JPH0875902A - Multi-layer antireflection film - Google Patents
Multi-layer antireflection filmInfo
- Publication number
- JPH0875902A JPH0875902A JP6239371A JP23937194A JPH0875902A JP H0875902 A JPH0875902 A JP H0875902A JP 6239371 A JP6239371 A JP 6239371A JP 23937194 A JP23937194 A JP 23937194A JP H0875902 A JPH0875902 A JP H0875902A
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- refractive index
- index layer
- low
- film
- layers
- Prior art date
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Abstract
(57)【要約】
【目的】 波長400nm から700nm の可視光域で良好な反
射防止特性を有し、基板との密着性が優れ、かつ低温で
製造できる反射防止膜を達成すること。
【構成】 透明な基板の上に空気側から順に低屈折率層
と高屈折率層を相互に全体として６層積層する際、該低
屈折率層はSiO2を含み、該高屈折率層はTiO2を含み、波
長600nm に対する該高屈折率層と該低屈折率層の屈折率
を各々ＮH ，ＮL とする時、ＮH ，ＮL を
２．４０≦ＮH ≦２．８０
１．３９≦ＮL ≦１．４８
とする。
(57) [Abstract] [Purpose] To achieve an antireflection film that has good antireflection properties in the visible light range of wavelengths from 400 nm to 700 nm, has excellent adhesion to substrates, and can be manufactured at low temperatures. When a total of 6 layers of a low refractive index layer and a high refractive index layer are sequentially laminated on a transparent substrate from the air side, the low refractive index layer contains SiO 2 and the high refractive index layer is When the refractive indexes of the high refractive index layer and the low refractive index layer containing TiO 2 at a wavelength of 600 nm are N H and N L , respectively, N H and N L are 2.40 ≦ N H ≦ 2.801 .39 ≦ N L ≦ 1.48.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、反射防止膜に関し、特
にガラスやプラスチック等、透明な材質からなる光学素
子基板の表面に所定の屈折率層を複数積層した反射防止
膜に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film, and more particularly to an antireflection film having a plurality of predetermined refractive index layers laminated on the surface of an optical element substrate made of a transparent material such as glass or plastic.
【０００２】[0002]
【従来の技術】従来よりTiO2を含む高屈折率層とSiO2を
含む低屈折率層を透明基板面上に交互に複数積層した赤
外光用の反射防止膜が例えば、特開平2-69701 号公報で
提案されている。同公報で提案されている赤外光用の反
射防止膜は、カメラ等で要求される波長が400nm 以上で
700nm 以下の可視光域では反射防止性能を有していな
い。 2. Description of the Related Art Conventionally, an antireflection film for infrared light in which a plurality of high refractive index layers containing TiO 2 and low refractive index layers containing SiO 2 are alternately laminated on the surface of a transparent substrate is disclosed in, for example, JP-A-2- It is proposed in the 69701 publication. The antireflection coating for infrared light proposed in the same publication has a wavelength of 400 nm or more required for cameras and the like.
It does not have antireflection properties in the visible light range of 700 nm or less.
【０００３】[0003]
【発明が解決しようとする課題】一般に反射防止膜は次
の事項が要求されている。 反射率、吸収率が極力低く、透過率が極力高いこと。 上記特性を所望の波長範囲で発揮すること。The following items are generally required for antireflection films. The reflectance and absorption are as low as possible, and the transmittance is as high as possible. To exhibit the above characteristics in the desired wavelength range.
【０００４】まずの要求特性の内吸収率に関しては、
膜を構成する諸材料例えばTiO2,Y2O3,Ta2O5,HfO2,ZrO2
などの単層膜は全て可視光域で吸収の発生は見られな
く、膜の材料として性能の差異は無い。低反射率の反射
防止膜を構成するには高屈折率材と低屈折率材を交互に
積層すれば良いことが知られている。そこで低反射率、
高透過率性能がどうであるかは、高屈折率材と低屈折率
材を交互に堆積させたときの多層膜の性能で判断しなけ
ればならない。First, regarding the absorption rate of the required characteristics,
Materials forming the film, such as TiO 2 , Y 2 O 3 , Ta 2 O 5 , HfO 2 , ZrO 2
All single-layer films such as No occurrence of absorption are observed in the visible light region, and there is no difference in performance as film materials. It is known that a high-refractive index material and a low-refractive index material may be alternately laminated to form an antireflection film having a low reflectance. So low reflectance,
How the high transmittance performance is should be judged by the performance of the multilayer film when the high refractive index material and the low refractive index material are alternately deposited.
