JPH0896407A - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JPH0896407A JPH0896407A JP6225040A JP22504094A JPH0896407A JP H0896407 A JPH0896407 A JP H0896407A JP 6225040 A JP6225040 A JP 6225040A JP 22504094 A JP22504094 A JP 22504094A JP H0896407 A JPH0896407 A JP H0896407A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- information recording
- optical information
- substrate
- acrylic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 15
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 15
- 239000010409 thin film Substances 0.000 claims abstract description 15
- 238000010521 absorption reaction Methods 0.000 claims abstract description 11
- 230000009477 glass transition Effects 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000010408 film Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 2
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 2
- -1 deca-8-yl Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 229920006352 transparent thermoplastic Polymers 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- AQOSPGCCTHGZFL-UHFFFAOYSA-N 1-(3a-hydroxy-7-methoxy-1,2,4,8b-tetrahydropyrrolo[2,3-b]indol-3-yl)ethanone Chemical compound COC1=CC=C2NC3(O)N(C(C)=O)CCC3C2=C1 AQOSPGCCTHGZFL-UHFFFAOYSA-N 0.000 description 1
- FPZQYYXSOJSITC-UHFFFAOYSA-N 1-(4-chlorophenyl)pyrrole-2,5-dione Chemical compound C1=CC(Cl)=CC=C1N1C(=O)C=CC1=O FPZQYYXSOJSITC-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- PVFYDPMTPBPRQA-UHFFFAOYSA-N 2-methylprop-2-enenitrile;prop-2-enenitrile Chemical compound C=CC#N.CC(=C)C#N PVFYDPMTPBPRQA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 101000985278 Escherichia coli 5-carboxymethyl-2-hydroxymuconate Delta-isomerase Proteins 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000004831 Hot glue Substances 0.000 description 1
- 102100040448 Leukocyte cell-derived chemotaxin 1 Human genes 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- IQYMRQZTDOLQHC-ZQTLJVIJSA-N [(1R,4S)-2-bicyclo[2.2.1]heptanyl] prop-2-enoate Chemical compound C1C[C@H]2C(OC(=O)C=C)C[C@@H]1C2 IQYMRQZTDOLQHC-ZQTLJVIJSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- SKKHNUKNMQLBTJ-QIIDTADFSA-N [(1s,4r)-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@H]2C(OC(=O)C(=C)C)C[C@@H]1C2 SKKHNUKNMQLBTJ-QIIDTADFSA-N 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
(57)【要約】
【目的】 アクリル樹脂基材上に無機薄膜を形成させ
た、光学式情報記録媒体として必要な特性に優れ、且つ
吸湿による変形が小さく、高温高湿下における信頼性に
優れた光学式情報記録媒体を提供する。
【構成】 60℃、90%RH環境下で保存した際、光
学式情報記録媒体基板の中心から20mm以上の領域
で、且つ該記録媒体基板表面から100μmまでの深さ
の領域において、0.5時間後の寸法をL1 、5時間後
における寸法をL2 としたとき、(L1 −L2 )/L1
≦1.0×10-3であるアクリル樹脂製基板上に無機薄
膜が積層された光学式情報記録媒体。(57) [Abstract] [Purpose] An inorganic thin film formed on an acrylic resin substrate has excellent characteristics required for an optical information recording medium, and it is not easily deformed by moisture absorption and has excellent reliability under high temperature and high humidity conditions. And an optical information recording medium. [Structure] When stored in an environment of 60 ° C. and 90% RH, 0.5 in a region of 20 mm or more from the center of the optical information recording medium substrate and a region of 100 μm in depth from the surface of the recording medium substrate. When the dimension after time is L1 and the dimension after 5 hours is L2, (L1-L2) / L1
An optical information recording medium in which an inorganic thin film is laminated on an acrylic resin substrate with ≦ 1.0 × 10 −3 .
Description
【0001】[0001]
【産業上の利用分野】本発明は、光ディスク等の光学式
情報記録媒体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information recording medium such as an optical disc.
【0002】[0002]
【従来の技術】光学式情報記録媒体として、光ディス
ク、光カード等が知られているが、これらは非接触で情
報を読み取れる、レーザー光を絞り込んで記録、再生を
行うため信号を高密度に収録することが可能である、と
いった特徴を有しているため、近年著しく普及が進んで
いる。特に、コンパクトディスク、ビデオディスクに代
表されるように、光ディスクの伸びは著しく、今後ます
ます用いられるようになっていくものと思われる。2. Description of the Related Art Optical discs, optical cards, etc. are known as optical information recording media, but these can read information in a non-contact manner and record signals at high density for recording and reproducing by narrowing down laser light. Since it has a feature that it can be used, it has been remarkably spread in recent years. Especially, as typified by compact discs and video discs, the growth of optical discs is remarkable, and it is expected that they will be used more and more in the future.
