JPH09143251A - Epoxy resin molding material for sealing electronic parts and semiconductor device - Google Patents
Epoxy resin molding material for sealing electronic parts and semiconductor deviceInfo
- Publication number
- JPH09143251A JPH09143251A JP30417095A JP30417095A JPH09143251A JP H09143251 A JPH09143251 A JP H09143251A JP 30417095 A JP30417095 A JP 30417095A JP 30417095 A JP30417095 A JP 30417095A JP H09143251 A JPH09143251 A JP H09143251A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- component
- molding material
- resin molding
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 73
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 73
- 239000012778 molding material Substances 0.000 title claims abstract description 38
- 238000007789 sealing Methods 0.000 title claims abstract description 6
- 239000004065 semiconductor Substances 0.000 title claims 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- -1 hydroxyphenylene group Chemical group 0.000 claims abstract description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 229920000098 polyolefin Polymers 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 229920001577 copolymer Polymers 0.000 claims abstract description 15
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 14
- 125000000524 functional group Chemical group 0.000 claims abstract description 10
- 229920003986 novolac Polymers 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 8
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 claims abstract description 5
- OZRVXYJWUUMVOW-UHFFFAOYSA-N 2-[[4-[4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C(C=C1)=CC=C1OCC1CO1 OZRVXYJWUUMVOW-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004698 Polyethylene Substances 0.000 claims description 7
- 238000005538 encapsulation Methods 0.000 claims description 7
- 229920000573 polyethylene Polymers 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract description 12
- 239000003795 chemical substances by application Substances 0.000 abstract description 8
- 239000004305 biphenyl Substances 0.000 abstract description 6
- 235000010290 biphenyl Nutrition 0.000 abstract description 6
- 230000003578 releasing effect Effects 0.000 abstract description 4
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 8
- 239000000194 fatty acid Substances 0.000 description 8
- 229930195729 fatty acid Natural products 0.000 description 8
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 150000004665 fatty acids Chemical class 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000001993 wax Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004203 carnauba wax Substances 0.000 description 2
- 235000013869 carnauba wax Nutrition 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000004209 oxidized polyethylene wax Substances 0.000 description 1
- 235000013873 oxidized polyethylene wax Nutrition 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はインサート部品との
接着性が良好でありかつ離型性にも優れる電子部品封止
用エポキシ樹脂成形材料に関するもので、特に、素子サ
イズが大きく薄形のLSIなどの電子部品封止用エポキ
シ樹脂成形材料に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin molding material for encapsulating electronic parts, which has good adhesiveness to insert parts and excellent releasability. The present invention relates to an epoxy resin molding material for encapsulating electronic components such as.
【0002】[0002]
【従来の技術】従来、コイル、コンデンサ、トランジス
タ、ICなど電子部品封止の分野ではエポキシ樹脂成形
材料が封止材として広く用いられている。この理由とし
ては、エポキシ樹脂が電気特性、耐熱性、機械強度、イ
ンサート部品との接着性などの諸特性にバランスがとれ
ているためである。また、これらの電子部品封止用エポ
キシ樹脂成形材料には成形時に金型からの良好な離型性
を得るために、離型剤が添加されている。従来使用され
ている離型剤としては高級脂肪酸や高級脂肪酸エステル
又はポリオレフィンなどが使用されている。前者として
はカルナバワックスなどの天然ワックスやステアリン
酸、モンタン酸などの高級脂肪酸やそのエステル化物な
どが使用されている。後者としてはポリエチレン、ポリ
プロピレンなどの低分子量物やその部分酸化物などが使
用されている。2. Description of the Related Art Conventionally, epoxy resin molding materials have been widely used as encapsulating materials in the field of encapsulating electronic parts such as coils, capacitors, transistors and ICs. The reason for this is that the epoxy resin is well balanced in various characteristics such as electrical characteristics, heat resistance, mechanical strength, and adhesiveness with insert parts. Further, a releasing agent is added to these epoxy resin molding materials for encapsulating electronic parts in order to obtain good mold releasability from the mold during molding. Higher fatty acids, higher fatty acid esters, polyolefins, and the like are used as the release agents that have been conventionally used. As the former, natural waxes such as carnauba wax, higher fatty acids such as stearic acid and montanic acid, and esterified products thereof are used. As the latter, low molecular weight substances such as polyethylene and polypropylene and partial oxides thereof are used.