【０００５】かかる多層膜を構成する場合、高屈折率材
料と低屈折率材料との屈折率差が大きい程、低反射率、
高透過率の性能を得易く、又の要求にも応え易い。つ
まり望ましい反射防止特性を得易くなる。In constructing such a multilayer film, the larger the difference in refractive index between the high refractive index material and the low refractive index material, the lower the reflectance,
It is easy to obtain high transmittance performance and easily meet other requirements. That is, it becomes easy to obtain a desired antireflection characteristic.
【０００６】特に、どちらかといえば、高屈折率材料の
屈折率の高低が反射防止特性の良否を支配するので、40
0nm から700nm のような広範囲で良好な反射防止特性を
実現するには、できるだけ高屈折率材料を使うことが望
ましい。この点からはTa2O5,HfO2,ZrO2 はTiO2と比較し
て屈折率が低いので、特に良好な反射防止特性は得難
い。In particular, if anything, the high or low refractive index of the high refractive index material governs the quality of the antireflection property.
In order to achieve good antireflection properties over a wide range from 0 nm to 700 nm, it is desirable to use a material with a high refractive index as much as possible. From this point, Ta 2 O 5 , HfO 2 , and ZrO 2 have a lower refractive index than TiO 2, and it is difficult to obtain particularly good antireflection properties.
【０００７】一方、低屈折率材料としてよく使用される
MgF2は、SiO2よりも若干屈折率が低く、前記の事情から
低反射率、かつ高透過率の特性を得るには好都合の材料
である。しかし、常温の基板上にMgF2を成膜すると、こ
れは基板との密着性が悪く膜がはがれ易い。これを解決
するには基板を加熱すれば良いが、そうすると成膜装置
に加熱機構を設けたり、成膜プロセス自体にも加熱のプ
ロセスを入れなければならなくなり、コストが上昇す
る。更に、場合によっては加熱による光学素子の表面形
状の変化が起きるため、例えばプラスチックスのような
低融点材料からなる基板には加工することが難しかっ
た。On the other hand, it is often used as a low refractive index material.
Since MgF 2 has a slightly lower refractive index than SiO 2 , it is a convenient material for obtaining the characteristics of low reflectance and high transmittance from the above circumstances. However, when MgF 2 is formed on a substrate at room temperature, it has poor adhesion to the substrate and the film easily peels off. To solve this problem, the substrate may be heated. However, if this is done, it is necessary to provide a heating mechanism in the film forming apparatus and to add a heating process to the film forming process itself, which increases the cost. Further, in some cases, the surface shape of the optical element changes due to heating, so that it is difficult to process a substrate made of a low melting point material such as plastics.
【０００８】また、これらTiO2やSiO2膜は可視域で光学
的吸収が発生しないというものの、厳密には極微量では
あるが存在するため、幾層も積層すると光学的吸収が顕
著に現れる。また膜と膜との界面で吸収が発生すること
もあるため、これらの見地から鑑みると積層数は少ない
方が良好な膜が得られる。しかし、積層数を少なくする
と上記の要求に応えにくい、即ち所望の反射防止特性
を得にくくなる。であるから反射防止膜は、良好な反射
防止特性と光学的吸収がないことの両方を満たす積層数
及びその膜厚を最適化する事が望まれる。Further, although these TiO 2 and SiO 2 films do not cause optical absorption in the visible region, they are present in a strict amount, but strictly speaking, optical absorption remarkably appears when several layers are laminated. In addition, since absorption may occur at the interface between the films, from the above viewpoints, the smaller the number of laminated layers, the better the film obtained. However, if the number of laminated layers is reduced, it becomes difficult to meet the above requirements, that is, it becomes difficult to obtain desired antireflection characteristics. Therefore, in the antireflection film, it is desired to optimize the number of laminated layers and the film thickness thereof which satisfy both good antireflection properties and no optical absorption.
