらに、(33)はタンク(27)の上部に排出
管(34)を介して接続された真空ポンプ、(35)はタン
ク(27)の上壁に設けられた水素ガス排出装置であり、
(36)は上昇管、(37)はパラジウムセルである。
In FIG. 2, (1) is a high temperature regenerator, (2) is a low temperature regenerator, (3) is a condenser, (4) is an evaporative absorber cylinder, and (5).
Is an evaporator, (6) is an evaporator, (7) is a high temperature heat exchanger,
(8) is a low temperature heat exchanger, each of which is a refrigerant vapor pipe (10), a refrigerant pipe (11), (12), a rare absorption liquid pipe (13) to (16), an intermediate liquid pipe (18), (19), concentrated absorbent tube (20),
The pipe is connected by (21). Further, (22) is a cooling water pipe connected to the absorber (6) and the condenser (3),
5) is a cold water pipe connected to the evaporator (5). In addition, (2
6) is a non-condensable gas extraction device, (27) is a tank,
(28) is an ejector, (30), (31), and (32) are noncondensable gas introduction pipes connected to the ejector (28), respectively.
An absorption liquid pipe branched from the rare absorption liquid pipe (14) and a gas-liquid falling pipe. Further, (33) is a vacuum pump connected to the upper part of the tank (27) via a discharge pipe (34), and (35) is a hydrogen gas discharge device provided on the upper wall of the tank (27),
(36) is a riser, and (37) is a palladium cell.

上記水素ガス排出装置(35)の上昇管(36)、即ち水素
ガスの流路の途中には第1図に示したように、濾紙等の
フィルター(F)が設けられている。又、パラジウムセ
ル(37)は容器(38)、この容器(38)の相対向した側
壁間にわたされたパラジウム管(水素ガス排出管)(3
9),(39)及びパラジウム管(39),(39)を加熱す
るヒータ(H)から構成されている。
As shown in FIG. 1, a filter (F) such as a filter paper is provided in the rising pipe (36) of the hydrogen gas discharge device (35), that is, in the middle of the hydrogen gas flow path. Further, the palladium cell (37) is a container (38), and a palladium pipe (hydrogen gas discharge pipe) (3) that is passed between the opposite side walls of the container (38).
9), (39) and a palladium tube (39), and a heater (H) for heating (39).

上記吸収冷凍機が運転されているときには、従来の吸収
冷凍機と同様に、機械内を吸収液及び冷媒が流れ、温度
低下した冷水が冷水管(25)を介して負荷(図示せず)
へ流れる。また、タンク(27)へはエゼクタ(28)から
気液流下管(32)を介して不凝縮ガス、及び吸収液が流
入し、吸収液から分離した不凝縮ガスがタンク(27)の
上部に滞留する。そして、タンク(27)内の圧力が高く
なったときには真空ポンプ(33)が運転され、不凝縮ガ
スが排出される。
When the absorption refrigeration machine is operating, as in the conventional absorption refrigeration machine, the absorption liquid and the refrigerant flow in the machine, and the cold water whose temperature has dropped is loaded through the cold water pipe (25) (not shown).
Flows to. Further, the non-condensable gas and the absorbing liquid flow into the tank (27) from the ejector (28) through the gas-liquid flow-down pipe (32), and the non-condensing gas separated from the absorbing liquid flows to the upper part of the tank (27). Stay. Then, when the pressure in the tank (27) becomes high, the vacuum pump (33) is operated to discharge the non-condensable gas.

又、タンク(27)の上部に滞留した不凝縮ガスは上昇管
(36)を第1図に矢印にて示したように上方へ流れる。
ここで、不凝縮ガスに含まれている水、又は吸収液の粒
子がフィルター(F)により除去される。そして、容器
(38)に流入した水素ガスがパラジウム管(39),(3
9)の管壁を透過し、容器(38)の外部の開口から大気
中へ放出される。
Further, the non-condensable gas accumulated in the upper part of the tank (27) flows upward in the rising pipe (36) as shown by the arrow in FIG.
Here, the water contained in the non-condensed gas or the particles of the absorbing liquid are removed by the filter (F). Then, the hydrogen gas flowing into the container (38) is replaced by the palladium pipes (39), (3
It permeates the wall of 9) and is released into the atmosphere from the opening outside the container (38).

上記本考案の実施例によれば、タンク(27)から流れて
きた不凝縮ガス中の水分及び吸収液の粒子が上昇管(3
6)の途中に設けられたフィルター(F)にて吸収さ
れ、容器(38)内へ流入する水素ガス以外の不純物を極
く僅かに抑えることができ、パラジウム管(39),(3
9)表面への水粒子等の付着を防止できる。この結果、
水素ガスが水分等に妨げられることなくパラジウム管
(39)の表面に吸着し、水素ガス排出能力を向上するこ
とができる。
According to the above-mentioned embodiment of the present invention, the particles of the water and the absorbing liquid in the non-condensable gas flowing from the tank (27) are transferred to the rising pipe (3
Impurities other than hydrogen gas that are absorbed by the filter (F) provided in the middle of 6) and flow into the container (38) can be suppressed to a very small extent, and the palladium pipes (39), (3
9) Water particles can be prevented from adhering to the surface. As a result,
Hydrogen gas can be adsorbed on the surface of the palladium pipe (39) without being hindered by moisture or the like, and the hydrogen gas discharge capacity can be improved.

