JPH0777605A - Production of optical spot array element - Google Patents
Production of optical spot array elementInfo
- Publication number
- JPH0777605A JPH0777605A JP24869293A JP24869293A JPH0777605A JP H0777605 A JPH0777605 A JP H0777605A JP 24869293 A JP24869293 A JP 24869293A JP 24869293 A JP24869293 A JP 24869293A JP H0777605 A JPH0777605 A JP H0777605A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- recording medium
- latent image
- magnetic field
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000011553 magnetic fluid Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000009826 distribution Methods 0.000 abstract description 21
- 239000002245 particle Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 12
- 230000002123 temporal effect Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000011882 ultra-fine particle Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 229910016629 MnBi Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、光スポットアレー素
子の作製方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a light spot array element.
【０００２】[0002]
【従来の技術】光スポットアレー素子は、図１７に示す
ように２次元のスポットアレーを発生、投影する素子で
あって、形状測定を行うロボットビジョンや光情報処理
における分岐素子として重要な役割を有する。基本的に
は高次まで均等な回折光を発生する特殊な回折格子であ
る。従来このような格子の製作法としては、電子ビーム
等でレジスト材に格子パターンを描画するか、光ファイ
バーをアレー状に並べる方法が知られていた。2. Description of the Related Art An optical spot array element is an element for generating and projecting a two-dimensional spot array as shown in FIG. 17, and plays an important role as a branch element in robot vision for shape measurement and optical information processing. Have. Basically, it is a special diffraction grating that evenly diffracts light up to higher orders. Conventionally, as a method of manufacturing such a grating, a method of drawing a grating pattern on a resist material with an electron beam or arranging optical fibers in an array shape has been known.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、これら
従来の方法で作製された光スポットアレー素子は、発生
ビームの個数、ビーム強度の均一性、製作コストの点で
不充分なものであった。この発明は上記の如き事情に鑑
みてなされたものであって、多数の回折ビームを発生す
ることができ、高次の回折光まで均等な強度の回折スポ
ットを得ることができる光スポットアレーを安価に製造
することができる光スポットアレー素子の作製方法を提
供することを目的とするものである。However, the optical spot array elements manufactured by these conventional methods are insufficient in terms of the number of generated beams, the uniformity of beam intensity, and the manufacturing cost. The present invention has been made in view of the above circumstances, and an optical spot array that can generate a large number of diffracted beams and can obtain a diffracted spot of uniform intensity up to high-order diffracted light is inexpensive. It is an object of the present invention to provide a method for manufacturing an optical spot array element that can be manufactured in the above.
【０００４】[0004]
【課題を解決するための手段】この目的に対応して、こ
の発明の光スポットアレー素子の作製方法は、磁気記録
媒体に磁気ヘッドを用いて回折格子パターンの磁気潜像
を形成する磁気潜像形成過程と、次に磁気記録媒体の磁
気潜像形成領域に磁性流体を塗布して現像する現像行程
とを含むことを特徴としている。To solve this problem, a method of manufacturing an optical spot array element according to the present invention is a magnetic latent image in which a magnetic head is used as a magnetic recording medium to form a magnetic latent image of a diffraction grating pattern. It is characterized in that it includes a forming process and a developing process of applying a magnetic fluid to the magnetic latent image forming region of the magnetic recording medium and then developing it.
【０００５】[0005]
【作用】磁性媒体に回折格子パターンの磁気潜像を非接
触で１次元的または２次元的に書き込む。次に磁性媒体
に磁気流体を塗布して現像する。磁性流体中の磁性超微
粒子は磁気記録媒体の漏洩磁界の強度分布に応じて堆積
し、立体的断面形状をもつ光スポットアレーが形成され
る。The magnetic latent image of the diffraction grating pattern is one-dimensionally or two-dimensionally written on the magnetic medium without contact. Next, a magnetic fluid is applied to the magnetic medium and developed. The magnetic ultrafine particles in the magnetic fluid are deposited according to the intensity distribution of the leakage magnetic field of the magnetic recording medium to form a light spot array having a three-dimensional cross-sectional shape.