【0003】これらの光学式情報記録媒体は、微小な溝
又はピットを表面に形成した透明基材上に反射膜又は記
録膜として金属や金属酸化物等の無機薄膜が形成されて
いるが、無機薄膜の膜厚や組成はその光学式情報記録媒
体の用途により異なり、例えば、コンパクトディスク、
ビデオディスク等の再生専用型光ディスクではアルミ膜
が厚さ60〜100nm程度形成されている。In these optical information recording media, an inorganic thin film such as metal or metal oxide is formed as a reflective film or a recording film on a transparent substrate having fine grooves or pits formed on the surface thereof. The thickness and composition of the thin film differ depending on the application of the optical information recording medium, and include, for example, compact discs,
In a read-only optical disc such as a video disc, an aluminum film is formed with a thickness of about 60 to 100 nm.
【0004】光学式情報記録媒体用の透明基材として
は、ガラスや樹脂が用いられているが、量産性の点か
ら、透明熱可塑性樹脂を使用し、射出成形法によって製
造するのが主流となっている。Glass and resin are used as the transparent substrate for the optical information recording medium, but from the viewpoint of mass productivity, it is the mainstream to use a transparent thermoplastic resin and manufacture it by an injection molding method. Has become.
【0005】透明基材として用いられる透明熱可塑性樹
脂としては、アクリル樹脂やポリカーボネート樹脂、非
晶性ポリオレフィン等が挙げられるが、この中で、アク
リル樹脂は光学特性、成形性に最も優れており、ビデオ
ディスク等に広く用いられている。Examples of the transparent thermoplastic resin used as the transparent substrate include acrylic resin, polycarbonate resin, and amorphous polyolefin. Among them, the acrylic resin has the best optical characteristics and moldability. Widely used for video discs.
【0006】しかしながら、アクリル樹脂は吸水率が大
きく、光ディスク等のように片面に無機薄膜を形成した
場合には、主に基板の片側から水分の吸収が生ずるた
め、吸湿によって反りが生じ易く、長期信頼性の点で改
善が求められている。この問題を回避する方法として、
ビデオディスクでは基板を二枚貼り合わせにする方法が
試みられているが、必ずしも十分ではなく、高温高湿下
に放置すると変形して再生不能となったり、貼り合わせ
面が剥がれる等の問題が生ずることがあった。また、光
学式情報記録媒体は、サイズが小さくなっていく傾向に
あり、それに伴って、基材の厚みも薄くなっていくこと
が予想される。その場合には、基材の強度低下により、
吸湿による変形も大きくなる。However, the acrylic resin has a large water absorption rate, and when an inorganic thin film is formed on one surface such as an optical disk, moisture is absorbed mainly from one side of the substrate, and thus moisture absorption tends to cause warpage, which results in long-term use. Improvement is required in terms of reliability. As a way to avoid this problem,
For video discs, a method of bonding two substrates has been attempted, but it is not always sufficient, and if left under high temperature and high humidity, it may deform and become unreproducible, or the bonded surface may peel off. There was an occasion. Further, the size of the optical information recording medium tends to decrease, and it is expected that the thickness of the base material will decrease accordingly. In that case, due to the decrease in the strength of the substrate,
Deformation due to moisture absorption also increases.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的とすると
ころは、アクリル樹脂基材上に無機薄膜を形成させた、
光学式情報記録媒体として必要な特性に優れ、且つ吸湿
による変形が小さく、高温高湿下における信頼性に優れ
た光学式情報記録媒体を提供することにある。The object of the present invention is to form an inorganic thin film on an acrylic resin substrate,
An object of the present invention is to provide an optical information recording medium which has excellent characteristics required as an optical information recording medium, has a small deformation due to moisture absorption, and has excellent reliability under high temperature and high humidity.
【0008】[0008]
【課題を解決するための手段】本発明の要旨とするとこ
ろは、60℃、90%RH環境下で保存した際、光学式
情報記録媒体基板の中心から20mm以上の領域で、且
つ該記録媒体基板表面から100μmまでの深さの領域
において、0.5時間後の寸法をL1 、5時間後におけ
る寸法をL2 としたとき、(L1 −L2 )/L1 ≦1.
