JPH085579A - Micro area X-ray irradiation device - Google Patents

Micro area X-ray irradiation device

Info

Publication number
JPH085579A
JPH085579A JP6134722A JP13472294A JPH085579A JP H085579 A JPH085579 A JP H085579A JP 6134722 A JP6134722 A JP 6134722A JP 13472294 A JP13472294 A JP 13472294A JP H085579 A JPH085579 A JP H085579A
Authority
JP
Japan
Prior art keywords
ray
visible light
optical system
sample
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6134722A
Other languages
Japanese (ja)
Inventor
Hisao Fujisaki
久雄 藤崎
Shinichi Takahashi
進一 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP6134722A priority Critical patent/JPH085579A/en
Publication of JPH085579A publication Critical patent/JPH085579A/en
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To obtain an X-ray irradiation system for microarea by which an X-ray irradiation test can be conducted conveniently and quickly for a microarea on a biological sample. CONSTITUTION:The microarea X-ray irradiation system comprises an X-ray source 20, a visible light source 13, an optical system 25 for condensing the light from the X-ray source or the visible light source toward a sample in a sample case 26, an optical system 27 for imaging a pattern condensed through the condenser optical system 25, an image pickup means 29 disposed at the imaging position of the imaging optical system 27, a vessel 18 for evacuating the optical path between the X-ray source 20 and the image pickup means 29, and means 30 for evacuating the vacuum vessel 18. In such X-ray irradiation system, an X-ray and visible light transmissive window is made through one of two faces intersecting the optical path of the sample case 26 and a visible light transmissive window is made through the other face. The area of the visible light transmissive window is set larger than that of the X-ray and visible light transmissive window.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、試料(生体試料など)
にX線を照射する微小領域X線照射装置に関する。
The present invention relates to a sample (such as a biological sample).
The present invention relates to a small area X-ray irradiating device that irradiates X-rays to the inside.

【0002】[0002]

【従来の技術】近年の生物工学技術の発展は、光学顕微
鏡や電子顕微鏡などの観察手段に負うところが大きい。
ところが、光学顕微鏡は液体中の生きた生体試料を扱え
るのが特長であるが、可視光の波長に空間分解能が制限
される。また、電子顕微鏡は空間分解能は高いが、真空
中に試料を置かなければならず、電子線が透過する窓材
が存在しないために、生きたままでは生体試料を観察で
きなかった。
2. Description of the Related Art Recent developments in biotechnological technology largely depend on observation means such as optical microscopes and electron microscopes.
However, the optical microscope is characterized in that it can handle a living biological sample in a liquid, but its spatial resolution is limited to the wavelength of visible light. Further, although the electron microscope has a high spatial resolution, the sample must be placed in a vacuum, and since there is no window material through which the electron beam passes, the biological sample cannot be observed as it is alive.

【0003】そこで、生きたままの生体試料を高分解能
で観察できる可能性を持つX線顕微鏡が注目され、その
開発がなされている。微細精密工学の発展によってX線
顕微鏡用のX線光学素子の性能が向上し、X線顕微鏡の
試験機が作られるまでになっている。試料容器の窓材に
は、生体試料を観察するのに適している2.4 〜4.4nm
のX線が透過する窒化珪素膜などが用いられている。
Therefore, an X-ray microscope, which has the possibility of observing a living biological sample with high resolution, has attracted attention and has been developed. With the development of fine precision engineering, the performance of X-ray optical elements for X-ray microscopes has been improved, and a tester for X-ray microscopes has been manufactured. The window material of the sample container is suitable for observing biological samples 2.4 ~ 4.4nm
A silicon nitride film or the like that transmits X-rays is used.

【0004】生体試料はX線照射によって損傷を受け易
く、生きたままの試料を観察できないのではないかとい
う懸念があり、X線顕微鏡の実用化が疑問視されてい
る。そこで、生体試料が耐えられるX線の限界量のデー
タを収集するための実験がX線顕微鏡の試験機を用いて
行われている。試料容器は図4に示すようなX線顕微鏡
用のものがそのまま用いられている。
Biological samples are easily damaged by X-ray irradiation, and there is a concern that a living sample cannot be observed. Therefore, the practical application of an X-ray microscope has been questioned. Therefore, an experiment for collecting data on the limit amount of X-rays that a biological sample can withstand is performed using an X-ray microscope tester. The sample container for X-ray microscope as shown in FIG. 4 is used as it is.