【０００６】[0006]
【実施例】以下この発明の詳細を一実施例を示す図面に
ついて説明する。図１にはこの発明の光スポットアレー
素子の作製方法において使用する回折格子パターン形成
装置１が示されている。すなわち回折格子パターン形成
装置１は磁気ヘッド２を有する。磁気ヘッド２はリング
状のコア３と、コア３に巻かれたコイル４とを備え、下
端に間隙５を置いて対向する磁極６ａ、６ｂを形成して
いる。また、磁気ヘッド２には回転軸９が取り付けられ
ていて、磁気ヘッド２は回転軸９の回りに回転可能であ
る。回転軸９の方向は磁気潜像を形成すべき磁気記録媒
体７の膜面８に垂直である。磁極６ａ、６ｂは磁気記録
媒体７の膜面８の直上にあって、膜面８に平行な平面内
に対向して位置しており、従って磁極６ａ、６ｂが形成
する磁界の漏洩磁界は磁気記録媒体７内に面内磁界を形
成し、磁気記録媒体７の回折格子パターン書込み位置１
０及びその周囲に面内記録が可能である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below with reference to the drawings showing one embodiment. FIG. 1 shows a diffraction grating pattern forming apparatus 1 used in the method of manufacturing a light spot array element of the present invention. That is, the diffraction grating pattern forming apparatus 1 has the magnetic head 2. The magnetic head 2 includes a ring-shaped core 3 and a coil 4 wound around the core 3, and forms opposing magnetic poles 6a and 6b with a gap 5 at the lower end. A rotary shaft 9 is attached to the magnetic head 2 so that the magnetic head 2 can rotate around the rotary shaft 9. The direction of the rotation axis 9 is perpendicular to the film surface 8 of the magnetic recording medium 7 on which a magnetic latent image is to be formed. The magnetic poles 6a and 6b are located directly above the film surface 8 of the magnetic recording medium 7 and face each other in a plane parallel to the film surface 8. Therefore, the leakage magnetic field of the magnetic field formed by the magnetic poles 6a and 6b is magnetic. An in-plane magnetic field is formed in the recording medium 7, and the diffraction grating pattern writing position 1 of the magnetic recording medium 7
In-plane recording is possible at 0 and its surroundings.
【０００７】一方、磁気ヘッド２には光照射装置１１が
付属している。光照射装置１１はレーザー発生装置１２
及び光学素子１３を備えている。光照射装置１１はレー
ザ光を回折格子パターン書込み位置１０に結像させる。
この光照射装置１１は回折格子パターン書込み位置１０
を照射して、材料の温度をキューリ点の近傍或いは補償
温度の近傍まで加熱する能力を有することが必要であ
る。磁気記録媒体７はテーブル１４上に取り付けられ
る。テーブル１４は回転軸９に垂直な面内で二次元方向
に移動可能であり、その結果として磁極６ａ，６ｂ及び
光照射装置１１のビーム１５は磁気記録媒体７の膜面８
上を一次元的または二次元的に走査する。On the other hand, a light irradiation device 11 is attached to the magnetic head 2. The light irradiation device 11 is a laser generator 12
And an optical element 13. The light irradiation device 11 forms an image of the laser light at the diffraction grating pattern writing position 10.
This light irradiating device 11 has a diffraction grating pattern writing position 10
Is required to heat the temperature of the material to near the Curie point or near the compensation temperature. The magnetic recording medium 7 is mounted on the table 14. The table 14 can move in a two-dimensional direction in a plane perpendicular to the rotation axis 9, and as a result, the magnetic poles 6a and 6b and the beam 15 of the light irradiation device 11 cause the film surface 8 of the magnetic recording medium 7 to move.
Scan the top one-dimensionally or two-dimensionally.
【０００８】磁気記録媒体７を構成する磁気記録材料の
一例としては光磁気記録材料を使用することができ、そ
のような光磁気記録材料としては、ＭｎＢｉ（低温
相），ＭｎＢｉ（高温相）， ＭｎＣｕＢｉ， ＰｔＣ
ｏ， Ｙ3 Ｇａ1.1 Ｆｅ3.9 Ｏ12， ＴｂＦｅＯ3 ，
ＧｄＩＧ， ＧｄＣｏ， ＧｄＦｅ， ＴｂＦｅ， Ｇ
ｄＴｂＦｅ等を使用することができる。A magneto-optical recording material can be used as an example of the magnetic recording material constituting the magnetic recording medium 7. Examples of such a magneto-optical recording material include MnBi (low temperature phase), MnBi (high temperature phase), MnCuBi, PtC
o, Y 3 Ga 1.1 Fe 3.9 O 12 , TbFeO 3 ,
GdIG, GdCo, GdFe, TbFe, G
dTbFe or the like can be used.
