JPH08201826A - Liquid crystal display element - Google Patents

Liquid crystal display element

Info

Publication number
JPH08201826A
JPH08201826A JP7009846A JP984695A JPH08201826A JP H08201826 A JPH08201826 A JP H08201826A JP 7009846 A JP7009846 A JP 7009846A JP 984695 A JP984695 A JP 984695A JP H08201826 A JPH08201826 A JP H08201826A
Authority
JP
Japan
Prior art keywords
liquid crystal
pixel
rubbing
crystal display
display element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7009846A
Other languages
Japanese (ja)
Other versions
JP2778500B2 (en
Inventor
Shigeyoshi Suzuki
成嘉 鈴木
Teruaki Suzuki
照晃 鈴木
Ken Sumiyoshi
研 住吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP7009846A priority Critical patent/JP2778500B2/en
Priority to US08/559,828 priority patent/US5710611A/en
Priority to KR1019950043058A priority patent/KR100228604B1/en
Priority to DE19542981A priority patent/DE19542981A1/en
Publication of JPH08201826A publication Critical patent/JPH08201826A/en
Application granted granted Critical
Publication of JP2778500B2 publication Critical patent/JP2778500B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE: To provide a liquid crystal display element with less numerical aperture, excellent picture quality and a wide angle of visibility as a result of no bending and movement of a discrimination line and no need for an extremely large width of shield film. CONSTITUTION: A liquid crystal display element has a pair of electrodes constituting one picture element, at least one of which is given different orientation treatments to be divided into two areas where respective liquid crystal sections with different oriented conditions exist. A portion 5 with no electrode is provided on the electrode 3 located in the rising direction of a liquid crystal director so that the liquid crystal director coincides with a boundary for dividing a portion rising toward an each other separating direction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は液晶表示素子に関し、更
に詳しくは基板上に複数の領域を設けることにより広視
野な表示を得る液晶表示素子に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display element, and more particularly to a liquid crystal display element which provides a wide field of view by providing a plurality of regions on a substrate.

【0002】[0002]

【従来の技術】広視野角化を目的として複数の領域を設
けた液晶表示素子に関しては、特開昭57−18673
5号公報、特開昭60−211422号公報、特開昭6
3−106624号公報、特開昭64−88520号公
報、特開平1−245223号公報、特開平5−203
951号公報等に記載されている。その主旨は、1つの
画素を複数の領域に分割し、異なる領域内での液晶の配
向方向を、互いに視角依存性を補うように規定すること
である。この液晶の配向方向を規定する方法として、酸
化珪素膜の斜方蒸着、ポリイミド樹脂の薄膜をラビング
する方法があり、工程の簡便さから、特にポリイミド薄
膜をラビングする方法が広く用いられている。ここで用
いられるポリイミド樹脂としては、特開昭61−479
32号公報、特開平6−148650号公報に示された
もの、及び、商品名では、日産化学製SE−7311、
日本合成ゴム製AL1051などがある。
2. Description of the Related Art A liquid crystal display element provided with a plurality of regions for the purpose of widening the viewing angle is disclosed in JP-A-57-18673.
5, JP-A-60-212142, JP-A-6
3-106624, JP-A-64-88520, JP-A-1-245223, and JP-A-5-203.
951 and the like. The main idea is to divide one pixel into a plurality of regions and define the alignment directions of the liquid crystal in different regions so as to complement each other in the viewing angle dependence. As a method of defining the alignment direction of the liquid crystal, there is a method of oblique vapor deposition of a silicon oxide film, a method of rubbing a thin film of a polyimide resin, and a method of rubbing a polyimide thin film is widely used because of the simplicity of the process. The polyimide resin used here is, for example, JP-A-61-479.
32, JP-A-6-148650, and SE-7311, manufactured by Nissan Kagaku Co., Ltd.
There is AL1051 made by Japan Synthetic Rubber.

【0003】1つの画素を複数の領域に分割するために
は、1つの画素内のラビング方向を変化させることが必
要であるが、その具体的な方法に関しては、特開昭60
−211422号公報、平5−203951号公報など
に述べられている。例えば、特開昭60−211422
号公報には、1回目のラビング後に画素の1部をフォト
レジスト層で保護しておき、2回目のラビングを行った
後、このフォトレジスト層を剥離するという操作を繰り
返すことで、1画素を複数の領域に分割することが述べ
られている。さらに、特開平5−173137号公報、
特開平5−203951号公報には、一方の基板を分割
配向処理を施し、もう一方の基板に全面均一配向処理を
施し、分割配向処理を施した方の基板のプレチルト角
を、全面均一配向処理を施した基板のプレチルト角とほ
ぼ同一にするか、または、それ以上にすることにより、
分割配向処理を施した基板における液晶層の配向が支配
的になり、少ない工程数で、分割配向が可能であること
が、述べられている。
In order to divide one pixel into a plurality of regions, it is necessary to change the rubbing direction within one pixel. A specific method for doing so is Japanese Patent Laid-Open No. Sho 60.
No. 211422, No. 5-203951, and the like. For example, Japanese Patent Laid-Open No. 60-212142
In the publication, a part of the pixel is protected by a photoresist layer after the first rubbing, the second rubbing is performed, and then the operation of peeling off the photoresist layer is repeated. Dividing into multiple regions is mentioned. Furthermore, JP-A-5-173137,
Japanese Unexamined Patent Publication No. 5-203951 discloses that one substrate is subjected to a split alignment treatment, the other substrate is subjected to a uniform alignment treatment over the entire surface, and the pretilt angle of the substrate subjected to the divided alignment treatment is determined over the uniform alignment treatment. By making the pretilt angle of the substrate subjected to
It is described that the orientation of the liquid crystal layer on the substrate that has been subjected to the division alignment treatment becomes dominant, and the division alignment can be performed with a small number of steps.

