JPH0845651A - Multi-layer ceramic heater - Google Patents

Multi-layer ceramic heater

Info

Publication number
JPH0845651A
JPH0845651A JP17508094A JP17508094A JPH0845651A JP H0845651 A JPH0845651 A JP H0845651A JP 17508094 A JP17508094 A JP 17508094A JP 17508094 A JP17508094 A JP 17508094A JP H0845651 A JPH0845651 A JP H0845651A
Authority
JP
Japan
Prior art keywords
layer
ceramic heater
emissivity
conductive
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17508094A
Other languages
Japanese (ja)
Inventor
Noboru Kimura
昇 木村
Ryoji Nakajima
亮二 中島
Nobuo Arai
延男 新井
Atsuo Kawada
敦雄 川田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP17508094A priority Critical patent/JPH0845651A/en
Publication of JPH0845651A publication Critical patent/JPH0845651A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To heat an object effectively and attain a high temp. while the electric power is saved, by furnishing a low emission rate layer on the surface opposite the heating surface. CONSTITUTION:A double-layer ceramic heater is prepared by laminating insulative layer and conductive layer, wherein the insulative layer is made of nitrides of silicon, aluminum, boron or oxides such as alumina, quartz, etc., while the conductive layer is made of a high melting point metal such as W, Pt, Ta or conductive ceramics such as SiC, carbon, etc. A low emission rate layer having a rate of emission below 0.2 is provided on the surface opposite the heating surface. The low emission rate layer is made of a high melting point metal such as W, Ta, Mo, Pt using such method as sputtering, EB evaporation, CVD, etc. Thereby the object can be heated effectively, and a high temp. be attained while the electric power is saved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は複層セラミックヒータ
ー、特には平坦な均熱加熱ができることから、化学気相
蒸着法やスパッター法によって薄膜を形成する際の基板
やウェハーの加熱用に有用とされる複層セラミックヒー
ターに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is useful for heating a substrate or wafer when forming a thin film by a chemical vapor deposition method or a sputtering method, since it is capable of performing uniform soaking heating on a multilayer ceramic heater. The present invention relates to a multilayer ceramic heater.

【0002】[0002]

【従来の技術】半導体製品製造工程における分子線エピ
タキシーやCVD、スパッタリングなどにおけるウェハ
ーの加熱反応としては、熱分解窒化ほう素(P−BN)
とパイロリテックグラファイト(PG)の複合セラミッ
クヒーターを用いることが有効とされており(特開昭 6
3-241921号公報参照)、このものは従来のタンタルワイ
ヤーヒーターに比べて装着が容易で、熱変形、断線、シ
ョートというトラブルもないので使い易く、しかも面状
ヒーターであるために比較的均熱が得られ易いという利
点もある。
2. Description of the Related Art As a heating reaction of a wafer in molecular beam epitaxy, CVD, sputtering, etc. in a semiconductor product manufacturing process, pyrolytic boron nitride (P-BN) is used.
It is said that it is effective to use a composite ceramic heater of graphite and pyrolithic graphite (PG).
3-241921), this product is easier to install than conventional tantalum wire heaters and has no troubles such as thermal deformation, disconnection and short circuit, and is easy to use. Is also easy to obtain.

【0003】[0003]

