JPH09110414A - Method for producing anhydrous silica fine powder and water-repellent silica fine powder - Google Patents
Method for producing anhydrous silica fine powder and water-repellent silica fine powderInfo
- Publication number
- JPH09110414A JPH09110414A JP29327095A JP29327095A JPH09110414A JP H09110414 A JPH09110414 A JP H09110414A JP 29327095 A JP29327095 A JP 29327095A JP 29327095 A JP29327095 A JP 29327095A JP H09110414 A JPH09110414 A JP H09110414A
- Authority
- JP
- Japan
- Prior art keywords
- silica
- fine powder
- water
- acid
- silica fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【課題】 無水シリカ微紛末を表面活性を損なわない
で、比較的本和な条件で、かつ、低コストでに製造しう
る方法を提供する。さらに、低コスト、簡便に、かつ、
あらためて表面処理を行うことなく撥水性シリカ微紛末
を製造する方法を提供する。
【解決手段】 ケイ酸及び/又はケイ酸塩を含んでなる
粘土鉱物を酸処理後、分離してシリカヒドロゲルを得、
これを水及び/又は有機溶媒中に分散処理してシリカ分
散液とし、次いでこれを有機溶媒と共に共沸脱水した
後、乾燥及び/又は焼成する無水シリカ微紛末の製造方
法。(57) Abstract: To provide a method for producing anhydrous silica fine powder under relatively mild conditions and at low cost without impairing the surface activity. Furthermore, low cost, simple, and
Provided is a method for producing a water-repellent silica fine powder without performing surface treatment again. SOLUTION: A clay mineral containing silicic acid and / or silicate is acid-treated and then separated to obtain silica hydrogel,
A method for producing anhydrous silica fine powder, which comprises subjecting this to a dispersion treatment in water and / or an organic solvent to obtain a silica dispersion, and then subjecting this to azeotropic dehydration with an organic solvent, followed by drying and / or firing.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、無水シリカ微紛末
及び撥水性シリカ微紛末の製造方法に関する。さらに詳
しくは、ケイ酸及び/又はケイ酸塩を含んでなる、入手
容易な粘土鉱物より、湿式法で廉価に無水シリカ微紛末
及び撥水性シリカ微紛末を製造する方法に関する。TECHNICAL FIELD The present invention relates to a method for producing anhydrous silica fine powder and water-repellent silica fine powder. More specifically, it relates to a method for inexpensively producing anhydrous silica fine powder and water-repellent silica fine powder from a readily available clay mineral containing silicic acid and / or silicate.
【0002】[0002]
【従来の技術】非晶質の合成シリカは、ゴム、樹脂、接
着剤、塗料、インク、化粧品、医薬品など様々な分野
で、補強剤、増粘剤、沈降防止剤、分散剤など種々の用
途に利用されている。この無水シリカの従来の製造方法
は、乾式法と湿式法の2つに大別できる。前者にはハロ
ゲン化ケイ素を酸水素炎中で高温加水分解する方法等が
あるが、原料が高価であることや、1000℃以上の高
温で処理を行う必要があることなどから、コストが高く
なるという問題があった。また、この方法で得られる無
水シリカは内部表面積を持たない構造であることが確認
されており、用途が限定されるという難点があった。一
方、後者の湿式法は、ケイ酸ソーダと鉱酸および塩類を
水溶液中で反応させる方法である。この湿式法において
は、シリカヒドロゲルより無水シリカ微紛末を製造する
方法としては、シリカヒドロゲル中の水分を有機溶媒で
置換し、この有機溶媒をオートクレーブ中にて臨界温
度、臨界圧力で気化させるエアロゲル法などが知られて
いる。エアロゲル法の場合、臨界状態を形成する装置が
高価となることや高温高圧での処理を必要とするため乾
式法と同様コスト高になるうえ安全性についても課題が
あるなどの問題がある。また、この方法で得られた微粒
子シリカは上記のように生成条件が厳しいために表面活
性が失われる欠点がある。このようなことから、無水シ
リカ微粒子を表面活性を損なわないで、比較的温和な条
件で、低コストで製造しうる方法の開発が望まれてい
た。2. Description of the Related Art Amorphous synthetic silica is used in various fields such as rubber, resin, adhesives, paints, inks, cosmetics and pharmaceuticals in various fields such as reinforcing agents, thickeners, antisettling agents and dispersants. Is used for. The conventional method for producing anhydrous silica can be roughly classified into a dry method and a wet method. The former includes a method of hydrolyzing silicon halide in an oxyhydrogen flame at high temperature, but the cost is high because the raw material is expensive and it is necessary to perform the treatment at a high temperature of 1000 ° C or higher. There was a problem. Further, it has been confirmed that the anhydrous silica obtained by this method has a structure having no internal surface area, and there is a drawback that its use is limited. On the other hand, the latter wet method is a method of reacting sodium silicate with a mineral acid and salts in an aqueous solution. In this wet method, as a method for producing anhydrous silica fine powder from silica hydrogel, the water content in the silica hydrogel is replaced with an organic solvent, and the organic solvent is vaporized at a critical temperature and a critical pressure in an autoclave. The law is known. In the case of the airgel method, there are problems that an apparatus for forming a critical state is expensive and that treatment at high temperature and high pressure is required, so that the cost is high as in the dry method and there is a problem in safety. Further, the fine particle silica obtained by this method has a drawback that the surface activity is lost due to the severe production conditions as described above. Therefore, it has been desired to develop a method capable of producing anhydrous silica fine particles at a low cost under relatively mild conditions without impairing the surface activity.
