JPH09105809A - Production of color filter for liquid crystal display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the flatness of color filter surfaces without using over coating by forming the outer peripheral parts of colored layer patterns to the waveforms finer than the resolution at the time of forming the colored layers. SOLUTION: The colored layer mask patterns 3 are first patterned in such a manner that the colored layers are formed within the designed external shape 1 of the colored layers (a). At this time, the outer peripheral parts of the colored layer mask patterns 3 are formed to the waveforms finer than the resolution by the combination of the resist in the formation of the colored layers and an exposure device. The colored layers 6 are therefore, formed in the unmasked parts by a pigment dispersion method (b) (c). The external shapes 4 of the colored layers has the linearity approximate to the case the outer peripheral parts of the colored layer mask patterns 3 are formed as straight lines. The rising at the ends where the colored layers 6 are formed is extremely gentle and therefore, the flatness of the colored layers 6 is not impaired even if the colored layers are combined with a resin black mask 7.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter for a liquid crystal display, and more particularly to a method for manufacturing a color filter having a resin black matrix.

[0002]

2. Description of the Related Art In recent years, liquid crystal displays (hereinafter referred to as "LC
D)), its characteristics such as light weight, thin shape, low power consumption, low voltage drive, and little influence on the human body are noted, and its application area is rapidly expanding. Among them, the color liquid crystal display has been rapidly expanding its application particularly as a display for various devices corresponding to the trend of color display of personal computers and multimedia.

At present, in the color display liquid crystal display which has been industrially put into practical use, the active matrix (hereinafter referred to as "AM") using the twisted nematic (hereinafter referred to as "TN") mode is classified according to its display mode and driving method. ") System and a multiplex system using a super twisted nematic (hereinafter referred to as" STN ") mode.

Here, the principle of color display in the above two methods is common, and each display pixel is divided into dots corresponding to three primary colors, and the voltage applied to the liquid crystal layer in each divided dot is By controlling it, the light transmittance of the dot is controlled, and the color synthesized from each of the three primary colors of which the transmittance is controlled becomes the display color in that pixel. A combination of red (hereinafter referred to as "R"), green (hereinafter referred to as "G"), and blue (hereinafter referred to as "B") is usually used for the above-described three primary colors.

In each dot, a color filter (hereinafter referred to as "CF") is used to selectively transmit one color corresponding to the dot among the three primary colors.

The CF is formed on one surface of the glass-based substrates that are laminated as an LCD on the surface in contact with the liquid crystal. Generally, in an AM-LCD, a thin film transistor (hereinafter referred to as "CF") is used. It is formed on the surface of a substrate (hereinafter referred to as "counter substrate") on the side on which a TFT (hereinafter referred to as "TFT") or a diode (hereinafter referred to as "MIM") is not formed, and a stripe is formed in STN-LCD. It is formed on either one of the substrates.

The components of the LCD will be described below.

(1) Structure of Color Filter (CF) Colored layers of primary colors of R, G, and B are formed on the CF, and light leakage occurs in the gaps between the colored layers and the colored layer regions. A black matrix (hereinafter referred to as "BM") is formed in the portion where it is desired to prevent the light emission and the outer peripheral portion of the LCD display area for the purpose of shielding light.

Here, as a general method for forming the colored layer and the BM, there is a method in which the BM is first formed on the glass substrate and then the colored layer is formed thereon. Further, as another forming method, there is a method in which a colored layer is first formed on a glass substrate, and then a BM is formed so as to fill a gap between the colored layer patterns.

After the colored layer and the BM are formed,
An overcoat (hereinafter referred to as “OC”) layer may be formed on the coloring layer and the BM layer for flattening the surface of the CF. However, in the formation of the OC layer, the load on the process is large and the yield is low, which causes a large cost increase in the production of CF, and it is desirable to omit it from the viewpoint of mass production.

After that, a transparent electrode for driving the liquid crystal is further formed on the layer formed as described above. As a material for the transparent electrode, indium tin oxide (hereinafter referred to as “I
"TO") is used. In the case of the TFT pattern, the ITO pattern is formed on the entire surface.
A stripe pattern is formed for M-LCD and STN-LCD.