【発明が解決しようとする課題】しかし、これについて
は近年にいたり、口径も大きく、使用温度も高温とした
ものが要求されつつあり、これに伴なって加熱に要する
消費電力の効率化、断熱に要する設備の簡素化が求めら
れている。そのため、一般に半導体プロセスにおけるウ
ェハーの加熱においては、ヒーターは片面のみの加熱に
使われ、その反対側は熱を損失しないようにMo、Wな
どの高融点金属薄を積み重ねたヒーターシールドで覆わ
れたものが使用されているが、このものはそのヒートシ
ールドの性能により加熱に要するエネルギーがほぼ決ま
り、これを強化すれば省エネルギー型のヒーターとなる
が、このヒートシールドを強化するにはそのためのスペ
ースが必要で、コストもかかり、装置も複雑化するとい
う不利がある。
However, in recent years, there has been a demand for a device having a large diameter and a high operating temperature, which is accompanied by an increase in power consumption required for heating and heat insulation. There is a demand for simplification of the equipment required for. Therefore, generally, in heating a wafer in a semiconductor process, the heater is used for heating only one side, and the other side is covered with a heater shield in which high melting point metal thin films such as Mo and W are stacked so as not to lose heat. Although the thing used is this, the energy required for heating is almost determined by the performance of its heat shield, and if it is strengthened it becomes an energy saving type heater, but to strengthen this heat shield, there is space for it It has the disadvantages of being necessary, costly and complicating the device.

【0004】[0004]

【課題を解決するための手段】本発明はこのような不
利、欠点を解決した複層セラミックヒーターに関するも
のであり、これは絶縁層と導電層を積層してなる複層面
状セラミックヒーターにおいて、その加熱面に対して反
対側の面に放射率が 0.2以下の低放射率層を設けてなる
ことを特徴とするものである。
SUMMARY OF THE INVENTION The present invention relates to a multi-layer ceramic heater which solves the above disadvantages and drawbacks, and it relates to a multi-layer planar ceramic heater having an insulating layer and a conductive layer laminated thereon. A low emissivity layer having an emissivity of 0.2 or less is provided on the surface opposite to the heating surface.

【0005】すなわち、本発明者らは大口径化、高温化
の要求を満たし、省エネルギーで断熱構造も簡素化を可
能にする複層セラミックヒーターを開発すべく種々検討
した結果、これについてはヒーター自体を省エネルギー
化のために、加熱対象のない面に放射率の低い層を設け
ると、熱損失を低減できることを見出し、この低放射率
層は加熱面に対して反対側の面に放射率が 0.2以下のも
のとすればよいということを確認して本発明を完成させ
た。以下にこれをさらに詳述する。
That is, the present inventors have conducted various studies to develop a multi-layer ceramic heater which satisfies the requirements of large diameter and high temperature, saves energy, and can simplify the heat insulating structure. In order to save energy, it was found that heat loss can be reduced by providing a layer with low emissivity on the surface without heating, and this low emissivity layer has an emissivity of 0.2 on the surface opposite to the heating surface. The present invention has been completed by confirming that the following is required. This will be described in more detail below.

【0006】[0006]

【作用】本発明は複層セラミックヒーターに関するもの
で、これは前記したように絶縁層と導電層とを積層させ
てなる複層面状セラミックヒーターにおいて、その加熱
面に対して反対側の面に放射率が 0.2以下の低放射率層
を設けてなるものであるが、この低放射率層を設ければ
その熱損失を低減することができるので、このヒーター
を省エネルギータイプのものとすることができるという
有利性が与えられる。
The present invention relates to a multi-layer ceramic heater, which is a multi-layer planar ceramic heater having an insulating layer and a conductive layer laminated as described above, and radiates to a surface opposite to the heating surface. The low emissivity layer having a coefficient of 0.2 or less is provided. Since the heat loss can be reduced by providing the low emissivity layer, this heater can be an energy saving type. The advantage is given.

【0007】複層セラミックヒーターは図3に示すよう
に絶縁層と導電層とを積層したものであるが、この絶縁
層は窒化けい素、窒化アルミニウム、窒化ほう素などの
窒化物、あるいはアルミナ、石英などの酸化物からなる
ものとすればよく、この導電層はW、Pt、Taなどの
高融点金属、あるいはSiC、カーボンなどの導電性セ
ラミックスからなるものとすればよい。
As shown in FIG. 3, the multi-layer ceramic heater is formed by laminating an insulating layer and a conductive layer. The insulating layer is made of a nitride such as silicon nitride, aluminum nitride or boron nitride, or alumina, The conductive layer may be made of an oxide such as quartz, and the conductive layer may be made of a refractory metal such as W, Pt, or Ta, or a conductive ceramic such as SiC or carbon.