【０００９】次に、このように構成された回折格子パタ
ーン形成装置１を使用して回折格子パターンの書き込み
及び創成について説明する。まず回折格子パターンを創
成する基板２０の表面に蒸着、スパッタリング法或いは
無電解メッキ法等で記録用の磁気記録媒体７を形成する
（図２ａ）。この記録媒体７に書き込むべき回折格子パ
ターンに沿って光照射装置１１により光を照射し磁気記
録媒体７の温度をキュリー温度近傍或いは補償温度以上
まで上昇させることで記録媒体７の室温での保磁力（Ｈ
ｃ）を低下させる（図４）。このとき、図３、図５に示
すように、照射された光の強度分布（図５参照）、また
は照射点を中心とした熱拡散による温度分布（図３参
照）に対応した形で、記録媒体７内部での保磁力は（０
≦Ｈｉ≦Ｈｃ）分布を持つことになる。次に外部から磁
界（Ｈｄ）を印加しながら記録媒体７の載せられたテー
ブル１４を移動させると光が当たらなくなったところか
ら順次冷却されていき、一度光が照射されていて記録媒
体７の面内及び厚さ方向でＨｉ≦Ｈｄの条件を満たした
領域だけが外部磁界の方向にそろい回折格子パターンの
磁気潜像は書き込まれる。この時に記録媒体７として、
面内方向に磁化容易軸を持つ面内磁化膜を用い、磁気ヘ
ッド２により媒体面とその移動方向に平行な外部磁界
（Ｈｄ）を印加し、照射する光強度（Ｉ）または印加す
る外部磁界強度（Ｈｄ）を形成する断面波形に応じてア
ナログ的に変調すると記録媒体７の厚さ方向で媒体の保
磁力（Ｈｉ）が印加外部磁界（Ｈｄ）より低くなってい
る深さ （ｈ）まで磁化され、この深さ（ｈ）は光強度
（Ｉ）または外部磁界強度（Ｈｄ）に依存して変化し、
その結果、図６に示すように磁気潜像による漏洩磁界分
布（Ｈ（ｘ））もアナログ的に変化する形で書き込まれ
る。また、印加する外部磁界強度を一定としてホログラ
フィ等の二次元平面的な光の強度分布（光画像）を固定
された記録媒体に一定時間照射、加熱し上記原理で一度
に二次元平面的な回折格子パターンの磁気潜像を書き込
むこともできる（図２ｂ）。また、磁気記録を目的とし
て光を用いて磁性媒体を加熱し磁気潜像を書き込む方法
は、光磁気メモリとして知られている（「薄膜技術ハン
ドブック」，ｐ７５２〜７５７，（１９８６年）参
照）。Next, writing and creation of a diffraction grating pattern by using the diffraction grating pattern forming apparatus 1 thus constructed will be described. First, the magnetic recording medium 7 for recording is formed on the surface of the substrate 20 for forming a diffraction grating pattern by vapor deposition, sputtering or electroless plating (FIG. 2a). Light is emitted by the light irradiating device 11 along the diffraction grating pattern to be written on the recording medium 7 to raise the temperature of the magnetic recording medium 7 to near the Curie temperature or above the compensation temperature so that the coercive force of the recording medium 7 at room temperature is increased. (H
c) is reduced (FIG. 4). At this time, as shown in FIGS. 3 and 5, recording is performed in a form corresponding to the intensity distribution of the irradiated light (see FIG. 5) or the temperature distribution due to thermal diffusion around the irradiation point (see FIG. 3). The coercive force inside the medium 7 is (0
≦ Hi ≦ Hc) distribution. Next, when the table 14 on which the recording medium 7 is placed is moved while applying a magnetic field (Hd) from the outside, it is cooled sequentially from the point where it is no longer exposed to light, and the surface of the recording medium 7 is once exposed to light. A magnetic latent image of a diffraction grating pattern is written in which only regions that satisfy the condition of Hi ≦ Hd in the inner and thickness directions are aligned in the direction of the external magnetic field. At this time, as the recording medium 7,
An in-plane magnetization film having an easy axis of magnetization in the in-plane direction is used, and an external magnetic field (Hd) parallel to the medium surface and its moving direction is applied by the magnetic head 2 to irradiate light intensity (I) or an external magnetic field to be applied. When modulated in an analog manner according to the cross-sectional waveform that forms the strength (Hd), the coercive force (Hi) of the medium in the thickness direction of the recording medium 7 is lower than the applied external magnetic field (Hd) up to the depth (h). Magnetized, this depth (h) changes depending on the light intensity (I) or the external magnetic field intensity (Hd),
As a result, as shown in FIG. 6, the leakage magnetic field distribution (H (x)) due to the magnetic latent image is also written in a form that changes in an analog manner. In addition, by applying a constant external magnetic field intensity, a two-dimensional planar light intensity distribution (optical image) such as holography is irradiated on a fixed recording medium for a certain period of time and heated, and the two-dimensional planar diffraction is performed at once by the above principle. It is also possible to write a magnetic latent image in a grid pattern (Fig. 2b). Also, a method of writing a magnetic latent image by heating a magnetic medium by using light for the purpose of magnetic recording is known as a magneto-optical memory (see "Thin Film Technology Handbook", p752-757, (1986)).
