JPH08271925A - Liquid crystal device - Google Patents
Liquid crystal deviceInfo
- Publication number
- JPH08271925A JPH08271925A JP8119006A JP11900696A JPH08271925A JP H08271925 A JPH08271925 A JP H08271925A JP 8119006 A JP8119006 A JP 8119006A JP 11900696 A JP11900696 A JP 11900696A JP H08271925 A JPH08271925 A JP H08271925A
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- connection
- liquid crystal
- conductive
- fine particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/36—Assembling printed circuits with other printed circuits
- H05K3/361—Assembling flexible printed circuits with other printed circuits
Landscapes
- Liquid Crystal (AREA)
Abstract
(57)【要約】
【課題】回路基板どうしの接続加工性を向上し、かつ接
続の信頼性を向上させる。
【解決手段】 絶縁性接着剤層8と導電性微粒子7とか
らなる異方導電性接着剤6は、硬化前シート状をしてお
り、この状態で接続用回路5と銅箔パターン2の間に挟
持される。そして、回路基板の上からヒーターツールに
より加熱および加圧が施され、これによって異方導電性
接着剤6が硬化し、導電性微粒子7が接続用回路5と銅
箔パターン2の両方に接触し、さらに接続用回路5に力
強く押し付けられ、ついには接続用回路5には導電性微
粒子の形状に対応した陥没性の穴があけられる。押しつ
けられる回路部品に対するヒーターツールの平行度は比
較的緩やかで良く、ヒーターツールそのものの表面の平
面度も比較的緩やかで良いため加工難度が低く、したが
って、加工コストを低減することが可能となる。
(57) Abstract: To improve connection workability between circuit boards and improve connection reliability. An anisotropic conductive adhesive 6 composed of an insulating adhesive layer 8 and conductive fine particles 7 is in a sheet shape before curing, and in this state, a space between a connection circuit 5 and a copper foil pattern 2 is formed. Sandwiched between. Then, the circuit board is heated and pressed by a heater tool, whereby the anisotropic conductive adhesive 6 is cured, and the conductive fine particles 7 come into contact with both the connection circuit 5 and the copper foil pattern 2. Further, the connection circuit 5 is strongly pressed, and finally the connection circuit 5 is provided with a recessed hole corresponding to the shape of the conductive fine particles. The parallelism of the heater tool with respect to the pressed circuit component may be relatively gentle, and the flatness of the surface of the heater tool itself may be relatively gentle, so that the processing difficulty is low and therefore the processing cost can be reduced.
Description
【0001】[0001]
【発明の属する技術分野】本発明はポケットテレビ、壁
掛けテレビ、プロジェクションテレビ、ラップトップパ
ソコン、ゲーム機等に用いられる液晶装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal device used for a pocket TV, a wall TV, a projection TV, a laptop personal computer, a game machine and the like.
【0002】[0002]
【従来の技術】従来より、液晶パネルへの半導体や半導
体部品の接続、あるいは光センサーへの集積回路類の接
続、さらには各種回路基板への表面実装部品の接続など
のように、接続端子が相対峙して細かいピッチでならん
でいる場合の接続方法として、半田付けや導電ペースト
による方法が広く用いられている。しかし、これらの方
法は導電性接続部材を導電回路部のみに限定して形成し
なければならないので、高密度、高精細化の進む微細回
路の接続には困難をきたしてきた。近年、回路の接続材
料について検討が加えられ、相対峙する回路間に金属粒
子やプラスチック粒子に金属メッキを施した導電性微粒
子と接着剤成分を含む異方導電性の接着部材層を設け、
加圧、加熱加圧あるいは加圧光硬化手段を用いることに
よって、回路間を電気的に接続すると同時に隣接回路間
に絶縁性を付与しながら、相対峙する回路を接着固定す
るという方法が提案されている。2. Description of the Related Art Conventionally, connection terminals such as connection of semiconductors and semiconductor components to liquid crystal panels, connection of integrated circuits to photosensors, connection of surface mount components to various circuit boards, etc. As a connection method in the case where they are lined up relatively at a fine pitch, a method using soldering or conductive paste is widely used. However, in these methods, since the conductive connecting member must be formed only in the conductive circuit portion, it has been difficult to connect a fine circuit with high density and high definition. In recent years, the connection material of the circuit has been studied, and an anisotropic conductive adhesive member layer containing conductive fine particles and adhesive components obtained by metal plating metal particles or plastic particles between the opposing circuits is provided.