【0005】また、放射線被爆による生体の損傷が、原
子炉や核実験など、様々な場面で社会問題になってお
り、放射線の生体に対する作用の解明や、放射線治療な
どのためのデータ収集が急がれている。微小領域X線照
射装置を用いたX線照射による生体試料の損傷の実験
は、この一翼をも担っている。
Further, the damage to the living body due to radiation exposure has become a social problem in various situations such as nuclear reactors and nuclear experiments, and it is urgent to clarify the action of radiation on the living body and collect data for radiation therapy. It is peeling. The experiment on the damage of the biological sample by the X-ray irradiation using the microscopic area X-ray irradiation apparatus also plays a role in this.

【0006】[0006]

【発明が解決しようとする課題】図4に示すような従来
から用いられている試料容器26’は、窒化珪素膜31
を形成したシリコン基板32をバックエッチングしてX
線透過窓を作製した部材を2枚用いている。2枚の部材
に挟まれた試料溶液40の厚さは、前記部材の片方ある
いは両方に形成されたスペーサ34によって調整され
る。X線透過窓は真空の環境下では、内圧(真空との圧
力差)を受けるため大きさに限界がある。即ち、大きす
ぎると内圧で窓材(窒化珪素膜)31が外側にたわみ、
試料溶液が厚くなってX線が透過しなくなる。
A sample container 26 'which has been conventionally used as shown in FIG.
Back etching the silicon substrate 32 on which
Two members having a line-transparent window are used. The thickness of the sample solution 40 sandwiched between the two members is adjusted by the spacer 34 formed on one or both of the members. In a vacuum environment, the X-ray transmission window receives an internal pressure (a pressure difference from the vacuum), and therefore has a limited size. That is, if it is too large, the window material (silicon nitride film) 31 is bent outward by the internal pressure,
The sample solution becomes thick and X-rays cannot be transmitted.

【0007】X線顕微鏡では、試料溶液の厚さを10μ
m以下にする必要があるが、2.4 〜4.4 nmのX線を約
60%透過する0.1 μm程度の厚さ、200μm角の窒
化珪素膜では約3μmたわむので、スペーサを3μm程
度にすることで試料溶液の厚さを10μm以下にしてい
る。試料容器の組立ては光学顕微鏡下で行われるが、試
料容器を構成する2枚の前記部材にそれぞれ設けられた
X線透過窓の大きさが200μm角しかないので、2つ
のX線透過窓の位置を正確に一致させて光学調整(光路
調整)を行うことは、試行錯誤を伴う煩雑な作業になっ
ている。
In the X-ray microscope, the thickness of the sample solution is 10 μm.
It should be less than m, but a silicon nitride film with a thickness of about 0.1 μm and a 200 μm square that transmits about 60% of 2.4 to 4.4 nm X-rays will bend about 3 μm. The thickness of the solution is 10 μm or less. The assembly of the sample container is performed under an optical microscope. However, since the size of the X-ray transmission window provided on each of the two members forming the sample container is only 200 μm square, the positions of the two X-ray transmission windows are different. Performing optical adjustment (optical path adjustment) by accurately matching the above is a complicated task involving trial and error.

【0008】本発明は、試料容器に対向して設けられた
二つの光透過窓の位置を正確に一致させる必要がなく、
そのため試料容器の組み立てが極めて容易であり、さら
に生体試料の微少領域へのX線照射テストを簡便かつ迅
速に行うことができる微小領域X線照射装置を提供する
ことを目的とする。
According to the present invention, it is not necessary to exactly match the positions of the two light transmission windows provided facing the sample container,
Therefore, it is an object of the present invention to provide a micro-area X-ray irradiating device which is extremely easy to assemble a sample container and which can easily and quickly perform an X-ray irradiation test on a microscopic area of a biological sample.