【0008】しかし、このものの熱伝導は 600℃以上の
高温ではスパッタ、CVD蒸着、MBEなどのプロセス
で特に真空中で放射が支配的であり、これは材料表面の
放射率(ε)の影響を受けるので、加熱対象面の放射率
(ε)を大きくし、その反対面の放射率(ε)を小さく
すれば、加熱対象物を効率よく加熱することができ、ま
たその他の方向には熱が伝わらないようにすれば、省電
力で対象物を高温に加熱することができるということを
見出したので、本発明の複層セラミックヒーターではこ
の加熱面に対して反対側の面に低放射率層が設けられ
る。その1例は図2に示されている。
However, the heat conduction of this material is dominated by radiation particularly in a vacuum in processes such as sputtering, CVD deposition, and MBE at a high temperature of 600 ° C. or higher, which influences the emissivity (ε) of the material surface. Therefore, if the emissivity (ε) of the surface to be heated is increased and the emissivity (ε) of the opposite surface is decreased, the object to be heated can be efficiently heated, and heat will be generated in other directions. It has been found that the object can be heated to a high temperature with low power consumption if it is prevented from being transmitted. Therefore, in the multilayer ceramic heater of the present invention, a low emissivity layer is provided on the surface opposite to the heating surface. Is provided. One example is shown in FIG.

【0009】この低放射率層からの放射の伝熱量Qはつ
ぎの式(1) Q=4.88A1 ((T1/100)4 − (T2/100)4 )/((1/ε
1)+(1/ε2)−1) A1 :ヒーター面積、 T1 :ヒーター温度 T2 :被加熱体温度 ε1 :ヒーター放射率 ε2 :被加熱体放射率 によって算出されるが、この放射はその加熱物、加熱源
の放射率(ε1 )が小さくなることによって小さくな
り、したがってこの熱損失が減少する。したがって、こ
の複層セラミックヒーターにおいて、加熱対象のない方
の面に放射率(ε1 )の小さい層を設けると、その面で
放射熱損失が減るので、このヒーターは省エネルギータ
イプのものとなるが、この放射率(ε1 )はこれが 0.2
より大きいと伝熱量が大となるので、 0.2以下のものと
することが必要とされる。
[0009] the heat transfer amount Q Hatsugi formula (1) of the radiation from the low emissivity layer Q = 4.88A 1 ((T 1 /100) 4 - (T 2/100) 4) / ((1 / ε
1 ) + (1 / ε 2 ) -1) A 1 : heater area, T 1 : heater temperature T 2 : heated object temperature ε 1 : heater emissivity ε 2 : calculated by the heated object emissivity, This radiation is reduced by reducing the emissivity (ε 1 ) of the heated object, the heating source, and thus this heat loss is reduced. Therefore, in this multi-layer ceramic heater, if a layer having a small emissivity (ε 1 ) is provided on the side not to be heated, the radiant heat loss is reduced on that side, so this heater is an energy-saving type. , This emissivity (ε 1 ) is 0.2
If it is larger than this, the amount of heat transfer will be large, so 0.2 or less is required.

【0010】この低放射率層はW、Ta、Mo、Ptな
どの高融点金属をスパッタ法、EB蒸着法、CVD法な
どの方法で設けたものとすればよいが、これはその面を
研磨することが望ましく、それによればこのヒーターを
その面の放射率が 0.2以下である省エネルギータイプに
最適なものとすることができる。なお、この複層セラミ
ックヒーターによれば消費電力を軽減し、ヒートシール
ドを軽減することができるし、そのことにより装置自体
もコンパクト化することができる。また、このものには
大面積ウェハーの加熱、 1,000℃以上の高温プロセスに
おいてその効果を十分に発揮できるという有利性が与え
られる。
The low-emissivity layer may be formed by providing a refractory metal such as W, Ta, Mo, or Pt by a method such as a sputtering method, an EB vapor deposition method, a CVD method, or the like. This makes it possible to make this heater most suitable for energy-saving type whose surface emissivity is 0.2 or less. In addition, according to this multilayer ceramic heater, power consumption can be reduced and heat shield can be reduced, and thereby the apparatus itself can be made compact. In addition, this product has the advantage that it can fully exert its effects in heating large area wafers and in high temperature processes of 1,000 ° C or higher.

