JPH0859611A - Production of heterocyclic derivative - Google Patents
Production of heterocyclic derivativeInfo
- Publication number
- JPH0859611A JPH0859611A JP22596294A JP22596294A JPH0859611A JP H0859611 A JPH0859611 A JP H0859611A JP 22596294 A JP22596294 A JP 22596294A JP 22596294 A JP22596294 A JP 22596294A JP H0859611 A JPH0859611 A JP H0859611A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- substituent
- group
- compound represented
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000623 heterocyclic group Chemical group 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 45
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 28
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 13
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 11
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 11
- 239000002585 base Substances 0.000 claims abstract description 10
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 5
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 3
- 125000001424 substituent group Chemical group 0.000 claims description 54
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 abstract description 10
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 abstract description 10
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract description 10
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 238000007363 ring formation reaction Methods 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 5
- 238000003786 synthesis reaction Methods 0.000 abstract description 5
- 229930192474 thiophene Natural products 0.000 abstract description 5
- 150000002576 ketones Chemical class 0.000 abstract description 2
- 239000002243 precursor Substances 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 23
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- -1 nitro, sulfonyl Chemical group 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000004471 Glycine Substances 0.000 description 5
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 150000007529 inorganic bases Chemical class 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003302 alkenyloxy group Chemical group 0.000 description 2
- 125000005108 alkenylthio group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000005133 alkynyloxy group Chemical group 0.000 description 2
- 125000005109 alkynylthio group Chemical group 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- KJPYNVNXXUELAB-UHFFFAOYSA-N diethyl 3-methyl-1h-pyrrole-2,4-dicarboxylate Chemical compound CCOC(=O)C1=CNC(C(=O)OCC)=C1C KJPYNVNXXUELAB-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- NTNZTEQNFHNYBC-UHFFFAOYSA-N ethyl 2-aminoacetate Chemical compound CCOC(=O)CN NTNZTEQNFHNYBC-UHFFFAOYSA-N 0.000 description 2
- IQANECQLWTYWGR-UHFFFAOYSA-N ethyl 2-methylidene-3-oxobutanoate Chemical group CCOC(=O)C(=C)C(C)=O IQANECQLWTYWGR-UHFFFAOYSA-N 0.000 description 2
- MMDOYVVZUVZLHQ-UHFFFAOYSA-N ethyl 4-methyl-1h-pyrrole-3-carboxylate Chemical compound CCOC(=O)C1=CNC=C1C MMDOYVVZUVZLHQ-UHFFFAOYSA-N 0.000 description 2
- ZNSIHGXAXBRNSW-UHFFFAOYSA-N ethyl 4-methylthiophene-3-carboxylate Chemical compound CCOC(=O)C1=CSC=C1C ZNSIHGXAXBRNSW-UHFFFAOYSA-N 0.000 description 2
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- TXTWXQXDMWILOF-UHFFFAOYSA-N (2-ethoxy-2-oxoethyl)azanium;chloride Chemical compound [Cl-].CCOC(=O)C[NH3+] TXTWXQXDMWILOF-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- UGELJEHAACFCJC-UHFFFAOYSA-N ethyl 1-acetyl-4-methylpyrrole-3-carboxylate Chemical compound CCOC(=O)c1cn(cc1C)C(C)=O UGELJEHAACFCJC-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000001766 physiological effect Effects 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- GNBVPFITFYNRCN-UHFFFAOYSA-M sodium thioglycolate Chemical compound [Na+].[O-]C(=O)CS GNBVPFITFYNRCN-UHFFFAOYSA-M 0.000 description 1
- 229940046307 sodium thioglycolate Drugs 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
Landscapes
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Furan Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Pyrrole Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は電子吸引性基を3位に有
するピロ−ル、フランおよびチオフェン等のヘテロ環誘
導体の簡便で収率のよい製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a heterocyclic derivative having an electron-withdrawing group at the 3-position such as pyrrole, furan and thiophene in a simple and high yield.
【0002】[0002]
【従来の技術】ピロ−ル、フランおよびチオフェン類の
合成法の中で、(3+2)のユニットからなる環化法
は、「2」のユニットとして、α位にヘテロ原子(N,
O,S)をもつ酢酸誘導体(即ち、グリシン、グリコ−
ル酸、チオグリコ−ル酸誘導体)を用いることができ、
これら誘導体は容易にかつ安価に入手できるので極めて
有効な方法である。この方法に従う報告例は数多く知ら
れていて、ComprehensiveHeterocyclic Chemistry,vol.
4.,Part 3.(1984) p123−125 ; CA.,80,59815;CA.,87,2
2933; J.Chem.Soc.,Chem.Commun.,472,1976; EP.18273
8; Helv.Chim.Acta. 65,1694,1982; J.Med.Chem.,23,48
1,1980; Heterocycles,31,1049,1990;Synthesis,389,19
90 に記載されている。これらの報告例は、「3」のユ
ニットが生理活性などのある特殊な目的に沿うように合
成されたものであり一般性に欠ける、環化までの前駆体
合成が簡便ではない、環化収率が低いなどの問題点を有
している。2. Description of the Related Art Among the methods for synthesizing pyrrole, furan and thiophene, the cyclization method consisting of a unit of (3 + 2) is a unit of "2", and a hetero atom (N,
Acetic acid derivatives with O, S) (ie glycine, glyco-
Acid, thioglycolic acid derivative),
These derivatives are extremely effective methods because they are easily and inexpensively available. There are many known reports that follow this method, Comprehensive Heterocyclic Chemistry, vol.
4., Part 3. (1984) p123−125; CA., 80 , 59815; CA., 87 , 2
2933; J. Chem. Soc., Chem. Commun., 472, 1976; EP. 18273.