A method has been proposed in which pressure, heat pressure, or pressure light curing means is used to electrically connect the circuits and at the same time to provide insulation between the adjacent circuits, while adhering and fixing the circuits that face each other. ing.
【0003】この様な異方導電性接着剤を用いて液晶パ
ネルの回路と他の回路基板とを接続する方法としては、
例えば、ポリイミドテープの上に銅箔の回路パターンを
形成し、これにICを登載実装した半導体部品を液晶パ
ネルの実装端子上に接続するというものや、ICチップ
をそのままフェイスダウンして液晶パネルの接続用回路
上に接続するというものがある。As a method of connecting a circuit of a liquid crystal panel and another circuit board using such an anisotropic conductive adhesive,
For example, a circuit pattern of a copper foil is formed on a polyimide tape, and a semiconductor component having an IC mounted thereon is connected to a mounting terminal of a liquid crystal panel, or an IC chip is directly faced down so that a liquid crystal panel There is one that is connected on the connection circuit.
【0004】図6は、従来の回路基板の接続方法の一例
を示すものである。図6において、ポリイミドからなる
TAB用テープ材料21上には、接続回路たる銅箔パタ
ーン22が形成されており、この銅箔パターン22には
錫メッキが施されている。一方、液晶パネル23の基板
上には接続用回路24が形成されており、接続用回路2
4と銅箔パターン22は異方導電性接着25を介して電
気的に接続されている。FIG. 6 shows an example of a conventional circuit board connecting method. In FIG. 6, a copper foil pattern 22 as a connecting circuit is formed on a TAB tape material 21 made of polyimide, and the copper foil pattern 22 is tin-plated. On the other hand, a connection circuit 24 is formed on the substrate of the liquid crystal panel 23, and the connection circuit 2
4 and the copper foil pattern 22 are electrically connected via an anisotropic conductive adhesive 25.
【0005】[0005]
【発明が解決しようとする課題】ここで、異方導電性接
着剤25は、絶縁性接着剤層中に、プラスチック粒子に
金属メッキが施された導電性微粒子26が混在分散され
たものとなっており、硬化前はシート状である。異方導
電性接着剤25は、このようなシート状の状態で接続用
回路24と銅箔パターン22との間に挟持される。そし
て、回路基板の上からヒーターツールにより加熱および
加圧が施されることによって硬化し、導電性微粒子26
が接続用回路24と銅箔パターン22の両方に接触す
る。その結果、接続用回路24と銅箔パターン22の電
気的導通が実現する。図6より明らかなように、従来
は、プラスチック粒子に金属メッキを施した導電性微粒
子26の変形が、その弾性限界を越えない程度に加圧が
施されていた。Here, the anisotropic conductive adhesive 25 is one in which conductive particles 26 in which plastic particles are metal-plated are mixed and dispersed in an insulating adhesive layer. Before curing, it is in sheet form. The anisotropic conductive adhesive 25 is sandwiched between the connection circuit 24 and the copper foil pattern 22 in such a sheet-like state. Then, the conductive fine particles 26 are cured by being heated and pressed by the heater tool from above the circuit board.
Contacts both the connecting circuit 24 and the copper foil pattern 22. As a result, electrical connection between the connection circuit 24 and the copper foil pattern 22 is realized. As is apparent from FIG. 6, conventionally, pressure is applied to the extent that the deformation of the conductive fine particles 26 obtained by metal-plating plastic particles does not exceed its elastic limit.