(2) Black matrix (BM) As a constituent material of the BM, a metal such as chromium or a black resin is used. The optical density (hereinafter referred to as "OD") for light shielding needs to be about 3 or more for any material,
To achieve this, metallic chromium should be about 0.1 μm or more,
Black resin requires a film thickness of 1 to 2 μm or more.

In recent years, there has been a strong market demand for lowering the reflection of LCDs, and in response to this, the reduction of BM is progressing. A black resin is preferable in terms of characteristics as a BM that is compatible with low reflection. The reflectance of black resin is 60% that of metallic chromium.
On the other hand, it is extremely low at 1 to 3%, the reflection spectrum has little wavelength dependency, and the tint is neutral black. However, since the film thickness is relatively thick as 1 to 2 μm,
The problem is that the flatness of the CF surface is adversely affected.

Another method for achieving low reflection is to use BM by laminating chromium oxide and metallic chromium. However, in this case, the reflectance is 3 to 5%.
Is slightly higher than that of the resin BM, and since the reflectance has wavelength dependency, the tint is not neutral black but blue or purple. Further, also in the film forming step, since two layers of chromium oxide and metallic chromium are usually formed by sputtering, there is a demerit of productivity reduction and cost increase.

(3) Method of Forming Resin BM Several kinds of methods are possible as a method of forming the BM using a black resin on the glass substrate. The representative examples will be described below.

[Method 1] First, a negative photosensitive black resin is formed on a glass substrate. Examples of the film forming method include coating with a spin coater, a method of attaching a black resist previously formed in a film shape to a glass substrate, and a method of cascade coating.

Next, the glass substrate is irradiated with ultraviolet rays through a photomask having a predetermined BM pattern to cure the exposed portion of the black resin.

Then, the BM is formed by removing the unexposed portion of the black resin in the developing process.

[Method 2] First, a nematic photosensitive uncolored resin is formed on a glass substrate in the same manner as in [Method 1].

Next, exposure and development are performed in the same manner as in [Method 1] to pattern the BM original form.

After that, the pattern forming portion is colored black. Coloring methods include electroless plating and dyeing.

[Method 3] First, a black resin having developability is formed on a glass substrate in the same manner as in [Method 1].

Next, a positive photoresist is formed on the surface and exposed and developed in the same manner as in [Method 1]. During development, the photoresist and black resin in the exposed area are removed together.

Then, the black resin is crosslinked and cured by heating, and then the unexposed portion resist is removed.

(4) Colored layer In the method of forming the colored layer, a resin in which a colored pigment is previously dispersed is formed on a substrate, and the resin is patterned into a predetermined shape by a photolithography method (hereinafter referred to as " Pigment dispersion method "), a photosensitive resin film is formed on the substrate.
A method of dyeing after patterning, a method of printing a resin in which color pigments are previously dispersed in a predetermined pattern on a substrate (hereinafter referred to as “printing method”), and a method of dispersing a pigment and a resin in a liquid and electrodepositing them on the substrate. There is a method of forming a predetermined pattern on the.

Among the above-mentioned methods for forming a colored layer, the pigment dispersion method is currently most industrially used as a CF for LCDs for office automation (hereinafter referred to as "OA") applications. On the other hand, CF for OA LCD
The printing method is expected to become popular as a cost-cutting technology.

(5) OC layer In the OC layer, it is not necessary to form the OC layer if it has excellent surface flatness after the colored layer is formed.

By omitting the formation of the OC layer, advantages such as simplification of the process, improvement of yield, and reduction of manufacturing cost can be obtained.

However, depending on the application of CF, extremely high surface flatness may be required, and in that case, it becomes necessary to form an OC layer.

(7) Transparent Electrode A transparent electrode is formed on the outermost surface of CF.

In most cases, ITO is used as the material for the transparent electrode in the state of the art. IT
O may not be patterned depending on the use of CF, or may be patterned by a method such as mask sputtering or photolithography.

The process of forming the colored layer in the above-mentioned conventional process will be described below with reference to the drawings.

FIG. 11 is a diagram showing an example of a designed shape in forming a colored layer by the pigment dispersion method.

