JPH084157B2 - Josephson device and manufacturing method thereof - Google Patents
Josephson device and manufacturing method thereofInfo
- Publication number
- JPH084157B2 JPH084157B2 JP62308226A JP30822687A JPH084157B2 JP H084157 B2 JPH084157 B2 JP H084157B2 JP 62308226 A JP62308226 A JP 62308226A JP 30822687 A JP30822687 A JP 30822687A JP H084157 B2 JPH084157 B2 JP H084157B2
- Authority
- JP
- Japan
- Prior art keywords
- weakly
- bonded portion
- film
- substance
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明は、例えば高速スイッチング素子、SQUID、ミ
リ波検出等への応用が可能なジョセフソン素子とその製
造方法に関し、更に詳しくは、2つの超電導体間を超電
導材で形成された弱結合部で接続したタイプのジョセフ
ソン素子とその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a Josephson element that can be applied to, for example, a high-speed switching element, SQUID, millimeter wave detection, etc., and a manufacturing method thereof. The present invention relates to a Josephson element of a type in which superconductors are connected by a weakly-bonded portion formed of a superconducting material and a manufacturing method thereof.
<従来の技術> ジョセフソン素子の一般的な構造は、第5図〜第9図
に示す通りで、いずれも2つの超電導体1および2間を
弱結合部3で接続してなっている。第5図に示すものは
超電導マイクロブリッジと称されるタイプで、超電導体
1,2および弱結合部3を同一の超電導材によって一体形
成している。第6図に示すものは平面型ジョセフソン接
合と称されるタイプで、2つの超電導体1,2間に超電導
材製の弱結合部3を差しわたしている。第7図に示すも
のは薄膜トンネル接合と称され、一方の超電導体1の表
面に弱結合部3となる薄い絶縁膜を形成したものであ
る。また、第8図に示すものはサンドイッチ型ジョセフ
ソン接合と称され、同じく絶縁体によって弱結合部3を
形成している。更に、第9図に示すものは準平面型ジョ
セフソン接合と称されるタイプで、一方の超電導体1の
表面に絶縁体10を介して他方の超電導体2を重ね、これ
らを超電導材製の弱結合部3で接続している。<Prior Art> The general structure of a Josephson element is as shown in FIGS. 5 to 9, and in each case, two superconductors 1 and 2 are connected by a weak coupling portion 3. The type shown in Fig. 5 is a type called superconducting microbridge.
1, 2 and the weakly coupled portion 3 are integrally formed of the same superconducting material. What is shown in FIG. 6 is a type called a plane type Josephson junction, and a weak coupling portion 3 made of a superconducting material is inserted between two superconductors 1 and 2. What is shown in FIG. 7 is called a thin film tunnel junction, in which a thin insulating film to be the weak coupling portion 3 is formed on the surface of one superconductor 1. Further, the one shown in FIG. 8 is called a sandwich type Josephson junction, and the weak coupling portion 3 is also formed by an insulator. Furthermore, what is shown in FIG. 9 is a type called a quasi-plane type Josephson junction, in which the surface of one superconductor 1 is superposed with the other superconductor 2 via an insulator 10, and these are made of a superconducting material. They are connected by the weakly connected portion 3.
<発明が解決しようとする問題点> 以上のような各構造ジョセフソン素子の、超電導体1,
2間に電流を流すと、そのI−V特性は第10図は示す通
りとなる。ここで、ジョセフソン素子の特性を揃えるた
めには、第10図の臨界電流値Icを一定値にする必要があ
る。このIcの値は、例えば第6図のタイプにおいて弱結
合部3の断面積w×tで決まるが、このIcの値を適度の
範囲内に収めるためには、wおよびtの寸法をサブミク
ロンオーダーの精度で加工する必要があり、従来の加工
法ではIcのバラツキを所望の範囲内に抑えこめず、素子
の歩留まりを大きく低下させる要因となっている。<Problems to be Solved by the Invention> The superconductor 1 of each structure Josephson device as described above
When a current is applied between the two, its IV characteristic becomes as shown in FIG. Here, in order to make the characteristics of the Josephson device uniform, it is necessary to make the critical current value I c in FIG. 10 constant. The value of I c is determined by, for example, the cross-sectional area w × t of the weak coupling portion 3 in the type of FIG. 6, but in order to keep the value of I c within a proper range, the dimensions of w and t are It is necessary to process with a precision on the order of submicrons, and conventional processing methods cannot suppress variations in I c within a desired range, which is a factor that greatly reduces the yield of devices.
