JPH0761817A - Method for forming oxide superconducting film by laser ablation method - Google Patents
Method for forming oxide superconducting film by laser ablation methodInfo
- Publication number
- JPH0761817A JPH0761817A JP5207534A JP20753493A JPH0761817A JP H0761817 A JPH0761817 A JP H0761817A JP 5207534 A JP5207534 A JP 5207534A JP 20753493 A JP20753493 A JP 20753493A JP H0761817 A JPH0761817 A JP H0761817A
- Authority
- JP
- Japan
- Prior art keywords
- film
- superconducting film
- target
- laser ablation
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
(57)【要約】
【目的】 多結晶基板上に、高い臨界電流密度を有する
Y1 Ba2 Cu3 O7-X超電導膜をレーザアブレーショ
ン法により成膜する方法を提供する。
【構成】 ターゲットにレーザを照射することにより、
ターゲット表面から飛散する物質を多結晶基板上に堆積
させて、Y1 Ba2 Cu3 O7-X 超電導膜を成膜する方
法であって、ターゲット中に、6重量%以上20重量%
以下のAgを含むことを特徴とする。
(57) [Summary] [Object] To provide a method for forming a Y 1 Ba 2 Cu 3 O 7-X superconducting film having a high critical current density on a polycrystalline substrate by a laser ablation method. [Configuration] By irradiating the target with a laser,
A method of depositing a substance scattered from a target surface on a polycrystalline substrate to form a Y 1 Ba 2 Cu 3 O 7-X superconducting film, wherein the target contains 6% by weight or more and 20% by weight or more.
It is characterized by containing the following Ag.
Description
【0001】[0001]
【産業上の利用分野】この発明は、レーザアブレーショ
ン法による酸化物超電導膜の成膜方法に関するものであ
り、特に、レーザアブレーション法による多結晶基板上
へのY1 Ba 2 Cu3 O7-X 超電導膜の成膜方法に関す
るものである。BACKGROUND OF THE INVENTION This invention relates to laser ablation.
The present invention relates to a method for forming an oxide superconducting film by the
, Especially on polycrystalline substrates by laser ablation
To Y1Ba 2Cu3O7-XRegarding superconducting film formation method
It is something.
【0002】[0002]
【従来の技術】近年、レーザ装置の発達は目覚ましいも
のがあり、それを用いたレーザアブレーション法による
成膜も盛んに行なわれている。レーザアブレーション法
では、ターゲットにレーザを照射することにより、ター
ゲットの照射部からターゲットを構成する物質の粒子が
原子および分子の状態で飛散し、この飛散した粒子が基
板に到達して、基板上に成膜が行なわれる。2. Description of the Related Art In recent years, the development of a laser device has been remarkable, and film formation by a laser ablation method using it has been actively performed. In the laser ablation method, by irradiating the target with a laser, the particles of the substance constituting the target are scattered in the state of atoms and molecules from the irradiation part of the target, and these scattered particles reach the substrate, and onto the substrate. A film is formed.
【0003】レーザアブレーション法による成膜は、ス
パッタ法、真空蒸着法、CVD法等の他の気相法に比較
して、成膜速度が非常に速いため、工業的に生産速度を
高めることができる。また、レーザアブレーション法に
よる成膜は、他の気相法に比較して、成膜雰囲気が比較
的自由に変えられるため、酸化物、窒化物等の成膜にも
適している。The film formation by the laser ablation method has a very high film formation rate as compared with other vapor phase methods such as the sputtering method, the vacuum vapor deposition method and the CVD method, and therefore the production rate can be industrially increased. it can. Further, the film formation by the laser ablation method is suitable for film formation of oxides, nitrides, etc. because the film formation atmosphere can be changed relatively freely as compared with other vapor phase methods.
【0004】このようなことから、最近、レーザアブレ
ーション法は、工業的な生産に採用されることが非常に
多くなってきている。For these reasons, the laser ablation method has recently been very often used for industrial production.
