JPH0892352A - Sealing resin composition for plastic ball grid array - Google Patents
Sealing resin composition for plastic ball grid arrayInfo
- Publication number
- JPH0892352A JPH0892352A JP20626394A JP20626394A JPH0892352A JP H0892352 A JPH0892352 A JP H0892352A JP 20626394 A JP20626394 A JP 20626394A JP 20626394 A JP20626394 A JP 20626394A JP H0892352 A JPH0892352 A JP H0892352A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- epoxy resin
- weight
- composition
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 40
- 238000007789 sealing Methods 0.000 title claims abstract description 13
- 239000004033 plastic Substances 0.000 title claims description 8
- 239000003822 epoxy resin Substances 0.000 claims abstract description 21
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 229920002545 silicone oil Polymers 0.000 claims abstract description 15
- 239000011256 inorganic filler Substances 0.000 claims abstract description 11
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 11
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 11
- 239000004945 silicone rubber Substances 0.000 claims abstract description 11
- 230000009477 glass transition Effects 0.000 claims abstract description 10
- 229920003986 novolac Polymers 0.000 claims abstract description 10
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 230000000704 physical effect Effects 0.000 claims description 11
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 2
- 239000004848 polyfunctional curative Substances 0.000 abstract 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000012535 impurity Substances 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000012778 molding material Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 229910001415 sodium ion Inorganic materials 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 238000013329 compounding Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 238000013001 point bending Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- -1 dimethylsiloxane Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、プラスチックボールグ
リッドアレイ用封止樹脂組成物に関するものである。TECHNICAL FIELD The present invention relates to a sealing resin composition for a plastic ball grid array.
【0002】[0002]
【従来の技術】従来、ロジックLSIをデバイス化する
にあたって要求されてきた項目として、多ピン化対応が
ある。QFP等のデバイスには、多ピン化の目的のため
に種々の技術的な課題が要求されてきた。例えば、ピン
ピッチが0.3mm以下になることにより、実装時のト
ラブルが増大する。わずかにずれて実装されても不良と
なり、取り外して再度実装するという非常に工数のかか
る工程が要求されている。更に、多ピン化に伴いパッケ
ージサイズも拡大の一途をたどり、実装面積の大型化は
大きな問題となってきている。これらの問題の解決のた
めに、米国・モトローラ社よりOMPAC(商品名)と
言う名称のプラスチックボールグリッドアレイ(以下B
GAという)が開発された。図2を用いてBGAの概略
を説明する。図2はBGAの断面図である。エポキシ樹
脂、ポリイミド樹脂等の積層板からなる回路基板1の表
面に銀ペーストでICチップ3を実装し、これを封止樹
脂組成物2で封止し、その後回路基板1の下面に、ピン
の変わりにソルダーボール5が付けられたものである。
ソルダーボール同士の間隔は、現状で一番短いものでも
1mmであり、QFPのピンピッチに比べると実装が容
易である。更に、実装面積が小さく、熱放散性が良好な
ことからピンカウントが多くなるとコストメリットもあ
り、米国を中心にBGAがかなりの勢いで立ち上がりつ
つある。しかし、BGAにも欠点があり、最も大きな問
題は封止樹脂組成物と回路基板との熱膨張係数の差によ
るパッケージの反りが発生し易いことである。これを解
決するために、種々の封止樹脂組成物の開発が行われて
いるが、反りを完全に解決するまでに至っていない(例
えば、特開平5−67705号公報)。2. Description of the Related Art Conventionally, an item that has been required in order to make a logic LSI into a device is to support a large number of pins. Devices such as QFP have been required to have various technical problems for the purpose of increasing the number of pins. For example, when the pin pitch is 0.3 mm or less, troubles during mounting increase. Even if it is mounted with a slight deviation, it becomes defective, and a very time-consuming process of removing and mounting again is required. Further, as the number of pins increases, the package size also keeps expanding, and the increase in mounting area has become a big problem. In order to solve these problems, a plastic ball grid array called OMPAC (trade name) from Motorola, Inc. in the United States (hereinafter referred to as B
GA) was developed. The outline of the BGA will be described with reference to FIG. FIG. 2 is a sectional view of the BGA. An IC chip 3 is mounted with silver paste on the surface of a circuit board 1 made of a laminated plate of epoxy resin, polyimide resin or the like, and the IC chip 3 is sealed with a sealing resin composition 2, and then the lower surface of the circuit board 1 is covered with pins. Instead, a solder ball 5 is attached.