【００１０】回折格子パターンの磁気潜像の記録媒体へ
の書き込みは、熱磁気書き込みの原理から整理すると以
下４通りの方法がある。すなわち、 （１）外部印加磁界強度（Ｈｄ）を一定にして、照射光
強度（Ｉ）を製作する断面波形に応じて強度変調し書き
込む方法（図７参照）。（ただしこの場合、照射光に空
間的な強度分布を持たせれば図１１に示すような特定の
断面波形の線状パターンの描画やホログラフィックなパ
ターンの書き込みができる。） （２）照射光強度（Ｉ）を一定にして、外部印加磁界
（Ｈｄ）を製作する断面波形に応じて強度変調し書き込
む方法（図８参照）。 （３）照射光強度（Ｉ）を一定にして、製作する断面波
形に応じて強度変調された外部交流磁界（Ｈｄ）を印加
することにより書き込む方法（図９参照）。（この場合
の交流磁界（Ｈｄ）は、断面波形に応じて強度変化する
磁界に一定強度、周波数の交流磁界を電気的或いは磁気
的に加算したものである。） （４）外部印加交流磁界（Ｈｄ）を一定にして、照射光
強度（Ｉ）を製作する断面波形に応じて強度変調し書き
込む方法。There are the following four methods for writing a magnetic latent image of a diffraction grating pattern on a recording medium, in order from the principle of thermomagnetic writing. That is, (1) a method in which the intensity of externally applied magnetic field (Hd) is kept constant and the intensity of irradiation light (I) is intensity-modulated and written according to the cross-sectional waveform to be produced (see FIG. 7). (However, in this case, if the irradiation light has a spatial intensity distribution, it is possible to draw a linear pattern having a specific cross-sectional waveform as shown in FIG. 11 and write a holographic pattern.) (2) Irradiation light intensity A method in which (I) is kept constant and intensity-modulated according to a cross-sectional waveform for producing an externally applied magnetic field (Hd) and writing (see FIG. 8). (3) A method of writing by making the irradiation light intensity (I) constant and applying an external AC magnetic field (Hd) whose intensity is modulated according to the cross-sectional waveform to be manufactured (see FIG. 9). (The AC magnetic field (Hd) in this case is obtained by electrically or magnetically adding an AC magnetic field of constant strength and frequency to the magnetic field whose strength changes according to the cross-sectional waveform.) (4) Externally applied AC magnetic field ( Hd) is kept constant, and the intensity of the irradiation light (I) is intensity-modulated and written according to the cross-sectional waveform to be manufactured.
【００１１】光照射による加熱点を中心とした熱拡散に
より記録媒体に温度分布が生じ、これに応じた形で記録
媒体厚さ方向に保磁力（Ｈｉ）は分布を持つことにな
る。このとき媒体内部の保磁力（Ｈｉ）が外部印加磁界
（Ｈｄ）以下になる領域だけが外部印加磁界の方向に磁
化され、光照射による加熱点が記録媒体に対して相対的
に移動することで媒体が冷却されて書き込み状態は保持
されることになる。これが、上述（１）〜（４）の書き
込み方法の基本原理である。また、これらの方法は記録
媒体を一様方向に磁化しておいてから書き込みをおこな
う。（１），（２）の方法では、媒体断面内で加熱点を
中心としＨｄ＞Ｈｉとなる半円弧領域内が外部印加磁界
の方向に磁化され、照射光或いは印加磁場の変調強度に
応じてこの半円弧の半径が変化しアナログ的な記録がお
こなわれる。ただし、これらの場合外部印加磁界（Ｈ
ｄ）の方向は変化しないので記録媒体の移動にともなう
記録領域の境界は、この半円弧を重ねた包絡線の形とな
り、高い空間周波数成分を含む断面波形の書き込みが行
えない（図７，８参照）。これに対して、（３），
（４）の方法では外部印加磁界が交流磁界のため一度書
き込まれた領域を再び逆方向に磁化する事ができるの
で、図９，１０に示すように照射した光スポット径以下
の高い空間周波数成分を含む短波長の断面波形の書き込
みが行える。また、回折格子パターンの磁気潜像の記録
媒体への書き込み技術としては平成４年特許出願第２６
６５５３号明細書、図面に記載された技術も使用するこ
とができる。A temperature distribution is generated in the recording medium due to thermal diffusion around the heating point due to light irradiation, and the coercive force (Hi) has a distribution in the thickness direction of the recording medium in a form corresponding to the temperature distribution. At this time, only the region where the coercive force (Hi) inside the medium becomes equal to or less than the externally applied magnetic field (Hd) is magnetized in the direction of the externally applied magnetic field, and the heating point by light irradiation moves relatively to the recording medium. The medium is cooled and the written state is maintained. This is the basic principle of the writing methods (1) to (4) described above. Further, in these methods, writing is performed after magnetizing the recording medium in a uniform direction. According to the methods (1) and (2), the semicircular arc region where Hd> Hi is centered on the heating point in the medium cross section is magnetized in the direction of the externally applied magnetic field, and the intensity of the irradiation light or the modulation intensity of the applied magnetic field is changed. The radius of this semi-circle changes and analog recording is performed. However, in these cases, the externally applied magnetic field (H
Since the direction of d) does not change, the boundary of the recording area due to the movement of the recording medium is in the form of an envelope formed by overlapping these semi-circular arcs, and it is not possible to write a sectional waveform including a high spatial frequency component (FIGS. 7 and 8). reference). On the other hand, (3),
In the method (4), since the externally applied magnetic field is an alternating magnetic field, the region once written can be magnetized in the opposite direction again, so that a high spatial frequency component equal to or smaller than the diameter of the irradiated light spot as shown in FIGS. It is possible to write a cross-sectional waveform having a short wavelength including Further, as a technique for writing a magnetic latent image of a diffraction grating pattern onto a recording medium, 1992 Patent Application No. 26
The technique described in the specification of 6553 and the drawings can also be used.
