JPH0836744A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH0836744A JPH0836744A JP17395694A JP17395694A JPH0836744A JP H0836744 A JPH0836744 A JP H0836744A JP 17395694 A JP17395694 A JP 17395694A JP 17395694 A JP17395694 A JP 17395694A JP H0836744 A JPH0836744 A JP H0836744A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- protective film
- recording medium
- film
- atomic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 40
- 239000000314 lubricant Substances 0.000 claims abstract description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 9
- 230000003746 surface roughness Effects 0.000 claims abstract description 7
- 239000007789 gas Substances 0.000 claims description 29
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 5
- 238000001179 sorption measurement Methods 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 239000004721 Polyphenylene oxide Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229920000570 polyether Polymers 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052799 carbon Inorganic materials 0.000 abstract description 9
- 229910000838 Al alloy Inorganic materials 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 52
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、磁気ヘッドとの間で情
報の記録および再生を行う磁気記録媒体に関するもので
あり、特に表面に適当な粗さを有し、炭素質保護膜およ
び液体潤滑膜が設けられた磁気ディスクに関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium for recording information on and reproducing information from a magnetic head, and more particularly to a carbonaceous protective film and liquid lubrication having a suitable roughness on the surface. The present invention relates to a magnetic disk provided with a film.
【０００２】[0002]
【従来の技術】従来より磁気記録媒体に情報を記録し、
もしくは記録された情報を再生出力するための装置とし
て磁気ディスク装置が使用されている。磁気ディスク装
置では磁気ディスクを高速に回転させ、その表面に発生
する空気膜の圧力により磁気ヘッドを例えば０．０５〜
０．３μｍの微小間隙を保って浮上させながら情報の記
録や再生を行う。このため、磁気ヘッドと磁気ディスク
との間隙に塵埃や突起が存在したり、衝撃が加わった場
合、高速に回転する磁気ディスクと磁気ヘッドとが衝突
して、磁気ディスクの磁気記録膜を破壊して情報の記録
や再生が行えなくなる恐れがある。特にパーソナルコン
ピュータに用いられるような小型の磁気ディスク装置で
は、上記の浮上型磁気ヘッドが使用されているものの、
磁気ディスクの回転速度が磁気ヘッドの浮上に十分な空
気膜の圧力を発生し得ない起動時および停止時には、磁
気ヘッドと磁気ディスクは接触し、しゅう動するコンタ
クト・スタートアンドストップ（以下ＣＳＳ）方式が用
いられているため、ＣＳＳの繰り返しに起因して磁気記
録膜が摩耗などの損傷を受けて記録媒体として機能しな
くなってしまう恐れがある。そこで、これらの損傷から
磁気記録膜を保護するために、磁気ディスク表面には炭
素質保護膜が設けられ、さらに潤滑剤が塗布されるのが
通常である。炭素質保護膜を形成する手段としては、膜
の諸特性の制御性や磁気記録膜を形成する手段との整合
性などを考慮して、一般にアルゴンを放電ガスとするマ
グネトロンスパッタリング法が用いられる。また、その
ターゲットにはグラファイトやガラス状炭素などの炭素
質材料が一般に用いられている。しかし、この方法で形
成した炭素質保護膜は必ずしも磁気ディスクの保護膜と
して十分な耐久性を期待できないという問題があった。
そこで、例えば特開平２−２８２４７０に記載されてい
るように放電ガス中に水素を含むガス、例えばメタンガ
スを適当量混合することにより炭素質保護膜にＨを適当
量含有させてＣＳＳの繰り返しによる耐しゅう動性を改
善し、磁気ディスクの信頼性を向上させようとすること
が行われている。2. Description of the Related Art Conventionally, information is recorded on a magnetic recording medium,
Alternatively, a magnetic disk device is used as a device for reproducing and outputting recorded information. In the magnetic disk device, the magnetic disk is rotated at a high speed, and the pressure of the air film generated on the surface of the magnetic disk causes the magnetic head to move, for example, from 0.05 to
Information is recorded and reproduced while floating while maintaining a minute gap of 0.3 μm. Therefore, if dust or protrusions are present in the gap between the magnetic head and the magnetic disk or if an impact is applied, the magnetic disk rotating at high speed collides with the magnetic head and destroys the magnetic recording film of the magnetic disk. Therefore, there is a possibility that information recording and reproduction cannot be performed. In particular, in the small-sized magnetic disk device used for a personal computer, the above-mentioned floating magnetic head is used,
A contact start and stop (CSS) method in which the magnetic head and the magnetic disk come into contact and slide during start and stop when the rotation speed of the magnetic disk cannot generate sufficient air film pressure to float the magnetic head. Therefore, there is a possibility that the magnetic recording film may be damaged by abrasion or the like due to repetition of CSS and may not function as a recording medium. Therefore, in order to protect the magnetic recording film from these damages, it is usual to provide a carbonaceous protective film on the surface of the magnetic disk and further apply a lubricant. As a means for forming a carbonaceous protective film, a magnetron sputtering method using argon as a discharge gas is generally used in consideration of controllability of various characteristics of the film and compatibility with means for forming a magnetic recording film. Further, a carbonaceous material such as graphite or glassy carbon is generally used for the target. However, there has been a problem that the carbonaceous protective film formed by this method cannot be expected to have sufficient durability as a protective film for a magnetic disk.
