JPH08241832A - Method for manufacturing electrode foil for aluminum electrolytic capacitors - Google Patents

Method for manufacturing electrode foil for aluminum electrolytic capacitors

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Publication number
JPH08241832A
JPH08241832A JP7042891A JP4289195A JPH08241832A JP H08241832 A JPH08241832 A JP H08241832A JP 7042891 A JP7042891 A JP 7042891A JP 4289195 A JP4289195 A JP 4289195A JP H08241832 A JPH08241832 A JP H08241832A
Authority
JP
Japan
Prior art keywords
etching
foil
aluminum electrolytic
acid
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7042891A
Other languages
Japanese (ja)
Inventor
Yoshihiro Watanabe
善博 渡辺
Koichi Kojima
浩一 小島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7042891A priority Critical patent/JPH08241832A/en
Publication of JPH08241832A publication Critical patent/JPH08241832A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To provide a method of manufacturing an electrode foil for an aluminum electrolytic capacitor which is capable of increasing the capacitance and tanδ, and enhancing the leakage current characteristic. CONSTITUTION: An etched foil subjected to an electrochemical etching treatment carried out in an acidic solution is dechlorinated, dipped into a water solution of pH8 to 10, then thermally treated, and then subjected to a chemical conversion treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は低圧用のアルミ電解コン
デンサ用電極箔の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor for low voltage.

【0002】[0002]

【従来の技術】近年、セットの小型化、高信頼性化に伴
い、アルミ電解コンデンサに対するユーザーからのニー
ズ(小型化、コストダウン)が急速に高まっており、ア
ルミ電解コンデンサ用電極箔(以下電極箔と記す)も従
来以上に単位面積当たりの静電容量を高める必要が求め
られている。そのため、陽極用電極箔はアルミニウム箔
を電気化学的、あるいは化学的にエッチングして有効表
面積を拡大したものが使用されている。この表面積を拡
大するために種々のエッチング方法が研究されている
が、一般にアルミニウム箔を多数のエッチング槽内に連
続した状態で挿入し、各エッチング槽内のエッチング条
件を変えることによりアルミニウム箔の表面積を徐々に
拡大し、そして最終洗浄を行い、水和皮膜を施した後に
化成処理されて製造されている。
2. Description of the Related Art In recent years, with the miniaturization and high reliability of sets, the needs (miniaturization, cost reduction) from users for aluminum electrolytic capacitors have been rapidly increasing. It is also required that the capacitance per unit area be increased more than before. Therefore, as the electrode foil for the anode, an aluminum foil which is electrochemically or chemically etched to have an expanded effective surface area is used. Various etching methods have been studied to expand this surface area, but in general, the aluminum foil surface area is changed by inserting the aluminum foil continuously in multiple etching tanks and changing the etching conditions in each etching tank. Is gradually expanded, subjected to final washing, and subjected to a chemical conversion treatment after applying a hydrated film.

【0003】化成処理する前の水和皮膜処理は、アルミ
ニウム箔の表面に水酸化皮膜を形成して化成の際の陽極
酸化皮膜の膜質を向上させることを目的とするものであ
るが、通常はアルミニウム箔を高温の純水中に浸漬する
ことによって行われているもので、特開平2−2168
10号公報に示されているものは、高温の純水中にアミ
ンを添加したもので行われている。
The hydration film treatment before the chemical conversion treatment is intended to form a hydroxide film on the surface of the aluminum foil so as to improve the film quality of the anodized film during the chemical conversion process. It is carried out by immersing an aluminum foil in high temperature pure water.
The method disclosed in Japanese Patent No. 10 is performed by adding amine to high temperature pure water.

【0004】[0004]

【発明が解決しようとする課題】化成処理する前の水和
皮膜処理を高温(90℃以上)で処理すると、使用電気
量が節約されて静電容量も増大するとされている。しか
しながら、耐電圧が低い場合には良好な結果が得られ
ず、約150V以上の場合のみ有効であるとされてい
る。
It is said that when the hydration film treatment before chemical conversion treatment is performed at a high temperature (90 ° C. or higher), the amount of electricity used is saved and the capacitance is increased. However, when the withstand voltage is low, good results are not obtained, and it is said to be effective only when the withstand voltage is about 150 V or higher.

