JPH09120986A - Pre-alignment method and pre-alignment apparatus - Google Patents
Pre-alignment method and pre-alignment apparatusInfo
- Publication number
- JPH09120986A JPH09120986A JP27861195A JP27861195A JPH09120986A JP H09120986 A JPH09120986 A JP H09120986A JP 27861195 A JP27861195 A JP 27861195A JP 27861195 A JP27861195 A JP 27861195A JP H09120986 A JPH09120986 A JP H09120986A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- reference point
- carrier
- standby
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
(57)【要約】
【課題】 パターンが形成された円形の試料の載置位置
を正確に補正でき、かつ試料のパターンの載置角度を正
確に補正することができるプリアライメント方法および
プリアライメント装置を提供する。
【解決手段】 ステージ2Cと試料1との間の位置ずれ
が試料支持部材8の待機位置をずらすことにより吸収さ
れ、試料1が試料支持部材8の正規の位置に載置され
る。また、ステージ2Cの方向と試料1の方向との間の
ずれ角度が試料支持部材8の待機方向をずらすことによ
り吸収され、試料1が試料支持部材8に対して正規の方
向で載置される。
(57) Abstract: Pre-alignment method and pre-alignment apparatus capable of accurately correcting the placement position of a circular sample on which a pattern is formed and also accurately correcting the placement angle of the pattern of the sample. I will provide a. A positional deviation between a stage 2C and a sample 1 is absorbed by shifting a standby position of a sample support member 8, and the sample 1 is placed on a regular position of the sample support member 8. Further, the shift angle between the direction of the stage 2C and the direction of the sample 1 is absorbed by shifting the standby direction of the sample support member 8, and the sample 1 is placed on the sample support member 8 in the regular direction. .
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体フォトマス
クなどの試料を試料台に搬送する際に使用するプリアラ
イメント方法およびプリアライメント装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a prealignment method and a prealignment apparatus used when a sample such as a semiconductor photomask is transported to a sample stage.
【0002】[0002]
【従来の技術】従来、半導体ウエハや半導体フォトマス
クを製造装置や検査装置の試料台に搬送する際に、試料
の外形または試料上に形成されたパターンのいずれかに
基づいて、試料の位置決めを行なっている。図8におい
て、101はパターン101Aが形成された半導体フォ
トマスク、8は座標測定機の試料台に設けられた試料支
持部材であり、図8は、半導体フォトマスク101が試
料台に載置された状態を示している。試料支持部材8は
3つの突起部を備え、フォトマスク101を3点で支持
する。このように外形が矩形のフォトマスク101を位
置決めする場合には、フォトマスク101の外形からフ
ォトマスク101の中心およびフォトマスク101の方
向が算出できるので、フォトマスク101の中心と試料
支持部材8の中心とを一致させ、かつパターン101A
が所定の方向を向くようにフォトマスク101を試料支
持部材8に載置することができる。2. Description of the Related Art Conventionally, when a semiconductor wafer or a semiconductor photomask is transported to a sample stage of a manufacturing apparatus or an inspection apparatus, the positioning of the sample is performed based on either the outer shape of the sample or the pattern formed on the sample. I am doing it. In FIG. 8, 101 is a semiconductor photomask on which the pattern 101A is formed, 8 is a sample support member provided on the sample stage of the coordinate measuring machine, and FIG. 8 shows the semiconductor photomask 101 placed on the sample stage. It shows the state. The sample support member 8 has three protrusions and supports the photomask 101 at three points. When positioning the photomask 101 having a rectangular outer shape in this way, the center of the photomask 101 and the direction of the photomask 101 can be calculated from the outer shape of the photomask 101, so that the center of the photomask 101 and the sample support member 8 can be calculated. Match the center and pattern 101A
The photomask 101 can be placed on the sample support member 8 so that the photomask 101 faces a predetermined direction.
【0003】[0003]
【発明が解決しようとする課題】しかし、図9に示すよ
うに、試料201が円形の場合、試料201の外周を検
出することにより試料201の中心位置を算出すること
はできるが、試料201の方向を求めることはできな
い。したがって、図10に示すようにパターン201A
の角度を修正できず、試料上のパターン201Aが傾い
たまま試料支持部材8に載置されてしまう。また、試料
上のパターン201Aを検出する場合には、パターン2
01Aの方向および中心位置は算出されるものの、試料
自体の中心が正確に検出されない。このため、図11に
示すように、パターン201Aの中心と試料201の中
心との間のずれの分だけ、試料201の中心と試料支持
部材8の中心とが互いにずれた状態で試料201が載置
されてしまう。However, as shown in FIG. 9, when the sample 201 has a circular shape, the center position of the sample 201 can be calculated by detecting the outer circumference of the sample 201. You can't find the direction. Therefore, as shown in FIG.