Therefore, for example, as described in JP-A-2-282470, by mixing an appropriate amount of a gas containing hydrogen, for example, methane gas, in the discharge gas, an appropriate amount of H is contained in the carbonaceous protective film, and CSS is repeatedly used. Attempts have been made to improve slidability and magnetic disk reliability.
【０００３】[0003]
【発明が解決しようとする課題】炭素質保護膜に適当量
のＨを含有させることにより、高サイクルのＣＳＳに対
する耐久性を向上させることができることは前記の通り
であるが、Ｈのみを添加した炭素質保護膜は、高温高湿
環境下で磁気ヘッドとの吸着力が増加して磁気ディスク
の回転が困難に成り易い問題があった。また、スパッタ
リング法により形成された炭素質膜中には相当量のＨが
不可避的に含有されるのが通常であり、膜中のＨ量を常
に最適に制御することは困難であった。このため、ヘッ
ド吸着の一因とされる潤滑剤の塗布厚を薄くしたり、磁
気ディスクの表面粗さを大きくしなければならず、耐久
性が低下したりヘッド浮上高さを低くすることができな
いという問題があり、磁気ディスクの高記録密度化の障
害となっていた。以上の状況から、磁気ディスクの高記
録密度化のために、磁気ヘッドの浮上高さを極力低くす
るために表面粗さを極力小さくすることや、必要最小限
の膜厚で高サイクルのＣＳＳに対して高い耐久性を有す
る保護膜という相反する技術課題があり、さらに、潤滑
に十分な厚さの潤滑剤を塗布した場合であっても高温高
湿環境下で磁気ヘッドが吸着を起こしにくいことが求め
られている。As described above, it is possible to improve durability against high cycle CSS by adding an appropriate amount of H to the carbonaceous protective film, but only H is added. The carbonaceous protective film has a problem that it tends to be difficult to rotate the magnetic disk due to an increased attraction force with the magnetic head under a high temperature and high humidity environment. Further, it is usual that a considerable amount of H is inevitably contained in the carbonaceous film formed by the sputtering method, and it has been difficult to always control the H amount in the film to be optimum. Therefore, it is necessary to reduce the coating thickness of the lubricant, which is one of the causes of head adsorption, and to increase the surface roughness of the magnetic disk, which may reduce the durability and reduce the flying height of the head. There is a problem that it cannot be done, which has been an obstacle to increasing the recording density of the magnetic disk. From the above situation, in order to increase the recording density of the magnetic disk, the surface roughness should be minimized in order to reduce the flying height of the magnetic head as much as possible, and high cycle CSS with the minimum necessary film thickness should be obtained. On the other hand, there is a contradictory technical issue of a protective film with high durability, and further, even if a lubricant of a thickness sufficient for lubrication is applied, the magnetic head does not easily attract under high temperature and high humidity environment. Is required.
