JPH08203993A - Portable closed container gas supply system - Google Patents
Portable closed container gas supply systemInfo
- Publication number
- JPH08203993A JPH08203993A JP2865495A JP2865495A JPH08203993A JP H08203993 A JPH08203993 A JP H08203993A JP 2865495 A JP2865495 A JP 2865495A JP 2865495 A JP2865495 A JP 2865495A JP H08203993 A JPH08203993 A JP H08203993A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- closed container
- gas supply
- container
- portable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Warehouses Or Storage Devices (AREA)
Abstract
(57)【要約】
【目的】 本発明は、経済的に一定量の置換ガスを常時
流すことにより、密閉コンテナ内の半導体ウエハへの汚
染を低減することのできる可搬式密閉コンテナのガス供
給システムを提供することを目的とする。
【構成】 本発明の可搬式密閉コンテナのガス供給シス
テムは、半導体ウエハＷを収納し内部を不活性ガス雰囲
気に密閉される密閉コンテナ１０と、密閉コンテナ１０
内部に不活性ガスと供給／排気するガス供給装置５とを
備えてなるものにおいて、密閉コンテナ１０には、この
内部と外部とを連通する複数のガス通路２０、２１に互
いに反する方向に不活性ガスの流れを許容する一方向弁
３０、３１を設け、ガス供給装置には、各ガス通路２
０、２１に対応して接離可能にされたガス流路５０、５
１を形成したものである。
(57) [Summary] [PROBLEMS] The present invention provides a gas supply system for a portable closed container capable of reducing pollution to semiconductor wafers in the closed container by constantly flowing a constant amount of replacement gas economically. The purpose is to provide. A gas supply system for a portable airtight container according to the present invention includes a watertight container 10 for accommodating a semiconductor wafer W and airtightly sealed in an inert gas atmosphere;
In a container provided with an inert gas and a gas supply device 5 for supplying / exhausting inside, in the closed container 10, a plurality of gas passages 20 and 21 communicating between the inside and the outside are inert in directions opposite to each other. One-way valves 30 and 31 that allow the flow of gas are provided, and each gas passage 2 is provided in the gas supply device.
Gas flow paths 50, 5 that can be connected to and separated from each other in correspondence with 0, 21
1 is formed.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、クリーンルームに用い
られる可搬式密閉コンテナ内を不活性ガスで置換するた
めの、可搬式密閉コンテナのガス供給システムに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas supply system for a portable airtight container, which is used to replace the inside of a portable airtight container used in a clean room with an inert gas.
【０００２】[0002]
【従来の技術】例えば、半導体の製造は、内部雰囲気を
清浄化したクリーンルーム内において行われるが、クリ
ーンルーム内での工程間の搬送は、半導体ウエハへの塵
埃の付着を防ぐために当該半導体ウエハを収納したウエ
ハカセットを可搬式の密閉コンテナに収納して行う。更
に、近年、半導体ウエハの自然酸化による酸化膜の成長
を防止するために、この密閉コンテナの内部雰囲気を窒
素Ｎ2 ガス等の不活性ガスで置換するようにしている。2. Description of the Related Art For example, a semiconductor is manufactured in a clean room in which the internal atmosphere is cleaned, but the semiconductor wafer is stored in a clean room during the transfer between steps in order to prevent dust from adhering to the semiconductor wafer. The wafer cassette is stored in a portable airtight container. Furthermore, in recent years, in order to prevent the growth of an oxide film due to natural oxidation of a semiconductor wafer, the internal atmosphere of this closed container is replaced with an inert gas such as nitrogen N 2 gas.
【０００３】このように、近年では、窒素Ｎ2 ガスを充
満した密閉コンテナにウエハカセットを入れて搬送・保
管するようにしているが、密閉コンテナ内の窒素Ｎ2 ガ
スの濃度は、搬送待機中や保管中に規定値以下に低下し
てしまう場合があり、このような場合、従来は、窒素Ｎ
2 ガスの濃度が低下した密閉コンテナをクリーンルーム
内に設けたガスパージステーションへ搬送して、ここで
再パージしたのち元の場所に戻す等していたので、無駄
な搬送を行なわなくてはならず、かつ密閉コンテナの保
管が複雑になるという問題があった。As described above, in recent years, a wafer cassette is placed in a sealed container filled with nitrogen N 2 gas for transportation and storage. However, the concentration of nitrogen N 2 gas in the sealed container is in the standby state for transportation. In some cases, it may drop below the specified value during storage or storage.
(2 ) The airtight container with the reduced gas concentration was transported to the gas purge station provided in the clean room, where it was repurged and then returned to its original location.Therefore, wasteful transportation must be performed. Moreover, there is a problem that the storage of the closed container becomes complicated.