ところで、最近発見されたセラミックス高温超電導体
は、液体窒素温度で動作するジョセフソン素子を作成す
ることができることから注目されているが、セラミック
スであるが故に加工性が悪く、上記の問題が更に深刻な
ものとなっている。By the way, the recently discovered ceramics high-temperature superconductor has attracted attention because it can make a Josephson element that operates at liquid nitrogen temperature.However, since it is ceramics, it has poor workability and the above problems are more serious. It has become.
本発明は上記に鑑みてなされたもので、臨界電流値Ic
を必要に応じて変化させることのできるジョセフソン素
子、および、高精度の加工を施すことなく臨界電流値Ic
を所望の値とすることのできる、ジョセフソン素子の製
造方法の提供を目的としている。The present invention has been made in view of the above, and the critical current value I c
Of the Josephson element, which can be changed as required, and the critical current value I c without high-precision machining.
It is an object of the present invention to provide a method for manufacturing a Josephson device capable of setting a desired value.
<問題点を解決するための手段> 上記の各目的を達成するため、第1の発明は、実施例
に対応する第1図に示すように、2つの超電導体1,2間
を、超電導材で形成された弱結合部3により接続してな
る素子において、弱結合部3に、加熱によりこの弱結合
部3内に拡散してその臨界電流値Icを下げる物質(例え
ばAl2O3膜)4を接続配置し、かつ、上記の加熱のため
のヒータ(例えばTa膜)5を熱的に接触したことによっ
て、特徴づけられる。<Means for Solving Problems> In order to achieve each of the above-mentioned objects, the first invention is, as shown in FIG. 1 corresponding to an embodiment, a superconducting material between two superconductors 1 and 2. In the element formed by connecting the weakly-bonded portions 3 formed in 1., a substance (for example, an Al 2 O 3 film) that diffuses into the weakly-bonded portions 3 by heating and reduces its critical current value I c ) 4 is connected and arranged, and a heater (for example, Ta film) 5 for heating is thermally contacted.
また、第2の発明は、ジョセフソン素子の製造方法で
あって、同じく実施例に対応する第1図を参照しつつ説
明すると、2つの超電導体1,2間を、超電導材によって
接続して弱結合部3を形成し、次に、その弱結合部3
に、加熱によりこの弱結合部3内に拡散してその拡散領
域の超電導性を破壊する物質(例えばAl2O3膜)4を接
触させた状態で、2つの超電導体1,2間に電流を流して
そのI−V特性を測定しつつ、弱結合部3を局所的に加
熱して上記の物質4の拡散領域を順次増大せしめること
により、上記のI−V特性における臨界電流値Icが所望
の値となるよう調整することによって、特徴づけられ
る。A second invention is a method of manufacturing a Josephson element, which will be described with reference to FIG. 1 which also corresponds to the embodiment. Two superconductors 1 and 2 are connected by a superconducting material. Weakly bonded portion 3 is formed, and then weakly bonded portion 3 is formed.
When a substance (for example, an Al 2 O 3 film) 4 that diffuses into the weakly coupled portion 3 by heating and destroys the superconductivity of the diffusion region is brought into contact with the current, a current is passed between the two superconductors 1 and 2. Current is measured and the IV characteristic is measured, the weakly bonded portion 3 is locally heated to sequentially increase the diffusion region of the substance 4 to thereby increase the critical current value I c in the IV characteristic. Is characterized by adjusting to a desired value.