Cannot be corrected, and the pattern 201A on the sample is placed on the sample support member 8 while being inclined. When detecting the pattern 201A on the sample, the pattern 2
Although the direction and center position of 01A are calculated, the center of the sample itself is not accurately detected. Therefore, as shown in FIG. 11, the sample 201 is mounted with the center of the sample 201 and the center of the sample support member 8 displaced from each other by the amount of the displacement between the center of the pattern 201A and the center of the sample 201. Will be placed.
【0004】ところが、このような状態で試料支持部材
8上に載置された試料201のパターン201Aの座標
測定をする場合には、以下の問題がある。すなわち、試
料支持部材8に対するパターン201Aの方向にばらつ
きがあると、測定点が個々の試料ごとに異なることとな
るため、測定精度が劣化する。また、試料201を支持
する試料支持部材8の当接位置が変ると試料201のた
わみ方が個々の試料ごとに変化するため、測定値に相違
が生じ、やはり測定精度が悪化する。However, when the coordinates of the pattern 201A of the sample 201 placed on the sample support member 8 are measured in such a state, there are the following problems. That is, if there is variation in the direction of the pattern 201A with respect to the sample support member 8, the measurement point will differ for each individual sample, and the measurement accuracy will deteriorate. In addition, when the contact position of the sample support member 8 that supports the sample 201 changes, the way in which the sample 201 bends changes for each individual sample, resulting in a difference in measured values, which also deteriorates the measurement accuracy.
【0005】本発明の目的は、パターンが形成された円
形の試料の載置位置を正確に補正でき、かつ試料のパタ
ーンの載置角度を正確に補正することができるプリアラ
イメント方法およびプリアライメント装置を提供するこ
とにある。An object of the present invention is to provide a pre-alignment method and a pre-alignment apparatus which can accurately correct the placement position of a circular sample on which a pattern is formed and also accurately correct the placement angle of the pattern of the sample. To provide.
【0006】[0006]
【課題を解決するための手段】一実施の形態を示す図1
〜6に対応づけて説明すると、請求項1に記載の発明
は、試料台5に設けた試料台基準点と試料1に設けた試
料基準点とを一致させ、かつ試料台5の試料台方向と試
料1の試料方向とを一致させるように試料台5に試料1
を受け渡すプリアライメント方法に適用される。そし
て、試料1を搬送器2C上に載置し、搬送器2Cに設け
た搬送器基準点と試料基準点との間の位置ずれ(δX,
δY)を試料1の外周形状に基づいて測定するととも
に、搬送器2Cの搬送器方向と試料方向との間のずれ角
度δθを試料1上のパターン1Aに基づいて測定し、試
料台5の待機位置の基準となる待機基準点から位置ずれ
分だけ補正した補正点(LX−δX,LY−δY)に試
料台基準点をあわせるとともに、試料台5の待機方向の
基準となる待機方向Lθからずれ角度分δθだけ補正し
た補正方向Lθ−δθに試料台方向をあわせた状態で試
料台5を待機させ、搬送器基準点を待機基準点にあわせ
るとともに、搬送器方向を待機方向にあわせた状態で試
料1を搬送器2Cから試料台5に受け渡すことにより上
述の目的が達成される。請求項2に記載の発明は、試料
台5に設けた試料台基準点と試料1に設けた試料基準点
とを一致させ、かつ試料台5の試料台方向と試料1の試
料方向とを一致させるように搬送器2Cから試料台5に
試料1を受け渡すプリアライメント装置に適用される。
そして、試料1を試料台5に搬送する搬送器2Cと、搬
送器2Cに設けた搬送器基準点と試料基準点との間の位
置ずれ(δX,δY)を試料1の外周形状に基づいて測
定するとともに、搬送器2Cの搬送器方向と試料方向と
の間のずれ角度δθを試料上のパターンに基づいて測定
する測定手段11、12、13、14と、試料台5の待
機位置の基準となる待機基準点から位置ずれ分だけ補正
した補正点(LX−δX,LY−δY)に試料台基準点
をあわせるとともに、試料台5の待機方向の基準となる
待機方向Lθからずれ角度分δθだけ補正した補正方向
Lθ−δθに試料台方向をあわせ、さらに搬送器基準点
を待機基準点に、搬送器方向を待機方向にそれぞれあわ
せた状態で試料1を搬送器2Cから試料台5に受け渡す
ように搬送器2Cおよび試料台5を制御する制御手段1
4とを備えることにより上述の目的が達成される。FIG. 1 shows an embodiment of the present invention.