【0003】また、この無水シリカ表面のシラノール基
を、さらに、ハロシラン、アルコキシシラン、シラザ
ン、シロキサン等のシラン化合物と反応させることによ
り、疎水性に表面改質することも行われている。表面改
質した撥水性シリカは高分子材料との親和性がよく、平
衡水分が上昇しないなどの優れた物性を持ち、従来、シ
リコーンオイル、シランカップリング剤、チタネート系
・アルミネート系カップリング剤などで表面改質して製
造されているが、これらの処理剤が高価であるため製品
コストについての課題はさらに大きく、廉価に簡便に撥
水性シリカを製造する方法の開発が望まれていた。Further, the silanol group on the surface of the anhydrous silica is further reacted with a silane compound such as halosilane, alkoxysilane, silazane, and siloxane to hydrophobically modify the surface. The surface-modified water-repellent silica has good affinity with polymer materials and has excellent physical properties such as equilibrium moisture does not rise. Conventional silicone oil, silane coupling agent, titanate / aluminate coupling agent However, since these treating agents are expensive, the problem of the product cost is further increased, and it has been desired to develop a method for easily and inexpensively producing water-repellent silica.
【0004】[0004]
【発明が解決しようとする課題】したがって本発明は、
無水シリカ微紛末を表面活性を損なわないで、比較的温
和な条件で、かつ、低コストで製造しうる方法を提供す
ることを目的とする。さらに本発明は、低コスト、簡便
に、かつ、あらためて表面処理を行うことなく撥水性シ
リカ微紛末を製造する方法を提供することを目的とす
る。Accordingly, the present invention provides
An object of the present invention is to provide a method capable of producing anhydrous silica fine powder under relatively mild conditions and at low cost without impairing the surface activity. A further object of the present invention is to provide a method for producing a water-repellent silica fine powder at low cost, simply and without performing a new surface treatment.
【0005】[0005]
【課題を解決するための手段】本発明者らは上記課題に
鑑み鋭意研究した結果、ケイ酸を含有する粘土鉱物をを
直接化学処理後、シリカヒドロゲルを形成させ、これを
有機溶媒存在下に共沸脱水させることにより無水シリカ
微紛末及び撥水性シリカ微紛末が得られ、その目的を達
成しうることを見出し、この知見に基づき本発明をなす
に至った。すなわち本発明は、(1)ケイ酸及び/又は
ケイ酸塩を含んでなる粘土鉱物を酸処理して、ケイ酸分
をシリカヒドロゲルとして分離し、このシリカヒドロゲ
ルを分散処理して分散液とし、次いで有機溶媒共存下に
共沸脱水した後、乾燥及び/又は焼成することを特徴と
する無水シリカ微紛末の製造方法、(2)共沸脱水を酸
触媒の存在下で行った後、焼成することを特徴とする
(1)項記載の無水シリカ微紛末の製造方法、(3)シ
リカヒドロゲルの水分散液のシリカ濃度が5〜40重量
%である(1)又は(2)項記載の無水シリカ微紛末の
製造方法、(4)ケイ酸及び/又はケイ酸塩を含んでな
る粘土鉱物を酸処理して得たシリカヒドロゲルを水及び
/又は有機溶媒中に分散させてシリカ分散液とし、次い
でこれを酸触媒の存在下で共沸脱水しうる有機溶媒と共
に共沸脱水した後、乾燥することを特徴とする撥水性シ
リカ微紛末の製造方法、及び(5)シリカヒドロゲルの
水分散液のシリカ濃度が5〜40重量%である(4)項
記載の撥水性シリカ微紛末の製造方法を提供するもので
ある。Means for Solving the Problems The inventors of the present invention have made extensive studies in view of the above problems, and as a result, after directly chemically treating a clay mineral containing silicic acid, a silica hydrogel is formed, and the silica hydrogel is formed in the presence of an organic solvent. It was found that anhydrous silica fine powder and water-repellent silica fine powder can be obtained by azeotropic dehydration, and that the object can be achieved, and the present invention has been completed based on this finding. That is, the present invention comprises (1) acid-treating a clay mineral containing silicic acid and / or a silicate to separate a silicic acid content into silica hydrogel, and the silica hydrogel is subjected to a dispersion treatment to obtain a dispersion liquid. Next, azeotropic dehydration in the coexistence of an organic solvent, followed by drying and / or calcination, a method for producing anhydrous silica fine powder, (2) azeotropic dehydration in the presence of an acid catalyst, followed by calcination (1) The method for producing fine powder of anhydrous silica according to item (1), (3) the silica concentration of the aqueous dispersion of silica hydrogel is 5 to 40% by weight (1) or (2). (4) Dispersing silica hydrogel obtained by acid treatment of clay mineral containing silicic acid and / or silicate in water and / or organic solvent to disperse silica Liquid, then azeotropically in the presence of an acid catalyst A method for producing water-repellent silica fine powder, characterized by azeotropic dehydration with a water-soluble organic solvent, and then drying, and (5) the silica concentration of an aqueous dispersion of silica hydrogel is 5 to 40% by weight. A method for producing the water-repellent silica fine powder according to the item (4) is provided.