0×10-3であるアクリル樹脂製基板上に無機薄膜が積
層された光学式情報記録媒体にある。SUMMARY OF THE INVENTION The gist of the present invention is that, when stored in an environment of 60 ° C. and 90% RH, the area is 20 mm or more from the center of an optical information recording medium substrate, and the recording medium. When the dimension after 0.5 hour is L1 and the dimension after 5 hours is L2 in a region of a depth of 100 .mu.m from the substrate surface, (L1-L2) /L1.ltoreq.1.
It is an optical information recording medium in which an inorganic thin film is laminated on a 0.times.10.sup.- 3 acrylic resin substrate.
【0009】本発明に用いられるアクリル樹脂として
は、基材を60℃、90%RH環境下で保存した際、基
材の中心から20mm以上の領域で、基板表面から10
0μmまでの深さの領域において、0.5時間後の寸法
をL1 、5時間後における寸法をL2 としたとき、(L
1 −L2 )/L1 ≦1.0×10-3であることが必要で
あり、この条件を外れると基板の反りを改善することが
難しい。As the acrylic resin used in the present invention, when the base material is stored in an environment of 60 ° C. and 90% RH, an area of 20 mm or more from the center of the base material and 10 from the surface of the substrate is used.
When the dimension after 0.5 hours is L1 and the dimension after 5 hours is L2 in the depth range up to 0 μm, (L
It is necessary that 1−L2) /L1≦1.0×10 −3 , and it is difficult to improve the warp of the substrate if the condition is not satisfied.
【0010】上記条件を満足するアクリル樹脂として
は、例えば、ガラス転移温度が110℃以上のもの、吸
水率が1.0%以下のもの、又は、成形基板をガラス転
移温度±30℃以内の温度環境下においてアニーリング
処理したものが挙げられる。As the acrylic resin satisfying the above conditions, for example, one having a glass transition temperature of 110 ° C. or more, one having a water absorption rate of 1.0% or less, or a molded substrate having a glass transition temperature of ± 30 ° C. or less is used. Examples include those that have been annealed in the environment.
【0011】上記アクリル樹脂を構成する単量体組成と
しては特に限定されるものではないが、例えば、メタク
リル酸メチル、及び、その他のメタクリル酸エステル、
アクリル酸エステル又はこれら単量体と共重合性を有す
る他のビニル単量体の共重合体が挙げられる。Although the monomer composition of the acrylic resin is not particularly limited, for example, methyl methacrylate and other methacrylic acid esters,
Examples thereof include acrylic acid esters or copolymers of other vinyl monomers having copolymerizability with these monomers.
【0012】上記メタクリル酸エステル単量体として
は、メタクリル酸メチル、メタクリル酸エチル、メタク
リル酸シクロヘキシル、メタクリル酸フェニル、メタク
リル酸ベンジル、メタクリル酸ノルボルニル、メタクリ
ル酸イソボルニル、メタクリル酸トリシクロ[5,2,
1,02.6 ]デカ−8−イル等が挙げられる。Examples of the methacrylic acid ester monomer include methyl methacrylate, ethyl methacrylate, cyclohexyl methacrylate, phenyl methacrylate, benzyl methacrylate, norbornyl methacrylate, isobornyl methacrylate, tricyclo [5,2, methacrylate].
1,0 2.6 ] deca-8-yl and the like can be mentioned.
【0013】また、アクリル酸エステル単量体として
は、アクリル酸メチル、アクリル酸エチル、アクリル酸
シクロヘキシル、アクリル酸フェニル、アクリル酸ベン
ジル、アクリル酸ノルボルニル、アクリル酸イソボルニ
ル、アクリル酸トリシクロ[5,2,1,02.6 ]デカ
−8−イル等が挙げられる。As the acrylic acid ester monomer, methyl acrylate, ethyl acrylate, cyclohexyl acrylate, phenyl acrylate, benzyl acrylate, norbornyl acrylate, isobornyl acrylate, tricyclo [5,2, acrylate] 1,0 2.6 ] deca-8-yl and the like can be mentioned.
【0014】また、その他の単量体としては、N−シク
ロヘキシルマレイミド、N−フェニルマレイミド、N−
クロロフェニルマレイミド等のマレイミド類、スチレ
ン、α−メチルスチレン等の芳香族ビニル化合物、アク
リロニトリルメタクリロニトリル等のシアン化ビニル化
合物等が挙げられる。Further, as other monomers, N-cyclohexylmaleimide, N-phenylmaleimide, N-
Examples thereof include maleimides such as chlorophenylmaleimide, aromatic vinyl compounds such as styrene and α-methylstyrene, and vinyl cyanide compounds such as acrylonitrile methacrylonitrile.