【0004】[0004]

【発明が解決しようとする課題】このような方法で分割
配向を行った場合、分割境界に必ずディスクリネーショ
ンラインが発生し、このディスクリネーションラインか
ら光が漏れることになるので、コントラストの低下を招
く。そこで、高コントラストを維持するためにこの部分
を遮光する必要があるが、あまり遮光部が太くなると開
口率の低下を招き、画面が暗くなるので、遮光部分はな
るべく細い方が望ましい。ディスクリネーションライン
が分割境界位置にきちんと固定されていれば、この遮光
部分は細くてすむが、実際に薄膜トランジスタで駆動を
行うパネルを作成してみると、主に横方向電界の影響に
より、ディスクリネーションラインが画素の端で大きく
曲がり、これを遮光するために、太い遮光部分を設けざ
るを得なくなり、その結果、開口率が大きく低下すると
いう問題があった。
When the division orientation is performed by such a method, a disclination line is always generated at the division boundary, and light is leaked from the disclination line, which lowers the contrast. Invite. Therefore, in order to maintain a high contrast, it is necessary to shield this part from light, but if the light-shielding part becomes too thick, the aperture ratio will decrease and the screen will become dark, so it is desirable that the light-shielding part be as thin as possible. If the disclination line is properly fixed at the division boundary position, this light shielding part can be thin, but when actually creating a panel driven by thin film transistors, mainly due to the influence of the lateral electric field, the disc There is a problem that the line is largely bent at the edge of the pixel and a thick light-shielding portion is required to shield the light from the edge, resulting in a large reduction in the aperture ratio.

【0005】また、電圧を印可することによりディスク
リネーションラインが移動するといった現象が見られ
た。このディスクリネーションラインの移動は、残像と
して観察され、表示素子の性能を劣化させていた。
Further, a phenomenon has been observed in which the disclination line moves when a voltage is applied. This movement of the disclination line was observed as an afterimage, deteriorating the performance of the display element.

【0006】本発明の目的は、安定な分割配向を実現
し、残像などの表示性能を劣化させる現象をなくした広
視野の液晶表示素子を提供することにある。
An object of the present invention is to provide a liquid crystal display device having a wide field of view, which realizes stable divisional alignment and eliminates a phenomenon such as an afterimage that deteriorates the display performance.

【0007】[0007]

【課題を解決するための手段】本発明は、1画素を構成
する1対の電極の少なくとも一方に2つ以上の部分に分
割するため異なった配向処理を施し、分割された各部で
配向状態の異なる液晶区分を実現し、電圧を印加した場
合、液晶のダイレクタが立ち上がる方向にある電極に、
液晶のダイレクタが互いに離れる方向を向いて立ち上が
る部分の分割処理の境界と一致する方向に、電極の無い
部分を設けることを特徴とした液晶表示素子である。こ
れにより、電界が分割配向を助成する向きに生じるた
め、ディスクリネーションラインが分割位置に固定され
る。その結果、ディスクリネーションラインが曲がる現
象も、駆動によりディスクリネーションラインが移動す
る現象も防ぐことができ、開口率の低下、残像による表
示性能の劣化を防ぐことができる。
According to the present invention, different alignment treatments are applied to at least one of a pair of electrodes constituting one pixel to divide it into two or more portions, and the divided portions have different alignment states. When realizing different liquid crystal divisions and applying a voltage, to the electrodes in the direction in which the director of the liquid crystal rises,
A liquid crystal display element is characterized in that a portion without electrodes is provided in a direction that coincides with a boundary of a division process of a portion where the directors of the liquid crystal stand in a direction away from each other. As a result, the electric field is generated in the direction that promotes the division orientation, and the disclination line is fixed at the division position. As a result, it is possible to prevent the phenomenon that the disclination line bends and the phenomenon that the disclination line moves due to driving, and it is possible to prevent the reduction of the aperture ratio and the deterioration of the display performance due to the afterimage.

【0008】[0008]

【作用】分割配向を実現する際、特開昭60−2114
22号公報、特開平5−203951号公報に開示され
ているように、レジストを用いたPR工程を用いる。1
回目のラビングの後、レジストを用い配向膜の一部を保
護し、2回目のラビングを行った後、レジストを剥離液
で剥離する。対向する基板にも、同様に分割処理を施す
方法と、分割処理を施さない方法の2種類の方式があ
る。分割処理を施さない場合は、ほとんどの場合、配向
膜を塗布し、1方向にラビングする。または、特開平4
−7520号公報に記載されているように、配向膜を塗
布した後、偏光を照射し配向処理を施してもよい。
When the split orientation is realized, the method disclosed in JP-A-60-2114 is used.
As disclosed in Japanese Unexamined Patent Application Publication No. 22-22, and Japanese Patent Application Laid-Open No. 5-203951, a PR process using a resist is used. 1
After the rubbing for the second time, a part of the alignment film is protected with a resist, and after rubbing for the second time, the resist is stripped with a stripping solution. There are also two types of methods, that is, a method of similarly performing division processing on the facing substrate and a method of not performing division processing. When the division treatment is not performed, in most cases, the alignment film is applied and rubbed in one direction. Alternatively, JP-A-4
As described in JP-A-7520, after the alignment film is applied, polarized light may be irradiated to perform the alignment treatment.