As shown in FIG. 11, this shape has the shape of B in the region where the colored layer surrounded by the colored layer design outline 101 is formed.
The opening 102 in which M is not formed is formed.

FIG. 12 is a view showing an example of the prior art in which a colored layer is formed on the design shape shown in FIG. 11 by a pigment dispersion method. (A) shows a mask pattern of the colored layer, (b).
Is a finished plan view after forming the colored layer, (c) is a finished sectional view after forming the colored layer, and (d) is a sectional view after forming the colored layer when combined with a resin black matrix.

First, a colored layer mask pattern 103 for forming a colored layer is patterned in a range narrower than the colored layer design outline 101 (FIG. 12A).

After that, the coloring layer 106 is formed on the unmasked portion by the pigment dispersion method (FIG. 12).
(B), (c)).

Here, when combined with the resin BM107, the portion of the colored layer 106 formed on the resin BM107 rises (FIG. 12 (d)).

FIG. 13 is a diagram showing an example of a design shape in forming a colored layer by a printing method.

As shown in FIG. 13, this shape has a shape of B in the region where the colored layer surrounded by the colored layer design outline 111 is formed.
An opening 112 where M is not formed is formed.

FIG. 14 is a view showing an example of a conventional structure in which a colored layer is formed on the design shape shown in FIG. 13 by a printing method.
(A) is a diagram showing a printing plate pattern of a colored layer, (b) is a finished plan view after the colored layer is formed, (c) is a finished sectional view after the colored layer is formed, and (d) is combined with a resin black matrix. FIG. 6 is a cross-sectional view after formation of a colored layer in the case.

First, the colored layer printing plate pattern 1 for forming a colored layer in a range narrower than the colored layer outline 111.
13 is patterned (FIG. 14A).

After that, the coloring layer 116 is formed on the unmasked portion by the printing method (FIG. 14B,
(C)).

Here, when it is combined with the resin BM117, the portion of the colored layer 116 formed on the resin BM117 rises (FIG. 14 (d)).

As described above, when the colored layer is formed on the resin BM, the colored layer rises in the portion where the resin BM is formed, and the flatness of the CF surface is impaired.

If the flatness of the CF surface is impaired, the alignment of the liquid crystal molecules is likely to be disturbed, and there is a risk of abnormal display.

Therefore, in order to improve the flatness, chromium oxide / metal chromium (hereinafter referred to as “2
It is conceivable that the “layer chrome” will be used as the BM, but as described above, the resin BM is superior in terms of reflectance, tint characteristics, productivity, manufacturing cost, and the like. That is, if it is possible to improve the flatness of the CF final product, the resin BM is superior to the two-layer chromium BM in all aspects.

Therefore, various improvement techniques have been tried so far in order to improve the flatness not only of the resin BM but also of CF in general. A typical example is shown below.

(1) Regarding the one disclosed in Japanese Patent Application Laid-Open No. 4-296721: After forming the organic coating film of the coloring layer / BM, the substrate on which the organic coating film of the coloring layer / BM is formed is treated with an organic solvent. A method is used in which it is installed in a gas phase atmosphere to absorb an organic solvent, the organic coating film formed by absorption is liquefied again to be flat, and then cured.

(2) In the one disclosed in JP-A-4-264503, a photocurable overcoat material is used for surface flattening, and the overcoat is applied by using a roller. At the same time, the overcoat is irradiated with transmitted light from the inside of the roller for curing.

[0051]

However, the above-mentioned conventional device has the following problems.

(1) Regarding the one disclosed in Japanese Unexamined Patent Publication No. 4-296721, dedicated equipment for installing the substrate on which the organic coating film of the coloring layer / BM is formed in a gas phase atmosphere of an organic solvent is required. And
Moreover, control of the conditions of the vapor phase atmosphere becomes complicated.

(2) In the one disclosed in Japanese Unexamined Patent Publication No. 4-264503, overcoating has a problem in that productivity, yield and cost increase as described above.