【0015】本発明における無機薄膜としては、アルミ
ニウム、金などの金属単体もしくはこれらを主成分とす
る金属や、酸化ケイ素、窒化ケイ素、酸化ジルコニウ
ム、硫化亜鉛等の無機誘電体が挙げられる。ここで、形
成する無機薄膜の種類や膜厚、膜組成などは光学式情報
記録媒体の種類により決定される。例えば、通常の再生
専用形光ディスクでは、充分な反射率と耐久性を得るた
めには、アルミ膜を50nm厚以上、好ましくは70n
m厚以上形成する。追記形光ディスクや書換形光ディス
クでは、誘電体と金属を積層して形成するのが普通であ
る。Examples of the inorganic thin film in the present invention include simple metals such as aluminum and gold, metals containing these as the main components, and inorganic dielectrics such as silicon oxide, silicon nitride, zirconium oxide and zinc sulfide. Here, the type and thickness of the inorganic thin film to be formed, the film composition, etc. are determined by the type of the optical information recording medium. For example, in a normal read-only optical disc, in order to obtain sufficient reflectance and durability, the aluminum film has a thickness of 50 nm or more, preferably 70 n or more.
Form at least m thick. In a write-once type optical disc or a rewritable type optical disc, it is usual to form a dielectric and a metal by laminating.
【0016】また、本発明の光学式情報記録媒体には、
目的に応じて無機薄膜上に紫外線硬化樹脂やワックス系
の保護膜を形成しても良く、それを単板のかたちで用い
ても、貼合わせにより両面使用型として用いても良い。Further, the optical information recording medium of the present invention comprises:
An ultraviolet-curable resin or a wax-based protective film may be formed on the inorganic thin film according to the purpose, and it may be used in the form of a single plate or may be used as a double-sided type by laminating.
【0017】[0017]
【実施例】以下に実施例を用いて本発明を更に詳しく説
明するが、本発明の主旨及び適用範囲はこれらの実施例
によって限定されるものではない。EXAMPLES The present invention will be described in more detail below with reference to examples, but the gist and scope of application of the present invention are not limited to these examples.
【0018】実施例、比較例における光ディスクの成形
材料の作製、成形、アルミ薄膜形成、収縮率および反り
変形量の評価は、特に指定のない限り全て以下の方法で
行った。The production, molding, aluminum thin film formation, shrinkage and warpage deformation of the optical disk molding materials in Examples and Comparative Examples were all carried out by the following methods unless otherwise specified.
【0019】成形材料の作製 表1に示した各種単量体混合物を用いて懸濁重合により
表1に示す各種アクリル樹脂のビーズ状共重合体を得
た。Preparation of Molding Material Bead-like copolymers of various acrylic resins shown in Table 1 were obtained by suspension polymerization using various monomer mixtures shown in Table 1.
【0020】得られた共重合体を、(株)池貝製PCM
−30二軸押し出し機で混練し、ペレット化した。The obtained copolymer was PCM manufactured by Ikegai Co., Ltd.
The mixture was kneaded with a -30 twin-screw extruder and pelletized.
【0021】基板成形 以下の条件により信号入り光ディスク基板を作製した。Substrate molding An optical disc substrate with a signal was manufactured under the following conditions.
【0022】・基板仕様 直径120mm×板厚0.6mmの円盤 ・使用スタンパー ピッチ1.6μm、ピット深さ110nmのCD信号入
りスタンパー ・成形機 名機製作所M−70A−DM ・金型 ディスク用金型 基板アニール処理 実施例3及び比較例3のサンプルのみ、以下の条件で基
板アニール処理を行った。-Substrate specifications: Disc with a diameter of 120 mm x plate thickness of 0.6 mm-Stamper used: stamper with a CD signal with a pitch of 1.6 μm and pit depth of 110 nm-Molding machine name machine M-70A-DM-Mold for disk Mold Substrate Annealing Treatment Only the samples of Example 3 and Comparative Example 3 were subjected to substrate annealing treatment under the following conditions.
【0023】実施例3:恒温槽内に、樹脂のガラス転移
温度−20℃で2時間保持した後、徐冷した。Example 3: The glass transition temperature of the resin was kept at -20 ° C for 2 hours in a constant temperature bath and then gradually cooled.