【０００４】[0004]
【課題を解決するための手段】不活性ガス、好ましくは
Ａｒに少なくともＮ2ガスを請求項に記載の範囲で適当
量混合し、さらに必要に応じてＨ2ガスや炭化水素ガス
の少なくとも１種以上を適当量混合したガスを放電ガス
として炭素質ターゲットをスパッタリングすることによ
り磁気記録媒体表面に炭素質保護膜を形成する。Means for Solving the Problems An inert gas, preferably Ar, is mixed with at least N 2 gas in an appropriate amount within the range described in the claims, and if necessary, at least one of H 2 gas and hydrocarbon gas. A carbonaceous target film is formed on the surface of the magnetic recording medium by sputtering a carbonaceous target using a gas obtained by mixing the above in an appropriate amount as a discharge gas.
【０００５】[0005]
【作用】スパッタリング法で形成された炭素質保護膜は
一般に非晶質構造であり、その膜中には相当量のＨが不
可避的に含まれるのが通常である。このＨは炭素の未結
合手（ダングリングボンド）を終端することにより非晶
質構造を安定化し、さらに非晶質構造炭素の構造を変化
させることにより膜の機械的性質を変化させる。スパッ
タリングガス中にＨ2あるいは炭化水素ガスを混合する
場合でも同様である。一方、スパッタリングガスから炭
素質保護膜中に取り込まれた窒素は炭素の非晶質構造に
はほとんど変化を及ぼさないが、膜中に含まれるＨ量を
抑制し、また潤滑剤との親和性を高める効果がある。こ
の結果、炭素質保護膜表面の化学的性質や機械的性質を
任意に制御することが可能となる。The carbonaceous protective film formed by the sputtering method generally has an amorphous structure, and the film usually contains a considerable amount of H inevitably. This H stabilizes the amorphous structure by terminating dangling bonds of carbon, and further changes the structure of amorphous structure carbon, thereby changing the mechanical properties of the film. The same applies when H 2 or a hydrocarbon gas is mixed in the sputtering gas. On the other hand, the nitrogen taken into the carbonaceous protective film from the sputtering gas hardly changes the amorphous structure of carbon, but it suppresses the amount of H contained in the film and has an affinity with the lubricant. Has the effect of increasing. As a result, it becomes possible to arbitrarily control the chemical properties and mechanical properties of the surface of the carbonaceous protective film.
【０００６】[0006]
（実施例１）基板搬送型スパッタリング装置（ライボル
ト社ＶＺ１２００型）を使用して、ＡｒにＮ2を４０モ
ル％混合した放電ガス中でグラファイトターゲットを直
流マグネトロンスパッタリングして形成した炭素質保護
膜を有する磁気ディスクのＣＳＳ耐久性を示す。表面粗
さはＲaで約５５オングストローム、潤滑剤（モンテカ
チーニ社フォンブリンＺ−ＤＯＬ）は約２５オングスト
ロームの厚さにディップ法で塗布されている。ＣＳＳテ
ストは、AlTiC系スライダを使用して常温常湿および高
温高湿（３０℃８０％R.H.）で行った。図２に示すよう
に、本発明の炭素質保護膜を設けた磁気ディスクでは、
特に高温高湿条件下でのヘッド吸着が実用十分な程度に
低減されることがわかる。なお、現在実用されている磁
気ディスクでは、適当な表面粗さを付与された基体上に
下地膜、磁気記録膜、炭素質保護膜、潤滑剤膜の順に形
成するのが通常であり、基体にはＮｉＰメッキが施され
たアルミニウム合金が一般的であるが、ガラス、セラミ
クス、炭素系材料あるいは有機高分子等であってもよ
く、また、積極的に粗さを付与されたものでなくともよ
い。下地膜にはCrが一般的であるが必要に応じて材料や
構成を変更したりあるいは省略することもできる。炭素
質保護膜は必要に応じて一層以上の組成の異なる炭素質
膜あるいは金属質膜等を介して形成しても良く、あるい
はその膜厚方向に連続的に組成が変化するように構成さ
れても良いが、少なくとも保護膜の表層がＮを含有し、
磁気記録膜との界面では表面近傍よりもＮ濃度が低くな
るように構成されることが必要である。なお、前記の方
法により作成される磁気記録媒体の表面に粗さを付与す
る方法は、予め粗さを付与されていない基体を用いて磁
気記録膜までを形成した後に、薄膜を島状に形成した
り、粒子を分散させる等の適当な手段により所用の表面
粗さを得る方法によっても差し支えない。Example 1 A carbonaceous protective film formed by direct-current magnetron sputtering of a graphite target in a discharge gas in which Ar is mixed with 40 mol% of N 2 using a substrate-conveying type sputtering device (VZ1200 type of Leibold). 3 shows the CSS durability of a magnetic disk having the same. The surface roughness Ra is about 55 Å, and the lubricant (Fomblin Z-DOL of Montecatini Co.) is applied by a dip method to a thickness of about 25 Å. The CSS test was performed at room temperature and normal humidity and high temperature and high humidity (30 ° C. 80% RH) using an AlTiC slider. As shown in FIG. 2, in the magnetic disk provided with the carbonaceous protective film of the present invention,