8; Helv.Chim.Acta. 65 , 1694,1982; J.Med.Chem., 23 , 48
1,1980; Heterocycles, 31 , 1049,1990; Synthesis, 389,19
90. In these reports, the unit of "3" was synthesized so as to meet a special purpose such as physiological activity and lacks generality. It is not convenient to synthesize a precursor until cyclization, and cyclization yield is low. It has problems such as a low rate.
【0003】[0003]
【発明が解決しようとする課題】本発明は、α、β−不
飽和ケトンのα位に電子吸引性基を導入することによ
り、3位に電子吸引性基を有するピロ−ル、フランおよ
びチオフェン等のヘテロ環誘導体の製造を簡便に収率よ
く工業的に有利に実施できる方法を提供することを目的
とする。DISCLOSURE OF THE INVENTION The present invention provides a pyrrole, a furan and a thiophene having an electron-withdrawing group at the 3-position by introducing an electron-withdrawing group at the α-position of an α, β-unsaturated ketone. It is an object of the present invention to provide a method by which the production of a heterocyclic derivative such as can be carried out conveniently in a high yield and industrially advantageously.
【0004】[0004]
1.発明の構成 本発明は、下記工程a及びbを経ることを特徴とする、
式〔I〕1. The invention is characterized in that the following steps a and b are performed,
Formula [I]
【化11】 で表されるヘテロ環誘導体の製造法である。ここで、R1
は置換基を有してもよいアルキル基、置換基を有しても
よいアルケニル基、置換基を有してもよいアルキニル
基、置換基を有してもよいアリール基、置換基を有して
もよいヘテロ環又はCOOR4 を表す。R2は電子吸引性基を
表す。R3は水素原子又は置換基を有してもよいアルキル
基を表す。X はNR5 、O 又はS を表す。Y は水素原子、
カルボキシ基、COOR6 又はシアノ基を表す。R5は水素原
子、置換基を有してもよいアルキル基、置換基を有して
もよいアルケニル基、置換基を有してもよいアルキニル
基、置換基を有してもよいアリール基、置換基を有して
もよいヘテロ環又はCOR7を表す。R4、R6は置換基を有し
てもよいアルキル基、置換基を有してもよいアルケニル
基、置換基を有してもよいアルキニル基、置換基を有し
てもよいアリール基又は置換基を有してもよいヘテロ環
を表す。R7は置換基を有してもよいアルキル基を表す。 工程a: 式〔II〕[Chemical 11] Is a method for producing a heterocyclic derivative. Where R 1
Is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an aryl group which may have a substituent, and a substituent Optionally represents a heterocycle or COOR 4 . R 2 represents an electron-withdrawing group. R 3 represents a hydrogen atom or an alkyl group which may have a substituent. X represents NR 5 , O or S. Y is a hydrogen atom,
Represents a carboxy group, COOR 6 or cyano group. R 5 is a hydrogen atom, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an aryl group which may have a substituent, It represents a heterocycle optionally having a substituent or COR 7 . R 4 and R 6 are an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an aryl group which may have a substituent, or It represents a heterocycle which may have a substituent. R 7 represents an alkyl group which may have a substituent. Step a: Formula [II]
【化12】R1COC(=CR3-OR8)R2 〔II〕 〔式中、R1、R2およびR3は前記と同じ意味を表す。R8は
水素原子又は置換基を有してもよいアルキル基を表
す。〕で表される化合物と、式〔III 〕Embedded image R 1 COC (= CR 3 —OR 8 ) R 2 [II] [In the formula, R 1 , R 2 and R 3 have the same meanings as described above. R 8 represents a hydrogen atom or an alkyl group which may have a substituent. ] A compound represented by the formula [III]
【化13】HX'CH2Y' 〔III 〕 〔式中、X'はNR4'、O 又はS を表す。R4' は水素原子、
置換基を有してもよいアルキル基、置換基を有してもよ
いアルケニル基、置換基を有してもよいアルキニル基、
置換基を有してもよいアリール基、置換基を有してもよ
いヘテロ環を表す。Y'はCOOM、COOR6 又はシアノ基を表
す。M はアルカリ金属を表す。R6は前記と同じ意味を表
す。〕で表される化合物とを反応させて、式〔IV〕Embedded image HX′CH 2 Y ′ [III] [wherein, X ′ represents NR 4 ′, O or S 2. R 4 'is a hydrogen atom,
An alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent,
It represents an aryl group which may have a substituent or a heterocycle which may have a substituent. Y'represents COOM, COOR 6 or a cyano group. M represents an alkali metal. R 6 has the same meaning as described above. ] By reacting with a compound represented by the formula [IV]
【化14】R1COC(=CR3-X'CH2Y')R2 〔IV〕 〔式中、R1,R2、R3、X'、Y'は前記と同じ意味を表
す。〕で表される化合物を製造する工程。 工程b: 式〔IV' 〕Embedded image R 1 COC (= CR 3 —X′CH 2 Y ′) R 2 [IV] [In the formula, R 1 , R 2 , R 3 , X ′, and Y ′ have the same meanings as described above. ] The process of manufacturing the compound represented by these. Step b: Formula [IV ']
【化15】R1COC(=CR3-X'CH2Y")R2 〔IV' 〕 〔式中、Y"はカルボキシ基、COOM、COOR6 又はシアノ基
を表す。M 及びR6は前記と同じ意味を表す。〕で表され
る化合物を、塩基又は式〔V〕Embedded image R 1 COC (= CR 3 —X′CH 2 Y ″) R 2 [IV ′] [In the formula, Y ″ represents a carboxy group, COOM, COOR 6 or a cyano group. M and R 6 have the same meanings as described above. ] The compound represented by the base or formula [V]
【化16】R7COOCOR7 〔V〕 〔式中、R7は前記と同じ意味を表す。〕で表される化合
物存在下に閉環反応させて、式〔I〕Embedded image R 7 COOCOR 7 [V] [In the formula, R 7 represents the same meaning as described above. ] The compound of formula [I]
【化17】 〔式中、R1,R2、R3、X 、Y は前記と同じ意味を表
す。〕で表される化合物を製造する工程。但し、工程b
を式〔V〕で表される化合物存在下に行う場合は、X'が
NHのときX はNCOR7 (R7は前記と同じ意味を表す。)で
あり、Y"がカルボキシ基又はCOOM(M は前記と同じ意味
を表す。)のときY は水素原子である。[Chemical 17] [In the formula, R 1 , R 2 , R 3 , X and Y have the same meanings as described above. ] The process of manufacturing the compound represented by these. However, step b
Is carried out in the presence of a compound represented by the formula [V], X ′ is
In the case of NH, X is NCOR 7 (R 7 has the same meaning as described above), and when Y ″ is a carboxy group or COOM (M has the same meaning as described above), Y 2 is a hydrogen atom.