又、第1図に鎖線にて示したようにフィルター(F)を
容器(38)内のパラジウム管(39),(39)より上流
側、即ち下方に設けた場合にも上記実施例と同様な作用
効果を得ることができる。
Also, as shown by the chain line in FIG. 1, when the filter (F) is provided upstream of the palladium pipes (39) and (39) in the container (38), that is, below the same, the same as in the above embodiment. Various operational effects can be obtained.

又、第3図は他の水素ガス排出装置を示したものであ
り、第3図において第1図と図番が同じものは同様なも
のであり、その詳細な説明は省略する。第3図に示した
ように、上昇管(36)の途中に冷却装置(41)が設けら
れ、冷却装置(41)より上方にパラジウム管(39),
(39)を備えた容器(38)が位置している。すなわち、
冷却装置(41)はパラジウム管(39),(39)より下方
に位置し、上昇管(36)の一部を覆っている。そして、
冷却装置(41)には冷却水が流れ、上昇管(36)の冷却
装置取付部が冷却される。このため、上昇管(36)内を
流れて来た不凝縮ガス中の水は上昇管(36)の内面に凝
縮する。凝縮した水は上昇管(36)を下方へ流れ、タン
ク(27)内へ滴下する。そして、容器(38)内へは水の
含有量の少ない不凝縮ガスが流入し、不凝縮ガス中の水
素ガスがパラジウム管(39),(39)を介して大気中へ
放出される。
Further, FIG. 3 shows another hydrogen gas discharging device. In FIG. 3, those having the same drawing numbers as those in FIG. 1 are the same, and detailed description thereof will be omitted. As shown in FIG. 3, a cooling device (41) is provided in the middle of the rising pipe (36), and a palladium pipe (39) is provided above the cooling device (41).
Located is a container (38) with (39). That is,
The cooling device (41) is located below the palladium pipes (39) and (39) and covers a part of the rising pipe (36). And
Cooling water flows through the cooling device (41), and the cooling device mounting portion of the rising pipe (36) is cooled. Therefore, the water in the non-condensable gas flowing through the inside of the rising pipe (36) is condensed on the inner surface of the rising pipe (36). The condensed water flows downward in the rising pipe (36) and drops into the tank (27). Then, the non-condensable gas having a low water content flows into the container (38), and the hydrogen gas in the non-condensable gas is released into the atmosphere through the palladium pipes (39) and (39).

上記第3図に示した水素ガス排出装置によれば、不凝縮
ガスに含まれている水が冷却装置(41)により冷却され
ている上昇管(36)の内面に凝縮し、凝縮した水は上方
のパラジウムセル(39),(39)に達することなく上昇
管を下方へ流れるため、水素ガスが流れる上昇管(36)
を凝縮水の戻り流路と兼用し、簡単な構成で容器(38)
内へ流入する水の量を大幅に減少させることができ、パ
ラジウム管(39),(39)表面への水の付着を僅かに抑
えることができ、この結果、水素ガスが水にほとんど妨
げられることなくパラジウム管(39)の表面に吸着し、
水素ガス排出能力を向上させることができる。
According to the hydrogen gas discharge device shown in FIG. 3, the water contained in the non-condensed gas is condensed on the inner surface of the rising pipe (36) cooled by the cooling device (41), and the condensed water is The rising pipe (36) in which hydrogen gas flows because it flows downward in the rising pipe without reaching the upper palladium cells (39), (39).
Also serves as a return flow path for condensed water, and has a simple structure (38)
The amount of water flowing into the interior can be greatly reduced, and the adhesion of water to the surfaces of the palladium pipes (39) and (39) can be slightly suppressed, and as a result, hydrogen gas is almost prevented by water. Without adsorbing on the surface of the palladium tube (39),
The hydrogen gas discharge capacity can be improved.

尚、上記実施において吸収冷凍機について説明したが吸
収ヒートポンプに設けられている水素ガス排出装置を同
じ構成にすることにより、同様の作用効果を得ることが
できる。
Although the absorption refrigerating machine has been described in the above embodiment, the same action and effect can be obtained by making the hydrogen gas discharge device provided in the absorption heat pump have the same structure.

(ト) 考案の効果 本考案は以上のように構成された水素ガス排出装置であ
り、不凝縮ガスを貯留するタンクから水素ガス排出管に
至る流路の途中にフィルターを設けたため、流路を流れ
て来た水あるいは吸収液等の粒子がフィルターにより除
かれ、水あるいは吸収液が水素ガス排出管の表面に付着
することを防止でき、水素ガスの排出能力を向上するこ
とができる。
(G) Effect of the Invention The present invention is a hydrogen gas discharge device configured as described above, and since a filter is provided in the middle of the flow path from the tank that stores the non-condensable gas to the hydrogen gas discharge pipe, Particles of the flowing water or absorbing liquid are removed by the filter, and it is possible to prevent the water or absorbing liquid from adhering to the surface of the hydrogen gas discharge pipe, and improve the discharge capacity of hydrogen gas.