【0006】[0006]
【発明の実施の形態】本発明方法において、原料として
ケイ酸及び/又はケイ酸塩を含んでなる粘土鉱物を用い
る。具体的には、ケイ酸を主成分とするものとしては例
えばケイ藻土、ケイ華、アロフェン、川原毛粘土、ケイ
酸白土、クリストバライトなど、ケイ酸塩を主成分とす
るものとしては、酸性白土、ベントナイト、タルクなど
のスメクタイト鉱物、蛇紋岩などのクリソタイル鉱物、
沸石などのゼオライト鉱物、ハロイサイト、カオリナイ
トなどのカオリン鉱物、アスベスト、セピオライトなど
のセピオライト鉱物などの天然鉱物をあげることができ
る。タルク、カオリナイト、ベントナイトなど、不純物
(ケイ酸及び/又はケイ酸塩以外の成分)として酸に難
溶あるいは不溶性のものを含む粘土鉱物を用いる場合
は、酸処理の前に化学処理、熱処理などを行って結晶構
造を破壊することが必要である。これらは単独で用いて
も2種以上を混合して用いてもよい。好ましくはスメク
タイト鉱物、カオリン鉱物、セピオライト鉱物、蛇紋石
鉱物、ゼオライトを用いる。BEST MODE FOR CARRYING OUT THE INVENTION In the method of the present invention, a clay mineral containing silicic acid and / or silicate is used as a raw material. Specifically, those containing silicic acid as the main component include, for example, diatomaceous earth, silica, allophane, Kawara wool clay, silicic acid clay, cristobalite, etc. , Bentonite, talc and other smectite minerals, serpentine and other chrysotile minerals,
Examples thereof include zeolite minerals such as zeolite, kaolin minerals such as halloysite and kaolinite, and natural minerals such as sepiolite minerals such as asbestos and sepiolite. When using clay minerals containing impurities such as talc, kaolinite, bentonite, etc. that are sparingly soluble or insoluble in acids as impurities (components other than silicic acid and / or silicates), chemical treatment, heat treatment, etc. before acid treatment To destroy the crystal structure. These may be used alone or as a mixture of two or more. Smectite minerals, kaolin minerals, sepiolite minerals, serpentine minerals, and zeolites are preferably used.
【0007】これらの粘土鉱物を酸によって処理し、ケ
イ酸及び/又はケイ酸塩を分離する。このとき使用する
酸としては、硫酸、塩酸、硝酸、リン酸などの鉱酸及び
シュウ酸、酢酸、クエン酸などの有機酸を用いることが
でき、工業的実施には硫酸、塩酸、硝酸などが好ましく
使用される。酸の濃度は原料鉱物の結晶構造、化学成
分、形態などによって異なり、適宜選択できるが、例え
ば酸性白土を硫酸で処理する場合は通常10〜40%で
ある。酸処理の条件についても原料鉱物の結晶構造等に
より異なるが、通常60〜150℃、好ましくは80〜
110℃で8時間以上、好ましくは10〜24時間反応
を行う。These clay minerals are treated with acid to separate silicic acid and / or silicates. As the acid used at this time, a mineral acid such as sulfuric acid, hydrochloric acid, nitric acid or phosphoric acid and an organic acid such as oxalic acid, acetic acid or citric acid can be used, and sulfuric acid, hydrochloric acid, nitric acid or the like can be industrially used. Preferably used. The acid concentration varies depending on the crystal structure, chemical composition, morphology, etc. of the raw material mineral and can be appropriately selected, but is usually 10 to 40% when the acid clay is treated with sulfuric acid. The conditions of the acid treatment also vary depending on the crystal structure of the raw material mineral, etc.
The reaction is carried out at 110 ° C. for 8 hours or more, preferably 10 to 24 hours.
【0008】このようにして処理して得た酸処理液から
シリカヒドロゲルを分離する。シリカヒドロゲルの分離
は、ろ過、遠心分離などにより行うことができる。この
ようにろ過などにより母液から分離したシリカヒドロゲ
ルは、常法により十分水洗することが必要である。The silica hydrogel is separated from the acid treatment liquid obtained by the treatment in this way. The silica hydrogel can be separated by filtration, centrifugation or the like. The silica hydrogel thus separated from the mother liquor by filtration or the like needs to be sufficiently washed with water by a conventional method.
【0009】次にこのシリカヒドロゲルを水及び/又は
有機溶媒中に分散させ、シリカ分散液とする。この分散
液とは、シリカをコロイド分散したゾルもしくはシリカ
のサスペンジョンであり、シリカ単分散液である。有機
溶媒は、共沸脱水に用いられるものと同じものが好まし
い。分散させる方法としては、ボールミル、媒体撹拌ミ
ル、その他乳化分散機等でシリカヒドロゲルを湿式粉砕
し、物理的にゲルの構造を変化させて分散させる方法
や、イオン交換法、解膠剤の添加などがあり、好ましく
は湿式粉砕である。このとき、シリカ分散液のシリカ濃
度を5〜40重量%とすることが好ましく、10〜30
重量%とすることがさらに好ましい。シリカ分散液の濃
度が高すぎると、スラリーの粉砕の進行につれて粘度が
上昇し、粉砕効果が減少するために微粉体化が困難とな
る。また、低すぎると、粘度は上がらないものの粉砕効
率が低下し、長時間の粉砕が必要となる。Next, this silica hydrogel is dispersed in water and / or an organic solvent to obtain a silica dispersion liquid. The dispersion liquid is a sol in which silica is colloidally dispersed or a suspension of silica, and is a silica single dispersion liquid. The organic solvent is preferably the same as that used for azeotropic dehydration. As a method of dispersing, a ball mill, a medium stirring mill, or another method in which silica hydrogel is wet pulverized by an emulsifying disperser or the like to physically change the structure of the gel to disperse, an ion exchange method, addition of a deflocculant, etc. However, wet grinding is preferable. At this time, the silica concentration of the silica dispersion is preferably 5 to 40% by weight, and 10 to 30
It is more preferable to set it as the weight%. If the concentration of the silica dispersion is too high, the viscosity increases as the pulverization of the slurry progresses, and the pulverizing effect decreases, so that it becomes difficult to form a fine powder. On the other hand, if it is too low, the viscosity does not increase, but the pulverization efficiency decreases, and pulverization for a long time is required.
