JPH08111010A - Multilayer magnetoresistive film and magnetic head - Google Patents

Multilayer magnetoresistive film and magnetic head

Info

Publication number
JPH08111010A
JPH08111010A JP6245900A JP24590094A JPH08111010A JP H08111010 A JPH08111010 A JP H08111010A JP 6245900 A JP6245900 A JP 6245900A JP 24590094 A JP24590094 A JP 24590094A JP H08111010 A JPH08111010 A JP H08111010A
Authority
JP
Japan
Prior art keywords
magnetic
layer
magnetoresistive effect
alloy
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6245900A
Other languages
Japanese (ja)
Inventor
Ryoichi Nakatani
亮一 中谷
Katsumi Hoshino
勝美 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6245900A priority Critical patent/JPH08111010A/en
Publication of JPH08111010A publication Critical patent/JPH08111010A/en
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/325—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being noble metal

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)

Abstract

(57)【要約】 【構成】多層膜の非磁性層14の材料として、Cuに貴
金属元素、あるいは、Ru,Alを添加した合金を用い
た。これにより非磁性層14の耐食性が向上した。ま
た、元素の添加量を制限することにより、高い磁気抵抗
変化率を維持した。また、多層磁気抵抗効果膜を磁気抵
抗効果素子,磁気ヘッドおよび磁気記録再生装置に用い
た。 【効果】多層磁気抵抗効果膜は高い磁気抵抗変化率およ
び耐食性を示す。また、多層磁気抵抗効果膜を使用した
磁気ヘッドは、優れた再生特性を示した。また、磁気ヘ
ッドを磁気記録再生装置に用いることにより、高性能磁
気記録再生装置が得られた。
(57) [Summary] [Structure] As a material of the non-magnetic layer 14 of the multilayer film, an alloy in which a noble metal element or Ru or Al is added to Cu is used. This improved the corrosion resistance of the non-magnetic layer 14. In addition, a high magnetoresistance change rate was maintained by limiting the addition amount of elements. Further, the multilayer magnetoresistive effect film was used for a magnetoresistive effect element, a magnetic head and a magnetic recording / reproducing apparatus. [Effect] The multilayer magnetoresistive effect film exhibits a high magnetoresistance change rate and corrosion resistance. Moreover, the magnetic head using the multilayer magnetoresistive film showed excellent reproducing characteristics. Further, a high performance magnetic recording / reproducing apparatus was obtained by using the magnetic head in the magnetic recording / reproducing apparatus.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は高い磁気抵抗効果を有す
る多層磁気抵抗効果膜およびこれを用いた磁気抵抗効果
素子,磁気ヘッド,磁気記録再生装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer magnetoresistive effect film having a high magnetoresistive effect, a magnetoresistive effect element using the same, a magnetic head and a magnetic recording / reproducing apparatus.

【0002】[0002]

【従来の技術】磁気記録の高密度化に伴い、再生用磁気
ヘッドに用いる磁気抵抗効果材料として、高い磁気抵抗
効果を示す材料が求められている。そこで、Dieny らに
よるフィジカル・レビュー・B(Pysical Review B),
第43巻,第1号,1297〜1300ページに記載の
「軟磁性多層膜における巨大磁気抵抗効果」(Giant Ma
gnetoresistance in Soft Ferromagnetic Multilayers)
のように二層の磁性層を非磁性層で磁気的に分離し、一
方の磁性層に反強磁性層からの交換バイアス磁界を印加
する方法が考案された。この多層膜では、二層の磁性層
の磁化の向きが平行の時に電気抵抗率が低く、磁化の向
きが反平行の時に電気抵抗率が高い。印加する磁界の高
さにより、二層の磁性層の磁化の向きのなす角度が変化
することにより磁気抵抗効果が生じる。このような多層
膜では、European Patent,0 490 608 A2
に記載のように、非磁性層としてCu,Ag,Auが用
いられている。
2. Description of the Related Art As the magnetic recording density increases, a material having a high magnetoresistive effect is required as a magnetoresistive effect material used for a reproducing magnetic head. So, Physical Review B by Dieny et al.,
"Giant Magnetoresistance Effect in Soft Magnetic Multilayer Films", Vol. 43, No. 1, pp. 1297-1300 (Giant Ma
gnetoresistance in Soft Ferromagnetic Multilayers)
As described above, a method of magnetically separating two magnetic layers with a non-magnetic layer and applying an exchange bias magnetic field from an antiferromagnetic layer to one magnetic layer has been devised. In this multilayer film, the electric resistivity is low when the magnetization directions of the two magnetic layers are parallel, and the electric resistivity is high when the magnetization directions are antiparallel. The magnetoresistive effect is generated by changing the angle formed by the magnetization directions of the two magnetic layers depending on the height of the applied magnetic field. In such a multilayer film, European Patent, 0 490 608 A2
As described in (1), Cu, Ag, and Au are used as the nonmagnetic layer.

