JPH08212952A - レーザー照射型電子銃 - Google Patents

レーザー照射型電子銃

Info

Publication number
JPH08212952A
JPH08212952A JP7018258A JP1825895A JPH08212952A JP H08212952 A JPH08212952 A JP H08212952A JP 7018258 A JP7018258 A JP 7018258A JP 1825895 A JP1825895 A JP 1825895A JP H08212952 A JPH08212952 A JP H08212952A
Authority
JP
Japan
Prior art keywords
filament
electron gun
electron
type electron
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7018258A
Other languages
English (en)
Japanese (ja)
Inventor
Takayoshi Kimoto
高義 木本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute for Materials Science
Original Assignee
National Research Institute for Metals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Research Institute for Metals filed Critical National Research Institute for Metals
Priority to JP7018258A priority Critical patent/JPH08212952A/ja
Priority to NL1002246A priority patent/NL1002246C2/nl
Priority to DE1996104272 priority patent/DE19604272A1/de
Publication of JPH08212952A publication Critical patent/JPH08212952A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/34—Photo-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP7018258A 1995-02-06 1995-02-06 レーザー照射型電子銃 Pending JPH08212952A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP7018258A JPH08212952A (ja) 1995-02-06 1995-02-06 レーザー照射型電子銃
NL1002246A NL1002246C2 (nl) 1995-02-06 1996-02-05 Door een laser bestraald electronenkanon.
DE1996104272 DE19604272A1 (de) 1995-02-06 1996-02-06 Laserbestrahlungs-Elektronenkanone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7018258A JPH08212952A (ja) 1995-02-06 1995-02-06 レーザー照射型電子銃

Publications (1)

Publication Number Publication Date
JPH08212952A true JPH08212952A (ja) 1996-08-20

Family

ID=11966663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7018258A Pending JPH08212952A (ja) 1995-02-06 1995-02-06 レーザー照射型電子銃

Country Status (3)

Country Link
JP (1) JPH08212952A (de)
DE (1) DE19604272A1 (de)
NL (1) NL1002246C2 (de)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004273419A (ja) * 2002-09-26 2004-09-30 Leo Elektronenmikroskopie Gmbh 電子ビーム源、そのようなビーム源を用いた電子光学装置、および電子ビーム源の駆動方法
JP2006134664A (ja) * 2004-11-04 2006-05-25 National Institute For Materials Science フォトカソード型電子線源の陰極先端部への高量子効率物質の局所被覆装置
JP2007531876A (ja) * 2004-04-02 2007-11-08 カリフォルニア インスティテュート オブ テクノロジー 超高速光電子顕微鏡のための方法およびシステム
JP2011524072A (ja) * 2008-06-13 2011-08-25 カール ツァイス エヌティーエス エルエルシー イオン源、システムおよび方法
WO2012114521A1 (ja) 2011-02-25 2012-08-30 株式会社Ｐａｒａｍ 電子銃および電子ビーム装置
JP2013131505A (ja) * 2013-03-29 2013-07-04 Param Co Ltd 電子銃および電子ビーム装置
JP2015512122A (ja) * 2012-02-16 2015-04-23 サントル ナシオナル ドゥ ラ ルシェルシェサイアンティフィク（セエヌエールエス） 電子放出に関するデバイスおよび方法並びにこの電子放出系を有するデバイス
CN115410887A (zh) * 2021-12-21 2022-11-29 中国科学院物理研究所 用于电子枪的激光引入装置及包括其的超快扫描电镜

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10113064B4 (de) * 2001-03-15 2004-05-19 Lzh Laserzentrum Hannover E.V. Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung
DE10255767A1 (de) * 2002-11-28 2004-06-17 Von Ardenne Anlagentechnik Gmbh Verfahren zum Erzeugen eines Elektronenstrahls und Elektronenstrahlerzeuger
US7557359B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7557360B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7557361B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7554096B2 (en) 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US7557358B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7554097B2 (en) 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
DE102013108603B4 (de) * 2013-08-08 2015-05-13 Von Ardenne Gmbh Strahlungsquelle, Vorrichtung und Verfahren zur schnellen Wärmebehandlung von Beschichtungen
CN104766776B (zh) * 2014-01-07 2016-09-28 中国科学院物理研究所 多功能超快透射电子显微镜电子枪
EP3561850A1 (de) * 2018-04-27 2019-10-30 Friedrich-Alexander-Universität Erlangen-Nürnberg Elektronenemittierende vorrichtung und verfahren zur emission von elektronen