【0003】[0003]
【発明が解決しようとする課題】近年のICパッケージ
は表面実装型ICが主流になり、TSOP(ThinS
mall Outline Package)に代表さ
れるような小型薄形パッケージが増加している。これら
のパッケージはICチップ上の封止樹脂厚が薄く、信頼
性を確保するためにはこれを封止する電子部品封止用エ
ポキシ樹脂成形材料に高い接着性が要求される。しか
し、接着性を高くすると、当然のことながら成形時の金
型離型が悪くなる傾向にある。この傾向は、接着性向上
を観点とした新規ベース樹脂系材料で顕著である。すな
わち、従来のベース樹脂系であるオルソクレゾールノボ
ラック型エポキシ樹脂系よりも最近主流になりつつある
ビフェニル系、ジシクロペンタジエン系の材料などで離
型性に係わる問題が多く発生している。本発明はこれら
の課題を解決すべく、ICチップ及びリードフレームと
の接着性が良好で、なおかつ金型離型性に優れた電子部
品封止用エポキシ樹脂成形材料を提供するものである。In recent years, surface mount type ICs have become the mainstream of IC packages, and TSOP (ThinS
The number of small and thin packages represented by the mall OUTLET PACKAGE) is increasing. These packages have a small sealing resin thickness on the IC chip, and in order to ensure reliability, the epoxy resin molding material for sealing the electronic parts is required to have high adhesiveness. However, if the adhesiveness is increased, naturally the mold release during molding tends to deteriorate. This tendency is remarkable in the new base resin material for improving the adhesiveness. That is, there are many problems relating to mold releasability in materials such as biphenyl-based and dicyclopentadiene-based materials, which are becoming mainstream in recent years, as compared with the conventional base resin-based orthocresol novolac-type epoxy resin-based materials. In order to solve these problems, the present invention provides an epoxy resin molding material for electronic component encapsulation, which has good adhesiveness to an IC chip and a lead frame and excellent mold releasability.
【0004】[0004]
【課題を解決するための手段】本発明の電子部品封止用
エポキシ樹脂成形材料は、(A)1分子中に2個以上の
エポキシ基を有するエポキシ樹脂、(B)1分子中に2
個以上のフェノール性水酸基を有する化合物及び(C)
フェノール性水酸基と反応する官能基を有するポリオレ
フィン(C−1)とヒドロキシフェニレン基を構造単位
として有する重合体(C−2)との共重合体を必須成分
とすることを特徴とするものである。The epoxy resin molding material for encapsulating electronic parts of the present invention is (A) an epoxy resin having two or more epoxy groups in one molecule, and (B) 2 in one molecule.
A compound having one or more phenolic hydroxyl groups and (C)
It is characterized in that a copolymer of a polyolefin (C-1) having a functional group capable of reacting with a phenolic hydroxyl group and a polymer (C-2) having a hydroxyphenylene group as a structural unit is an essential component. .
【0005】[0005]
【発明の実施の形態】本発明において用いられる(A)
成分の1分子中に2個以上のエポキシ基を有するエポキ
シ樹脂としては、電子部品封止用エポキシ樹脂成形材料
で一般に使用されているものであれば制限はなく、フェ
ノールノボラック型エポキシ樹脂、オルソクレゾールノ
ボラック型エポキシ樹脂をはじめとするフェノール類と
アルデヒド類のノボラック樹脂をエポキシ化したもの、
ビスフェノールA、ビスフェノールF、ビスフェノール
S、アルキル置換又は非置換のビフェノールなどのジグ
リシジルエーテル、ジアミノジフェニルメタン、イソシ
アヌル酸などのポリアミンとエピクロルヒドリンの反応
により得られるグリシジルアミン型エポキシ樹脂、オレ
フィン結合を過酢酸などの過酸で酸化して得られる線状
脂肪族エポキシ樹脂、及び飽和脂肪族環を有するエポキ
シ樹脂(脂環族エポキシ樹脂)などがある。また、臭素
化エポキシ樹脂など、これらのエポキシ樹脂をハロゲン
化したハロゲン化エポキシ樹脂、例えば臭素化ビスフェ
ノールAのジグリシジルエーテル、臭素化フェノールノ
ボラック型エポキシ樹脂等も難燃性を向上させるために
用いられる。具体的には臭素化ビスフェノールA型エポ
キシ樹脂が好適に用いられ、その配合量はエポキシ樹脂
全体に対して好ましくは5〜40重量%、更に好ましく
は10〜30重量%配合される。DETAILED DESCRIPTION OF THE INVENTION (A) used in the present invention
The epoxy resin having two or more epoxy groups in one molecule of the component is not particularly limited as long as it is generally used in epoxy resin molding materials for electronic component encapsulation, phenol novolac type epoxy resin, orthocresol. Epoxidized novolac resin of phenols and aldehydes including novolac type epoxy resin,
Bisphenol A, bisphenol F, bisphenol S, diglycidyl ether such as alkyl-substituted or unsubstituted biphenol, diaminodiphenylmethane, glycidylamine-type epoxy resin obtained by reaction of polyamines such as isocyanuric acid with epichlorohydrin, olefinic bond such as peracetic acid There are linear aliphatic epoxy resins obtained by oxidation with peracid, epoxy resins having a saturated aliphatic ring (alicyclic epoxy resins), and the like. Further, halogenated epoxy resins obtained by halogenating these epoxy resins such as brominated epoxy resins, for example, diglycidyl ether of brominated bisphenol A, brominated phenol novolac type epoxy resins, etc. are also used for improving flame retardancy. . Specifically, a brominated bisphenol A type epoxy resin is preferably used, and the blending amount thereof is preferably 5 to 40% by weight, more preferably 10 to 30% by weight based on the whole epoxy resin.