The shortest distance between the solder balls at present is 1 mm, which is easier to mount than the pin pitch of the QFP. Furthermore, since the mounting area is small and the heat dissipation is good, there is a cost advantage when the pin count increases, and BGA is starting up with considerable momentum mainly in the United States. However, BGA also has a drawback, and the biggest problem is that the package warps easily due to the difference in thermal expansion coefficient between the encapsulating resin composition and the circuit board. In order to solve this, various encapsulating resin compositions have been developed, but the warpage has not been completely resolved (for example, JP-A-5-67705).
【0003】[0003]
【発明が解決しようとする課題】本発明は、反りの少な
いBGAパッケージに適した封止樹脂組成物を提供する
ことを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a sealing resin composition suitable for a BGA package with less warpage.
【0004】[0004]
【課題を解決するための手段】本発明は、回路基板の表
面に銀ペーストで半導体素子を実装し、該実装品を封止
するエポキシ樹脂組成物が、(A)式(1)に示す多官
能エポキシ樹脂、According to the present invention, an epoxy resin composition for mounting a semiconductor element on a surface of a circuit board with a silver paste and sealing the mounted product has a large amount represented by the formula (A) (1). Functional epoxy resin,
【0005】[0005]
【化3】 [Chemical 3]
【0006】(B)平均重合度3以上のフェノールノボ
ラック樹脂硬化剤、(C)硬化促進剤、(D)全組成物
中に無機充填材を72重量%以上含み、かつ(E)全組
成物中に、式(2)で示されるシリコーンオイル(B) Phenolic novolac resin curing agent having an average degree of polymerization of 3 or more, (C) curing accelerator, (D) total composition containing 72% by weight or more of an inorganic filler, and (E) total composition And the silicone oil represented by the formula (2)
【0007】[0007]
【化4】 [Chemical 4]
【0008】および/またはシリコーンゴムを2.0重
量%以上含むことからなるプラスチックボールグリッド
アレイ用封止樹脂組成物である。また前記封止樹脂組成
物の硬化物が、ガラス転移温度180℃以上、常温の弾
性率1400kgf/mm2以下で、かつ常温の熱膨張
係数1.4×10-5/℃以下の物性を有するものであ
り、BGAを成形したときの反りが極めて低く、良好な
BGAデバイスを得ることができる。A sealing resin composition for a plastic ball grid array, which comprises 2.0% by weight or more of silicone rubber. The cured product of the encapsulating resin composition has a glass transition temperature of 180 ° C. or higher, an elastic modulus of 1400 kgf / mm 2 or less at room temperature, and a thermal expansion coefficient of 1.4 × 10 −5 / ° C. or less at room temperature. However, the warpage of BGA when molded is extremely low, and a good BGA device can be obtained.
【0009】BGAの反りを低減するため、今迄の知見
に基づき封止樹脂組成物の硬化物のガラス転移温度、常
温の弾性率及び常温の熱膨張係数の3項目の物性に着眼
し、これらの物性について如何なる物性値が必要か有限
要素法による熱応力解析の手法を用いて検討した。図1
は、熱応力解析及び実際に評価した際のBGAの一部の
構成であるエポキシ樹脂積層板からなる回路基板1と封
止樹脂組成物2とを一体化した成形品の斜視図であり、
回路基板1の大きさは24mm×24mm、その厚みは
0.4mmで、硬化した封止樹脂組成物2の大きさは2
0mm×20mmで、その厚みは0.8mmである。硬
化した封止樹脂組成物のガラス転移温度、常温の弾性率
及び常温の熱膨張係数の3項目の物性値を想定し、有限
要素法によるBGAの反りの解析をした結果を表1に示
す。この結果をまとめると、BGAの反り防止に有効な
封止樹脂組成物の物性値は、 ガラス転移温度が180℃以上であること(TM
A)。 常温の弾性率が1400kgf/mm2以下である
こと(3点曲げ法)。 常温の熱膨張係数が1.4×10-5/℃以下である
こと(TMA)である。 上記の3項目の物性値を満足させる封止樹脂組成物を用
いれば、図1の成形品の反りが200ppm以下と小さ
く、BGA用として充分実用性があるものと判断した。In order to reduce the warpage of BGA, we have focused on the three physical properties of the cured resin of the encapsulating resin composition, namely the glass transition temperature, the elastic modulus at room temperature and the coefficient of thermal expansion at room temperature, based on our findings. What kind of physical property values are necessary for the physical properties of slag are investigated using the method of thermal stress analysis by the finite element method. Figure 1
[FIG. 1] is a perspective view of a molded product in which a circuit board 1 made of an epoxy resin laminate, which is a part of the structure of a BGA at the time of thermal stress analysis and actual evaluation, and a sealing resin composition 2 are integrated,
The size of the circuit board 1 is 24 mm × 24 mm, the thickness thereof is 0.4 mm, and the size of the cured sealing resin composition 2 is 2.