【0011】[0011]

【実施例】つぎに本発明の実施例をあげる。 実施例 厚さ5mm、径 100mmφの Al2O3板の片面にWペーストに
より厚さ50μmのくし型パターンのヒーターを形成し、
その反対側の面には 何もしないもの、 Ptを10μmの厚さにEBガンにより蒸着したも
の、 このPt面をさらにポリッシングにより鏡面加工し
たもの の3種類を準備した。
EXAMPLES Next, examples of the present invention will be given. Example A comb-shaped heater having a thickness of 50 μm was formed on one surface of an Al 2 O 3 plate having a thickness of 5 mm and a diameter of 100 mm by W paste.
On the opposite surface, three types were prepared: one that does nothing, one that Pt is vapor-deposited to a thickness of 10 μm by an EB gun, and one that is Pt surface mirror-finished by polishing.

【0012】このヒーターの裏面の放射率は表1に示し
たようになり、これを 500℃、 1,000℃に加熱するのに
要した電力を測定したところ、図1に示したとおりの結
果が得られ、本発明の複層セラミックヒーターによれば
少ない電力で高温を達成できることが確認された。
The emissivity of the back surface of this heater is as shown in Table 1. The electric power required to heat this heater to 500 ° C. and 1,000 ° C. was measured, and the results shown in FIG. 1 were obtained. It was confirmed that the multi-layer ceramic heater of the present invention can achieve high temperature with less electric power.

【0013】[0013]

【表1】 [Table 1]

【0014】[0014]

【発明の効果】本発明は複層セラミックヒーターに関す
るものであり、これは前記したように絶縁層と導電層と
を積層してなる複層面状セラミックヒーターにおいて、
その加熱面に対して反対側の面に放射率が 0.2以下の低
放射率層を設けてなることを特徴とするものであるが、
このものには加熱対象物を効率よく加熱することがで
き、省電力でこれを高温に加熱することができるという
有利性が与えられる。
The present invention relates to a multi-layer ceramic heater, which is a multi-layer planar ceramic heater having an insulating layer and a conductive layer laminated as described above.
A low emissivity layer with an emissivity of 0.2 or less is provided on the surface opposite to the heating surface.
This has the advantage that the object to be heated can be efficiently heated and can be heated to a high temperature with low power consumption.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例における複層セラミックヒータ
ーの電力(W)と安定温度(℃)との関係グラフを示し
たものである。
FIG. 1 is a graph showing a relationship between electric power (W) and stable temperature (° C.) of a multilayer ceramic heater according to an example of the present invention.

【図2】本発明の複層セラミックヒーターの断面図を示
したものである。
FIG. 2 shows a cross-sectional view of a multilayer ceramic heater of the present invention.

【図3】従来の複層セラミックヒーターの断面図を示し
たものである。
FIG. 3 is a cross-sectional view of a conventional multilayer ceramic heater.

【符号の説明】[Explanation of symbols]

1…基材 2…導電層 3…低放射層 1 ... Substrate 2 ... Conductive layer 3 ... Low emission layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 川田 敦雄 群馬県安中市磯部2丁目13番1号 信越化 学工業株式会社精密機能材料研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Atsushi Kawada 2-13-1, Isobe, Annaka-shi, Gunma Shin-Etsu Chemical Co., Ltd. Precision Materials Research Laboratory