【0009】[0009]

【課題を解決するための手段】そのため、本発明は第一
に「少なくとも、X線を発生するX線源、可視光を発生
する可視光源、該X線源又は可視光源から出射した光を
試料容器中の試料に、又は試料設置箇所に集光するコン
デンサー光学系、該コンデンサー光学系による集光パタ
ーンを結像させる結像光学系、該結像光学系による結像
位置に配置された撮像手段、前記X線源から該撮像手段
までの光路を真空にするための真空容器、及び該真空容
器を真空に排気するための排気手段、を有する微小領域
X線照射装置において、前記試料容器の前記光路と交差
する二つの面のうち、一方の面にX線及び可視光の透過
窓を、他方の面に可視光透過窓をそれぞれ設け、かつ、
可視光透過窓の面積をX線及び可視光の透過窓の面積よ
りも大きくしたことを特徴とする微小領域X線照射装置
(請求項1)」を提供する。
Therefore, the first aspect of the present invention is to provide "at least an X-ray source that generates X-rays, a visible light source that emits visible light, and a sample that emits light emitted from the X-ray source or the visible light source. Condenser optical system for condensing on a sample in a container or at a place where the sample is installed, image forming optical system for forming an image of a condensing pattern by the condenser optical system, and image pickup means arranged at an image forming position by the image forming optical system. A micro-region X-ray irradiator comprising: a vacuum container for evacuating an optical path from the X-ray source to the imaging means; and an evacuation means for evacuating the vacuum container to a vacuum. Of the two surfaces intersecting the optical path, one surface is provided with a transparent window for X-rays and visible light, and the other surface is provided with a visible light transparent window, and
There is provided a minute area X-ray irradiator (claim 1), characterized in that the area of the visible light transmitting window is made larger than the area of the X-ray and visible light transmitting window.

【0010】また、本発明は第二に「前記コンデンサー
光学系及び前記結像光学系を反射型光学素子を用いた各
光学系としたことを特徴とする請求項1記載の微小領域
X線照射装置(請求項2)」を提供する。また、本発明
は第三に「前記コンデンサー光学系を反射型光学素子を
用いた光学系としたことを特徴とする請求項1記載の微
小領域X線照射装置(請求項3)」を提供する。
A second aspect of the present invention is that "the condenser optical system and the imaging optical system are each optical system using a reflection type optical element, and the minute area X-ray irradiation is performed. Apparatus (claim 2) ". Further, the present invention thirdly provides a "small area X-ray irradiating apparatus (claim 3)" in which the condenser optical system is an optical system using a reflection type optical element. .

【0011】また、本発明は第四に「前記反射型光学素
子が回転楕円面多層膜鏡、回転放物面多層膜鏡、シュワ
ルツシルト鏡、又はウォルター鏡であることを特徴とす
る請求項2又は3記載の微小領域X線照射装置(請求項
4)」を提供する。
A fourth aspect of the present invention is that the reflective optical element is a spheroidal multilayer mirror, a rotating parabolic multilayer mirror, a Schwarzschild mirror, or a Walter mirror. Alternatively, the minute area X-ray irradiator according to claim 3 is provided.

【0012】[0012]

【作用】X線顕微鏡の場合と異なり、本発明にかかる微
小領域X線照射装置の試料容器には、X線を透過する窓
が光源側に1枚あればよく、必ずしもX線透過窓を2枚
使う必要はない。即ち、可視光で焦点合わせができる型
の微小領域X線照射装置では、光源から撮像手段に向か
う光路と交差する試料容器の二つの面のうち、光源側の
面にX線及び可視光の透過窓を、撮像手段側の面に可視
光透過窓をそれぞれ設ければよい。
Unlike the case of the X-ray microscope, the sample container of the micro-area X-ray irradiator according to the present invention needs only one window for transmitting X-rays on the light source side. You don't have to use one. That is, in the microscopic area X-ray irradiator of the type capable of focusing with visible light, of the two surfaces of the sample container intersecting the optical path extending from the light source to the imaging means, the surface on the light source side transmits X-rays and visible light. A window and a visible light transmitting window may be provided on the surface on the image pickup means side.