【０００９】本発明の目的は、波長400nm から700nm の
可視光域で光学的吸収が少く、良好な反射防止特性を有
し、基板との密着性が優れ、かつ低温で製造できる反射
防止膜を提供することである。An object of the present invention is to provide an antireflection film which has a small optical absorption in the visible light region of wavelengths of 400 nm to 700 nm, has good antireflection properties, has excellent adhesion to a substrate, and can be produced at a low temperature. Is to provide.
【００１０】[0010]
【課題を解決するための手段】本発明の反射防止膜の構
成は、 （１−１）透明な基板の上に空気側から順に低屈折率層
と高屈折率層を交互に全体として６層積層する際、該低
屈折率層はSiO2を含み、該高屈折率層はTiO2を含み、波
長600nm に対する該高屈折率層と該低屈折率層の屈折率
を各々ＮH ，ＮLとする時、 ２．４０≦ＮH ≦２．８０ １．３９≦ＮL ≦１．４８ であることを特徴としている。The structure of the antireflection film of the present invention is as follows: (1-1) A total of 6 layers of a low refractive index layer and a high refractive index layer are alternately arranged in order from the air side on a transparent substrate. When laminating, the low-refractive index layer contains SiO 2 , the high-refractive index layer contains TiO 2 , and the refractive indices of the high-refractive index layer and the low-refractive index layer with respect to a wavelength of 600 nm are NH and NL respectively. Then, 2.40 ≦ N H ≦ 2.80 1.39 ≦ N L ≦ 1.48.
【００１１】特に、（１−１−１）前記６層を空気側か
ら順に数えて第ｉ層（ｉ＝１〜６）とし、第ｉ層の光学
的膜厚をＤｉ（単位ｎｍ）とするとき、 ９５≦Ｄ１≦１４５ ３０≦Ｄ２≦ ５０ １０≦Ｄ３≦ ２２ １７０≦Ｄ４≦２７０ ２０≦Ｄ５≦ ４７ ２５≦Ｄ６≦ ４５ を満たすこと等を特徴としている。In particular, (1-1-1) the six layers are sequentially counted from the air side to form the i-th layer (i = 1 to 6), and the optical film thickness of the i-th layer is Di (unit: nm). At this time, 95 ≦ D1 ≦ 145 30 ≦ D2 ≦ 50 10 ≦ D3 ≦ 22 170 ≦ D4 ≦ 270 20 ≦ D5 ≦ 47 25 ≦ D6 ≦ 45 and the like are characterized.
【００１２】[0012]
【実施例】図１は本発明の実施例１の要部断面概略図で
ある。本実施例の反射防止膜は基板Ｇ面上に低屈折率層
と高屈折率層を相互に全体として６層積層した多層膜よ
り成っており、このときの６層は空気側から基板Ｇ側に
かけて順に数えたとき第１、第３、第５層がSiO2を含む
低屈折率層（Ｌ）、空気側から順に第２、第４、第６層
がTiO2を含む高屈折率層（Ｈ）で構成している。Embodiment 1 FIG. 1 is a schematic cross-sectional view of the essential portions of Embodiment 1 of the present invention. The antireflection film of the present embodiment is composed of a multilayer film in which a low refractive index layer and a high refractive index layer are laminated on the surface of the substrate G as a total of 6 layers, and the 6 layers at this time are from the air side to the substrate G side. The first, third and fifth layers are low refractive index layers (L) containing SiO 2 and the second, fourth and sixth layers are high refractive index layers containing TiO 2 in order from the air side ( H).