又、タンクからパラジウムセルに至る水素ガスの流路の
途中に冷却装置を設け、かつ冷却装置の上方にパラジウ
ムセルを位置させたので、流路を流れてきた水の粒子が
冷却装置によって凝縮して流路を流れ落ち、水素ガスの
流路を凝縮水の戻り流路と兼用し、凝縮した水がパラジ
ウムセルのパラジウム管に達することを簡単な構成で確
実に回避でき、水のパラジウム管への付着を僅かに抑え
ることができ、この結果、水素ガスの排出能力を向上す
ることができる。
Further, since the cooling device is provided in the middle of the flow path of hydrogen gas from the tank to the palladium cell and the palladium cell is located above the cooling device, the water particles flowing through the flow path are condensed by the cooling device. Flow through the flow path, the hydrogen gas flow path also serves as the return path for the condensed water, and it is possible to reliably prevent condensed water from reaching the palladium tube of the palladium cell with a simple configuration. Adhesion can be slightly suppressed, and as a result, the hydrogen gas discharge capacity can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の一実施例を示す水素ガス排出装置の概
略断面図、第2図は吸収冷凍機の回路構成図、第3図は
本考案の他の実施例を示す水素ガス排出装置の概略断面
図である。 (38)……容器、(39),(39)……パラジウム管(水
素ガス排出管)、(F)……フィルター、(41)……冷
却装置。
FIG. 1 is a schematic cross-sectional view of a hydrogen gas discharge device showing an embodiment of the present invention, FIG. 2 is a circuit configuration diagram of an absorption refrigerator, and FIG. 3 is a hydrogen gas discharge device showing another embodiment of the present invention. FIG. (38) …… Container, (39), (39) …… Palladium tube (hydrogen gas exhaust tube), (F) …… Filter, (41) …… Cooling device.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】吸収冷凍機内、あるいは吸収ヒートポンプ
内で発生した水素ガスなどの不凝縮ガスを貯留するタン
クと、このタンクに配管接続された水素ガス排出管とを
備え、この水素ガス排出管を介して水素を排出する水素
ガス排出装置において、タンクから水素ガス排出管に至
る流路の途中にフィルターを設けたことを特徴とする水
素ガス排出装置。
1. A tank for storing a non-condensable gas such as hydrogen gas generated in an absorption refrigerator or an absorption heat pump, and a hydrogen gas discharge pipe connected to this tank by piping. A hydrogen gas discharge device for discharging hydrogen through a hydrogen gas discharge device, characterized in that a filter is provided in the middle of a flow path from the tank to the hydrogen gas discharge pipe.
【請求項2】吸収冷凍機内、あるいは吸収ヒートポンプ
内で発生した水素ガスなどの不凝縮ガスを貯留するタン
クと、このタンクに配管接続され、不凝縮ガス中の水素
を外部に透過するパラジウム管及びこのパラジウム管を
加熱するヒータを有したパラジウムセルとを備え、パラ
ジウムセルを介して水素を排出する水素ガス排出装置に
おいて、タンクからパラジウムセルに至る流路の途中に
冷却装置を設け、かつ冷却装置の上方にパラジウムセル
を設けたことを特徴とする水素ガス排出装置。
2. A tank for storing non-condensable gas such as hydrogen gas generated in an absorption refrigerator or an absorption heat pump, a palladium pipe connected to the tank for transmitting hydrogen in the non-condensed gas to the outside, and In a hydrogen gas discharge device including a palladium cell having a heater for heating this palladium tube, which discharges hydrogen through the palladium cell, a cooling device is provided in the middle of a flow path from the tank to the palladium cell, and the cooling device is also provided. A hydrogen gas discharge device having a palladium cell provided above.
JP1988145041U 1988-11-07 1988-11-07 Hydrogen gas discharge device Expired - Fee Related JPH0744919Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988145041U JPH0744919Y2 (en) 1988-11-07 1988-11-07 Hydrogen gas discharge device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988145041U JPH0744919Y2 (en) 1988-11-07 1988-11-07 Hydrogen gas discharge device

Publications (2)

Publication Number Publication Date
JPH0264858U JPH0264858U (en) 1990-05-16
JPH0744919Y2 true JPH0744919Y2 (en) 1995-10-11

Family

ID=31413283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988145041U Expired - Fee Related JPH0744919Y2 (en) 1988-11-07 1988-11-07 Hydrogen gas discharge device

Country Status (1)

Country Link
JP (1) JPH0744919Y2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139669A (en) * 1976-05-17 1977-11-21 Mitsubishi Heavy Ind Ltd Removal of hydrogen
JPS53103964U (en) * 1977-01-27 1978-08-22
JPS60205161A (en) * 1984-03-29 1985-10-16 株式会社 田熊総合研究所 Device for removing noncondensable gas of absorption type refrigerator

Also Published As

Publication number Publication date
JPH0264858U (en) 1990-05-16

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