JPH088362A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH088362A
JPH088362A JP6141417A JP14141794A JPH088362A JP H088362 A JPH088362 A JP H088362A JP 6141417 A JP6141417 A JP 6141417A JP 14141794 A JP14141794 A JP 14141794A JP H088362 A JPH088362 A JP H088362A
Authority
JP
Japan
Prior art keywords
wiring layer
capacitor
base substrate
ground
cap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6141417A
Other languages
Japanese (ja)
Other versions
JP2500310B2 (en
Inventor
Hiromori Tobase
浩守 鳥羽瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP6141417A priority Critical patent/JP2500310B2/en
Publication of JPH088362A publication Critical patent/JPH088362A/en
Application granted granted Critical
Publication of JP2500310B2 publication Critical patent/JP2500310B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65—Shapes or dispositions of interconnections
    • H10W70/654—Top-view layouts
    • H10W70/655—Fan-out layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/874—On different surfaces
    • H10W72/877—Bump connectors and die-attach connectors

Landscapes

  • Semiconductor Integrated Circuits (AREA)

Abstract

(57)【要約】 【目的】高集積化,多ピン化により増大する傾向のグラ
ウンドバウンスノイズを抑制する。 【構成】グラウンド配線層3と電源配線層4を対向させ
て形成したベース基板1の第1のコンデンサに金属層5
a,5bを対向させて形成したキャップ6の第2のコン
デンサを半田封止材10を介して並列接続させることに
より、電源端子とグラウンド端子間のコンデンサ容量を
増加させ、高集積化半導体装置のグラウンドバウンスノ
イズを抑制する。
(57) [Summary] [Purpose] Suppresses ground bounce noise, which tends to increase due to higher integration and higher pin count. [Structure] A metal layer 5 is formed on a first capacitor of a base substrate 1 formed by facing a ground wiring layer 3 and a power supply wiring layer 4 to each other.
By connecting the second capacitors of the cap 6 formed by facing a and 5b in parallel with each other through the solder sealing material 10, the capacitor capacitance between the power supply terminal and the ground terminal is increased, and the high integration semiconductor device Suppresses ground bounce noise.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置に関し、特に
パッケージに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a package.

【0002】[0002]

【従来の技術】従来の半導体装置は、図3に示すよう
に、信号配線2,シート状の金属層からなるグラウンド
配線層3および電源配線層4を内蔵したベース基板1の
下面に形成してスルーホールを介し信号電線2,グラウ
ンド配線層3,電源配線層4のそれぞれと電気的に接続
した外部端子11を有し、キャップ6の凹部内に半導体
チップ7をろう材8を用いダイマウントした後、半導体
チップ7のバンプ9を介してベース基板1の信号配線
2,グラウンド配線層3,電源配線層4のそれぞれに接
合すると同時にキャップ6を封止材12によりベース基
板1を封止して構成される。
2. Description of the Related Art As shown in FIG. 3, a conventional semiconductor device is formed on the lower surface of a base substrate 1 in which a signal wiring 2, a ground wiring layer 3 made of a sheet metal layer and a power wiring layer 4 are built. It has an external terminal 11 electrically connected to each of the signal wire 2, the ground wiring layer 3, and the power supply wiring layer 4 through the through hole, and the semiconductor chip 7 is die-mounted in the recess of the cap 6 by using the brazing material 8. After that, the base substrate 1 is sealed with the sealing material 12 at the same time as bonding the signal wiring 2, the ground wiring layer 3, and the power wiring layer 4 of the base substrate 1 through the bumps 9 of the semiconductor chip 7. Composed.

【0003】ここで、ベース基板1のグラウンド配線層
3と電極配線層4で形成されるコンデンサにより、図4
に示すように、トランジスタQ1 ,Q2 からなる電子回
路等を有する半導体チップの電源端子とグラウンド端子
間にコンデンサ容量Cb を接続してグラウンドバウンス
ノイズ(半導体チップ上の複数の素子が同時にオン/オ
フした際に生ずるグラウンド配線又は電源電位の変動で
生ずるノイズ)を抑制していた。
Here, the capacitor formed by the ground wiring layer 3 and the electrode wiring layer 4 of the base substrate 1 is used as shown in FIG.
As shown in the transistors Q 1, Q plurality of elements of the ground bounce noise (on the semiconductor chip by connecting a capacitance C b between the power supply terminal of the semiconductor chip and the ground terminal having a 2 formed of an electron circuit or the like are simultaneously turned on (/ Noise generated due to fluctuations in the ground wiring or power supply potential that occur when the power is turned off).

