JPH0833992B2 - Method of manufacturing magnetic recording medium - Google Patents
Method of manufacturing magnetic recording mediumInfo
- Publication number
- JPH0833992B2 JPH0833992B2 JP62256249A JP25624987A JPH0833992B2 JP H0833992 B2 JPH0833992 B2 JP H0833992B2 JP 62256249 A JP62256249 A JP 62256249A JP 25624987 A JP25624987 A JP 25624987A JP H0833992 B2 JPH0833992 B2 JP H0833992B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- protective film
- recording medium
- thin film
- ferromagnetic metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は強磁性金属薄膜を磁気記録層とする磁気記録
媒体の製造方法に係り、特に磁気記録層上に耐久性に優
れた保護膜を形成する方法に関するものである。Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a magnetic recording medium having a ferromagnetic metal thin film as a magnetic recording layer, and more particularly to a protective film having excellent durability on the magnetic recording layer. It relates to a method of forming.
(従来の技術) 従来強磁性金属薄膜を磁気記録層とする磁気記録体は
非磁性の金属ディスク基体或はテープ基体上に、強磁性
金属材料を真空蒸着するとか、樹脂マトリックスに強磁
性金属材料を分散させたエマルジョンをスピンコートす
ることにより製造しているものである。(Prior Art) Conventionally, a magnetic recording body using a ferromagnetic metal thin film as a magnetic recording layer is formed by vacuum-depositing a ferromagnetic metal material on a non-magnetic metal disk substrate or tape substrate or by using a ferromagnetic metal material as a resin matrix. It is produced by spin coating an emulsion in which is dispersed.
然しながら強磁性金属薄膜は高密度記録に優れた特性
を有するが、ヘッドの接触によって摩耗や損傷を受けや
すく又空気中で酸化又は腐食され、特性変化がおこる等
の欠点がある。However, although the ferromagnetic metal thin film has excellent characteristics for high-density recording, it has the drawback that it is easily worn or damaged by contact with the head, and that it is oxidized or corroded in the air to change its characteristics.
従って強磁性金属薄膜上に種々の保護膜を形成するこ
とにより耐久性、耐食性を改善することが実施されてお
り、その1例として上記保護膜をプラズマ重合により形
成することが近年注目されている。このプラズマ重合法
を用いることにより薄膜化が容易であり且つ得られた薄
膜は均一性に優れている等種々の特性を有するものであ
る。Therefore, durability and corrosion resistance have been improved by forming various protective films on the ferromagnetic metal thin film, and as one example thereof, forming the above protective film by plasma polymerization has been attracting attention in recent years. . By using this plasma polymerization method, a thin film can be easily formed, and the obtained thin film has various characteristics such as excellent uniformity.
然しながら従来のプラズマ重合法により得られた保護
膜は、摩擦係数が大きく又磁気ディスクの場合、CSSテ
ストの結果によれば磁気ヘッドとの接触を多数回繰り返
したときに、膜の表面に損傷が見られるなど耐久性、耐
摩耗性に劣るものであった。However, the protective film obtained by the conventional plasma polymerization method has a large friction coefficient, and in the case of a magnetic disk, the CSS test results show that the film surface is not damaged when repeated contact with the magnetic head is repeated many times. As seen, it was inferior in durability and wear resistance.
本発明者等はかかる欠点を改善せんとして先に強磁性
金属薄膜の表面にプラズマ重合による保護膜を設けた
後、熱処理を行って磁気記録媒体を製造する方法(特願
昭61-127644号)を提案し又上記保護膜を熱処理するに
おいて酸素などの反応性ガス雰囲気中で行う方法(特願
昭61-217216号)を提案した。The inventors of the present invention have a method of manufacturing a magnetic recording medium by first providing a protective film by plasma polymerization on the surface of a ferromagnetic metal thin film and then performing heat treatment to improve the above drawbacks (Japanese Patent Application No. 61-127644). And a method (Japanese Patent Application No. 61-217216) of heat-treating the protective film in an atmosphere of a reactive gas such as oxygen.
