JPH08335736A - Discharge electrode for excimer laser and its production - Google Patents
Discharge electrode for excimer laser and its productionInfo
- Publication number
- JPH08335736A JPH08335736A JP7164694A JP16469495A JPH08335736A JP H08335736 A JPH08335736 A JP H08335736A JP 7164694 A JP7164694 A JP 7164694A JP 16469495 A JP16469495 A JP 16469495A JP H08335736 A JPH08335736 A JP H08335736A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- discharge electrode
- carbon
- excimer laser
- diluted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 34
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000012535 impurity Substances 0.000 claims abstract description 16
- 239000002344 surface layer Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 230000005684 electric field Effects 0.000 claims description 11
- 238000010790 dilution Methods 0.000 claims 1
- 239000012895 dilution Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- -1 carbon halide Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Lasers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、エキシマレーザ装置用
の放電電極及び該放電電極の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a discharge electrode for an excimer laser device and a method for manufacturing the discharge electrode.
【０００２】[0002]
【従来の技術】一般に、放電励起エキシマレーザ装置で
は、レーザガスに含まれるＦ2 等のハロゲンガスが極め
て活性であることから、エキシマレーザ装置用の放電電
極の材質としてハロゲンガスと反応しにくい金属材料を
選んで用いている（特開平５−９０６６５号等）。ま
た、放電励起エキシマレーザ装置において高い発振効率
を実現するためには、放電電極間の均一な放電を得る必
要があり、このような均一な放電を実現するためには、
前記金属材料を均一な電界を形成する形状（以下、「均
一電界形状」という。）に精密加工する必要がある。 2. Description of the Related Art Generally, in a discharge-excited excimer laser device, a halogen gas such as F 2 contained in a laser gas is extremely active, so that a metal material which is hard to react with a halogen gas is used as a material of a discharge electrode for the excimer laser device. Is selected and used (Japanese Patent Application Laid-Open No. 5-90665, etc.). Further, in order to achieve high oscillation efficiency in the discharge excitation excimer laser device, it is necessary to obtain a uniform discharge between the discharge electrodes, and in order to realize such a uniform discharge,
It is necessary to precisely process the metal material into a shape that forms a uniform electric field (hereinafter referred to as “uniform electric field shape”).
【０００３】従来においては、均一電界形状の一つであ
るチャン型電極形状に形成した金属材料を切削加工して
放電電極を製造する技術が開示されている（レビュー・
オブ・サイエンティフィック・インスツルメント（Ｒｅ
ｖ・Ｓｃｉ・Ｉｎｓｔｒｕｍ．４４，４０５（１９７
３）参照）。また、金属材料の材質としては、ハロゲン
ガスとの反応が少ないニッケル、銅、黄銅等が用いられ
ている。Conventionally, there has been disclosed a technique of manufacturing a discharge electrode by cutting a metal material formed into a Chang-shaped electrode shape which is one of uniform electric field shapes (review /
Of Scientific Instruments (Re
v.Sci.Instrum. 44,405 (197)
See 3)). Further, as the material of the metal material, nickel, copper, brass or the like, which is less likely to react with halogen gas, is used.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、従来の
エキシマレーザ装置用の放電電極の製造方法では、切削
加工時に放電電極材質内に炭素Ｃが混入することを避け
ることは難しい。このため、従来の製造方法で製造した
エキシマレーザ装置用の放電電極を、エキシマレーザ装
置に適用すると、混入した炭素Ｃが放電による放電電極
表面の蒸散とともにエキシマレーザガス中に放出され、
活性なハロゲンガスと反応し、ＣＦ4 等のハロゲン化炭
素を発生する。エキシマレーザガス中に濃度約１００ｐ
ｐｍのＣＦ 4 が発生すると、レーザ光を吸収しレーザ出
力が４０％程度低下することが知られている。However, the conventional
In the method of manufacturing the discharge electrode for the excimer laser device, cutting
Avoid mixing carbon C into the material of the discharge electrode during processing
Difficult to do. Therefore, it was manufactured by the conventional manufacturing method.