【0003】[0003]

【発明が解決しようとする課題】しかし、非磁性層のC
uは耐食性が悪いことが知られている。また、Ag層は
薄く均一に形成することが困難である。このため、二層
の磁性層をAg非磁性層で磁気的に分離するためには、
Ag非磁性層の平均層厚を厚くすることが必要であり、
この結果、磁気抵抗変化率が低下する。また、Auはそ
の価格が高く、コストダウンに対して不利である。
However, the C of the non-magnetic layer is
It is known that u has poor corrosion resistance. Further, it is difficult to form the Ag layer thinly and uniformly. Therefore, in order to magnetically separate the two magnetic layers with the Ag nonmagnetic layer,
It is necessary to increase the average layer thickness of the Ag non-magnetic layer,
As a result, the rate of change in magnetic resistance decreases. Also, Au is expensive and is disadvantageous for cost reduction.

【0004】本発明の目的は、磁気抵抗効果型ヘッド用
の高磁気抵抗効果多層膜における問題の解決方法を提供
することにある。
It is an object of the present invention to provide a method for solving the problem in a high magnetoresistive effect multilayer film for a magnetoresistive effect type head.

【0005】[0005]

【課題を解決するための手段】本発明者等は、種々の材
料および膜厚を有する非磁性層を積層した多層磁性膜を
用いた磁気抵抗効果素子について鋭意研究を重ねた結
果、前記多層膜における非磁性層材料としてCuに種々
の元素を添加した合金を用いることにより、高い磁気抵
抗変化率および優れた耐食性を有する多層膜を得ること
ができることを見出し、本発明を完成するに至った。
The inventors of the present invention have conducted extensive studies on a magnetoresistive effect element using a multilayer magnetic film in which non-magnetic layers having various materials and film thicknesses are laminated, and as a result, the multilayer film It was found that a multilayer film having a high magnetoresistance change rate and excellent corrosion resistance can be obtained by using an alloy in which various elements are added to Cu as the non-magnetic layer material in (1), and has completed the present invention.

【0006】すなわち、複数層の磁性層を非磁性層で分
割し、少なくとも一層の磁性層に反強磁性層からの交換
バイアス磁界が印加されており、少なくとも一層の磁性
層に反強磁性層からの交換バイアス磁界は直接には印加
されていない多層膜を用いた多層磁気抵抗効果膜におい
て、前記非磁性層としてCuに貴金属元素を添加した合
金を用いることにより、非磁性層の耐食性が向上する。
また、前記貴金属元素の添加量をある範囲にすることに
より、多層膜の磁気抵抗変化率の低下を最小限にとどめ
る。また、添加元素として、貴金属元素以外に、Ru,
Alを用いる。
That is, a plurality of magnetic layers are divided by nonmagnetic layers, and an exchange bias magnetic field from the antiferromagnetic layer is applied to at least one magnetic layer, and at least one magnetic layer is separated from the antiferromagnetic layer. In the multilayer magnetoresistive effect film using the multilayer film to which the exchange bias magnetic field is not directly applied, the corrosion resistance of the nonmagnetic layer is improved by using the alloy in which the precious metal element is added to Cu as the nonmagnetic layer. .
Further, by setting the addition amount of the noble metal element within a certain range, the decrease in the magnetoresistance change rate of the multilayer film can be minimized. In addition to the precious metal element, Ru,
Al is used.

【0007】[0007]

【作用】多層膜における非磁性層材料としてCuに種々
の元素を添加した合金を用いることにより、Cu非磁性
層を用いる時に得られる高い磁気抵抗変化率をあまり損
なわず、また、非磁性層の耐食性を向上することができ
る。さらに、多層磁気抵抗効果膜は、磁気抵抗効果素
子,磁界センサ,磁気ヘッドなどに好適である。また、
磁気ヘッドを用いることにより、高性能磁気記録再生装
置を得ることができる。
By using an alloy in which various elements are added to Cu as the non-magnetic layer material in the multilayer film, the high magnetoresistance change rate obtained when using the Cu non-magnetic layer is not significantly impaired, and the non-magnetic layer Corrosion resistance can be improved. Furthermore, the multilayer magnetoresistive effect film is suitable for a magnetoresistive effect element, a magnetic field sensor, a magnetic head, and the like. Also,
A high-performance magnetic recording / reproducing apparatus can be obtained by using the magnetic head.

【0008】[0008]

【実施例】以下、本発明について、図面を用いながら具
体的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings.