【0006】一方、図6に示すような回路基板において
は接続ピッチを小さく抑えなければならない宿命にある
ため、プラスチック粒子の大きさは直径5〜10μm程
度とかなり小さな寸法にしなければならない。一般に、
金属メッキを施すプラスチック粒子にはポリスチレン系
のものが多く用いられるが、ポリスチレン系のプラスチ
ック粒子の弾性限界は極めて小さく5kgw/cm2 程度
である。よって、直径5〜10μm程度という小さな寸
法のプラスック粒子を弾性限界を越えない程度に、すな
わちプラスチック粒子が破砕あるいはクラックを起こさ
ない程度に押しつぶすには、その変形量を1〜2μm程
度に抑えなければならない。On the other hand, in the circuit board as shown in FIG. 6, the connection pitch must be kept small, and therefore the size of the plastic particles must be quite small, such as about 5 to 10 μm in diameter. In general,
Polystyrene-based plastic particles are often used for metal plating, but polystyrene-based plastic particles have an extremely small elastic limit of about 5 kgw / cm 2 . Therefore, in order to crush plastic particles having a small diameter of about 5 to 10 μm to the extent that the elastic limit is not exceeded, that is, to the extent that plastic particles do not crush or crack, the deformation amount must be suppressed to about 1 to 2 μm. I won't.
【0007】しかるに、プラスチック粒子の変形量を1
〜2μm程度に抑えるにはたいへん難度の高い技術を要
する。まず、ヒーターツールによる加熱および加圧を押
しつけるものに対してきわめて良い平行度で行なうとと
もに、ヒーターツールそのものの平面度を出さなければ
ならない。通常、おのおの1μm以下の精度に収めなけ
ればならないが、このような高い精度に収めるのはきわ
めて難しい。しかも、仮に上記ヒーターツールを常温に
おいて平面研磨して平面度を1μmの精度に収めたとし
ても、加熱した際にこの平面度が保たれているかどうか
は保証されず、通常平面度は低下しまう。[0007] However, the deformation amount of the plastic particles is 1
A very difficult technique is required to control the thickness to about 2 μm. First, the heating and pressing by the heater tool must be performed with extremely good parallelism with respect to the pressing object, and the flatness of the heater tool itself must be obtained. Normally, the accuracy must be within 1 μm or less, but it is extremely difficult to achieve such high accuracy. Moreover, even if the heater tool is flat-polished at room temperature to maintain the flatness to an accuracy of 1 μm, it is not guaranteed that the flatness is maintained when heated, and the flatness usually decreases.
【0008】さらに、プラスチック粒子を弾性限界を超
えない程度に弱く液晶パネルの接続用回路に押し付けな
ければならないが、この場合、導電性微粒子と液晶パネ
ルの接続用回路24との導通接続は単に接触によっての
み図られている事となってしまい、相対峙する接続回路
の接続信頼性がかなり低減してしまうことも考えられ
る。特に、なんらかの影響で接続用回路の表面に薄い酸
化膜が出来てしまったような場合にはなおさらである。Further, the plastic particles must be pressed against the connecting circuit of the liquid crystal panel so weakly as not to exceed the elastic limit. In this case, the conductive connection between the conductive fine particles and the connecting circuit 24 of the liquid crystal panel is simply a contact. It is possible that the connection reliability of the connection circuit that is relatively facing is considerably reduced. Especially, when a thin oxide film is formed on the surface of the connecting circuit due to some influence.
【0009】このように、プラスチック粒子を押しつぶ
す量を均一にし、かつプラスチック粒子の変形量を1〜
2μm程度に抑えるというのはかなり困難である。従っ
て、従来は、プラスチック粒子の変形量のばらつきが所
々で大きくなってしまい、場所によってはその限界応力
を越えて変形してしまうことがあった。その結果、プラ
スチック粒子は中途半端に破壊してしまい、接続回路ど
うしが点、あるいはきわめて小面積で接触している状態
となり、接続信頼性がかなり低くなってしまう。In this way, the amount of crushing the plastic particles is made uniform, and the deformation amount of the plastic particles is 1 to
It is quite difficult to suppress the thickness to about 2 μm. Therefore, conventionally, the variation in the amount of deformation of the plastic particles becomes large in places, and in some places, the limit stress is exceeded and the plastic particles are deformed. As a result, the plastic particles are broken halfway, and the connection circuits are in contact with each other at points or in an extremely small area, resulting in considerably low connection reliability.
【0010】そこで、本発明は従来のこのような欠点を
解決し、回路基板どうしの接続加工性を向上し、かつ接
続の信頼性を向上させることを目的とする。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above-mentioned conventional drawbacks, improve the workability of connection between circuit boards, and improve the reliability of connection.