【0013】可視光透過窓は可視光さえ通ればよいか
ら、窓に厚いガラス板を用いることができる。厚いガラ
ス板は内圧により、たわむことがないので大きさに制限
は生じない。この可視光透過窓をX線透過窓と比べて十
分大きくすれば、窓の位置合わせは特に必要なくなる。
ガラス板の大きさ、および厚さをX線透過窓付きのシリ
コン基板と同じにすれば、従来の試料容器の基部と蓋を
そのまま用いることができるので好ましい。
Since the visible light transmitting window only needs to pass visible light, a thick glass plate can be used for the window. Since the thick glass plate does not bend due to internal pressure, the size is not limited. If the visible light transmitting window is made sufficiently larger than the X-ray transmitting window, the window alignment is not necessary.
It is preferable that the size and the thickness of the glass plate are the same as those of the silicon substrate with the X-ray transmission window because the base and lid of the conventional sample container can be used as they are.

【0014】また、この可視光透過窓の材質はガラスに
限らず、例えば透明プラスチック樹脂等、可視光を通す
材料なら何でもよい。以下、本発明を実施例により更に
詳しく説明するが、本発明はこれらの実施例に限定され
るものではない。
The material of the visible light transmitting window is not limited to glass, and any material that allows visible light to pass, such as transparent plastic resin, may be used. Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

【0015】[0015]

【実施例】図1に第一の実施例として、X線および可視
光による結像にウォルタ鏡を用いる微小領域X線照射装
置の概略構成図を示す。YAGレーザ装置11からの赤
外パルスレーザ光12を赤外光反射鏡15で反射させ、
レーザ光集光用レンズ16でレーザ光導入窓17を通し
て真空容器18の中に設置した標的板19の表面に集光
し、プラズマ(X線源、可視光源の一例)20を生成さ
せる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic block diagram of a micro-area X-ray irradiator using a Walter mirror for imaging with X-rays and visible light as a first embodiment. The infrared pulsed laser light 12 from the YAG laser device 11 is reflected by the infrared light reflecting mirror 15,
The laser light condensing lens 16 condenses the laser light through the laser light introduction window 17 onto the surface of the target plate 19 installed in the vacuum container 18 to generate plasma (an X-ray source, an example of a visible light source) 20.

【0016】プラズマ20はX線や紫外線、可視光等の
プラズマ光21を放射する。X線だけがX線透過フィル
タ22を通り、集光用ウォルタ鏡(コンデンサー光学系
の一例)25によって試料容器26の位置に集光され、
容器内の試料を照射する。試料容器26の位置における
集光パターンの像が結像用ウォルタ鏡(結像光学系の一
例)27によって撮像器(撮像手段の一例)29に形成
される。真空容器18には、真空排気装置(排気手段の
一例)30が接続されている。
The plasma 20 emits plasma light 21 such as X-rays, ultraviolet rays, and visible light. Only the X-rays pass through the X-ray transmission filter 22, and are condensed at the position of the sample container 26 by a Wolter mirror (an example of condenser optical system) 25 for condensing.
Irradiate the sample in the container. An image of the condensing pattern at the position of the sample container 26 is formed on an imager (an example of an image pickup unit) 29 by an image-forming Walter mirror (an example of an image-forming optical system) 27. A vacuum exhaust device (an example of exhaust means) 30 is connected to the vacuum container 18.

【0017】照射装置の光学配置のアライメントは、試
料容器26を取り除いた状態で前記X線を用いて行う。
即ち、撮像器29でX線の良好な集光パターンが得られ
るようにアライメントを行う。次に、アライメントされ
たら、撮像器29にX線の良好な集光パターンを形成し
たままの状態にて、HeNeレーザ装置(可視光源の一
例)13からの可視レーザ光14を赤外光反射鏡15を
透過させ、レーザ光集光用レンズ16でレーザ光導入窓
17を通して標的板19の表面に集光する。
Alignment of the optical arrangement of the irradiation device is performed using the X-ray with the sample container 26 removed.
That is, alignment is performed so that the image pickup device 29 can obtain a good X-ray focusing pattern. Next, after the alignment, the visible laser light 14 from the HeNe laser device (an example of a visible light source) 13 is irradiated with an infrared light reflecting mirror in a state in which a good X-ray focusing pattern is formed on the image pickup device 29. 15 is transmitted, and the laser beam focusing lens 16 focuses the laser beam on the surface of the target plate 19 through the laser beam introduction window 17.