Connect the discharge electrode for the excimer laser device to the excimer laser
When applied to a storage device, carbon C mixed in is discharged by the discharge electrode.
It is emitted into the excimer laser gas with the evaporation of the surface,
CF reacts with active halogen gasFour Halogenated charcoal
Generate prime. Concentration of about 100p in excimer laser gas
CF of pm When 4 occurs, it absorbs the laser light and emits laser light.
It is known that the force is reduced by about 40%.
【０００５】このように、従来の放電電極では、その電
極材質中に不純物として炭素Ｃが混入しているため、エ
キシマレーザ装置の運転にともなう放電によってレーザ
ガス中にＣＦ4 等のハロゲン化炭素が発生する。この結
果、ハロゲン化炭素がレーザ光を吸収することによって
レーザ出力が低下するため、エキシマレーザを長時間運
転することが不可能になるという問題があった。As described above, in the conventional discharge electrode, since carbon C is mixed as an impurity in the material of the electrode, carbon halide such as CF 4 is generated in the laser gas due to the discharge accompanying the operation of the excimer laser device. To do. As a result, since the carbon halide absorbs the laser beam, the laser output is reduced, and it is impossible to operate the excimer laser for a long time.
【０００６】本発明の目的は、エキシマレーザ装置の運
転に伴ってレーザガス中に炭素Ｃの放出が起こらずレー
ザ出力を長時間にわたって安定に維持することができる
エキシマレーザ装置用の放電電極及び該放電電極を得る
ことができる製造方法を提供することにある。An object of the present invention is to provide a discharge electrode for an excimer laser device and a discharge electrode capable of maintaining a stable laser output for a long time without emission of carbon C in the laser gas accompanying the operation of the excimer laser device. It is to provide a manufacturing method capable of obtaining an electrode.
【０００７】[0007]
【課題を解決するための手段】請求項１記載の発明に係
るエキシマレーザ装置用の放電電極は、均一な電界を形
成する形状に加工されるとともに不純物である炭素Ｃが
混入した金属製放電電極を、加熱処理しつつＯ2 ガス若
しくは希釈Ｏ2 ガスと接触させて前記炭素ＣとＯ2 ガス
若しくは希釈Ｏ2 ガスとの反応により表面層の不純物で
ある炭素Ｃを除去して得られることを特徴とするもので
ある。A discharge electrode for an excimer laser device according to a first aspect of the present invention is a metal discharge electrode that is processed into a shape that forms a uniform electric field and contains carbon C as an impurity. Is contacted with O 2 gas or diluted O 2 gas while being heat-treated to remove carbon C which is an impurity in the surface layer by the reaction between the carbon C and O 2 gas or diluted O 2 gas. It is a feature.
【０００８】請求項２記載の発明に係るエキシマレーザ
装置用の放電電極の製造方法は、均一な電界を形成する
形状に加工した金属製放電電極を、加熱手段内に配置す
る工程と、前記加熱手段内に配置する金属製放電電極を
加熱しながら（好ましくは５０℃以上３００℃以下）Ｏ
2 ガス若しくは希釈Ｏ2 ガスと接触させ、前記炭素Ｃと
Ｏ2 ガス若しくは希釈Ｏ2 ガスとの反応により表面層の
不純物である炭素Ｃを除去する工程とからなることを特
徴とするものである。According to a second aspect of the present invention, there is provided a method of manufacturing a discharge electrode for an excimer laser device, comprising the steps of disposing a metal discharge electrode processed into a shape that forms a uniform electric field in a heating means, and the heating. While heating the metal discharge electrode arranged in the means (preferably 50 ° C. or higher and 300 ° C. or lower) O
2 gas or diluted O 2 gas is contacted, and the carbon C, which is an impurity in the surface layer, is removed by the reaction of the carbon C with the O 2 gas or diluted O 2 gas. .
【０００９】[0009]
【作用】以下に本発明の作用を説明する。The function of the present invention will be described below.