The present invention has been made in view of the problems of the above-mentioned conventional technique, and it is possible to improve the flatness of the CF surface without using the resin black matrix and without using the overcoat. An object of the present invention is to provide a method for manufacturing a color filter for a liquid crystal display, which can be improved.

[0055]

In order to achieve the above object, the present invention provides a method of patterning a colored layer pattern for forming a colored layer on a substrate on which a resin black matrix is formed, and the patterned substrate. In the method of manufacturing a color filter for a liquid crystal display, in which the colored layer is formed thereon, the outer peripheral portion of the colored layer pattern has a waveform finer than the resolution in forming the colored layer.

Further, the colored layer is formed by a photolithography method of a colored resin.

Further, the colored layer is formed by a printing method.

The printing method is an intaglio offset printing method.

Further, the printing method is a planographic offset printing method.

(Operation) In the present invention configured as described above, since the outer peripheral portion of the pattern for forming the colored layer has a waveform finer than the resolution in forming the colored layer, it is formed in the convex portion of the waveform. The colored layer thus formed also forms a colored layer in the corrugated recesses, and the thickness of the colored layer formed in the corrugated pattern portion becomes thin as a whole. Therefore, when a corrugated pattern is set in the portion where the resin black matrix is formed, even when the colored layer is formed on the resin black matrix, compared with the colored layer formed in the portion where the resin black matrix is not formed. The thickness never increases.

[0061]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

(1) Formation of Colored Layer by Pigment Dispersion Method FIG. 1 is a diagram showing an example of a design shape in the formation of a colored layer by the pigment dispersion method.

In this shape, as shown in FIG. 1, an opening 2 in which a BM is not formed is formed in a region surrounded by the colored layer design outline 1 in which a colored layer is formed.

FIG. 2 is a view showing an example in which a colored layer is formed on the design shape shown in FIG. 1 by the pigment dispersion method.
Is a diagram showing a mask pattern of a colored layer, (b) is a finished plan view after the colored layer is formed, (c) is a finished sectional view after the colored layer is formed, and (d) is a colored layer when combined with a resin black matrix. It is sectional drawing after formation.

First, the colored layer mask pattern 3 is patterned so that a colored layer is formed in the colored layer design outline 1 (FIG. 2A).

Here, the outer peripheral portion of the colored mask pattern 3 has a waveform finer than the resolution due to the combination of the resist and the exposure device in forming the colored layer.

Then, the coloring layer 6 is formed on the unmasked portion by the pigment dispersion method (FIG. 2 (b),
(C)).

Here, on the finished plane of the colored layer 6, the colored layer outline 4 has linearity close to that when the outer peripheral portion of the colored mask pattern 3 is a straight line.

Further, in the cross section of the colored layer 6 shown in FIG. 2C, the rising edge at the end where the colored layer 6 is formed is very gentle. Therefore, even when the colored layer 6 is combined with the resin BM7. The flatness of the colored layer 6 is not impaired (FIG. 2 (d)).

In the pigment dispersion method, the accuracy of the pattern of the photomask printed on the photosensitive resin differs depending on the wavelength of the light source for exposure and the photosensitive resin used.

The reason is that the diffraction phenomenon corresponding to the wavelength causes the light to wrap around, and the pigment particles cause the scattering of the curing light inside the photosensitive resin. This is because the degree of photo-curing of the volatile resin gradually increases as the light intensity increases.

By the effect produced by the above-mentioned phenomenon,
When the fine pattern is exposed, the convex portion is recessed in the wavy convex pattern, and the concave portion is filled in the concave pattern. Therefore, when exposure is performed using a mask having a waveform that is finer than the resolution of pattern formation, the uneven shapes of the waveform are averaged, and the outline portion of the final pattern is located at a position corresponding to the straight line at the center of the unevenness. Is left, and the outer shape of the colored layer has a shape close to a straight line as shown in FIG.

Further, the colored layer formed in the corrugated convex portion also forms the colored layer in the corrugated concave portion, and the thickness of the colored layer formed in the corrugated pattern portion becomes thin as a whole. Does not impair the flatness of.