【０００４】[0004]
【発明が解決しようとする課題】この問題を解決するた
めに、本願発明の発明者は、特願平４−１２８８５０号
に記載の可搬式密閉コンテナのガス供給システムを提案
している。この可搬式密閉コンテナのガス供給システム
は、内部に空間を有するパージボックスと、このパージ
ボックスの開口内に嵌入して当該開口をボックス内側か
ら密閉している昇降台と、パージボックス内部に開口す
る給ガス管及び排ガス管を主要部とし、パージボックス
の開口を密閉状態にして錠機構付きの密閉コンテナが載
置されている。そして、密閉コンテナ内の不活性ガス
（例えば、窒素Ｎ2 ガス）の濃度が低下すると、このコ
ンテナの錠機構を解除して蓋を、昇降台側へ若干だけ変
位させて、供給ガスから窒素Ｎ2 ガスを、パージボック
スの内部空間内、及びコンテナ内に流入するとともに、
これらの内部の気体を排ガス管を通して外部へ追い出す
ことにより、コンテナ内の窒素Ｎ2 ガスを高い濃度のガ
スに置換（再パージ）した後、再び、錠機構で蓋を施錠
してコンテナ内を密閉状態にするものである。In order to solve this problem, the inventor of the present invention has proposed a gas supply system for a portable closed container described in Japanese Patent Application No. 4-128850. This gas supply system for a portable closed container has a purge box having a space inside, an elevator that fits into the opening of the purge box and seals the opening from the inside of the box, and opens inside the purge box. A gas supply pipe and an exhaust gas pipe are main parts, and a closed container with a lock mechanism is placed with the purge box opening closed. Then, when the concentration of the inert gas (for example, nitrogen N 2 gas) in the closed container decreases, the lock mechanism of this container is released, and the lid is slightly displaced to the side of the lifting table so that the nitrogen N 2 is supplied from the supply gas. 2 The gas flows into the internal space of the purge box and into the container,
By expelling these internal gases to the outside through the exhaust gas pipe, the nitrogen N 2 gas in the container is replaced with a high concentration gas (repurging), and then the lid is locked again by the locking mechanism to seal the inside of the container. It is to make it a state.
【０００５】しかしながら、従来技術の可搬式密閉コン
テナのガス供給システムでは、密閉コンテナ内を濃度の
高い窒素Ｎ2 ガスで置換した後、蓋を施錠して密閉状態
で保管しておいても、コンテナ内面、錠機構等の機構部
から吸着物（不純物）がコンテナ内に放出をはじめ水
分、酸素濃度が上昇し、半導体ウエハが汚染されるとい
う問題があった。However, in the conventional gas supply system for a portable closed container, even if the inside of the closed container is replaced with nitrogen N 2 gas having high concentration, the lid is locked and stored in a closed state, There has been a problem that adsorbed substances (impurities) are released from the inner surface and mechanical parts such as a lock mechanism into the container, the moisture and oxygen concentrations rise, and the semiconductor wafer is contaminated.
【０００６】この問題を解決するために、給ガス管から
連続的に窒素Ｎ2 ガスを、供給しつづけることも考えら
れるが、コンテナ以外のパージボックスの空間が大き
く、不要ガス濃度を下げるためには、置換用純粋窒素Ｎ
2 ガスが大量に必要となり、その不要ガスの排気も容易
に行えず窒素Ｎ2 ガスの置換に長時間かかり、また、パ
ージボックス分だけガス供給システムが大型化して不経
済なものとなる。In order to solve this problem, it is conceivable to continuously supply the nitrogen N 2 gas from the gas supply pipe, but there is a large space in the purge box other than the container so that the unnecessary gas concentration is lowered. Is pure nitrogen N for substitution
A large amount of 2 gases is required, the unnecessary gas cannot be easily exhausted, it takes a long time to replace the nitrogen N 2 gas, and the gas supply system becomes large in size for the purge box, which is uneconomical.
【０００７】本発明は、この問題を解決するためになさ
れたもので、経済的に一定量の置換ガスを常時流すこと
により、密閉コンテナ内の半導体ウエハへの汚染を低減
することのできる可搬式密閉コンテナのガス供給システ
ムを提供することを目的とする。The present invention has been made in order to solve this problem, and is a portable type capable of reducing the contamination on the semiconductor wafer in the hermetically sealed container by constantly flowing a constant amount of the replacement gas economically. It is an object to provide a gas supply system for a closed container.
【０００８】[0008]
【課題を解決するための手段】上記問題を解決するた
め、本発明の可搬式密閉コンテナのガス供給システムで
は、半導体ウエハを収納し内部を不活性ガス雰囲気に密
閉される可搬式密閉コンテナと、この可搬式密閉コンテ
ナの内部に不活性ガスを供給／排気するガス供給装置と
を備えてなる可搬式密閉コンテナのガス供給システムに
おいて、前記密閉コンテナには、この内部と外部とを連
通する複数のガス通路に互いに反する方向に前記不活性
ガスの流れを許容する一方向弁をそれぞれ設けると共
に、前記ガス供給装置には、前記各ガス通路に対応して
接離可能にされたガス流路を形成したものである。In order to solve the above problems, in a gas supply system for a portable hermetically sealed container according to the present invention, a portable hermetically sealed container for accommodating semiconductor wafers and hermetically sealed in an inert gas atmosphere, In a gas supply system for a portable closed container, which comprises a gas supply device for supplying / exhausting an inert gas to the inside of the portable closed container, the closed container is provided with a plurality of communicating internal and external parts. One-way valves that allow the flow of the inert gas in opposite directions are provided in the gas passages, and the gas supply device is provided with gas passages that can be brought into contact with and separated from the gas passages. It was done.