It is 0 mm × 20 mm and its thickness is 0.8 mm. Table 1 shows the results of BGA warpage analysis by the finite element method assuming the three physical property values of the glass transition temperature, the elastic modulus at room temperature and the thermal expansion coefficient at room temperature of the cured encapsulating resin composition. Summarizing these results, the physical properties of the encapsulating resin composition effective in preventing warpage of BGA are that the glass transition temperature is 180 ° C. or higher (TM
A). The elastic modulus at room temperature is 1400 kgf / mm 2 or less (3-point bending method). That is, the coefficient of thermal expansion at room temperature is 1.4 × 10 −5 / ° C. or less (TMA). When the encapsulating resin composition satisfying the above-mentioned three physical property values was used, the warp of the molded product of FIG. 1 was as small as 200 ppm or less, and it was judged that it is sufficiently practical for BGA.
【0010】この結果を元に、3項目の物性について種
々の物性値を有する封止樹脂組成物と図1の形状の回路
基板を一体成形し、実際の反りについて測定をした。実
際に評価した反りの測定結果を表2に示す。この結果
は、有限要素法の計算結果とよく一致し、上記の3項目
の物性値が正しいことを証明している。 硬化条件 低圧トランスファー成形にて、175℃、70Kg/c
m2、120秒の成形条件で一体成形し、更にポストモ
ールドキュアとして175℃、8時間の処理を行い、以
下の試験に供した。 ガラス転移温度、常温の熱膨張係数の測定方法(T
MA法) セイコー(株)製・TMA−100を使用。テストピース
サイズは5×5×5mm。0〜300℃を5℃/min
の昇温速度で測定。 常温の弾性率の測定方法(3点曲げ法) オリエンテック(株)製・OCT−10Tを使用。テスト
ピースサイズ80×10×5mm。スパンは64mm、
荷重スピードは2mm/minで測定。 反りの測定方法(表面粗さ計) 東京精密(株) サーフコム1500Aを使用。成形品を
固定し、最大反りをモニターした。図3にBGAパッケ
ージ反り量を表す概略図を示す。Based on these results, the encapsulating resin composition having various physical properties with respect to the three physical properties and the circuit board having the shape shown in FIG. 1 were integrally molded, and the actual warpage was measured. Table 2 shows the measurement results of the warp actually evaluated. This result agrees well with the calculation result of the finite element method, and proves that the above-mentioned three physical property values are correct. Curing conditions Low pressure transfer molding at 175 ° C, 70 Kg / c
It was integrally molded under a molding condition of m 2 for 120 seconds, and was further treated as a post-mold cure at 175 ° C. for 8 hours, and subjected to the following test. Measuring method of glass transition temperature and thermal expansion coefficient at room temperature (T
MA method) TMA-100 manufactured by Seiko Co., Ltd. is used. The test piece size is 5 x 5 x 5 mm. 0 ~ 300 ℃ 5 ℃ / min
Measured at the rate of temperature rise. Measurement method of elastic modulus at room temperature (3-point bending method) Orientec Co., Ltd. OCT-10T is used. Test piece size 80 x 10 x 5 mm. The span is 64 mm,
The load speed is measured at 2 mm / min. Warpage measurement method (surface roughness meter) Tokyo Seimitsu Co., Ltd. Surfcom 1500A is used. The molded parts were fixed and the maximum warpage was monitored. FIG. 3 is a schematic diagram showing the warp amount of the BGA package.
【0011】この結果に基づき、上記の3項目を目標物
性値とし、樹脂配合に関して鋭意検討を行い、下記の封
止樹脂組成物を用いることによりBGAの反り防止に有
効なことが確認できた。Based on these results, the above three items were used as the target physical property values, and intensive investigations were made on the resin composition, and it was confirmed that the use of the encapsulating resin composition described below was effective in preventing warpage of BGA.