【0010】次に、このシリカ分散液を有機溶媒の共存
下に共沸脱水する。共沸脱水処理を開始する時の分散液
中のシリカ(ケイ酸分)の濃度は、好ましくは3〜30
重量%、より好ましくは5〜15重量%とする。用いら
れる有機溶媒としては、アセトン、ベンゼン、グリセリ
ン、酢酸エチル、エタノール、メタノール、プロパノー
ル、ブタノール、ペンタノール、ヘキサノール、ヘプタ
ノール、オクタノール、ノナノールなどがあげられる
が、これらに限定されるものではない。前工程で有機溶
媒を加えてある場合も、必要に応じて有機溶媒を追加す
ることができる。共沸脱水処理を開始する時の水分量は
分散媒体中好ましくは10〜60重量%、より好ましく
は20〜40重量%であり、有機溶媒は分散媒体中、好
ましくは40〜90重量%、より好ましくは50〜60
重量%である。有機溶媒との共沸脱水により、分散液中
の水分が有機溶媒と置換してシリカが無水化するので、
これを乾燥し、必要に応じてさらに焼成することにより
実質的に水分を含有しない無水シリカの微紛末が得られ
る。この共沸脱水ではシリカの無水化とともに、シリカ
表面のシラノール基が有機溶媒と反応してエステル化
し、撥水性を発現する。したがって、共沸脱水の際に酸
触媒の存在下でエステル化反応を行うことにより、シリ
カ粒子表面のシラノール基が完全に置換するので、撥水
性シリカ微粒子を得ることができる。このときの酸とし
ては、硫酸、塩酸などの鉱酸、フッ化ホウ素酸、塩化ア
ルミニウム、塩化亜鉛などを用いることができ、好まし
くは鉱酸を用いる。酸の使用量は、反応液のpHが通常
5以下、好ましくは3以下となる量である。酸触媒を使
用しない場合、エステル化反応の完結に非常に時間がか
かるので、撥水性シリカ微粒子を製造する際には、実用
上好ましくない。エステル化反応を迅速に完結させるう
えでは、共沸脱水の途中で減った分の有機溶媒を随時補
給し、有機溶媒の絶対量を多くしておくことが好まし
い。共沸脱水で蒸発した水及び/又は有機溶媒は、回
収、分離して再利用することができる。Next, this silica dispersion is azeotropically dehydrated in the presence of an organic solvent. The concentration of silica (silicic acid content) in the dispersion when starting the azeotropic dehydration treatment is preferably 3 to 30.
%, More preferably 5 to 15% by weight. Examples of the organic solvent used include, but are not limited to, acetone, benzene, glycerin, ethyl acetate, ethanol, methanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, nonanol and the like. Even when the organic solvent is added in the previous step, the organic solvent can be added if necessary. The amount of water at the time of starting the azeotropic dehydration treatment is preferably 10 to 60% by weight, more preferably 20 to 40% by weight in the dispersion medium, and the organic solvent is preferably 40 to 90% by weight in the dispersion medium. Preferably 50-60
% By weight. By azeotropic dehydration with an organic solvent, the water in the dispersion replaces the organic solvent and the silica is dehydrated,
This is dried and, if necessary, further calcined to obtain anhydrous silica fine powder containing substantially no water. In this azeotropic dehydration, the silanol groups on the silica surface react with an organic solvent to esterify as the silica is dehydrated, and water repellency is exhibited. Therefore, by performing the esterification reaction in the presence of an acid catalyst during the azeotropic dehydration, the silanol groups on the surface of the silica particles are completely replaced, so that water-repellent silica fine particles can be obtained. As the acid at this time, a mineral acid such as sulfuric acid or hydrochloric acid, a fluoroboric acid, aluminum chloride, zinc chloride or the like can be used, and preferably a mineral acid is used. The amount of the acid used is such that the pH of the reaction solution is usually 5 or less, preferably 3 or less. When an acid catalyst is not used, it takes a very long time to complete the esterification reaction, which is not preferable in practice when producing the water-repellent silica fine particles. In order to quickly complete the esterification reaction, it is preferable to replenish the amount of the organic solvent reduced during the azeotropic dehydration as needed to increase the absolute amount of the organic solvent. Water and / or organic solvent evaporated by azeotropic dehydration can be recovered, separated and reused.