【００１３】そして高屈折率層Ｈと低屈折率層Ｌの波長
600nm の光に対する屈折率を各々ＮH ，ＮL とすると
き、 ２．４０≦ＮH ≦２．８０ （１） １．３９≦ＮL ≦１．４８ （２） なる条件を満たしている。そして本実施例では低屈折率
層ＬをSiO2を主として含む層としたことにより、基板Ｇ
を加熱せずとも密着性の優れた反射防止膜が得られてい
る。The wavelengths of the high refractive index layer H and the low refractive index layer L
When the refractive indices for light of 600 nm are N H and N L , respectively, the condition of 2.40 ≦ N H ≦ 2.80 (1) 1.39 ≦ N L ≦ 1.48 (2) is satisfied. In this embodiment, the low-refractive-index layer L is a layer mainly containing SiO 2 , so that the substrate G
An antireflection film having excellent adhesion can be obtained without heating.
【００１４】これにより、波長400nm から700nm の可視
光域で良好な反射防止特性を有し、基板との密着性が優
れ、かつ低温で製造できる反射防止膜を達成している。As a result, an antireflection film having good antireflection properties in the visible light range of wavelengths from 400 nm to 700 nm, excellent adhesion to the substrate, and capable of being manufactured at low temperature is achieved.
【００１５】更に、本実施例の反射防止膜を構成する６
層は空気側から順に第１層から第６層とし、その光学的
膜厚（屈折率ｘ幾何学的膜厚ｎｍ）を各々Ｄ１，Ｄ２，
Ｄ３，Ｄ４，Ｄ５，Ｄ６としたとき、 ９５≦Ｄ１≦１４５ （３） ３０≦Ｄ２≦ ５０ （４） １０≦Ｄ３≦ ２２ （５） １７０≦Ｄ４≦２７０ （６） ２０≦Ｄ５≦ ４７ （７） ２５≦Ｄ６≦ ４５ （８） を満たしている。Further, the antireflection film of this embodiment is formed 6
The layers are the first to sixth layers in order from the air side, and their optical thicknesses (refractive index x geometrical thickness nm) are D1, D2 and
When D3, D4, D5, D6, 95 ≦ D1 ≦ 145 (3) 30 ≦ D2 ≦ 50 (4) 10 ≦ D3 ≦ 22 (5) 170 ≦ D4 ≦ 270 (6) 20 ≦ D5 ≦ 47 (7 ) 25 ≦ D6 ≦ 45 (8) is satisfied.
【００１６】総層数を６層にすることにより光学的吸収
量を極微量にとどめ、そして各層の光学的膜厚が条件式
（３）〜（８）を満たすことにより、１％以下の低反射
率を400nmから700nmという広範囲の波長域で実現してい
る。By making the total number of layers 6 layers, the optical absorption amount is kept extremely small, and the optical film thickness of each layer satisfies the conditional expressions (3) to (8). The reflectance is realized in a wide wavelength range from 400 nm to 700 nm.
【００１７】ところでこれらTiO2膜やSiO2膜を成膜する
方法としては、真空蒸着法、スパッタ法などが挙げられ
るが、いずれの成膜方法においても成膜時に不純物の混
入は避けられなく、本実施例では例えばスパッタ法では
窒素、アルゴン、鉄、ニッケル等が混入し、真に純粋な
意味でのTiO2膜やSiO2膜は得難く、それらを含んだ膜と
なっている。しかしそれらの混入量は通常微量で、上記
（１）、（２）の条件を満たす限り反射防止効果を損な
うことは殆どなく、顕著な光学的吸収も発生しない。By the way, as a method for forming the TiO 2 film or the SiO 2 film, there are a vacuum vapor deposition method, a sputtering method and the like. In any of the film forming methods, mixing of impurities is inevitable at the time of film formation. In this embodiment, for example, the sputtering method mixes nitrogen, argon, iron, nickel, etc., and it is difficult to obtain a TiO 2 film or SiO 2 film in a truly pure sense, and the film contains them. However, the amount of such a compound is usually very small, and as long as the above conditions (1) and (2) are satisfied, the antireflection effect is hardly impaired and no remarkable optical absorption occurs.