When the invention is described in association with claim 6, the invention according to claim 1 makes the sample table reference point provided on the sample table 5 coincide with the sample table reference point provided on the sample 1, and the sample table 5 is oriented in the sample table direction. On the sample table 5 so that the sample direction of
It is applied to the pre-alignment method for handing over. Then, the sample 1 is placed on the carrier 2C, and the positional deviation (δX, between the carrier reference point provided on the carrier 2C and the sample reference point
δY) is measured based on the outer peripheral shape of the sample 1, and the deviation angle δθ between the carrier direction of the carrier 2C and the sample direction is measured based on the pattern 1A on the sample 1, and the sample stand 5 is on standby. The sample base reference point is aligned with the correction points (LX-δX, LY-δY) corrected by the positional deviation from the standby reference point that is the position reference, and the sample table 5 is displaced from the standby direction Lθ that is the reference in the standby direction. With the sample stage 5 in the correction direction Lθ-δθ corrected by the angle δθ, with the sample stage direction aligned, the carrier reference point is aligned with the standby reference point, and the carrier direction is aligned with the standby direction. The above object is achieved by transferring the sample 1 from the carrier 2C to the sample table 5. In the invention according to claim 2, the sample table reference point provided on the sample table 5 and the sample table reference point provided on the sample 1 are matched, and the sample table direction of the sample table 5 and the sample direction of the sample 1 are matched. It is applied to the pre-alignment apparatus that transfers the sample 1 from the carrier 2C to the sample table 5 so as to perform the above.
Then, based on the outer peripheral shape of the sample 1, the carrier 2C that conveys the sample 1 to the sample table 5 and the positional deviation (δX, δY) between the carrier reference point provided on the carrier 2C and the sample reference point are determined. Measuring means 11, 12, 13, 14 for measuring the displacement angle δθ between the carrier direction of the carrier 2C and the sample direction based on the pattern on the sample, and a reference for the standby position of the sample table 5. The sample base reference point is aligned with a correction point (LX-δX, LY-δY) that is corrected by the positional deviation from the standby reference point that is The sample 1 is received from the carrier 2C to the sample table 5 with the sample table direction aligned with the corrected direction Lθ-δθ, and with the carrier reference point as the standby reference point and the carrier direction as the standby direction. Conveyor 2C and try to pass Control means for controlling the table 5 1
The above-mentioned object is achieved by including 4 and 4.
【0007】請求項1および2に記載の発明では、搬送
器基準点と試料基準点との間の位置ずれ(δX,δY)
が試料台の待機位置の補正により吸収され、試料基準点
と試料台基準点とが一致した状態で試料が試料台に載置
される。また、搬送器方向と試料方向との間のずれ角度
δθが試料台の待機方向の補正により吸収され、試料方
向と試料台方向とが一致した状態で試料が試料台に載置
される。According to the first and second aspects of the invention, the positional deviation (δX, δY) between the carrier reference point and the sample reference point.
Is absorbed by the correction of the standby position of the sample table, and the sample is placed on the sample table with the sample reference point and the sample table reference point aligned. Further, the deviation angle δθ between the carrier direction and the sample direction is absorbed by the correction of the standby direction of the sample stage, and the sample is placed on the sample stage in a state where the sample direction and the sample stage direction match.
【0008】なお、本発明の構成を説明する上記課題を
解決するための手段と作用の項では、本発明を分かり易
くするために実施例の図を用いたが、これにより本発明
が実施例に限定されるものではない。[0008] In the means and means for solving the above-mentioned problems which explain the constitution of the present invention, the drawings of the embodiments are used to make the present invention easy to understand. It is not limited to.
【0009】[0009]
【発明の実施の形態】以下、図1〜図7により本発明に
よるプリアライメント装置の一実施の形態を説明する。
図1および図2に示すように、パターン1Aが形成され
た円形の試料1を搬送する試料ローダ2は、回動可能に
立設された回動軸2Bと、回動軸2Bに基端が固定され
たアーム2Aと、アーム2Aの先端に設けられ、試料1
が載置されるステージ2Cとを備え、アーム2Aの回動
および伸縮はローダ制御回路4により制御される。BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of a pre-alignment apparatus according to the present invention will be described below with reference to FIGS.
As shown in FIGS. 1 and 2, a sample loader 2 that conveys a circular sample 1 on which a pattern 1A is formed has a rotation shaft 2B rotatably erected and a base end on the rotation shaft 2B. The fixed arm 2A and the sample 1 provided at the tip of the arm 2A
And a stage 2C on which is mounted, and the rotation and extension / contraction of the arm 2A are controlled by the loader control circuit 4.
【0010】試料1を載置する試料支持台5は、基台6
Aに対してxy方向に移動可能に設けられたXYステー
ジ6と、XYステージ6の中心を回動軸としてXYステ
ージ6に対して回動可能に取付けられた回動ステージ7
と、回動ステージ7上に突設されZ方向に摺動可能に取
付けられた3つの試料支持部材8とからなり、XYステ
ージ6の移動および回動ステージ7の回動はステージ制
御回路10により制御される。The sample support 5 on which the sample 1 is placed is a base 6
An XY stage 6 provided so as to be movable in the xy directions with respect to A, and a rotary stage 7 rotatably attached to the XY stage 6 with the center of the XY stage 6 as a rotation axis.
