JPH081810A - Micro lens formed by isotropic etching - Google Patents
Micro lens formed by isotropic etchingInfo
- Publication number
- JPH081810A JPH081810A JP17154294A JP17154294A JPH081810A JP H081810 A JPH081810 A JP H081810A JP 17154294 A JP17154294 A JP 17154294A JP 17154294 A JP17154294 A JP 17154294A JP H081810 A JPH081810 A JP H081810A
- Authority
- JP
- Japan
- Prior art keywords
- isotropic etching
- lens
- etching
- microlens
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】
【目的】 薄膜形成技術、フォトリソグラフ、等方性エ
ッチングの技術を用いて製造が簡単、大量生産に有利
で、かつこれまでに無く微小なレンズを開発しようとす
るものである。
【構成】 １板が等方性エッチングされてできた４球面
状の窪みに、光屈折率の大きな物質でできた５膜が満た
されレンズとして作用する。この微小レンズは半導体集
積回路の製造に使用されている技術によって、大きさ１
μｍ以下のものが形成できる。
(57) [Abstract] [Purpose] This is an attempt to develop a lens that is simpler to manufacture, advantageous for mass production, and has a finer lens than ever before, using thin film forming technology, photolithography, and isotropic etching technology. is there. [Structure] One spherical plate formed by isotropic etching is filled with five films made of a substance having a large optical refractive index and acts as a lens. This microlens has a size of 1 according to the technology used in the manufacture of semiconductor integrated circuits.
It can be formed with a thickness of less than μm.
Description
【０００１】[0001]
【産業上の利用分野】光エレクトロニクスの進歩にとも
ない、微小光学系を用いる産業分野が急速に拡大してい
る。微小光学とは数ｍｍから１μｍ以下の非常に小さな
光学素子、あるいはそれを基礎とした総合技術を言う。
光通信、光情報処理の高速化、大容量化のために微小光
学のさらなる微細化、高集積化が望まれている。そのた
めにはこれまで以上に微小なレンズの開発が必要であ
る。本発明は製造が簡単、大量生産に有利で、かつこれ
までに無く微小なレンズとその応用に関するものであ
る。[Industrial field of application] With advances in optoelectronics, the field of industry using micro-optical systems is expanding rapidly. Micro optics refers to an extremely small optical element of several mm to 1 μm or less, or a comprehensive technology based on it.
Further miniaturization and higher integration of micro optics are desired for high speed and large capacity of optical communication and optical information processing. For that purpose, it is necessary to develop smaller lenses than ever before. The present invention relates to a lens which is simple to manufacture, is advantageous for mass production, and has a finer lens than ever before, and its application.
【０００２】[0002]
【従来の技術】通常、レンズはガラスを、溶融または軟
化して型に入れ成形したり、研削、研磨することにより
製造される。この従来の技術では大きさ１μｍ以下のレ
ンズを形成することは不可能である。2. Description of the Related Art Generally, a lens is manufactured by melting or softening glass, molding it into a mold, grinding, and polishing. With this conventional technique, it is impossible to form a lens having a size of 1 μm or less.
【０００３】[0003]
【発明が解決しようとする課題】本発明は薄膜形成技
術、フォトリソグラフ、等方性エッチングの技術を用い
て製造が簡単、大量生産に有利で、かつこれまでに無く
微小なレンズを開発しようとするものである。DISCLOSURE OF THE INVENTION The present invention intends to develop a lens which is simpler to manufacture, advantageous to mass production, and finer than ever before, using thin film forming technology, photolithography and isotropic etching technology. To do.
【０００４】[0004]
【課題を解決するための手段】薄膜形成、フォトリソグ
ラフ、等方性エッチングの技術を用いて微小なレンズを
製造する方法を図１を追って説明する。図１の（イ）〜
（ロ）は順に微小レンズの製造工程を表す。また、図１
の（イ）〜（ロ）は全て断面図である。 （イ）光を伝播し光屈折率の小さな物質でできた１板を
用意する。 （ロ）１板の上に、２フォトレジストを塗布する。 （ハ）フォトリソグラフにより２フォトレジストに３孔
を開ける。 （ニ）等方性エッチングを行う。すると１板がエッチン
グされ、４球面状の窪みができる。 （ホ）フォトレジストを除去する。 （ヘ）１板の上に、光を伝播し光屈折率の大きな物質で
できた５膜を形成する。A method of manufacturing a minute lens using thin film formation, photolithography, and isotropic etching techniques will be described with reference to FIG. 1 (a)-
(B) represents the manufacturing process of a micro lens in order. Also, FIG.