【０００９】[0009]
【作用】このように本発明の可搬式密閉コンテナのガス
供給システムでは、密閉コンテナの各ガス通路を、ガス
供給装置の各ガス流路にそれぞれ接続して、一方のガス
流路から一方向弁を介して不活性ガスを密閉コンテナ内
に供給し、一方向弁を介して他方のガス流路から密閉コ
ンテナ内の不要ガス（空気・水等）を外部に排気するこ
とができ、また、密閉コンテナの各ガス通路をガス供給
装置のガス流路に接続するだけで、極めて容易、且つ短
時間に不活性ガスの置換を行うことができる。As described above, in the gas supply system for the portable airtight container of the present invention, each gas passage of the airtight container is connected to each gas flow passage of the gas supply device, and the one-way valve is provided from one gas passage. Inert gas can be supplied into the closed container via the, and unnecessary gas (air, water, etc.) in the closed container can be exhausted to the outside from the other gas flow path via the one-way valve. By simply connecting each gas passage of the container to the gas flow path of the gas supply device, the inert gas can be replaced very easily and in a short time.
【００１０】また、可搬式密閉コンテナを、ガス供給装
置から取り出して搬送する場合には、各ガス通路に設け
られた一方向弁の閉弁作動により、このガス通路からコ
ンテナ内への不要ガス（空気・水等）の進入を阻止する
ことができる。Further, when the portable closed container is taken out from the gas supply device and conveyed, the one-way valve provided in each gas passage closes the unnecessary gas from this gas passage into the container. It is possible to prevent the entry of air, water, etc.).
【００１１】[0011]
【実施例】以下、本発明の一実施例である可搬式密閉コ
ンテナのガス供給システムを図面を参照して説明する。
図１は本実施例における可搬式密閉コンテナのガス供給
システムの構成を示す縦断面図、図２（ａ）及び（ｂ）
は本実施例における可搬式密閉コンテナのガス供給シス
テムの一方向弁の構成を示す要部拡大図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A gas supply system for a portable closed container according to an embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a vertical cross-sectional view showing the configuration of a gas supply system for a portable airtight container according to this embodiment, FIGS. 2 (a) and 2 (b).
FIG. 4 is an enlarged view of a main part showing a configuration of a one-way valve of a gas supply system for a portable closed container according to the present embodiment.
【００１２】図１において、１はクリーンルーム内の所
定場所に配置された可搬式密閉コンテナのガス供給シス
テムであって、ガス供給装置５と可搬式の密閉コンテナ
１０とを主要部としている。１１は密閉コンテナ（ＰＯ
Ｄ）１０の本体であって、この開口部１２にはフランジ
１３が設けられている。また、密閉コンテナ１０の開口
部１２内には、環状シール材１４を介して蓋１５が嵌合
されているとともに、この蓋１５に設けられた蓋錠機構
１６を施錠することにより密閉コンテナ１０の内部空間
Ａを密閉状態にしている。また、この蓋１５には、所定
半径を有する周方向に所定の間隔を隔てて（１８０度の
位相を持って）、密閉コンテナ１０の内部空間Ａと外部
とを連通するガス通路管２０、２１が設けられている。
各ガス通路管２０、２１は、互いに並行して蓋１５を貫
通して延びており（蓋１５の厚さを貫通して延びてい
る。）、これらの内部には、一方向弁（逆止弁）３０、
３１がそれぞれ配置されている。１６は密閉コンテナ１
０の外部に設けられた把手である。１７は半導体ウエハ
Ｗを収納したウエハカセットであって、密閉コンテナ１
０の内部空間Ａ内の蓋１５上に各ガス通路管２０、２１
を塞ぐことなく載置されている。In FIG. 1, reference numeral 1 is a gas supply system for a portable closed container arranged at a predetermined location in a clean room, and has a gas supply device 5 and a portable closed container 10 as main parts. 11 is a closed container (PO
D) 10 is a main body, and the opening 12 is provided with a flange 13. Further, a lid 15 is fitted into the opening 12 of the closed container 10 via an annular sealing material 14, and a lid locking mechanism 16 provided on the lid 15 is locked to close the closed container 10. The internal space A is sealed. In addition, the lid 15 is provided with gas passage pipes 20 and 21 that communicate the internal space A of the closed container 10 and the outside with a predetermined interval in the circumferential direction having a predetermined radius (with a phase of 180 degrees). Is provided.
Each of the gas passage pipes 20 and 21 extends through the lid 15 in parallel with each other (extends through the thickness of the lid 15) and has a one-way valve (check valve) inside thereof. Valve) 30,
31 are arranged respectively. 16 is a closed container 1
It is a handle provided outside 0. Reference numeral 17 denotes a wafer cassette containing a semiconductor wafer W, which is a closed container 1
On the lid 15 in the inner space A of 0, each gas passage pipe 20, 21
It is placed without blocking.