【0011】[0011]
【課題を解決するための手段】本発明は、一対の基板間
に液晶が挟持され、前記基板の端部には他の回路基板と
接続される接続パターンが形成され、前記接続パターン
と前記他の回路基板とは導電性微粒子が含まれた異方性
導電接着剤を介して接続されてなる液晶装置であって、
前記接続パターンの一部には、前記導電性微粒子による
食い込み陥没部が形成されてなることを特徴とする。According to the present invention, a liquid crystal is sandwiched between a pair of substrates, and a connection pattern for connecting to another circuit board is formed at an end portion of the board. The circuit board is a liquid crystal device connected through an anisotropic conductive adhesive containing conductive fine particles,
It is characterized in that a part of the connection pattern is formed with a recessed portion which is bitten by the conductive fine particles.
【0012】[0012]
【発明の実施の形態】図1、図2は、それぞれ本発明の
一実施形態を示したものである。図1はTABテープを
実装した例、図2はICチップを直接パネルの実装端子
面に登載実装した例を要部断面図をもって示したもので
ある。さらに図3、図4、図5は図1および図2の接続
部を中心に、さらに拡大し詳細に示した断面図である。
図1〜図5に於て、1はTAB用テープ材料、2は接続
回路たる銅箔パターンであり、この銅箔パターン2には
錫メッキが施されている。3は液晶パネル、5は回路基
板上に形成された接続用回路を示す。また、図中6は接
続用回路4と銅箔パターン2の間に存在する異方導電性
接着剤であり、7は導電性微粒子、8は絶縁性接着剤層
を示す。さらに、9はICチップ、10はICチップの
接続用回路たる金バンプを示す。また11、13、14
は導電性薄膜層、12は絶縁性薄膜層を示す。絶縁性薄
膜層12は、例えば液晶パネルの回路パターンを形成す
る工程において意識的に形成することもあれば、金属薄
膜の上に例えばITO等の別の導電性薄膜を形成する際
に非意識的に形成されてしまうこともある。1 and 2 show an embodiment of the present invention. FIG. 1 shows an example in which a TAB tape is mounted, and FIG. 2 shows an example in which an IC chip is directly mounted on a mounting terminal surface of a panel by a sectional view of a main part. Further, FIGS. 3, 4, and 5 are sectional views showing the connection portion of FIGS. 1 and 2 as a center and further in detail.
1 to 5, 1 is a TAB tape material, 2 is a copper foil pattern which is a connection circuit, and the copper foil pattern 2 is tin-plated. Reference numeral 3 is a liquid crystal panel, and 5 is a connecting circuit formed on a circuit board. In the figure, 6 is an anisotropic conductive adhesive present between the connection circuit 4 and the copper foil pattern 2, 7 is conductive fine particles, and 8 is an insulating adhesive layer. Further, 9 is an IC chip, and 10 is a gold bump which is a circuit for connecting the IC chip. Also 11, 13, 14
Indicates a conductive thin film layer, and 12 indicates an insulating thin film layer. The insulating thin film layer 12 may be intentionally formed, for example, in a process of forming a circuit pattern of a liquid crystal panel, or may be unconsciously formed when another conductive thin film such as ITO is formed on a metal thin film. It may be formed in.
【0013】絶縁性接着剤層8と導電性微粒子7とから
なる異方導電性接着剤6は、硬化前シート状をしてお
り、この状態で接続用回路5と銅箔パターン2の間に挟
持される。そして、回路基板の上からヒーターツールに
より加熱および加圧が施され、これによって異方導電性
接着剤6が硬化し、導電性微粒子7が接続用回路5と銅
箔パターン2の両方に接触し、さらに接続用回路5に力
強く押し付けられ、ついには接続用回路5には導電性微
粒子の形状に対応した陥没性の穴があけられ、この様な
導電性微粒子7の接続用回路5への食い込みによっても
接続用回路5と銅箔パターン2との電気的導通が図られ
る。なお、一般に絶縁性接着剤層8は熱硬化性の接着剤
を基材としており、例えばエポキシ系の主材と硬化材を
ブレンドした材料からなる。ヒーターツールによって加
熱を行なうと、硬化材の周囲にまぶしてあるコート材が
溶けて、主材と硬化材が反応し、絶縁性接着剤8が硬化
する。The anisotropic conductive adhesive 6 composed of the insulating adhesive layer 8 and the conductive fine particles 7 is in the form of a sheet before curing, and in this state, it is placed between the connection circuit 5 and the copper foil pattern 2. It is pinched. Then, the circuit board is heated and pressed by a heater tool, whereby the anisotropic conductive adhesive 6 is cured, and the conductive fine particles 7 come into contact with both the connection circuit 5 and the copper foil pattern 2. Further, the connection circuit 5 is strongly pressed, and finally the connection circuit 5 is provided with a recessed hole corresponding to the shape of the conductive fine particles, and the conductive fine particles 7 are bitten into the connection circuit 5. Also, electrical connection between the connection circuit 5 and the copper foil pattern 2 can be achieved. In general, the insulating adhesive layer 8 uses a thermosetting adhesive as a base material and is made of, for example, a material in which an epoxy-based main material and a curing material are blended. When heating is performed by the heater tool, the coating material sprinkled around the curing material is melted, the main material reacts with the curing material, and the insulating adhesive 8 is cured.