(A) to (b) are all sectional views. (A) Prepare one plate made of a substance that propagates light and has a small optical refractive index. (B) Apply 2 photoresists on 1 plate. (3) 3 holes are formed in 2 photoresists by photolithography. (D) Isotropic etching is performed. Then, one plate is etched, and four spherical spherical depressions are formed. (E) Remove the photoresist. (F) Five films made of a substance that propagates light and has a large optical refractive index are formed on one plate.
【０００５】[0005]
【作用】上記の（イ）〜（ヘ）工程を経て、４球面状の
窪みの部分に、光を伝播し光屈折率の大きな物質が満た
され、レンズとして作用する。After the above steps (a) to (f), the portion of the four-spherical depression is filled with a substance that propagates light and has a large optical refractive index, and acts as a lens.
【０００６】[0006]
【実施例１】図１に示す微小レンズの製造工程におい
て、２フォトレジストに開ける３孔を図２に示すように
円筒型にすると、円形の微小レンズができる。[Embodiment 1] In the manufacturing process of the microlens shown in FIG. 1, if the three holes formed in the two photoresists are made cylindrical as shown in FIG. 2, a circular microlens is formed.
【実施例２】図１に示す微小レンズの製造工程におい
て、２フォトレジストに開ける３孔を図３に示すように
方型にすると、極めて幅の狭い円筒形のレンズ（シリン
ドリカルレンズ）ができる。[Embodiment 2] In the process of manufacturing the minute lens shown in FIG. 1, if the three holes formed in the two photoresists are formed in a rectangular shape as shown in FIG. 3, a cylindrical lens (cylindrical lens) having an extremely narrow width can be obtained.
【実施例３】１板の材料としてＳｉＯ２（酸化けい素）
を用い、水で薄めたＨＦでＳｉＯ２の等方性エッチング
を行い、５膜としてＳｉ３Ｎ４（窒化けい素）を用い
る。ＳｉＯ２の屈折率は約１．５であり、Ｓｉ３Ｎ４の
屈折率は約２．０である。従ってこの構成で凸レンズが
できる。Example 3 SiO 2 (silicon oxide) as a material for one plate
Is used to perform isotropic etching of SiO 2 with HF diluted with water, and Si 3 N 4 (silicon nitride) is used as the 5 film. The refractive index of SiO 2 is about 1.5, and the refractive index of Si 3 N 4 is about 2.0. Therefore, with this structure, a convex lens can be formed.
【実施例４】１板の材料としてＳｉＯ２を用い、ＣＦ４
のプラズマエッチングでＳｉＯ２の等方性エッチングを
行い、５膜としてＳｉ３Ｎ４を用いる。Example 4 SiO 2 was used as a material for one plate, and CF 4
The isotropic etching of SiO 2 is performed by the plasma etching of, and Si 3 N 4 is used as the five films.
【実施例５】１板の材料としてをＳｉ３Ｎ４用い、５膜
としてＳｉＯ２を用いる。ＳｉＯ２の屈折率は約１．５
であり、Ｓｉ２Ｎ４の屈折率は約２．０である。従って
この構成で凹レンズができる。この場合、５膜は付けな
くてもよい。Fifth Embodiment Si 3 N 4 is used as a material for one plate, and SiO 2 is used as five films. The refractive index of SiO 2 is about 1.5
And the refractive index of Si 2 N 4 is about 2.0. Therefore, with this structure, a concave lens can be formed. In this case, five films may not be attached.