【0004】[0004]

【発明が解決しようとする課題】この従来の半導体装置
は、半導体チップの高集積化に伴う多ピン化でコンデン
サを形成するベース基板の電源配線層およびグラウンド
配線層を貫通するスルーホールの数も増加し、その結
果、金属層の面積が縮小してベース基板のコンデンサ容
量が減少するのに対して半導体チップ上の素子数の増加
によりグラウンドバウンスノイズは増大する傾向にあ
り、グラウンドバウンスノイズを充分には抑制すること
ができなくなってきたという問題があった。
In this conventional semiconductor device, the number of through-holes penetrating the power supply wiring layer and the ground wiring layer of the base substrate forming the capacitor due to the increase in the number of pins accompanying the high integration of the semiconductor chip is also increased. As a result, the area of the metal layer is reduced and the capacitor capacitance of the base substrate is reduced, while the ground bounce noise tends to increase due to the increase in the number of elements on the semiconductor chip. Had a problem that could not be suppressed.

【0005】本発明の目的は、グラウンドバウンスノイ
ズを抑制するための容量値の大きなコンデンサをパッケ
ージ内に内蔵する半導体装置を提供することにある。
An object of the present invention is to provide a semiconductor device in which a capacitor having a large capacitance value for suppressing ground bounce noise is built in a package.

【0006】[0006]

【課題を解決するための手段】本発明の半導体装置は、
シート状の金属層からなるグラウンド配線層および電源
配線層を対向させて形成した第1のコンデンサを内蔵す
る積層構造のベース基板と、少なくとも2層の金属層を
対向させて形成した第2のコンデンサを内蔵し導電性封
止材を介して前記第1のコンデンサと前記第2のコンデ
ンサとを並列接続し且つ前記導電性封止材により前記ベ
ース基板を封止するキャップと、前記キャップの内側に
ダイマウントし且つバンプを介して少くとも前記グラウ
ンド配線層および電源配線層と電気的に接続した半導体
チップとを含んで構成される。
The semiconductor device of the present invention comprises:
A base substrate having a laminated structure containing a first capacitor formed by facing a ground wiring layer and a power supply wiring layer formed of sheet metal layers, and a second capacitor formed by facing at least two metal layers And a cap for connecting the first capacitor and the second capacitor in parallel via a conductive sealing material and sealing the base substrate with the conductive sealing material, and a cap inside the cap. It is configured to include a semiconductor chip that is die-mounted and electrically connected to at least the ground wiring layer and the power supply wiring layer via bumps.

【0007】[0007]

【実施例】次に、本発明について図面を参照して説明す
る。
Next, the present invention will be described with reference to the drawings.

【0008】図1は本発明の一実施例を示す断面図であ
る。
FIG. 1 is a sectional view showing an embodiment of the present invention.

【0009】図1に示すように、信号配線2やシート状
の金属層からなるグラウンド配線層3と電源配線層4と
を対向させて形成したコンデンサを内蔵し、セラミック
やガラスエポキシ等からなる積層構造を有するベース基
板1と、積層構造により少くとも2層の金属層5a,5
bを対向させて形成したコンデンサを内蔵し、内側にA
u−Si合金等のろう材8で半導体チップ7をダイマウ
ントしたセラミックキャップ6とを相対させ、バンプ9
を介して半導体チップ7とベース基板1の信号配線2,
グラウンド配線層3,電源配線層4のそれぞれを電気的
に接続すると同時にキャップ6の周縁部に環状に設けて
キャップ6とベース基板1とを封止する半田封止材10
を介して金属層5aとグラウンド配線層3,金属層5b
と電源配線層4のそれぞれを電気的に接続し、これら信
号配線2,グラウンド配線層3,電源配線4をスルーホ
ールを介してベース基板1の下面に設けた外部端子11
と電気的に接続して構成される。
As shown in FIG. 1, a built-in capacitor formed by opposing a signal wiring 2 and a ground wiring layer 3 made of a sheet-like metal layer and a power supply wiring layer 4 to each other is laminated and made of ceramic or glass epoxy. A base substrate 1 having a structure, and at least two metal layers 5a, 5 having a laminated structure.
Built-in capacitor formed by facing b
The solder cap 8 such as a u-Si alloy is made to face the ceramic cap 6 on which the semiconductor chip 7 is die-mounted, and the bump 9
Signal wiring 2 between the semiconductor chip 7 and the base substrate 1 via
Solder encapsulant 10 for electrically connecting the ground wiring layer 3 and the power supply wiring layer 4 and at the same time annularly provided on the peripheral portion of the cap 6 to seal the cap 6 and the base substrate 1.
Through the metal layer 5a, the ground wiring layer 3, and the metal layer 5b
And the power supply wiring layer 4 are electrically connected to each other, and the signal wiring 2, the ground wiring layer 3, and the power supply wiring 4 are provided on the lower surface of the base substrate 1 via through holes.
It is configured to be electrically connected to.