【００１０】請求項１記載の発明に係るエキシマレーザ
装置用の放電電極によれば、その形状が均一な電界を形
成する形状に加工されているとともに、その表面層の不
純物である炭素Ｃが除去されているため、この放電電極
を用いたエキシマレーザ装置の運転に伴って均一な放電
を実現でき、かつ、レーザガス中に炭素Ｃの放出が起こ
らずレーザ出力を長時間にわたって安定に維持すること
ができエキシマレーザガス中の高価な希ガスの消費量を
大幅に低減できる。According to the discharge electrode for an excimer laser device according to the first aspect of the invention, the shape thereof is processed to form a uniform electric field, and carbon C which is an impurity in the surface layer is removed. Therefore, it is possible to realize a uniform discharge along with the operation of the excimer laser device using this discharge electrode, and to maintain the laser output stable for a long time without the emission of carbon C in the laser gas. As a result, the consumption of expensive rare gas in the excimer laser gas can be significantly reduced.
【００１１】請求項２記載の発明に係るエキシマレーザ
装置用の放電電極の製造方法によれば、均一な電界を形
成する形状に加工した金属製放電電極を加熱手段内に配
置してこの金属製放電電極を加熱しながら（好ましくは
５０℃以上３００℃以下）Ｏ 2 ガス若しくは希釈Ｏ2 ガ
スと接触させることによって、加工時に放電電極の表面
層に混入した不純物である炭素ＣがＯ2 ガス若しくは希
釈Ｏ2 ガスと反応し、ＣＯ2 となって電極層表面から除
去される。したがって、電極層表面に炭素Ｃが存在しな
い放電電極を製造することができる。金属製放電電極の
加熱温度を５０℃以上３００℃以下とするのは、５０℃
未満の温度では炭素ＣとＯ2 ガス若しくは希釈Ｏ2 ガス
との反応が不良となり電極層表面から不純物である炭素
Ｃを除去できず、また、３００℃を越える高温では金属
製放電電極が溶融してしまうからである。The excimer laser according to the invention of claim 2
According to the manufacturing method of the discharge electrode for the device, a uniform electric field is formed.
The metal discharge electrode processed into the desired shape is placed in the heating means.
And heat the metal discharge electrode (preferably
50 ° C to 300 ° C) O 2 gas or diluted O2 Moth
Surface of the discharge electrode during machining
Carbon C which is an impurity mixed in the layer is O2 Gas or rare
Shaku O2 Reacts with gas, CO2 Is removed from the surface of the electrode layer.
To be left. Therefore, carbon C does not exist on the electrode layer surface.
A discharge electrode can be manufactured. Of metal discharge electrode
The heating temperature is 50 ° C or higher and 300 ° C or lower is 50 ° C.
At temperatures below C and O2 Gas or diluted O2 gas
It reacts poorly with carbon, which is an impurity from the surface of the electrode layer.
C cannot be removed, and at high temperatures above 300 ° C metal
This is because the manufactured discharge electrode melts.
