JPH08323629A - Method and apparatus for controlling polishing agent projection area in centrifugal polishing agent projection apparatus - Google Patents

Abstract

(57) [Abstract] [Purpose] In the method of controlling the abrasive material projection area in the device that applies centrifugal force to the abrasive material by the rotation of the impeller, and controls the abrasive material projection area, To make it possible to easily change the abrasive cleaning material projection area to a desired one when the material projection amount or projection speed is changed. [Structure] Correlation between the standard supply amount of the abrasive and cleaning material to the impeller and the center position of the projection area of the abrasive and cleaning material, and the correlation between the reference projection speed of the abrasive and cleaning material and the central position of the projection area of the abrasive and cleaning material Then, the supply amount of the polishing / cleaning material to the impeller and the projection speed of the polishing / cleaning material are specified in accordance with the form of the object to be processed, and thus the reference supply amount to the impeller of the polishing / cleaning material is determined. The center position of the abrasive cleaning material projection area is determined based on the correlation with the central position of the abrasive cleaning material projection area and the correlation between the reference projection speed of the abrasive cleaning material and the center position of the abrasive cleaning material projection area. To do so.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for controlling a polishing / cleaning material projection area in a centrifugal polishing / cleaning material projection apparatus and a controller for the polishing / cleaning material projection area.

[0002]

2. Description of the Related Art The abrasive cleaning material projected by a centrifugal abrasive cleaning material projecting device is used for various kinds of objects to be processed.
In terms of projection speed, projection area, etc., the shape of the object to be processed,
It is desirable that the projection is performed under appropriate conditions corresponding to the shape of the surface to be processed.

[0003]

However, in the conventional centrifugal abrasive cleaning material projecting device, when the product to be processed is changed, the amount of the abrasive cleaning material or the projection speed of the abrasive cleaning material corresponding to the product to be processed is changed. Then, there is a problem that the center position of the projection area of the blasting material is displaced and the blasting efficiency is deteriorated. Therefore, conventionally, when the object to be processed changes, the center position of the projection area is changed by changing the position of the abrasive cleaning material discharge port of the control gauge that determines the center position of the projection area of the polishing material. However, in order to determine the position of the abrasive cleaning agent discharge port of the control gauge, many tests must be conducted on the change in the projection area with the change in the projection amount or the projection speed of the abrasive cleaning material for the product to be processed. Moreover, after determining the position of the abrasive cleaning material outlet of the control gauge, the abrasive cleaning projection device must be disassembled to change the position of the abrasive cleaning material outlet of the control gauge, and then reassembled. However, new problems such as a very large hand gap are occurring. The present invention has been made in view of the above circumstances, and an object thereof is to obtain a desired abrasive cleaning material projection area when the amount of abrasive cleaning material or the projection speed is changed in accordance with the object to be processed. It is an object of the present invention to provide a control method of a polishing / cleaning material projection area and a control device of the polishing / cleaning material projection area in a centrifugal polishing / cleaning material projection apparatus that can be easily changed.

[0004]

In order to achieve the above object, a method of controlling a polishing / blasting material projection area in a centrifugal type polishing / blasting material projection apparatus according to the first aspect of the present invention is to apply a centrifugal force to the polishing / cleaning material by rotating an impeller. A method for controlling a polishing / cleaning material projection area in a centrifugal polishing / cleaning material projection device for projecting a polishing / cleaning material, the method comprising: a reference supply amount of the polishing / cleaning material to an impeller; The correlation with the position and the correlation between the reference projection speed of the polishing / cleaning material and the center position of the projection area of the polishing / cleaning material are obtained in advance, and then the cleaning / polishing is performed according to the shape of the object to be processed. The reference supply amount of the material to the impeller and the reference projection speed of the polishing and cleaning material are specified, and thus the correlation between the reference supply amount to the impeller of the polishing and cleaning material and the center position of the projection area of the polishing and cleaning material, and The reference projection speed of the abrasive material and the projection area of the abrasive material Based on the correlation between the heart position, characterized in that to determine the center position of the blast material projected area.

[0005]

When the supply amount of the polishing / cleaning material to the impeller and the projection speed of the polishing / cleaning material corresponding to the form of the article to be processed are specified, the thus-constructed one can be supplied to the impeller of the polishing / cleaning material obtained in advance. Based on the correlation between the standard supply amount of the and the center position of the projection area of the abrasive cleaning material, and the correlation between the reference rotational speed of the impeller and the center position of the projection area of the abrasive cleaning material, It is possible to determine the center position of the projection area of the abrasive cleaning material in the centrifugal abrasive cleaning material projection device corresponding to the projection speed.