【００１８】表１は本発明の実施例１の多層膜構成のデ
ータであり、図２は本実施例の反射特性図である。本実
施例はガラスBK7 （商品名）を基板として用い、その面
上にスパッタ法を用いて波長400nm から700nm の可視光
域に対して反射防止効果を有するようにしている。表１
中の屈折率は波長600nm の光に対するものであり、又光
学的膜厚とは屈折率ｘ幾何学的膜厚（単位はｎｍ）であ
る。Table 1 shows the data of the multilayer film structure of Example 1 of the present invention, and FIG. 2 is a reflection characteristic diagram of this example. In this embodiment, glass BK7 (trade name) is used as a substrate, and a sputtering method is used on the surface thereof so as to have an antireflection effect in the visible light region of wavelengths 400 nm to 700 nm. Table 1
The refractive index therein is for light with a wavelength of 600 nm, and the optical film thickness is the refractive index x geometric film thickness (unit: nm).
【００１９】[0019]
【表１】 本実施例の分光反射率は図２に示すように波長410nm 〜
680nm にわたって最高で0.4 ％であり、優れた反射防止
膜であることをしめしている。[Table 1] The spectral reflectance of this embodiment is, as shown in FIG.
The maximum is 0.4% over 680 nm, which is an excellent antireflection film.
【００２０】表２は本発明の実施例２の多層膜構成のデ
ータであり、図３は本実施例の反射特性図である。本実
施例はガラスBK7 （商品名）を基板として用い、その面
上に真空蒸着法を用いて波長400nm から700nm の可視光
域に対して反射防止効果を有するようにしている。表２
中の屈折率は波長600nm の光に対するものである。Table 2 shows the data of the multilayer film structure of Example 2 of the present invention, and FIG. 3 is a reflection characteristic diagram of this example. In this embodiment, glass BK7 (trade name) is used as a substrate, and a vacuum evaporation method is used on the surface thereof so as to have an antireflection effect in the visible light region of wavelengths 400 nm to 700 nm. Table 2
The refractive index inside is for light with a wavelength of 600 nm.
【００２１】[0021]
【表２】 以上の構成データにおいて高屈折率層Ｈと低屈折率層Ｌ
の屈折率が同様な材料を用いても表１の場合と異なるの
は表１の場合はスパッタ法を用いて加工し、表２の場合
は真空蒸着法によって加工する違いによって生じるもの
である。[Table 2] In the above configuration data, the high refractive index layer H and the low refractive index layer L
Even when materials having the same refractive index are used, the difference from the case of Table 1 is caused by the difference in processing in the case of Table 1 by the sputtering method and in the case of Table 2 by the vacuum deposition method.
【００２２】本実施例の分光反射率は図３に示すように
波長400nm 〜680nm にわたって最高で0.4 ％程度であ
り、優れた反射防止膜であることをしめしている。As shown in FIG. 3, the spectral reflectance of this embodiment is about 0.4% at the maximum in the wavelength range of 400 nm to 680 nm, which indicates that it is an excellent antireflection film.
【００２３】表３は本発明の実施例３の多層膜構成のデ
ータであり、図４は本実施例の反射特性図である。本実
施例はガラスLah5（商品名）を基板として用い、その面
上にスパッタ法を用いて波長400nm から700nm の可視光
域に対して反射防止効果を有するようにしている。表３
中の屈折率は波長600nm の光に対するものである。Table 3 shows the data of the multilayer film structure of the third embodiment of the present invention, and FIG. 4 is a reflection characteristic diagram of the present embodiment. In this embodiment, glass Lah5 (trade name) is used as a substrate, and a sputtering method is used on the surface thereof so as to have an antireflection effect in the visible light region of wavelength 400 nm to 700 nm. Table 3
The refractive index inside is for light with a wavelength of 600 nm.
【００２４】[0024]
【表３】 本実施例の分光反射率は図４に示すように波長400nm 〜
680nm にわたって最高で0.4 ％程度であり、優れた反射
防止膜であることをしめしている。[Table 3] The spectral reflectance of the present embodiment is, as shown in FIG.
The maximum is about 0.4% over 680 nm, which indicates that it is an excellent antireflection film.