【００１２】[0012]
【実施例】以下に、本発明の実施例を図面を参照して説
明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１３】図１は、本発明の第１の実施例のエキシマ
レーザ装置用の放電電極３の製造方法を示すものであ
る。本実施例においては、予め均一電界形状に切削加工
され表面層に不純物である炭素Ｃを含むエキシマレーザ
装置用の放電電極３を、加熱手段であるベーキングチャ
ンバー１内に入れ、ベーキングチャンバー１の内部に配
置したヒーター４によって５０℃以上３００℃以下の温
度に加熱するとともに、ベーキングチャンバー１の導入
口５ａからＯ2 ガス若しくは希釈Ｏ2 ガス２をベーキン
グチャンバー１内に導入し、前記放電電極３の表面層と
Ｏ2 ガス若しくは希釈Ｏ2 ガス２を接触させ、前記放電
電極３の表面層に不純物として混入した炭素Ｃと、Ｏ2
ガス若しくは希釈Ｏ2 ガとを反応させてＣＯ2 とし、こ
のＣＯ2 を残存するＯ2 ガス若しくは希釈Ｏ2 ガス２と
ともに排出口５ｂから排出させる。FIG. 1 shows a method of manufacturing a discharge electrode 3 for an excimer laser device according to a first embodiment of the present invention. In the present embodiment, the discharge electrode 3 for an excimer laser device, which has been previously machined into a uniform electric field shape and contains carbon C as an impurity in the surface layer, is placed in the baking chamber 1 which is a heating means, and the inside of the baking chamber 1 is inserted. Is heated to a temperature of 50 ° C. or higher and 300 ° C. or lower by the heater 4 disposed in the baking chamber 1, and O 2 gas or diluted O 2 gas 2 is introduced into the baking chamber 1 from the inlet 5a of the baking chamber 1 to discharge the discharge electrode 3 When the surface layer is brought into contact with O 2 gas or diluted O 2 gas 2, carbon C mixed as impurities in the surface layer of the discharge electrode 3 and O 2
The gas or diluted O 2 gas is reacted to form CO 2, and this CO 2 is discharged together with the remaining O 2 gas or diluted O 2 gas 2 from the discharge port 5b.
【００１４】この結果、前記表面層に不純物である炭素
Ｃが存在しないエキシマレーザ装置用の放電電極３を得
ることができる。As a result, it is possible to obtain the discharge electrode 3 for the excimer laser device in which carbon C, which is an impurity, does not exist in the surface layer.
【００１５】このようにして製造した放電電極３を用い
たエキシマレーザ装置を運転した場合、均一電界形状に
により均一な放電を実現でき、かつ、レーザガス中に炭
素Ｃの放出が起こらずハロゲン化炭素が発生することを
防止することができ、レーザ出力を長時間にわたって安
定に維持することが可能となって、エキシマレーザガス
中の高価な希ガスの消費量を大幅に低減しランニングコ
ストの大幅な低減を図れる。When the excimer laser device using the discharge electrode 3 manufactured as described above is operated, a uniform discharge can be realized due to the uniform electric field shape, and carbon C is not emitted into the laser gas, so that the carbon halide is discharged. Can be prevented and the laser output can be stably maintained for a long time, the consumption of expensive rare gas in the excimer laser gas can be significantly reduced, and the running cost can be significantly reduced. Can be achieved.
【００１６】尚、前記加熱手段であるベーキングチャン
バー１の変形例として、前記ベーキングチャンバー１内
にヒーター４を配置する替わりに、ヒーター４をベーキ
ングチャンバー１の外周に配置したベーキングチャンバ
ーを用いることもできる。As a modification of the baking chamber 1 serving as the heating means, instead of arranging the heater 4 in the baking chamber 1, a baking chamber in which the heater 4 is arranged around the outer periphery of the baking chamber 1 can be used. .
【００１７】[0017]
【発明の効果】請求項１記載の発明によれば、エキシマ
レーザ装置の運転に伴って均一な放電を実現でき、か
つ、レーザガス中に炭素Ｃの放出が起こらずレーザ出力
を長時間にわたって安定に維持することができエキシマ
レーザガス中の高価な希ガスの消費量を大幅に低減でき
るエキシマレーザ装置装置用の放電電極を提供すること
ができる。According to the first aspect of the present invention, a uniform discharge can be realized along with the operation of the excimer laser device, and the emission of carbon C in the laser gas does not occur, so that the laser output is stable for a long time. It is possible to provide a discharge electrode for an excimer laser device that can be maintained and can significantly reduce the consumption of an expensive rare gas in the excimer laser gas.
【００１８】請求項２記載の発明によれば、電極層表面
に炭素Ｃが存在せず請求項１記載の効果を奏する放電電
極を製造することができるエキシマレーザ装置用の放電
電極の製造方法を提供することができる。According to the second aspect of the present invention, there is provided a method for producing a discharge electrode for an excimer laser device, which is capable of producing a discharge electrode having the effect of the first aspect without carbon C existing on the surface of the electrode layer. Can be provided.