【0009】[実施例1]非磁性層として用いるCuの
耐食性を向上するために以下に述べる実験を行った。
Example 1 The following experiment was conducted to improve the corrosion resistance of Cu used as the non-magnetic layer.

【0010】まず、ガラス基板上にCuに種々の元素を
添加した合金膜をイオンビームスパッタリング装置で形
成した。膜厚は40〜60nmとした。スパッタリング
条件は、到達真空度8〜10/105Pa,Arガス圧
力0.02Pa,イオンガン加速電圧300V,イオン
電流30mAとした。
First, an alloy film prepared by adding various elements to Cu was formed on a glass substrate by an ion beam sputtering apparatus. The film thickness was 40 to 60 nm. The sputtering conditions, the ultimate vacuum 8~10 / 10 5 Pa, Ar gas pressure 0.02 Pa, an ion gun acceleration voltage 300 V, and the ion current 30 mA.

【0011】形成した合金膜に対して温度60℃,湿度
90%,3日間の条件で耐食性試験を行った。耐食性試
験後の合金膜の全面積に対する腐食された部分の面積の
割合を測定した。測定結果を図1から図3に示す。
A corrosion resistance test was conducted on the formed alloy film under the conditions of a temperature of 60 ° C. and a humidity of 90% for 3 days. The ratio of the area of the corroded portion to the total area of the alloy film after the corrosion resistance test was measured. The measurement results are shown in FIGS.

【0012】図1および図2のようにCuに貴金属を添
加すると耐食性が向上する。AgあるいはAuの添加量
が3at%以上,Pt,Ir,Pdの添加量が5at%
以上、Rhの添加量が2at%以上の時に耐食性が向上
する。また、図3のように、Ruの添加量が2at%以
上,Alの添加量が5at%以上の時に耐食性が向上す
る。
When a noble metal is added to Cu as shown in FIGS. 1 and 2, corrosion resistance is improved. Ag or Au addition amount is 3 at% or more, Pt, Ir, Pd addition amount is 5 at%
As described above, the corrosion resistance is improved when the added amount of Rh is 2 at% or more. Further, as shown in FIG. 3, the corrosion resistance is improved when the added amount of Ru is 2 at% or more and the added amount of Al is 5 at% or more.

【0013】以上のように、Cuに貴金属,Ru,Al
を添加すると耐食性が向上する。従って、これらの合金
を多層膜の非磁性層として用いることが好ましい。
As described above, noble metal, Ru, Al is added to Cu.
Addition improves the corrosion resistance. Therefore, it is preferable to use these alloys as the non-magnetic layer of the multilayer film.

【0014】[実施例2]多層膜の積層構造を図4に示
す。本実施例では、基板11としてSi(100)単結晶
基板を用いた。バッファ層12としては、厚さ5nmの
Hfを用いた。磁性層13および15としては、厚さ5
nmのNi−16at%Fe−18at%Co合金を用
いた。反強磁性層16は、厚さ5nmのFe−40at
%Mn合金を用いた。保護層17は、厚さ5nmのHf
を用いた。また、非磁性層14は、実施例1で述べた種
々の合金を用いた。非磁性層14の厚さは2.5nm で
ある。
[Embodiment 2] FIG. 4 shows a laminated structure of a multilayer film. In this example, a Si (100) single crystal substrate was used as the substrate 11. As the buffer layer 12, Hf having a thickness of 5 nm was used. The magnetic layers 13 and 15 have a thickness of 5
nm Ni-16 at% Fe-18 at% Co alloy was used. The antiferromagnetic layer 16 is made of Fe-40at having a thickness of 5 nm.
% Mn alloy was used. The protective layer 17 is made of Hf having a thickness of 5 nm.
Was used. Further, the nonmagnetic layer 14 uses the various alloys described in the first embodiment. The thickness of the nonmagnetic layer 14 is 2.5 nm.

【0015】CuにAuあるいはAgを添加した合金を
非磁性層として用いた時の多層膜の磁気抵抗変化率と添
加元素濃度との関係を図5に示す。図5のように、添加
元素濃度の増加とともに磁気抵抗変化率は低下する。C
uにAgを添加した時に磁気抵抗変化率が低下する理由
は以下のように考えられる。Agの添加量が増加する
と、非磁性層の厚さが不均一になり、非磁性層の薄い部
分で磁性層間の交換相互作用が強くなる。このため、二
層の磁性層の磁化のなす角度が変化しにくくなり磁気抵
抗変化率が低下するものと考えられる。CuにAuを添
加した時に磁気抵抗変化率が低下する理由は、Auの添
加により多層膜の電気抵抗率が増加するためである。
FIG. 5 shows the relationship between the magnetoresistance change rate of the multilayer film and the additive element concentration when an alloy obtained by adding Au or Ag to Cu is used as the nonmagnetic layer. As shown in FIG. 5, the rate of change in magnetoresistance decreases as the concentration of the additional element increases. C
The reason why the magnetoresistance change rate decreases when Ag is added to u is considered as follows. When the amount of Ag added increases, the thickness of the non-magnetic layer becomes non-uniform, and the exchange interaction between the magnetic layers becomes stronger in the thin portion of the non-magnetic layer. Therefore, it is considered that the angle formed by the magnetizations of the two magnetic layers is less likely to change and the rate of change in magnetoresistance decreases. The reason why the magnetoresistance change rate decreases when Au is added to Cu is that the electric resistance of the multilayer film increases by the addition of Au.