<作用> Y−B−C−O系やL−S−C−O系セラミックス超
電導体等においては、Al,Al2O3,Si,SiO2等を拡散させる
ことによってその超電導性が破壊されることが知られて
いる。<Action> In YBCO and LSCOS ceramic superconductors, the superconductivity is destroyed by diffusing Al, Al 2 O 3 , Si, SiO 2 and the like. It is known that
第1の発明の構造を有するジョセフソン素子による
と、ヒータ5による加熱により、Al2O3等の物質が弱結
合部3内に拡散してその超電導性破壊領域を増大させ、
弱結合部3の超電導性を有する断面積を縮少させること
ができ、必要に応じて適宜に素子のIcを低下させること
ができる。According to the Josephson element having the structure of the first invention, the heating by the heater 5 causes a substance such as Al 2 O 3 to diffuse into the weakly coupled portion 3 to increase the superconducting breakdown region thereof.
The cross-sectional area of the weakly coupled portion 3 having superconductivity can be reduced, and the I c of the device can be appropriately reduced as necessary.
第2の発明による製造方法によれば、適当な断面積の
超電導材による弱結合部3に、超電導性破壊物質を拡散
させつつ、素子のI−V特性を測定し、Ic値が所望値と
なった時点で拡散を停止することで、一定のIc値を有す
るジョセフソン素子が得られる。According to the manufacturing method of the second aspect of the present invention, the IV characteristic of the device is measured while diffusing the superconducting destructive substance in the weakly coupled portion 3 made of the superconducting material having an appropriate cross-sectional area, and the I c value is a desired value. By stopping the diffusion at that time, a Josephson device having a constant Ic value can be obtained.
<実施例> 本発明の実施例を、以下、図面に基づいて説明する。<Examples> Examples of the present invention will be described below with reference to the drawings.
第1図は本発明実施例の構造を示す斜視図である。 FIG. 1 is a perspective view showing the structure of the embodiment of the present invention.
超電導体1,2および弱結合部3が同一の超電導材によ
って一体形成されてなる超電導マイクロブリッジ構造
の、弱結合部3の上面に、Al2O3膜4が形成されてお
り、更にその上面にTa膜5が形成されている。このTa膜
5の両端には、それぞれ電極(図示せず)を介してリー
ド線6,7が接続されている。An Al 2 O 3 film 4 is formed on the upper surface of the weakly-coupling portion 3 of the superconducting microbridge structure in which the superconductors 1 and 2 and the weakly-coupling portion 3 are integrally formed of the same superconducting material. Is formed with a Ta film 5. Lead wires 6 and 7 are connected to both ends of the Ta film 5 via electrodes (not shown).
以上の構造は、次の方法によって製造することができ
る。The above structure can be manufactured by the following method.
YSZ(イットリア安定化ジルコニア)基板上に、rfス
パッタによりY−B−C−O薄膜を作成し、フォトリソ
グラフ・ウェットエッチングにより、超電導体1,2およ
び弱結合部3からなる超電導マイクロブリッジ構造を形
成した。ここで、弱結合部3の大きさは10μm×10μm,
厚さは2μmとした。なお、このパターン成形はイオン
注入法等によって行ってもよい。A YBCO thin film was formed on a YSZ (yttria-stabilized zirconia) substrate by rf sputtering, and a superconducting microbridge structure consisting of superconductors 1 and 2 and weakly coupled portions 3 was formed by photolithographic wet etching. Formed. Here, the size of the weak coupling portion 3 is 10 μm × 10 μm,
The thickness was 2 μm. The pattern forming may be performed by an ion implantation method or the like.
次に、同じくrfスパッタにより、弱結合部3の上にAl
2O3膜4を、更にその上にTa膜5を積層した。そしてTa
膜5の両端に電極とリード線6,7を接続した。Next, by rf sputtering as well, Al is formed on the weakly coupled portion 3.