【００１３】ガス通路管２０には、図２（ａ）に示すよ
うに、蓋１５から端部側に向かって小径孔２２Ａ、大径
孔２２Ｂ及び小径孔２２Ｃが順々に連続する段付孔２２
が形成されており、この大径孔２２Ｂと小径孔２２Ｃと
をつなぐ傾斜面を、一方向弁３０の弁座３０Ａとして球
状弁体３０Ｂが着座している。この一方向弁３０の球状
弁体３１Ｂは、大径孔２２Ｂの段部２２ａとの間に張設
された弁ばね２３で弁座３０Ａに付勢されている。これ
により、一方向弁３０は、密閉コンテナ１０外部から内
部空間Ａ内への不活性ガス（窒素Ｎ2 ガス）の流れを許
容し、その逆を阻止するようになっている。また、ガス
通路管２１には、図２（ｂ）に示すように、蓋１５から
端部側に向かって小径孔２４Ａ、大径孔２４Ｂ及び小径
孔２４Ｃが順々に連続する段付孔２４が形成されてお
り、この大径孔２４Ｂと小径孔２４Ａとをつなぐ傾斜面
を、一方向弁３１の弁座３１Ａとして球状弁体３１Ｂが
着座している。この一方向弁３１の球状弁体３１Ｂは、
大径孔３１Ｂの段部３１ａとの間に張設された弁ばね２
５で弁座３１Ａに付勢されている。これにより、一方向
弁３１は、密閉コンテナ１０の内部空間Ａから外部への
窒素ガスＮ2 ガスの流れを許容し、その逆を阻止するよ
うになっている。As shown in FIG. 2A, the gas passage pipe 20 has a stepped hole in which a small diameter hole 22A, a large diameter hole 22B and a small diameter hole 22C are successively arranged from the lid 15 toward the end side. 22
The spherical valve element 30B is seated on the inclined surface connecting the large diameter hole 22B and the small diameter hole 22C as the valve seat 30A of the one-way valve 30. The spherical valve body 31B of the one-way valve 30 is biased to the valve seat 30A by a valve spring 23 stretched between the spherical valve body 31B and the step portion 22a of the large diameter hole 22B. As a result, the one-way valve 30 allows the flow of the inert gas (nitrogen N 2 gas) from the outside of the closed container 10 into the internal space A, and blocks the opposite. Further, in the gas passage pipe 21, as shown in FIG. 2B, a stepped hole 24 in which a small diameter hole 24A, a large diameter hole 24B and a small diameter hole 24C are successively arranged from the lid 15 toward the end side. The spherical valve body 31B is seated on the inclined surface connecting the large diameter hole 24B and the small diameter hole 24A as the valve seat 31A of the one-way valve 31. The spherical valve body 31B of the one-way valve 31 is
Valve spring 2 stretched between stepped portion 31a of large diameter hole 31B
5 is urged to the valve seat 31A. As a result, the one-way valve 31 allows the flow of the nitrogen gas N 2 gas from the internal space A of the closed container 10 to the outside and blocks the opposite.
【００１４】４０はガス供給装置５の供給台であって、
この上面４０ａには、ガス供給管２０、２１と同一半径
を有する周方向に所定の間隔を隔てて（１８０度の位相
を持って）、コネクタ管４１と４２がそれぞれ突出して
おり、この各コネクタ管４１、４２端には、環状シール
材４１Ａ、４２Ａがそれぞれ設けられている。このコネ
クタ管４２は排ガス管４３を介して、図示しない処理装
置（外部）に、コネクタ管４２は給ガス管４４及び開閉
弁４５を介して、不活性ガス（例えば、窒素Ｎ2 ガス）
を生成するガス供給源４６にそれぞれ接続されており、
コネクタ管４２と排ガス管４３とでガス排気流路５０
を、コネクタ管４１と給ガス管４４、開閉弁４５とでガ
ス供給流路５１を形成している。尚、５２は検知センサ
であって、密閉コンテナ１０がガス供給装置１の供給台
４０に確実に設置されたかを検知するものである。５３
は供給台４０に立設されたコンテナガイドである。Reference numeral 40 denotes a supply base of the gas supply device 5,
Connector pipes 41 and 42 project from the upper surface 40a at predetermined intervals in the circumferential direction having the same radius as the gas supply pipes 20 and 21 (with a phase of 180 degrees), and these connector pipes 41 and 42 respectively project. Annular seal members 41A and 42A are provided at the ends of the pipes 41 and 42, respectively. The connector pipe 42 is connected to an unillustrated processing device (outside) via an exhaust gas pipe 43, and the connector pipe 42 is connected to an inert gas (for example, nitrogen N 2 gas) via a gas supply pipe 44 and an opening / closing valve 45.