【0011】反応終了後、ろ過、遠心分離等により母液
を分離し、酸触媒を使用した場合はこれを洗浄した後、
乾燥及び/又は焼成する。乾燥、焼成の条件は、所望す
るシリカ微粒子の比表面積や表面性状等に応じて選択さ
れるが、通常、乾燥は、80〜200℃、好ましくは1
00〜150℃で24時間程度行う。その後、800℃
以上で焼成すると、無水シリカ微粒子の細孔が封孔し、
比表面積の低いものとなる。比表面積の高い無水シリカ
微粒子を得たい場合の焼成温度は通常800℃以下、好
ましくは300〜800℃とする。300℃以上とする
ことにより、微粒子表面のアルキル基が消失し、表面の
シラノール基が置換していない無水シリカ微粒子が得ら
れる。撥水性シリカ微粒子の場合は、粒子表面のアルキ
ル基を消失させないため、好ましくは300℃以下、よ
り好ましくは150〜250℃で、24時間程度乾燥を
行う。After the reaction is completed, the mother liquor is separated by filtration, centrifugation, etc., and if an acid catalyst is used, this is washed,
Dry and / or bake. The drying and firing conditions are selected according to the desired specific surface area and surface properties of the silica fine particles, but usually the drying is 80 to 200 ° C., preferably 1
It is carried out at 00 to 150 ° C. for about 24 hours. After that, 800 ℃
When fired as above, the pores of anhydrous silica fine particles are sealed,
It has a low specific surface area. When it is desired to obtain anhydrous silica fine particles having a high specific surface area, the firing temperature is usually 800 ° C or lower, preferably 300 to 800 ° C. By setting the temperature to 300 ° C or higher, anhydrous silica fine particles in which the alkyl groups on the fine particle surfaces disappear and the silanol groups on the surface are not substituted are obtained. In the case of water-repellent silica fine particles, drying is preferably performed at 300 ° C. or lower, more preferably 150 to 250 ° C. for about 24 hours in order to prevent the alkyl groups on the particle surface from disappearing.
【0012】こうして本発明方法によって得られる無水
シリカ微粒子は、SiO2 が99%以上の組成を有し、
乾燥又は焼成後は容器に入れて振る程度の弱い力でサブ
ミクロン粉末となるほぐれやすい粉体として得られる。Thus, the anhydrous silica fine particles obtained by the method of the present invention have a composition of SiO 2 of 99% or more,
After drying or firing, the powder is easily loosened to be submicron powder with a weak force such as shaking in a container.
【0013】[0013]
【発明の効果】本発明方法によれば、入手容易な粘土鉱
物を原料として、表面活性の損なわれにくい、比較的温
和な処理を行う、低コストの工程によって、高い比表面
積を持つサブミクロン粒子の形状の無水シリカを得るこ
とができる。また、共沸脱水、乾燥、焼成の条件を変更
するだけで、無水シリカ微粒子の表面のシラノール基の
置換状態を変えることができ、撥水性の表面とすること
も、乾式法で得られる無水シリカと同様の表面とするこ
ともできる。したがって、あらためて表面処理の工程を
行わなくとも高い撥水性を有する超微細の無水シリカ微
粒子を得られるという優れた作用効果を奏する。EFFECTS OF THE INVENTION According to the method of the present invention, submicron particles having a high specific surface area are produced by a low-cost process in which a readily available clay mineral is used as a raw material, the surface activity is not easily impaired, and the treatment is relatively mild. It is possible to obtain anhydrous silica in the form of. Further, by simply changing the conditions of azeotropic dehydration, drying, and calcination, the substitution state of silanol groups on the surface of the anhydrous silica fine particles can be changed, and a water-repellent surface can also be obtained. The same surface can be used. Therefore, there is an excellent effect that ultrafine anhydrous silica fine particles having high water repellency can be obtained without performing the surface treatment step again.
【0014】[0014]
【実施例】次に、本発明を実施例に基づいてさらに詳細
に説明する。 実施例1 酸性白土原鉱(宮城県刈田郡遠刈田産、水分16.7重
量%)2kgに水を加え、濃度23.8%として湿式粉
砕後、土砂分離したスラリー(濃度20.4重量%)に
濃硫酸を加え、硫酸濃度35%に調整した。これを70
℃に加熱し、36時間反応を行った。この途中で少量の
サンプルをとり、水洗、乾燥、粉砕してX線回折の測定
を行った。結果を図1に示す。この結果より、24時間
後にスメクタイトのピークはほとんど消滅し、不純物と
して石英が認められるが、非晶質ケイ酸によるブロード
な回折線となっている。したがって、24時間以上の硫
酸処理で、非晶質化したことがわかる。非晶質化後の試
料の比表面積(BET法)は465m2 /gであった。Next, the present invention will be described in more detail with reference to examples. Example 1 Water was added to 2 kg of acid clay clay ore (produced in Togarita, Karita-gun, Miyagi Prefecture, water content: 16.7% by weight) to obtain a slurry having a concentration of 23.8% and wet-milled, and then a slurry (concentration of 20.4% by weight) separated from the sediment. Concentrated sulfuric acid was added to adjust the sulfuric acid concentration to 35%. This is 70
The mixture was heated to ° C and reacted for 36 hours. During this process, a small amount of sample was taken, washed with water, dried and pulverized to measure X-ray diffraction. The results are shown in FIG. From this result, the peak of smectite almost disappeared after 24 hours and quartz was recognized as an impurity, but the diffraction line was broad due to amorphous silicic acid. Therefore, it can be seen that it was amorphized by the sulfuric acid treatment for 24 hours or more. The specific surface area (BET method) of the sample after amorphization was 465 m 2 / g.