【0009】どの方法で作成した場合でも、分割境界に
おけるパネルギャップの中間で液晶のダイレクタの方向
は模式的に図1に示すような配置をとる部分が必ず生じ
る。この分割の境界にディスクリネーションラインが発
生し、駆動するために電圧を印可すると、横方向電界が
生じるために、ディスクリネーションラインが分割境界
から曲がる現象が生じ、はなはだしい場合には移動し、
さらに、画素の別の場所に生じたディスクリネーション
ラインとつながることもあり、残像として観測され、画
質の劣化を招く。特に、このようなダイレクタの配置が
画素中央にくるようにラビングした場合は、極めて大き
な問題となる。
Whatever method is used, the direction of the director of the liquid crystal must have a portion schematically arranged in the middle of the panel gap at the division boundary. When a disclination line is generated at the boundary of this division and a voltage is applied to drive it, a lateral electric field is generated, so that the phenomenon that the disclination line bends from the division boundary occurs.
Further, it may be connected to a disclination line generated in another place of the pixel, and it is observed as an afterimage, resulting in deterioration of image quality. In particular, when the rubbing is performed so that the director arrangement is located at the center of the pixel, it becomes a very serious problem.

【0010】このとき、液晶のダイレクタが立ち上がる
方向にある電極、すなわち、図1において上部にある電
極に、分割処理の方向と一致する方向に電極の無い部分
を設けると、下部電極と上部電極との間の電気力線がデ
ィスクリネーションを固定する方向に働くため、ディス
クリネーションが極めて安定する。このためディスクリ
ネーションラインの、移動などを防ぐことができ、残像
などの画質の低下を防ぐことができる。また、ディスク
リネーションラインが電極の無い部分に沿って固定され
るので、横方向電界によるディスクリネーションライン
の曲がりを防ぐことができ、この電極の切り込みに沿っ
て遮光膜を設ければ、細い遮光膜を使用して、ディスク
リネーションラインからの光もれを防止することができ
るので、開口率の低下を許容できる程度に少なくすませ
ることができる。特に、電極の切り込みをストライプま
たは長方形にすれば開口率の低下は少なくてすむ。遮光
膜は一対の電極基板のどちらに設けてもよいが、特に片
方の基板のみ分割配向させた場合は目合わせの容易さか
ら、分割配向処理をした基板に設けるほうがよい。
At this time, if the electrode in the direction in which the director of the liquid crystal rises, that is, the electrode on the upper side in FIG. The lines of electric force between the two act in a direction to fix the disclination, so that the disclination is extremely stable. Therefore, it is possible to prevent the disclination line from moving, and to prevent deterioration in image quality such as an afterimage. Further, since the disclination line is fixed along the portion where there is no electrode, it is possible to prevent the disclination line from being bent by a lateral electric field. Since the light-shielding film can be used to prevent light leakage from the disclination line, it is possible to minimize the decrease in the aperture ratio. In particular, if the notches of the electrodes are formed in stripes or rectangles, the reduction in aperture ratio can be reduced. The light-shielding film may be provided on either of the pair of electrode substrates, but it is preferable to provide the light-shielding film on the substrate which has been subjected to the split alignment treatment, because alignment is easy, especially when only one of the substrates is split and aligned.

【0011】また、図1のようなダイレクタの配置が画
素内部以外の場所で生じる配向制御を行った場合は、デ
ィスクリネーションラインの遮光は大きな問題とはなら
ないが、ディスクリネーションラインの移動は問題とな
り、ディスクリネーションラインを固定した方が優れた
画質が得られる。
Further, when the director arrangement as shown in FIG. 1 is carried out at a place other than the inside of the pixel, the shading of the disclination line is not a serious problem, but the movement of the disclination line does not occur. There is a problem, and better image quality can be obtained by fixing the disclination line.

【0012】なお、ここでは説明の都合上、一つの基板
では同一の配向膜をレジストパターンを用いて、ラビン
グし分ける方法を述べたが、有機無機を問わず異なる配
向膜を塗り分けて、分割配向を実現した場合でも、さら
にその他の方法で分割配向を実現した場合でも同様の効
果が得られる。
Here, for convenience of description, a method of rubbing the same alignment film on one substrate by using a resist pattern was described. However, different alignment films are painted and divided regardless of organic or inorganic. The same effect can be obtained when the orientation is realized or when the divided orientation is realized by another method.

【0013】また、特に、片方の基板のみに分割配向処
理を施した場合は特願平6−79089号公報に記載さ
れているように、プレチルト角が大きくなる領域がスプ
レイ型の配向をとるように設計した方が、ディスクリネ
ーションラインの固定に有利であるが、画素中央部の分
割境界上のディスクリネーションに限って言えば、本発
明の効果が強く、プレチルト角の大きさにより大きな影
響は受けないことが確認された。さらにここでは一画素
を2つの領域に分割する例を説明したが3つ以上に分割
しても同様のことが言える。
Further, in particular, when only one of the substrates is subjected to the divisional alignment treatment, as described in Japanese Patent Application No. 6-79089, the region in which the pretilt angle becomes large has a splay type alignment. Although it is more advantageous to fix the disclination line, the effect of the present invention is strong and the influence of the size of the pretilt angle is great if it is limited to the disclination on the division boundary of the pixel central portion. It was confirmed that he would not receive it. Furthermore, here, an example in which one pixel is divided into two regions has been described, but the same can be said when dividing into three or more regions.

【0014】[0014]

【実施例】以下、本発明を実施例を用いて、詳細に説明
する。
EXAMPLES The present invention will be described in detail below with reference to examples.