And three sample support members 8 projectingly provided on the rotary stage 7 and mounted slidably in the Z direction. The movement of the XY stage 6 and the rotation of the rotary stage 7 are controlled by the stage control circuit 10. Controlled.
【0011】試料ローダ2に近接して設けられたテレビ
カメラ11は、試料ローダ2で搬送される試料1を上面
から撮影する。テレビカメラ11は図1に示す視野枠1
1Aを有し、視野枠11A内の座標(X,Y)のX軸は
x軸と、Y軸はy軸とそれぞれ平行に設けられている。
視野枠11A内の映像はA/D変換器12によりデジタ
ル信号化されてフレームメモリ13に取込まれる。フレ
ームメモリ13の情報はCPU14に出力され、CPU
14はこの情報に基づいてローダ制御回路4およびステ
ージ制御回路10を制御する。A television camera 11 provided close to the sample loader 2 photographs the sample 1 conveyed by the sample loader 2 from above. The television camera 11 is a field frame 1 shown in FIG.
1A, the X axis of the coordinates (X, Y) in the field frame 11A is provided in parallel with the x axis, and the Y axis is provided in parallel with the y axis.
The image in the visual field frame 11A is converted into a digital signal by the A / D converter 12 and taken into the frame memory 13. The information in the frame memory 13 is output to the CPU 14, and the CPU
14 controls the loader control circuit 4 and the stage control circuit 10 based on this information.
【0012】以下、本実施の形態のプリアライメント装
置を用いて、試料1を試料支持台5に搬送する場合の手
順について説明する。まず、図3に示すように、試料1
が載置された試料ローダ2のアーム2Aを図1の状態か
ら駆動してステージ2Cを停止する。ステージ2Cを停
止するときのアーム2Aの方向および長さは予め定めた
第1の方向および第1の長さとする。このとき、テレビ
カメラ11のフレーム11A内には試料1の外周が写し
出され、フレームメモリ13に映像が取込まれる。図4
は、フレームメモリ13に記憶された3本の水平走査線
(Y=Y1、Y2およびY3)の輝度信号を示し、輝度
信号が変化する位置が試料1の外周として認識される。
図4に示すように、フレームメモリ座標系の3点(X,
Y)=(X1,Y1)、(X2,Y2)、(X3,Y
3)が試料1の外周上にあることから、円の方程式によ
り試料1のフレームメモリ座標系に対する中心座標
(X,Y)=(X0,Y0)が求められる。試料ローダ
2のステージ2Cのフレームメモリ座標系に対する中心
座標を(X,Y)=(XS,YS)とすると、試料ロー
ダ2上にある試料1の中心と、ステージ2Cの中心との
間の位置ずれ(δX,δY)は、 δX=(XS−X0)×K δY=(YS−X0)×K (但し、Kはフレームメモリ1画素あたりの実寸法)に
より算出される。The procedure for transporting the sample 1 to the sample support 5 using the pre-alignment apparatus of this embodiment will be described below. First, as shown in FIG.
The arm 2A of the sample loader 2 on which is mounted is driven from the state of FIG. 1 to stop the stage 2C. The direction and length of the arm 2A when the stage 2C is stopped are the first direction and the first length that are determined in advance. At this time, the outer periphery of the sample 1 is projected in the frame 11A of the television camera 11, and the image is captured in the frame memory 13. FIG.
Indicates the luminance signal of the three horizontal scanning lines (Y = Y1, Y2 and Y3) stored in the frame memory 13, and the position where the luminance signal changes is recognized as the outer periphery of the sample 1.
As shown in FIG. 4, three points (X,
Y) = (X1, Y1), (X2, Y2), (X3, Y
Since 3) is on the outer circumference of the sample 1, the center coordinates (X, Y) = (X0, Y0) of the sample 1 with respect to the frame memory coordinate system can be obtained by the equation of the circle. Assuming that the center coordinates of the sample loader 2 with respect to the frame memory coordinate system of the stage 2C are (X, Y) = (XS, YS), the position between the center of the sample 1 on the sample loader 2 and the center of the stage 2C. The deviation (δX, δY) is calculated by δX = (XS−X0) × K δY = (YS−X0) × K (where K is the actual size per pixel of the frame memory).