【0005】また、高温の純水中にアミンを添加したも
ので行われたものは、tanδ,漏れ電流が向上すると
されているが、本発明者らの実験によれば、高温の純水
中にアミンを添加したもので処理すると、エッチングさ
れたアルミニウム箔の表面が溶解されて静電容量が低下
したり、高温度で処理されるため耐電圧が150V以下
では静電容量が高くならないことがわかった。
Further, it is said that tan δ and leakage current are improved in the case where the amine is added to the high temperature pure water, but according to the experiments of the present inventors, the tan δ and the leakage current are improved. When treated with amine added to the above, the surface of the etched aluminum foil is dissolved to lower the electrostatic capacity, or the electrostatic capacity does not increase at a withstand voltage of 150 V or less because it is processed at high temperature. all right.

【0006】さらには、水和処理をした後すぐに化成す
ると、化成液で水和皮膜が一部溶解されてその効果が発
揮されていない。
Furthermore, when the chemical conversion is performed immediately after the hydration treatment, the hydration film is partially dissolved in the chemical conversion liquid and the effect is not exhibited.

【0007】本発明は上記従来の課題に鑑み、耐電圧が
150V以下の静電容量を高めることができ、かつta
nδ,漏れ電流の特性も向上させることができるアルミ
電解コンデンサ用電極箔の製造方法を提供することを目
的とするものである。
In view of the above-mentioned conventional problems, the present invention can increase the electrostatic capacity with a withstand voltage of 150 V or less, and ta
It is an object of the present invention to provide a method for manufacturing an electrode foil for an aluminum electrolytic capacitor, which can improve the characteristics of nδ and leakage current.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に本発明のアルミ電解コンデンサ用電極箔の製造方法
は、酸性溶液中で電気化学エッチング処理されたエッチ
ング箔を脱塩素処理し、かつpH8〜10の水溶液中に
浸漬し、その後、熱処理を行い、さらにその後、この箔
を化成処理するようにしたものである。
In order to achieve the above object, a method for producing an electrode foil for an aluminum electrolytic capacitor according to the present invention is a method in which an etching foil subjected to electrochemical etching in an acidic solution is dechlorinated and a pH of 8 is obtained. The foil is immersed in an aqueous solution of Nos. 10 to 10, then heat-treated, and then the foil is subjected to chemical conversion treatment.

【0009】[0009]

【作用】上記製造方法によれば、酸性溶液中で電気化学
エッチング処理されたエッチング箔を脱塩素処理し、か
つpH8〜10の水溶液中に浸漬するようにしているた
め、水和皮膜が均一に形成されるとともに、この水和皮
膜はその後の熱処理で固定されることになり、これによ
り、熱処理後の化成時における水和皮膜の溶解を防止す
ることができるため、耐電圧が150V以下の静電容量
を高めることができるとともに、tanδ,漏れ電流も
低減させることができるものである。
According to the above manufacturing method, since the etching foil which has been subjected to the electrochemical etching treatment in the acidic solution is dechlorinated and is immersed in the aqueous solution of pH 8 to 10, the hydrated film is uniformly formed. While being formed, this hydrated film is fixed by the subsequent heat treatment, which can prevent dissolution of the hydrated film during chemical conversion after the heat treatment, so that the withstand voltage is 150 V or less. It is possible to increase the capacitance and also reduce tan δ and leakage current.

【0010】[0010]

【実施例】以下、本発明の実施例を説明する。本発明に
使用されるアルミニウム箔は、特に限定するものではな
いが、純度が99.90%以上のアルミニウム箔であれ
ば構わない。
Embodiments of the present invention will be described below. The aluminum foil used in the present invention is not particularly limited, but may be any aluminum foil having a purity of 99.90% or more.