A 2 O 3 film 4 and a Ta film 5 were further laminated thereon. And Ta
Electrodes and lead wires 6 and 7 were connected to both ends of the membrane 5.
さて、以上の構造を有する素子を、液体窒素中に浸
し、超電導体1,2間に電流を流してそのI−V特性を測
定すると、例えば第2図実線の通りであった。次に、そ
の状態でリード線6,7間に電流を数秒間流してTa膜5を
発熱させると、Al2O3が弱結合部3のY−B−C−O膜
に所定深さだけ拡散してその超電導性を破壊する結果、
実質的に弱結合部3の厚さtが小さくなって断面積が小
さくなり、第2図破線で示すようなI−V特性が得ら
れ、臨界電流値が低下した。更にTa膜5に通電すると、
同図一点鎖線で示すように臨界電流値は更に低下した。
このように、Ta膜5への通電時間により、臨界電流値の
大きさを制御することができ、所望の臨界電流値から得
られた時点で通電を停止することによって、所棒の特性
を有するジョセフソン素子が得られる。Now, when the element having the above structure is dipped in liquid nitrogen and a current is passed between the superconductors 1 and 2 to measure its IV characteristic, for example, it is as shown by the solid line in FIG. Then, in that state, when a current is passed between the lead wires 6 and 7 for several seconds to heat the Ta film 5, Al 2 O 3 is allowed to reach a predetermined depth in the Y-B-C-O film of the weak coupling portion 3. As a result of spreading and destroying its superconductivity,
Substantially, the thickness t of the weakly-bonded portion 3 became small, the cross-sectional area became small, the IV characteristic as shown by the broken line in FIG. 2 was obtained, and the critical current value decreased. When the Ta film 5 is further energized,
As shown by the alternate long and short dash line in the figure, the critical current value further decreased.
As described above, the magnitude of the critical current value can be controlled by the time of energizing the Ta film 5, and by stopping the energization at the time when the desired critical current value is obtained, the characteristics of the bar are obtained. A Josephson device is obtained.
なお、I−V特性の測定と加熱のための通電は並行し
て行ってもよいし、交互に行ってもよい。測定と加熱通
電を並行に行なう場合、第1図の構造の素子を窒素ガス
が充填された容器内に入れ、その容器ごと液体窒素内に
浸すことで、加熱による液体窒素の急激な沸騰を防止で
きる。The measurement of the IV characteristics and the energization for heating may be performed in parallel or alternately. When performing measurement and heating energization in parallel, the element with the structure shown in Fig. 1 is placed in a container filled with nitrogen gas, and the container is immersed in liquid nitrogen to prevent rapid boiling of liquid nitrogen due to heating. it can.
また、素子の構造としては、第1図に示した超電導マ
イクロブリッジ構造のほか、第6図および第9図に示し
た平面型ジョセフソン接合および準平面型ジョセフソン
接合のタイプにも適用可能であり、いずれも超電導材製
弱結合部3に超電導性破壊物質を接触配置し、この接触
部分を加熱するためのヒータを熱的に接続すればよい。Further, as the structure of the element, in addition to the superconducting microbridge structure shown in FIG. 1, the planar Josephson junction type and the quasi-planar Josephson junction type shown in FIGS. 6 and 9 can be applied. In either case, a superconducting destructive substance may be placed in contact with the weakly bonded portion 3 made of superconducting material, and a heater for heating the contact portion may be thermally connected.