【0013】次に、試料ローダ2のアーム2Aを再び駆
動し、図5に示すように試料上のパターン1Aが視野枠
11Aに入る方向でアーム2Aを停止させる。このとき
のアーム2Aの方向および長さは予め定めた第2の方向
および第2の長さとする。この状態でパターン1Aはカ
メラ11により撮影され、その映像はフレームメモリ1
3に取込まれる。図6はテレビカメラ11の2本の水平
走査線(Y=Y4およびY5)の輝度信号を示し、輝度
信号が変化する位置がパターン1Aのエッジとして認識
される。図6に示すように、(X4,Y4)、(X5,
Y5)が同一の直線エッジ上にあることから、テレビカ
メラ11の画面上でのパターン1Aの1辺16とY軸と
の間の傾きθ0は、 θ0=tan-1((X5−X4)/(Y5−Y4)) により算出される。パターン1Aの画面上での正規角度
をθSとすると、試料ローダ2に対する試料1のずれ角
度δθは、 δθ=θS−θ0 で算出される。ここで、図7(a)に示すように、図5
の状態でアーム2Aの回動軸およびステージ2Cの中心
を結ぶ直線15とY軸(y軸)とのなす角度を正規角度
θSとする。Next, the arm 2A of the sample loader 2 is driven again, and the arm 2A is stopped in the direction in which the pattern 1A on the sample enters the field frame 11A as shown in FIG. The direction and the length of the arm 2A at this time are the predetermined second direction and the second length. In this state, the pattern 1A is photographed by the camera 11, and its image is recorded in the frame memory 1
Incorporated in 3. FIG. 6 shows the luminance signals of the two horizontal scanning lines (Y = Y4 and Y5) of the television camera 11, and the position where the luminance signal changes is recognized as the edge of the pattern 1A. As shown in FIG. 6, (X4, Y4), (X5,
Since Y5) is on the same straight edge, the inclination θ0 between one side 16 of the pattern 1A and the Y axis on the screen of the television camera 11 is θ0 = tan −1 ((X5-X4) / (Y5-Y4)). When the normal angle of the pattern 1A on the screen is θS, the shift angle δθ of the sample 1 with respect to the sample loader 2 is calculated by δθ = θS−θ0. Here, as shown in FIG.
In this state, the angle formed by the straight line 15 connecting the rotation axis of the arm 2A and the center of the stage 2C and the Y axis (y axis) is defined as the normal angle θS.
【0014】次に、ステージ2Cの中心が所定位置
(x,y)=(LX,LY)になるように、試料ローダ
2のアーム2Aを図7(a)から時計回転方向に回動す
るとともにアーム2Aを伸して試料1を試料支持部材8
の上方に搬送し、アーム2Aを停止する。このとき、ア
ーム2Aの回動軸およびステージ2Cの中心を結ぶ直線
とy軸とのなす角度はLθに設定される。Next, the arm 2A of the sample loader 2 is rotated clockwise from FIG. 7A so that the center of the stage 2C is at a predetermined position (x, y) = (LX, LY). The arm 2A is extended to attach the sample 1 to the sample support member 8
And the arm 2A is stopped. At this time, the angle formed by the y-axis and the straight line connecting the rotation axis of the arm 2A and the center of the stage 2C is set to Lθ.
【0015】次に、XYステージ6を駆動してXYステ
ージ6の中心の座標が、 (x,y)=(LX−δX,LY−δY) となる位置でXYステージ6を停止させる。Next, the XY stage 6 is driven to stop the XY stage 6 at the position where the coordinates of the center of the XY stage 6 are (x, y) = (LX-δX, LY-δY).
【0016】次に、回動ステージ7を回転駆動して試料
支持部材8の角度が、 θ=Lθ−δθ となる角度で回動ステージ7を停止させる。ここで、試
料支持部材8の角度とは、図7(b)に示すように、3
つの試料支持部材8を頂点とする3角形の所定の1の頂
点17から対辺に降ろした垂線18とy軸とのなす角度
をいう。Next, the rotary stage 7 is driven to rotate, and the rotary stage 7 is stopped at an angle of the sample support member 8 such that θ = Lθ−δθ. Here, the angle of the sample support member 8 is 3 as shown in FIG.
An angle formed by a vertical line 18 drawn from a predetermined one vertex 17 of a triangle having the two sample support members 8 as its vertex to the opposite side and the y-axis.