【0011】次にアルミニウム箔のエッチングである
が、本発明のアルミニウム箔は低圧用のアルミ電解コン
デンサに使用されるものであるため、交流エッチング法
により表面積の拡大処理が施される。これに使用される
エッチング液は、塩酸を主体とし、この塩酸に硫酸、硝
酸、リン酸、蓚酸のうちから選ばれた少なくとも1種を
添加した酸性溶液を用いる。塩酸の濃度や硫酸、硝酸、
リン酸、蓚酸等の添加剤の濃度は、その表面積の拡大率
や生産効率によって異なるが、塩酸5〜15wt%、添
加剤0.05〜5wt%の範囲が好ましい。エッチング
条件は、温度が20〜50℃、周波数10〜60Hz、電
流密度が0.05〜0.5A/cm2の範囲で、エッチン
グを3〜10回繰り返し行う。
Next, regarding the etching of the aluminum foil, since the aluminum foil of the present invention is used for a low voltage aluminum electrolytic capacitor, the surface area is enlarged by an AC etching method. The etching solution used for this is mainly an acid solution containing hydrochloric acid and at least one selected from sulfuric acid, nitric acid, phosphoric acid, and oxalic acid. The concentration of hydrochloric acid, sulfuric acid, nitric acid,
The concentration of additives such as phosphoric acid and oxalic acid varies depending on the expansion rate of the surface area and production efficiency, but is preferably in the range of 5 to 15 wt% hydrochloric acid and 0.05 to 5 wt% of additives. The etching conditions are a temperature of 20 to 50 ° C., a frequency of 10 to 60 Hz, and a current density of 0.05 to 0.5 A / cm 2 , and the etching is repeated 3 to 10 times.

【0012】脱塩素処理は、エッチング表面のCl-を
除去する目的で行われるもので、硫酸、硝酸の水溶液が
使われているがどちらを用いても構わない。
[0012] dechlorination treatment, Cl etching the surface - what is done in order to remove, may be used either sulfuric, although an aqueous solution of nitric acid is used.

【0013】水和処理は、化成時の酸化皮膜を形成する
上で重要な役割をするものであるため、均一な皮膜形成
が必要である。本発明は、温度が50〜65℃であるp
H8〜10の水溶液中に浸漬することを最大の特徴とす
るものである。pH8以下では充分な水和皮膜が形成さ
れないため、静電容量が高くならない。一方、pH10
以上になるとアルミニウム箔のエッチング表面が溶解し
てくるためピット破壊が起きてやはり静電容量が低下す
る。従って、最適な範囲はpH8〜10である。また、
温度を65℃以上にすると、エッチング表面の溶解が促
進されるため好ましくなく、一方、温度が50℃以下で
は、水和皮膜の形成時間が遅くなって生産性が悪くな
る。従って、最適な温度範囲は50〜65℃である。
Since the hydration treatment plays an important role in forming an oxide film during chemical conversion, it is necessary to form a uniform film. In the present invention, the temperature is 50 to 65 ° C.
The greatest feature is that it is immersed in an aqueous solution of H8 to 10. At a pH of 8 or less, a sufficient hydrated film is not formed, so the electrostatic capacity does not increase. On the other hand, pH 10
In the above case, the etched surface of the aluminum foil is dissolved, so that pit destruction occurs and the electrostatic capacity also decreases. Therefore, the optimum range is pH 8-10. Also,
When the temperature is 65 ° C. or higher, the dissolution of the etching surface is promoted, which is not preferable. On the other hand, when the temperature is 50 ° C. or lower, the hydrated film formation time is delayed and productivity is deteriorated. Therefore, the optimum temperature range is 50 to 65 ° C.

【0014】pH8〜10の水溶液を得るのは、NaO
H,NH4OHなどで調整することができるが、絶えず
pHを維持することができるものであれば、特にこれら
に限定されるものではない。
Aqueous solution having a pH of 8 to 10 is obtained from NaO.
It can be adjusted with H, NH 4 OH, etc., but is not particularly limited as long as the pH can be constantly maintained.

【0015】上記水和処理をした後は、熱により処理を
行う。この熱処理は水和皮膜をエッチング表面に固定し
て化成液で溶解するのを抑制する働きをもっているもの
で、熱処理の温度は250〜400℃で1〜3分が好ま
しい。
After the above hydration treatment, heat treatment is performed. This heat treatment has a function of fixing the hydrated film on the etching surface and suppressing dissolution in the chemical conversion liquid, and the temperature of the heat treatment is preferably 250 to 400 ° C. and 1 to 3 minutes.

【0016】上記熱処理の後に行われる化成は、特に限
定されるものではないが、アジピン酸アンモニウム、ほ
う酸、蓚酸などの水溶液中で化成するのが好ましい。
The chemical conversion performed after the above heat treatment is not particularly limited, but it is preferable to perform chemical conversion in an aqueous solution of ammonium adipate, boric acid, oxalic acid or the like.