【００２５】表４は本発明の実施例４の多層膜構成のデ
ータであり、図５は本実施例の反射特性図である。本実
施例はガラスLah5（商品名）を基板として用い、その面
上に真空蒸着法を用いて波長400nm から700nm の可視光
域に対して反射防止効果を有するようにしている。表４
中の屈折率は波長600nm の光に対するものである。Table 4 shows the data of the multilayer film structure of Example 4 of the present invention, and FIG. 5 is a reflection characteristic diagram of this example. In this embodiment, glass Lah5 (trade name) is used as a substrate, and a vacuum evaporation method is used on the surface thereof so as to have an antireflection effect in the visible light region of wavelengths 400 nm to 700 nm. Table 4
The refractive index inside is for light with a wavelength of 600 nm.
【００２６】[0026]
【表４】 本実施例の分光反射率は図５に示すように波長400nm 〜
690nm にわたって最高で0.35％程度であり、優れた反射
防止膜であることをしめしている。[Table 4] The spectral reflectance of this embodiment is, as shown in FIG.
The maximum is about 0.35% over 690 nm, which indicates that it is an excellent antireflection film.
【００２７】[0027]
【発明の効果】本発明の反射防止膜は以上の構成によ
り、 （２−１）400nm から700nm の広い可視光域にわたって
光学的吸収が少なく、良好な反射防止特性を発揮する。 （２−２）基板と膜との密着性が優れている。 （２−３）常温で成膜可能なため、加熱機構や加熱プロ
セス等が不要であり、低コストで加工できる。 等の効果を達成している。The antireflection film of the present invention having the above-mentioned constitution exhibits (2-1) a small optical absorption over a wide visible light region of 400 nm to 700 nm and exhibits excellent antireflection properties. (2-2) The adhesion between the substrate and the film is excellent. (2-3) Since a film can be formed at room temperature, a heating mechanism, a heating process, etc. are not required, and processing can be performed at low cost. And so on.
【図１】 本発明の実施例１の要部断面概略図FIG. 1 is a schematic cross-sectional view of essential parts of Embodiment 1 of the present invention.
【図２】 本発明の実施例１の分光反射特性図FIG. 2 is a spectral reflection characteristic diagram of Example 1 of the present invention.
【図３】 本発明の実施例２の分光反射特性図FIG. 3 is a spectral reflection characteristic diagram of Example 2 of the present invention.
【図４】 本発明の実施例３の分光反射特性図FIG. 4 is a spectral reflection characteristic diagram of Example 3 of the present invention.
【図５】 本発明の実施例４の分光反射特性図FIG. 5 is a spectral reflection characteristic diagram of Example 4 of the present invention.
Claims (2)
率層と高屈折率層を交互に全体として６層積層する際、
該低屈折率層はSiO2を含み、該高屈折率層はTiO2を含
み、波長600nm に対する該高屈折率層と該低屈折率層の
屈折率を各々ＮH ，ＮL とする時、 ２．４０≦ＮH ≦２．８０ １．３９≦ＮL ≦１．４８ であることを特徴とする反射防止膜1. When six low-refractive index layers and six high-refractive index layers are alternately laminated on a transparent substrate in order from the air side,
When the low-refractive index layer contains SiO 2 , the high-refractive index layer contains TiO 2 , and the high-refractive index layer and the low-refractive index layer have a refractive index of N H and N L respectively at a wavelength of 600 nm, 2.40 ≦ N H ≦ 2.80 1.39 ≦ N L ≦ 1.48, Antireflection Film
（ｉ＝１〜６）とし、第ｉ層の光学的膜厚をＤｉ（単位
ｎｍ）とするとき、 ９５≦Ｄ１≦１４５ ３０≦Ｄ２≦ ５０ １０≦Ｄ３≦ ２２ １７０≦Ｄ４≦２７０ ２０≦Ｄ５≦ ４７ ２５≦Ｄ６≦ ４５ を満たすことを特徴とする請求項１の反射防止膜。2. When the six layers are sequentially counted from the air side to form an i-th layer (i = 1 to 6) and the optical film thickness of the i-th layer is Di (unit: nm), 95 ≦ D1 ≦ 145 30 <D2 <50 10 <D3 <22 170 <D4 <270 20 <D5 <47 25 <D6 <45 The antireflection film of Claim 1 characterized by the above-mentioned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6239371A JPH0875902A (en) | 1994-09-07 | 1994-09-07 | Multi-layer antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6239371A JPH0875902A (en) | 1994-09-07 | 1994-09-07 | Multi-layer antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0875902A true JPH0875902A (en) | 1996-03-22 |