【0015】36時間硫酸処理した試料を真空ろ過機で
ろ別後、ろ紙上のシリカヒドロゲルを水洗し、ハイドロ
サルファイトで脱鉄処理後、亜塩素酸ソーダ溶液で脱色
精製し、水200mlを加え、ボールミルで湿式粉砕し
てシリカ分散液(ゾル、SiO2 濃度15重量%)を得
た。このシリカ分散液200gを1リットル容量の三つ
口フラスコに入れ、1−ブタノール500mlを加え、
マントルヒーターで加熱、撹拌しながら共沸脱水した。
蒸発する水と1−ブタノールはコンデンサーで冷却して
捕集した。共沸脱水の途中、1−ブタノールを随時追加
して加えた。フラスコ内の温度が1−ブタノールの沸点
(117.3℃)に達したときに加熱を止め、冷却後、
ろ過により母液を分離した。フィルターケーキを乾燥器
で120℃で24時間乾燥し、無水シリカの乾燥物1
0.9gを得た。さらに乾燥物の一部を電気炉で600
℃で3時間焼成し、無水シリカの焼成物5.2gを得
た。この無水シリカの乾燥物、焼成物はともにかさ高
く、容器に入れて振る程度の弱い力で容易に微紛末にな
った。微紛末の粒径を遠心沈降粒度測定機(島津製作所
社製、SA−CP3L)で測定したところ、ともに平均
0.85μmで、サブミクロン微紛末であった。乾燥物
から得た微紛末と、焼成物から得た微紛末のそれぞれの
比表面積をBET法で測定したところ、乾燥微紛末は4
00m2 /g、焼成微紛末は450m2/gであった。
また、透過型電子顕微鏡(日本電子社製、JEM−20
10)で観察した結果、ともに10nm程度の一次粒子
が確認された。また、乾燥微紛末と焼成微紛末をそれぞ
れFT−IR(日本分光社製、FT−IR−7300)
で測定したところ、乾燥微紛末にはブチル基のピークが
認められた。この乾燥微紛末を水を入れたビーカー中に
落とすと懸濁した。焼成微紛末ではブチル基のピークは
消失しており、乾式法で得た無水シリカと同様の表面状
態であった。After filtering the sample treated with sulfuric acid for 36 hours with a vacuum filter, the silica hydrogel on the filter paper was washed with water, deironed with hydrosulfite, decolorized and purified with a sodium chlorite solution, and 200 ml of water was added, Wet grinding with a ball mill gave a silica dispersion (sol, SiO 2 concentration 15% by weight). 200 g of this silica dispersion was placed in a three-necked flask having a capacity of 1 liter, 500 ml of 1-butanol was added,
Azeotropic dehydration was performed while heating with a mantle heater and stirring.
Evaporated water and 1-butanol were collected by cooling with a condenser. During the azeotropic dehydration, 1-butanol was additionally added at any time. When the temperature in the flask reaches the boiling point of 1-butanol (117.3 ° C), the heating is stopped, and after cooling,
The mother liquor was separated by filtration. The filter cake was dried in a dryer at 120 ° C. for 24 hours to obtain a dried product of anhydrous silica 1
0.9 g was obtained. Furthermore, 600 parts of the dried product are heated in an electric furnace.
The product was calcined at 3 ° C. for 3 hours to obtain 5.2 g of a calcined product of anhydrous silica. Both the dried and calcined products of this anhydrous silica were bulky, and easily became fine powder with a weak force such as shaking in a container. When the particle size of the fine powder was measured with a centrifugal sedimentation particle size analyzer (manufactured by Shimadzu Corporation, SA-CP3L), both were on average 0.85 μm and were submicron fine powder. The specific surface areas of the fine powder obtained from the dried product and the fine powder obtained from the calcined product were measured by the BET method.
00m 2 / g, firing fine紛末was 450m 2 / g.
In addition, a transmission electron microscope (JEM-20, manufactured by JEOL Ltd.)
As a result of observation in 10), primary particles of about 10 nm were both confirmed. In addition, dry fine powder and calcined fine powder are respectively FT-IR (manufactured by JASCO Corporation, FT-IR-7300).
A peak of butyl group was found in the dried fine powder. The dried fine powder was suspended in a beaker containing water. The butyl group peak disappeared at the end of the calcined fine powder, and the surface state was the same as that of anhydrous silica obtained by the dry method.
【0016】実施例2 実施例1と全く同様にしてシリカ分散液(ゾル、SiO
2 濃度15重量%)を得、これに酸触媒として濃硫酸を
加えてpHを2に調整した。これを実施例1と全く同様
にして1−ブタノールで共沸脱水し、乾燥、焼成を行
い、撥水性シリカの乾燥物及び無水シリカの焼成物を得
た。これらの乾燥物、焼成物も実施例1で得たものと同
様に、かさ高く、容器に入れて振る程度の弱い力で容易
に微紛末となった。実施例1と同様にして微紛末の平均
粒径を測定したところ、乾燥微紛末は0.82μm、焼
成微紛末は0.80μmであった。これらを実施例1と
同様にFT−IRで測定したところ、乾燥微紛末にはブ
チル基のピークが認められた。この乾燥微紛末は、水を
入れたビーカー中に落とし撹拌しても懸濁することな
く、長時間安定に浮き、強い撥水性を示した。焼成微紛
末ではブチル基のピークは消失しており、乾式法で得た
無水シリカと同様の表面状態であった。Example 2 A silica dispersion (sol, SiO 2) was prepared in the same manner as in Example 1.