弱結合部3の超電導材料としては、Y−B−C−O系
セラミックスのほか、L−S−C−O系セラミックスで
も同様の結果を得ることができた。また、超電導性破壊
物質としては、上述のAl2O3のほか、SiO2,AlおよびSiが
ほぼ同様の結果を示し、更にSr,Ti,Feおよびその酸化物
等でも効率的ではないものの使用することができる。As the superconducting material of the weakly coupled portion 3, similar results could be obtained not only with the YBCO system ceramics but also with the LSCOS system ceramics. Further, as the superconducting destruction material, in addition to Al 2 O 3 mentioned above, SiO 2 , Al and Si show almost the same result, and use of Sr, Ti, Fe and oxides thereof which are not efficient can do.
次に、超電導マイクロブリッジ構造を有するジョセフ
ソン素子と、その製造方法の他の例を述べる。第3図は
その説明図である。この例では、まず、YSZ基板等の上
に一様なY−B−C−O膜11を形成する。次に、そのY
−B−C−O膜11上に第3図に示すようにAl2O3膜4,4ま
たは他の超電導性破壊物質の膜を形成する。そして、こ
のAl2O3膜4,4を加熱することにより、Y−B−C−O膜
11の膜厚方向に拡散させてAl2O3膜4,4の下方のY−B−
C−O膜11を絶縁化し、超電動マイクロブリッジ構造を
得る。次いで、Al2O3膜4,4を更に加熱することによりAl
2O3を膜面方向に拡散させ、弱結合部3の実質的な幅w
を小さくさせて断面積を小さくし、所望のI−V特性が
得られた時点で加熱を停止する。Next, a Josephson device having a superconducting microbridge structure and another example of the manufacturing method thereof will be described. FIG. 3 is an explanatory diagram thereof. In this example, first, a uniform Y-B-C-O film 11 is formed on a YSZ substrate or the like. Then that Y
On the -B-C-O film 11, as shown in FIG. 3, Al 2 O 3 films 4, 4 or other superconducting destructive substance films are formed. Then, by heating the Al 2 O 3 films 4 and 4, the YBCO film is formed.
11 is diffused in the film thickness direction, and Y-B- under the Al 2 O 3 films 4 and 4 is formed.
The CO film 11 is insulated to obtain a super electric microbridge structure. Then, by further heating the Al 2 O 3 films 4 and 4,
2 O 3 is diffused in the film surface direction, and the substantial width w of the weakly bonded portion 3 is
Is reduced to reduce the cross-sectional area, and heating is stopped when the desired IV characteristic is obtained.
この方法は第6図および第9図に示した平面型および
準平面型ジョセフソン接合のタイプに適用できる。準平
面型ジョセフソン接合を有する素子への適用例を第4図
に示す。この例では、超電導体1と、その上に絶縁体10
を介して重ねられた超電導体2の上に、一様なY−B−
C−O膜11を形成し、そのY−B−C−O膜11の上方に
は、中心部分を除いてAl2O3膜4およびTa膜5を積層
し、更にTa膜5の両端に加熱用電流を流すためのリード
線6,7を接続している。この構造においてリード線6,7を
介して電流を流してTa膜5を発熱させることにより、Al
2O3がY−B−C−O膜11の膜厚方向に拡散し、Y−B
−C−O膜11の中心部を除く部分が絶縁化される。つま
り、超電導性が残る中心部が弱結合部3を形成すること
になる。そして、同様に更に通電して加熱することによ
り、Al2O3がY−B−C−O膜11の膜面方向に拡散し、
弱結合部3の実質的な幅wを適宜を狭めることができ
る。This method is applicable to the planar and quasi-planar Josephson junction types shown in FIGS. 6 and 9. An example of application to a device having a quasi-planar Josephson junction is shown in FIG. In this example, the superconductor 1 and the insulator 10 thereon are
A uniform Y-B-on the superconductor 2 stacked via
A C—O film 11 is formed, and an Al 2 O 3 film 4 and a Ta film 5 are laminated above the Y—B—C—O film 11 except for the central portion, and further on both ends of the Ta film 5. Lead wires 6 and 7 for supplying a heating current are connected. In this structure, a current is passed through the lead wires 6 and 7 to heat the Ta film 5 to
2 O 3 diffuses in the film thickness direction of the Y-B-C-O film 11,
The portion of the —C—O film 11 other than the central portion is insulated. That is, the central portion where the superconducting property remains forms the weak coupling portion 3. Then, similarly, by further energizing and heating, Al 2 O 3 diffuses in the film surface direction of the Y-B-C-O film 11,
The substantial width w of the weakly coupled portion 3 can be appropriately narrowed.