【0016】以上のように、CuにAuあるいはAgを
添加すると、多層膜の磁気抵抗変化率が低下する。2%
以上の磁気抵抗変化率を維持するためには、Auあるい
はAgの添加量を、それぞれ、50at%以下,25a
t%以下とする必要がある。従って、優れた耐食性およ
び高い磁気抵抗変化率を得るためには、Au,Agの添
加元素濃度をそれぞれ、3〜50at%,3〜25at
%とする必要がある。
As described above, when Au or Ag is added to Cu, the magnetoresistive change rate of the multilayer film decreases. 2%
In order to maintain the above magnetoresistance change rate, the amount of Au or Ag added should be 50 at% or less and 25a, respectively.
It needs to be t% or less. Therefore, in order to obtain excellent corrosion resistance and a high magnetoresistance change rate, the additive element concentrations of Au and Ag are set to 3 to 50 at% and 3 to 25 at%, respectively.
Must be set to%.

【0017】CuにPt,Ir,Rh,Pdを添加した
場合の結果を図6に、CuにRu,Alを添加した場合
の結果を図7に示す。図1ないし図3,図5ないし図7
の結果より、優れた耐食性および高い磁気抵抗変化率を
得るためには、Cuに対するPtの組成を5〜30at
%,Cuに対するIrの組成を5〜30at%,Cuに
対するRhの組成を2〜30at%,Cuに対するPd
の組成を5〜30at%,Cuに対するRuの組成を2〜
30at%,Cuに対するAlの組成を5〜20at%
とする必要がある。
FIG. 6 shows the results when Pt, Ir, Rh, and Pd were added to Cu, and FIG. 7 shows the results when Ru and Al were added to Cu. 1 to 3 and 5 to 7
From the results, in order to obtain excellent corrosion resistance and a high rate of change in magnetoresistance, the composition of Pt with respect to Cu is 5 to 30 at.
%, Ir composition to Cu is 5 to 30 at%, Rh composition to Cu is 2 to 30 at%, Pd to Cu is
Composition of 5 to 30 at% and composition of Ru to Cu of 2
30at%, Al composition to Cu is 5 to 20at%
It is necessary to

【0018】なお、本実施例では、2元系合金の非磁性
層について述べたが、多層膜の磁気抵抗変化率あるいは
非磁性層の耐食性を損なわない範囲ならば、さらに他の
元素を添加しても問題はない。
In this embodiment, the non-magnetic layer of the binary alloy is described, but another element may be added as long as the magnetoresistance change rate of the multilayer film or the corrosion resistance of the non-magnetic layer is not impaired. But there is no problem.

【0019】また、本実施例では、磁性層としてNi−
Fe−Co系合金を使用したが、他の磁性層を用いて
も、同様の結果を得ることができる。しかし、反強磁性
層から直接交換バイアス磁界が印加されていない磁性層
は、軟磁性を示すことが必要であり、磁性層として、N
i−Fe系合金,Ni−Fe−Co系合金を用いること
が好ましい。
In this embodiment, the magnetic layer is made of Ni-
Although the Fe-Co alloy is used, the same result can be obtained by using other magnetic layers. However, the magnetic layer to which the exchange bias magnetic field is not directly applied from the antiferromagnetic layer needs to exhibit soft magnetism.
It is preferable to use an i-Fe-based alloy or a Ni-Fe-Co-based alloy.

【0020】また、本実施例では、反強磁性層として、
Fe−Mn系合金を用いたが、他の反強磁性材料を用い
ることもできる。反強磁性材料は、Cr−Mn,Pt−
Mn,Ir−Mn,Pd−Mn,Au−Mn,Ni−M
n,Ni−Cr−Mn系合金,Ni−O,Ni−Co−
Oなどが好ましい。
Further, in this embodiment, as the antiferromagnetic layer,
Although the Fe-Mn-based alloy was used, other antiferromagnetic materials can also be used. Antiferromagnetic materials are Cr-Mn, Pt-
Mn, Ir-Mn, Pd-Mn, Au-Mn, Ni-M
n, Ni-Cr-Mn-based alloy, Ni-O, Ni-Co-
O and the like are preferable.