2 concentration 15% by weight) was obtained, and concentrated sulfuric acid was added to this as an acid catalyst to adjust the pH to 2. This was azeotropically dehydrated with 1-butanol, dried and calcined in the same manner as in Example 1 to obtain a dried product of water-repellent silica and a calcined product of anhydrous silica. Similar to those obtained in Example 1, the dried and fired products were bulky and easily became fine powder with a weak force such as shaking in a container. When the average particle size of the fine powder was measured in the same manner as in Example 1, the dry fine powder was 0.82 μm, and the calcined fine powder was 0.80 μm. When these were measured by FT-IR in the same manner as in Example 1, a butyl group peak was recognized in the dried fine powder. The dried fine powder did not suspend even if dropped into a beaker containing water and stirred, and floated stably for a long time and exhibited strong water repellency. The butyl group peak disappeared at the end of the calcined fine powder, and the surface state was the same as that of anhydrous silica obtained by the dry method.
【0017】実施例1、2の結果をまとめて表1に示
す。比較として、シリカヒドロゲルを水に分散せずに直
接共沸脱水した以外は実施例1と同様にして得た乾燥
物、焼成物の値も併せて表1に示した。本発明方法で得
られる乾燥物及び焼成物は、ともにかさ高く、容器に入
れて振る程度の弱い力で容易に微紛末化したが、比較例
の試料の乾燥物及び焼成物は、一部微紛化しているもの
のゲルの塊がそのまま硬い凝集塊を形成しており、容器
に入れて振る程度では、その塊は粉末化しなかった。The results of Examples 1 and 2 are summarized in Table 1. For comparison, the values of the dried and calcined products obtained in the same manner as in Example 1 except that the silica hydrogel was directly azeotropically dehydrated without being dispersed in water are also shown in Table 1. The dried product and the fired product obtained by the method of the present invention were both bulky and easily finely pulverized with a weak force such as shaking in a container. Although it was finely pulverized, the gel lump formed a hard agglomerate as it was, and the lump was not pulverized by putting it in a container and shaking it.
【0018】[0018]
【表1】 [Table 1]
【0019】実施例3 蛇紋岩(高知県高岡郡日高村産)を200メッシュ(粒
径74μm)以下に粉砕し、2万ガウスで湿式磁選した
試料2kgを10リットル容の容器に入れ、5M硫酸
7.5リットルを加え、100℃で撹拌しながら24時
間反応した。途中で少量のサンプルを取り、実施例1と
同様にX線回折を測定した。結果を図2に示す。この結
果より12時間以上の反応で非晶質化していることがわ
かる。24時間酸処理した試料を実施例1と同様に湿式
粉砕してシリカ分散液(ゾル、SiO2 濃度15重量
%)とし、イソプロパノールで共沸脱水し、120℃で
24時間乾燥して無水シリカ微紛末29.4gを得た。Example 3 Serpentine rock (produced in Hidaka-mura, Takaoka-gun, Kochi) was crushed to a size of 200 mesh (particle size: 74 μm) or less, and 2 kg of wet magnetically selected sample at 20,000 gauss was put in a 10 liter container and 5 M sulfuric acid. 7.5 liters were added, and the mixture was reacted at 100 ° C. for 24 hours while stirring. A small amount of a sample was taken on the way and X-ray diffraction was measured in the same manner as in Example 1. The results are shown in FIG. From these results, it can be seen that the reaction has been made amorphous for 12 hours or more. The sample treated with acid for 24 hours was wet pulverized in the same manner as in Example 1 to obtain a silica dispersion (sol, SiO 2 concentration: 15% by weight), azeotropically dehydrated with isopropanol, and dried at 120 ° C. for 24 hours to obtain a fine anhydrous silica powder. 29.4 g of powder was obtained.
【0020】実施例4 アスベスト(カナダ産)2kgを実施例3と全く同様に
して粉砕、磁選、酸処理したのち、実施例1と同様の処
理を行い、無水シリカ微紛末10.1gを得た。Example 4 2 kg of asbestos (made in Canada) was pulverized, subjected to magnetic separation and acid treatment in exactly the same manner as in Example 3 and then treated in the same manner as in Example 1 to obtain 10.1 g of anhydrous silica fine powder. It was
【0021】実施例5 ゼオライト(栃木県葛生産)2kgについても実施例4
と同様の処理を行い、無水シリカ微紛末10.5gを得
た。Example 5 Example 4 was also applied to 2 kg of zeolite (produced by Kuzu, Tochigi Prefecture).
The same treatment as above was performed to obtain 10.5 g of anhydrous silica fine powder.
【0022】実施例6 カオリン(中国産)2kgを湿式法で精製したのち60
0℃で3時間焼成し、非晶質化したメタカオリンを得
た。これについて実施例3と同様の処理を行い、無水シ
リカ微紛末29.2gを得た。Example 6 2 kg of kaolin (produced in China) was purified by a wet method and then 60
Baking was performed at 0 ° C. for 3 hours to obtain amorphized metakaolin. This was treated in the same manner as in Example 3 to obtain 29.2 g of anhydrous silica fine powder.