In the above process, the method for forming the colored layer was spin coating, and the colored layer was a photosensitive negative photoresist. However, the application object of the present invention is not limited to this. Instead, it can be applied to all pigment dispersion methods. That is, as the film forming method, in addition to the above-described method, for example, a method of pasting a negative photosensitive colored resin previously formed in a film shape on the substrate surface,
A method in which a color resin having developability is formed into a film by a method such as spin coating, and a positive photosensitive photoresist is further formed thereon can be applied.

(2) Formation of Colored Layer by Printing Method FIG. 3 is a diagram showing an example of a design shape in forming a colored layer by the printing method.

In this shape, as shown in FIG. 3, an opening 12 in which the BM is not formed is formed in a region surrounded by the colored layer design outline 11 where the colored layer is formed.

FIG. 4 is a diagram showing an example in which a colored layer is formed on the design shape shown in FIG. 3 by a printing method. (A) is a diagram showing a printing plate pattern of the colored layer, (b) is a colored layer. The finished plan view after formation, (c) is the finished sectional view after formation of the colored layer, and (d) is the sectional view after formation of the colored layer when combined with the resin black matrix.

First, the colored layer print pattern 3 is patterned so that the colored layer is formed in the colored layer design outline 11 (FIG. 4A).

Here, the outer peripheral portion of the colored print pattern 13 has a waveform finer than the resolution due to the combination of the ink and the printing device in forming the colored layer.

After that, the coloring layer 16 is formed on the unmasked portion by the printing method (FIG. 4B,
(C)).

Here, on the finished plane of the colored layer 16, the colored layer outline 14 has linearity close to that when the outer peripheral portion of the colored print pattern 13 is a straight line.

Further, in the cross section of the colored layer 16 shown in FIG. 4C, the rising edge at the end where the colored layer 16 is formed is very gradual, and therefore when combined with the resin BM17. The flatness of the colored layer 16 is not impaired (FIG. 4 (d)).

In the printing method, the accuracy of the pattern after printing differs depending on the characteristics of the printing ink used and the characteristics of the printing plate used.

The reason is that the transferability to the transferred surface (in this case, the glass surface) corresponding to the thixotropy characteristic and the adhesiveness of the printing ink is different, and also due to the deformation of the printing plate due to the contact surface pressure during printing. This is because the pattern collapses, and further, deformation occurs due to the pressure from the printing ink plate after transfer.

By the effect produced by the above-mentioned phenomenon,
When the fine pattern is exposed, the convex portion is retracted in the convex pattern and the concave portion is filled in the concave pattern. Therefore, when exposure is performed using a mask having a waveform that is finer than the resolution of pattern formation, the uneven shapes of the waveform are averaged, and the outline portion of the final pattern is located at a position corresponding to the straight line at the center of the unevenness. Is left, and the outer shape of the colored layer becomes a shape close to a straight line as shown in FIG.

Further, the colored layer formed on the convex portion of the corrugation also forms the colored layer on the concave portion of the corrugation, and the thickness of the colored layer formed on the corrugated pattern portion becomes thin as a whole. Does not impair the flatness of.

As the above-mentioned printing method, various printing methods used in CF for liquid crystal displays such as an intaglio offset printing method and a lithographic offset printing method are generally used.

[0088]

EXAMPLES Examples of the present invention will be described below together with comparative examples with reference to the drawings.

(First Example) (1) Formation of Resin Black Matrix FIG. 5 shows a first example of a resin black matrix pattern in which a colored layer is formed in the method for producing a color filter for a liquid crystal display of the present invention. FIG.

In this example, a negative photosensitive acrylic resin in which carbon black was dispersed as a black pigment was used as a resist, and the resin BM was formed by a conventional method for producing the resin BM by photolithography.

The glass substrate has a plate thickness of 1.1 mm and a BM.
Has a film thickness of 2.0 μm. The shape of the pattern was the shape shown in FIG.

Dot size: horizontal 100 μm, vertical 300 μm Display area: horizontal 192 mm, vertical 144 mm (diagonal 9.4 inches) (2) Formation of colored layer FIG. 6 shows a pigment dispersed in the resin black matrix pattern shown in FIG. It is a figure which shows one Example which formed the colored layer by the method, (a) is a figure which shows the mask pattern of a colored layer,
(B) is a finished plan view after forming the colored layer, (c) is a finished sectional view after forming the colored layer, and (d) is a diagram showing a dot display state.