【0006】(A)成分のエポキシ樹脂において特に優
れた接着性を示すものとして、アルキル置換又は非置換
のビフェニル骨格型エポキシ樹脂があり、本発明のエポ
キシ樹脂成形材料に特に優れた接着性を付与するために
は、使用エポキシ樹脂全量に対し20重量%以上、好ま
しくは60重量以上%使用することが望ましい。アルキ
ル置換ビフェニル骨格型エポキシ樹脂とは、ビフェニル
環がアルキル基で置換されたものであり、アルキル基と
しては、メチル基等の炭素数1〜4のものが好ましい。
このようなエポキシ樹脂の具体例としては、例えば、
4,4′−ビスヒドロキシビフェニルや4,4′−ジヒ
ドロキシ−3,3′,5,5′−テトラアルキルビフェ
ニル等のアルキル置換又は非置換4,4′−ジヒドロキ
シビフェニルをエピクロルヒドリンを用いてエポキシ化
したもの、すなわち、アルキル置換又は非置換の4,
4′−ビス(2,3−エポキシプロポキシ)ビフェニル
等が挙げられる。Among the epoxy resins as the component (A), which have particularly excellent adhesiveness, there are alkyl-substituted or unsubstituted biphenyl skeleton type epoxy resins, which impart particularly excellent adhesiveness to the epoxy resin molding material of the present invention. In order to achieve this, it is desirable to use 20% by weight or more, preferably 60% by weight or more, based on the total amount of the epoxy resin used. The alkyl-substituted biphenyl skeleton type epoxy resin is one in which the biphenyl ring is substituted with an alkyl group, and the alkyl group is preferably one having 1 to 4 carbon atoms such as a methyl group.
Specific examples of such an epoxy resin include, for example,
Epoxidation of alkyl-substituted or unsubstituted 4,4'-dihydroxybiphenyl such as 4,4'-bishydroxybiphenyl and 4,4'-dihydroxy-3,3 ', 5,5'-tetraalkylbiphenyl using epichlorohydrin That is, an alkyl-substituted or unsubstituted 4,
4'-bis (2,3-epoxypropoxy) biphenyl and the like can be mentioned.
【0007】(A)成分のエポキシ樹脂は適宜何種類で
も併用することができるが、純度、特に加水分解性塩素
量はICなど素子上のアルミ配線腐食に係わるため少な
い方がよく、耐湿性の優れた電子部品封止用エポキシ樹
脂成形材料を得るためには500ppm以下であること
が好ましい。ここで、加水分解性塩素量とは試料のエポ
キシ樹脂1gをジオキサン30mlに溶解し、1N−K
OHメタノール溶液5mlを添加して30分間リフラッ
クス後、電位差滴定により求めた値を尺度としたもので
ある。The epoxy resin as the component (A) can be used in combination with any number of kinds as appropriate, but the purity, especially the amount of hydrolyzable chlorine, is preferably small because it is related to the corrosion of aluminum wiring on the element such as IC, and the moisture resistance is high. In order to obtain an excellent epoxy resin molding material for electronic component encapsulation, it is preferably 500 ppm or less. Here, the amount of hydrolyzable chlorine means that 1 g of epoxy resin as a sample is dissolved in 30 ml of dioxane to prepare 1N-K
The value obtained by potentiometric titration after adding 5 ml of OH-methanol solution and refluxing for 30 minutes is used as a scale.
【0008】本発明において用いられる(B)成分の1
分子中に2個以上のフェノール性水酸基を有する化合物
としては、フェノール、クレゾール、キシレノール、レ
ゾルシン、カテコール、ビスフェノールA、ビスフェノ
ールFなどのフェノール類又はα−ナフトール、β−ナ
フトール、ジヒドロキシナフタレン等のナフトール類と
ホルムアルデヒド、アセトアルデヒド、プロピオンアル
デヒド、ベンズアルデヒド、サリチルアルデヒド等のア
ルデヒド類とを酸性触媒下で縮合又は共縮合させて得ら
れる樹脂、ポリパラビニルフェノール樹脂、フェノール
類とジメトキシパラキシレンから合成されるキシリレン
基を有するフェノール・アラルキル樹脂、飽和脂肪族環
を分子中に有する化合物などがあり、単独で又は2種類
以上併用してもよい。また、難燃性付与の目的で、ハロ
ゲン化フェノール類、例えば臭素化ビスフェノールAな
どを併用してもよく、その配合量は(B)成分総量中、
5〜40重量%、好ましくは10〜30重量%が適当で
ある。[0008] One of the components (B) used in the present invention
Examples of compounds having two or more phenolic hydroxyl groups in the molecule include phenols such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F, or naphthols such as α-naphthol, β-naphthol and dihydroxynaphthalene. Resin obtained by condensation or co-condensation of aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde, etc. under acidic catalyst, polyparavinylphenol resin, xylylene group synthesized from phenols and dimethoxyparaxylene There are phenol / aralkyl resins having the above, compounds having a saturated aliphatic ring in the molecule, and the like, and these may be used alone or in combination of two or more kinds. Further, halogenated phenols such as brominated bisphenol A may be used in combination for the purpose of imparting flame retardancy, and the blending amount thereof in the total amount of the component (B) is
5-40% by weight, preferably 10-30% by weight is suitable.