【0005】2.詳細な説明 R1、R4、R5、R6、R7のアルキル基、アルケニル基、アル
キニル基の置換基としては、例えば、ハロゲン、アルコ
キシ、アルケニルオキシ、アルキニルオキシ基、フェノ
キシ基、アルキルチオ基、アルケニルチオ基、アルキニ
ルチオ基、フェニルチオ基、シアノ、アルコキシカルボ
ニル、ニトロ、ジアルキルアミノ、(アルキルまたはア
ルキルなどの置換基を有してもよいアリ−ルなどの)置
換基を有してもよいスルホニルなどが挙げられる。R1、
R4、R5、R6のアリ−ル、ヘテロ環の置換基としては、C1
〜C10 のアルキル基、アルキル基、アルケニル基、アル
キニル基、ハロゲン、アルコキシ、アルケニルオキシ、
アルキニルオキシ基、フェノキシ基、アルキルチオ基、
アルケニルチオ基、アルキニルチオ基、フェニルチオ
基、シアノ、アルコキシカルボニル、アシル、ニトロ、
ジアルキルアミノ、(アルキルまたはアルキルなどの置
換基を有してもよいアリ−ルなどの)置換基を有しても
よいスルホニルなどが挙げられる。R2としては、アルコ
キシカルボニル、アシル、シアノ、ニトロ、(アルキル
またはアルキルなどの置換基を有してもよいアリ−ルな
どの)置換基を有してもよいスルホニル、トリフルオロ
メチル及びテトラフルオロエチル等のハロアルキルなど
の電子吸引性基が挙げられる。R3としては、水素原子、
C1〜C6のアルキル基などが挙げられる。R7としては、通
常、C1〜C6のアルキル基、トリクロロメチル、トリフル
オロメチル等のハロアルキル基などである。R8として
は、通常、水素原子、C1〜C6のアルキル基などである。
本発明において、アルキル基は通常C1〜C10 であるが、
C11 以上でもよい。またX がS の場合は、Y は水素原
子、カルボキシ基、又はシアノ基がよい。[0005] 2. Detailed Description The substituent of the alkyl group, alkenyl group and alkynyl group for R 1 , R 4 , R 5 , R 6 and R 7 includes, for example, halogen, alkoxy, alkenyloxy, alkynyloxy group, phenoxy group and alkylthio group. , An alkenylthio group, an alkynylthio group, a phenylthio group, a cyano group, an alkoxycarbonyl group, a nitro group, a dialkylamino group, and a substituent (such as an aryl which may have a substituent such as alkyl or alkyl). Examples thereof include sulfonyl and the like. R 1 ,
R 4 , R 5 and R 6 are aryl, and the substituent of the heterocycle is C 1
~ C 10 alkyl group, alkyl group, alkenyl group, alkynyl group, halogen, alkoxy, alkenyloxy,
Alkynyloxy group, phenoxy group, alkylthio group,
Alkenylthio group, alkynylthio group, phenylthio group, cyano, alkoxycarbonyl, acyl, nitro,
And dialkylamino, sulfonyl which may have a substituent (such as alkyl or aryl which may have a substituent such as alkyl), and the like. R 2 is alkoxycarbonyl, acyl, cyano, nitro, sulfonyl which may have a substituent (such as alkyl or aryl which may have a substituent such as alkyl), trifluoromethyl and tetrafluoro. Electron withdrawing groups such as haloalkyl such as ethyl. R 3 is a hydrogen atom,
Examples thereof include C 1 to C 6 alkyl groups. R 7 is usually a C 1 -C 6 alkyl group, a haloalkyl group such as trichloromethyl, trifluoromethyl, or the like. R 8 is usually a hydrogen atom, a C 1 -C 6 alkyl group, or the like.
In the present invention, the alkyl group is usually C 1 to C 10 ,
C 11 or higher is acceptable. When X is S, Y is preferably a hydrogen atom, a carboxy group or a cyano group.