【0005】[0005]
【発明が解決しようとする課題】レーザアブレーション
法を用いて基板上にY1 Ba2 Cu3 O7-X 超電導膜の
成膜を行なう場合、数百mTorrの酸素雰囲気中の成
膜室内でY1 Ba2 Cu 3 O7-X の組成かそれに近い組
成のターゲットにエキシマレーザを照射し、ターゲット
から飛散する原子、分子、あるいはそれらが励起された
状態の粒子が基板上に堆積して、Y1 Ba2 Cu3 O
7-X 超電導膜が得られる。Problem to be Solved by the Invention Laser ablation
On the substrate using the method1Ba2Cu3O7-XOf superconducting film
When forming a film, the film is grown in an oxygen atmosphere of several hundred mTorr.
Y in the membrane chamber1Ba2Cu 3O7-XComposition or a group close to it
Irradiate excimer laser on target
Atoms, molecules, or those that are scattered from
Particles are deposited on the substrate, and Y1Ba2Cu3O
7-XA superconducting film is obtained.
【0006】このようなY1 Ba2 Cu3 O7-X 超電導
膜の成膜において、基板がMgO等の単結晶基板の場合
は、成膜された膜は単結晶あるいはそれに近い状態とな
り、結晶粒界の影響を受けることがないかあるいは極め
て少なくなる。そのため、得られる超電導膜の臨界電流
密度も非常に高くなり、液体窒素温度で1×106 A/
cm2 以上の値が容易に得られる。In the formation of such a Y 1 Ba 2 Cu 3 O 7-X superconducting film, when the substrate is a single crystal substrate such as MgO, the formed film becomes a single crystal or a state close to it, and a crystal is formed. It is not affected by the grain boundaries or is extremely reduced. Therefore, the critical current density of the obtained superconducting film also becomes very high, and the liquid nitrogen temperature is 1 × 10 6 A /
A value of cm 2 or more can be easily obtained.
【0007】しかしながら、超電導マグネット、超電導
送電、超電導限流器等の超電導応用に使用される超電導
線材を得るためには、ハステロイ、銀、あるいはYSZ
等の多結晶基板にY1 Ba2 Cu3 O7-X 超電導膜を成
膜することが必要となる。このように基板が多結晶であ
る場合には、成膜された膜も多結晶となり、結晶粒界の
影響を受けるようになる。そのため、多結晶基板上に成
膜された超電導膜の臨界電流密度は、単結晶基板上に成
膜された超電導膜の臨界電流密度と比較して大きく低下
し、4×104 A/cm2 という低い値しか得ることが
できなかった。However, in order to obtain a superconducting wire used for superconducting applications such as superconducting magnets, superconducting power transmission, and superconducting fault current limiters, hastelloy, silver, or YSZ.
It is necessary to form a Y 1 Ba 2 Cu 3 O 7-X superconducting film on a polycrystalline substrate such as. When the substrate is polycrystalline as described above, the formed film is also polycrystalline and is affected by the crystal grain boundaries. Therefore, the critical current density of the superconducting film formed on the polycrystalline substrate is much lower than the critical current density of the superconducting film formed on the single crystal substrate, which is 4 × 10 4 A / cm 2 I could only get a low value.
【0008】この発明の目的は、上述の問題点を解決
し、多結晶基板上に、液体窒素温度で1×105 A/c
m2 以上の高い臨界電流密度を有するY1 Ba2 Cu3
O7-X超電導膜を、レーザアブレーション法により成膜
することができる方法を提供することにある。An object of the present invention is to solve the above-mentioned problems and to provide a liquid crystal on a polycrystalline substrate at a temperature of 1 × 10 5 A / c
Y 1 Ba 2 Cu 3 having a high critical current density of m 2 or more
An object of the present invention is to provide a method capable of forming an O 7 -X superconducting film by a laser ablation method.
【0009】[0009]
【課題を解決するための手段】この発明による酸化物超
電導膜の成膜方法は、ターゲットにレーザを照射するこ
とにより、ターゲット表面から飛散する物質を多結晶基
板上に堆積させて、Y 1 Ba2 Cu3 O7-X 超電導膜を
成膜する方法であって、ターゲット中に、6重量%以上
20重量%以下のAgを含むことを特徴としている。The oxide superoxide according to the present invention
The method of forming the conductive film is to irradiate the target with a laser.
With, the substances scattered from the target surface are
Accumulate on a plate, Y 1Ba2Cu3O7-XSuperconducting film
A method for forming a film, wherein 6% by weight or more is contained in the target.
It is characterized by containing 20% by weight or less of Ag.