First, the colored layer mask pattern 23 having a finer waveform than the resolution by the combination of the resist and the exposure device in forming the colored layer on the outer peripheral portion is patterned (FIG. 6A).

Then, for each color of R, G, B, a pigment-dispersed photoresist was applied on the resin BM27 by a spin coater, and then exposed by using the pattern shown in FIG. 6 (a) as a photomask. After that, development and post-cure were performed to form the colored layer 26 on the unmasked portion (FIGS. 6B and 6C).

Here, on the finished plane of the colored layer 26, the colored layer outline 24 had linearity close to that when the outer peripheral portion of the colored mask pattern 23 was a straight line.

(3) Formation of transparent electrode ITO is provided only on the display area on the substrate on which the colored layer 26 is formed.
IT by mask sputtering so that the layer is formed
A transparent electrode of O was formed.

CF produced by the series of steps described above
The cross-sectional shape was measured by a scanning electron microscope (SEM). As a result, it had a good plane pattern as shown in FIG. 6B and a good surface flatness as shown in FIG. 6C.

After that, the CF produced by the above steps
To face a thin film transistor (TFT) substrate having a matched pattern, and an LCD panel is formed by a conventional method.
A color LCD was produced.

The display state of the manufactured color LCD is CF
Since the flatness of the surface was good, the liquid crystal molecules did not become defective in alignment, which was good, and good display dots as shown in FIG. 6D could be obtained.

(First Comparative Example) (1) Formation of Resin Black Matrix A resin BM similar to that shown in the first example was formed on a glass substrate.

(2) Formation of Colored Layer FIG. 7 is a diagram showing an example for comparison with the method of forming the colored layer shown in FIG. 6, (a) showing a mask pattern of the colored layer, (b) FIG. 4C is a finished plan view after the formation of the colored layer, FIG. 7C is a finished cross-sectional view after the formation of the colored layer, and FIG.

First, a colored layer mask pattern 123 for forming a colored layer is patterned in a range narrower than the colored layer design outline 121 (FIG. 7A).

After that, the coloring layer 126 was formed on the unmasked portion by the pigment dispersion method (FIG. 7B,
(C)).

(3) Formation of Transparent Electrode A transparent electrode made of ITO was formed on the substrate by the same method as the method shown in the first embodiment.

CF produced by the series of steps described above
The cross-sectional shape of the sample was measured by a scanning electron microscope (SEM). As a result, a pattern having a good flat surface was not produced as shown in FIG. 7B, and the resin BM27 was colored as shown in FIG. 7C. The layer 126 was swollen and the surface flatness was impaired.

After that, the CF produced by the above steps
To face a thin film transistor (TFT) substrate having a matched pattern, and an LCD panel is formed by a conventional method.
A color LCD was produced.

The display state of the manufactured color LCD is CF
Poor surface flatness causes poor alignment of liquid crystal molecules,
This is a defect, and disclinations 128 as shown in FIG. 7D have occurred in the display dots.

Second Example (1) Formation of Resin Black Matrix FIG. 8 shows a second example of a resin black matrix pattern in which a colored layer is formed in the method for producing a color filter for liquid crystal display of the present invention. FIG.

In this example, a negative photosensitive acrylic resin in which carbon black was dispersed as a black pigment was used as a resist, and the resin BM was formed by a conventional method for producing the resin BM by photolithography.

The glass substrate has a plate thickness of 1.1 mm and a BM.
Has a film thickness of 1.5 μm. Further, the shape of the pattern was the shape shown in FIG.

Dot size: 115 μm in width, 342 μm in height Display area: 110 mm in width, 82 mm in length (diagonal 5.4 inches) (2) Formation of colored layer FIG. 9 shows a printing method on the resin black matrix pattern shown in FIG. It is a figure which shows an example which formed the coloring layer by this, (a) is a figure which shows the printing plate pattern of a coloring layer, (b)
FIG. 4C is a finished plan view after the formation of the colored layer, FIG. 7C is a finished cross-sectional view after the formation of the colored layer, and FIG.