【0024】比較例3:恒温槽内に、樹脂のガラス転移
温度−50℃で5時間保持した後、徐冷した。Comparative Example 3: The glass transition temperature of the resin was kept at -50 ° C. for 5 hours in a constant temperature bath and then gradually cooled.
【0025】無機薄膜形成 真空蒸着法によりアルミを成膜した。具体的には以下の
条件で行った。Formation of Inorganic Thin Film Aluminum was formed into a film by a vacuum deposition method. Specifically, it was performed under the following conditions.
【0026】・使用装置:芝浦製作所製 HCU−12
P−55 ・予備排気:排気時間0.5hr、到着真空度1×10
-5Torr ・蒸発方法:抵抗加熱 ・成膜速度:0.8〜1.2nm/sec ・膜厚:70nm 評価 《材料特性》 〔重量平均分子量〕GPCにより常法にて測定を行っ
た。Equipment used: HCU-12 manufactured by Shibaura Manufacturing Co., Ltd.
P-55 ・ Preliminary evacuation: Evacuation time 0.5 hr, Arrival vacuum degree 1 × 10
-5 Torr-Evaporation method: resistance heating-Film forming rate: 0.8 to 1.2 nm / sec-Film thickness: 70 nm Evaluation <Material characteristics> [Weight average molecular weight] Measurement was carried out by an ordinary method by GPC.
【0027】〔ガラス転移温度〕DSCによりJIS
K7121に従って測定した。[Glass transition temperature] JIS according to DSC
It was measured according to K7121.
【0028】〔平衡吸水率〕サンプルを50℃、170
時間真空中で乾燥後、初期重量(W0 )を測定し、60
℃、90%RH環境の恒温恒湿機中にサンプルの重量が
一定になるまで保存した。その時の重量(W)から平衡
吸水率は以下の式で与えられる。[Equilibrium water absorption rate]
After drying in vacuum for an hour, the initial weight (W0) is measured and 60
The sample was stored in a thermo-hygrostat at 90 ° C. and 90% RH until the weight of the sample became constant. From the weight (W) at that time, the equilibrium water absorption is given by the following formula.
【0029】 平衡吸水率[%]=(W−W0 )/W0 ×100 《基板特性》 〔収縮率〕成形されたディスク基板の中心から3.5c
m以上4.5cm以下の範囲において試験片を切り出
し、次いで試験片の厚みが、表面から70μm以上10
0μm以下となるよう研磨し試験片とした。Equilibrium water absorption rate [%] = (W−W0) / W0 × 100 <Substrate characteristics> [Shrinkage rate] 3.5 c from the center of the molded disc substrate
A test piece is cut out in a range of m to 4.5 cm, and the thickness of the test piece is 70 μm to 10
A test piece was obtained by polishing so as to have a thickness of 0 μm or less.
【0030】ディスクの半径方向に沿った直線上に任意
の2点を決めた後、この試験片を60℃、90%RH環
境下に放置した。次いで、0.5時間が経過した時の上
記2点間距離(L1 )を光学顕微鏡で測定し、5時間後
に再度この2点間の距離(L2 )を測定した。この時の
収縮率(X)は以下の通りである。After determining two arbitrary points on a straight line along the radial direction of the disk, the test piece was left in an environment of 60 ° C. and 90% RH. Then, the distance (L1) between the two points when 0.5 hours had passed was measured with an optical microscope, and after 5 hours, the distance (L2) between the two points was measured again. The shrinkage ratio (X) at this time is as follows.
【0031】X=(L1 −L2 )/L1 <反り変形量>反り測定は単板ディスク、両面型貼り合
わせディスクの両方で行った。X = (L1−L2) / L1 <Amount of warp deformation> The warp was measured on both a single plate disk and a double-sided bonded disk.
【0032】1)単板ディスクの場合 アルミ薄膜を成膜した基板面上に耐湿性を有する下記保
護膜を塗布し、測定サンプルとした。これを60℃、9
0%RHの環境下に外径25mmφのスペーサーで支持
し、アルミ薄膜及び保護膜成膜面を上にして放置した。
200時間後に、サンプルの最外周の変位をスキマゲー
ジにて測定した。1) In the case of a single plate disk A protective film having the following moisture resistance was applied onto the surface of a substrate on which an aluminum thin film had been formed to prepare a measurement sample. This is 60 ℃, 9
It was supported by a spacer having an outer diameter of 25 mmφ in an environment of 0% RH, and left with the aluminum thin film and the protective film forming surface facing upward.
After 200 hours, the displacement of the outermost periphery of the sample was measured with a clearance gauge.