Respectively connected to a gas supply source 46 for generating
Gas exhaust flow path 50 through the connector pipe 42 and the exhaust gas pipe 43
A gas supply flow path 51 is formed by the connector pipe 41, the gas supply pipe 44, and the on-off valve 45. A detection sensor 52 detects whether the closed container 10 is securely installed on the supply base 40 of the gas supply device 1. 53
Is a container guide erected on the supply table 40.
【００１５】そして、密閉コンテナ１０の内部空間Ａ内
を窒素Ｎ2 ガスで置換するため、クリーンルーム内の作
業者又は図示しない自動搬送により、この各ガス通路管
２０、２１をコネクタ管４１、４２にそれぞれに一致さ
せてガス供給装置５の供給台４０に載置すると、ガス通
路管２０とコネクタ管４１、ガス通路管２１とコネクタ
管４２とが環状シール材４１Ａ、４２Ａを介してそれぞ
れ気密に接続される。また、検知センサ５０は、密閉コ
ンテナ１０が供給台４０に確実に載置されたか否かを検
知する。各ガス通路管２０、２１をコネクタ管４１、４
２のそれぞれに接続した後、ガス供給源４６を作動させ
るとともに、開閉弁４５を開状態にすると、このガス供
給源４６で生成された窒素Ｎ2 ガスが、開閉弁４５−給
ガス管４４を介してコネクタ管４１に供給され、この供
給され窒素Ｎ2 ガスの圧力が一方向弁３０の球状弁体３
０Ｂに作用するので、この球状弁体３０は弁ばね２３の
ばね力に抗して弁座３０Ａから離座して、一方向弁３０
が開弁する。これにより、窒素Ｎ2 ガスが一方向弁３０
を通って、ガス通路管２０を介して密閉コンテナ１０の
内部空間Ａ内に供給される。Then, in order to replace the inside space A of the closed container 10 with nitrogen N 2 gas, an operator in a clean room or automatic transfer (not shown) connects the gas passage pipes 20 and 21 to the connector pipes 41 and 42. When they are placed on the supply table 40 of the gas supply device 5 in conformity with each other, the gas passage pipe 20 and the connector pipe 41, and the gas passage pipe 21 and the connector pipe 42 are hermetically connected via the annular seal members 41A and 42A, respectively. To be done. Further, the detection sensor 50 detects whether or not the closed container 10 is securely placed on the supply table 40. Connect the gas passage pipes 20 and 21 to the connector pipes 41 and 4,
After the gas supply source 46 is operated and the on-off valve 45 is opened after connecting to each of the two, the nitrogen N 2 gas generated by the gas supply source 46 causes the on-off valve 45-the supply gas pipe 44 to flow. It is supplied to the connector tube 41 via the spherical valve body 3 of the pressure of the supplied nitrogen N 2 gas is one-way valve 30
0B, the spherical valve element 30 is separated from the valve seat 30A against the spring force of the valve spring 23, and the one-way valve 30
Opens. This allows the nitrogen N 2 gas to flow in the one-way valve 30.
Through the gas passage pipe 20 into the internal space A of the closed container 10.
【００１６】このとき、密閉コンテナ１０の内部空間Ａ
が窒素Ｎ2 ガスで充満されて、この空間Ａ内の窒素Ｎ2
ガスが所定圧力になると、一方向弁３１の球状弁体３１
Ｂを弁ばね２５のばね力に抗して弁座３１Ａから離座し
て、一方向弁３１が開弁する。これにより、コンテナ１
０の内部空間Ａの不要ガス（空気・水等）がガス通路管
２１、コネクタ管４２、一方向弁３１及び排ガス管４３
を介して、図示しない処理装置（密閉コンテナ１０の外
部）に排気される。そして、所定の時間中に、ガス通路
管２０から窒素Ｎ2 ガスを密閉コンテナ１０内に供給す
るとともに、ガス通路管２１から密閉コンテナ１０内の
不要ガス（空気・水分等）を外部に排気することによ
り、密閉コンテナ１０の内部空間Ａ内の窒素Ｎ2 ガスの
置換が行われ、不要ガス（空気・水等）の濃度を低下さ
せて半導体ウエハＷの保管に適した環境にする。At this time, the internal space A of the closed container 10
There is filled with nitrogen N 2 gas, nitrogen N 2 in the space A
When the gas reaches a predetermined pressure, the spherical valve element 31 of the one-way valve 31
B is separated from the valve seat 31A against the spring force of the valve spring 25, and the one-way valve 31 opens. This allows the container 1
The unnecessary gas (air, water, etc.) in the internal space A of 0 is the gas passage pipe 21, the connector pipe 42, the one-way valve 31, and the exhaust gas pipe 43.
The gas is exhausted to a processing device (not shown) (outside the closed container 10) via the. Then, during a predetermined time, the nitrogen N 2 gas is supplied from the gas passage pipe 20 into the closed container 10, and unnecessary gas (air, moisture, etc.) in the closed container 10 is exhausted from the gas passage pipe 21 to the outside. As a result, the nitrogen N 2 gas in the internal space A of the closed container 10 is replaced, and the concentration of unnecessary gas (air, water, etc.) is reduced, and an environment suitable for storing the semiconductor wafer W is created.