【0015】(実施例1)TFT基板を洗浄後、高プレ
ティルト角を与えるポリイミド(日産化学社製:商品名
SE−7210)をスピン塗布し、200℃で1時間焼
成した。ラビング装置を用いラビングを行った後、レジ
スト(東京応化工業社製 商品名:OFPR−800
C)を1μm 厚になるようにスピン塗布し、85℃で3
0分焼成した。すべての画素について1画素の半分を覆
うストライプパターンのマスクを用い、露光・現像を行
い、純水でリンスした後、75℃で20分乾燥を行っ
た。光学顕微鏡を用い、パターンを観察したところ、す
べての画素について1画素の半分にレジストパターンが
形成されていた。次に、ラビング装置を用い、1回目の
ラビングとは逆方向にラビングを行った。1回目と2回
目のラビングの方向は図2に示すとおりである。(ここ
では1回目のラビングが8の方向、2回目のラビングが
7の方向になるように設定した。)レジストを剥離する
ために、この基板を、乳酸エチルで2分間処理した後、
純水でリンスし、110℃で30分間、乾燥を行い、主
基板とした。ディスクリネーションを観察するために対
向基板としてITOを成膜したガラス基板を洗浄後、フ
ォトレジストプロセス、およびウエットエッチングプロ
セスを用いて、TFT基板の分割境界のうち、液晶のダ
イレクタが互いに離れる方向を向いて立ち上がる部分、
すなわち図2では画素の中央の部分の分割境界に相当す
る位置に、幅が6μm で長さが1画素の横幅と等しい長
方形状のスリットを、ITOに形成した。この基板に低
プレティルト角を与えるポリイミド(日本合成ゴム社
製、AL−1051)をスピン塗布し、200℃で1時
間焼成し、ラビングを行った。このようにして作成した
二枚の基板をギャップが6μm になるように、かつ、上
下基板のラビング方向が互いに直角になるように、球形
のスペーサーを介して接着剤で貼り合わせパネルを作成
した。このとき、後に述べるように、レジストが残って
いた部分の方がレジストが残っていなかった部分よりプ
レチルト角が小さかったが、レジストが残っていた部分
がスプレイ型TN変形を、レジストが残っていなかった
部分が通常のTN型変形をするように、基板を貼り合わ
せパネルを作成した。ラビングの方向の関係は図2にし
めすとおりである。このパネルに左カイラル材を溶解さ
せた通常のネマチック液晶を注入し、注入口を封止し
た。
Example 1 After washing the TFT substrate, a polyimide (manufactured by Nissan Kagaku: trade name SE-7210) that gives a high pretilt angle was spin-coated and baked at 200 ° C. for 1 hour. After rubbing using a rubbing device, a resist (trade name: OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.)
C) is spin coated to a thickness of 1 μm,
It was baked for 0 minutes. All pixels were exposed and developed using a stripe pattern mask covering half of one pixel, rinsed with pure water, and then dried at 75 ° C. for 20 minutes. When the pattern was observed using an optical microscope, a resist pattern was formed on half of one pixel for all pixels. Next, using a rubbing device, rubbing was performed in the opposite direction to the first rubbing. The directions of the first and second rubbing are as shown in FIG. (Here, it was set so that the first rubbing was in the 8 direction and the second rubbing was in the 7 direction.) To remove the resist, the substrate was treated with ethyl lactate for 2 minutes, and then,
It was rinsed with pure water and dried at 110 ° C. for 30 minutes to obtain a main substrate. After observing the glass substrate on which the ITO film was formed as the counter substrate for observing the disclination, using the photoresist process and the wet etching process, the direction in which the directors of the liquid crystal are separated from each other among the division boundaries of the TFT substrate is used. The part that stands up,
That is, in FIG. 2, a rectangular slit having a width of 6 μm and a length equal to the lateral width of one pixel is formed in ITO at a position corresponding to the division boundary of the central portion of the pixel. Polyimide (AL-1051, manufactured by Japan Synthetic Rubber Co., Ltd.) that gives a low pretilt angle was spin-coated on this substrate, baked at 200 ° C. for 1 hour, and rubbed. A panel was prepared by bonding the two substrates thus prepared with an adhesive through a spherical spacer so that the gap was 6 μm and the rubbing directions of the upper and lower substrates were perpendicular to each other. At this time, as described later, the pretilt angle of the part where the resist remained was smaller than that of the part where the resist did not remain, but the part where the resist remained was spray type TN deformation and the resist did not remain. The substrates were bonded to each other to form a panel so that the bent portion was subjected to a normal TN type deformation. The relationship of rubbing directions is as shown in FIG. A normal nematic liquid crystal in which the left chiral material was dissolved was injected into this panel, and the injection port was sealed.

【0016】作成したパネルに、駆動電圧を印加し、偏
光顕微鏡で液晶の配向状態を観察した。その結果、どの
ような駆動電圧においても良好な分割配向が確認され、
かつ画素中央部のディスクリネーションラインがITO
のスリット部分すなわち分割境界にきれいに固定され、
駆動電圧の変化で移動することはなかった。また、この
ディスクリネーションラインの幅は12μm 以内におさ
まっており、遮光のためのストライプの幅は12μm も
あれば充分で、開口率の低下は許容できる範囲であっ
た。
A driving voltage was applied to the prepared panel and the alignment state of the liquid crystal was observed with a polarization microscope. As a result, good split orientation was confirmed at any drive voltage,
And the disclination line in the center of the pixel is ITO
It is fixed neatly at the slit part of
It did not move due to changes in drive voltage. Further, the width of the disclination line was within 12 μm, and the width of the stripe for shielding light was 12 μm, which was sufficient, and the reduction of the aperture ratio was within the allowable range.