【図１】本発明のエキシマレーザ装置用の放電電極の製
造方法を示す概略断面図である。FIG. 1 is a schematic cross-sectional view showing a method of manufacturing a discharge electrode for an excimer laser device of the present invention.
１ ベーキングチャンバー ２ Ｏ2 ガス若しくは希釈Ｏ2 ガス ３ 放電電極 ４ ヒーター ５ａ 導入口 ５ｂ 排出口1 Baking chamber 2 O 2 gas or diluted O 2 gas 3 Discharge electrode 4 Heater 5a Inlet port 5b Outlet port
Claims (3)
とともに不純物である炭素Ｃが混入した金属製放電電極
を、加熱処理しつつＯ2 ガス若しくは希釈Ｏ 2 ガスと接
触させて前記炭素ＣとＯ2 ガス若しくは希釈Ｏ2 ガスと
の反応により表面層の不純物である炭素Ｃを除去して得
られることを特徴とするエキシマレーザ装置用の放電電
極。1. A shape processed to form a uniform electric field
Discharge electrode made of metal mixed with carbon C as an impurity
While heating2 Gas or diluted O 2 Contact with gas
Touch the carbon C and O2 Gas or diluted O2 With gas
Obtained by removing carbon C which is an impurity in the surface layer by the reaction of
Discharge power for excimer laser devices
very.
属製放電電極を、加熱手段内に配置する工程と、 前記加熱手段内に配置する金属製放電電極を加熱しなが
らＯ2 ガス若しくは希釈Ｏ2 ガスと接触させ、前記炭素
ＣとＯ2 ガス若しくは希釈Ｏ2 ガスとの反応により表面
層の不純物である炭素Ｃを除去する工程と、からなるこ
とを特徴とするエキシマレーザ装置用の放電電極の製造
方法。2. A step of disposing a metal discharge electrode processed into a shape for forming a uniform electric field in a heating means, and an O 2 gas or dilution while heating the metal discharge electrode arranged in the heating means. O 2 is contacted with a gas, a discharge for the excimer laser device for removing carbon C which is an impurity of the surface layers by the reaction between the carbon C and the O 2 gas or diluted O 2 gas, characterized in that it consists of Electrode manufacturing method.
である請求項２に記載の製造方法。3. The manufacturing method according to claim 2, wherein the heating temperature is 50 ° C. or higher and 300 ° C. or lower.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7164694A JPH08335736A (en) | 1995-06-07 | 1995-06-07 | Discharge electrode for excimer laser and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7164694A JPH08335736A (en) | 1995-06-07 | 1995-06-07 | Discharge electrode for excimer laser and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08335736A true JPH08335736A (en) | 1996-12-17 |
Family
ID=15798097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7164694A Pending JPH08335736A (en) | 1995-06-07 | 1995-06-07 | Discharge electrode for excimer laser and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08335736A (en) |
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|---|---|---|---|---|
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| JPH02130989A (en) * | 1988-11-11 | 1990-05-18 | Mitsubishi Electric Corp | Halogen excimer laser device |
| JPH0398768A (en) * | 1989-09-11 | 1991-04-24 | Toshiba Corp | Manufacture of metal bonded tool |
| JPH03184345A (en) * | 1989-12-13 | 1991-08-12 | Nippon Steel Corp | Silicon wafer and manufacture thereof |
-
1995
- 1995-06-07 JP JP7164694A patent/JPH08335736A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5754221A (en) * | 1980-09-17 | 1982-03-31 | Kawasaki Steel Corp | Production of steel material with surface decarbonized |
| JPH02130989A (en) * | 1988-11-11 | 1990-05-18 | Mitsubishi Electric Corp | Halogen excimer laser device |
| JPH0398768A (en) * | 1989-09-11 | 1991-04-24 | Toshiba Corp | Manufacture of metal bonded tool |
| JPH03184345A (en) * | 1989-12-13 | 1991-08-12 | Nippon Steel Corp | Silicon wafer and manufacture thereof |
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