【実施例６】図１の微小レンズ形成の工程において、図
１（ハ）で２フォトレジストに３孔を開けた後、図４に
示すように異方性エッチングで１板に６穴を開ける。そ
の後、図１（ニ）〜（ヘ）の工程を通し、微小レンズを
形成する。すると４球面状の窪みが６穴が無い場合とく
らべて変化する。そして微小レンズの焦点距離を変化さ
せられる。[Sixth Embodiment] In the step of forming the microlenses of FIG. 1, after three holes are formed in two photoresists in FIG. 1C, six holes are formed in one plate by anisotropic etching as shown in FIG. . Then, the microlenses are formed through the steps of FIGS. Then, the sphere-shaped depression changes as compared with the case where there are no 6 holes. Then, the focal length of the minute lens can be changed.
【実施例７】７半導体基板上に形成した８受光素子の上
に９等方性エッチングにより形成した微小レンズを形成
すると、８受光素子に光が集められ、光を受ける効率が
高まる。[Embodiment 7] When a microlens formed by 9 isotropic etching is formed on 8 light receiving elements formed on 7 semiconductor substrates, the light is collected by the 8 light receiving elements and the efficiency of receiving light is increased.
【実施例８】７半導体基板上に形成した１０発光素子の
上に９等方性エッチングにより形成した微小レンズを形
成すると、１０発光素子からの光をひとつの方向に集め
られる。[Embodiment 8] By forming a microlens formed by 9 isotropic etching on 10 light emitting elements formed on 7 semiconductor substrates, light from 10 light emitting elements can be collected in one direction.
【０００７】[0007]
【効果】薄膜形成、フォトリソグラフ、等方性エッチン
グの技術は半導体集積回路の製造に使用されており、完
成度が高く高精度である。２フォトレジストに開ける３
孔は大きさ０．５μｍのものが、その大きさも位置も再
現性良く形成できる。従って４球面状の窪みとその部分
にできるレンズは大きさ１μｍ以下のものが形成でき
る。[Effect] Thin film formation, photolithography, and isotropic etching techniques are used in the manufacture of semiconductor integrated circuits, and are highly completed and highly accurate. 2 Open in photoresist 3
The hole having a size of 0.5 μm can be formed with good reproducibility in size and position. Therefore, it is possible to form a dent having four spherical surfaces and a lens formed in that portion having a size of 1 μm or less.
【図１】 （イ）〜（ヘ）は微小レンズの製造工程を表
す断面図である。1A to 1F are cross-sectional views showing a manufacturing process of a minute lens.
【図２】 本発明の実施例１の製造工程を表す斜視図FIG. 2 is a perspective view showing a manufacturing process according to the first embodiment of the present invention.
【図３】 本発明の実施例２の製造工程を表す斜視図FIG. 3 is a perspective view showing a manufacturing process according to a second embodiment of the present invention.
【図４】 本発明の実施例６の製造工程を表す断面図FIG. 4 is a sectional view showing a manufacturing process of a sixth embodiment of the present invention.
【図５】 本発明の実施例７のを表す断面図FIG. 5 is a cross-sectional view showing Example 7 of the present invention.
【図６】 本発明の実施例８のを表す断面図FIG. 6 is a cross-sectional view showing Example 8 of the present invention.
１ 光を伝播し光屈折率の小さな物質でできた板 ２ フォトレジスト ３ ２フォトレジストに開けた孔 ４ １板が等方性エッチングされてできた球面状の窪み ５ 光屈折率の大きな物質でできた膜 ６ 異方性エッチングで１板に開けた穴 ７ 半導体基板 ８ 受光素子 ９ 等方性エッチングにより形成した微小レンズ １０ 発光素子 1 A plate made of a substance that propagates light and has a small optical refractive index 2 A photoresist 3 2 A hole made in a photoresist 4 1 A spherical recess formed by isotropic etching of a plate 5 A substance having a large optical refractive index Film formed 6 Holes formed in one plate by anisotropic etching 7 Semiconductor substrate 8 Light receiving element 9 Microlens formed by isotropic etching 10 Light emitting element
Claims (9)
ンズの製造法1. A method of manufacturing a microlens formed by isotropic etching.