【0021】[実施例3]本発明の多層膜を用いた磁気
抵抗効果素子を形成した。本実施例では、バッファ層と
して、厚さ5nmのHfを用いた。磁性層には厚さ5n
mのNi−16at%Fe−18at%Co合金を用い
た。非磁性層には、厚さ2.5nm のCu−25at%
Au合金を用いた。反強磁性層には厚さ10nmのFe
−40at%Mn合金を用いた。また、保護層には厚さ
5nmのHfを用いた。
Example 3 A magnetoresistive effect element using the multilayer film of the present invention was formed. In this example, Hf having a thickness of 5 nm was used as the buffer layer. The magnetic layer has a thickness of 5n
m Ni-16 at% Fe-18 at% Co alloy was used. The non-magnetic layer has a thickness of 2.5 nm Cu-25 at%.
Au alloy was used. Fe with a thickness of 10 nm is used for the antiferromagnetic layer.
A -40 at% Mn alloy was used. Further, Hf having a thickness of 5 nm was used for the protective layer.

【0022】図7に磁気抵抗効果素子の構造を示す。磁
気抵抗効果素子は、多層磁気抵抗効果膜21および電極
22をシールド層23,24で挟んだ構造を有する。磁
気抵抗効果素子に磁界を印加し、電気抵抗率の変化を測
定したところ、本発明の多層磁気抵抗効果膜を用いた磁
気抵抗効果素子は、1.6kA/m(20Oe)程度の印
加磁界で2.5% 程度の磁気抵抗変化率を示した。ま
た、本発明の磁気抵抗効果素子の再生出力は、Ni−F
e単層膜を用いた磁気抵抗効果素子と比較して2.3 倍
であった。
FIG. 7 shows the structure of the magnetoresistive effect element. The magnetoresistive effect element has a structure in which the multilayer magnetoresistive effect film 21 and the electrode 22 are sandwiched by shield layers 23 and 24. When a magnetic field was applied to the magnetoresistive effect element and a change in electric resistivity was measured, it was found that the magnetoresistive effect element using the multilayer magnetoresistive effect film of the present invention has an applied magnetic field of about 1.6 kA / m (20 Oe). The rate of change in magnetic resistance was about 2.5%. The reproduction output of the magnetoresistive effect element of the present invention is Ni-F.
e 2.3 times higher than that of a magnetoresistive element using a single layer film.

【0023】本実施例では、非磁性層材料として、Cu
−25at%Au合金を用いたが、本発明の組成範囲の
非磁性層材料は全て磁気抵抗効果素子用の多層膜の非磁
性層として用いることができる。
In this embodiment, Cu is used as the non-magnetic layer material.
Although a -25 at% Au alloy was used, all the non-magnetic layer materials in the composition range of the present invention can be used as the non-magnetic layer of the multilayer film for the magnetoresistive effect element.

【0024】[実施例4]実施例3で述べた磁気抵抗効
果素子を用い、磁気ヘッドを作製した。磁気ヘッドの構
造を以下に示す。図9は、記録再生分離型ヘッドの一部
分を切断した場合の斜視図である。多層磁気抵抗効果膜
51をシールド層52,53で挾んだ部分が再生ヘッド
として働き、コイル54を挾む下部磁極55,上部磁極
56の部分が記録ヘッドとして働く。また、電極58に
は、Cr/Cu/Crという多層構造の材料を用いた。
[Embodiment 4] Using the magnetoresistive effect element described in Embodiment 3, a magnetic head was manufactured. The structure of the magnetic head is shown below. FIG. 9 is a perspective view when a part of the recording / reproducing separated type head is cut. The portion of the multilayer magnetoresistive film 51 sandwiched by the shield layers 52 and 53 functions as a reproducing head, and the lower magnetic pole 55 and the upper magnetic pole 56 that sandwich the coil 54 function as a recording head. Further, a material having a multilayer structure of Cr / Cu / Cr is used for the electrode 58.

【0025】以下にこのヘッドの作製方法を示す。A method of manufacturing this head will be described below.