又プラズマ重合により保護膜を基板に被着せしめるに
際し該基板を加熱しながら行うことにより膜の平滑性と
接着性とを大巾に改良しうる方法(特願昭61-234459
号)も提案した。In addition, when the protective film is applied to the substrate by plasma polymerization while heating the substrate, the smoothness and adhesiveness of the film can be greatly improved (Japanese Patent Application No. 61-234459).
No.) was also proposed.
然しながらかかる方法を個別に行っても、機械的特性
において十分な保護膜をうることが出来ないものであっ
た。However, even if such a method is individually performed, a protective film having sufficient mechanical properties cannot be obtained.
(発明が解決しようとする問題点) 本発明はかかる現状に鑑み鋭意研究を行った結果、摩
擦係数が小さく、磁気ヘッドとの接触を多頻度行っても
表面に何等の損傷をうけることのない強固な保護膜を形
成し、走行性に優れた磁気記録媒体を製造する方法を開
発したものである。(Problems to be Solved by the Invention) As a result of intensive studies in view of the present situation, the present invention has a small friction coefficient and does not suffer any damage to the surface even if the magnetic head is frequently contacted. This is a method for forming a strong protective film and manufacturing a magnetic recording medium having excellent running properties.
(問題点を解決するための手段) 本発明方法は基板上に強磁性金属薄膜を設けた磁気記
録層の表面に保護膜を形成して磁気記録媒体を製造する
方法において、該基板上に強磁性金属薄膜を設けた後該
基板を50〜300℃に加熱しながら、該強磁性金属薄膜の
表面に常温、常圧にて固体状の昇華性有機化合物を気化
せしめてプラズマ重合を行って保護膜を形成し、次いで
熱処理を施すことを特徴とするものである。(Means for Solving Problems) The method of the present invention is a method for producing a magnetic recording medium by forming a protective film on the surface of a magnetic recording layer provided with a ferromagnetic metal thin film on a substrate, wherein After providing the magnetic metal thin film, while heating the substrate to 50 to 300 ° C., the surface of the ferromagnetic metal thin film is vaporized at room temperature and atmospheric pressure to protect the solid sublimable organic compound by plasma polymerization. It is characterized in that a film is formed and then heat treatment is performed.
なお従来結晶性高分子や非晶質耐熱性ポリマー等に対
して密度の向上などの物性改良を図るために微細構造発
現の雰囲気温度やポリマーの重合温度を変えたり又得ら
れたポリマーの成形品に種々の熱処理を施すことが行わ
れているが、これらの方法はバルク試料を対象にしたも
のである。It should be noted that, in order to improve the physical properties such as the density and the like of conventional crystalline polymers and amorphous heat-resistant polymers, the atmospheric temperature for expressing the microstructure and the polymerization temperature of the polymers are changed, and the molded articles of the polymers obtained. Although various heat treatments have been performed on these, these methods are intended for bulk samples.
本発明方法はこれらの方法とは全く異にするものであ
り、保護膜における薄膜特有の表面効果即ち接着性、摩
擦係数、平滑性などの表面物性変化に着目したものであ
る。The method of the present invention is completely different from these methods, and focuses on the surface effects peculiar to the thin film in the protective film, that is, changes in surface physical properties such as adhesion, friction coefficient, and smoothness.
本発明方法において基板を加熱しつつプラズマ重合有
機薄膜を形成するのは、強磁性金属薄膜の酸化、損傷を
防止し又強磁性金属薄膜との接着性を改善し、平滑にし
て強固な膜を形成して、摩擦係数の小さい走行性に優れ
た磁気記録媒体をうるためである。In the method of the present invention, the plasma-polymerized organic thin film is formed while heating the substrate to prevent oxidation and damage of the ferromagnetic metal thin film, improve adhesion with the ferromagnetic metal thin film, and form a smooth and strong film. This is to obtain a magnetic recording medium having a small friction coefficient and excellent running property.