【0017】次に、試料支持部材8を−Z方向に突出さ
せて試料1をステージ2から受け取る。上述のようにX
Yステージ6を試料1の位置ずれ(δX,δY)が吸収
される位置で待機させているので、載置された試料1の
中心はXYステージ6の中心(回動ステージ7の回動
軸)と一致する。また、回動ステージ7は試料1のずれ
角度δθを吸収する角度で待機しているので、載置され
た試料1の方向(パターン1Aの辺16の方向)と試料
支持部材8の方向(垂線18の方向)とが一致する。こ
のようにして試料支持部材8に載置された試料1は、X
Yステージ6および回動ステージ7の駆動により所定位
置および角度に搬送され、例えば、試料1のパターン1
Aの座標測定などが行なわれる。Next, the sample support member 8 is projected in the -Z direction to receive the sample 1 from the stage 2. X as above
Since the Y stage 6 is on standby at the position where the positional deviation (δX, δY) of the sample 1 is absorbed, the center of the mounted sample 1 is the center of the XY stage 6 (the rotation axis of the rotation stage 7). Matches Further, since the rotation stage 7 stands by at an angle that absorbs the displacement angle δθ of the sample 1, the direction of the mounted sample 1 (direction of the side 16 of the pattern 1A) and the direction of the sample support member 8 (perpendicular line). 18)). The sample 1 thus placed on the sample support member 8 is
The Y stage 6 and the rotating stage 7 are driven to convey them to a predetermined position and angle.
The coordinate measurement of A and the like are performed.
【0018】本実施の形態のプリアライメント装置で
は、ステージ2Cの中心と試料1の中心との間の位置ず
れおよび角度ずれを打ち消すように、試料支持部材8の
待機位置および待機角度を補正するようにしているの
で、試料支持部材8に対する試料1の載置位置および載
置角度が、それぞれ正規の位置および角度に調整され
る。In the pre-alignment apparatus of this embodiment, the standby position and standby angle of the sample support member 8 are corrected so as to cancel out the positional deviation and the angular deviation between the center of the stage 2C and the center of the sample 1. Therefore, the mounting position and the mounting angle of the sample 1 with respect to the sample supporting member 8 are adjusted to the regular position and angle, respectively.
【0019】本実施の形態のプリアライメント装置を用
いると、試料支持部材8と試料1の位置関係が一定にさ
れるので、試料1のたわみが一定となり、後工程とし
て、例えば試料支持台5上でパターン1Aの座標測定な
どを行なう場合の測定精度が向上する。また、パターン
1Aと試料支持部材8との相対角度が一定になるので、
たとえば個々の試料のパターン1Aの座標測定の測定点
が測定機の座標に対してほぼ定位置となり、測定精度が
向上する。When the prealignment apparatus of this embodiment is used, the positional relationship between the sample support member 8 and the sample 1 is made constant, so that the deflection of the sample 1 becomes constant, and as a post-process, for example, on the sample support base 5. The measurement accuracy is improved when the coordinates of the pattern 1A are measured. Further, since the relative angle between the pattern 1A and the sample support member 8 becomes constant,
For example, the measurement point of the coordinate measurement of the pattern 1A of each sample is almost a fixed position with respect to the coordinate of the measuring machine, and the measurement accuracy is improved.
【0020】本実施の形態においては、1台のテレビカ
メラにより試料の外周およびパターンエッジの両者を撮
影しているが、2台のテレビカメラを用意してそれぞれ
を別のカメラで撮影してもよい。また、試料の外周およ
びパターンエッジの検出にレーザ光線を使用してもよ
い。例えばレーザ光線を試料上で操作し、散乱光を検出
器で検出することにより同様の目的が果せる。In the present embodiment, one TV camera photographs both the outer periphery of the sample and the pattern edge. However, even if two TV cameras are prepared and each is photographed by another camera. Good. A laser beam may be used to detect the outer circumference of the sample and the pattern edge. For example, the same purpose can be achieved by operating a laser beam on the sample and detecting scattered light with a detector.
【0021】実施の形態および請求項の記載について、
試料支持台5が試料台に、ステージ2Cが搬送器に、X
Yステージ6の中心が試料台基準点に、垂線18の方向
が試料台方向に、試料1の中心が試料基準点に、パター
ン1Aの1辺16の方向が試料1の方向に、ステージ2
Cの中心が搬送器基準点に、直線15の方向が搬送器方
向に、座標(LX,LY)が待機基準点に、垂線18の
方向とy軸とのなす角度がLθとなる方向が「基準とな
る待機方向」にそれぞれ対応する。Regarding the description of the embodiments and claims,
The sample support base 5 is the sample base, the stage 2C is the carrier, and X
The center of the Y stage 6 is the sample stage reference point, the direction of the perpendicular 18 is the sample stage direction, the center of the sample 1 is the sample reference point, the direction of one side 16 of the pattern 1A is the sample 1 direction, and the stage 2
The center of C is the carrier reference point, the direction of the straight line 15 is the carrier direction, the coordinates (LX, LY) are the standby reference points, and the direction between the direction of the perpendicular 18 and the y axis is Lθ. "Standard waiting direction".