First, the colored layer printing plate pattern 33 having a waveform finer than the resolution is patterned on the outer peripheral portion by the combination of the ink and the printing device in forming the colored layer (FIG. 9A).

Then, each of the R, G, and B colors is filled in the intaglio offset original plate, the pattern is transferred to the printing roller, and the printing ink is transferred from the printing roller onto the resin BM27 to pattern the colored layer 36. Then, each time one-color printing was performed, post-cure was performed to form the colored layer 36 on the unmasked portion (FIGS. 9B and 9C).

Here, on the finished plane of the colored layer 36, the colored layer outline 34 had linearity close to that when the outer peripheral portion of the colored print pattern 33 was a straight line.

(3) Formation of transparent electrode ITO is formed only on the display area on the substrate on which the colored layer 36 is formed.
IT by mask sputtering so that the layer is formed
A transparent electrode of O was formed.

CF produced by the series of steps described above
The cross-sectional shape of was measured by a scanning electron microscope (SEM). As a result, it had a good plane pattern as shown in FIG. 9B and a good surface flatness as shown in FIG. 9C.

After that, the CF produced by the above process
To face a thin film transistor (TFT) substrate having a matched pattern, and an LCD panel is formed by a conventional method.
A color LCD was produced.

The display state of the manufactured color LCD is CF
Since the flatness of the surface was good, alignment defects of liquid crystal molecules did not occur, which was good, and good display dots as shown in FIG. 9D could be obtained.

Second Comparative Example (1) Formation of Resin Black Matrix A resin BM similar to that shown in the second example was formed on a glass substrate.

(2) Formation of Colored Layer FIG. 10 is a diagram showing an example for comparison with the method for forming the colored layer shown in FIG. 9, (a) showing the printing plate pattern of the colored layer, (b) ) Is a finished plan view after formation of the coloring layer, (c)
FIG. 4A is a finished sectional view after formation of a colored layer, and FIG.

First, the coloring layer printing plate pattern 133 for forming the coloring layer is patterned in a range narrower than the coloring layer design outline 131 (FIG. 10A).

After that, a coloring layer 136 was formed on the unmasked portion by a printing method (FIG. 7B,
(C)).

(3) Formation of Transparent Electrode A transparent electrode made of ITO was formed on the substrate by the same method as the method shown in the second embodiment.

CF manufactured by the series of steps described above
The cross-sectional shape of the sample was measured with a scanning electron microscope (SEM). As a result, a pattern having a good flat surface was not produced as shown in FIG. 10 (b), and as shown in FIG. The layer 136 was raised, and the surface flatness was impaired.

The display state of the manufactured color LCD is CF
Poor surface flatness causes poor alignment of liquid crystal molecules,
This is a defect, and disclination 138 as shown in FIG. 10D has occurred in the display dot.

[0126]

As described above, according to the present invention, since the outer peripheral portion of the pattern for forming the colored layer has a waveform finer than the resolution in forming the colored layer, the colored layer formed in the convex portion of the waveform is formed. As a result, the colored layer is also formed in the corrugated concave portion, and the thickness of the colored layer formed in the corrugated pattern portion becomes thin as a whole.

As a result, even when the resin black matrix is used for the color filter, the surface of the color filter can be made flat without using the overcoat, which is favorable when the color filter is used for the LCD. You can get the display.

[Brief description of the drawings]

FIG. 1 is a diagram showing an example of a design shape in forming a colored layer by a pigment dispersion method.

2A and 2B are views showing an example in which a colored layer is formed on the design shape shown in FIG. 1 by a pigment dispersion method, FIG. 2A shows a mask pattern of the colored layer, and FIG. Finished plan view, (c) is a finished sectional view after formation of the colored layer, (d)
FIG. 6 is a cross-sectional view after formation of a colored layer when combined with a resin black matrix.

FIG. 3 is a diagram showing an example of a design shape in forming a colored layer by a printing method.