【0014】このように、導電性微粒子7を液晶パネル
の接続用回路5に食い込ませるまで単純完全押し付け指
向で圧着するようにすれば、回路基板たるTABテープ
の上からヒーターツールを押しつけるとき、押しつけら
れる回路部品に対するヒーターツールの平行度は比較的
緩やかで良く、ヒーターツールそのものの表面の平面度
も比較的緩やかで良い。加工精度が比較的緩やかでも良
いため加工難度が低く、したがって、加工コストを低減
することが可能となる。As described above, when the conductive fine particles 7 are pressed into the connection circuit 5 of the liquid crystal panel in a simple and complete pressing direction until they are pressed, when the heater tool is pressed from above the TAB tape as the circuit board, the pressing is performed. The parallelism of the heater tool with respect to the circuit components used may be relatively gentle, and the flatness of the surface of the heater tool itself may be relatively gentle. Since the processing accuracy may be relatively gentle, the processing difficulty is low, and therefore the processing cost can be reduced.
【0015】さらに、昨今、液晶パネルの進歩はめざま
しいものがあり、とくにMIM、TFTといったアクテ
ィブマトリックスパネルの開発進度はめざましいものが
ある。STNのような単純マトリックスパネルと異な
り、アクティブマトリックスパネルは一般には配線パタ
ーンが2種類以上の多層配線となっている。例えば、M
IMパネルのMIM素子を形成した基板には、最下層に
はタンタルの薄膜、第2層にはタンタルの酸化膜である
五酸化タンタル、さらにその上にはCrやITOが形成
されいる。これらの層のうち、実装端子を構成するもの
はパネルのサイズ、めざす目的等によって若干異なる
が、図3に示すようなタンタル(導電性薄膜11)とI
TO(導電性薄膜13)の2層構造、図4に示すような
タンタル(導電性薄膜11)、五酸化タンタル(絶縁性
薄膜12)、ITO(導電性薄膜13)の3層構造、図
5に示すようなタンタル(導電性薄膜11)、五酸化タ
ンタル(絶縁性薄膜12)、Cr(導電性薄膜13)、
ITO(導電性薄膜14)の4層構造が考えられる。T
FT基板においても同様に、実装端子は複数の薄膜層で
構成されている。Furthermore, recently, there has been a remarkable progress in liquid crystal panels, and in particular, there has been a remarkable progress in the development of active matrix panels such as MIM and TFT. Unlike a simple matrix panel such as STN, an active matrix panel is generally a multilayer wiring having two or more wiring patterns. For example, M
On the substrate on which the MIM element of the IM panel is formed, a tantalum thin film is formed in the lowermost layer, tantalum pentoxide which is a tantalum oxide film is formed in the second layer, and Cr and ITO are formed thereon. Of these layers, those constituting the mounting terminals are slightly different depending on the size of the panel, the purpose for which it is aimed, etc., but the tantalum (conductive thin film 11) and I as shown in FIG.
2 layer structure of TO (conductive thin film 13), 3 layer structure of tantalum (conductive thin film 11), tantalum pentoxide (insulating thin film 12), ITO (conductive thin film 13) as shown in FIG. 4, FIG. Tantalum (conductive thin film 11), tantalum pentoxide (insulating thin film 12), Cr (conductive thin film 13),
A four-layer structure of ITO (conductive thin film 14) can be considered. T
Similarly, in the FT substrate, the mounting terminal is composed of a plurality of thin film layers.