【0018】フィルタ操作機24でX線透過フィルタ2
2を光路から退避させると、標的板19の表面からの散
乱光は、集光用ウォルタ鏡25によって集光され、その
集光パターンの像が結像用ウォルタ鏡27によって撮像
器29に形成される。この集光の位置が前記X線集光の
位置に一致するように、HeNeレーザ装置13の位置
を調整する。こうすることによってX線の集光位置を可
視光を用いて知ることができる。
The filter operating unit 24 is used to transmit the X-ray transmission filter 2
When 2 is retracted from the optical path, the scattered light from the surface of the target plate 19 is condensed by the condensing Walter mirror 25, and an image of the condensing pattern is formed on the imager 29 by the imaging Walter mirror 27. It The position of the HeNe laser device 13 is adjusted so that the position of this light focusing coincides with the position of the X-ray focusing. By doing so, the condensing position of the X-ray can be known using visible light.

【0019】試料にX線を照射するときには、まず、X
線透過フィルタ22を光路から退避させた状態で、撮像
器によって観察しながら可視光の集光位置に試料容器2
6の位置を合わせ、試料の照射部分を確認する。つぎ
に、X線透過フィルタ22を光路に挿入し、YAGレー
ザ装置から赤外パルスレーザ光を照射すると、試料上の
所望の位置にX線が集光・照射される。
When irradiating a sample with X-rays, first, X
While the line transmission filter 22 is retracted from the optical path, the sample container 2 is placed at the visible light condensing position while observing with the image pickup device.
The positions of 6 are aligned and the irradiated portion of the sample is confirmed. Next, the X-ray transmission filter 22 is inserted in the optical path, and infrared pulsed laser light is emitted from the YAG laser device, so that X-rays are focused and emitted at a desired position on the sample.

【0020】図2に第二の実施例として、可視光での結
像に対物レンズを用いる微小領域X線照射装置の概略構
成図を示す。YAGレーザ装置11からの赤外パルスレ
ーザ光12をレーザ光集光用レンズ16でレーザ光導入
窓17を通して真空容器18の中に設置した標的板19
の表面に集光し、プラズマ20を生成する。プラズマ2
0はX線や紫外線、可視光等のプラズマ光21を放射す
が、フィルタ操作機24を用いて選択されたフィルタに
よってフィルタを透過する光が異なる。真空容器18に
は真空排気装置30が接続されている。
FIG. 2 shows, as a second embodiment, a schematic configuration diagram of a minute area X-ray irradiating apparatus using an objective lens for image formation with visible light. A target plate 19 in which the infrared pulsed laser light 12 from the YAG laser device 11 is set in a vacuum container 18 through a laser light introduction window 17 by a laser light focusing lens 16
The light is focused on the surface of and the plasma 20 is generated. Plasma 2
0 emits plasma light 21 such as X-rays, ultraviolet rays, and visible light, but the light that passes through the filter differs depending on the filter selected using the filter operating unit 24. A vacuum exhaust device 30 is connected to the vacuum container 18.

【0021】照射装置の光学配置のアライメントは、試
料容器26を取り除いた状態でプラズマ20が放射する
プラズマ光21に含まれる可視光を用いて行う。観察試
料や撮像器29を傷めない程度に減光された可視光が透
過するように、フィルタ操作機24によって可視光減光
フィルタ23を光路に挿入する。第一の実施例でX線を
用いて行ったのと同様に、減光した可視光を用いてアラ
イメントを行い、アライメントされたら、試料容器26
を挿入して撮像器により観察しながら可視光の集光位置
に試料容器26の位置を重ね合わせて、試料の照射部分
を確認する。
The alignment of the optical arrangement of the irradiation device is performed by using visible light contained in the plasma light 21 emitted by the plasma 20 with the sample container 26 removed. The visible light extinction filter 23 is inserted into the optical path by the filter operating device 24 so that the visible light that has been dimmed to the extent that the observation sample and the image pickup device 29 are not damaged is transmitted. Similar to the case of using X-rays in the first embodiment, alignment is performed using dimmed visible light, and when aligned, the sample container 26
While observing with an image pickup device, the position of the sample container 26 is overlapped with the position where the visible light is condensed, and the irradiated portion of the sample is confirmed.