【0010】[0010]
【作用】この発明によれば、Agが含まれたターゲット
を使用して、多結晶基板上にレーザアブレーション法に
よりY1 Ba2 Cu3 O7-X 超電導膜の成膜を行なって
いる。そのため、成膜されたY1 Ba2 Cu3 O7-X 超
電導膜の結晶粒が大きくなり、通電時に結晶粒界の影響
を受けることが少なくなる。したがって、臨界電流密度
が向上する。According to the present invention, the Y 1 Ba 2 Cu 3 O 7-X superconducting film is formed on the polycrystalline substrate by the laser ablation method using the target containing Ag. Therefore, the crystal grains of the formed Y 1 Ba 2 Cu 3 O 7-X superconducting film become large, and the influence of the crystal grain boundaries during current application is reduced. Therefore, the critical current density is improved.
【0011】前述のように、単結晶の超電導膜の場合、
1×106 A/cm2 以上の臨界電流密度が得られる
が、多結晶の超電導膜の場合は、104 A/cm2 のオ
ーダーである。このように多結晶の超電導膜の臨界電流
密度が低くなる理由は、結晶粒界が存在することによ
り、粒界に絶縁体の析出物が析出することと、結晶間の
結晶方位が互いに傾いているため超電導電流が流れにく
くなることによる。したがって、結晶粒径が大きければ
大きいほど粒界の影響を受けることが少なくなり、粒界
電流密度は高くなる。As described above, in the case of a single crystal superconducting film,
A critical current density of 1 × 10 6 A / cm 2 or more can be obtained, but in the case of a polycrystalline superconducting film, it is on the order of 10 4 A / cm 2 . The reason why the critical current density of the polycrystalline superconducting film becomes low in this way is that the existence of crystal grain boundaries causes the precipitation of insulators at the grain boundaries and the crystal orientations between the crystals are inclined to each other. It is because the superconducting current becomes difficult to flow because of the existence of Therefore, the larger the crystal grain size, the smaller the influence of the grain boundaries, and the higher the grain boundary current density.
【0012】また、Agを用いたターゲットを使用する
と、成膜されたY1 Ba2 Cu3 O 7-X 超電導膜の結晶
粒界に、Y、Ba、Cuの化合物が析出することが抑え
られる。そのため、臨界電流密度の低下が防止できる。
通常析出する化合物は絶縁体であるため、たとえば、結
晶粒界の面積の80%に相当する部分に絶縁物が析出す
ると、臨界電流密度は絶縁体が析出しない場合に比較し
て20%になってしまう。しかし、Agを用いたターゲ
ットを使用すると、結晶粒界に析出する絶縁体は、結晶
粒界の面積の10%以下に抑えられるため、臨界電流密
度の低下を防止することができる。Also, a target using Ag is used.
And the deposited Y1Ba2Cu3O 7-XCrystal of superconducting film
Suppresses the precipitation of Y, Ba, and Cu compounds at the grain boundaries
To be Therefore, reduction of the critical current density can be prevented.
Since the compound that usually precipitates is an insulator,
Insulators are deposited on the area corresponding to 80% of the grain boundary area.
Then, the critical current density is lower than that when the insulator is not deposited.
Will be 20%. However, target using Ag
Insulators that precipitate at the grain boundaries are
Since the grain boundary area is suppressed to 10% or less, the critical current density is reduced.
It is possible to prevent a decrease in degree.
【0013】さらに、本発明によれば、絶縁体が結晶粒
界に析出する代わりに、Agが析出することがある。こ
の場合、Agは比抵抗が小さく、粒界の面積は析出した
Agの厚さに比較して大きいため、その抵抗は無視でき
るぐらい小さくなる。Further, according to the present invention, Ag may be deposited instead of depositing the insulator at the grain boundaries. In this case, since the specific resistance of Ag is small and the area of the grain boundary is larger than the thickness of the precipitated Ag, the resistance becomes negligibly small.