【0010】ここで、キャップ6内に設けたコンデンサ
は、ベース基板1に内蔵させたコンデンサに比べて、信
号配線等を外部端子11に接続するためのスルーホール
を形成する必要がないため、有効面積が広くなり、ベー
ス基板1に内蔵させたコンデンサに対して約1.5倍の
容量値が得られ、図2に示すように、電源端子とグラウ
ンド端子間にベース基板のコンデンサ容量Cb とキャッ
プのコンデンサ容量Cc が並列に接続され、グラウンド
バウンスノイズを抑制するための充分な大きさのコンデ
ンサ容量を確保できる。
The capacitor provided in the cap 6 is effective because it does not need to form a through hole for connecting the signal wiring to the external terminal 11 as compared with the capacitor built in the base substrate 1. The area is increased, and a capacitance value about 1.5 times that of the capacitor built in the base substrate 1 is obtained. As shown in FIG. 2, between the power supply terminal and the ground terminal, the capacitance C b of the base substrate is The capacitor capacitance C c of the cap is connected in parallel, and a sufficiently large capacitor capacitance for suppressing ground bounce noise can be secured.

【0011】[0011]

【発明の効果】以上説明したように本発明は、パッケー
ジのキャップに金属膜を対向させたコンデンサを形成し
てベース基板のコンデンサと並列接続することにより、
パッケージの多ピン化により低減したベース基板のコン
デンサ容量を補って高集積化された半導体装置のグラウ
ンドバウンスノイズを防止できるという効果を有する。
As described above, according to the present invention, by forming a capacitor with a metal film facing a cap of a package and connecting the capacitor in parallel with a capacitor of a base substrate,
There is an effect that it is possible to prevent the ground bounce noise of the highly integrated semiconductor device by compensating for the capacitor capacitance of the base substrate which is reduced by the increase in the number of pins of the package.

【0012】[0012]

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す断面図。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】本発明の一実施例を説明するための回路図。FIG. 2 is a circuit diagram for explaining an embodiment of the present invention.

【図3】従来の半導体装置の一例を示す断面図。FIG. 3 is a sectional view showing an example of a conventional semiconductor device.

【図4】従来の半導体装置を説明するための回路図。FIG. 4 is a circuit diagram for explaining a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 ベース基板 2 信号配線 3 グラウンド配線 4 電源配線 5a,5b 金属層 6 キャップ 7 半導体チップ 8 ろう材 9 バンプ 10 半田封止材 11 外部端子 12 封止材 1 Base Board 2 Signal Wiring 3 Ground Wiring 4 Power Wiring 5a, 5b Metal Layer 6 Cap 7 Semiconductor Chip 8 Brazing Material 9 Bump 10 Solder Sealing Material 11 External Terminal 12 Sealing Material

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 シート状の金属層からなるグラウンド配
線層および電源配線層を対向させて形成した第1のコン
デンサを内蔵する積層構造のベース基板と、少なくとも
2層の金属層を対向させて形成した第2のコンデンサを
内蔵し導電性封止材を介して前記第1のコンデンサと前
記第2のコンデンサとを並列接続し且つ前記導電性封止
材により前記ベース基板を封止するキャップと、前記キ
ャップの内側にダイマウントし且つバンプを介して少く
とも前記グラウンド配線層および電源配線層と電気的に
接続した半導体チップとを含むことを特徴とする半導体
装置。
1. A base substrate having a laminated structure containing a first capacitor formed by facing a ground wiring layer and a power wiring layer, which are sheet-like metal layers, and at least two metal layers facing each other. And a cap that contains the second capacitor and that connects the first capacitor and the second capacitor in parallel via a conductive sealing material and that seals the base substrate with the conductive sealing material, A semiconductor device comprising: a semiconductor chip that is die-mounted inside the cap and that is electrically connected to at least the ground wiring layer and the power wiring layer via a bump.
【請求項2】 導電性封止材が半田からなる請求項1記
載の半導体装置。
2. The semiconductor device according to claim 1, wherein the conductive sealing material is solder.
JP6141417A 1994-06-23 1994-06-23 Semiconductor device Expired - Lifetime JP2500310B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6141417A JP2500310B2 (en) 1994-06-23 1994-06-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6141417A JP2500310B2 (en) 1994-06-23 1994-06-23 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH088362A true JPH088362A (en) 1996-01-12
JP2500310B2 JP2500310B2 (en) 1996-05-29

Family

ID=15291527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6141417A Expired - Lifetime JP2500310B2 (en) 1994-06-23 1994-06-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2500310B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005012107A (en) * 2003-06-20 2005-01-13 Ngk Spark Plug Co Ltd Intermediate board with built-in capacitor
JP2006147726A (en) * 2004-11-17 2006-06-08 Sony Corp Circuit module body and manufacturing method thereof
JP2006270013A (en) * 2004-11-26 2006-10-05 Kyocera Corp Electronic component storage package and electronic device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005012107A (en) * 2003-06-20 2005-01-13 Ngk Spark Plug Co Ltd Intermediate board with built-in capacitor
JP2006147726A (en) * 2004-11-17 2006-06-08 Sony Corp Circuit module body and manufacturing method thereof
JP2006270013A (en) * 2004-11-26 2006-10-05 Kyocera Corp Electronic component storage package and electronic device

Also Published As

Publication number Publication date
JP2500310B2 (en) 1996-05-29

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A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19960123