【0022】つぎに、フィルタ操作機24によってX線
透過フィルタ22を光路に挿入し、YAGレーザ装置か
ら赤外パルスレーザ光を照射すると、試料上の所望の位
置にX線が集光・照射される。図3に試料容器の一例を
示す。試料容器の基部35にはリング状凹部が1箇所設
けられてゴムのOリング37が、蓋36にはリング状凹
部が2箇所設けられてゴムのOリング37’、39がそ
れぞれ一部露出して埋め込まれている。
Next, the X-ray transmission filter 22 is inserted into the optical path by the filter operating unit 24, and the infrared pulsed laser light is irradiated from the YAG laser device, so that the X-ray is focused and irradiated at a desired position on the sample. It FIG. 3 shows an example of the sample container. The base portion 35 of the sample container is provided with one ring-shaped concave portion to expose a rubber O-ring 37, and the lid 36 is provided with two ring-shaped concave portions to expose a part of the rubber O-rings 37 ′ and 39. It is embedded in.

【0023】フォトレジスト材による3μm厚のスペー
サ34とX線透過窓材である0.1 μm厚の窒化珪素膜と
を形成した0.4 mm厚のシリコン製窓基板32をバック
エッチングしてX線透過窓(可視光透過窓でもある)3
1が作製されている。試料容器の準備には、試料容器基
部35を水平に置き、窓基板32を設置して試料溶液を
窓部に滴下し、窓基板32と同じ大きさ、同じ厚さのガ
ラス板(可視光透過窓に相当する)33を載せる。余分
の試料溶液を濾紙で拭い、蓋36をかぶせてネジ38で
留めると、Oリングによって密閉され真空中でも試料溶
液40は浸出しない。
A 0.4 mm thick silicon window substrate 32 having a 3 μm thick spacer 34 made of a photoresist material and a 0.1 μm thick silicon nitride film which is an X-ray transparent window material is back-etched to form an X-ray transparent window ( It is also a visible light transmission window) 3
1 has been produced. To prepare the sample container, the sample container base 35 is placed horizontally, the window substrate 32 is installed, the sample solution is dropped on the window, and a glass plate of the same size and the same thickness as the window substrate 32 (visible light transmission) is used. 33, which corresponds to the window, is placed. When the excess sample solution is wiped with filter paper, covered with the lid 36 and fastened with the screw 38, the sample solution 40 is sealed by the O-ring and the sample solution 40 does not leach even in vacuum.

【0024】本実施例の試料容器によれば、対向して試
料容器に設けたX線及び可視光の透過窓31と該透過窓
31よりも面積が大きい可視光透過窓33との位置を正
確に一致させる必要がなく、そのため試料容器の組み立
てが極めて容易であった。本実施例では、X線照射用の
試料としてイースト菌を用いた。ドライイーストを水で
戻し、トリパンブルー染色液を加えたものを試料容器2
6に入れ、イースト菌が染色されていないことを光学顕
微鏡で確認した。
According to the sample container of this embodiment, the positions of the X-ray and visible light transmission window 31 and the visible light transmission window 33 having a larger area than that of the transmission window 31 are provided so as to face each other. Therefore, it was extremely easy to assemble the sample container. In this example, yeast was used as a sample for X-ray irradiation. Sample container 2 with dry yeast reconstituted with water and trypan blue stain added
It was put in No. 6, and it was confirmed by an optical microscope that yeast was not stained.

【0025】試料容器26を微小領域X線照射装置に装
着し、可視光で焦点合わせをしてからX線を照射した。
試料容器を取り出し、光学顕微鏡で試料を観察した。強
いX線を当てたイースト菌だけが染色され、そのまわり
のX線が当たっていないイースト菌は染色されないこと
が観察され、イースト菌は強いX線が当たると色素排除
能力を失うことが分かった。
The sample container 26 was attached to a microscopic area X-ray irradiator and focused with visible light before irradiating with X-rays.
The sample container was taken out and the sample was observed with an optical microscope. It was observed that only yeasts exposed to strong X-rays were stained and surrounding yeasts not exposed to X-rays were not stained, and it was found that yeasts lose their dye exclusion ability when exposed to strong X-rays.