【0012】以下に本発明の封止樹脂組成物の各成分に
ついて説明する。本発明に用いる多官能エポキシ樹脂
は、式(1)に示すものである。式中のRは、水素、メ
チル基およびターシャリーブチル基の内から選ばれる同
一または異なった原子または基である。n=1〜10で
あり、10を越えると樹脂粘度が高過ぎ、成形性が低下
する。これらの構造を有するものならば、単独でも混合
して用いてもよい。封止樹脂組成物の耐湿性向上のため
には、不純物としてのClイオン、Naイオン等の不純
物イオンが極力少ないことが望ましい。また、硬化した
封止樹脂組成物のガラス転移温度が180℃未満となら
ない範囲内なら臭素化エポキシ樹脂、オルソクレゾール
ノボラック型エポキシ樹脂、ビフェニル系エポキシ化合
物等の各種のエポキシ樹脂と併用しても差し支えない。Each component of the encapsulating resin composition of the present invention will be described below. The polyfunctional epoxy resin used in the present invention is represented by the formula (1). R in the formula is the same or different atom or group selected from hydrogen, methyl group and tertiary butyl group. n = 1 to 10, and when it exceeds 10, the resin viscosity is too high and the moldability is deteriorated. As long as it has these structures, you may use it individually or in mixture. In order to improve the moisture resistance of the encapsulating resin composition, it is desirable that impurity ions such as Cl ions and Na ions as impurities are minimized. Further, if the glass transition temperature of the cured encapsulating resin composition is within the range of not higher than 180 ° C., it may be used in combination with various epoxy resins such as brominated epoxy resin, orthocresol novolac type epoxy resin and biphenyl type epoxy compound. Absent.
【0013】本発明に用いるフェノールノボラック樹脂
硬化剤は、BGAの反りを防止するために硬化した封止
樹脂組成物のガラス転移温度が180℃以上必要なこと
から、その平均重合度は3以上である必要がある。平均
重合度が3未満だと、封止樹脂組成物のガラス転移温度
が180℃未満となり、BGAの反りが大きくなる。封
止樹脂組成物の耐湿性向上のためには、不純物としての
Clイオン、Naイオン等の不純物イオンが極力少ない
ことが望ましく、また硬化性向上のために水酸基当量は
90〜150g/eqが好ましい。The phenol novolac resin curing agent used in the present invention has an average degree of polymerization of 3 or more because the glass transition temperature of the cured encapsulating resin composition must be 180 ° C. or higher in order to prevent warpage of BGA. Need to be If the average degree of polymerization is less than 3, the glass transition temperature of the encapsulating resin composition will be less than 180 ° C., and the warpage of BGA will increase. In order to improve the moisture resistance of the encapsulating resin composition, it is desirable that impurity ions such as Cl ions and Na ions as impurities are as small as possible, and the hydroxyl equivalent is preferably 90 to 150 g / eq for improving the curability. .
【0014】本発明に用いる硬化促進剤は、エポキシ基
と水酸基の反応を促進するものであれば良く、一般に封
止樹脂に使用されているのものを利用することができ
る。例えば、1,8−ジアザビシクロウンデセン、トリ
フェニルホスフィン、ベンジルジメチルアミン、2−メ
チルイミダゾール等が挙げられ単独でも混合して用いて
もよい。The curing accelerator used in the present invention may be any one as long as it accelerates the reaction between the epoxy group and the hydroxyl group, and those generally used for sealing resins can be used. For example, 1,8-diazabicycloundecene, triphenylphosphine, benzyldimethylamine, 2-methylimidazole and the like can be mentioned, and they may be used alone or in combination.
【0015】本発明に用いられる無機充填材は、溶融シ
リカ粉末、球状シリカ粉末、結晶シリカ粉末、アルミナ
等を使用することができるが、特に溶融シリカ粉末と球
状シリカ粉末の混合物が望ましい。無機充填材は全組成
物中に72重量%以上含む必要がある。無機充填材を7
2重量%以上含む封止樹脂組成物は、熱膨張係数が目標
値の1.4×10-5/℃以下となり、BGAの反りが減
少する。72重量%未満の無機充填材では、封止樹脂組
成物の熱膨張係数が大きくなり、BGAに用い成形した
ときの反りが大きくなり、封止樹脂組成物の特徴を著し
く損なう。また無機充填材が82重量%を越えると成形
時の流動性が低下し、実用的でない。As the inorganic filler used in the present invention, fused silica powder, spherical silica powder, crystalline silica powder, alumina and the like can be used, but a mixture of fused silica powder and spherical silica powder is particularly desirable. The inorganic filler must be contained in the total composition in an amount of 72% by weight or more. 7 inorganic fillers
The encapsulating resin composition containing 2% by weight or more has a thermal expansion coefficient of 1.4 × 10 −5 / ° C. or less, which is a target value, and BGA warpage is reduced. If the inorganic filler content is less than 72% by weight, the thermal expansion coefficient of the encapsulating resin composition will be large, and the warpage when molded for BGA will be large, and the characteristics of the encapsulating resin composition will be significantly impaired. On the other hand, if the content of the inorganic filler exceeds 82% by weight, the fluidity at the time of molding decreases, which is not practical.