本発明方法ははじめに基体を加熱することであるがそ
の温度については有機モノマーの種類及び反応条件によ
り異るものである。通常50°〜300℃、好ましくは80°
〜250℃が望ましい。この温度が50℃未満の場合には強
固にして平滑な保護膜をうることが出来ず又300℃を超
えた場合には強磁性金属薄膜の接着性が劣り且つ保護膜
の硬度が低下するものである。The method of the present invention is to heat the substrate first, but the temperature depends on the type of organic monomer and the reaction conditions. Usually 50 ° -300 ° C, preferably 80 °
~ 250 ° C is desirable. If this temperature is less than 50 ° C, a strong and smooth protective film cannot be obtained, and if it exceeds 300 ° C, the adhesion of the ferromagnetic metal thin film is poor and the hardness of the protective film decreases. Is.
なお加熱方法としては抵抗加熱体による加熱、赤外線
輻射による加熱など基体に熱を供与しうる方法であれば
何れの方法でもよい。The heating method may be any method as long as it can supply heat to the substrate, such as heating with a resistance heater or infrared radiation.
又本発明方法において使用する有機化合物としては、
常温常圧にて固体状を呈するナフタレン、アントラセ
ン、ジフエニール、ジベンジル、ジフエニールアセチレ
ンなどの昇華性芳香族有機化合物を使用するものであ
る。Further, as the organic compound used in the method of the present invention,
Sublimable aromatic organic compounds such as naphthalene, anthracene, diphenyl, dibenzyl and diphenylacetylene, which are solid at room temperature and atmospheric pressure, are used.
本発明は、上記プラズマ重合により保護膜を形成した
後、更に酸素雰囲気中で熱を加えることにより膜構造を
より強固に、また保護膜の表面をより平滑にし、耐久
性、耐摩耗性の向上を図るものである。The present invention, after forming a protective film by the above-mentioned plasma polymerization, further heat in an oxygen atmosphere to make the film structure stronger and to make the surface of the protective film smoother, thereby improving durability and abrasion resistance. Is intended.
熱を加える平板としては抵抗加熱、高周波加熱、レー
ザー加熱、赤外線加熱、オープン中での加熱など保護膜
に熱を供与できるものであればどんな方法でもよく、ま
た加熱時の雰囲気は真空中、不活性ガス中、大気中とい
ずれでも差し支えない。As a flat plate to which heat is applied, any method can be used as long as it can provide heat to the protective film, such as resistance heating, high frequency heating, laser heating, infrared heating, and heating in an open state. It does not matter whether it is in active gas or air.
加熱の温度範囲としては50〜300℃であり、望ましく
は80〜250℃である。加熱温度が低過ぎると膜構造及び
膜表面の改質を図ることが出来ず、また加熱温度が高過
ぎると保護膜及び強磁性金属薄膜への悪影響が生じてし
まう。The heating temperature range is 50 to 300 ° C, preferably 80 to 250 ° C. If the heating temperature is too low, the film structure and the film surface cannot be modified, and if the heating temperature is too high, the protective film and the ferromagnetic metal thin film are adversely affected.
また熱を加えることによって通常保護膜には膜構造の
変化に伴ない膜厚の変化が見られる。この膜厚の変化率
が±20%以内になるよう熱処理を施すことが膜の表面構
造の改質を図る上で望ましい。Further, when heat is applied, the thickness of the protective film usually changes with the change of the film structure. It is desirable to perform heat treatment so that the change rate of the film thickness is within ± 20% in order to improve the surface structure of the film.
尚プラズマ重合保護膜の加熱温度の範囲は前述の如く
50〜300℃であるが、加熱時間は温度が高い場合は短時
間でよく、温度が低い場合は長時間行うことになるが大
体10秒〜120分程度である。時間が短すぎても所定の性
能が得られなく、又長すぎる場合は所定の性能が得られ
ないか、不経済である。The heating temperature range of the plasma polymerization protective film is as described above.
Although the temperature is 50 to 300 ° C, the heating time is short when the temperature is high, and long when the temperature is low, but it is about 10 seconds to 120 minutes. If the time is too short, the predetermined performance cannot be obtained, and if it is too long, the predetermined performance cannot be obtained or it is uneconomical.