【0016】このうち、図4に示すタンタル11、五酸
化タンタル12、ITO13の3層構造の実装端子構造
や、図5に示すタンタル11、五酸化タンタル12、C
r13、ITO14の4層構造の実装端子構造では、複
数の導電性薄膜の間に絶縁性の酸化膜が形成されている
ため、酸化膜の上下の導電性薄膜層の間のピンホールの
存在等により最表面と最下層との間の抵抗が端子によっ
て大きく異なってくる。ピンホールが多い程最表面と最
下層との間の抵抗が低くなり、ピンホールが少ない程抵
抗が高くなる。ここで、図1、図2からわかるように、
TAB用テープ1の接続用回路2やフェイスダウンにて
実装されるICチップ9の金バンプ10は、上記実装端
子の最表面(ITO13、14)に接続されるのに対
し、パネルの内部の画素部にはパネルの実装端子の最下
層(タンタル11)が接続されていることが多い。この
ような場合、外部回路や駆動ICからの信号は、実装端
子の最表面から供給されることになる。すると、接続用
回路2や金バンプ10とパネルの内部パターンとの間に
は、パネルの実装端子たる接続用回路5の最表面の導電
性薄膜と最下層の導電性薄膜との間の抵抗が付加される
ことになり、しかも、最表面の導電性薄膜と最下層の導
電性薄膜との間の抵抗が端子によって大きく違ってしま
うこととなる。しかるに、液晶パネルの画像品質は、パ
ネル接続用回路5の最表面の導電性薄膜と最下層の導電
性薄膜との間の抵抗によって大きく影響されてしまうた
め、抵抗のばらつきが大きいと液晶パネルの画像品質が
著しく低下してしまい、最もひどい場合は線欠陥になっ
てしまう。このようなばらつきは、ピンホールを少なく
することによりできるだけ抑えることが望ましいが、ス
パッタの原理、その他の薄膜形成方法からして、薄膜間
のピンホールを皆無にすることは不可能である。Of these, a mounting terminal structure having a three-layer structure of tantalum 11, tantalum pentoxide 12, and ITO 13 shown in FIG. 4 and tantalum 11, tantalum pentoxide 12, C shown in FIG.
In the four-layer structure mounting terminal structure of r13 and ITO14, since an insulating oxide film is formed between a plurality of conductive thin films, the presence of pinholes between the conductive thin film layers above and below the oxide film, etc. As a result, the resistance between the outermost surface and the lowermost layer varies greatly depending on the terminal. The more pinholes, the lower the resistance between the outermost surface and the lowermost layer, and the less pinholes, the higher the resistance. Here, as can be seen from FIG. 1 and FIG.
The connection circuit 2 of the TAB tape 1 and the gold bumps 10 of the IC chip 9 mounted face down are connected to the outermost surfaces (ITOs 13 and 14) of the mounting terminals, while the pixels inside the panel are connected. The bottom layer (tantalum 11) of the mounting terminals of the panel is often connected to the portion. In such a case, the signal from the external circuit or the drive IC is supplied from the outermost surface of the mounting terminal. Then, between the connection circuit 2 or the gold bumps 10 and the internal pattern of the panel, there is a resistance between the conductive thin film on the outermost surface and the conductive thin film on the lowermost layer of the connection circuit 5, which is a mounting terminal of the panel. In addition, the resistance between the uppermost conductive thin film and the lowermost conductive thin film will be greatly different depending on the terminal. However, the image quality of the liquid crystal panel is greatly affected by the resistance between the outermost conductive thin film and the lowermost conductive thin film of the panel connection circuit 5, so that if the resistance varies greatly, The image quality is significantly degraded, and in the worst case, it becomes a line defect. It is desirable to suppress such variations as much as possible by reducing the number of pinholes, but it is impossible to eliminate pinholes between thin films owing to the principle of sputtering and other thin film forming methods.