The above-mentioned reference supply amount of the abrasive and cleaning agent and the reference rotational speed of the impeller are those generally used in the centrifugal type abrasive and abrasive material projecting device.

In order to achieve the above-mentioned object, the control unit for the polishing / blasting material projection area in the centrifugal type polishing / blasting material projection apparatus according to the second invention, as shown in FIG. A control device for a polishing / blasting material projection area in a centrifugal type polishing / polishing material projecting device for imparting
Correlation between the reference supply amount to the impeller of the polishing and cleaning material and the center position of the projection area of the polishing and cleaning material obtained in advance, and the reference rotation speed of the impeller and the center position of the projection area of the polishing and cleaning material Storage means 1 for storing data relating to correlation
A supply amount specifying mechanism 2 for specifying the supply amount of the polishing and cleaning material to the impeller, and a control gauge for operating a control gauge for changing the central position of the polishing and cleaning material projection area in the centrifugal type polishing and cleaning material projection device 3. An operating mechanism 4 and a drive mechanism 5 for rotationally driving the impeller, the drive mechanism 5 including a rotational speed varying mechanism.
By specifying the amount of the abrasive supplied to the impeller and the projection speed of the abrasive, the position of the abrasive outlet of the control gauge corresponding to the form of the article to be processed can be determined based on the data in the storage means. And a computing means 6 for computing and outputting to the control gauge actuation mechanism 4 a command signal relating to the operation rotation amount of the control gauge corresponding to the position of the abrasive cleaning material discharge port of the control gauge.

[0008]

With this construction, when the supply amount of the polishing / cleaning material to the impeller and the projection speed of the polishing / cleaning material corresponding to the form of the article to be processed are specified and input to the calculating means 1, the calculating means Reference numeral 6 sets the opening degree of the supply amount specifying mechanism 2 and the rotation speed of the drive mechanism 5 to desired values, respectively, and further, the reference supply amount of the polishing / cleaning material stored in the storage means 1 to the impeller and the polishing amount. The necessary data is read out from the data relating to the correlation with the center position of the projection area of the cleaning material, and the data relating to the correlation between the reference rotational speed of the impeller and the projection area of the abrasive cleaning material, and the control corresponding to the form of the object to be processed. The position of the abrasive cleaning material discharge port of the gauge is calculated, and a command signal relating to the operation rotation amount of the control gauge corresponding to the position of the abrasive cleaning material discharge port of the control gauge is issued to the control gauge operating mechanism 4. As a result, the control gauge actuating mechanism 4 rotates the control gauge so that the position of the abrasive cleaning material discharge port of the control gauge is desired.

[0009]

Embodiments of the present invention will be described in detail with reference to FIGS. As shown in FIG. 2, on the upper surface of the ceiling of the cabinet 21 that constitutes the polishing and sweeping chamber, the centrifugal polishing and cleaning material projection device 3, the control gauge operating mechanism 4 for operating the control gauge, and the rotation speed varying mechanism are provided. The driving mechanism 5 for rotating the impeller is installed respectively, and the discharge port of the polishing / cleaning material storage hopper 22 is provided at the polishing / cleaning material supply port of the polishing / cleaning material projection device 3 and the supply amount specifying mechanism 2 is provided. And is connected through a guide tube 23.

As shown in FIGS. 3 and 4, the supply amount specifying mechanism 2 is mounted on the discharge port of the hopper 22 through the flange 24 and extends vertically, and the lower end portion has an arcuate shape. 25, a gate 27 that is mounted on the lower portion of the inner cylinder 25 through a rotary shaft 26 so as to be able to rotate forward and backward, and controls the opening degree of the lower end opening of the inner cylinder 25, and is mounted on the flange 24. An outer cylinder 28 surrounding the inner cylinder 25 and the gate 27, a servomotor 29 mounted on the outer surface of the outer cylinder 28, and a transmission means 30 connecting the output shaft of the servomotor 29 and the rotary shaft 26. I am doing it.

Further, in the abrasive cleaning and projecting device 3, FIG.
Further, as shown in FIG. 6, an auxiliary cover 34 having a hole 33 in the center is attached to the outer surface of the right side wall of the cover body 32 surrounding the impeller 31, and the roller bearing 35 is fitted in the hole 33. is there. A short cylindrical body 36 is fitted inside the roller bearing 35, and the cylindrical body 36 has a central axis perpendicular to the outer surface of the side wall of the cover body 32 and is rotatable in a vertical plane.