【００１２】次に磁気記録媒体７の表面に磁性流体１６
を塗布し現像し、乾燥・固定化する（図２ｃ）。ここで
用いる磁性流体１６は、直径５ｎｍ〜１０ｎｍ程度の磁
性を持つ超微粒子を界面活性材でコートし、揮発性の溶
媒中に分散させたものである。このような磁性流体につ
いては雑誌「機能材料」（１９８１年１０月号第４９頁
以下）に示されている。Next, the magnetic fluid 16 is applied to the surface of the magnetic recording medium 7.
Is applied, developed, dried and fixed (FIG. 2c). The magnetic fluid 16 used here is obtained by coating ultrafine particles having magnetism with a diameter of about 5 nm to 10 nm with a surfactant and dispersing them in a volatile solvent. Such a magnetic fluid is shown in the magazine "Functional Material" (October, 1981, p. 49 et seq.).
【００１３】磁性流体１６中の磁性超微粒子と磁気記録
媒体７の漏洩磁界の間には、その強度分布に応じた吸引
力が働き媒体表面に吸引・堆積するが、図１２（ａ）に
示すように、この吸引力は漏洩磁界の極性に無関係なの
で、このまま現像すると得られる断面形状は図１２
（ｂ）に示すように漏洩磁界分布の絶対値を取った形と
なる。そこで、記録媒体の保磁力（Ｈｃ）以下の直流磁
界を磁気記録媒体７の表面に平行に印加し、漏洩磁界に
図１２（ｃ）に示すように、バイアス（ＤＣバイアス磁
界）を与えることで磁界分布に対し図１２（ｄ）に示す
ように正確な形状の現像を行う。尚、上記現像中に印加
するバイアス磁界の方向を逆にすると、図１３に示すよ
うに形成される表面形状の凹凸は反転させることがで
き、雄・雌両方の型を作れる。その後、磁性流体１６中
の溶媒を蒸発・乾燥させて三次元形状をもつ回折格子パ
ターンを創成する。また、完全に固定化するには光硬化
型または熱硬化型の樹脂等をバインダーとして磁性流体
中に加え形状形成後に硬化させるか、図２（ｄ）に示す
ように離型材として金等を離型剤１７として蒸着しＮｉ
等の硬質金属１８で電鋳するかエポキシ等の樹脂で固め
た後、剥離することで回折格子パターンの形状の転写を
行う。Between the magnetic ultrafine particles in the magnetic fluid 16 and the leakage magnetic field of the magnetic recording medium 7, an attraction force according to the intensity distribution acts and attracts and deposits on the medium surface, as shown in FIG. 12 (a). As described above, since this attractive force is independent of the polarity of the leakage magnetic field, the sectional shape obtained by developing as it is is shown in FIG.
As shown in (b), the leakage magnetic field distribution has an absolute value. Therefore, a DC magnetic field having a coercive force (Hc) or less of the recording medium is applied in parallel to the surface of the magnetic recording medium 7, and a bias (DC bias magnetic field) is applied to the leakage magnetic field as shown in FIG. 12C. With respect to the magnetic field distribution, accurate shape development is performed as shown in FIG. When the direction of the bias magnetic field applied during the development is reversed, the unevenness of the surface shape formed as shown in FIG. 13 can be reversed, and both male and female molds can be made. Then, the solvent in the magnetic fluid 16 is evaporated and dried to create a diffraction grating pattern having a three-dimensional shape. In order to completely fix the resin, a photocurable or thermosetting resin or the like is added as a binder to the magnetic fluid and cured after forming the shape, or as shown in FIG. Vapor deposition as mold agent 17 Ni
The shape of the diffraction grating pattern is transferred by electroforming with a hard metal 18 such as or the like or hardening with a resin such as an epoxy and then peeling.