【0009】本発明における(A)成分のエポキシ樹脂
と(B)成分のフェノール性水酸基を有する化合物にお
いて、接着性に優れるものとしては、樹脂又は化合物の
構造中に特定の飽和脂肪族環を有するものが挙げられ
る。これを例示すれば、ジシクロペンタジエンや、リモ
ネンなどのテルペン化合物に酸触媒等を用いてフェノー
ル類を付加させた樹脂、又はこれをエポキシ化した樹脂
があげられる。これらの樹脂又は化合物の添加量として
は、(A)成分+(B)成分の合計重量に対し、飽和脂
肪族環の重量が20%〜40%であることが好ましい。
20重量%未満では従来のオルソクレゾールノボラック
型エポキシ樹脂/フェノールノボラック樹脂系のエポキ
シ樹脂成形材料と比較し高接着性の効果が不十分となる
ことがある。更に、これらの構造を有するエポキシ樹脂
又はフェノール性水酸基を有する化合物は前出のビフェ
ニル骨格型エポキシ樹脂と併用することで、更に優れた
接着性を発揮できる。Among the epoxy resin of the component (A) and the compound having a phenolic hydroxyl group of the component (B) in the present invention, those having excellent adhesiveness have a specific saturated aliphatic ring in the structure of the resin or the compound. There are things. Examples of this include a resin in which phenols are added to a terpene compound such as dicyclopentadiene or limonene using an acid catalyst or the like, or a resin obtained by epoxidizing this. As the addition amount of these resins or compounds, the weight of the saturated aliphatic ring is preferably 20% to 40% with respect to the total weight of the component (A) + the component (B).
If it is less than 20% by weight, the effect of high adhesiveness may be insufficient as compared with the conventional orthocresol novolac type epoxy resin / phenol novolac resin type epoxy resin molding material. Further, the epoxy resin having these structures or the compound having a phenolic hydroxyl group can exhibit more excellent adhesiveness when used in combination with the above-mentioned biphenyl skeleton type epoxy resin.
【0010】エポキシ樹脂成形材料中の(A)成分のエ
ポキシ樹脂の配合割合は、通常5〜30重量%、好まし
くは7〜20重量%、(B)成分のフェノール性水酸基
を有する化合物の配合割合は、通常3〜30重量%、好
ましくは5〜15重量%が適当である。The compounding ratio of the epoxy resin as the component (A) in the epoxy resin molding material is usually 5 to 30% by weight, preferably 7 to 20% by weight, and the compounding ratio of the compound having a phenolic hydroxyl group as the component (B). Is usually 3 to 30% by weight, preferably 5 to 15% by weight.
【0011】また、(A)成分のエポキシ樹脂中のエポ
キシ基と、(B)成分のフェノール性水酸基を有する化
合物中のフェノール性水酸基及び(C)成分の共重合体
中に存在するフェノール性水酸基の当量比((B)及び
(C)成分のフェノール性水酸基数/(A)成分のエポ
キシ基数)は、特に限定はされないが、それぞれの未反
応分を少なく抑えるために0.7〜1.3の範囲に設定
することが好ましい。Further, the epoxy group in the epoxy resin of the component (A), the phenolic hydroxyl group in the compound having the phenolic hydroxyl group of the component (B) and the phenolic hydroxyl group present in the copolymer of the component (C). The equivalent ratio (the number of phenolic hydroxyl groups in the components (B) and (C) / the number of epoxy groups in the component (A)) is not particularly limited, but it is 0.7 to 1. It is preferable to set it in the range of 3.
【0012】本発明の電子部品封止用エポキシ樹脂成形
材料には、エポキシ樹脂とフェノール性水酸基を有する
化合物の硬化反応を促進する硬化促進剤を配合すること
ができる。この硬化促進剤としては、例えば、トリエチ
レンジアミン、ベンジルジメチルアミン、トリエタノー
ルアミン、ジメチルアミノエタノール、トリス(ジメチ
ルアミノメチル)フェノール、1,6−ジアザビシクロ
(4,3,0)ウンデセン−5、1,8−ジアザビシク
ロ(5,4,0)ウンデセン−7などの三級アミン類、
2−メチルイミダゾール、2−フェニルイミダゾール、
2−フェニル−4−メチルイミダゾール、2−ヘプタデ
シルイミダゾールなどのイミダゾール類、トリブチルホ
スフィン、メチルジフェニルホスフィン、トリフェニル
ホスフィン、ジフェニルホスフィン、フェニルホスフィ
ンなどの有機ホスフィン類、テトラフェニルホスホニウ
ムテトラフェニルボレート、トリフェニルホスフィンテ
トラフェニルボレート、2−エチル−4−メチルイミダ
ゾールテトラフェニルボレート、N−メチルモルホリン
テトラフェニルボレートなどのテトラフェニルボロン塩
などがあり、単独で又は2種以上併用してもよい。硬化
促進剤総量の好ましい配合割合は(A)成分のエポキシ
樹脂100重量部に対して0.3〜20重量部、更に好
ましくは0.6〜10重量部である。The epoxy resin molding material for encapsulating electronic parts of the present invention may contain a curing accelerator which accelerates the curing reaction between the epoxy resin and the compound having a phenolic hydroxyl group. Examples of the curing accelerator include triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol, 1,6-diazabicyclo (4,3,0) undecene-5,1, Tertiary amines such as 8-diazabicyclo (5,4,0) undecene-7,
2-methylimidazole, 2-phenylimidazole,
Imidazoles such as 2-phenyl-4-methylimidazole and 2-heptadecylimidazole, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, diphenylphosphine and phenylphosphine, tetraphenylphosphonium tetraphenylborate, triphenyl There are tetraphenylboron salts such as phosphine tetraphenylborate, 2-ethyl-4-methylimidazole tetraphenylborate and N-methylmorpholine tetraphenylborate, and these may be used alone or in combination of two or more. A preferable mixing ratio of the total amount of the curing accelerator is 0.3 to 20 parts by weight, and more preferably 0.6 to 10 parts by weight with respect to 100 parts by weight of the epoxy resin as the component (A).