【0026】Al2O3・TiCを主成分とする焼結体を
スライダ用の基板57とした。シールド層,記録磁極に
はスパッタリング法で形成したNi−Fe合金を用い
た。各磁性膜の膜厚は、以下のようにした。上下のシー
ルド層52,53は1.0μm、下部磁極55,上部磁
極56は3.0μm 、各層間のギャップ材はスパッタリ
ングで形成したAl2O3を用いた。ギャップ層の膜厚
は、シールド層と磁気抵抗効果素子間で0.2μm,記
録磁極間では0.4μmとした。さらに再生ヘッドと記
録ヘッドの間隔は約4μmとし、このギャップもAl2
O3で形成した。コイル54には膜厚3μmのCuを使
用した。
A sintered body containing Al 2 O 3 .TiC as a main component was used as the substrate 57 for the slider. A Ni-Fe alloy formed by a sputtering method was used for the shield layer and the recording magnetic pole. The thickness of each magnetic film was as follows. The upper and lower shield layers 52 and 53 were 1.0 μm, the lower magnetic pole 55 and the upper magnetic pole 56 were 3.0 μm, and the gap material between the layers was Al 2 O 3 formed by sputtering. The film thickness of the gap layer was 0.2 μm between the shield layer and the magnetoresistive element, and 0.4 μm between the recording magnetic poles. Further, the distance between the reproducing head and the recording head is set to about 4 μm, and this gap is also made of Al 2
Formed with O 3 . Cu having a film thickness of 3 μm was used for the coil 54.

【0027】以上述べた構造の磁気ヘッドで記録再生を
行ったところ、Ni−Fe単層膜を用いた磁気ヘッドと
比較して、2.3 倍高い再生出力を得た。これは、本発
明の磁気ヘッドに高磁気抵抗効果を示す多層膜を用いた
ためと考えられる。
When recording / reproducing was performed with the magnetic head having the structure described above, a reproducing output 2.3 times higher than that of the magnetic head using the Ni--Fe single layer film was obtained. It is considered that this is because the magnetic head of the present invention uses a multilayer film having a high magnetoresistive effect.

【0028】また、本発明の磁気抵抗効果素子は、磁気
ヘッド以外の磁界検出器にも用いることができる。
The magnetoresistive effect element of the present invention can also be used in a magnetic field detector other than the magnetic head.

【0029】[実施例5]実施例4で述べた本発明の磁
気ヘッドを用い、磁気ディスク装置を作製した。装置の
構造を図10に示す。磁気記録媒体71には、残留磁束
密度0.75T のCo−Ni−Pt−Ta系合金からな
る材料を用いた。磁気ヘッド73のトラック幅は2.5
μm とした。磁気ヘッド73における磁気抵抗効果素
子は、再生出力が高いため、信号処理に負担をかけない
高性能磁気ディスク装置が得られた。
[Embodiment 5] Using the magnetic head of the present invention described in Embodiment 4, a magnetic disk device was manufactured. The structure of the device is shown in FIG. For the magnetic recording medium 71, a material made of a Co—Ni—Pt—Ta alloy having a residual magnetic flux density of 0.75T was used. The track width of the magnetic head 73 is 2.5.
μm. Since the magnetoresistive effect element in the magnetic head 73 has a high reproduction output, a high-performance magnetic disk device which does not burden the signal processing was obtained.

【0030】[0030]

【発明の効果】磁性層の一部に反強磁性層からの交換バ
イアス磁界を印加した多層膜において、非磁性層材料と
してCuに種々の元素を添加した合金を用いることによ
り、Cu非磁性層を用いる時に得られる高い磁気抵抗変
化率をあまり損なわず、また、非磁性層の耐食性を向上
することができる。さらに、多層磁気抵抗効果膜は、磁
気抵抗効果素子,磁界センサ,磁気ヘッドなどに好適で
ある。また、磁気ヘッドを用いることにより、高性能磁
気記録再生装置を得ることができる。
EFFECTS OF THE INVENTION In a multilayer film in which an exchange bias magnetic field from an antiferromagnetic layer is applied to a part of a magnetic layer, by using an alloy in which various elements are added to Cu as a nonmagnetic layer material, a Cu nonmagnetic layer is used. It is possible to improve the corrosion resistance of the non-magnetic layer without significantly impairing the high rate of change in magnetoresistance obtained when using. Furthermore, the multilayer magnetoresistive effect film is suitable for a magnetoresistive effect element, a magnetic field sensor, a magnetic head, and the like. Further, by using the magnetic head, a high performance magnetic recording / reproducing device can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】CuにAg,Au,Ptを添加した時の耐食性
試験の特性図。
FIG. 1 is a characteristic diagram of a corrosion resistance test when Ag, Au, and Pt are added to Cu.

【図2】CuにIr,Rh,Pdを添加した時の耐食性
試験の特性図。
FIG. 2 is a characteristic diagram of a corrosion resistance test when Ir, Rh, and Pd are added to Cu.

【図3】CuにRu,Alを添加した時の耐食性試験の
特性図。
FIG. 3 is a characteristic diagram of a corrosion resistance test when Ru and Al are added to Cu.

【図4】本発明の多層磁気抵抗効果膜の構造を示す断面
図。
FIG. 4 is a sectional view showing the structure of the multilayer magnetoresistive effect film of the present invention.