【００１４】形成する回折格子パターンはバイナリー型
にしてもよいが、バイナリー型の格子の場合は、スリッ
トの開口幅を小さくすると高次まで均等な強度の回折ス
ポットが得られるが効率が悪くなる。そこで特定形状の
凹凸断面をもつレリーフ型回折格子を検討する。図１８
に理論計算による各種断面形状での回折像を示す。各形
状とも格子の凹凸が深くなるほど、より高次の回折スポ
ットが現れる。各次回折スポットの強度分布は、円弧、
放物の断面曲線では各次数ごとに強度のばらつきがあ
り、さらに双曲線では高次の回折強度も強くなるが、楕
円状の断面曲線の場合は、滑らかに変化しほぼ均等にな
る。光源波長λ＝６３３ｎｍで格子面の深さ（ｈ）は、
少なくとも１μｍ以上必要である。The diffraction grating pattern to be formed may be of a binary type, but in the case of a binary type grating, if the opening width of the slit is made small, diffraction spots of uniform intensity up to higher orders can be obtained, but the efficiency becomes poor. Therefore, a relief-type diffraction grating having an uneven cross section of a specific shape will be examined. FIG.
Diffraction images with various cross-sectional shapes by theoretical calculation are shown in. In each shape, the deeper the irregularities of the grating, the higher the diffraction spots appear. The intensity distribution of each diffraction spot is an arc,
The intensity of the parabolic cross-section curve varies depending on the order, and the hyperbola also increases the higher-order diffraction intensity. However, in the case of an elliptical cross-section curve, the change is smooth and almost uniform. At the light source wavelength λ = 633 nm, the depth (h) of the lattice plane is
At least 1 μm or more is required.
【００１５】（実験例）正弦波状のアナログ信号をヘッ
ドギャップ：１０μｍの磁気ヘッドを用いて残留磁束密
度（Ｂｒ）：２５００Ｇａｕｓｓ、保磁力（Ｈｃ）：１
４５０ Ｏｅの磁気記録媒体にアナログ記録し、光スポ
ットアレー素子を形成するための回折格子の磁気潜像を
書き込んだ。次にこれに塗布する磁性流体は、粒径：１
０ｎｍ程度のマグネタイト系（Ｆｅ3 Ｏ4 ）の磁性超微
粒子をパラフィン系の溶媒に分散させた飽和磁化：５０
０Ｇａｕｓｓ、粘度：３０ｃｐｓの磁性流体を用い、こ
れをｎ−オクタンで体積比にして約２倍に希釈したもの
を用いた。磁性流体帯の塗布方法は、磁気潜像の書き込
まれた磁気記録媒体をスピナーに取付、回転数約２００
０ｒｐｍで前記希釈調整された磁性流体を滴下し均一に
塗布した。この時の磁性流体の塗布厚は、０．５μｍで
あった。その後塗布された磁性流体中の揮発性溶媒が乾
燥し、磁性流体が硬化する前に回折格子パターンの磁気
潜像が記録された前記磁性媒体の膜面に対し垂直方向か
ら約９００Ｇａｕｓｓの直流磁界を印加しながら乾燥・
固定化し、上述のような凹凸形状を実現した。反射型の
場合の固定化は、磁性流体中に光硬化性エポキシを混入
し紫外線硬化を行い、透過型格子の場合は、通常のエポ
キシ樹脂を用いてガラス基盤に転写した。図１９に４０
μｍの格子ピッチをもつビームスプリッタの作製例を示
す。強度分布のばらつきに検討の余地を残すが、約４０
個の明瞭な光ビームが得られた。(Experimental Example) An analog signal having a sinusoidal wave was used by using a magnetic head having a head gap of 10 μm, residual magnetic flux density (Br): 2500 Gauss, coercive force (Hc): 1.
Analog recording was performed on a 450 Oe magnetic recording medium, and a magnetic latent image of a diffraction grating for forming a light spot array element was written. The magnetic fluid to be applied next has a particle size of 1
Saturation magnetization of magnetite (Fe 3 O 4 ) magnetic ultrafine particles of about 0 nm dispersed in a paraffinic solvent: 50
A magnetic fluid having 0 Gauss and a viscosity of 30 cps was used, which was diluted with n-octane to a volume ratio of about 2 times. The magnetic fluid zone is applied by attaching a magnetic recording medium on which a magnetic latent image is written to a spinner and rotating at a rotation speed of about 200.
The diluted magnetic fluid was dropped at 0 rpm and applied uniformly. The coating thickness of the magnetic fluid at this time was 0.5 μm. After that, the volatile solvent in the applied magnetic fluid is dried, and a DC magnetic field of about 900 Gauss is applied from the direction perpendicular to the film surface of the magnetic medium on which the magnetic latent image of the diffraction grating pattern is recorded before the magnetic fluid is cured. Drying while applying
It was fixed and realized the uneven shape as described above. For the immobilization in the case of the reflection type, a photocurable epoxy was mixed in the magnetic fluid and UV curing was carried out, and in the case of the transmission type lattice, it was transferred to a glass substrate using a normal epoxy resin. 40 in FIG.