また、本発明の磁気記録媒体の製造方法では、プラズ
マ重合により保護膜を形成した後、この保護膜に対して
酸素雰囲気中で熱処理を施こす。これにより、保護膜の
表面を改質し、摩擦係数の小さい、走行性に優れた磁気
記録媒体を得ることが可能である。また、かかる表面処
理により、強磁性金属薄膜と保護膜との密着性も改善さ
れる。Further, in the method for manufacturing a magnetic recording medium of the present invention, after forming a protective film by plasma polymerization, the protective film is subjected to heat treatment in an oxygen atmosphere. This makes it possible to modify the surface of the protective film and obtain a magnetic recording medium having a small friction coefficient and excellent running properties. Further, such surface treatment also improves the adhesion between the ferromagnetic metal thin film and the protective film.
本発明方法について例えば磁気ディスクの製造に適用
する場合を示すと次の如くである。The case where the method of the present invention is applied to, for example, the production of a magnetic disk is as follows.
まず基体となるアルミニウム基板上にNi-Pなどの化学
メッキ層を密着せしめ研摩仕上げなどの後処理を施した
後、その表面に物理的または化学的の手法により強磁性
金属薄膜を形成する。First, a chemical plating layer such as Ni-P is brought into close contact with an aluminum substrate to be a substrate, and post-treatment such as polishing is performed, and then a ferromagnetic metal thin film is formed on the surface by a physical or chemical method.
次に図面に示す如く対極型プラスマ重合装置内に、磁
気ディスク本体1をセットする、即ち電極2A,2B間に磁
気ディスク本体1を挾持し電極2A内に挿着した加熱体13
により50〜300℃に加熱し、加熱しながらプラズマ重合
を行う。Next, as shown in the drawing, the magnetic disk main body 1 is set in a counter electrode type plasma polymerization apparatus, that is, the magnetic disk main body 1 is sandwiched between the electrodes 2A and 2B and inserted into the electrode 2A.
To 50 to 300 ° C, and plasma polymerization is performed while heating.
なお3はベルジャー、4はテーブル、5はベルジャー
3内を真空にする真空ポンプ、6は絶対真空計、7は電
極2A,2Bに接続された高周波電源、8は固体モノマー用
の抵抗加熱体、9は固体有機化合物用の抵抗加熱体、10
は抵抗加熱体用の電源、11はキャリアーガス源、12はノ
ズル、13は加熱体、14は加熱源である。In addition, 3 is a bell jar, 4 is a table, 5 is a vacuum pump for vacuuming the inside of the bell jar 3, 6 is an absolute vacuum gauge, 7 is a high frequency power source connected to the electrodes 2A and 2B, 8 is a resistance heating body for solid monomer, 9 is a resistance heating element for solid organic compounds, 10
Is a power source for the resistance heating element, 11 is a carrier gas source, 12 is a nozzle, 13 is a heating element, and 14 is a heating source.
又プラズマ発生装置は上記に限定されず誘導コイル
型、導波管型等の高周波発振装置を備えたものであれば
よい。Further, the plasma generator is not limited to the above, and may be any one provided with a high frequency oscillator such as an induction coil type or a waveguide type.
又高周波によりプラズマ重合を行う場合、高周波出力
と電極面積の大きさとからエネルギー密度は0.2〜4W/cm
2望ましくは0.5〜3W/cm2の範囲になるようにし、高周波
電源の出力を300〜500W、望ましくは100〜450Wに保持し
出来うる限り高出力で行うことにより硬質化の保護膜を
うることが出来る。なお高周波電源は通常13.56MHzの発
振周波数であるが、特にこの周波数に限定することなく
直流からマイクロ波までのいかなる周波数でもよい。When plasma polymerization is performed with high frequency, the energy density is 0.2 to 4 W / cm due to the high frequency output and the size of the electrode area.