【0026】上記第一および第二の実施例では、X線集
光鏡、X線結像鏡としてウォルタ鏡を用いたが、これら
はウォルタ鏡に限らずX線と可視光の焦点が一致するも
のであれば、シュワルツシルト鏡、回転楕円面多層膜鏡
なども使える。また、シンクロトロン放射光を光源とし
た微小領域X線照射装置も作製可能であり、シンクロト
ロン放射光は平行光と見なすことができるので、これを
集光するのには回転放物面多層膜鏡が用いられる。
In the first and second embodiments described above, the Wolter mirror is used as the X-ray focusing mirror and the X-ray imaging mirror, but these are not limited to the Walter mirror and the focal points of X-ray and visible light coincide with each other. You can also use Schwarzschild mirror, spheroid multilayer mirror, etc. Further, a micro-area X-ray irradiator using synchrotron radiation as a light source can be manufactured, and synchrotron radiation can be regarded as parallel light. A mirror is used.

【0027】[0027]

【発明の効果】本発明の微小領域X線照射装置によれ
ば、対向して試料容器に設けられた二つの光透過窓の位
置を正確に一致させる必要がなく、そのため試料容器の
組み立てが極めて容易であり、さらに生体試料の微小領
域へのX線照射テストを簡便かつ迅速に行うことができ
る。
According to the micro-area X-ray irradiator of the present invention, it is not necessary to accurately align the positions of the two light transmission windows provided on the sample container so as to face each other, and therefore the sample container can be assembled extremely easily. It is easy, and moreover, an X-ray irradiation test on a minute area of a biological sample can be performed simply and quickly.

【図面の簡単な説明】[Brief description of drawings]

【図1】は、本発明の微小領域X線照射装置の第一の実
施例(概略構成図)であり、X線および可視光による結
像にウォルタ鏡を用いる。
FIG. 1 is a first embodiment (schematic configuration diagram) of a micro-area X-ray irradiator of the present invention, which uses a Walter mirror for imaging with X-rays and visible light.

【図2】は、本発明の微小領域X線照射装置の第二の実
施例(概略構成図)であり、可視光による結像に対物レ
ンズを用いる。
FIG. 2 is a second embodiment (schematic configuration diagram) of a microscopic area X-ray irradiator of the present invention, which uses an objective lens for imaging with visible light.

【図3】は、本発明の微小領域X線照射装置用の試料容
器の一例である。
FIG. 3 is an example of a sample container for a micro-area X-ray irradiator of the present invention.

【図4】は、従来の微小領域X線照射装置用の試料容器
の一例である。
FIG. 4 is an example of a sample container for a conventional micro area X-ray irradiation device.

【符号の説明】[Explanation of symbols]

11 YAGレーザ装置 12 赤外パルスレーザ光 13 HeNeレーザ装置(可視光源の一例) 14 可視レーザ光 15 赤外光反射鏡 16 レーザ光集光用レンズ 17 レーザ光導入窓 18 真空容器 19 標的板 20 プラズマ(X線源、可視光源の一例) 21 プラズマ光 22 X線透過フィルタ 23 可視光減光フィルタ 24 フィルタ交換器 25 集光用ウォルタ鏡(コンデンサー光学系の一例) 26 試料容器 27 結像用ウォルタ鏡(結像光学系の一例) 28 可視光用結像レンズ(対物レンズ、結像光学系の
一例)) 29 撮像器(撮像手段の一例) 30 真空排気装置(排気手段の一例) 31 X線及び可視光の透過窓 32 窓基板 33 ガラス板(可視光透過窓の一例) 34 スペーサ 35 試料容器基部 36 試料容器蓋 37 Oリング 37’Oリング 38 ネジ 39 Oリング 40 試料溶液 以 上
11 YAG Laser Device 12 Infrared Pulse Laser Light 13 HeNe Laser Device (Example of Visible Light Source) 14 Visible Laser Light 15 Infrared Light Reflecting Mirror 16 Laser Light Condensing Lens 17 Laser Light Introducing Window 18 Vacuum Container 19 Target Plate 20 Plasma (Examples of X-ray source and visible light source) 21 Plasma light 22 X-ray transmission filter 23 Visible light dimming filter 24 Filter exchanger 25 Condensing wolter mirror (an example of condenser optical system) 26 Sample container 27 Imaging wolter mirror (Example of Imaging Optical System) 28 Imaging Lens for Visible Light (Example of Objective Lens, Imaging Optical System) 29 Imager (Example of Imaging Unit) 30 Vacuum Evacuation Device (Example of Exhaust Unit) 31 X-ray and Visible light transmission window 32 Window substrate 33 Glass plate (an example of visible light transmission window) 34 Spacer 35 Sample container base 36 Sample container lid 37 O phosphorus 37'O ring 38 threaded 39 O-ring 40 sample solution than on