【0017】次に本発明の具体的な実施例を比較例と共
に説明する。 (実施例1)エッチング工程として、純度99.98
%、厚さ1.00μmの高純度アルミニウム箔試料(有
効面積2×5cm)を、10wt%の塩酸溶液に硝酸を
0.5wt%添加した液温が30℃のエッチング液中に
入れ、そして電流密度0.2A/cm2、周波数25Hzで
3分間交流エッチングを行った。次に脱塩素処理として
液温が50℃である10wt%の硝酸溶液中に前記エッ
チング箔を1分間浸漬した。
Next, concrete examples of the present invention will be described together with comparative examples. (Example 1) Purity of 99.98 as an etching process
%, A high-purity aluminum foil sample (effective area 2 × 5 cm) with a thickness of 1.00 μm was placed in an etching solution having a solution temperature of 30 ° C., in which 0.5 wt% of nitric acid was added to a 10 wt% hydrochloric acid solution, and an electric current was applied. AC etching was performed at a density of 0.2 A / cm 2 and a frequency of 25 Hz for 3 minutes. Next, as the dechlorination treatment, the etching foil was immersed in a 10 wt% nitric acid solution having a liquid temperature of 50 ° C. for 1 minute.

【0018】その後、温度が55℃でpHが7,8,
9,10,11になるようにそれぞれ調整したNaOH
水溶液に前記脱塩素処理を行ったエッチング箔を2分間
浸漬して水和皮膜を施し、そしてその後、400℃で2
分間熱処理を行った。
Thereafter, the temperature was 55 ° C. and the pH was 7, 8,
NaOH adjusted to 9, 10, and 11 respectively
The dechlorinated etching foil is immersed in an aqueous solution for 2 minutes to form a hydrated film, and then at 400 ° C. for 2 minutes.
Heat treatment was performed for a minute.

【0019】化成は、温度が60℃であるアジピン酸ア
ンモニウム5wt%の水溶液中で化成電圧23Vを印加
して定電流化成を行った。その時の静電容量、tan
δ,漏れ電流を(表1)に示す。
The formation was carried out by applying a formation voltage of 23 V in an aqueous solution of ammonium adipate of 5 wt% at a temperature of 60 ° C. for constant current formation. Capacitance at that time, tan
δ and leakage current are shown in (Table 1).

【0020】比較例は、エッチングされ、かつ脱塩素処
理を行ったエッチング箔を、化成の前に0.05mol
/lのエチルアミン水溶液(液温90℃)に3分間浸漬
し、その後に化成を行った。
In the comparative example, an etched and dechlorinated etching foil was treated with 0.05 mol before chemical conversion.
The solution was immersed in an aqueous solution of ethylamine (1/1) (liquid temperature: 90 ° C.) for 3 minutes, and then chemical conversion was performed.

【0021】[0021]

【表1】 [Table 1]

【0022】(表1)からわかるように、本発明の実施
例1はpH8〜10の範囲で比較例に比べて静電容量を
高めることができるとともに、tanδ,漏れ電流も低
減させることができるものである。
As can be seen from Table 1, Example 1 of the present invention can increase the capacitance in the range of pH 8 to 10 as compared with the comparative example, and can also reduce tan δ and leakage current. It is a thing.

【0023】(実施例2)エッチングと脱塩素処理を実
施例1と同じ内容で行い、そして水和皮膜処理は、液温
が55℃でpHが8.5になるように調整したNH4O
H水溶液に前記脱塩素処理を行ったエッチング箔を2分
間浸漬して水和皮膜を施し、その後、400℃で2分間
熱処理を行った。一方、比較のために熱処理を行わない
ものも試作し、そしてこの後、温度が60℃であるアジ
ピン酸アンモニウム5wt%の水溶液中で化成電圧23
Vを印加して定電流化成を行った。その時の静電容量,
tanδ,漏れ電流を(表2)に示す。
Example 2 Etching and dechlorination were carried out in the same manner as in Example 1, and the hydrated film was treated with NH 4 O adjusted to a liquid temperature of 55 ° C. and a pH of 8.5.
The etching foil subjected to the dechlorination treatment was immersed in the H 2 aqueous solution for 2 minutes to form a hydrated film, and then heat-treated at 400 ° C. for 2 minutes. On the other hand, for comparison, a prototype without heat treatment was made, and thereafter, a formation voltage of 23% in an aqueous solution of ammonium adipate of 5 wt% at a temperature of 60 ° C.
V was applied to perform constant current formation. Capacitance at that time,
Tan δ and leakage current are shown in (Table 2).