【0013】本発明の(C)成分、すなわちフェノール
性水酸基と反応する官能基を有するポリオレフィン(C
−1)とヒドロキシフェニレン基を構造単位として有す
る重合体(C−2)との共重合体は、本発明の電子部品
封止用エポキシ樹脂成形材料の接着性を阻害することな
く、優れた離型性を発現させるための成分である。従来
の高級脂肪酸、高級脂肪酸金属塩、高級脂肪酸エステ
ル、パラフィンワックス、ポリオレフィンワックス等で
は添加量を多くすることで離型性を良くすることはでき
るが、接着性も低下していまい、この両立が困難であ
る。そこで本発明者らは従来の離型剤成分とベース樹脂
の共重合体を各種合成し、接着性と離型性との関係につ
いて鋭意検討を行った結果、上記の共重合体を使用する
ことで離型性と接着性の両立を図ることができることを
見出した。ここで、フェノール性水酸基と反応する官能
基を有するポリオレフィン(C−1)のポリオレフィン
部を例示するとポリエチレン、ポリプロピレン、1,2
−ポリブタジエン又は1,4−ポリブタジエン更にはこ
れらポリブタジエン類の不飽和二重結合を水添したもの
などが挙げられる。フェノール性水酸基と反応する官能
基を有するポリオレフィンは、ポリオレフィン主鎖の末
端又は分子内に、エポキシ基、カルボキシル基などの官
能基を有しているものが用いられる。The component (C) of the present invention, that is, a polyolefin having a functional group that reacts with a phenolic hydroxyl group (C
The copolymer of -1) and the polymer (C-2) having a hydroxyphenylene group as a structural unit has an excellent release property without impairing the adhesiveness of the epoxy resin molding material for electronic component encapsulation of the present invention. It is a component for expressing type. Conventional higher fatty acids, higher fatty acid metal salts, higher fatty acid esters, paraffin wax, polyolefin waxes and the like can improve the releasability by increasing the addition amount, but the adhesiveness may also decrease, and both are compatible. Have difficulty. Therefore, the present inventors synthesized various conventional release agent component-base resin copolymers, and as a result of diligent studies on the relationship between adhesiveness and releasability, the above-mentioned copolymers should be used. It was found that it is possible to achieve both releasability and adhesiveness. Examples of the polyolefin part of the polyolefin (C-1) having a functional group that reacts with a phenolic hydroxyl group include polyethylene, polypropylene, 1,2.
-Polybutadiene, 1,4-polybutadiene, and even those obtained by hydrogenating unsaturated double bonds of these polybutadienes may be mentioned. As the polyolefin having a functional group that reacts with a phenolic hydroxyl group, one having a functional group such as an epoxy group or a carboxyl group at the terminal or in the molecule of the polyolefin main chain is used.
【0014】上記官能基を有するポリオレフィン(C−
1)の好ましい例として、エポキシ基を両末端に有する
水添1,2−ポリブタジエン、カルボキシル基を両末端
に有する水添1,2−ポリブタジエン、エポキシ基を両
末端に有するポリエチレンなどを挙げることができる。
これらのポリオレフィンは官能基を有することでフェノ
ール樹脂等のヒドロキシフェニレン基を有する重合体
(C−2)と容易にブロック共重合体又はグラフト共重
合体等の共重合体を生成することができる。すなわちエ
ポキシ基を有する場合は前述のエポキシ基とフェノール
性水酸基の反応を促進する硬化促進剤の存在下で付加反
応を行えば(C)成分の共重合体を得ることができる。
また、カルボキシル基を有する場合は酸触媒を用いるこ
とで縮合反応により(C)成分の共重合体を得ることが
できる。何れの場合も重合体(C−2)としてフェノー
ル樹脂類を用いる場合は、ゲル化を避けるために、ポリ
オレフィン(C−1)の官能基1当量当たり、フェノー
ル樹脂類のフェノール性水酸基3〜20倍当量、好まし
くは5〜10倍当量の割合で反応させることが望まし
い。Polyolefin having the above functional group (C-
Preferred examples of 1) include hydrogenated 1,2-polybutadiene having epoxy groups at both ends, hydrogenated 1,2-polybutadiene having carboxyl groups at both ends, and polyethylene having epoxy groups at both ends. it can.
By having a functional group, these polyolefins can easily form a copolymer such as a block copolymer or a graft copolymer with the polymer (C-2) having a hydroxyphenylene group such as a phenol resin. That is, when it has an epoxy group, the copolymer of the component (C) can be obtained by carrying out an addition reaction in the presence of a curing accelerator that promotes the reaction between the epoxy group and the phenolic hydroxyl group.