【0014】また、一般に、Y−Ba−Cu−O超電導
膜において、結晶粒界における結晶方位が互いに傾いて
いると、超電導電流が流れにくくなるため、結晶粒界に
絶縁物が析出しなくても多結晶膜は臨界電流密度が低下
してしまうという現象が発生する。しかしながら、この
発明によれば、Agの析出により、超電導膜から極めて
抵抗の低いAgに電流が流れ、さらに超電導体に電流が
流れるので、上述のように、結晶の互いの結晶方位が傾
いているために起こる超電導電流が流れにくくなるとい
う現象がなくなる。実際には、Agの析出により、電流
は、超電導体→常電導体→超電導体と流れるが、Agの
抵抗が非常に低いためその抵抗は無視できる。むしろA
gの析出により、結晶間の結晶方位の傾きによる臨界電
流密度の低下を、抵抗の低い常電導層の介在により防ぐ
ことができる。In general, in the Y-Ba-Cu-O superconducting film, when the crystal orientations at the crystal grain boundaries are inclined to each other, it becomes difficult for the superconducting current to flow, so that the insulator does not precipitate at the crystal grain boundaries. However, a phenomenon occurs that the critical current density of the polycrystalline film decreases. However, according to the present invention, the precipitation of Ag causes a current to flow from the superconducting film to Ag having an extremely low resistance, and further a current to the superconductor, so that the crystal orientations of the crystals are tilted as described above. The phenomenon that the superconducting conductive current becomes difficult to flow due to this is eliminated. Actually, due to the precipitation of Ag, a current flows through a superconductor → a normal conductor → a superconductor, but the resistance of Ag is so low that the resistance can be ignored. Rather A
By depositing g, it is possible to prevent a decrease in the critical current density due to the inclination of the crystal orientation between the crystals due to the presence of the low-resistance normal-conducting layer.
【0015】さらに、本発明によれば、Y1 Ba2 Cu
3 O7-X 超電導膜の結晶中に、1μm以下のAgあるい
はAgの酸化物が析出する。そのため、この析出物がピ
ン止め点となって、臨界電流密度が向上する。Further in accordance with the present invention, Y 1 Ba 2 Cu
Ag or an oxide of Ag of 1 μm or less is precipitated in the crystal of the 3 O 7 -X superconducting film. Therefore, this precipitate serves as a pinning point to improve the critical current density.
【0016】[0016]
【実施例】Y1 Ba2 Cu3 O7-X の組成のターゲット
中にAgを5〜25重量%の間で変化させて含ませるよ
うにして、レーザアブレーション法により成膜を行なっ
た。レーザとしては、KrFを励起ガスとして用いた波
長248nmのエキシマレーザを用い、繰返し周波数は
50Hzで行なった。このときの成膜雰囲気は、酸素ガ
ス圧300mTorrであった。ターゲットと基板の間
の距離は50mmで成膜した。10分間の成膜により、
0.5μmの膜が得られた。EXAMPLE A film having a composition of Y 1 Ba 2 Cu 3 O 7-X was formed by a laser ablation method so that Ag was changed to be contained between 5 and 25% by weight. An excimer laser having a wavelength of 248 nm using KrF as an excitation gas was used as the laser, and the repetition frequency was 50 Hz. The film forming atmosphere at this time was an oxygen gas pressure of 300 mTorr. The distance between the target and the substrate was 50 mm. By film formation for 10 minutes,
A 0.5 μm film was obtained.
【0017】このようにして得られたY−Ba−Cu−
O系酸化物超電導膜について、液体窒素中で4端子法に
より、臨界電流密度を測定した。その結果を図1に示
す。図1において、横軸はターゲット中に含まれるAg
の量(重量%)を示し、縦軸は77.3Kでの臨界電流
密度(×105 A/cm2 )を示す。Y-Ba-Cu-obtained in this way
The critical current density of the O-based oxide superconducting film was measured in liquid nitrogen by the 4-terminal method. The result is shown in FIG. In FIG. 1, the horizontal axis represents Ag contained in the target.
(% By weight), and the vertical axis represents the critical current density (× 10 5 A / cm 2 ) at 77.3K.