【0024】[0024]

【表2】 [Table 2]

【0025】(表2)から明らかなように、本発明の実
施例2は熱処理を行っているため、熱処理を行わないも
のに比べて静電容量を高めることができるとともに、t
anδ,漏れ電流も低減させることができるものであ
る。
As is clear from (Table 2), in Example 2 of the present invention, since the heat treatment was performed, the capacitance can be increased as compared with the case where the heat treatment was not performed, and t
It is also possible to reduce an δ and leakage current.

【0026】(実施例3)実施例1におけるエッチング
液の添加剤である硝酸の替わりに、添加剤として硫酸を
0.5wt%、蓚酸を2wt%、リン酸を1wt%、硝
酸0.5wt%と硫酸1wt%を添加したそれぞれのエ
ッチング液を用いて実施例1に示した条件で交流エッチ
ングを行ってエッチング箔を得た。次に脱塩素処理とし
て液温が50℃である10wt%の硝酸溶液中に前記エ
ッチング箔を1分間浸漬した。
(Embodiment 3) Instead of nitric acid which is an additive for the etching solution in Embodiment 1, 0.5 wt% of sulfuric acid, 2 wt% of oxalic acid, 1 wt% of phosphoric acid and 0.5 wt% of nitric acid are added as additives. Using the respective etching solutions containing 1 wt% of sulfuric acid and sulfuric acid, AC etching was performed under the conditions shown in Example 1 to obtain an etching foil. Next, as the dechlorination treatment, the etching foil was immersed in a 10 wt% nitric acid solution having a liquid temperature of 50 ° C. for 1 minute.

【0027】その後、温度が55℃でpHが8.5にな
るように調整したKOHとNH4OH水溶液に前記脱塩
素処理を行ったエッチング箔を2分間浸漬して水和皮膜
を施し、そしてその後、400℃で2分間熱処理を行っ
た。
Thereafter, the dechlorinated etching foil was immersed for 2 minutes in a KOH and NH 4 OH aqueous solution adjusted to a temperature of 55 ° C. and a pH of 8.5 to form a hydrated film, and Then, heat treatment was performed at 400 ° C. for 2 minutes.

【0028】化成は、温度が60℃であるアジピン酸ア
ンモニウム5wt%の水溶液中で化成電圧23Vを印加
して定電流化成を行った。その時の静電容量,tan
δ,漏れ電流を(表3)に示す。
The formation was carried out by applying a formation voltage of 23 V in a 5 wt% aqueous solution of ammonium adipate at a temperature of 60 ° C. to form a constant current. Capacitance at that time, tan
δ and leakage current are shown in (Table 3).

【0029】[0029]

【表3】 [Table 3]

【0030】(表3)からわかるように、エッチング液
の添加剤として、硫酸、蓚酸、リン酸、硝酸+リン酸を
用いた場合でも、実施例1で示したエッチング液の添加
剤である硝酸と同様に、静電容量を高めることができる
とともに、tanδ,漏れ電流も低減させることができ
るものである。
As can be seen from Table 3, even when sulfuric acid, oxalic acid, phosphoric acid, or nitric acid + phosphoric acid was used as the additive for the etching solution, nitric acid, which is the additive for the etching solution shown in Example 1, was used. Similarly to the above, the capacitance can be increased, and tan δ and leakage current can be reduced.

【0031】[0031]