Further, when it has a carboxyl group, a copolymer of the component (C) can be obtained by a condensation reaction by using an acid catalyst. In any case, when a phenol resin is used as the polymer (C-2), in order to avoid gelation, the phenolic hydroxyl group of the phenol resin is 3 to 20 per equivalent of the functional group of the polyolefin (C-1). It is desirable to carry out the reaction at a ratio of double equivalent, preferably 5 to 10 equivalent.
【0015】なお、(C)成分の共重合体の製造に用い
られる重合体(C−1)の具体例としては、例えばSpecific examples of the polymer (C-1) used for producing the copolymer of the component (C) include, for example,
【0016】[0016]
【化1】 低分子量ポリエチレンの部分酸化物等が挙げられる。Embedded image Partial oxides of low molecular weight polyethylene and the like can be mentioned.
【0017】また、上記共重合体((C)成分)の製造
に用いられるポリオレフィン(C−1)の分子量は特に
限定するものではないが、重量平均分子量で、500〜
5000の範囲が好ましく、更には1000〜3000
の範囲が好ましい。この理由としては分子量がこの範囲
より小さくなると離型性に対して効果が無く、大きい場
合は(C)成分の共重合体の軟化点が高くなり、成形材
料中への分散が悪くなるため離型性に対する効果が低下
するおそれがあるためである。The molecular weight of the polyolefin (C-1) used for producing the above-mentioned copolymer (component (C)) is not particularly limited, but it is a weight average molecular weight of 500-500.
The range of 5000 is preferable, and more preferably 1000 to 3000.
Is preferable. The reason for this is that if the molecular weight is smaller than this range, there is no effect on releasability, and if it is large, the softening point of the copolymer of component (C) becomes high, and the dispersion in the molding material becomes poor, so that it becomes difficult to separate. This is because the effect on moldability may be reduced.
【0018】本発明の電子部品封止用エポキシ樹脂成形
材料には、(C)成分以外の離型剤として一般的に使用
される高級脂肪酸、高級脂肪酸金属塩、エステル系ワッ
クス、ポリエチレン系ワックスなどを同時に何種類でも
使用することができる。(C)成分以外の離型剤の配合
割合としては、通常、(A)成分のエポキシ樹脂100
重量部に対して0.1〜3重量部、好ましくは0.5〜
1.5重量部が適当である。In the epoxy resin molding material for encapsulating electronic parts of the present invention, higher fatty acids, higher fatty acid metal salts, ester waxes, polyethylene waxes and the like which are generally used as a release agent other than the component (C). Any number of types can be used at the same time. The compounding ratio of the releasing agent other than the component (C) is usually the epoxy resin 100 of the component (A).
0.1-3 parts by weight, preferably 0.5-
1.5 parts by weight is suitable.
【0019】また、本発明の電子部品封止用エポキシ樹
脂成形材料には、無機質充填剤として、溶融シリカ、結
晶シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸
カルシウム、炭化珪素、窒化ホウ素、ベリリア、ジルコ
ニアなどの粉体、又はこれらを球形化したビーズ、チタ
ン酸カリウム、炭化珪素、窒化珪素、アルミナなどの単
結晶繊維、ガラス繊維などを1種類以上配合することが
できる。無機質充填剤の配合量としては、吸湿性、線膨
張係数の低減及び強度向上の観点からエポキシ樹脂成形
材料全体に対して50〜95重量%、好ましくは70〜
90重量%とすることが適当である。上記の無機質充填
剤の中で、線膨張係数低減の観点からは溶融シリカが、
高熱伝導性の観点からはアルミナが好ましく、充填剤形
状は成形時の流動性及び金型摩耗性の点から球形が好ま
しい。Further, the epoxy resin molding material for encapsulating electronic parts of the present invention contains, as an inorganic filler, fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, boron nitride, beryllia, zirconia. It is possible to blend one or more kinds of powders such as, or spherical particles of these, single crystal fibers such as potassium titanate, silicon carbide, silicon nitride and alumina, and glass fibers. The content of the inorganic filler is 50 to 95% by weight, preferably 70 to 95% by weight based on the whole epoxy resin molding material from the viewpoint of hygroscopicity, reduction of linear expansion coefficient and improvement of strength.
90% by weight is suitable. Among the above-mentioned inorganic fillers, fused silica is, from the viewpoint of reducing the linear expansion coefficient,
Alumina is preferable from the viewpoint of high thermal conductivity, and the shape of the filler is preferably spherical from the viewpoints of fluidity at the time of molding and mold abrasion.
【0020】また、本発明の電子部品封止用エポキシ樹
脂成形材料にはカーボンブラック、有機染料などの着色
剤、エポキシシラン、アミノシラン、アルキルシラン、
ビニルシラン、有機チタネート、アルミニウムアルコレ
ートなどのカップリング剤を使用することができる。カ
ップリング剤の好ましい配合割合は(A)成分のエポキ
シ樹脂100重量部に対して1〜15重量部、更に好ま
しくは2〜8重量部である。The epoxy resin molding material for encapsulating electronic parts of the present invention includes carbon black, colorants such as organic dyes, epoxysilane, aminosilane, alkylsilane,
Coupling agents such as vinyl silanes, organic titanates, aluminum alcoholates and the like can be used. The mixing ratio of the coupling agent is preferably 1 to 15 parts by weight, more preferably 2 to 8 parts by weight, based on 100 parts by weight of the epoxy resin as the component (A).