【0017】次に、参考のため、高プレチルト角を与え
るポリイミド(SE−7210)のレジストが残ってい
た部分と残っていなかった部分のプレチルト角を、上記
のTNセルを作成したのと全く同じ条件になるように、
それぞれの条件でアンチパラレルセルを作成し、クリス
タルローテーション法によって測定した。その結果、レ
ジストが残っていた部分のプレチルト角は4.1゜、レ
ジストが残っていなかった部分のプレチルト角は6.3
゜と求められた。また、低プレチルト角を与えるポリイ
ミド(AL−1051)のプレチルト角をやはりTNセ
ルを作成したものと同じ条件で、アンチパラレルセルを
作成し、クリスタルローテーション法を用いて、測定し
た。その結果、プレチルト角は1゜と求められた。
Next, for reference, the pretilt angles of the portion where the resist of the polyimide (SE-7210) giving a high pretilt angle was left and the portion where it was not left were exactly the same as when the above TN cell was prepared. To meet the conditions
An anti-parallel cell was prepared under each condition and measured by the crystal rotation method. As a result, the pretilt angle of the portion where the resist remained was 4.1 °, and the pretilt angle of the portion where the resist remained was 6.3.
Was asked. Further, the pretilt angle of the polyimide (AL-1051) giving a low pretilt angle was measured under the same conditions as those used for manufacturing the TN cell to prepare an anti-parallel cell and using the crystal rotation method. As a result, the pretilt angle was determined to be 1 °.

【0018】(比較例1)実施例1と全く同様の方法
で、対向基板のITOに切り込みをいれずに、全面にI
TOがついた基板で、実験を行った。その結果、画素中
央部のディスクリネーションラインが各画素の端で大き
く曲がり、遮光のためのストライプは12μm ではとて
もおさまらず、ディスクリネーションをすべて遮光しよ
うとすると、開口率の低下が著しいことが確認された。
また、いくつかの画素においては、ディスクリネーショ
ンラインが移動し、他の画素のディスクリネーションラ
インと結び付き、そのまま画素内にディスクリネーショ
ンラインが残り、残像または焼き付けの原因となること
がわかった。
(Comparative Example 1) In the same manner as in Example 1, the entire surface of the counter substrate I
The experiment was conducted on the substrate with TO. As a result, the disclination line at the center of the pixel is greatly bent at the edge of each pixel, and the stripes for shading do not completely stop at 12 μm, and when trying to shade all the disclinations, the aperture ratio decreases significantly. confirmed.
In addition, it was found that in some pixels, the disclination line moved and was connected to the disclination lines of other pixels, and the disclination line remained in the pixel as it was, causing afterimages or burning. .

【0019】(実施例2)実施例1とまったく同様の方
法で、スプレイ型TN変形をする領域と通常のTN変形
をする領域のプレチルト角の大小のみ逆になるように、
すなわち、レジストが残っていた部分が通常のTN型変
形を、レジストが残っていなかった部分がスプレイ型T
N変形をするように、基板を貼り合わせ、他の条件は実
施例1とまったく同様にして、パネルを作成し、実験を
行った。すなわち、この場合はTFT基板の1回目のラ
ビングが図2の7の方向、2回目のラビングが8の方向
になるようにラビングを行った。その結果、どのような
駆動電圧においても良好な分割配向が確認され、かつ画
素中央部のディスクリネーションラインがITOのスリ
ット部分すなわち分割境界にきれいに固定され、駆動電
圧の変化で移動することはなかった。また、このディス
クリネーションラインの幅は6μm 以内におさまってお
り、遮光のためのストライプの幅は6μm もあれば充分
で、開口率の低下は許容できる範囲であった。
(Embodiment 2) In exactly the same manner as in Embodiment 1, only the magnitudes of the pretilt angles of the splay type TN deformation region and the normal TN deformation region are reversed.
That is, the part where the resist remains is the normal TN type deformation, and the part where the resist is not present is the spray type T
Substrates were attached so as to be N-deformed, and other conditions were exactly the same as in Example 1 to prepare a panel and perform an experiment. That is, in this case, rubbing was performed so that the first rubbing of the TFT substrate was in the direction 7 in FIG. 2 and the second rubbing was in the direction 8. As a result, good division orientation was confirmed at any drive voltage, and the disclination line at the center of the pixel was fixed neatly to the slit portion of ITO, that is, the division boundary, and did not move due to changes in drive voltage. It was The width of the disclination line was within 6 μm, and the width of the stripe for shielding light was 6 μm, which was sufficient, and the reduction of the aperture ratio was within the allowable range.

【0020】(比較例2)実施例2とまったく同様にし
て、対向基板のITOに切り込みをいれずに、全面にI
TOがついた基板で、実験を行った。その結果、比較例
1ほど顕著ではなかったが、いくつかの画素では画素中
央部のディスクリネーションが、画素の端で若干曲が
り、遮光のためのストライプが12μm では、画素の端
でディスクリネーションラインがはみ出す現象が見られ
た。
(Comparative Example 2) In exactly the same manner as in Example 2, I was formed on the entire surface of the counter substrate without cutting the ITO.
The experiment was conducted on the substrate with TO. As a result, although not as remarkable as in Comparative Example 1, in some pixels, the disclination at the center of the pixel was slightly bent at the edge of the pixel, and when the stripe for shading was 12 μm, the disclination was at the edge of the pixel. The phenomenon that the line protruded was seen.