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 少なくとも、X線を発生するX線源、可
視光を発生する可視光源、該X線源又は可視光源から出
射した光を試料容器中の試料に、又は試料設置箇所に集
光するコンデンサー光学系、該コンデンサー光学系によ
る集光パターンを結像させる結像光学系、該結像光学系
による結像位置に配置された撮像手段、前記X線源から
該撮像手段までの光路を真空にするための真空容器、及
び該真空容器を真空に排気するための排気手段、を有す
る微小領域X線照射装置において、 前記試料容器の前記光路と交差する二つの面のうち、一
方の面にX線及び可視光の透過窓を、他方の面に可視光
透過窓をそれぞれ設け、かつ、可視光透過窓の面積をX
線及び可視光の透過窓の面積よりも大きくしたことを特
徴とする微小領域X線照射装置。
1. At least an X-ray source for generating X-rays, a visible light source for generating visible light, and light emitted from the X-ray source or the visible light source on a sample in a sample container or at a sample installation location. A condenser optical system, an image forming optical system for forming an image of a condensing pattern by the condenser optical system, an image pickup means arranged at an image forming position by the image forming optical system, and an optical path from the X-ray source to the image pickup means. A micro-region X-ray irradiator having a vacuum container for creating a vacuum, and an exhaust unit for exhausting the vacuum container to a vacuum, wherein one surface of two surfaces intersecting the optical path of the sample container Is provided with an X-ray and visible light transmission window and the other surface is provided with a visible light transmission window, and the area of the visible light transmission window is X.
A micro-area X-ray irradiator characterized by being made larger than the area of a transmission window for rays and visible light.
【請求項2】 前記コンデンサー光学系及び前記結像光
学系を反射型光学素子を用いた各光学系としたことを特
徴とする請求項1記載の微小領域X線照射装置。
2. The micro area X-ray irradiator according to claim 1, wherein the condenser optical system and the imaging optical system are each optical system using a reflection type optical element.
【請求項3】 前記コンデンサー光学系を反射型光学素
子を用いた光学系としたことを特徴とする請求項1記載
の微小領域X線照射装置。
3. The micro area X-ray irradiator according to claim 1, wherein the condenser optical system is an optical system using a reflection type optical element.
【請求項4】 前記反射型光学素子が回転楕円面多層膜
鏡、回転放物面多層膜鏡、シュワルツシルト鏡、又はウ
ォルター鏡であることを特徴とする請求項2又は3記載
の微小領域X線照射装置。
4. The micro area X according to claim 2, wherein the reflective optical element is a spheroidal multilayer mirror, a paraboloid multilayer mirror, a Schwarzschild mirror, or a Walter mirror. X-ray irradiation device.
JP6134722A 1994-06-16 1994-06-16 Micro area X-ray irradiation device Pending JPH085579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6134722A JPH085579A (en) 1994-06-16 1994-06-16 Micro area X-ray irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6134722A JPH085579A (en) 1994-06-16 1994-06-16 Micro area X-ray irradiation device

Publications (1)

Publication Number Publication Date
JPH085579A true JPH085579A (en) 1996-01-12

Family

ID=15135076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6134722A Pending JPH085579A (en) 1994-06-16 1994-06-16 Micro area X-ray irradiation device

Country Status (1)

Country Link
JP (1) JPH085579A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010261951A (en) * 2009-05-05 2010-11-18 Media Lario Srl Zone optimization mirror and optical system using the same mirror
WO2023203856A1 (en) * 2022-04-22 2023-10-26 株式会社リガク Semiconductor inspecting device, semiconductor inspecting system, and semiconductor inspecting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010261951A (en) * 2009-05-05 2010-11-18 Media Lario Srl Zone optimization mirror and optical system using the same mirror
WO2023203856A1 (en) * 2022-04-22 2023-10-26 株式会社リガク Semiconductor inspecting device, semiconductor inspecting system, and semiconductor inspecting method

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