<発明の効果> 以上説明したように、本発明のジョセフソン素子によ
れば、超電導材製の弱結合部に、加熱によりその超電導
性を破壊し、弱結合部の実質的な断面積を小さくしてそ
の超電導臨界電流を低下させる物質が接続配置され、か
つ、加熱用のヒータが熱的に接続されているから、必要
に応じてそのI−V特性を適宜に変化させることがで
き、使用上の汎用性が増大する。<Effects of the Invention> As described above, according to the Josephson element of the present invention, the weak coupling portion made of a superconducting material destroys its superconductivity by heating, and the substantial cross-sectional area of the weak coupling portion is reduced. Since the substance for reducing the superconducting critical current is connected and arranged, and the heater for heating is thermally connected, its IV characteristic can be appropriately changed as needed, The versatility above increases.
また、本発明の製造方法によると、弱結合部の加工精
度を高度化することなく、I−V特性を所望の状態に調
整することができるので、歩留まりが向上し、ひいては
製造コストを低減させることができる。Further, according to the manufacturing method of the present invention, the IV characteristics can be adjusted to a desired state without enhancing the processing accuracy of the weakly coupled portion, so that the yield is improved and the manufacturing cost is reduced. be able to.
第1図は本発明実施例の構造を示す斜視図、 第2図はその作用説明図、 第3図および第4図は本発明の他の実施例の説明図、 第5図乃至第9図は従来のジョセフソン素子の構造例を
示す斜視図、 第10図はそのI−V特性を示すグラフである。 1,2……超電導体 3……弱接合部 4……Al2O3膜 5……Ta膜 6,7……リード線 10……絶縁体 11……Y−B−C−O膜FIG. 1 is a perspective view showing the structure of an embodiment of the present invention, FIG. 2 is an explanatory view of its operation, FIGS. 3 and 4 are illustrations of another embodiment of the present invention, and FIGS. Is a perspective view showing a structural example of a conventional Josephson element, and FIG. 10 is a graph showing its IV characteristic. 1,2 …… Superconductor 3 …… Weak junction 4 …… Al 2 O 3 film 5 …… Ta film 6,7 …… Lead wire 10 …… Insulator 11 …… YBCO film
Claims (4)
た弱結合部により接続してなる素子において、上記弱結
合部に、加熱により当該弱結合部内に拡散してその超電
導臨界電流値を下げる物質を接触配置し、かつ、上記加
熱のためのヒータを熱的に接触したことを特徴とする、
ジョセフソン素子。1. A device in which two superconductors are connected by a weakly-bonded portion formed of a superconducting material, and the weakly-bonded portion is diffused into the weakly-bonded portion by heating, and its superconducting critical current value. Is placed in contact with a substance that lowers, and a heater for heating is thermally contacted,
Josephson device.
電導材で、その弱結合部に接触配置される上記物質がA
l,Al2O3,SiまたはSiO2であることを特徴とする、特許請
求の範囲第1項記載のジョセフソン素子。2. The superconducting material of the weakly bonded portion is a ceramics superconducting material, and the substance placed in contact with the weakly bonded portion is A.
The Josephson device according to claim 1, wherein the Josephson device is 1, Al 2 O 3 , Si or SiO 2 .