【0021】(実施例3)実施例1と同様にして、TF
T基板側に分割配向処理を施し、主基板とした。ラビン
グの方向の関係を図3に示す。この場合、ラビングの順
序は大きな影響を与えないが、図3の7の方向がTFT
基板の1回目のラビング、8の方向がTFT基板の2回
目のラビング、それぞれに向かい合う9の方向が対向基
板の2回目,1回目のラビングとなるようにした。ま
た、実施例1と同様に、ディスクリネーションを観察す
るために対向基板としてITOを成膜したガラス基板
に、TFT基板の分割境界のうち、液晶のダイレクタが
互いに離れる方向を向いて立ち上がる部分、すなわち、
画素の中央部に相当する位置に、幅が6μm で長さが1
画素の横幅と等しい長方形状のスリットを、ITOに形
成した。その後、実施例1のTFT基板と同様に分割配
向処理を行い、対向基板とした。ラビングの方向の関係
は図3に示すとおりである。このようにして作成した二
枚の基板をギャップが6μm になるように、かつ、上下
基板のラビング方向が互いに直角になるように、かつ、
それぞれの分割領域が通常のTN型変形をするように設
置し、球形のスペーサーを介して接着剤で貼り合わせパ
ネルを作成した。実施例1と同様に、このパネルに左カ
イラル材を溶解させた通常のネマチック液晶を注入し、
注入口を封止し、駆動電圧を印加し、偏光顕微鏡で液晶
の配向状態を観察した。その結果、どのような駆動電圧
においても良好な分割配向が確認され、かつ画素中央部
のディスクリネーションラインがITOのスリット部分
すなわち分割境界にきれいに固定され、駆動電圧の変化
で移動することはなかった。また、このディスクリネー
ションラインの幅は6μm 以内におさまっており、遮光
のためのストライプの幅は6μm もあれば充分で、開口
率の低下は許容できる範囲であった。
(Embodiment 3) In the same manner as in Embodiment 1, TF
The T substrate side was subjected to a split orientation treatment to obtain a main substrate. The relationship between the rubbing directions is shown in FIG. In this case, the rubbing order does not have a great influence, but the direction 7 in FIG.
The first rubbing of the substrate, the direction of 8 is the second rubbing of the TFT substrate, and the direction of 9 facing each other is the second and first rubbing of the counter substrate. Further, as in Example 1, on the glass substrate on which the ITO film was formed as the counter substrate for observing the disclination, a part of the division boundary of the TFT substrate that rises in a direction in which the directors of the liquid crystal face each other, That is,
At the position corresponding to the center of the pixel, the width is 6 μm and the length is 1
A rectangular slit having the same width as the pixel was formed in the ITO. After that, a split alignment process was performed in the same manner as the TFT substrate of Example 1 to obtain a counter substrate. The relationship of rubbing directions is as shown in FIG. The two substrates created in this way should have a gap of 6 μm, and the rubbing directions of the upper and lower substrates should be at right angles to each other, and
Each of the divided areas was set so as to undergo a normal TN type deformation, and a panel was prepared by bonding with an adhesive through a spherical spacer. In the same manner as in Example 1, a normal nematic liquid crystal in which the left chiral material was dissolved was injected into this panel,
The injection port was sealed, a drive voltage was applied, and the alignment state of the liquid crystal was observed with a polarization microscope. As a result, good division orientation was confirmed at any drive voltage, and the disclination line in the center of the pixel was fixed neatly to the slit portion of ITO, that is, the division boundary, and did not move due to changes in drive voltage. It was Further, the width of the disclination line was within 6 μm, and the width of the stripe for shielding light was 6 μm, which was sufficient, and the reduction of the aperture ratio was within the allowable range.

【0022】(比較例3)実施例3とまったく同様にし
て、対向基板のITOに切り込みをいれずに、全面にI
TOがついた基板で、実験を行った。その結果、いくつ
かの画素では画素中央部のディスクリネーションが、画
素の端で若干曲がり、遮光のためのストライプが12μ
m では、画素の端でディスクリネーションラインがはみ
出す現象が見られた。
(Comparative Example 3) In exactly the same manner as in Example 3, I was formed on the entire surface of the counter substrate without cutting the ITO.
The experiment was conducted on the substrate with TO. As a result, in some pixels, the disclination at the center of the pixel is slightly bent at the edge of the pixel, and the stripe for light shielding is 12 μm.
At m, the phenomenon of the disclination line protruding at the edge of the pixel was seen.

【0023】(実施例4)実施例2とまったく同様の方
法で、高プレチルトを与える配向膜のみ、日産化学社
製、商品名RN−715にかえて実験を行った。この配
向膜の場合、レジストが残っていた部分とレジストが残
っていなかった部分のプレチルト角の大小関係がSE−
7210と逆になるので、それだけ逆にして、すなわ
ち、プレチルト角が大きい方がスプレイ型TN変形を、
プレチルト角が小さい方が通常のTN型変形をするよう
にして、それ以外は実施例2とまったく同様にして実験
を行った。その結果、実施例1とまったく同様に、どの
ような駆動電圧においても良好な分割配向が確認され、
かつ画素中央部のディスクリネーションラインがITO
のスリット部分すなわち分割境界にきれいに固定され、
駆動電圧の変化で移動することはなかった。また、この
ディスクリネーションラインの幅は10μm 以内におさ
まっており、遮光のためのストライプの幅は12μm も
あれば充分で、開口率の低下は許容できる範囲であっ
た。
(Example 4) An experiment was carried out in the same manner as in Example 2 except that only the alignment film giving a high pretilt was replaced with Nissan Chemical Co., Ltd., trade name RN-715. In the case of this alignment film, the magnitude relationship between the pretilt angles of the portion where the resist was left and the portion where the resist was not left was SE-.
Since it is the reverse of 7210, the reverse is the case, that is, the larger pretilt angle is the splay type TN deformation,
An experiment was conducted in the same manner as in Example 2 except that the smaller pretilt angle caused normal TN deformation. As a result, just as in Example 1, good split orientation was confirmed at any drive voltage,
And the disclination line in the center of the pixel is ITO
It is fixed neatly at the slit part of
It did not move due to changes in drive voltage. Further, the width of the disclination line was within 10 μm, and the width of the stripe for shielding light was 12 μm, which was sufficient, and the reduction of the aperture ratio was within the allowable range.