An example of manufacturing a beam splitter having a grating pitch of μm will be shown. There is room for consideration due to variations in intensity distribution, but it is about 40
A distinct light beam was obtained.
【００１６】[0016]
【発明の効果】このようにこの発明によれば、多数の回
折ビームを発生することができ、高次の回折光まで均等
な強度の回折スポットを得ることができる光スポットア
レーを安価に製造することができる光スポットアレーの
作製方法を得ることができる。As described above, according to the present invention, a large number of diffracted beams can be generated, and a light spot array capable of obtaining a diffracted spot having a uniform intensity even for diffracted light of higher orders can be manufactured at low cost. It is possible to obtain a method for producing a light spot array capable of performing the above.
【図面の簡単な説明】[Brief description of drawings]
【図１】この発明の磁気潜像書込み装置を示す構成説明
図。FIG. 1 is a structural explanatory view showing a magnetic latent image writing device of the present invention.
【図２】この発明による微細加工法の行程を示す説明
図。FIG. 2 is an explanatory view showing a process of a fine processing method according to the present invention.
【図３】書込み位置の温度分布を示す説明図。FIG. 3 is an explanatory diagram showing a temperature distribution at a writing position.
【図４】磁気記録媒体の保持力と温度との関係を示すグ
ラフ。FIG. 4 is a graph showing the relationship between the coercive force of the magnetic recording medium and the temperature.
【図５】磁気記録媒体の記録領域の温度分布の一例を示
す説明図。FIG. 5 is an explanatory diagram showing an example of temperature distribution in a recording area of a magnetic recording medium.
【図６】磁気記録媒体の記録領域の磁界強度分布を示す
説明図。FIG. 6 is an explanatory diagram showing a magnetic field strength distribution in a recording area of a magnetic recording medium.
【図７】照射強度の時間変化と外部印加磁界強度の時間
変化と磁気潜像のパターンの関係の一例を示す説明図。FIG. 7 is an explanatory diagram showing an example of a relationship between a temporal change in irradiation intensity, a temporal change in externally applied magnetic field intensity, and a pattern of a magnetic latent image.
【図８】光照射強度の時間変化と外部印加磁界強度の時
間変化と磁気潜像のパターンの関係の他の例を示す説明
図。FIG. 8 is an explanatory diagram showing another example of the relationship between the temporal change of the light irradiation intensity, the temporal change of the externally applied magnetic field intensity, and the pattern of the magnetic latent image.
【図９】光照射強度の時間変化と外部印加磁界強度の時
間変化と磁気潜像のパターンの関係の他の例を示す説明
図。FIG. 9 is an explanatory diagram showing another example of the relationship between the temporal change of the light irradiation intensity, the temporal change of the externally applied magnetic field intensity, and the pattern of the magnetic latent image.
【図１０】光照射強度の時間変化と外部印加磁界強度の
時間変化と磁気潜像のパターンの関係の他の例を示す説
明図。FIG. 10 is an explanatory diagram showing another example of the relationship between the temporal change of the light irradiation intensity, the temporal change of the externally applied magnetic field intensity, and the pattern of the magnetic latent image.
【図１１】光照射強度の時間変化と外部印加磁界強度の
時間変化と磁気潜像のパターンの関係の他の例を示す説
明図。FIG. 11 is an explanatory diagram showing another example of the relationship between the temporal change of the light irradiation intensity, the temporal change of the externally applied magnetic field intensity, and the pattern of the magnetic latent image.
【図１２】断面形状の制御とバイアス磁界の原理を示す
説明図。FIG. 12 is an explanatory diagram showing the principle of cross-sectional shape control and bias magnetic field.
【図１３】従来の方法による形状創成例を示す説明図。FIG. 13 is an explanatory diagram showing a shape generation example by a conventional method.
【図１４】この発明による形状創成波形を示す説明図。FIG. 14 is an explanatory diagram showing a shape generating waveform according to the present invention.
【図１５】この発明による形状創成波形を示す説明図。FIG. 15 is an explanatory diagram showing a shape generating waveform according to the present invention.
【図１６】現像時のバイアス磁界の方向と各種断面形状
創成例を示す説明図。FIG. 16 is an explanatory view showing a direction of a bias magnetic field at the time of development and various cross-sectional shape creation examples.
【図１７】マルチビームスプリッタを示す斜視説明図。FIG. 17 is an explanatory perspective view showing a multi-beam splitter.
【図１８】レリーフ型光スポットアレー素子の断面形状
と回折光の強度分布を示すグラフ。FIG. 18 is a graph showing a cross-sectional shape of a relief type light spot array element and an intensity distribution of diffracted light.
【図１９】レリーフ型光スポットアレー素子の断面形状
と回折光の強度分布と回折格子パターンの関係を示す説
明図。FIG. 19 is an explanatory view showing the relationship between the cross-sectional shape of the relief type light spot array element, the intensity distribution of diffracted light, and the diffraction grating pattern.