【0016】本発明に用いるシリコーンオイルは、式
(2)で示される構造を有する化合物である。式(2)
で示される各種の構造のシリコーンオイルを単独でも混
合して用いてもよい。樹脂組成物の耐湿性向上のために
は、不純物としてのClイオン、Naイオン等の不純物
イオンが極力少ないことが望ましく、さらに成形性向上
のために揮発分の極力少ないことが望ましい。The silicone oil used in the present invention is a compound having a structure represented by the formula (2). Equation (2)
The silicone oils having various structures represented by can be used alone or as a mixture. In order to improve the moisture resistance of the resin composition, it is desirable that impurity ions such as Cl ions and Na ions as impurities be as small as possible, and further that the volatile content be as small as possible in order to improve moldability.
【0017】式(2)の構造のシリコーンオイルは、側
鎖のR1がカルボン酸、エポキシ、シクロヘキシル型エ
ポキシ、ポリアルキレンオキサイドもしくは水素の内の
いずれかであり、またR2としてフェニル基、フェネチ
ル基、エチル基の内のいずれかである。これらの官能基
を有しないシリコーンオイルはエポキシ樹脂に充分に相
溶せず、成形品表面にブリードアウトし、成形品の表面
を汚し、良好な成形品が得られない。更に、シリコーン
主鎖の重合度が6以上(k+l+m=5以上)、301
以下(k+l+m=300以下)であることが必須であ
る。重合度が6未満であると低弾性率性が発現せず、B
GAの反りが大きくなり所定の性能が得られない。重合
度が301を越えると、シリコーンオイルのエポキシ樹
脂に対する相溶性が劣るために成形品表面にブリードア
ウトし、成形品の表面を汚す。In the silicone oil having the structure of the formula (2), R 1 of the side chain is either carboxylic acid, epoxy, cyclohexyl type epoxy, polyalkylene oxide or hydrogen, and R 2 is phenyl group or phenethyl group. It is either a group or an ethyl group. Silicone oils that do not have these functional groups are not sufficiently compatible with the epoxy resin, bleed out on the surface of the molded product and stain the surface of the molded product, and a good molded product cannot be obtained. Further, the degree of polymerization of the silicone main chain is 6 or more (k + l + m = 5 or more), 301
It is indispensable to be the following (k + l + m = 300 or less). If the degree of polymerization is less than 6, the low elastic modulus will not be expressed and B
The warp of GA becomes large and the desired performance cannot be obtained. When the degree of polymerization exceeds 301, the compatibility of the silicone oil with the epoxy resin is poor, so that the surface of the molded product bleeds out and the surface of the molded product is soiled.
【0018】本発明に用いるシリコーンゴムは、ジメチ
ルシロキサンを主体とする化学構造であれば特に限定す
るものではないが、樹脂組成物の流動特性改善のために
は、平均粒子径が5〜50μmの球状であることが望ま
しい。更に粒子表面にエポキシ、シラノール、メルカプ
ト等の極性の反応基を有するものがより望ましい。また
樹脂組成物の耐湿性向上のためには、不純物としてのC
lイオン、Naイオン等の不純物イオンが極力少ないこ
とが望ましく、更に成形性向上のために揮発分の極力少
ないことが望ましい。シリコーンオイルおよび/または
シリコーンゴムは、全組成物中に、2.0重量%以上含
むことが必須である。これらの成分は、封止樹脂組成物
の弾性率を低減させるのに有効である。全組成物中に
2.0重量%以上配合することにより、封止樹脂組成物
の低弾性率化が図られ、常温における弾性率を1400
kgf/mm2以下にできる。これによりBGAの反り
の量を低減できる。但し6.0重量%を越えると、成形
性、特性は問題ないがタブレットの打錠性が著しく低下
するのでハンドリングの問題が発生する。併用する場合
のシリコーンオイルとシリコーンゴムの配合比は特に限
定するものではなく、またシリコーンオイル単独、ある
いはシリコーンゴム単独であっても成形性、信頼性とも
に問題ない。The silicone rubber used in the present invention is not particularly limited as long as it has a chemical structure mainly composed of dimethylsiloxane, but in order to improve the flow characteristics of the resin composition, the average particle diameter is 5 to 50 μm. It is preferably spherical. Further, those having polar reactive groups such as epoxy, silanol, and mercapto on the particle surface are more desirable. Further, in order to improve the moisture resistance of the resin composition, C as an impurity is used.