【0033】・使用保護膜材料:ACIジャパン製 P
K−441 2)貼り合わせディスクの場合 1)の方法で作製した単板ディスクを、以下のホットメ
ルト型接着剤で金属膜側同士を貼り合わせ測定サンプル
とした。反り測定方法は単板の場合と同様に行った。Material of protective film used: P manufactured by ACI Japan
K-441 2) In the case of bonded disk The single plate disk manufactured by the method of 1) was bonded to its metal film sides with the following hot melt adhesive to give a measurement sample. The warp measurement method was the same as that for the single plate.
【0034】・使用接着剤:ACIジャパン製 PS−
16 以下の実施例、比較例中で、使用単量体名は次のように
略して記載した。Adhesive used: PS-made by ACI Japan
16 In the following Examples and Comparative Examples, the monomer names used are abbreviated as follows.
【0035】 メタクリル酸メチル :MMA N−シクロヘキシルマレイミド :CHMI アクリル酸シクロヘキシル :CHA スチレン :ST メタクリル酸シクロヘキシル :CHMA アクリル酸メチル :MA 〔実施例1〜3及び比較例1〜3〕表1に示す単量体組
成の共重合体を前記した方法で射出成形し、得られた基
板に70nm厚のアルミ膜を形成した。得られた評価結
果を表1に示した。Methyl methacrylate: MMA N-cyclohexylmaleimide: CHMI Cyclohexyl acrylate: CHA Styrene: ST Cyclohexyl methacrylate: CHMA Methyl acrylate: MA [Examples 1 to 3 and Comparative Examples 1 to 3] A copolymer having a monomer composition was injection-molded by the method described above, and an aluminum film having a thickness of 70 nm was formed on the obtained substrate. The obtained evaluation results are shown in Table 1.
【0036】[0036]
【表1】 [Table 1]
【0037】[0037]
【発明の効果】以上詳述したように、本発明のアクリル
樹脂製光ディスク基板は吸湿による変形が小さく、高温
高湿下における信頼性に優れていることから、その工業
的意義は極めて大きいものである。Industrial Applicability As described above in detail, the acrylic resin optical disk substrate of the present invention has little deformation due to moisture absorption and is excellent in reliability under high temperature and high humidity. Therefore, its industrial significance is extremely large. is there.
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成6年11月24日[Submission date] November 24, 1994
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0036[Correction target item name] 0036
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【0036】[0036]
【表1】 [Table 1]
Claims (4)
際、光学式情報記録媒体基板の中心から20mm以上の
領域で、且つ該記録媒体基板表面から100μmまでの
深さの領域において、0.5時間後の寸法をL1 、5時
間後における寸法をL2 としたとき、(L1 −L2 )/
L1 ≦1.0×10-3であるアクリル樹脂製基板上に無
機薄膜が積層された光学式情報記録媒体。1. When stored in an environment of 60 ° C. and 90% RH, 0 in a region of 20 mm or more from the center of the optical information recording medium substrate and a region of 100 μm in depth from the surface of the recording medium substrate. Assuming that the dimension after 5 hours is L1 and the dimension after 5 hours is L2, (L1-L2) /
An optical information recording medium in which an inorganic thin film is laminated on an acrylic resin substrate having L1 ≤ 1.0 x 10 -3 .
移温度が110℃以上である請求項1記載の光学式情報
記録媒体。2. The optical information recording medium according to claim 1, wherein the acrylic resin constituting the substrate has a glass transition temperature of 110 ° C. or higher.
1.0%以下である請求項1記載の光学式情報記録媒
体。3. The optical information recording medium according to claim 1, wherein the acrylic resin forming the substrate has a water absorption of 1.0% or less.
30℃以内の温度環境下においてアニーリング処理した
ものであることを特徴とする請求項1記載の光学式情報
記録媒体。4. The substrate has a glass transition temperature ± of the substrate resin.
The optical information recording medium according to claim 1, wherein the optical information recording medium is annealed in a temperature environment within 30 ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6225040A JPH0896407A (en) | 1994-09-20 | 1994-09-20 | Optical information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6225040A JPH0896407A (en) | 1994-09-20 | 1994-09-20 | Optical information recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0896407A true JPH0896407A (en) | 1996-04-12 |
Family
ID=16823110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6225040A Pending JPH0896407A (en) | 1994-09-20 | 1994-09-20 | Optical information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0896407A (en) |
-
1994
- 1994-09-20 JP JP6225040A patent/JPH0896407A/en active Pending
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