In particular, it can be seen that head adsorption under high temperature and high humidity conditions is reduced to a practically sufficient level. In a magnetic disk currently in practical use, it is usual that a base film, a magnetic recording film, a carbonaceous protective film, and a lubricant film are formed in this order on a base body having an appropriate surface roughness. Is generally an aluminum alloy plated with NiP, but may be glass, ceramics, a carbon-based material, an organic polymer, or the like, and need not be positively roughened. . Cr is generally used for the base film, but the material and configuration can be changed or omitted if necessary. The carbonaceous protective film may be formed through one or more carbonaceous films having different compositions or a metallic film, if necessary, or the composition may be continuously changed in the film thickness direction. However, at least the surface layer of the protective film contains N,
It is necessary that the N concentration at the interface with the magnetic recording film be lower than that at the vicinity of the surface. The method of imparting roughness to the surface of the magnetic recording medium prepared by the above method is as follows: a magnetic recording film is formed using a base body to which roughness is not imparted in advance, and then a thin film is formed in an island shape. Or a method of obtaining a desired surface roughness by an appropriate means such as dispersion of particles.
【０００７】（実施例２）図３は基板搬送型スパッタリ
ング装置（日本真空技術(株)ＳＰＬ−３００型）を用い
てグラファイトターゲット直流マグネトロンスパッタリ
ングした炭素質保護膜の高温高湿条件下（３０℃８０％
R.H.）でのＣＳＳ特性を示す。（ａ）は純Ａｒガスを放
電ガスとした場合。（ｂ）はＡｒに３０モル％のメタン
ガスを混合した放電ガスでスパッタリングした場合。
（ｃ）はＡｒガスに３０モル％のＮ2と２０モル％のH2
とを混合した放電ガス中でスパッタリングした場合のＣ
ＳＳテスト結果をそれぞれ示す。いずれも潤滑剤はモン
テカチーニ社のフォンブリンＡＭ２００１をディップ法
で約２５オングストローム塗布した。ＣＳＳテストには
CaTiO2系スライダ材料を使用した。この結果から、純Ａ
ｒ中でスパッタリングされた炭素質保護膜に比べて本発
明の炭素質保護膜を設けた磁気ディスクは高サイクルの
ＣＳＳを繰り返した後にも摩擦力の顕著な増加が認めら
れず、実用上問題となるヘッド吸着も認められない信頼
性に優れたものであることが分かる。(Example 2) FIG. 3 shows a high-temperature and high-humidity condition (30 ° C.) of a carbonaceous protective film obtained by direct-current magnetron sputtering of a graphite target using a substrate-conveying sputtering apparatus (SPL-300 manufactured by Nippon Vacuum Technology Co., Ltd.). 80%
RH) shows CSS characteristics. (A) is a case where pure Ar gas is used as the discharge gas. (B) is the case where sputtering is performed with a discharge gas in which Ar is mixed with 30 mol% of methane gas.
(C) is an Ar gas containing 30 mol% N 2 and 20 mol% H 2.
C when sputtering in a discharge gas containing a mixture of
The SS test results are shown respectively. In each case, the lubricant was Fomblin AM2001 manufactured by Montecatini Co., which was applied by about 25 angstrom by the dip method. For CSS test
A CaTiO 2 based slider material was used. From this result, pure A
In comparison with the carbonaceous protective film sputtered in r, the magnetic disk provided with the carbonaceous protective film of the present invention showed no significant increase in frictional force even after repeated high cycle CSS, which was a practical problem. It can be seen that the head has excellent reliability and no head adsorption.