It is desirable that the amount of impurity ions such as l ion and Na ion is as small as possible, and further that the volatile content is as small as possible in order to improve moldability. It is essential that the silicone oil and / or the silicone rubber be contained in the entire composition in an amount of 2.0% by weight or more. These components are effective in reducing the elastic modulus of the encapsulating resin composition. By blending 2.0% by weight or more in the entire composition, the elastic modulus of the encapsulating resin composition can be lowered and the elastic modulus at room temperature can be 1400.
It can be less than or equal to kgf / mm 2 . This can reduce the amount of BGA warpage. However, when it exceeds 6.0% by weight, the tableting property of the tablet is remarkably deteriorated although the molding property and the characteristic are not problematic, and the handling problem occurs. When used in combination, the compounding ratio of silicone oil and silicone rubber is not particularly limited, and there is no problem in moldability and reliability when silicone oil alone or silicone rubber alone is used.
【0019】本発明の樹脂組成物は多官能エポキシ樹
脂、フェノールノボラック樹脂硬化剤、硬化促進剤、無
機充填材、シリコーンオイルおよび/またはシリコーン
ゴムを必須成分とするが、これ以外に必要に応じてシラ
ンカップリング剤、三酸化アンチモン、ヘキサブロムベ
ンゼン等の難燃剤、カーボンブラック、ベンガラ等の着
色剤、天然ワックス、合成ワックス等の離型剤等の種々
の添加剤を適宜配合しても差し支えない。また、本発明
の封止樹脂組成物を成形材料として製造するには、多官
能エポキシ樹脂、フェノールノボラック樹脂硬化剤、硬
化促進剤、無機充填材、シリコーンオイルおよび/また
はシリコーンゴム、その他の添加剤をミキサー等によっ
て充分に均一に混合した後、更に熱ロールまたはニーダ
ー等で溶融混練し、冷却後粉砕して封止材料とすること
ができる。The resin composition of the present invention contains a polyfunctional epoxy resin, a phenol novolac resin curing agent, a curing accelerator, an inorganic filler, a silicone oil and / or a silicone rubber as essential components. Various additives such as a silane coupling agent, a flame retardant such as antimony trioxide and hexabromobenzene, a coloring agent such as carbon black and red iron oxide, and a release agent such as natural wax and synthetic wax may be appropriately blended. . Further, in order to produce the encapsulating resin composition of the present invention as a molding material, a polyfunctional epoxy resin, a phenol novolac resin curing agent, a curing accelerator, an inorganic filler, a silicone oil and / or a silicone rubber, and other additives are used. Can be sufficiently and uniformly mixed with a mixer or the like, and then melt-kneaded with a hot roll, a kneader or the like, cooled and pulverized to obtain a sealing material.
【0020】以下本発明を実施例にて具体的に説明す
る。 実施例1 下記組成物 式(1)の多官能エポキシ樹脂A(Rは表6に示す) (軟化点60℃、エポキシ当量170) 12.6重量部 フエノールノボラック樹脂硬化剤 (軟化点100℃、水酸基当量105、平均重合度4.0) 8.2重量部 溶融シリカ粉末(平均粒径15μm) 10.0重量部 球状シリカ粉末(平均粒径20μm) 63.0重量部 シリコーンオイルA(R1、R2、k、l、mは表6に示す) 1.2重量部 シリコーンゴムA (平均粒径10μm、球状) 1.0重量部 トリフェニルホスフィン 0.3重量部 カーボンブラック 0.3重量部 三酸化アンチモン 2.0重量部 カルナバワックス 0.3重量部 臭素化フェノールノボラック型エポキシ樹脂 1.1重量部 をミキサーにて常温混合し、70〜100℃で二軸ロー
ルにて混練し、冷却後粉砕し成形材料とした。得られた
成形材料をタブレット化し、図1の回路基板とこの材料
を低圧トランスファー成形機にて175℃、70kg/
mm2、120秒の条件で一体成形し、更にポストモー
ルドキュアとして175℃で8時間の処理を行い成形品
を得た。評価結果を表3に示す。The present invention will be specifically described below with reference to examples. Example 1 Composition below Polyfunctional epoxy resin A of formula (1) (R is shown in Table 6) (softening point 60 ° C., epoxy equivalent 170) 12.6 parts by weight phenol novolac resin curing agent (softening point 100 ° C., Hydroxyl equivalent 105, average degree of polymerization 4.0) 8.2 parts by weight Fused silica powder (average particle size 15 μm) 10.0 parts by weight Spherical silica powder (average particle size 20 μm) 63.0 parts by weight Silicone oil A (R 1 , R 2 , k, l and m are shown in Table 6) 1.2 parts by weight Silicone rubber A (average particle size 10 μm, spherical) 1.0 parts by weight Triphenylphosphine 0.3 parts by weight Carbon black 0.3 parts by weight Parts Antimony trioxide 2.0 parts by weight Carnauba wax 0.3 parts by weight Brominated phenol novolac type epoxy resin 1.1 parts by weight are mixed at room temperature with a mixer, and then a biaxial low temperature is applied at 70 to 100 ° C. Were kneaded with, it was milled after cooling the molding material. The obtained molding material is tabletized, and the circuit board of FIG. 1 and this material are 175 ° C. and 70 kg / in a low-pressure transfer molding machine.