【発明の効果】以上のように本発明のアルミ電解コンデ
ンサ用電極箔の製造方法は、酸性溶液中で電気化学エッ
チング処理されたエッチング箔を脱塩素処理し、かつp
H8〜10の水溶液中に浸漬し、その後、熱処理を行
い、さらにその後、この箔を化成処理するようにしたも
ので、酸性溶液中で電気化学エッチング処理されたエッ
チング箔を脱塩素処理し、かつpH8〜10の水溶液中
に浸漬することにより、水和皮膜が均一に形成されると
ともに、この水和皮膜はその後の熱処理で固定されるこ
とになり、これにより、熱処理後の化成時における水和
皮膜の溶解を防止することができるため、耐電圧が15
0V以下の静電容量を高めることができるとともに、t
anδ,漏れ電流も低減させることができるものであ
る。
As described above, according to the method of manufacturing the electrode foil for an aluminum electrolytic capacitor of the present invention, the etching foil which has been subjected to the electrochemical etching treatment in an acidic solution is dechlorinated, and p
It was soaked in an aqueous solution of H8 to 10 and then subjected to heat treatment, and thereafter, this foil was subjected to chemical conversion treatment. The etching foil subjected to electrochemical etching treatment in an acidic solution was dechlorinated, and By immersing in an aqueous solution having a pH of 8 to 10, a hydrated film is formed uniformly, and this hydrated film is fixed by the subsequent heat treatment, which results in hydration during chemical conversion after heat treatment. Since the film can be prevented from melting, the withstand voltage is 15
Capacitance of 0 V or less can be increased, and t
It is also possible to reduce an δ and leakage current.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 酸性溶液中で電気化学エッチング処理さ
れたエッチング箔を脱塩素処理し、かつpH8〜10の
水溶液中に浸漬し、その後、熱処理を行い、さらにその
後、この箔を化成処理するようにしたアルミ電解コンデ
ンサ用電極箔の製造方法。
1. An etching foil subjected to electrochemical etching treatment in an acidic solution is dechlorinated and immersed in an aqueous solution having a pH of 8 to 10, followed by heat treatment, and then chemical conversion treatment of this foil. Of manufacturing method of electrode foil for aluminum electrolytic capacitor.
【請求項2】 pH8〜10の水溶液の温度が50〜6
5℃である請求項1記載のアルミ電解コンデンサ用電極
箔の製造方法。
2. The temperature of an aqueous solution having a pH of 8 to 10 is 50 to 6
It is 5 degreeC, The manufacturing method of the electrode foil for aluminum electrolytic capacitors of Claim 1.
【請求項3】 酸性溶液は、塩酸を主体とし、この塩酸
に硫酸、硝酸、リン酸、蓚酸のうちから選ばれた少なく
とも1種を添加したものを用いた請求項1記載のアルミ
電解コンデンサ用電極箔の製造方法。
3. The aluminum electrolytic capacitor according to claim 1, wherein the acidic solution is composed mainly of hydrochloric acid, and at least one selected from sulfuric acid, nitric acid, phosphoric acid and oxalic acid is added to this hydrochloric acid. Method for manufacturing electrode foil.
JP7042891A 1995-03-02 1995-03-02 Method for manufacturing electrode foil for aluminum electrolytic capacitors Pending JPH08241832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7042891A JPH08241832A (en) 1995-03-02 1995-03-02 Method for manufacturing electrode foil for aluminum electrolytic capacitors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7042891A JPH08241832A (en) 1995-03-02 1995-03-02 Method for manufacturing electrode foil for aluminum electrolytic capacitors

Publications (1)

Publication Number Publication Date
JPH08241832A true JPH08241832A (en) 1996-09-17

Family

ID=12648663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7042891A Pending JPH08241832A (en) 1995-03-02 1995-03-02 Method for manufacturing electrode foil for aluminum electrolytic capacitors

Country Status (1)

Country Link
JP (1) JPH08241832A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108395A (en) * 2004-10-06 2006-04-20 Nichicon Corp Method for producing electrode foil for aluminum electrolytic capacitor
JP2006114541A (en) * 2004-10-12 2006-04-27 Matsushita Electric Ind Co Ltd Manufacturing method of electrode foil for electrolytic capacitor and electrode foil thereof
US7990682B2 (en) 2006-02-09 2011-08-02 Sanyo Electric Co., Ltd. Anode element, method of manufacturing the same, and solid electrolytic capacitor
KR20180061670A (en) * 2016-11-30 2018-06-08 삼신디바이스 주식회사 Super capacitor and method for manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108395A (en) * 2004-10-06 2006-04-20 Nichicon Corp Method for producing electrode foil for aluminum electrolytic capacitor
JP2006114541A (en) * 2004-10-12 2006-04-27 Matsushita Electric Ind Co Ltd Manufacturing method of electrode foil for electrolytic capacitor and electrode foil thereof
US7990682B2 (en) 2006-02-09 2011-08-02 Sanyo Electric Co., Ltd. Anode element, method of manufacturing the same, and solid electrolytic capacitor
TWI451460B (en) * 2006-02-09 2014-09-01 Sanyo Electric Co Anode element, method of manufacturing the same, and solid electrolytic capacitor
KR20180061670A (en) * 2016-11-30 2018-06-08 삼신디바이스 주식회사 Super capacitor and method for manufacturing the same

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