【0017】したがって、このピンホールを積極的に多
くして、接続用回路5の最表面の薄膜層と最下層の薄膜
層との間の抵抗を同じように低下させることが必要とな
る。本発明は、この様なピンホールに相当するものを外
から積極的に形成するものである。すなわち、異方導電
接着剤6中に存在する導電性微粒子7によって、積極的
にパネル上の実装端子たる接続用回路5の最表面層を強
く押し付け、酸化膜を突き破ることにより、接続用回路
5の最表面の薄膜層と最下層の薄膜層との間の抵抗を一
様に低減させることが可能となる。Therefore, it is necessary to positively increase the number of pinholes to similarly reduce the resistance between the outermost thin film layer and the lowermost thin film layer of the connection circuit 5. The present invention positively forms from the outside what corresponds to such a pinhole. That is, the conductive fine particles 7 present in the anisotropic conductive adhesive 6 positively strongly press the outermost surface layer of the connecting circuit 5, which is a mounting terminal on the panel, and pierce the oxide film to thereby break the connecting circuit 5. It is possible to uniformly reduce the resistance between the outermost thin film layer and the lowermost thin film layer.
【0018】この様に、導電性微粒子によって接続用回
路5の酸化膜層を突き破るようにすることにより、多数
のTABテープ1やICチップ9を接続する際、TAB
テープ1間、あるいはICチップ9間の接続抵抗のばら
つきが低減し、その結果、画像品質の低減を防ぐことが
出来る。また、液晶パネル内への画像信号の書き込みを
行いやすくすることができ、これによっても画質の向上
を図ることができる。可能である。さらに、接続用回路
5の最表面の薄膜層と最下層の薄膜層の間の抵抗を一様
に低減することにより、接続の信頼性を著しく向上させ
ることも可能となる。As described above, the conductive fine particles are used to break through the oxide film layer of the connection circuit 5, so that when connecting a large number of TAB tapes 1 and IC chips 9, TAB is connected.
Variations in connection resistance between the tapes 1 or between the IC chips 9 are reduced, and as a result, reduction in image quality can be prevented. In addition, it is possible to easily write the image signal into the liquid crystal panel, which also improves the image quality. It is possible. Furthermore, by uniformly reducing the resistance between the outermost thin film layer and the lowermost thin film layer of the connection circuit 5, it is possible to significantly improve the connection reliability.
【0019】[0019]
【発明の効果】以上説明したように、本発明は、一対の
基板間に液晶が挟持され、前記基板の端部には他の回路
基板と接続される接続パターンが形成され、前記接続端
子と前記他の回路基板とは導電性微粒子が含まれた異方
性導電接着剤を介して接続されてなる液晶装置であっ
て、前記接続パターンの一部には、前記導電性微粒子に
よる食い込み陥没部が形成されてなることにより、液晶
パネルの画像品質を向上させ、接続用回路の接続信頼性
を向上させることができる。As described above, according to the present invention, a liquid crystal is sandwiched between a pair of substrates, and a connection pattern for connecting to another circuit board is formed at an end portion of the board, and the connection terminals and A liquid crystal device, which is connected to the other circuit board via an anisotropic conductive adhesive containing conductive fine particles, wherein a part of the connection pattern is a recess depressed by the conductive fine particles. By forming the above, the image quality of the liquid crystal panel can be improved and the connection reliability of the connection circuit can be improved.
【図1】 本発明の一実施例を示す要部断面図。FIG. 1 is a sectional view of an essential part showing an embodiment of the present invention.
【図2】 本発明の一実施例を示す要部断面図。FIG. 2 is a cross-sectional view of an essential part showing an embodiment of the present invention.
【図3】 本発明の実施例における接続部の詳細断面
図。FIG. 3 is a detailed cross-sectional view of a connection portion according to the embodiment of the present invention.
【図4】 本発明の実施例における接続部の詳細断面
図。FIG. 4 is a detailed cross-sectional view of a connection portion according to the embodiment of the present invention.
【図5】 本発明の実施例における接続部の詳細断面
図。FIG. 5 is a detailed cross-sectional view of a connection portion according to the embodiment of the present invention.
【図6】 従来技術を示す要部断面図。FIG. 6 is a sectional view of a main part showing a conventional technique.