【0018】図1より明らかなように、ターゲット中に
含まれるAgの量が6重量%以上20重量%以下のと
き、高い臨界電流密度を有する超電導膜が得られ、特
に、Agを9重量%含んだターゲットを使用して成膜す
ることにより、最も高い臨界電流密度を有する超電導膜
が得られることがわかる。また、このAgを9重量%含
んだターゲットを使用して成膜した膜と、Agを含まな
いターゲットを使用して成膜した膜との結晶粒の平均の
大きさを測定したところ、それぞれ3μmと0.2μm
であった。As is apparent from FIG. 1, when the amount of Ag contained in the target is 6% by weight or more and 20% by weight or less, a superconducting film having a high critical current density is obtained, and particularly, 9% by weight of Ag is obtained. It can be seen that the superconducting film having the highest critical current density can be obtained by forming the film using the target containing the film. Further, when the average size of crystal grains of the film formed by using the target containing 9% by weight of Ag and the film formed by using the target containing no Ag was measured to be 3 μm each. And 0.2 μm
Met.
【0019】[0019]
【発明の効果】以上説明したように、この発明によれ
ば、多結晶基板上に、高い臨界電流密度を有するY1 B
a2 Cu3 O7-X 超電導膜をレーザアブレーション法に
よって成膜することができる。As described above, according to the present invention, Y 1 B having a high critical current density is formed on a polycrystalline substrate.
The a 2 Cu 3 O 7-X superconducting film can be formed by the laser ablation method.
【図1】ターゲット中に含まれるAgの量と77.3K
での臨界電流密度との関係を示す図である。FIG. 1 Amount of Ag contained in a target and 77.3K
It is a figure which shows the relationship with the critical current density in.
フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 39/24 ZAA B 9276−4M // H01B 12/06 ZAA 7244−5G (72)発明者 林 憲器 大阪市此花区島屋一丁目1番3号 住友電 気工業株式会社大阪製作所内 (72)発明者 藤野 剛三 大阪市此花区島屋一丁目1番3号 住友電 気工業株式会社大阪製作所内 (72)発明者 原 築志 東京都調布市西つつじケ丘二丁目4番1号 東京電力株式会社技術研究所内 (72)発明者 石井 英雄 東京都調布市西つつじケ丘二丁目4番1号 東京電力株式会社技術研究所内Continuation of the front page (51) Int.Cl. 6 Identification number Reference number in the agency FI Technical display location H01L 39/24 ZAA B 9276-4M // H01B 12/06 ZAA 7244-5G (72) Inventor Hayashi Kenki Osaka 1-3-3 Shimaya, Konohana-ku, Yokohama, Osaka, Ltd. (72) Inventor, Gozo Fujino 1-3-3 Shimaya, Konohana-ku, Osaka (72) Invention, Osaka Tatsushi Hara 2-4-1, Nishi-Atsujigaoka, Chofu-shi, Tokyo Inside TEPCO Ltd. Technical Research Institute (72) Inventor Hideo Ishii 2-4-1 Nishi-Atsujigaoka, Chofu-shi, Tokyo Inside TEPCO Technical Research Institute
Claims (1)
り、ターゲット表面から飛散する物質を多結晶基板上に
堆積させて、Y1 Ba2 Cu3 O7-X 超電導膜を成膜す
る方法であって、 前記ターゲット中に、6重量%以上20重量%以下のA
gを含むことを特徴とする、レーザアブレーション法に
よる酸化物超電導膜の成膜方法。1. A method for forming a Y 1 Ba 2 Cu 3 O 7 -X superconducting film by irradiating a target with a laser to deposit a substance scattered from the target surface on a polycrystalline substrate. In the target, 6% by weight or more and 20% by weight or less of A
A method for forming an oxide superconducting film by a laser ablation method, which comprises g.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5207534A JPH0761817A (en) | 1993-08-23 | 1993-08-23 | Method for forming oxide superconducting film by laser ablation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5207534A JPH0761817A (en) | 1993-08-23 | 1993-08-23 | Method for forming oxide superconducting film by laser ablation method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0761817A true JPH0761817A (en) | 1995-03-07 |
Family
ID=16541325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5207534A Pending JPH0761817A (en) | 1993-08-23 | 1993-08-23 | Method for forming oxide superconducting film by laser ablation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0761817A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021190256A (en) * | 2020-05-28 | 2021-12-13 | 株式会社フジクラ | Oxide superconducting wire material and method for manufacturing the same |
-
1993
- 1993-08-23 JP JP5207534A patent/JPH0761817A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021190256A (en) * | 2020-05-28 | 2021-12-13 | 株式会社フジクラ | Oxide superconducting wire material and method for manufacturing the same |
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