【００１７】次いで、この窒素Ｎ2 ガスの置換が完了し
て、ガス供給源４６の作動を停止するとともに、開閉弁
４５を閉弁状態にすると、一方向３０の球状弁３０Ｂが
弁ばね２３のばね力で弁座３０Ａに着座して、一方向弁
３０が閉弁するとともに、密閉コンテナ１０の内部空間
Ａ内の圧力が一定値になる（弁ばね２５のばね力を同じ
圧力）と、一方向弁３１の球状弁体３１Ｂが弁ばね２５
のばね力で弁座３１Ａに着座して、一方向弁３１が閉弁
して、密閉コンテナ１０を密閉状態にする。そして、ク
リーンルーム内の作業者又は図示しない自動搬送によ
り、密閉コンテナ１０を供給台４０から取り出して所定
の目的地に搬送する。Next, when the replacement of the nitrogen N 2 gas is completed, the operation of the gas supply source 46 is stopped, and the on-off valve 45 is closed. When the valve seat 30A is seated by the spring force and the one-way valve 30 is closed, and the pressure in the internal space A of the closed container 10 becomes a constant value (the spring force of the valve spring 25 is the same pressure), The spherical valve element 31B of the directional valve 31 is the valve spring 25.
Is seated on the valve seat 31A by the spring force and the one-way valve 31 is closed to bring the closed container 10 into a closed state. Then, an operator in the clean room or an automatic transfer (not shown) takes out the closed container 10 from the supply table 40 and transfers it to a predetermined destination.
【００１８】また、密閉コンテナ１０をガス供給装置５
に載置して保管する場合には、ガス供給源４６を作動し
つづけ、一方向弁３０、３１を開弁状態にして、この保
管中に常時、窒素Ｎ2 ガスを給ガス管４４−コネクタ管
４１−ガス通路管２０及び一方向弁３０を介して密閉コ
ンテナ１０内に供給し続けるとともに、ガス通路管２１
−一方向弁３１−コネクタ管４２及び排ガス管４３を介
して、密閉コンテナ１０内に不要ガス（空気・水分等）
を順次、密閉コンテナ１０の外部に排気して、密閉コン
テナ１０を所定の目的地に搬送するまでの間に、コンテ
ナ内面、錠機構１６等の機構部から密閉コンテナ１０内
に放出しはじめる不要ガス（水分・空気）を、順次、密
閉コンテナ１０の外部に排気して半導体ウエハＷの汚染
を防止する。Further, the closed container 10 is connected to the gas supply device 5
In the case of placing and storing the same in the storage space, the gas supply source 46 is continuously operated, the one-way valves 30 and 31 are opened, and nitrogen N 2 gas is constantly supplied during the storage. Pipe 41-Gas passage pipe 21 while continuing to supply into closed container 10 via gas passage pipe 20 and one-way valve 30.
-One-way valve 31-Unnecessary gas (air, moisture, etc.) in the closed container 10 via the connector pipe 42 and the exhaust gas pipe 43.
Are sequentially discharged to the outside of the closed container 10, and unnecessary gas begins to be released into the closed container 10 from the inner surface of the container and the mechanical parts such as the lock mechanism 16 until the closed container 10 is transported to a predetermined destination. (Moisture / air) is sequentially exhausted to the outside of the closed container 10 to prevent the semiconductor wafer W from being contaminated.
【００１９】尚、本実施例における可搬式密閉コンテナ
のガス供給システムにおいて、各ガス供給管２０、２１
内に配置された一方向弁３０、３１は、これに限定され
るものでなく、図３（ａ）及び図３（ｂ）に示すような
ものであってもよい。即ち、ガス通路管２０内には、図
３（ａ）に示すように、この大径孔部２２Ｂを一方向弁
３０の弁座となる仕切部材３０Ｃで２つの空間Ｂ、Ｃに
区画し、小径孔部２２Ａ側の空間Ｂの仕切部材３０Ｃ
に、一方向弁３０を構成するプラスチックやゴム材で形
成された傘状弁体５５を設けるとともに、この傘状弁体
５５の傘状部５５Ａで仕切部材３０Ｃとの間に形成され
た密閉空間Ｄに連通する複数の通孔５６を設けたもの
で、小径孔部２２Ｃからの窒素Ｎ2 ガスにより傘状弁体
５５の傘状部５５Ａが仕切部材３０Ｃから離座して開弁
状態にする。また、ガス通路管２１内には、図３（ｂ）
に示すように、この大径孔部２４Ｂを一方向弁３１の弁
座となる仕切部材３１Ｃで２つの空間Ｅ、Ｆに区画し、
小径孔部２４Ｃ側の空間Ｆの仕切部材３１Ｃに、一方向
弁３１を構成するプラスチックやゴム材で形成された傘
状弁体６０を設けるとともに、この傘状弁体６０の傘状
部６０Ａで仕切部材３１Ｃとの間に形成された密閉空間
Ｇに連通する複数の通孔６１を設けたもので、小径孔部
２４Ａからの窒素Ｎ2 ガスにより傘状弁体６０の傘状部
６０Ａが仕切部材３１Ｃから離座して開弁状態にする。In the gas supply system for the portable closed container according to this embodiment, the gas supply pipes 20 and 21 are provided.