Family
ID=17043782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6239371A Pending JPH0875902A (en) | 1994-09-07 | 1994-09-07 | Multi-layer antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0875902A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998052074A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| AU774079B2 (en) * | 1997-05-16 | 2004-06-17 | Hoya Kabushiki Kaisha | Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film |
| JP2006119525A (en) * | 2004-10-25 | 2006-05-11 | Canon Inc | Anti-reflection coating |
| DE112009002574T5 (en) | 2008-10-17 | 2012-01-19 | Ulvac, Inc. | Film-forming process for an anti-reflection film, anti-reflection film and film-forming device |
| WO2012157706A1 (en) | 2011-05-17 | 2012-11-22 | キヤノン電子株式会社 | Optical filter, optical device, electronic device, and antireflection complex |
| WO2012157719A1 (en) | 2011-05-17 | 2012-11-22 | キヤノン電子株式会社 | Optical filter and optical device |
| US8665520B2 (en) | 2006-08-30 | 2014-03-04 | Canon Denshi Kabushiki Kaisha | Neutral density optical filter and image pickup apparatus |
| CN105093377A (en) * | 2015-09-17 | 2015-11-25 | 京东方科技集团股份有限公司 | Blue ray attenuation device and preparation method, base plate, displayer and intelligent wearable product |
| US9513417B2 (en) | 2012-11-16 | 2016-12-06 | Canon Denshi Kabushiki Kaisha | Optical filter and optical apparatus |
| JP2019207424A (en) * | 2015-01-07 | 2019-12-05 | ローデンシュトック ゲーエムベーハー | Layer system and optical element comprising layer system |
-
1994
- 1994-09-07 JP JP6239371A patent/JPH0875902A/en active Pending
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998052074A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| US6250758B1 (en) | 1997-05-16 | 2001-06-26 | Hoya Corporation | Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film |
| AU741691B2 (en) * | 1997-05-16 | 2001-12-06 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| AU774079B2 (en) * | 1997-05-16 | 2004-06-17 | Hoya Kabushiki Kaisha | Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film |
| AU741691C (en) * | 1997-05-16 | 2004-08-12 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| JP2006119525A (en) * | 2004-10-25 | 2006-05-11 | Canon Inc | Anti-reflection coating |
| US8665520B2 (en) | 2006-08-30 | 2014-03-04 | Canon Denshi Kabushiki Kaisha | Neutral density optical filter and image pickup apparatus |
| DE112009002574T5 (en) | 2008-10-17 | 2012-01-19 | Ulvac, Inc. | Film-forming process for an anti-reflection film, anti-reflection film and film-forming device |
| WO2012157706A1 (en) | 2011-05-17 | 2012-11-22 | キヤノン電子株式会社 | Optical filter, optical device, electronic device, and antireflection complex |
| WO2012157719A1 (en) | 2011-05-17 | 2012-11-22 | キヤノン電子株式会社 | Optical filter and optical device |
| US9316766B2 (en) | 2011-05-17 | 2016-04-19 | Canon Denshi Kabushiki Kaisha | Optical filter, optical device, electronic device and anti-reflection composite |
| US9588266B2 (en) | 2011-05-17 | 2017-03-07 | Canon Denshi Kabushiki Kaisha | Optical filter and optical apparatus |
| US9513417B2 (en) | 2012-11-16 | 2016-12-06 | Canon Denshi Kabushiki Kaisha | Optical filter and optical apparatus |
| JP2019207424A (en) * | 2015-01-07 | 2019-12-05 | ローデンシュトック ゲーエムベーハー | Layer system and optical element comprising layer system |
| CN105093377A (en) * | 2015-09-17 | 2015-11-25 | 京东方科技集团股份有限公司 | Blue ray attenuation device and preparation method, base plate, displayer and intelligent wearable product |
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