The right end of the control gauge 37, which penetrates the cylindrical body 36 and is inserted into the impeller 31, is fitted and inserted into the cylindrical body 36 and the flange portion 3 thereof.
The control gauge 37 has a polishing / cleaning material discharge port 37b, and a right end of the control gauge 37 is provided with a rubber-made annular elastic member 38. The left end of 39 is in contact, and the introducing cylinder 39 is detachably clamped by the control gauge 37 and the clamping mechanism 40. Then, the holding mechanism 40 is shown in FIG.
As shown in FIG. 5, the support member 42 is attached to the auxiliary cover 34 via the holding member 41 attached to the right end of the cylindrical body 36 and extends in the left-right direction, and the holding bolt 43 is screwed to the supporting member 42. (See FIG. 5).

Further, as shown in FIG. 6, an annular filling member 44 is mounted on the left side of the rolling element 35a in the roller bearing 35, and the filling member 44 is manufactured by solidifying felt or metal fiber. It has a structure, has a certain degree of elasticity, and is supported by being pressed by a liner 45 attached to the left surface of the auxiliary cover 34. Further, the liner 45 has a recess 46 formed in the lower portion, and even if the polishing / cleaning material enters from the upper position between the liner 45 and the cylindrical body 36, the polishing / cleaning material falls from the recess 46. You can do it.

Reference numeral 47 in the figure denotes an electric cylinder as the control gauge operating mechanism 4 for rotating the cylindrical body 36,
Reference numeral 48 is a motor with a reduction gear as the drive mechanism 5 for rotating the impeller 31, and 49 is a cover liner. And
The control gauge 37 is rotated forward and backward through the cylindrical body 36 by the expansion and contraction of the electric cylinder 47.

Further, as shown in FIG. 2, a microcomputer 50 is electrically connected to the electric cylinder 47, the speed reducer-equipped motor 48, and the servomotor 29, and the microcomputer 50 obtains the previously determined values. Correlation between the discharge amount of the polishing / cleaning material from the supply amount specifying mechanism 2, which is the supply amount of the polishing / cleaning material to the impeller 31, and the center position of the projection area of the polishing / cleaning material, and the reference rotation speed of the impeller 31. The function as the storage means 1 for storing data relating to the reference rotational speed of the motor with reduction gear 48 and the center position of the projection area of the abrasive cleaning material, and the abrasive cleaning material from the supply amount specifying mechanism 2 The discharge amount (the supply amount of the polishing / cleaning material to the impeller 31) and the projection speed of the polishing / cleaning material are specified, and the computer corresponding to the form of the article to be processed is based on the data of the microcomputer 50. And a function as an arithmetic means 6 which calculates the abrasive cleaning agent outlet 37b position of the roll gauge 37 outputs a command signal for actuating said control gauge actuating mechanism 4.

With the above-described structure, the supply amount of the polishing / cleaning material to the impeller 31 (projection amount of the polishing / cleaning material) and the projection speed of the polishing / cleaning material corresponding to the form of the article to be processed are specified and calculated. When input to the means 1, the calculation means 1 performs the following calculation. That is, the servomotor 29 of the supply amount specifying mechanism 2
Is driven in the forward and reverse directions to obtain a desired opening degree of the inner cylinder 25, and a desired rotation speed of the motor 48 of the drive mechanism 5,
Further, the correlation between the reference supply amount (reference projection amount of the polishing and cleaning material) of the polishing and cleaning material and the center position of the projection area of the polishing and cleaning material, which is stored in the microcomputer 50 in advance, and the impeller 31. Required data is read out from the data relating to the correlation between the reference rotation speed of the tool (reference projection speed of the polishing and cleaning material) and the projection area of the polishing and cleaning material, and the read data and the determined projection amount and projection speed of the polishing and cleaning material And the respective values are compared with each other, and the position of the abrasive cleaning material discharge port 37b of the control gauge 37 is calculated in order to obtain the center position of the projection area of the abrasive cleaning material corresponding to the object to be processed.