【0023】実施例7 セピオライト(スペイン産)2kgを実施例1と同様に
粉砕、酸処理し非晶質化した。この、36時間硫酸処理
した試料を真空ろ過機でろ別後、ろ紙上のシリカヒドロ
ゲルを水洗し、イソプロパノール400mlを加え、ボ
ールミルで湿式粉砕してシリカ分散液(ゾル、SiO2
濃度15重量%)を得た。このシリカ分散液200ml
を1リットル容量の三つ口フラスコに入れ、マントルヒ
ーターで加熱、撹拌しながら共沸脱水した。蒸発するイ
ソプロパノールはコンデンサーで冷却して捕集した。共
沸脱水の途中、イソプロパノールを随時追加して加え
た。フラスコ内の温度がイソプロパノールの沸点(8
2.4℃)に達したときに加熱を止め、冷却後、ろ過に
より母液を分離した。フィルターケーキを乾燥器で12
0℃で24時間乾燥し、無水シリカの乾燥物10.9g
を得た。Example 7 2 kg of sepiolite (produced in Spain) was pulverized and acid-treated to be amorphous in the same manner as in Example 1. After filtering the sample treated with sulfuric acid for 36 hours with a vacuum filter, the silica hydrogel on the filter paper was washed with water, 400 ml of isopropanol was added, and wet pulverized with a ball mill to obtain a silica dispersion (sol, SiO 2
A concentration of 15% by weight) was obtained. 200 ml of this silica dispersion
Was placed in a three-necked flask having a capacity of 1 liter, and azeotropically dehydrated while heating with a mantle heater and stirring. Evaporated isopropanol was cooled by a condenser and collected. During the azeotropic dehydration, isopropanol was added at any time. The temperature in the flask is the boiling point of isopropanol (8
When the temperature reached 2.4 ° C., heating was stopped, and after cooling, the mother liquor was separated by filtration. Filter cake in a dryer 12
Dry for 24 hours at 0 ° C., dry product of anhydrous silica 10.9 g
I got
【図1】実施例1で酸性白土を硫酸処理した際の0、
1、3、6、9、13、24、28、32、36時間後
のX線回折の測定結果である。FIG. 1 shows that when acid clay is treated with sulfuric acid in Example 1, 0,
It is a measurement result of X-ray diffraction after 1, 3, 6, 9, 13, 24, 28, 32, 36 hours.
【図2】実施例3で蛇紋岩を硫酸処理した際の0、1、
2、12、24時間後のX線回折の測定結果である。FIG. 2 shows 0, 1, when the serpentine is treated with sulfuric acid in Example 3.
It is a measurement result of X-ray diffraction after 2, 12, and 24 hours.
Claims (5)
粘土鉱物を酸処理後、分離してシリカヒドロゲルを得、
これを水及び/又は有機溶媒中に分散処理してシリカ分
散液とし、次いでこれを有機溶媒と共に共沸脱水した
後、乾燥及び/又は焼成することを特徴とする無水シリ
カ微紛末の製造方法。1. A clay mineral containing silicic acid and / or silicate is treated with an acid and then separated to obtain a silica hydrogel.
A method for producing fine powder of anhydrous silica, which comprises subjecting this to a dispersion treatment in water and / or an organic solvent to obtain a silica dispersion, followed by azeotropic dehydration with an organic solvent, followed by drying and / or calcination. .
焼成することを特徴とする請求項1記載の無水シリカ微
紛末の製造方法。2. After azeotropic dehydration in the presence of an acid catalyst,
The method for producing anhydrous silica fine powder according to claim 1, which comprises firing.
量%である請求項1又は2記載の無水シリカ微紛末の製
造方法。3. The method for producing anhydrous silica fine powder according to claim 1, wherein the silica concentration of the silica dispersion is 5 to 40% by weight.
粘土鉱物を酸処理して得たシリカヒドロゲルを水及び/
又は有機溶媒中に分散させてシリカ分散液とし、次いで
これを酸触媒の存在下で共沸脱水しうる有機溶媒と共に
共沸脱水した後、乾燥することを特徴とする撥水性シリ
カ微紛末の製造方法。4. A silica hydrogel obtained by subjecting a clay mineral containing silicic acid and / or silicate to an acid treatment with water and / or
Alternatively, it is dispersed in an organic solvent to give a silica dispersion, which is then azeotropically dehydrated with an organic solvent capable of being azeotropically dehydrated in the presence of an acid catalyst, followed by drying. Production method.
量%である請求項4記載の撥水性シリカ微紛末の製造方
法。5. The method for producing water-repellent silica fine powder according to claim 4, wherein the silica concentration of the silica dispersion is 5 to 40% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29327095A JPH09110414A (en) | 1995-10-17 | 1995-10-17 | Method for producing anhydrous silica fine powder and water-repellent silica fine powder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29327095A JPH09110414A (en) | 1995-10-17 | 1995-10-17 | Method for producing anhydrous silica fine powder and water-repellent silica fine powder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09110414A true JPH09110414A (en) | 1997-04-28 |
Family
ID=17792656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29327095A Pending JPH09110414A (en) | 1995-10-17 | 1995-10-17 | Method for producing anhydrous silica fine powder and water-repellent silica fine powder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09110414A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005512935A (en) * | 2001-12-26 | 2005-05-12 | ロディア・シミ | Low water absorption silica |
| US7517487B2 (en) * | 2002-03-12 | 2009-04-14 | Degussa Ag | Release agents comprising hydrophobic, nanoscalar particles, and the use of these mold release agents |
| WO2021060202A1 (en) | 2019-09-24 | 2021-04-01 | 豊田合成株式会社 | Frost-resistant water-repellent film and method for manufacturing same |
-
1995
- 1995-10-17 JP JP29327095A patent/JPH09110414A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005512935A (en) * | 2001-12-26 | 2005-05-12 | ロディア・シミ | Low water absorption silica |
| US7517487B2 (en) * | 2002-03-12 | 2009-04-14 | Degussa Ag | Release agents comprising hydrophobic, nanoscalar particles, and the use of these mold release agents |
| WO2021060202A1 (en) | 2019-09-24 | 2021-04-01 | 豊田合成株式会社 | Frost-resistant water-repellent film and method for manufacturing same |
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