【図5】CuにAg,Auを添加した時の多層膜の磁気
抵抗変化率を示す特性図。
FIG. 5 is a characteristic diagram showing a magnetoresistance change rate of a multilayer film when Ag and Au are added to Cu.

【図6】CuにPt,Ir,Rh,Pdを添加した時の
多層膜の磁気抵抗変化率を示す特性図。
FIG. 6 is a characteristic diagram showing a magnetoresistance change rate of a multilayer film when Pt, Ir, Rh, and Pd are added to Cu.

【図7】CuにRu,Alを添加した時の多層膜の磁気
抵抗変化率を示す特性図。
FIG. 7 is a characteristic diagram showing a magnetoresistance change rate of a multilayer film when Ru and Al are added to Cu.

【図8】本発明の多層磁気抵抗効果膜を用いた磁気抵抗
効果素子の構造を示す斜視図。
FIG. 8 is a perspective view showing the structure of a magnetoresistive effect element using the multilayer magnetoresistive effect film of the present invention.

【図9】本発明の磁気ヘッドの構造を示す斜視図。FIG. 9 is a perspective view showing the structure of the magnetic head of the present invention.

【図10】本発明の磁気記録再生装置の説明図。FIG. 10 is an explanatory diagram of a magnetic recording / reproducing apparatus of the present invention.

【符号の説明】[Explanation of symbols]

11…基板、12…バッファ層、13,15…磁性層、
14…非磁性層、16…反強磁性層、17…保護層。
11 ... Substrate, 12 ... Buffer layer, 13, 15 ... Magnetic layer,
14 ... Nonmagnetic layer, 16 ... Antiferromagnetic layer, 17 ... Protective layer.

Claims (13)