For example, when the rotation amount of the control gauge 37 for obtaining the position of the abrasive cleaning material discharge port 37b is a γ angle, the γ angle is a projected flow region from a reference state to a target state for a specific projection amount of the abrasive cleaning material. The rotation angle α of the control gauge 37 for obtaining the center position of the control gauge 37 and the rotation angle β of the control gauge 37 for obtaining the center position of the projection basin in the target state from the reference state for the specific projection speed of the abrasive It can be obtained by adding. Based on the calculation result, the electric cylinder 47 is driven to rotate in the normal direction or to rotate in the reverse direction, and the abrasive cleaning material discharge port 3 of the control gauge 37
The position of 7b will be changed to the desired one.

[0018]

As is apparent from the above description, according to the present invention, the correlation between the reference supply amount of the polishing and cleaning material to the impeller and the center position of the projection area of the polishing and cleaning material, and the polishing and cleaning material The correlation between the reference projection speed and the center position of the projection area of the polishing / cleaning material is obtained in advance, and thereafter, the reference supply amount of the polishing / cleaning material to the impeller and the polishing / cleaning material are made to correspond to the form of the object to be processed. Of the reference supply speed of the polishing and cleaning material to the impeller and the center position of the projection area of the polishing and cleaning material, and the reference projection speed of the polishing and cleaning material and the polishing and cleaning. Since the center position of the abrasive cleaning material projection area is determined based on the correlation with the central position of the material projection area, when changing the projection amount or the projection speed of the abrasive cleaning material according to the processing target It is now possible to easily change the abrasive cleaning material projection area to the desired one. Excellent effects such as.

[Brief description of drawings]

FIG. 1 is a diagram corresponding to a claim of the second invention.

FIG. 2 is a schematic front view of an embodiment of the present invention.

FIG. 3 is an enlarged vertical sectional view of a portion A of FIG.

FIG. 4 is a sectional view taken along line BB of FIG.

5 is an enlarged view of portion C in FIG.

FIG. 6 is a sectional view taken along the line CC of FIG. 5;

[Explanation of symbols]

 1 Storage Means 2 Supply Amount Specification Mechanism 3 Abrasive Cleaning Material Projector 4 Control Gauge Operation Mechanism 5 Drive Mechanism 6 Computing Means

Claims (2)

[Claims] 1. A method of controlling a polishing / blasting material projection area in a centrifugal type polishing / polishing material projecting device for applying a centrifugal force to the polishing / cleaning material by rotating an impeller to project the polishing / cleaning material. Correlation between the reference supply amount to the impeller and the center position of the projection area of the polishing and cleaning material, and the correlation between the reference projection speed of the polishing and cleaning material and the center position of the projection area of the polishing and cleaning material are obtained in advance. After that, the supply amount of the polishing / cleaning material to the impeller and the projection speed of the polishing / cleaning material are specified in accordance with the form of the object to be processed, and thus the reference supply amount to the impeller of the polishing / cleaning material and the polishing speed are specified. The center position of the abrasive cleaning material projection area is determined based on the correlation with the central position of the projection area of the cleaning material and the correlation between the reference projection speed of the abrasive cleaning material and the center position of the projection area of the abrasive cleaning material. In a centrifugal abrasive cleaning material projection device, characterized in that Control method of material projection area. 2. A control unit for a polishing / blasting material projection area in a centrifugal type polishing / polishing material projection apparatus for applying a centrifugal force to the polishing / cleaning material by the rotation of an impeller to project the polishing / cleaning material. Data concerning the correlation between the reference supply amount of the cleaning material to the impeller and the center position of the projection area of the polishing material, and the correlation between the reference rotational speed of the impeller and the center position of the projection area of the polishing material A storage means 1 for storing the above, a supply amount specifying mechanism 2 for specifying the supply amount of the abrasive cleaning material to the impeller, and a control for changing the center position of the abrasive cleaning material projecting area in the centrifugal abrasive cleaning material projecting device 3. By the control gauge actuation mechanism 4 for actuating a gauge, the drive mechanism 5 for rotating the impeller equipped with the rotation speed variable mechanism, the supply amount of the polishing and cleaning material to the impeller, and the projection speed of the polishing and cleaning material, The data of the storage means Based on the controller, the position of the abrasive cleaning material discharge port of the control gauge corresponding to the form of the processed product is calculated, and a command signal related to the operating rotation amount of the control gauge corresponding to the position of the abrasive cleaning material discharge port of the control gauge is calculated. A control unit for controlling a polishing / blasting material projection area in a centrifugal type polishing / blasting material projection apparatus, comprising: a computing unit 6 for outputting to the control gauge operating mechanism 4.