The one-way valves 30 and 31 arranged inside are not limited to this, and may be those as shown in FIGS. 3 (a) and 3 (b). That is, in the gas passage pipe 20, as shown in FIG. 3A, the large diameter hole portion 22B is divided into two spaces B and C by a partition member 30C which serves as a valve seat of the one-way valve 30, Partition member 30C in the space B on the side of the small diameter hole 22A
Is provided with an umbrella-shaped valve body 55 formed of a plastic or rubber material that constitutes the one-way valve 30, and an enclosed space formed between the umbrella-shaped portion 55A of the umbrella-shaped valve body 55 and the partition member 30C. A plurality of through holes 56 communicating with D are provided, and the umbrella-like portion 55A of the umbrella-like valve body 55 is separated from the partition member 30C by the nitrogen N 2 gas from the small diameter hole portion 22C to open the valve. . In addition, in the gas passage pipe 21, FIG.
As shown in, the large-diameter hole portion 24B is divided into two spaces E and F by a partition member 31C that serves as a valve seat of the one-way valve 31,
The partition member 31C in the space F on the side of the small-diameter hole portion 24C is provided with the umbrella-shaped valve body 60 formed of a plastic or rubber material forming the one-way valve 31, and the umbrella-shaped portion 60A of the umbrella-shaped valve body 60 is used. A plurality of through holes 61 communicating with the closed space G formed between the partition member 31C is provided, and the umbrella-shaped portion 60A of the umbrella-shaped valve body 60 is partitioned by the nitrogen N 2 gas from the small diameter hole portion 24A. The valve is opened by separating from the member 31C.
【００２０】また、本実施例における可搬式密閉コンテ
ナのガス供給システムにおいて、各ガス通路管２０、２
１を各コネクタ管４１、４２上に載置することにより、
環状シール材４１Ａ、４２Ａを介して各ガス通路管２
０、２１と各コネクタ管４１、４２を気密に接続するよ
うにしているが、これに限定されるものでなく、図４に
示すように、各コネクタ管４１、４２の端面に開口する
凹所６５を形成して、この凹所６５の内周面６５ａに環
状シール材６６を配置するとともに、各ガス通路管２
０、２１の先端部に凹所６５内に嵌合可能な小径部２０
Ａ、２１Ａを形成して、この小径部２０Ａ、２１Ａを各
コネクタ管４１、４２の凹所６５内にそれぞれ嵌合する
ことにより、環状シール材６６を介して各ガス通路管２
０、２１と各コネクタ管４１、４２をと気密にして接続
するようにしたものであってもよい。Further, in the gas supply system for the portable closed container according to the present embodiment, each gas passage pipe 20, 2 is provided.
By placing 1 on each connector pipe 41, 42,
Each gas passage pipe 2 through the annular seal members 41A and 42A
Although 0 and 21 are connected to the connector pipes 41 and 42 in an airtight manner, the present invention is not limited to this, and as shown in FIG. 4, a recess opening at the end face of each connector pipe 41 and 42. 65 is formed, the annular seal material 66 is arranged on the inner peripheral surface 65a of the recess 65, and each gas passage pipe 2
Small diameter part 20 that can be fitted into the recess 65 at the tip of 0, 21
A and 21A are formed, and the small diameter portions 20A and 21A are fitted into the recesses 65 of the connector pipes 41 and 42, respectively.
It is also possible to connect the connectors 0, 21 and the connector tubes 41, 42 in an airtight manner.
【００２１】更に、密閉コンテナ１０及びガス供給装置
５に設けられた、ガス通路管２０、２１及びコネクタ管
４１、４２の配管数は、これに限定されるものでない。Further, the number of the gas passage pipes 20 and 21 and the connector pipes 41 and 42 provided in the closed container 10 and the gas supply device 5 is not limited to this.
【００２２】[0022]
【発明の効果】このように本発明の可搬式密閉コンテナ
のガス供給システムによれば、密閉コンテナの各ガス通
路を、ガス供給装置の各ガス流路にそれぞれ接続して、
一方のガス流路から一方向弁を介して不活性ガスを密閉
コンテナ内に供給し、一方向弁を介して他方のガス流路
から密閉コンテナ内の不要ガス（空気・水等）を外部に
排気することができるので、密閉コンテナ内の不要ガス
濃度を下げるために必要な不活性ガスが少量で、且つそ
の不要ガスの排気も容易に行うことができ、また、常
時、不活性ガスを密閉コンテナ内に供給する際において
も経済的に半導体ウエハへの汚染を低減することができ
るとともに、密閉コンテナの各ガス通路をガス供給装置
のガス流路に接続するだけで、極めて容易、且つ短時間
に不活性ガスの置換を行うことができる。As described above, according to the gas supply system for a portable airtight container of the present invention, each gas passage of the airtight container is connected to each gas flow path of the gas supply device,
Inert gas is supplied from one gas flow path into the closed container via the one-way valve, and unnecessary gas (air, water, etc.) in the closed container is sent to the outside from the other gas flow path via the one-way valve. Since it can be exhausted, the amount of inert gas required to reduce the concentration of unnecessary gas in the closed container is small, and the unnecessary gas can be easily exhausted, and the inert gas is constantly sealed. It is possible to economically reduce contamination to the semiconductor wafer even when supplying it into the container, and it is extremely easy and short time by connecting each gas passage of the closed container to the gas passage of the gas supply device. The inert gas can be replaced.