【0024】参考のため、使用したポリイミド(RN−
715)のレジストが残っていた部分と残っていなかっ
た部分のプレチルト角を、上記のTNセルを作成したの
と全く同じ条件になるように、それぞれの条件でアンチ
パラレルセルを作成し、クリスタルローテーション法に
よって測定した。その結果、レジストが残っていた部分
のプレチルト角は12゜、レジストが残っていなかった
部分のプレチルト角は9゜と求められた。
For reference, the polyimide (RN-
715) Anti-parallel cells were created under each condition so that the pretilt angles of the part where the resist was left and the part where the resist was not left were exactly the same as those for the above TN cell, and the crystal rotation was performed. It was measured by the method. As a result, the pretilt angle of the portion where the resist remained was determined to be 12 °, and the pretilt angle of the portion where the resist did not remain was determined to be 9 °.

【0025】(実施例5)実施例2とまったく同様の方
法で、TFT基板のみ画素の中央にディスクリネーショ
ンを遮光する幅12μm の遮光膜が設けられている他は
通常と同じTFT基板に変え、実験を行った。その結
果、良好な分割配向が実現され、ディスクリネーション
ラインが遮光膜からはみ出ることはなかった。
(Embodiment 5) In the same manner as in Embodiment 2, the TFT substrate is changed to the usual one except that a light-shielding film having a width of 12 μm for shielding the disclination is provided in the center of the pixel only in the TFT substrate. , Conducted an experiment. As a result, good split orientation was realized, and the disclination line did not protrude from the light shielding film.

【0026】(実施例6)実施例2とまったく同様の方
法で、対向側のITO基板の切り込みの形状のみ、長方
形から、幅6μm で境目のないストライプに変え、実験
を行った。その結果、良好な分割配向が実現され、ディ
スクリネーションラインの幅は6μm 以内におさまって
おり、遮光膜は10μm 幅もあれば十分で、開口率の低
下は許容できる範囲内であった。
(Embodiment 6) In the same manner as in Embodiment 2, an experiment was conducted by changing only the shape of the notch of the ITO substrate on the opposite side from a rectangular shape to a stripe having a width of 6 μm and no border. As a result, good split orientation was realized, the width of the disclination line was within 6 μm, and the light-shielding film had a width of 10 μm, and the decrease in aperture ratio was within an allowable range.

【0027】(実施例7)実施例1とまったく同様の方
法で、ラビングの方向のみ図4にあるように変化させ、
実験を行った。このとき、図4の7の方向がTFT基板
の1回目のラビング、8の方向が2回目のラビングとな
るようにした。ここで、図1に示すようなダイレクタの
配置は、画素中央ではなく、画素の端で生じるので、こ
の部分の対向基板のITOに実施例1と同様に切り込み
をいれた。その結果、良好な分割配向が実現され、ディ
スクリネーションラインがきれいに固定され画素内には
み出したり、他の画素のディスクリネーションラインと
つながって焼き付けが起こるといった現象は見られなか
った。
(Embodiment 7) In the same manner as in Embodiment 1, only the rubbing direction is changed as shown in FIG.
An experiment was conducted. At this time, the direction 7 in FIG. 4 is the first rubbing of the TFT substrate, and the direction 8 is the second rubbing. Here, since the director arrangement as shown in FIG. 1 occurs not at the center of the pixel but at the end of the pixel, the ITO of the counter substrate in this portion was cut as in the first embodiment. As a result, good divisional orientation was realized, and the phenomenon that the disclination line was properly fixed and protruded into the pixel, and that the disclination line of another pixel was connected to cause the burn-in did not occur.

【0028】(比較例4)実施例7とまったく同様にし
て、ITO基板に切り込みをいれることなしに、セルを
作成し、評価したところ、画素によってはディスクリネ
ーションラインが、画素内にはみだす、他の画素のディ
スクリネーションラインとつながって、焼き付きとして
観測されるなどの現象がみられた。
Comparative Example 4 A cell was prepared and evaluated in exactly the same manner as in Example 7 without making a cut in the ITO substrate. As a result, depending on the pixel, a disclination line protruded into the pixel. There was a phenomenon that it was observed as burn-in due to being connected to the disclination line of other pixels.

【0029】[0029]

【発明の効果】このように本発明によれば、安定した分
割配向が得られ、とくに画素中央部のディスクリネーシ
ョンラインが安定し、遮光膜の幅を細くできることで、
視野角の広い液晶表示素子を開口率を低下させることな
く、高コントラストで作成できた。
As described above, according to the present invention, stable divisional alignment can be obtained, especially the disclination line in the central portion of the pixel is stable, and the width of the light shielding film can be reduced,
A liquid crystal display device having a wide viewing angle could be produced with high contrast without lowering the aperture ratio.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の構成を表す概念図である。FIG. 1 is a conceptual diagram showing a configuration of the present invention.