4A and 4B are diagrams showing an example in which a colored layer is formed on the design shape shown in FIG. 3 by a printing method, FIG. 4A is a diagram showing a printing plate pattern of the colored layer, and FIG. A finished plan view, (c) is a finished sectional view after formation of a colored layer, and (d) is a sectional view after formation of a colored layer when combined with a resin black matrix.

FIG. 5 is a diagram showing a first example of a resin black matrix pattern in which a colored layer is formed in the method for producing a color filter for a liquid crystal display of the present invention.

FIG. 6 is a diagram showing an example in which a colored layer is formed on the resin black matrix pattern shown in FIG. 5 by a pigment dispersion method, and (a) is a diagram showing a mask pattern of the colored layer;
(B) is a finished plan view after forming the colored layer, (c) is a finished sectional view after forming the colored layer, and (d) is a diagram showing a dot display state.

7A and 7B are diagrams showing an example for comparison with the method for forming a colored layer shown in FIG. 6, in which FIG. 7A is a diagram showing a mask pattern of the colored layer, and FIG. 7B is a finished plan view after formation of the colored layer; (C) is a finished cross-sectional view after formation of a colored layer, and (d) is a diagram showing a dot display state.

FIG. 8 is a diagram showing a second example of a resin black matrix pattern in which a colored layer is formed in the method for producing a color filter for liquid crystal display of the present invention.

9A and 9B are diagrams showing an example in which a colored layer is formed on the resin black matrix pattern shown in FIG. 8 by a printing method, FIG. 9A is a diagram showing a printing plate pattern of a colored layer, and FIG.
FIG. 4C is a finished plan view after the formation of the colored layer, FIG. 7C is a finished cross-sectional view after the formation of the colored layer, and FIG.

FIG. 10 is a diagram showing an example for comparison with the method for forming a colored layer shown in FIG. 9, (a) showing a printing plate pattern of the colored layer, and (b) showing a finished plan view after forming the colored layer. , (C)
FIG. 4A is a finished sectional view after formation of a colored layer, and FIG.

FIG. 11 is a diagram showing an example of a design shape in forming a colored layer by a pigment dispersion method.

12A and 12B are views showing a conventional example in which a colored layer is formed on the design shape shown in FIG. 11 by a pigment dispersion method, FIG. 12A shows a mask pattern of the colored layer, and FIG. A finished plan view after that, (c) is a finished cross-sectional view after formation of a colored layer, and (d) is a cross-sectional view after formation of a colored layer when combined with a resin black matrix.

FIG. 13 is a diagram showing an example of a design shape in forming a colored layer by a printing method.

14A and 14B are views showing a conventional example in which a colored layer is formed on the design shape shown in FIG. 13 by a printing method, FIG. 14A shows a printing plate pattern of the colored layer, and FIG. A finished plan view after that, (c) is a finished cross-sectional view after formation of the colored layer,
(D) is a cross-sectional view after formation of a colored layer when combined with a resin black matrix.

[Explanation of symbols]

 1,11,121,131 Colored layer design outline 2,12,22,32 Opening 3,23,123 Colored layer mask pattern 4,14,24,34,124,134 Colored layer outline 5 Black matrix 6,16, 26,36,126,136 Colored layer 7,17,27,37 Resin black matrix 13,33,133 Colored layer printing plate pattern 128,138 Disclination

Claims (5)

[Claims] 1. A method of manufacturing a color filter for a liquid crystal display, wherein a colored layer pattern for forming a colored layer is patterned on a substrate on which a resin black matrix is formed, and the colored layer is formed on the patterned substrate. The method for producing a color filter for a liquid crystal display according to the method, wherein an outer peripheral portion of the colored layer pattern has a waveform finer than a resolution in forming the colored layer. 2. The method for manufacturing a color filter for a liquid crystal display according to claim 1, wherein the colored layer is formed by a photolithography method of a colored resin. 3. The method for manufacturing a color filter for a liquid crystal display according to claim 1, wherein the colored layer is formed by a printing method. 4. The method for manufacturing a color filter for a liquid crystal display according to claim 3, wherein the printing method is an intaglio offset printing method. 5. The method for manufacturing a color filter for a liquid crystal display according to claim 3, wherein the printing method is a planographic offset printing method.