【0022】[0022]
【発明の効果】本発明によれば、試料と搬送器との間の
位置ずれおよびずれ角度を試料の外形から求め、試料台
の待機位置を補正することにより位置ずれを吸収するよ
うにしているので、試料と試料台との位置関係が一定に
保たれる。また、試料と搬送器との間のずれ角度を試料
のパターンから求め試料台の待機角度を補正することに
よりずれ角度を吸収するようにしているので、外周形状
が円形の試料であっても試料が試料台に正規の角度で載
置される。したがって、パターンの座標を測定する場合
に、試料台に載置された試料のたわみが一定となるとと
もに、パターンの測定点がほぼ一定となるので、測定精
度が向上する。According to the present invention, the positional deviation and the deviation angle between the sample and the carrier are obtained from the outer shape of the sample, and the positional deviation is absorbed by correcting the standby position of the sample table. Therefore, the positional relationship between the sample and the sample table is kept constant. Further, since the deviation angle between the sample and the carrier is found from the pattern of the sample and the waiting angle of the sample stand is corrected to absorb the deviation angle, even if the sample has a circular outer peripheral shape, Is placed on the sample table at a regular angle. Therefore, when measuring the coordinates of the pattern, the deflection of the sample placed on the sample table becomes constant and the measurement points of the pattern become substantially constant, which improves the measurement accuracy.
【図1】本発明によるプリアライメント装置の一実施の
形態を示す図。FIG. 1 is a diagram showing an embodiment of a pre-alignment apparatus according to the present invention.
【図2】図1に示す装置の試料ローダおよび試料台を示
す側面図。FIG. 2 is a side view showing a sample loader and a sample table of the apparatus shown in FIG.
【図3】試料ローダのステージが第1の所定位置および
第1の所定角度にある状態を示す図。FIG. 3 is a view showing a state where the stage of the sample loader is at a first predetermined position and a first predetermined angle.
【図4】図3の状態でのテレビカメラの画像を示す図。FIG. 4 is a diagram showing an image of the television camera in the state of FIG.
【図5】試料ローダのステージが第2の所定位置および
第2の所定角度にある状態を示す図。FIG. 5 is a view showing a state in which the stage of the sample loader is at a second predetermined position and a second predetermined angle.
【図6】図5の状態でのテレビカメラの画像を示す図。6 is a diagram showing an image of the television camera in the state of FIG.
【図7】プリアライメント時の試料、試料ローダのステ
ージおよび試料支持部材の方向を示し、(a)は試料の
角度と試料ローダの角度の関係を示す図、(b)は試料
支持部材の待機角度を示す図。7A and 7B show directions of a sample, a stage of a sample loader, and a sample support member during pre-alignment, FIG. 7A is a diagram showing a relationship between an angle of the sample and an angle of the sample loader, and FIG. 7B is a standby state of the sample support member. The figure which shows an angle.
【図8】矩形の試料に従来のプリアライメント方法を適
用した場合の状態を示す図。FIG. 8 is a diagram showing a state where a conventional pre-alignment method is applied to a rectangular sample.
【図9】円形試料と試料上のパターンの状態を示す図。FIG. 9 is a diagram showing a state of a circular sample and a pattern on the sample.
【図10】試料の外周を検出してプリアライメントをす
る従来のプリアライメント方法を、円形の試料に適用し
た場合の状態を示す図。FIG. 10 is a diagram showing a state in which a conventional pre-alignment method of detecting the outer circumference of a sample and performing pre-alignment is applied to a circular sample.
【図11】試料上のパターンを検出してプリアライメン
トをする従来のプリアライメント方法を、円形の試料に
適用した場合の状態を示す図。FIG. 11 is a view showing a state in which a conventional pre-alignment method of detecting a pattern on a sample and performing pre-alignment is applied to a circular sample.
1 試料 1A パターン 2 試料ローダ 2C ステージ 5 試料支持台 11 テレビカメラ 12 A/D変換器 13 フレームメモリ 14 CPU 1 sample 1A pattern 2 sample loader 2C stage 5 sample support 11 TV camera 12 A / D converter 13 frame memory 14 CPU
Claims (2)
けた試料基準点とを一致させ、かつ試料台の試料台方向
と試料の試料方向とを一致させるように前記試料台に試
料を受け渡すプリアライメント方法において、 試料を搬送器上に載置し、 前記搬送器に設けた搬送器基準点と前記試料基準点との
間の位置ずれを前記試料の外周形状に基づいて測定する
とともに、前記搬送器の搬送器方向と前記試料方向との
間のずれ角度を前記試料上のパターンに基づいて測定
し、 前記試料台の待機位置の基準となる待機基準点から前記
位置ずれ分だけ補正した補正点に前記試料台基準点をあ
わせるとともに、前記試料台の待機方向の基準となる待
機方向から前記ずれ角度分だけ補正した補正方向に前記
試料台方向をあわせた状態で前記試料台を待機させ、 前記搬送器基準点を前記待機基準点にあわせるととも
に、前記搬送器方向を前記待機方向にあわせた状態で前
記試料を前記搬送器から前記試料台に受け渡すことを特
徴とするプリアライメント方法。1. A sample on the sample table so that a sample table reference point provided on the sample table and a sample table reference point provided on the sample are matched, and the sample table direction of the sample table and the sample direction of the sample are matched. In the pre-alignment method of delivering the sample, the sample is placed on the carrier, and the positional deviation between the carrier reference point provided on the carrier and the sample reference point is measured based on the outer peripheral shape of the sample. Along with, the displacement angle between the transporter direction of the transporter and the sample direction is measured based on the pattern on the sample, and only the position shift amount from the standby reference point serving as a reference of the standby position of the sample table is measured. The sample table reference point is aligned with the corrected correction point, and the sample table is aligned with the sample table direction in the correction direction corrected by the deviation angle from the standby direction that is the reference of the standby direction of the sample table. Let it wait, A pre-alignment method, characterized in that the transporter reference point is aligned with the standby reference point, and the sample is transferred from the transporter to the sample stage while the transporter direction is aligned with the standby direction.