【0006】工程aの説明Description of step a
【化18】 式〔II〕〔式中、R1、R2、R3及びR8は前記と同じ意味を
表す。〕で表される化合物と式〔III 〕〔式中、X'及び
Y'は前記と同じ意味を表す。〕で表される化合物を反応
させることにより行われる。式〔II〕で表される化合物
は、例えば、J.Org.Chem.,49,140,1984 やJ.Heterocycl
ic Chem., 13,973,1976 などに記載された方法により容
易に合成できる。式〔III 〕で表される化合物は、例え
ば市販品をそのまま使用してもよいし、場合によりグリ
シン、グリコ−ル酸あるいはチオグリコ−ル酸とアルカ
リ金属水酸化物とをエタノ−ルなどのアルコ−ル中で混
合、溶解させることによって製造する。次に、式〔III
〕で表される化合物のアルコ−ル溶液と、等量の式〔I
I〕で表される化合物を混合する。この時のアルコ−ル
の使用量は任意である。また、DMF,DMSOなどの非プロト
ン性極性溶媒を使ってもよい。特に、式〔III 〕でX'が
O またはS の場合は、〔II〕との反応において塩基を使
用する。塩基としては、水酸化カリウムなどの無機塩
基、あるいはアルコラ−ト、アミン類などの有機塩基を
例示できる。好ましくは1当量の水酸化カリウムまたは
水酸化ナトリウムなどの無機塩基である。反応は、室温
〜100 ℃、10分〜5 時間、好ましくは50〜80℃、30分〜
2 時間攪拌し、溶媒を留去後、粗製の式〔IV〕で表され
る化合物を得ることができる。式〔IV〕でY'がカルボン
酸のアルカリ金属塩の場合は塩酸などの酸を加えてカル
ボン酸へ誘導して使ってもよい。これら粗製の化合物は
そのまま次の工程で使用してもよいし、通常の精製(再
結晶やカラムクロマトグラフィ−など)を施してもよ
い。Embedded image Formula [II] [In the formula, R 1 , R 2 , R 3 and R 8 have the same meanings as described above. ] And a compound represented by the formula [III] [wherein X'and
Y'has the same meaning as described above. ] It is carried out by reacting a compound represented by The compound represented by the formula [II] is, for example, J. Org. Chem., 49 , 140, 1984 or J. Heterocycl
It can be easily synthesized by the method described in ic Chem., 13 , 973, 1976. As the compound represented by the formula [III], for example, a commercially available product may be used as it is, and in some cases, glycine, glycolic acid or thioglycolic acid and an alkali metal hydroxide are mixed with alcohol such as ethanol. Manufactured by mixing and dissolving in a solvent. Next, the formula [III
] An alcohol solution of the compound represented by
The compound represented by I] is mixed. The amount of alcohol used at this time is arbitrary. Further, an aprotic polar solvent such as DMF or DMSO may be used. In particular, in the formula [III], X'is
In the case of O or S, a base is used in the reaction with [II]. Examples of the base include inorganic bases such as potassium hydroxide, and organic bases such as alcoholates and amines. Preferred is 1 equivalent of an inorganic base such as potassium hydroxide or sodium hydroxide. The reaction is carried out at room temperature to 100 ° C for 10 minutes to 5 hours, preferably at 50 to 80 ° C for 30 minutes.
After stirring for 2 hours and evaporating the solvent, a crude compound of the formula [IV] can be obtained. When Y ′ in the formula [IV] is an alkali metal salt of a carboxylic acid, it may be used by adding an acid such as hydrochloric acid to form a carboxylic acid. These crude compounds may be used as they are in the next step, or may be subjected to ordinary purification (recrystallization, column chromatography, etc.).
【0007】工程bの説明Description of step b
【化19】 式〔IV' 〕〔式中、R1、R2、R3、X'及びY"は前記と同じ
意味を表す。〕で表される化合物を、塩基又は式〔V〕
〔式中、R7は前記と同じ意味を表す。〕で表される化合
物存在下に閉環反応させることにより行われる。[Chemical 19] A compound represented by the formula [IV ′] [wherein R 1 , R 2 , R 3 , X ′ and Y ″ have the same meanings as described above] is a base or a formula [V]
[In the formula, R 7 represents the same meaning as described above. ] It is performed by carrying out a ring closure reaction in the presence of a compound represented by
【0008】b−1)塩基存在下に行う場合 式〔IV' 〕で表される化合物を塩基存在下に閉環反応さ
せる。塩基としては水酸化カリウム、水酸化ナトリウ
ム、金属ナトリウムまたは水素化ナトリウムなどの無機
塩基やナトリウムアルコラ−ト、tert−ブトキシカリウ
ムなどの有機塩基を例示できる。好ましくは、1当量の
ナトリウムアルコラ−トである。溶媒としては、アルコ
−ル類、BTX 系の炭化水素類、エ−テル類、DMF または
これらの混合物などが挙げられるが、好ましくはメタノ
−ルやエタノ−ルなどのアルコ−ル類である。反応は室
温〜100 ℃、10分〜10時間、好ましくは50〜80℃、1時
間〜3時間かくはんすることにより行う。Y'は好ましく
はカルボキシ基、COOR6 又はシアノ基、より好ましくは
COOR6 又はシアノ基である。B-1) When carried out in the presence of a base The compound of the formula [IV '] is subjected to a ring closure reaction in the presence of a base. Examples of the base include inorganic bases such as potassium hydroxide, sodium hydroxide, metallic sodium or sodium hydride, and organic bases such as sodium alcoholate and potassium tert-butoxide. Preferred is 1 equivalent of sodium alcoholate. Examples of the solvent include alcohols, BTX-based hydrocarbons, ethers, DMF, and a mixture thereof. Among them, alcohols such as methanol and ethanol are preferable. The reaction is carried out by stirring at room temperature to 100 ° C for 10 minutes to 10 hours, preferably at 50 to 80 ° C for 1 hour to 3 hours. Y'is preferably a carboxy group, COOR 6 or a cyano group, more preferably
It is COOR 6 or a cyano group.
【0009】b−2)式〔V〕で表される化合物存在下
に行う場合 式〔IV' 〕で表される化合物と式〔V〕で表される化合
物とを溶媒存在下または非存在下に反応させる。溶媒と
しては、BTX 系の炭化水素類、エ−テル類または酢酸な
どが挙げられる。式〔V〕で表される化合物としては、
種々のカルボン酸無水物を使用できるが、工業的にも非
常に安価でかつ大量に取扱い容易な、無水酢酸が最も好
ましい。使用量は式〔IV' 〕で表される化合物に対し
て、1 〜50当量、好ましくは10〜25当量である。反応は
50〜200 ℃、10分〜24時間、好ましくは100 〜140 ℃、
30分〜2 時間かくはんすることにより行う。Y"は好まし
くはカルボキシ基又はそのアルカリ金属塩である。本反
応ではX'がNHのときX はNCOR7 (R7は前記と同じ意味を
表す。)になり、Y"がカルボキシ基又はCOOM(M は前記
と同じ意味を表す。)のとき脱炭酸してY は水素原子に
なる。B-2) When carried out in the presence of the compound represented by the formula [V] The compound represented by the formula [IV '] and the compound represented by the formula [V] are present in the presence or absence of a solvent. React to. Examples of the solvent include BTX hydrocarbons, ethers, acetic acid and the like. As the compound represented by the formula [V],
Although various carboxylic acid anhydrides can be used, acetic anhydride is most preferable because it is industrially very inexpensive and easy to handle in large quantities. The amount used is 1 to 50 equivalents, preferably 10 to 25 equivalents, relative to the compound represented by the formula [IV ′]. The reaction is
50 to 200 ° C, 10 minutes to 24 hours, preferably 100 to 140 ° C,
Perform by stirring for 30 minutes to 2 hours. Y "is preferably a carboxy group or an alkali metal salt thereof. In this reaction, when X'is NH, X becomes NCOR 7 (R 7 has the same meaning as described above), and Y" is a carboxy group or COOM. (M has the same meaning as above.) When decarboxylated, Y becomes a hydrogen atom.