1,21 TABテープ 2,22 TABテープ上の接続用回路 3,23 液晶パネル 5,24 液晶パネル上の接続用回路 6,25 異方導電性接着剤 7,26 導電性微粒子 8 絶縁性接着剤層 9 ICチップ 10 金バンプ 11 導電性薄膜 12 絶縁性薄膜 13 導通性薄膜 14 導通性薄膜 1,21 TAB tape 2,22 Connection circuit on TAB tape 3,23 Liquid crystal panel 5,24 Connection circuit on liquid crystal panel 6,25 Anisotropic conductive adhesive 7,26 Conductive fine particles 8 Insulating adhesive Layer 9 IC chip 10 Gold bump 11 Conductive thin film 12 Insulating thin film 13 Conductive thin film 14 Conductive thin film
Claims (4)
板の端部には他の回路基板と接続される接続パターンが
形成され、前記接続パターンと前記他の回路基板とは導
電性微粒子が含まれた異方性導電接着剤を介して接続さ
れてなる液晶装置であって、前記接続パターンの一部に
は、前記導電性微粒子による食い込み陥没部が形成され
てなることを特徴とする液晶装置。1. A liquid crystal is sandwiched between a pair of substrates, a connection pattern for connecting to another circuit board is formed at an end of the substrate, and the connection pattern and the other circuit board are made of conductive fine particles. A liquid crystal device which is connected via an anisotropic conductive adhesive containing, wherein a part of the connection pattern is formed with a recess depressed by the conductive fine particles. Liquid crystal device.
の積層構造であることを特徴とする請求項1記載の液晶
装置。2. The liquid crystal device according to claim 1, wherein the connection pattern has a laminated structure of at least two layers.
縁層が形成され、前記絶縁層の上にさらに第2の導電層
が形成されてなる積層構造を有し、前記絶縁層及び前記
第2の導電層の一部には、前記導電性微粒子による食い
込み陥没部が形成されてなることを特徴とする請求項1
記載の液晶装置。3. The connection pattern has a laminated structure in which an insulating layer is formed on a first conductive layer, and a second conductive layer is further formed on the insulating layer. 2. The recessed part which is bitten by the conductive fine particles is formed in a part of the second conductive layer.
The liquid crystal device described.
絶縁層が形成され、前記絶縁層の上にさらに第2の導電
層が形成され、前記第2の導電層の上にさらに第3の導
電層が形成されてなる積層構造を有し、前記絶縁層、前
記第2の導電層、及び前記第3の導電層の一部には、前
記導電性微粒子による食い込み陥没部が形成されてなる
ことを特徴とする請求項1記載の液晶装置。4. The connection pattern has an insulating layer formed on a first conductive layer, a second conductive layer formed on the insulating layer, and a second conductive layer formed on the second conductive layer. 3 has a laminated structure in which the conductive layer is formed, and the insulating fine layer, the second conductive layer, and a part of the third conductive layer are formed with a recessed portion which is cut into by the conductive fine particles. The liquid crystal device according to claim 1, wherein
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8119006A JP2798052B2 (en) | 1996-05-14 | 1996-05-14 | Liquid crystal device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8119006A JP2798052B2 (en) | 1996-05-14 | 1996-05-14 | Liquid crystal device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08271925A true JPH08271925A (en) | 1996-10-18 |
| JP2798052B2 JP2798052B2 (en) | 1998-09-17 |
Family
ID=14750668
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8119006A Expired - Lifetime JP2798052B2 (en) | 1996-05-14 | 1996-05-14 | Liquid crystal device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2798052B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6211936B1 (en) | 1998-06-16 | 2001-04-03 | Kabushiki Kaisha Toshiba | Liquid crystal display device and method of making the same |
| WO2001026079A1 (en) * | 1999-10-06 | 2001-04-12 | Seiko Epson Corporation | Electrooptic device, method for manufacturing electrooptic device, and electronic apparatus |
-
1996
- 1996-05-14 JP JP8119006A patent/JP2798052B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6211936B1 (en) | 1998-06-16 | 2001-04-03 | Kabushiki Kaisha Toshiba | Liquid crystal display device and method of making the same |
| WO2001026079A1 (en) * | 1999-10-06 | 2001-04-12 | Seiko Epson Corporation | Electrooptic device, method for manufacturing electrooptic device, and electronic apparatus |
| US6646708B1 (en) | 1999-10-06 | 2003-11-11 | Seiko Epson Corporation | Electrooptic device, manufacturing method therefor with visual confirmation of compression bonding to terminals and electronic apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2798052B2 (en) | 1998-09-17 |
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