【０００８】[0008]
【発明の効果】非晶質構造の炭素質保護膜に少なくとも
ＮとＨとを含有させることによって機械的性質を改善
し、同時に潤滑剤との親和性を高めることによって、高
サイクルのＣＳＳに対する耐久性を高め、かつ高温高湿
環境下でもヘッド吸着が起こりにくい信頼性に優れた磁
気記録媒体を得ることができる。Industrial Applicability The carbonaceous protective film having an amorphous structure contains at least N and H to improve the mechanical properties, and at the same time, to improve the affinity with a lubricant, thereby improving the durability against high cycle CSS. It is possible to obtain a magnetic recording medium which has improved reliability and which is less likely to cause head adsorption even under a high temperature and high humidity environment.
【図１】本発明の炭素質保護膜を設けた磁気ディスクの
構成FIG. 1 Structure of a magnetic disk provided with a carbonaceous protective film of the present invention
【図２】本発明に係る炭素質保護膜を設けた磁気ディス
クの常温常湿および高温高湿環境（３０℃，８０％Ｒ．
Ｈ．）におけるＣＳＳテスト結果。FIG. 2 is a normal temperature and normal humidity and high temperature and high humidity environment (30 ° C., 80% RH) of a magnetic disk provided with a carbonaceous protective film according to the present invention.
H. ) CSS test results.
【図３】本発明に係る炭素質保護膜を設けた磁気ディス
クの高温高湿環境（３０℃，８０％Ｒ．Ｈ．）における
ＣＳＳテスト結果。図中の（ａ）〜（ｃ）はそれぞれ （ａ）純Ａｒガスを放電ガスとしてスパッタした場合 （ｂ）Ａｒに３０モル％のメタンを混合した放電ガスで
スパッタした場合 （ｃ）Ａｒガスに３０モル％のＮ2と２０モル％のＨ2と
を混合した放電ガス中でスパッタした場合FIG. 3 is a CSS test result of a magnetic disk provided with a carbonaceous protective film according to the present invention in a high temperature and high humidity environment (30 ° C., 80% RH). Each of (a) to (c) in the figure is (a) when sputtered with pure Ar gas as a discharge gas (b) when sputtered with a discharge gas in which Ar is mixed with 30 mol% of methane (c) Ar gas When sputtering is performed in a discharge gas in which 30 mol% N 2 and 20 mol% H 2 are mixed.
１ 潤滑剤、２ ＮおよびＨを含有する炭素保護膜、３
Ｎを含有しない炭素保護膜、４ 磁気記録膜、５ Ｃ
ｒ下地膜、６ ＮｉＰめっき層、７ Ａｌ合金基体1 Lubricant, 2 Carbon protective film containing N and H, 3
N-free carbon protective film, 4 magnetic recording film, 5 C
r Underlayer film, 6 NiP plating layer, 7 Al alloy substrate
───────────────────────────────────────────────────── フロントページの続き (72)発明者 篠原 肇 埼玉県熊谷市三ケ尻5200番地日立金属株式 会社磁性材料研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hajime Shinohara 5200 Mikashiri, Kumagaya, Saitama Hitachi Metals Co., Ltd.
Claims (5)
とを設けてなる磁気記録媒体であって、その保護膜が少
なくとも５０原子％以上のＣと１〜３０原子％のＮおよ
び５〜１０原子％のＨとから成り、残部が７．５原子％
以下のＯおよび１０原子％以下のＡｒから成ることを特
徴とする磁気記録媒体。1. A magnetic recording medium in which at least a magnetic recording film and a protective film are provided on a substrate, wherein the protective film is at least 50 atomic% or more C, 1 to 30 atomic% N and 5 to 10%. Consisting of atomic% H and the balance 7.5 atomic%
A magnetic recording medium comprising the following O and 10 atomic% or less of Ar.