2 Desirably to be in the range of 0.5 to 3 W / cm 2 , and to obtain a hardened protective film by maintaining the output of the high frequency power supply at 300 to 500 W, preferably 100 to 450 W and performing as high output as possible. Can be done. The high frequency power source normally has an oscillation frequency of 13.56 MHz, but the frequency is not particularly limited to this frequency and any frequency from direct current to microwave may be used.
又ベルジャー内は0.005〜3Torr望ましくは0.01〜1.5T
orrの圧力にすることがよく、反応時間はモノマーの種
類、電極配置等によって影響を及ぼすものであるが、通
常5秒〜10分望ましくは10秒〜3分にて所望の膜厚のも
のをうることが出来る。In the bell jar, 0.005 to 3 Torr, preferably 0.01 to 1.5T
It is preferable to set the pressure to orr, and the reaction time depends on the kind of the monomer, the electrode arrangement, etc., but usually 5 seconds to 10 minutes, preferably 10 seconds to 3 minutes to obtain a desired film thickness. You can get it.
又プラズマ重合による膜厚は通常10〜1000Åであり好
ましくは80〜600Åに分布することが好ましい、この膜
厚が10Åより薄いと耐久性、耐摩耗性が劣り、逆に1000
Åより厚いとスペーシングロスが大きくなり記録の読み
出し特性に悪影響を及ぼすものである。The film thickness by plasma polymerization is usually 10 to 1000Å and preferably 80 to 600Å. It is preferable that the film thickness is thinner than 10Å, durability and abrasion resistance are poor, and conversely 1000
If it is thicker than Å, the spacing loss becomes large and the read characteristics of recording are adversely affected.
(実施例) アルミニウム基板上にNi-Cr-Co3元系強磁性金属薄膜
を設けた3.5インチの磁気ディスクを図面に示すプラズ
マ重合装置内にセットし約210℃に加熱し該ディスク面
を均一に加熱しながら上記強磁性金属薄膜面にプラズマ
重合による保護膜を被着し、次いで酸素雰囲気中にて20
0℃5分間熱処理を施して本発明方法による磁気記録媒
体を得た。(Example) A 3.5-inch magnetic disk in which a Ni-Cr-Co ternary ferromagnetic metal thin film was provided on an aluminum substrate was set in the plasma polymerization apparatus shown in the drawing and heated to about 210 ° C to make the disk surface uniform. While heating, deposit a protective film by plasma polymerization on the surface of the ferromagnetic metal thin film, and then in an oxygen atmosphere for 20 minutes.
Heat treatment was performed at 0 ° C. for 5 minutes to obtain a magnetic recording medium according to the method of the present invention.
而してモノマーとしてはジベンジルを使用し、キャリ
ヤーガスとして純アルゴンを使用した。又プラズマ重合
を開始する直前のベルジャ内圧は0.1Torrであり、得ら
れた保護膜の厚さはモノマー量により一定値となった。
又モノマーの気化は蒸着用小型ボートに電流を通してボ
ートの温度を約80℃になるまで加熱した。Thus, dibenzyl was used as the monomer and pure argon was used as the carrier gas. The inner pressure of the bell jar just before starting the plasma polymerization was 0.1 Torr, and the thickness of the obtained protective film became a constant value depending on the amount of the monomer.
Further, for vaporization of the monomer, an electric current was passed through a small boat for vapor deposition to heat the boat to a temperature of about 80 ° C.
斯くして得た本発明方法による磁気記録媒体について
CSS耐久性、摩擦係数及び耐食性について測定を行っ
た。その結果は第1表に示す通りである。Regarding the magnetic recording medium thus obtained according to the method of the present invention
CSS durability, coefficient of friction, and corrosion resistance were measured. The results are shown in Table 1.
なお、本発明方法による磁気記録媒体と比較するため
にアルミニウム基板面に強磁性金属薄膜を設けた後、プ
ラズマ重合による保護膜を被着するにおいて該基板を加
熱することなく又は熱処理を行うことをせずに磁気記録
媒体(比較例)を製造し、実施例と同様にその性能を測
定して第1表に併記した。For comparison with the magnetic recording medium according to the method of the present invention, after providing a ferromagnetic metal thin film on the surface of an aluminum substrate, it is possible to perform heat treatment without heating the substrate in depositing a protective film by plasma polymerization. A magnetic recording medium (Comparative Example) was manufactured without performing the measurement, and its performance was measured in the same manner as in the Example, and is also shown in Table 1.