１ 磁気潜像形成装置 ２ 磁気ヘッド ３ コア ４ コイル ５ 間隙 ６ａ，６ｂ 磁極 ７ 磁気記録媒体 ８ 膜面 ９ 回転軸 １０ 記録書込み位置 １１ 光照射装置 １２ レーザー発生装置 １３ 光学素子 １４ テーブル １５ ビーム １６ 磁性流体 １７ 離型剤 １８ 硬質金属 ２０ 物体 1 Magnetic Latent Image Forming Device 2 Magnetic Head 3 Core 4 Coil 5 Gap 6a, 6b Magnetic Pole 7 Magnetic Recording Medium 8 Film Surface 9 Rotation Axis 10 Recording / Writing Position 11 Light Irradiator 12 Laser Generator 13 Optical Element 14 Table 15 Beam 16 Magnetic Fluid 17 Release agent 18 Hard metal 20 Object
Claims (3)
格子パターンの磁気潜像を形成する磁気潜像形成過程
と、次に前記磁気記録媒体の前記磁気潜像形成領域に磁
性流体を塗布して現像する現像行程とを含むことを特徴
とする光スポットアレー素子の作製方法。1. A magnetic latent image forming process of forming a magnetic latent image of a diffraction grating pattern on a magnetic recording medium using a magnetic head, and then applying a magnetic fluid to the magnetic latent image forming region of the magnetic recording medium. And a developing step of developing the light spot array element.
ーンの磁気潜像をアナログ的に磁気記録し前記回折格子
の回折特性を制御することを特徴とする請求項１記載の
光スポットアレー素子の作製方法。2. The optical spot array element according to claim 1, wherein in the step of forming the magnetic latent image, the magnetic latent image of the diffraction grating pattern is magnetically recorded in an analog manner to control the diffraction characteristics of the diffraction grating. Of manufacturing.
ンの磁気潜像が磁気記録された前記磁気記録媒体の膜面
に対し垂直方向から直流磁界を印加しながら、前記磁気
記録媒体の前記磁気潜像形成領域に磁性流体を塗布して
現像する現像行程を含むことを特徴とする請求項１記載
の光スポットアレー素子の作製方法。3. The magnetic field of the magnetic recording medium is applied while applying a DC magnetic field from a direction perpendicular to a film surface of the magnetic recording medium on which a magnetic latent image of a diffraction grating pattern is magnetically recorded in the process of forming the magnetic latent image. 2. The method of manufacturing an optical spot array element according to claim 1, further comprising a developing step of applying a magnetic fluid to the latent image forming area and developing the magnetic fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5248692A JP2600101B2 (en) | 1993-09-09 | 1993-09-09 | Manufacturing method of light spot array element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5248692A JP2600101B2 (en) | 1993-09-09 | 1993-09-09 | Manufacturing method of light spot array element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0777605A true JPH0777605A (en) | 1995-03-20 |
| JP2600101B2 JP2600101B2 (en) | 1997-04-16 |
Family
ID=17181919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5248692A Expired - Lifetime JP2600101B2 (en) | 1993-09-09 | 1993-09-09 | Manufacturing method of light spot array element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2600101B2 (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56161574A (en) * | 1980-05-16 | 1981-12-11 | Ricoh Co Ltd | Formation of magnetic latent image |
| JPS5990806A (en) * | 1982-11-16 | 1984-05-25 | Canon Inc | Working method of fine pattern |
| JPS61186977A (en) * | 1985-02-15 | 1986-08-20 | Iwatsu Electric Co Ltd | Latent image recording and developing method in magnetic printing device |
| JPS6333769A (en) * | 1986-07-29 | 1988-02-13 | Seiko Epson Corp | Magneto-optical printing method |
| JPH01308918A (en) * | 1988-02-05 | 1989-12-13 | Ricoh Co Ltd | Preparation of lattice |
-
1993
- 1993-09-09 JP JP5248692A patent/JP2600101B2/en not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56161574A (en) * | 1980-05-16 | 1981-12-11 | Ricoh Co Ltd | Formation of magnetic latent image |
| JPS5990806A (en) * | 1982-11-16 | 1984-05-25 | Canon Inc | Working method of fine pattern |
| JPS61186977A (en) * | 1985-02-15 | 1986-08-20 | Iwatsu Electric Co Ltd | Latent image recording and developing method in magnetic printing device |
| JPS6333769A (en) * | 1986-07-29 | 1988-02-13 | Seiko Epson Corp | Magneto-optical printing method |
| JPH01308918A (en) * | 1988-02-05 | 1989-12-13 | Ricoh Co Ltd | Preparation of lattice |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2600101B2 (en) | 1997-04-16 |
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