Integral molding was performed under conditions of mm 2 and 120 seconds, and post-mold cure was further performed at 175 ° C. for 8 hours to obtain a molded product. The evaluation results are shown in Table 3.
【0021】評価方法 BGAの反り評価:得られた成形品について、表面粗さ
計を用いて反り量を評価した。 成形品の表面の汚れ評価:得られた成形品について、目
視で成形品表面の油汚れを観察した。Evaluation Method Warpage Evaluation of BGA: The amount of warpage of the obtained molded product was evaluated using a surface roughness meter. Evaluation of stains on the surface of the molded product: Oil stains on the surface of the molded product were visually observed for the obtained molded products.
【0022】実施例2〜6 表3の処方に従って配合し、実施例1と同様にして成形
材料を得、同様に評価した。多官能エポキシ樹脂B(軟
化点60℃、エポキシ当量180、Rは表6に示す)、
多官能エポキシ樹脂C(軟化点65℃、エポキシ当量2
00、Rは表6に示す)。評価結果を表3に示す。 比較例1〜13 表4、表5の処方に従って配合し、実施例1と同様にし
て成形材料を得、同様に評価した。Examples 2 to 6 Compounding was performed according to the formulation shown in Table 3, molding materials were obtained in the same manner as in Example 1, and evaluated in the same manner. Polyfunctional epoxy resin B (softening point 60 ° C., epoxy equivalent 180, R is shown in Table 6),
Polyfunctional epoxy resin C (softening point 65 ° C, epoxy equivalent 2
00 and R are shown in Table 6). The evaluation results are shown in Table 3. Comparative Examples 1 to 13 Compounding was performed according to the formulations shown in Tables 4 and 5, molding materials were obtained in the same manner as in Example 1, and evaluated in the same manner.
【0023】[0023]
【表1】 [Table 1]
【0024】[0024]
【表2】 [Table 2]
【0025】[0025]
【表3】 [Table 3]
【0026】[0026]
【表4】 [Table 4]
【0027】[0027]
【表5】 [Table 5]
【0028】[0028]
【表6】 [Table 6]
【0029】[0029]
【発明の効果】本発明に従うと、従来技術では得れらな
かった反りのきわめて少ないBGAパッケージを得るこ
とができる。本樹脂組成物を電気、電子部品の封止用に
用いた場合、反りの少ないBGAのために回路基板への
実装時のトラブルが少なく、迅速に実装できるので、品
質向上、工程短縮、経費の節減に多大な効果がある。According to the present invention, it is possible to obtain a BGA package with extremely small warpage, which was not possible with the prior art. When this resin composition is used for encapsulation of electric and electronic parts, BGA with less warpage causes less troubles when mounting on a circuit board and can be mounted promptly, resulting in quality improvement, process reduction, and cost reduction. It has a great effect on saving.
【図1】本発明の評価に用いたエポキシ樹脂積層板から
なる回路基板と封止樹脂組成物を一体成形した成形品の
斜視図であり、回路基板の大きさは24mm×24mm
で、その厚さは0.4mm、硬化した封止樹脂組成物の
大きさは20mm×20mmで、その厚さは0.8mm
である。FIG. 1 is a perspective view of a molded product obtained by integrally molding a circuit board made of an epoxy resin laminate used for evaluation of the present invention and a sealing resin composition. The size of the circuit board is 24 mm × 24 mm.