【0021】更に、本発明の電子部品封止用エポキシ樹
脂成形材料には、上記のハロゲン化物以外の難燃剤とし
て、三酸化アンチモン、五酸化アンチモン、水酸化アル
ミニウムなどの難燃剤を使用することができる。これら
の難燃剤の好ましい配合割合は(A)成分のエポキシ樹
脂100重量部に対して1〜30重量部、更に好ましく
は2〜15重量部である。Further, in the epoxy resin molding material for encapsulating electronic parts of the present invention, flame retardants such as antimony trioxide, antimony pentoxide and aluminum hydroxide can be used as flame retardants other than the above halides. it can. The preferred blending ratio of these flame retardants is 1 to 30 parts by weight, more preferably 2 to 15 parts by weight, relative to 100 parts by weight of the epoxy resin as the component (A).
【0022】以上のような原材料を用いて成形材料を作
製する一般的な方法としては、所定の配合量の原材料混
合物をミキサー等によって充分混合した後、熱ロール、
押出機等によって混練し、冷却、粉砕することによっ
て、成形材料を得ることができる。As a general method for producing a molding material using the above raw materials, a predetermined amount of the raw material mixture is thoroughly mixed by a mixer or the like, and then a heat roll,
A molding material can be obtained by kneading with an extruder or the like, cooling and pulverizing.
【0023】本発明で得られる成形材料を用いて電子部
品を封止する方法としては、低圧トランスファ成形法が
最も一般的であるが、インジェクション成形、圧縮成
形、注型などの方法によっても可能である。As a method for sealing electronic parts by using the molding material obtained in the present invention, the low-pressure transfer molding method is the most general method, but injection molding, compression molding, casting or the like is also possible. is there.
【0024】[0024]
【実施例】以下、本発明の実施例及びその比較例によっ
て本発明を更に具体的に説明するが、本発明はこれらの
実施例に限定されるものではない。EXAMPLES Hereinafter, the present invention will be described more specifically with reference to Examples of the present invention and Comparative Examples thereof, but the present invention is not limited to these Examples.
【0025】実施例1〜11、比較例1〜13 表2及び表3に示す実施例及び比較例の成形材料を作製
するにあたり、(A)成分及び(B)成分の各種エポキ
シ樹脂及び硬化剤としては次に示すものを使用した。Examples 1 to 11 and Comparative Examples 1 to 13 In producing the molding materials of Examples and Comparative Examples shown in Tables 2 and 3, various epoxy resins and curing agents as the component (A) and the component (B) were used. The following was used as
【0026】[0026]
【化2】 *1:o−クレゾールノボラック型エポキシ樹脂(エポ
キシ当量=200)、住友化学工業(株)製、ESCN
−195Embedded image * 1: o-cresol novolac type epoxy resin (epoxy equivalent = 200), Sumitomo Chemical Co., Ltd., ESCN
-195
【0027】[0027]
【化3】 *2: テトラメチルビフェニル型ジエポキシ樹脂(エ
ポキシ当量=188)、油化シェルエポキシ(株)製、
YX−4000HEmbedded image * 2: Tetramethylbiphenyl type diepoxy resin (epoxy equivalent = 188), manufactured by Yuka Shell Epoxy Co., Ltd.
YX-4000H
【0028】[0028]
【化4】 Embedded image
【0029】[0029]
【化5】 (C)成分の共重合体としては表1に示すもの使用し
た。Embedded image As the copolymer of the component (C), those shown in Table 1 were used.
【0030】[0030]
【表1】 前記したエポキシ樹脂、硬化剤、表1に示す共重合体、
エポキシ当量375、軟化点80℃、臭素含量48重量
%の臭素化ビスフェノールA型エポキシ樹脂、1,8−
ジアザビシクロ(5,4,0)ウンデセン−7、カルナ
バワックス、重量平均分子量3000の非酸化ポリエチ
レンワックス、三酸化アンチモン、カーボンブラック、
カップリング剤としてγ−グリシドキシプロピルトリメ
トキシシラン、石英ガラス粉を原材料とし、表2、表3
に示す重量比で配合を行い、混練温度80〜90℃、混
練時間10分の条件でロール混練を行い、実施例及び比
較例の成形材料を作製した。なお、表2及び表3中、成
分の量は重量部で示した。表4、表5に実施例及び比較
例の成形材料特性を、表6に特性評価法の詳細を示す。
表4、表5に示すように比較例と比べ実施例1〜11は
離型性とマーキング性を両立した優れた性能を有してい
る。更に、実施例1〜11は優れた離型性を発揮すると
共に、ベース樹脂本来の接着性を維持する能力が高いた
め、表面実装型ICの最重要特性である耐リフロークラ
ック性にも優れていることが分かる。[Table 1] The above-mentioned epoxy resin, curing agent, copolymer shown in Table 1,
Epoxy equivalent 375, softening point 80 ° C, bromine content 48 weight% brominated bisphenol A type epoxy resin, 1,8-
Diazabicyclo (5,4,0) undecene-7, carnauba wax, non-oxidized polyethylene wax having a weight average molecular weight of 3000, antimony trioxide, carbon black,
Using γ-glycidoxypropyltrimethoxysilane as a coupling agent and quartz glass powder as raw materials, Table 2 and Table 3
Compounding was carried out in the weight ratio shown in Table 1, and roll kneading was carried out under the conditions of a kneading temperature of 80 to 90 ° C. and a kneading time of 10 minutes to prepare molding materials of Examples and Comparative Examples. In Tables 2 and 3, the amounts of the components are shown in parts by weight. Tables 4 and 5 show the characteristics of the molding materials of Examples and Comparative Examples, and Table 6 shows the details of the characteristic evaluation method.