けた試料基準点とを一致させ、かつ試料台の試料台方向
と試料の試料方向とを一致させるように搬送器から前記
試料台に試料を受け渡すプリアライメント装置におい
て、 前記試料を前記試料台に搬送する搬送器と、 前記搬送器に設けた搬送器基準点と前記試料基準点との
間の位置ずれを前記試料の外周形状に基づいて測定する
とともに、前記搬送器の搬送器方向と前記試料方向との
間のずれ角度を前記試料上のパターンに基づいて測定す
る測定手段と、 前記試料台の待機位置の基準となる待機基準点から前記
位置ずれ分だけ補正した補正点に前記試料台基準点をあ
わせるとともに、前記試料台の待機方向の基準となる待
機方向から前記ずれ角度分だけ補正した補正方向に前記
試料台方向をあわせ、さらに前記搬送器基準点を前記待
機基準点に、前記搬送器方向を前記待機方向にそれぞれ
あわせた状態で前記試料を前記搬送器から前記試料台に
受け渡すように前記搬送器および前記試料台を制御する
制御手段とを備えることを特徴とするプリアライメント
装置。2. The sample from the carrier so that the sample table reference point provided on the sample table and the sample table reference point provided on the sample are aligned, and the sample platform direction of the sample platform and the sample direction of the sample are aligned. In a pre-alignment device for delivering a sample to a table, a carrier for transferring the sample to the sample table, and a positional deviation between a carrier reference point provided on the carrier and the sample reference point are measured on the outer circumference of the sample. Measuring means based on the shape and measuring the deviation angle between the carrier direction of the carrier and the sample direction based on the pattern on the sample, and a reference for the standby position of the sample table. The sample table reference point is aligned with the correction point that is corrected by the positional deviation from the standby reference point, and the sample table direction is corrected from the standby direction, which is the reference in the standby direction of the sample table, by the correction angle. And further, the carrier and the carrier so that the sample is transferred from the carrier to the sample stage in a state where the carrier reference point is the standby reference point and the carrier direction is aligned with the standby direction. A pre-alignment apparatus comprising: a control unit that controls the sample stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27861195A JPH09120986A (en) | 1995-10-26 | 1995-10-26 | Pre-alignment method and pre-alignment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27861195A JPH09120986A (en) | 1995-10-26 | 1995-10-26 | Pre-alignment method and pre-alignment apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09120986A true JPH09120986A (en) | 1997-05-06 |
Family
ID=17599697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27861195A Pending JPH09120986A (en) | 1995-10-26 | 1995-10-26 | Pre-alignment method and pre-alignment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09120986A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6432790B1 (en) | 2000-10-30 | 2002-08-13 | Hitachi, Ltd. | Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| KR100369398B1 (en) * | 2000-12-30 | 2003-01-24 | 아이티에스테크놀러지 주식회사 | Substrate board prealign apparatus |
| WO2014069291A1 (en) * | 2012-10-29 | 2014-05-08 | ローツェ株式会社 | Device and method for detecting position of semiconductor substrate |
-
1995
- 1995-10-26 JP JP27861195A patent/JPH09120986A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6432790B1 (en) | 2000-10-30 | 2002-08-13 | Hitachi, Ltd. | Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| KR100369398B1 (en) * | 2000-12-30 | 2003-01-24 | 아이티에스테크놀러지 주식회사 | Substrate board prealign apparatus |
| WO2014069291A1 (en) * | 2012-10-29 | 2014-05-08 | ローツェ株式会社 | Device and method for detecting position of semiconductor substrate |
| US9275886B2 (en) | 2012-10-29 | 2016-03-01 | Rorze Corporation | Device and method for detecting position of semiconductor substrate |
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