【特許請求の範囲】[Claims] 【請求項1】二層の磁性層を非磁性層で分割し、一層の
磁性層に反強磁性層からの交換バイアス磁界が印加さ
れ、前記一層の磁性層には前記反強磁性層からの前記交
換バイアス磁界が直接には印加されていない多層膜を用
いた多層磁気抵抗効果膜において、前記非磁性層がCu
に貴金属元素を添加した合金であることを特徴とする多
層磁気抵抗効果膜。
1. A two-layer magnetic layer is divided into non-magnetic layers, an exchange bias magnetic field from an antiferromagnetic layer is applied to one magnetic layer, and the one magnetic layer is separated from the antiferromagnetic layer. In the multilayer magnetoresistive effect film using a multilayer film to which the exchange bias magnetic field is not directly applied, the nonmagnetic layer is made of Cu.
A multilayer magnetoresistive effect film, which is an alloy in which a noble metal element is added to.
【請求項2】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Ag系合金であり、Cuに対す
るAgの組成が、3〜25at%である多層磁気抵抗効
果膜。
2. The multilayer magnetoresistive film according to claim 1, wherein the alloy obtained by adding a noble metal element to Cu is a Cu—Ag alloy, and the composition of Ag with respect to Cu is 3 to 25 at%.
【請求項3】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Au系合金であり、Cuに対す
るAuの組成が、3〜50at%である多層磁気抵抗効
果膜。
3. The multilayer magnetoresistive effect film according to claim 1, wherein the alloy obtained by adding a noble metal element to Cu is a Cu—Au alloy, and the composition of Au with respect to Cu is 3 to 50 at%.
【請求項4】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Pt系合金であり、Cuに対す
るPtの組成が、5〜30at%である多層磁気抵抗効
果膜。
4. The multilayer magnetoresistive effect film according to claim 1, wherein the alloy obtained by adding a noble metal element to Cu is a Cu—Pt alloy, and the composition of Pt with respect to Cu is 5 to 30 at%.
【請求項5】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Ir系合金であり、Cuに対す
るIrの組成が、5〜30at%である多層磁気抵抗効
果膜。
5. The multilayer magnetoresistive film according to claim 1, wherein the alloy obtained by adding a noble metal element to Cu is a Cu—Ir alloy, and the composition of Ir with respect to Cu is 5 to 30 at%.
【請求項6】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Rh系合金であり、Cuに対す
るRhの組成が、2〜30at%である多層磁気抵抗効
果膜。
6. The multilayer magnetoresistive film according to claim 1, wherein the alloy obtained by adding a noble metal element to Cu is a Cu—Rh-based alloy, and the composition of Rh with respect to Cu is 2 to 30 at%.
【請求項7】請求項1において、前記Cuに貴金属元素
を添加した合金がCu−Pd系合金であり、Cuに対す
るPdの組成が、5〜30at%である多層磁気抵抗効
果膜。
7. The multilayer magnetoresistive film according to claim 1, wherein the alloy in which a noble metal element is added to Cu is a Cu—Pd alloy, and the composition of Pd with respect to Cu is 5 to 30 at%.
【請求項8】二層の磁性層を非磁性層で分割し、一層の
磁性層に反強磁性層からの交換バイアス磁界が印加され
ており、前記一層の磁性層には前記反強磁性層からの前
記交換バイアス磁界が直接には印加されていない多層膜
を用いた多層磁気抵抗効果膜において、前記非磁性層が
CuにRuを添加した合金であり、Cuに対するRuの
組成が、2〜30at%であることを特徴とする多層磁
気抵抗効果膜。
8. The two magnetic layers are divided by non-magnetic layers, and the exchange bias magnetic field from the antiferromagnetic layer is applied to the one magnetic layer, and the one magnetic layer is the antiferromagnetic layer. In the multilayer magnetoresistive effect film using the multilayer film to which the exchange bias magnetic field is not directly applied, the nonmagnetic layer is an alloy in which Ru is added to Cu, and the composition of Ru to Cu is 2 to A multi-layer magnetoresistive effect film having a content of 30 at%.
【請求項9】二層の磁性層を非磁性層で分割し、一層の
磁性層に反強磁性層からの交換バイアス磁界が印加され
ており、前記一層の磁性層には前記反強磁性層からの前
記交換バイアス磁界が直接には印加されていない多層膜
を用いた多層磁気抵抗効果膜において、前記非磁性層が
CuにAlを添加した合金であり、Cuに対するAlの
組成が、5〜20at%であることを特徴とする多層磁
気抵抗効果膜。
9. The two magnetic layers are divided by non-magnetic layers, and the exchange bias magnetic field from the antiferromagnetic layer is applied to one magnetic layer, and the one magnetic layer is the antiferromagnetic layer. In the multilayer magnetoresistive effect film using the multilayer film to which the exchange bias magnetic field is not directly applied, the nonmagnetic layer is an alloy in which Al is added to Cu, and the composition of Al to Cu is 5 to A multi-layered magnetoresistive effect film having a content of 20 at%.
【請求項10】請求項1から請求項9に記載の前記多層
磁気抵抗効果膜を一部に用いた磁気抵抗効果素子。
10. A magnetoresistive effect element in which the multilayer magnetoresistive effect film according to claim 1 is partially used.
【請求項11】請求項10に記載の前記磁気抵抗効果素
子を一部に用いた磁気ヘッド。
11. A magnetic head including a part of the magnetoresistive effect element according to claim 10.
【請求項12】請求項10に記載の前記磁気抵抗効果素
子と誘導型磁気ヘッドを組み合わせた複合型磁気ヘッ
ド。
12. A composite magnetic head in which the magnetoresistive effect element according to claim 10 and an inductive magnetic head are combined.
【請求項13】請求項11または請求項12に記載の前
記磁気ヘッドを用いた磁気記録再生装置。
13. A magnetic recording / reproducing apparatus using the magnetic head according to claim 11 or 12.
JP6245900A 1994-10-12 1994-10-12 Multilayer magnetoresistive film and magnetic head Pending JPH08111010A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6245900A JPH08111010A (en) 1994-10-12 1994-10-12 Multilayer magnetoresistive film and magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6245900A JPH08111010A (en) 1994-10-12 1994-10-12 Multilayer magnetoresistive film and magnetic head

Publications (1)

Publication Number Publication Date
JPH08111010A true JPH08111010A (en) 1996-04-30

Family

ID=17140497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6245900A Pending JPH08111010A (en) 1994-10-12 1994-10-12 Multilayer magnetoresistive film and magnetic head

Country Status (1)

Country Link
JP (1) JPH08111010A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100369121C (en) * 2005-03-28 2008-02-13 中国科学院物理研究所 A kind of magnetic recording medium based on FePt magnetic layer and preparation method thereof
US7525774B2 (en) 2004-09-29 2009-04-28 Sony Corporation Magneto-resistance effect type magnetic head and magnetic tape apparatus
WO2010039177A3 (en) * 2008-09-23 2010-05-27 United Solar Ovonic Llc A semiconductor device having a multi-layer substrate and a method of forming the semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7525774B2 (en) 2004-09-29 2009-04-28 Sony Corporation Magneto-resistance effect type magnetic head and magnetic tape apparatus
CN100369121C (en) * 2005-03-28 2008-02-13 中国科学院物理研究所 A kind of magnetic recording medium based on FePt magnetic layer and preparation method thereof
WO2010039177A3 (en) * 2008-09-23 2010-05-27 United Solar Ovonic Llc A semiconductor device having a multi-layer substrate and a method of forming the semiconductor device

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