【００２３】また、可搬式密閉コンテナを、ガス供給装
置から取り出して搬送する場合には、各ガス通路に設け
られた一方向弁の閉弁作動により、このガス通路からコ
ンテナ内への不要ガス（空気・水等）の進入を阻止する
ことができるので、密閉コンテナ内の半導体ウエハが汚
染されることを防止することができる。When the portable closed container is taken out from the gas supply device and conveyed, the one-way valve provided in each gas passage is closed so that unnecessary gas from this gas passage into the container ( Since it is possible to prevent the entry of air, water, etc., it is possible to prevent the semiconductor wafer in the closed container from being contaminated.
【図１】本発明の一実施例における可搬式密閉コンテナ
のガス供給システムの構成を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing the configuration of a gas supply system for a portable closed container according to an embodiment of the present invention.
【図２】（ａ）及び（ｂ）は本発明の 実施例における
可搬式密閉コンテナのガス供給システムの一方向弁の構
成を示す要部拡大図である。2 (a) and 2 (b) are enlarged views of a main part showing a configuration of a one-way valve of a gas supply system for a portable closed container according to an embodiment of the present invention.
【図３】（ａ）及び（ｂ）は本発明の実施例における可
搬式密閉コンテナのガス供給システムの一方向弁の変形
例の構成を示す要部拡大図である。3 (a) and 3 (b) are enlarged views of a main part showing the configuration of a modification of the one-way valve of the gas supply system for the portable closed container according to the embodiment of the present invention.
【図４】本発明の実施例における可搬式密閉コンテナの
ガス供給システムのガス通路管とコネクタ管との接続構
造の変形例を示す要部拡大図である。FIG. 4 is an enlarged view of an essential part showing a modified example of the connection structure between the gas passage pipe and the connector pipe of the gas supply system for the portable closed container according to the embodiment of the present invention.
【符号の説明】 ５ ガス供給装置 １０ 可搬式密閉コンテナ ２０、２１ ガス通路管 ３０、３１ 一方向弁 ５０、５１ ガス流路[Explanation of reference numerals] 5 gas supply device 10 portable sealed container 20, 21 gas passage pipe 30, 31 one-way valve 50, 51 gas passage
フロントページの続き (72)発明者 森田 日也 三重県伊勢市竹ヶ鼻町100番地 神鋼電機 株式会社伊勢製作所内Front page continuation (72) Inventor, Hiya Morita, 100, Takegahana Town, Ise City, Mie Prefecture Shinko Electric Co., Ltd. Ise Works
Claims (1)
雰囲気に密閉される可搬式密閉コンテナと、この可搬式
密閉コンテナの内部に不活性ガスを供給／排気するガス
供給装置とを備えてなる可搬式密閉コンテナのガス供給
システムにおいて、 前記密閉コンテナには、この内部と外部とを連通する複
数のガス通路に互いに反する方向に前記不活性ガスの流
れを許容する一方向弁をそれぞれ設けると共に、前記ガ
ス供給装置には、前記各ガス通路に対応して接離可能に
されたガス流路を形成したことを特徴とする可搬式密閉
コンテナのガス供給システム。1. A portable airtight container for accommodating a semiconductor wafer, the inside of which is hermetically sealed in an inert gas atmosphere, and a gas supply device for supplying / exhausting an inert gas to the inside of this portable airtight container. In the gas supply system for a portable closed container, the closed container is provided with a one-way valve that allows the flow of the inert gas in directions opposite to each other in a plurality of gas passages that communicate the inside and the outside, A gas supply system for a portable sealed container, wherein the gas supply device is formed with a gas flow path that can be brought into contact with and separated from each gas passage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2865495A JP3617681B2 (en) | 1995-01-24 | 1995-01-24 | Gas supply system for portable sealed containers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2865495A JP3617681B2 (en) | 1995-01-24 | 1995-01-24 | Gas supply system for portable sealed containers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08203993A true JPH08203993A (en) | 1996-08-09 |
| JP3617681B2 JP3617681B2 (en) | 2005-02-09 |
Family
ID=12254501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2865495A Expired - Fee Related JP3617681B2 (en) | 1995-01-24 | 1995-01-24 | Gas supply system for portable sealed containers |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3617681B2 (en) |
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1995
- 1995-01-24 JP JP2865495A patent/JP3617681B2/en not_active Expired - Fee Related
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