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4961595A (de) * 1972-10-11 1974-06-14
JPH06333525A (ja) * 1993-05-21 1994-12-02 Beam Tec:Kk 荷電粒子線照射装置
JPH0714503A (ja) * 1993-06-25 1995-01-17 Laser Gijutsu Sogo Kenkyusho レーザー熱陰極構造体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557656B2 (de) * 1972-07-17 1980-02-27
NL7605820A (nl) * 1976-05-31 1977-12-02 Philips Nv Elektronenstraalbuis met veldemissieelektronen- bron, veldemissieelektronenbron voor een der- gelijke elektronenstraalbuis en werkwijze voor de vervaardiging van een dergelijke veldemis- sieelektronenbron.
KR970005769B1 (ko) * 1992-08-27 1997-04-19 가부시끼가이샤 도시바 자계 계침형 전자총

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4961595A (de) * 1972-10-11 1974-06-14
JPH06333525A (ja) * 1993-05-21 1994-12-02 Beam Tec:Kk 荷電粒子線照射装置
JPH0714503A (ja) * 1993-06-25 1995-01-17 Laser Gijutsu Sogo Kenkyusho レーザー熱陰極構造体

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004273419A (ja) * 2002-09-26 2004-09-30 Leo Elektronenmikroskopie Gmbh 電子ビーム源、そのようなビーム源を用いた電子光学装置、および電子ビーム源の駆動方法
JP2007531876A (ja) * 2004-04-02 2007-11-08 カリフォルニア インスティテュート オブ テクノロジー 超高速光電子顕微鏡のための方法およびシステム
EP1735811A4 (de) * 2004-04-02 2009-08-19 California Inst Of Techn Verfahren und system für ein ultraschnelles fotoelektronen-mikroskop
US7915583B2 (en) 2004-04-02 2011-03-29 California Institute Of Technology Method and system for ultrafast photoelectron microscope
JP2006134664A (ja) * 2004-11-04 2006-05-25 National Institute For Materials Science フォトカソード型電子線源の陰極先端部への高量子効率物質の局所被覆装置
US9029765B2 (en) 2008-06-13 2015-05-12 Carl Zeiss Microscopy, Llc Ion sources, systems and methods
JP2011524072A (ja) * 2008-06-13 2011-08-25 カール ツァイス エヌティーエス エルエルシー イオン源、システムおよび方法
WO2012114521A1 (ja) 2011-02-25 2012-08-30 株式会社Ｐａｒａｍ 電子銃および電子ビーム装置
US9070527B2 (en) 2011-02-25 2015-06-30 Param Corporation Electron gun and electron beam device
JP2015512122A (ja) * 2012-02-16 2015-04-23 サントル ナシオナル ドゥ ラ ルシェルシェサイアンティフィク（セエヌエールエス） 電子放出に関するデバイスおよび方法並びにこの電子放出系を有するデバイス
JP2013131505A (ja) * 2013-03-29 2013-07-04 Param Co Ltd 電子銃および電子ビーム装置
CN115410887A (zh) * 2021-12-21 2022-11-29 中国科学院物理研究所 用于电子枪的激光引入装置及包括其的超快扫描电镜
CN115410887B (zh) * 2021-12-21 2026-04-07 中国科学院物理研究所 用于电子枪的激光引入装置及包括其的超快扫描电镜

Also Published As

Publication number Publication date
NL1002246C2 (nl) 1998-07-13
DE19604272A1 (de) 1996-08-08
NL1002246A1 (nl) 1996-08-06

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