【0010】こうして上記の反応を行った後、通常の後
処理を施す。精製が必要な場合は常法に従い、例えば蒸
留や再結晶法あるいはカラムクロマトグラフィ−により
式〔I〕で表される化合物を得ることができる。本発明
における化合物の構造確認は、NMR,IR,MASS,融点などの
測定により行った。After carrying out the above reaction, a usual post-treatment is carried out. When purification is required, the compound represented by the formula [I] can be obtained by a conventional method, for example, distillation, recrystallization or column chromatography. The structure of the compound in the present invention was confirmed by measuring NMR, IR, MASS, melting point and the like.
【0011】[0011]
【実施例】次に代表例を挙げて本発明を更に具体的に説
明する。EXAMPLES The present invention will be described more specifically with reference to representative examples.
【0012】〔実施例1〕 3-メチルピロ−ル-2,4-ジカルボン酸ジエチルの合成:Example 1 Synthesis of diethyl 3-methylpyrrole-2,4-dicarboxylate:
【化20】MeCOC(=CHOEt)COOEt + EtOCOCH2NH2・HCL
→ MeCOC(=CHNHCH2COOEt)COOEt 37g の (エトキシメチレン) アセト酢酸エチルと、28g
のグリシンエチルエステル塩酸塩を500mL のエタノ−ル
に加え、この混合物に21g のトリエチルアミンを添加し
た。50〜60℃で約1時間加熱かくはんした後、減圧下エ
タノ−ルを留去し、残査に水を加えて塩化メチレンで抽
出した。有機層を水洗し、無水硫酸ナトリウムで乾燥
後、溶媒を留去し、粗製のN−(2-エトキシカルボニル
-3- オキソ-1- ブテニル) グリシンエチルエステル(39.
8g) を得た。 MS(CI);244(M+1,100%), 198(M-OEt,20%), 1H-NMR(CDC
l3)δ1.3(t,6H),2.46(s,3H),4.15(m,6H),7.86(d,1H),1
1.1(br s,1H)[Chemical 20] MeCOC (= CHOEt) COOEt + EtOCOCH 2 NH 2 · HCL
→ MeCOC (= CHNHCH 2 COOEt) COOEt 37g of (ethoxymethylene) ethyl acetoacetate and 28g
Of glycine ethyl ester hydrochloride was added to 500 mL of ethanol and to this mixture was added 21 g of triethylamine. After heating and stirring at 50 to 60 ° C. for about 1 hour, ethanol was distilled off under reduced pressure, water was added to the residue, and the mixture was extracted with methylene chloride. The organic layer was washed with water and dried over anhydrous sodium sulfate, then the solvent was distilled off to give crude N- (2-ethoxycarbonyl).
-3-Oxo-1-butenyl) glycine ethyl ester (39.
8g) was obtained. MS (CI); 244 (M + 1,100%), 198 (M-OEt, 20%), 1 H-NMR (CDC
l 3 ) δ1.3 (t, 6H), 2.46 (s, 3H), 4.15 (m, 6H), 7.86 (d, 1H), 1
1.1 (br s, 1H)
【0013】[0013]
【化21】 次に、49g のN−(2-エトキシカルボニル-3- オキソ-1
- ブテニル) グリシンエチルエステルを、1.4gのナトリ
ウムエチラ−トを溶解したエタノ−ル溶液(500mL) に加
え、加熱還流下約1時間かくはんした。放冷後、減圧下
エタノ−ルを留去し、残査に水を加えて酢酸エチルで抽
出した。有機層を水洗し、無水硫酸ナトリウムで乾燥
後、溶媒を留去し、残査をシリカゲルカラムクロマトグ
ラフィ−(展開溶媒: ヘキサン- 酢酸エチル v/v=7/3 )
により精製し、白色粉末の3-メチルピロ−ル-2,4-ジカ
ルボン酸ジエチル(31.6g) を得た。 mp.91-91.5 ℃(Lit.90-91℃, JACS.,64,1267,1942)[Chemical 21] Then 49 g of N- (2-ethoxycarbonyl-3-oxo-1
-Butenyl) glycine ethyl ester was added to an ethanol solution (500 mL) in which 1.4 g of sodium ethylate was dissolved, and the mixture was stirred with heating under reflux for about 1 hour. After cooling, ethanol was distilled off under reduced pressure, water was added to the residue, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous sodium sulfate, the solvent was distilled off, and the residue was subjected to silica gel column chromatography (developing solvent: hexane-ethyl acetate v / v = 7/3).