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 絶縁層と導電層を積層してなる複層面状
セラミックヒーターにおいて、その加熱面に対して反対
側の面に放射率が 0.2以下の低放射率層を設けてなるこ
とを特徴とする複層セラミックヒーター。
1. A multi-layer planar ceramic heater comprising a laminate of an insulating layer and a conductive layer, wherein a low emissivity layer having an emissivity of 0.2 or less is provided on a surface opposite to a heating surface thereof. And multi-layer ceramic heater.
【請求項2】 絶縁層が窒化けい素、窒化アルミニウ
ム、窒化ほう素などの窒化物、あるいはアルミナ、石英
などの酸化物よりなり、導電層がW、Pt、Taなどの
高融点金属、あるいはSiC、カーボンなどの導電性セ
ラミックスからなるもので、低放射率層はW、Pt、T
aなどの高純度金属からなるものである請求項1に記載
した複層セラミックヒーター。
2. The insulating layer is made of a nitride such as silicon nitride, aluminum nitride, or boron nitride, or an oxide such as alumina or quartz, and the conductive layer is a refractory metal such as W, Pt, or Ta, or SiC. , E.g., conductive ceramics such as carbon, and the low emissivity layer is made of W, Pt, T
The multilayer ceramic heater according to claim 1, which is made of a high-purity metal such as a.
【請求項3】 絶縁層がCVD法によって作られた窒化
ほう素であり、導電層、低放射率層がCVD、スクリー
ンパターンなどで作られたものである請求項1に記載し
た複層セラミックヒーター。
3. The multi-layer ceramic heater according to claim 1, wherein the insulating layer is boron nitride formed by a CVD method, and the conductive layer and the low emissivity layer are formed by CVD, a screen pattern or the like. .
JP17508094A 1994-07-27 1994-07-27 Multi-layer ceramic heater Pending JPH0845651A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17508094A JPH0845651A (en) 1994-07-27 1994-07-27 Multi-layer ceramic heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17508094A JPH0845651A (en) 1994-07-27 1994-07-27 Multi-layer ceramic heater

Publications (1)

Publication Number Publication Date
JPH0845651A true JPH0845651A (en) 1996-02-16

Family

ID=15989895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17508094A Pending JPH0845651A (en) 1994-07-27 1994-07-27 Multi-layer ceramic heater

Country Status (1)

Country Link
JP (1) JPH0845651A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313890A (en) * 2001-04-11 2002-10-25 Sumitomo Electric Ind Ltd Heater member for mounting object to be heated and substrate processing apparatus using the same
KR100459868B1 (en) * 2002-09-25 2004-12-03 한국과학기술연구원 Composition for low temperature sinterable ceramic heater and fabrication method of ceramic heater
KR20150094712A (en) * 2012-12-14 2015-08-19 어플라이드 머티어리얼스, 인코포레이티드 Thermal radiation barrier for substrate processing chamber components
WO2018079386A1 (en) * 2016-10-24 2018-05-03 日本碍子株式会社 Infrared heater

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313890A (en) * 2001-04-11 2002-10-25 Sumitomo Electric Ind Ltd Heater member for mounting object to be heated and substrate processing apparatus using the same
KR100459868B1 (en) * 2002-09-25 2004-12-03 한국과학기술연구원 Composition for low temperature sinterable ceramic heater and fabrication method of ceramic heater
KR20150094712A (en) * 2012-12-14 2015-08-19 어플라이드 머티어리얼스, 인코포레이티드 Thermal radiation barrier for substrate processing chamber components
JP2016508288A (en) * 2012-12-14 2016-03-17 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Thermal radiation barrier for substrate processing chamber components
US10177014B2 (en) 2012-12-14 2019-01-08 Applied Materials, Inc. Thermal radiation barrier for substrate processing chamber components
WO2018079386A1 (en) * 2016-10-24 2018-05-03 日本碍子株式会社 Infrared heater
CN109845397A (en) * 2016-10-24 2019-06-04 日本碍子株式会社 Infrared heater
JPWO2018079386A1 (en) * 2016-10-24 2019-08-08 日本碍子株式会社 Infrared heater

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