【図2】ラビングの方向を表す模式図である。FIG. 2 is a schematic diagram showing a rubbing direction.

【図3】ラビングの方向を表す模式図である。FIG. 3 is a schematic diagram showing a rubbing direction.

【図4】ラビングの方向を表す模式図である。FIG. 4 is a schematic diagram showing a rubbing direction.

【符号の説明】[Explanation of symbols]

1 分割配向処理されたTFT基板 2 対向側のガラス基板 3 ITO膜 4 ポリイミド配向膜 5 ITOの切り込み 6 液晶分子 7 TFT基板のラビング方向 8 TFT基板のラビング方向 9 対向側基板のラビング方向 1 TFT substrate subjected to orientation treatment 2 Glass substrate on the opposite side 3 ITO film 4 Polyimide orientation film 5 Incision of ITO 6 Liquid crystal molecules 7 Rubbing direction of TFT substrate 8 Rubbing direction of TFT substrate 9 Rubbing direction of opposite substrate

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】1画素を構成する1対の電極の少なくとも
一方の電極に、2つ以上の部分に分割するため異なった
配向処理を施し、分割された各部で配向状態の異なる液
晶区分を有する液晶表示素子において、電圧を印加した
場合に液晶のダイレクタが立ち上がる方向にある電極
に、液晶のダイレクタが互いに離れる方向を向いて立ち
上がる部分の分割処理の境界の方向と一致した、電極の
無い部分を有することを特徴とする液晶表示素子。
1. At least one electrode of a pair of electrodes constituting one pixel is subjected to different alignment treatments in order to divide it into two or more parts, and each divided part has a liquid crystal section having a different alignment state. In the liquid crystal display element, a part without an electrode, which coincides with the boundary direction of the division process of the part where the director of the liquid crystal rises in the direction away from each other, is placed on the electrode where the director of the liquid crystal rises when a voltage is applied. A liquid crystal display device having.
【請求項2】電極の無い部分がストライプまたは長方形
であることを特徴とする請求項1記載の液晶表示素子。
2. The liquid crystal display element according to claim 1, wherein the portion having no electrode is a stripe or a rectangle.
【請求項3】1対の電極基板のうち少なくとも一方の基
板に、分割配向の境界に遮光膜を設けることを特徴とす
る請求項1または2記載の液晶表示素子。
3. The liquid crystal display element according to claim 1, wherein a light-shielding film is provided on the boundary of the divisional alignment on at least one of the pair of electrode substrates.
JP7009846A 1994-11-17 1995-01-25 Liquid crystal display device Expired - Lifetime JP2778500B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7009846A JP2778500B2 (en) 1995-01-25 1995-01-25 Liquid crystal display device
US08/559,828 US5710611A (en) 1994-11-17 1995-11-17 Liquid crystal display apparatus preventing image on screen from influences of disclination line
KR1019950043058A KR100228604B1 (en) 1994-11-17 1995-11-17 Liquid crystal display device to prevent the influence of the declining line on the screen image
DE19542981A DE19542981A1 (en) 1994-11-17 1995-11-17 Twisted nematic liquid crystal display device

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6630971B1 (en) 1999-04-02 2003-10-07 Lg.Philips Lcd Co., Ltd. Multi-domain liquid crystal display device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275646A (en) 1999-03-24 2000-10-06 Nec Corp Liquid crystal display device

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111820A (en) * 1989-09-26 1991-05-13 Sony Corp Liquid crystal display element
JPH03212618A (en) * 1989-12-26 1991-09-18 General Electric Co <Ge> Liquid crystal device
JPH04241321A (en) * 1991-01-16 1992-08-28 Fujitsu Ltd Liquid crystal display panel
JPH05281544A (en) * 1992-03-31 1993-10-29 Toshiba Corp Liquid crystal display element
JPH0634965A (en) * 1992-07-20 1994-02-10 Toshiba Corp Active matrix liquid crystal display device
JPH06273798A (en) * 1993-03-23 1994-09-30 Fujitsu Ltd LCD display panel
JPH06273781A (en) * 1993-03-18 1994-09-30 Toshiba Corp Liquid crystal display element
JPH06301036A (en) * 1993-04-12 1994-10-28 Sanyo Electric Co Ltd Liquid crystal display device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111820A (en) * 1989-09-26 1991-05-13 Sony Corp Liquid crystal display element
JPH03212618A (en) * 1989-12-26 1991-09-18 General Electric Co <Ge> Liquid crystal device
JPH04241321A (en) * 1991-01-16 1992-08-28 Fujitsu Ltd Liquid crystal display panel
JPH05281544A (en) * 1992-03-31 1993-10-29 Toshiba Corp Liquid crystal display element
JPH0634965A (en) * 1992-07-20 1994-02-10 Toshiba Corp Active matrix liquid crystal display device
JPH06273781A (en) * 1993-03-18 1994-09-30 Toshiba Corp Liquid crystal display element
JPH06273798A (en) * 1993-03-23 1994-09-30 Fujitsu Ltd LCD display panel
JPH06301036A (en) * 1993-04-12 1994-10-28 Sanyo Electric Co Ltd Liquid crystal display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6630971B1 (en) 1999-04-02 2003-10-07 Lg.Philips Lcd Co., Ltd. Multi-domain liquid crystal display device

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