Purification was carried out to obtain a white powder of diethyl 3-methylpyrrole-2,4-dicarboxylate (31.6 g). mp.91-91.5 ℃ (Lit.90-91 ℃, JACS., 64 , 1267, 1942)
【0014】〔実施例2〕 3-メチルチオフェン-4- カルボン酸エチルの合成:Example 2 Synthesis of ethyl 3-methylthiophene-4-carboxylate:
【化22】MeCOC(=CHOEt)COOEt + HSCH2COONa → Me
COC(=CHSCH2COOH)COOEt 34.3g のチオグリコ−ル酸ナトリウムを、20g の水酸化
カリウムを溶解したエタノ−ル500mL に加え、加熱還流
下30分かくはんしたのち、55g の( エトキシメチレン)
アセト酢酸エチルを添加した。この混合物を加熱還流下
約3時間かくはんした後、減圧下エタノ−ルを留去し、
残査に水を加えて2N塩酸をpH1-2 になるまで滴下し
た。生じた結晶をろ過し、水洗後乾燥して、粗製のS−
(2- エトキシカルボニル-3- オキソ-1- ブテニル) チオ
グリコ−ル酸(54.3g) を得た。[Chemical formula 22] MeCOC (= CHOEt) COOEt + HSCH 2 COONa → Me
COC (= CHSCH 2 COOH) COOEt 34.3 g of sodium thioglycolate was added to 500 mL of ethanol in which 20 g of potassium hydroxide was dissolved, and the mixture was stirred under heating under reflux for 30 minutes, and then 55 g of (ethoxymethylene)
Ethyl acetoacetate was added. This mixture was stirred under heating under reflux for about 3 hours, and then ethanol was distilled off under reduced pressure.
Water was added to the residue and 2N hydrochloric acid was added dropwise until pH 1-2. The resulting crystals were filtered, washed with water and dried to give crude S-
(2-Ethoxycarbonyl-3-oxo-1-butenyl) thioglycolic acid (54.3 g) was obtained.
【0015】[0015]
【化23 】 次に、無水酢酸300mL に54.3g のS−(2- エトキシカル
ボニル-3- オキソ-1-ブテニル) チオグリコ−ル酸を加
え、130-135 ℃で約1時間かくはんした。放冷後、無水
酢酸を留去し、残査に酢酸エチル(1L)を加えて、飽和炭
酸水素ナトリウム水溶液で2回、飽和食塩水で1回洗浄
した。有機層を無水硫酸ナトリウムで乾燥後、溶媒を留
去し、残査を減圧蒸留により精製し、3-メチルチオフェ
ン-4- カルボン酸エチル(32g) を得た。bp. 90-100℃/
0.5mm[Chemical 23] Next, 54.3 g of S- (2-ethoxycarbonyl-3-oxo-1-butenyl) thioglycolic acid was added to 300 mL of acetic anhydride, and the mixture was stirred at 130 to 135 ° C. for about 1 hour. After allowing to cool, acetic anhydride was distilled off, ethyl acetate (1 L) was added to the residue, and the mixture was washed twice with saturated aqueous sodium hydrogen carbonate solution and once with saturated brine. The organic layer was dried over anhydrous sodium sulfate, the solvent was evaporated, and the residue was purified by distillation under reduced pressure to give ethyl 3-methylthiophene-4-carboxylate (32 g). bp. 90-100 ℃ /
0.5 mm
【0016】〔実施例3〕 3-エトキシカルボニル-4- メチルピロールの合成;Example 3 Synthesis of 3-ethoxycarbonyl-4-methylpyrrole;
【化24】 グリシン(75g,1mol)と85%水酸化カリウム(66g,1mo
l)を700mL のエタノールに加え、40〜50℃で攪拌して
溶解させた。この溶液に、(エトキシメチレン)アセト
酢酸エチル(185g,1mol) を添加し、加熱還流下約 1時間
攪拌した。放冷後、減圧下エタノールを留去し、残査に
水(400mL) を加え溶解させた。これに35%塩酸(80mL)を
加えることにより生じた結晶をろ過し、水で洗浄し、次
いで乾燥することにより、154.8gのN-(2- アセチル-2-
エトキシカルボニルエチレン) グリシンを得た。[Chemical formula 24] Glycine (75g, 1mol) and 85% potassium hydroxide (66g, 1mo)
l) was added to 700 mL of ethanol and dissolved by stirring at 40 to 50 ° C. Ethyl (ethoxymethylene) acetoacetate (185 g, 1 mol) was added to this solution, and the mixture was stirred with heating under reflux for about 1 hr. After allowing to cool, ethanol was distilled off under reduced pressure, and water (400 mL) was added to the residue to dissolve it. The crystals formed by adding 35% hydrochloric acid (80 mL) to this were filtered, washed with water, and then dried to give 154.8 g of N- (2-acetyl-2-
Ethoxycarbonylethylene) glycine was obtained.
【0017】[0017]
【化25】 次に、N-(2- アセチル-2- エトキシカルボニルエチレ
ン) グリシン(50g, 0.23mol)を無水酢酸(50mL,5mol) に
加え、 130〜 135℃で 1時間攪拌した。放冷後、過剰の
無水酢酸を減圧下留去し、残査に酢酸エチル(1L)を加え
て、飽和炭酸水素ナトリウム水溶液(300mL) で 2回、さ
らに飽和食塩水(300mL) で 1回洗浄した。分液した有機
層を無水硫酸ナトリウムで乾燥後、溶媒を留去し、残査
をシリカゲルカラムクロマトグラフィー( 展開溶媒: ヘ
キサン- 酢酸エチル v/v=7/3 )により精製し、35.6g の
1-アセチル-3- エトキシカルボニル-4- メチルピロール
を得た。 収率 78.7 % . mp.41-44 ℃ この後の留分として、1.4gの3-エトキシカルボニル-4-
メチルピロールを得た。収率 4%.[Chemical 25] Next, N- (2-acetyl-2-ethoxycarbonylethylene) glycine (50 g, 0.23 mol) was added to acetic anhydride (50 mL, 5 mol), and the mixture was stirred at 130 to 135 ° C for 1 hr. After cooling, excess acetic anhydride was distilled off under reduced pressure, ethyl acetate (1 L) was added to the residue, and the mixture was washed twice with saturated aqueous sodium hydrogen carbonate solution (300 mL) and once with saturated brine (300 mL). did. The separated organic layer was dried over anhydrous sodium sulfate, the solvent was distilled off, and the residue was purified by silica gel column chromatography (developing solvent: hexane-ethyl acetate v / v = 7/3) to give 35.6 g.