The thickness is 0.4 mm, the size of the cured encapsulating resin composition is 20 mm × 20 mm, and the thickness is 0.8 mm.
Is.
【図2】プラスチックボールグリッドアレイの断面図で
ある。FIG. 2 is a cross-sectional view of a plastic ball grid array.
【図3】プラスチックボールグリッドアレイの反り量を
表す概略図である。FIG. 3 is a schematic diagram showing a warp amount of a plastic ball grid array.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location H01L 23/31
Claims (2)
子を実装し、該実装品を封止するエポキシ樹脂組成物
が、(A)式(1)に示す多官能エポキシ樹脂、 【化1】 (B)平均重合度3以上のフェノールノボラック樹脂硬
化剤、(C)硬化促進剤、(D)全組成物中に無機充填
材を72重量%以上含み、かつ(E)全組成物中に式
(2)で示されるシリコーンオイル 【化2】 および/またはシリコーンゴムを2.0重量%以上含む
ことを特徴とするプラスチックボールグリッドアレイ用
封止樹脂組成物。1. An epoxy resin composition for mounting a semiconductor element on a surface of a circuit board with a silver paste and encapsulating the mounted product is a polyfunctional epoxy resin represented by the formula (1): (B) a phenol novolac resin curing agent having an average degree of polymerization of 3 or more, (C) a curing accelerator, (D) the total composition contains 72% by weight or more of an inorganic filler, and (E) the composition contains the formula Silicone oil represented by (2) And / or a silicone rubber content of 2.0% by weight or more, which is a sealing resin composition for a plastic ball grid array.
が、ガラス転移温度180℃以上、常温の弾性率が14
00kgf/mm2以下で、かつ常温の熱膨張係数が
1.4×10-5/℃以下の物性を有することを特徴とす
るプラスチックボールグリッドアレイ用封止樹脂組成
物。2. The cured product of the encapsulating resin composition according to claim 1, which has a glass transition temperature of 180 ° C. or higher and an elastic modulus of 14 at room temperature.
A sealing resin composition for a plastic ball grid array, which has a physical property of 00 kgf / mm 2 or less and a thermal expansion coefficient at room temperature of 1.4 × 10 −5 / ° C. or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20626394A JP3343448B2 (en) | 1994-07-27 | 1994-08-31 | Sealing resin composition for plastic ball grid array |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6-175641 | 1994-07-27 | ||
| JP17564194 | 1994-07-27 | ||
| JP20626394A JP3343448B2 (en) | 1994-07-27 | 1994-08-31 | Sealing resin composition for plastic ball grid array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0892352A true JPH0892352A (en) | 1996-04-09 |
| JP3343448B2 JP3343448B2 (en) | 2002-11-11 |
Family
ID=26496842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20626394A Expired - Fee Related JP3343448B2 (en) | 1994-07-27 | 1994-08-31 | Sealing resin composition for plastic ball grid array |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3343448B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6166433A (en) * | 1998-03-26 | 2000-12-26 | Fujitsu Limited | Resin molded semiconductor device and method of manufacturing semiconductor package |
| JP2001270932A (en) * | 2000-03-28 | 2001-10-02 | Matsushita Electric Works Ltd | Epoxy resin composition and semiconductor device |
| JP2002097343A (en) * | 2000-09-27 | 2002-04-02 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for interposer, prepreg and copper-clad laminated sheet using the same |
| EP2602289A2 (en) | 2011-12-07 | 2013-06-12 | Nitto Denko Corporation | Epoxy resin composition for electronic parts encapsulation and electronic parts-equipped device using the same |
-
1994
- 1994-08-31 JP JP20626394A patent/JP3343448B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6166433A (en) * | 1998-03-26 | 2000-12-26 | Fujitsu Limited | Resin molded semiconductor device and method of manufacturing semiconductor package |
| JP2001270932A (en) * | 2000-03-28 | 2001-10-02 | Matsushita Electric Works Ltd | Epoxy resin composition and semiconductor device |
| JP2002097343A (en) * | 2000-09-27 | 2002-04-02 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for interposer, prepreg and copper-clad laminated sheet using the same |
| EP2602289A2 (en) | 2011-12-07 | 2013-06-12 | Nitto Denko Corporation | Epoxy resin composition for electronic parts encapsulation and electronic parts-equipped device using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3343448B2 (en) | 2002-11-11 |
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