形レンズ2. A minute circular lens formed by isotropic etching.
幅の狭い円筒形レンズ3. An extremely narrow cylindrical lens formed by isotropic etching.
い、微小レンズを形成する方法4. A method of forming microlenses by performing isotropic etching with HF diluted with water.
ッチングを行い、微小レンズを形成する方法5. A method for forming microlenses by performing isotropic etching with CF 4 plasma etching.
レンズ6. A micro concave lens formed by isotropic etching.
チングを行って、等方性エッチングにより形成する微小
レンズの焦点距離を変化させる方法7. A method of changing the focal length of a microlens formed by isotropic etching by performing anisotropic etching before the isotropic etching.
ンズを上部に形成し受光効率を高めた受光素子8. A light-receiving element having a microlens formed by isotropic etching formed on the top to enhance light-receiving efficiency.
ンズを上部に形成し光をひとつの方向に集める発光素子9. A light emitting device in which a microlens formed by isotropic etching is formed on the upper part to collect light in one direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17154294A JPH081810A (en) | 1994-06-20 | 1994-06-20 | Micro lens formed by isotropic etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17154294A JPH081810A (en) | 1994-06-20 | 1994-06-20 | Micro lens formed by isotropic etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH081810A true JPH081810A (en) | 1996-01-09 |
Family
ID=15925061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17154294A Pending JPH081810A (en) | 1994-06-20 | 1994-06-20 | Micro lens formed by isotropic etching |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH081810A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6614598B1 (en) | 1998-11-12 | 2003-09-02 | Institute Of Technology, California | Microlensing particles and applications |
| EP1151796A3 (en) * | 2000-04-27 | 2004-03-31 | Sony Corporation | Immersion lens, optical system incorporating same, method of production of same, and mold for production of same |
| US6958865B1 (en) * | 1998-11-12 | 2005-10-25 | California Institute Of Technology | Microlicensing particles and applications |
| US7042649B2 (en) | 2003-08-11 | 2006-05-09 | California Institute Of Technology | Microfabricated rubber microscope using soft solid immersion lenses |
| US7161736B2 (en) | 2000-08-16 | 2007-01-09 | California Institute Of Technology | Solid immersion lens structures and methods for producing solid immersion lens structures |
| CN102446774A (en) * | 2010-10-01 | 2012-05-09 | 住友金属矿山株式会社 | Method of manufacturing a base plate for mounting semiconductor elements |
| CN103560083A (en) * | 2013-11-18 | 2014-02-05 | 电子科技大学 | Stripping process for non-refrigerating infrared FPA detector electrode patterning |
-
1994
- 1994-06-20 JP JP17154294A patent/JPH081810A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6614598B1 (en) | 1998-11-12 | 2003-09-02 | Institute Of Technology, California | Microlensing particles and applications |
| US6958865B1 (en) * | 1998-11-12 | 2005-10-25 | California Institute Of Technology | Microlicensing particles and applications |
| US7248413B2 (en) | 1998-11-12 | 2007-07-24 | California Institute Of Technology | Microlensing particles and applications |
| EP1151796A3 (en) * | 2000-04-27 | 2004-03-31 | Sony Corporation | Immersion lens, optical system incorporating same, method of production of same, and mold for production of same |
| US6825995B2 (en) | 2000-04-27 | 2004-11-30 | Sony Corporation | Optical device, optical system, method of production of same, and mold for production of same |
| US7161736B2 (en) | 2000-08-16 | 2007-01-09 | California Institute Of Technology | Solid immersion lens structures and methods for producing solid immersion lens structures |
| US7042649B2 (en) | 2003-08-11 | 2006-05-09 | California Institute Of Technology | Microfabricated rubber microscope using soft solid immersion lenses |
| CN102446774A (en) * | 2010-10-01 | 2012-05-09 | 住友金属矿山株式会社 | Method of manufacturing a base plate for mounting semiconductor elements |
| CN103560083A (en) * | 2013-11-18 | 2014-02-05 | 电子科技大学 | Stripping process for non-refrigerating infrared FPA detector electrode patterning |
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