1-Acetyl-3-ethoxycarbonyl-4-methylpyrrole was obtained. Yield 78.7% .mp.41-44 ℃ As the fraction after this, 1.4 g of 3-ethoxycarbonyl-4-
Methylpyrrole was obtained. Yield 4%.
【0018】上記実施例3の方法に準じて種々の化合物
を用いて反応を行なった。その結果を第1表に示す。Reactions were carried out according to the method of Example 3 using various compounds. The results are shown in Table 1.
【0019】[0019]
【表1】 [Table 1]
【0020】[0020]
【発明の効果】3位に電子吸引性基を有するピロ−ル、
フランおよびチオフェン等のヘテロ環誘導体の製造を従
来の技術に比べてより簡便に収率よく工業的に有利に実
施できる方法を実現した。The pyrrole having an electron-withdrawing group at the 3-position,
A method has been realized in which the production of a heterocyclic derivative such as furan and thiophene can be carried out more simply and with higher yield than in the prior art and industrially advantageous.
Claims (2)
る、式〔I〕 【化1】 〔式中、R1は置換基を有してもよいアルキル基、置換基
を有してもよいアルケニル基、置換基を有してもよいア
ルキニル基、置換基を有してもよいアリール基、置換基
を有してもよいヘテロ環又はCO0R4 を表す。R2は電子吸
引性基を表す。R3は水素原子又は置換基を有してもよい
アルキル基を表す。X はNR5 、O 又はS を表す。Y は水
素原子、カルボキシ基、CO0R6 又はシアノ基を表す。
R4、R6は置換基を有してもよいアルキル基、置換基を有
してもよいアルケニル基、置換基を有してもよいアルキ
ニル基、置換基を有してもよいアリール基又は置換基を
有してもよいヘテロ環を表す。R5は水素原子、置換基を
有してもよいアルキル基、置換基を有してもよいアルケ
ニル基、置換基を有してもよいアルキニル基、置換基を
有してもよいアリール基、置換基を有してもよいヘテロ
環又はCOR7を表す。R7は置換基を有してもよいアルキル
基を表す。但し、X がS の場合は、Y は水素原子、カル
ボキシ基、又はシアノ基を表し、又、工程bを式〔V〕
で表される化合物存在下に行う場合は、X'がNHのときX
はNCOR7 (R7は前記と同じ意味を表す。)を、Y"がカル
ボキシ基又はCOOM(M はアルカリ金属を表す。)のとき
Y は水素原子を表す。〕で表されるヘテロ環誘導体の製
造法。 工程a: 式〔II〕 【化2】R1COC(=CR3-OR8)R2 〔II〕 〔式中、R1、R2およびR3は前記と同じ意味を表す。R8は
水素原子又は置換基を有してもよいアルキル基を表
す。〕で表される化合物と、式〔III 〕 【化3】HX'CH2Y' 〔III 〕 〔式中、X'はNR5'、O 又はS を表す。R5' は水素原子、
置換基を有してもよいアルキル基、置換基を有してもよ
いアルケニル基、置換基を有してもよいアルキニル基、
置換基を有してもよいアリール基、置換基を有してもよ
いヘテロ環を表す。Y'はCOOM、CO0R6 又はシアノ基を表
す。R6及びM は前記と同じ意味を表す。〕で表される化
合物とを反応させて、式〔IV〕 【化4】R1COC(=CR3-X'CH2Y')R2 〔IV〕 〔式中、R1,R2、R3、X'、Y'は前記と同じ意味を表
す。〕で表される化合物を製造する工程。 工程b: 式〔IV' 〕 【化5】R1COC(=CR3-X'CH2Y")R2 〔IV' 〕 〔式中、Y"はカルボキシ基、COOM、COOR6 又はシアノ基
を表す。R1、R2、R3、R6、X'及びM は前記と同じ意味を
表す。〕で表される化合物を、塩基又は式〔V〕 【化6】R7COOCOR7 〔V〕 〔式中、R7は前記と同じ意味を表す。〕で表される化合
物存在下に閉環反応させて、式〔I〕 【化7】 〔式中、R1,R2、R3、X 、Y は前記と同じ意味を表
す。〕で表される化合物を製造する工程。1. A compound represented by the formula [I]: wherein the following steps a and b are performed. [In the formula, R 1 is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, and an aryl group which may have a substituent. Represents a heterocycle which may have a substituent or CO0R 4 . R 2 represents an electron-withdrawing group. R 3 represents a hydrogen atom or an alkyl group which may have a substituent. X represents NR 5 , O or S. Y represents a hydrogen atom, a carboxy group, CO0R 6 or a cyano group.
R 4 and R 6 are an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an aryl group which may have a substituent, or It represents a heterocycle which may have a substituent. R 5 is a hydrogen atom, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an aryl group which may have a substituent, It represents a heterocycle optionally having a substituent or COR 7 . R 7 represents an alkyl group which may have a substituent. However, when X is S, Y represents a hydrogen atom, a carboxy group, or a cyano group, and the step b is represented by the formula [V].
When performing in the presence of the compound represented by, when X'is NH, X
Is NCOR 7 (R 7 has the same meaning as described above), and Y "is a carboxy group or COOM (M represents an alkali metal).