して弱結合部を形成し、次に、その弱結合部に、加熱に
より当該弱結合部内に拡散してその拡散領域における超
電導性を破壊する物質を接触させた状態で、上記2つの
超電導体間に電流を流してそのI−V特性を測定しつ
つ、上記弱結合部を局所的に加熱して上記物質の拡散領
域を順次増大せしめることにより、上記I−V特性にお
ける臨界電流値が所望の値となるよう調整することを特
徴とする、ジョセフソン素子の製造方法。3. A superconducting material is used to connect between two superconductors to form a weakly-bonded portion, and then the weakly-bonded portion is heated to diffuse into the weakly-bonded portion so that the superconductivity in the diffusion region is increased. In the state of contacting a substance that destroys, the current is passed between the two superconductors and the IV characteristics are measured, and the weakly coupled portion is locally heated to sequentially diffuse the diffusion regions of the substance. A method for manufacturing a Josephson device, characterized in that the critical current value in the IV characteristic is adjusted to a desired value by increasing the value.
成するとともに、その弱結合部に接触させる上記物質を
Al,Al2O3,SiまたはSiO2とすることを特徴とする、特許
請求の範囲第3項記載のジョセフソン素子の製造方法。4. The weakly-bonded portion is formed of a ceramics superconductor, and the substance is brought into contact with the weakly-bonded portion.
The method for manufacturing a Josephson device according to claim 3 , wherein Al, Al 2 O 3 , Si or SiO 2 is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62308226A JPH084157B2 (en) | 1987-12-04 | 1987-12-04 | Josephson device and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62308226A JPH084157B2 (en) | 1987-12-04 | 1987-12-04 | Josephson device and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01149492A JPH01149492A (en) | 1989-06-12 |
| JPH084157B2 true JPH084157B2 (en) | 1996-01-17 |
Family
ID=17978445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62308226A Expired - Lifetime JPH084157B2 (en) | 1987-12-04 | 1987-12-04 | Josephson device and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH084157B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112098910B (en) * | 2020-10-10 | 2025-05-23 | 邵阳学院 | A six-point roll-to-roll transmission high-temperature superconducting long tape critical current test device and method |
-
1987
- 1987-12-04 JP JP62308226A patent/JPH084157B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01149492A (en) | 1989-06-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5376624A (en) | Josephson break junction thin film device | |
| JP4917205B2 (en) | Electrically stabilized thin film high temperature superconductor and method of manufacturing the same | |
| RU2133525C1 (en) | Superconducting quantum interference transmitter and process of its manufacture | |
| JPH084157B2 (en) | Josephson device and manufacturing method thereof | |
| Kiss et al. | Quench characteristics in HTSC devices | |
| EP0484251B1 (en) | Superconducting device having an extremely short superconducting channel formed of extremely thin oxide superconductor film and method for manufacturing the same | |
| EP0444873A2 (en) | Apparatus for measuring distribution of magnetic field | |
| US5714767A (en) | Method for manufacturing superconducting device having a reduced thickness of oxide superconducting layer and superconducting device manufactured thereby | |
| JP2585269B2 (en) | Superconducting transistor | |
| EP0381541B1 (en) | Superconductive magnetoresistive device | |
| JPH01214178A (en) | Manufacture of josephson junction | |
| Akhmetov et al. | Current voltage characteristics of composite superconductors with high contact resistance | |
| JPH0282586A (en) | Manufacture of superconducting device | |
| JPH03297178A (en) | Squid device | |
| JP3011411B2 (en) | Superconducting element | |
| JP2647985B2 (en) | Josephson element | |
| JP2933681B2 (en) | Magnetic field measurement method | |
| Goodrich et al. | High current pressure contacts to Ag pads on thin film superconductors | |
| JPH08186300A (en) | Oxide SQUID pickup coil | |
| Krause | Magnetic field resistivity of superconducting bismuth oxides | |
| JP2005039038A (en) | Superconducting switch | |
| JPH0378674A (en) | Squid element | |
| JPH05243625A (en) | Method for adjusting the critical current value of Josephson device | |
| JPH01120879A (en) | Formation of squid | |
| JPH03283680A (en) | Squid device using proximity effect |