異なる組成の２層以上から成り、または磁気記録膜との
界面と表面との間で組成が連続的に変化し、その保護膜
表面のＮ濃度が磁気記録膜との界面のＮ濃度よりも高く
なるように構成されることを特徴とする磁気記録媒体。2. In the above magnetic recording medium, the protective film is composed of two or more layers having different compositions, or the composition continuously changes between the interface with the magnetic recording film and the surface, A magnetic recording medium, characterized in that the N concentration is higher than the N concentration at the interface with the magnetic recording film.
厚さが１５〜５００オングストロームの範囲にあり、そ
の表面粗さが中心線平均粗さＲａで３０〜３００オング
ストロームの範囲であり、かつ／または最大粗さＲｍａ
ｘが５０〜５００オングストロームの範囲であって、そ
のベアリングレシオ曲線において、最大の突起高さから
１０％の範囲の面積負荷率が２５％以下であることを特
徴とする磁気記録媒体。3. In the above magnetic recording medium, the thickness of the protective film is in the range of 15 to 500 angstroms, the surface roughness thereof is in the range of center line average roughness Ra of 30 to 300 angstroms, and / Or maximum roughness Rma
A magnetic recording medium characterized in that x is in the range of 50 to 500 angstroms, and in the bearing ratio curve, the area load ratio in the range of 10% from the maximum protrusion height is 25% or less.
上に含フッ素ポリエーテルを主構造とする潤滑剤が５〜
３０オングストロームの厚さに塗布され、その潤滑剤分
子の分子鎖の少なくとも一端に極性基を有し、その潤滑
剤分子の２５重量％以上が保護膜に化学吸着を生じてい
ることを特徴とする磁気記録媒体。4. In the above magnetic recording medium, a lubricant containing a fluorine-containing polyether as a main structure is formed on the protective film in an amount of 5 to 5.
It is characterized in that it is applied to a thickness of 30 Å and has a polar group at least at one end of the molecular chain of the lubricant molecule, and 25% by weight or more of the lubricant molecule undergoes chemical adsorption on the protective film. Magnetic recording medium.
好ましくはＡｒに１〜８０モル％のＮ2ガスを加えたも
の、またはＮ2ガスにＨ2ガス、炭化水素ガスの１種以上
を全圧に対して８０モル％以下の濃度に混合した放電ガ
スを用い、基体がスパッタリング装置の匡体に対して−
５ないし−４５０Ｖとなるようにバイアス電圧を印加し
ながら１．５〜９Ｗ／ｃｍ2の電力密度でスパッタリン
グされる炭素質保護膜を有することを特徴とする磁気記
録媒体およびその製造方法。5. In the above magnetic recording medium, an inert gas, preferably Ar to which 1 to 80 mol% of N 2 gas is added, or N 2 gas containing at least one of H 2 gas and hydrocarbon gas. Using a discharge gas mixed at a concentration of 80 mol% or less with respect to the total pressure, the substrate is against the casing of the sputtering device.
A magnetic recording medium having a carbonaceous protective film which is sputtered at a power density of 1.5 to 9 W / cm 2 while applying a bias voltage of 5 to -450 V, and a method for manufacturing the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17395694A JPH0836744A (en) | 1994-07-26 | 1994-07-26 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17395694A JPH0836744A (en) | 1994-07-26 | 1994-07-26 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0836744A true JPH0836744A (en) | 1996-02-06 |
Family
ID=15970174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17395694A Pending JPH0836744A (en) | 1994-07-26 | 1994-07-26 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0836744A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6403194B1 (en) | 1998-09-03 | 2002-06-11 | Hitachi, Ltd. | Magnetic recording medium, process for producing same and magnetic disc apparatus |
| US6740407B1 (en) * | 1999-07-16 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Magnetic recording medium and magnetic recording mode using floppy disk |
-
1994
- 1994-07-26 JP JP17395694A patent/JPH0836744A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6403194B1 (en) | 1998-09-03 | 2002-06-11 | Hitachi, Ltd. | Magnetic recording medium, process for producing same and magnetic disc apparatus |
| US7037607B2 (en) | 1998-09-03 | 2006-05-02 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic recording medium, process for producing same and magnetic disc apparatus |
| US6740407B1 (en) * | 1999-07-16 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Magnetic recording medium and magnetic recording mode using floppy disk |
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