Y represents a hydrogen atom. ] The manufacturing method of the heterocyclic derivative represented by these. Step a: Formula [II] embedded image R 1 COC (= CR 3 —OR 8 ) R 2 [II] [In the formula, R 1 , R 2 and R 3 have the same meanings as described above. R 8 represents a hydrogen atom or an alkyl group which may have a substituent. ] And a compound represented by the formula [III]: HX'CH 2 Y '[III] [In the formula, X'represents NR 5 ', O or S 2. R 5 'is a hydrogen atom,
An alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent,
It represents an aryl group which may have a substituent or a heterocycle which may have a substituent. Y 'represents a COOM, CO0R 6 or a cyano group. R 6 and M have the same meanings as described above. ] The compound represented by the formula] is reacted to give a compound of the formula [IV] R 1 COC (= CR 3 -X'CH 2 Y ') R 2 [IV] [wherein R 1 , R 2 , R 3 , X ′, and Y ′ have the same meanings as described above. ] The process of manufacturing the compound represented by these. Step b: Formula [IV ′] embedded image R 1 COC (= CR 3 —X′CH 2 Y ″) R 2 [IV ′] [In the formula, Y ″ is a carboxy group, COOM, COOR 6 or a cyano group. Represents R 1 , R 2 , R 3 , R 6 , X ′ and M have the same meanings as described above. A compound represented by the formula: a base or a compound of the formula [V] embedded image R 7 COOCOR 7 [V] [wherein R 7 has the same meaning as described above. ] The compound represented by the formula [I] [In the formula, R 1 , R 2 , R 3 , X and Y have the same meanings as described above. ] The process of manufacturing the compound represented by these.
す。〕で表される化合物を、塩基又は式〔V〕 【化9】R7COOCOR7 〔V〕 〔式中、R7は前記と同じ意味を表す。〕で表される化合
物存在下に閉環反応させることを特徴とする、式〔I〕 【化10】 〔式中、R1,R2、R3、X 、Y は前記と同じ意味を表
す。〕で表されるヘテロ環誘導体の製造法。2. A compound represented by the formula [IV ']: embedded image R 1 COC (= CR 3 -X'CH 2 Y ") R 2 [IV'] [wherein R 1 , R 2 , R 3 and X ' And Y "have the same meanings as described above. A compound represented by the formula: a base or a compound of the formula [V] embedded image R 7 COOCOR 7 [V] [wherein R 7 has the same meaning as described above. ] The compound represented by the formula [I] [In the formula, R 1 , R 2 , R 3 , X and Y have the same meanings as described above. ] The manufacturing method of the heterocyclic derivative represented by these.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22596294A JPH0859611A (en) | 1994-08-26 | 1994-08-26 | Production of heterocyclic derivative |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22596294A JPH0859611A (en) | 1994-08-26 | 1994-08-26 | Production of heterocyclic derivative |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0859611A true JPH0859611A (en) | 1996-03-05 |
Family
ID=16837618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22596294A Pending JPH0859611A (en) | 1994-08-26 | 1994-08-26 | Production of heterocyclic derivative |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0859611A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8884034B2 (en) | 2009-07-08 | 2014-11-11 | Dermira (Canada), Inc. | TOFA analogs useful in treating dermatological disorders or conditions |
-
1994
- 1994-08-26 JP JP22596294A patent/JPH0859611A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8884034B2 (en) | 2009-07-08 | 2014-11-11 | Dermira (Canada), Inc. | TOFA analogs useful in treating dermatological disorders or conditions |
| US9434718B2 (en) | 2009-07-08 | 2016-09-06 | Dermira (Canada), Inc. | TOFA analogs useful in treating dermatological disorders or conditions |
| US9782382B2 (en) | 2009-07-08 | 2017-10-10 | Dermira (Canada), Inc. | TOFA analogs useful in treating dermatological disorders or conditions |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3179515B2 (en) | Method for producing 2-chlorothiazoles | |
| JP5545118B2 (en) | Method for producing nitrile compound, carboxylic acid compound or carboxylic acid ester compound | |
| JPS63139182A (en) | Production of thiazolidinedione derivative | |
| JP3850838B2 (en) | Process for producing trans-4-amino-1-cyclohexanecarboxylic acid derivative | |
| JPH0859611A (en) | Production of heterocyclic derivative | |
| US5532381A (en) | Process for preparing pyrrolizine derivatives | |
| KR100424393B1 (en) | Process for the preparation of oxiracetam | |
| US6388083B2 (en) | Process for the synthesis of (2S)-phenyl-3-piperidone | |
| JPH01316352A (en) | Production of 3-cyano-4-arylpyrrole | |
| HU195485B (en) | Process for producing aromatic carboxylic acid derivatives and -carboxamide derivatives | |
| JPH1171354A (en) | Production of alkoxypyrazine derivative | |
| MX2008013408A (en) | 2-alkenyl-3-aminothiophene derivative and method for producing the same. | |
| JP3404720B2 (en) | Method for producing 3,4-disubstituted pyrrole | |
| SK279499B6 (en) | Method for the preparation of 2-aryl-5-trifluoromethyl pyrrole compounds | |
| CN120698910A (en) | Preparation method of elobixibat intermediate 2,4-dibromo-5-methoxybenzenesulfonyl chloride | |
| JP3013760B2 (en) | Method for producing 4-hydroxy-2-pyrrolidone | |
| JP2003286285A (en) | Process for producing pyridone compounds and intermediates thereof | |
| JPS5915919B2 (en) | Method for producing (N-methylpyryl-2)acetothioamide derivative | |
| JP3819473B2 (en) | 4,4-Bishalomethyl-3-oxoalkanecarboxylic acid derivative and method for producing 3-cyclopropyl-3-oxopropionic acid derivative using the same | |
| JPH0432064B2 (en) | ||
| JP2021187795A (en) | Method for producing 2,3-difluoro-6-methoxybenzaldehyde | |
| JPS5852995B2 (en) | Method for producing furfural derivatives | |
| JPH0552824B2 (en) | ||
| JPS58413B2 (en) | (N-methylpyryl-2)acetothioamide derivative | |
| JPS5814438B2 (en) | Pyrazolopyridine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050221 |
|
| A02 | Decision of refusal |
Effective date: 20050704 Free format text: JAPANESE INTERMEDIATE CODE: A02 |