(効果) 以上詳述した如く本発明方法によれば磁気記録媒体の
保護膜において、耐久性、耐食性及び摩擦係数に優れた
ものがえられるためヘッドの接触によるも損傷をうける
ことなく且つ長期に亘り使用しうる等工業上極めて有用
なものである。 (Effect) As described above in detail, according to the method of the present invention, the protective film of the magnetic recording medium can be excellent in durability, corrosion resistance and friction coefficient. It is extremely useful industrially such that it can be used over a long period of time.
図面は本発明磁気記録媒体の製造方法において基板上に
プラズマ重合による保護膜を被着するための装置の1例
を示す概略説明図である。 1…磁気ディスク本体、2A,2B…対向する電極、3…ベ
ルジャー、4…テーブル、5…真空ポンプ、6…絶対真
空計、7…高周波電源、8…抵抗加熱体、9…抵抗加熱
体、10…電源、11…キャリアーガス源、12…ノズル、13
…加熱体。The drawings are schematic explanatory views showing an example of an apparatus for depositing a protective film by plasma polymerization on a substrate in the method for producing a magnetic recording medium of the present invention. DESCRIPTION OF SYMBOLS 1 ... Magnetic disk main body, 2A, 2B ... Opposing electrodes, 3 ... Bell jar, 4 ... Table, 5 ... Vacuum pump, 6 ... Absolute vacuum gauge, 7 ... High frequency power supply, 8 ... Resistance heating body, 9 ... Resistance heating body, 10 ... Power source, 11 ... Carrier gas source, 12 ... Nozzle, 13
… Heating body.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−22433(JP,A) 特開 昭61−5435(JP,A) 特開 昭61−924(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-61-22433 (JP, A) JP-A-61-5435 (JP, A) JP-A-61-924 (JP, A)
Claims (1)
に保護膜を形成して磁気記録媒体を製造する方法におい
て、該基板上に強磁性金属薄膜を設けた後基板を50〜30
0℃に加熱しながら、該強磁性金属薄膜の表面に、常温
常圧にて固体状の昇華性有機化合物を気化せしめてプラ
ズマ重合を行って保護膜を形成し、次いで酸素雰囲気中
で熱処理を施すことを特徴とする磁気記録媒体の製造方
法。1. A method for producing a magnetic recording medium by forming a protective film on the surface of a ferromagnetic metal thin film provided on a substrate, wherein the ferromagnetic metal thin film is provided on the substrate and then the substrate is changed to 50 to 30.
While heating at 0 ° C., a solid sublimable organic compound is vaporized at room temperature and atmospheric pressure on the surface of the ferromagnetic metal thin film to perform plasma polymerization to form a protective film, and then heat treatment is performed in an oxygen atmosphere. A method of manufacturing a magnetic recording medium, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62256249A JPH0833992B2 (en) | 1987-10-13 | 1987-10-13 | Method of manufacturing magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62256249A JPH0833992B2 (en) | 1987-10-13 | 1987-10-13 | Method of manufacturing magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01100732A JPH01100732A (en) | 1989-04-19 |
| JPH0833992B2 true JPH0833992B2 (en) | 1996-03-29 |
Family
ID=17290011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62256249A Expired - Lifetime JPH0833992B2 (en) | 1987-10-13 | 1987-10-13 | Method of manufacturing magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0833992B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS615435A (en) * | 1984-06-20 | 1986-01-11 | Sony Corp | Manufacture of magnetic recording medium |
| JPS6122433A (en) * | 1984-07-10 | 1986-01-31 | Hitachi Maxell Ltd | Production of magnetic recording medium |
-
1987
- 1987-10-13 JP JP62256249A patent/JPH0833992B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01100732A (en) | 1989-04-19 |
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