As shown in Tables 4 and 5, Examples 1 to 11 have excellent performance in which the releasability and the marking property are compatible with each other as compared with the comparative example. Furthermore, since Examples 1 to 11 exhibit excellent releasability, and have a high ability to maintain the original adhesiveness of the base resin, they also have excellent reflow crack resistance, which is the most important characteristic of surface mount ICs. I know that
【0031】[0031]
【表2】 *7:1,8−ジアザビシクロ(5,4,0)ウンデセ
ン−7 *8:γ−グリシドキシプロピルトリメトキシシラン *9:非酸化型ポリエチレンワックス(分子量300
0)[Table 2] * 7: 1,8-diazabicyclo (5,4,0) undecene-7 * 8: γ-glycidoxypropyltrimethoxysilane * 9: non-oxidizing polyethylene wax (molecular weight 300
0)
【0032】[0032]
【表3】 [Table 3]
【0033】[0033]
【表4】 [Table 4]
【0034】[0034]
【表5】 [Table 5]
【0035】[0035]
【表6】 [Table 6]
【0036】[0036]
【発明の効果】本発明によって得られたエポキシ樹脂成
形材料は耐クラック性が従来のものと比べ大きく改善で
きる。電子部品の分野、特にFP(フラットパッケー
ジ)、SOP(スモールアウトラインパッケージ)など
のICではパッケージが薄形、小形になり、素子の大型
化と相俟って耐パッケージクラック性が強く要求されて
おり、これらの製品へ広く適用でき、その工業的価値は
大きい。The epoxy resin molding material obtained according to the present invention can be greatly improved in crack resistance as compared with the conventional one. In the field of electronic parts, especially in ICs such as FP (flat package) and SOP (small outline package), the package is thin and small, and in combination with the increase in size of the device, package crack resistance is strongly required. It can be widely applied to these products and has great industrial value.
【図1】離型性の測定法を示す斜視図。FIG. 1 is a perspective view showing a method of measuring releasability.
1 金型 2 成形品 1 mold 2 molded product
Claims (8)
を有するエポキシ樹脂、(B)1分子中に2個以上のフ
ェノール性水酸基を有する化合物及び(C)フェノール
性水酸基と反応する官能基を有するポリオレフィン(C
−1)とヒドロキシフェニレン基を構造単位として有す
る重合体(C−2)との共重合体を必須成分とすること
を特徴とする電子部品封止用エポキシ樹脂成形材料。1. A reaction with (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, and (C) a phenolic hydroxyl group. Polyolefin having functional group (C
An epoxy resin molding material for electronic component encapsulation, comprising a copolymer of -1) and a polymer (C-2) having a hydroxyphenylene group as a structural unit as an essential component.
フィンが重量平均分子量1000から3000のもので
ある請求項1記載の電子部品封止用エポキシ樹脂成形材
料。2. The epoxy resin molding material for electronic component encapsulation according to claim 1, wherein the polyolefin used for producing the component (C) has a weight average molecular weight of 1,000 to 3,000.
フィン(C−1)がエポキシ基を有する水添1,2−ポ
リブタジエン、カルボキシル基を有する水添1,2−ポ
リブタジエン又はエポキシ基を有するポリエチレンであ
る請求項1又は2記載の電子部品封止用エポキシ樹脂成
形材料。3. A hydrogenated 1,2-polybutadiene having an epoxy group as the polyolefin (C-1) used for producing the component (C), a hydrogenated 1,2-polybutadiene having a carboxyl group, or a polyethylene having an epoxy group. The epoxy resin molding material for encapsulating an electronic component according to claim 1 or 2.
シフェニレン基を構造単位として有する重合体(C−
2)がフェノールノボラック樹脂である請求項1〜3何
れか記載の電子部品封止用エポキシ樹脂成形材料。4. A polymer (C-) having a hydroxyphenylene group as a structural unit, which is used for producing the component (C).
2) is a phenol novolac resin, The epoxy resin molding material for electronic component sealing in any one of Claims 1-3.
換又は非置換の4,4′−ビス(2,3−エポキシプロ
ポキシ)ビフェニルである請求項1〜4何れか記載の電
子部品封止用エポキシ樹脂成形材料。5. The encapsulating electronic component according to claim 1, wherein the epoxy resin as the component (A) is alkyl-substituted or unsubstituted 4,4′-bis (2,3-epoxypropoxy) biphenyl. Epoxy resin molding material.
分のフェノール性水酸基を有する化合物が飽和脂肪族環
を分子中に有するエポキシ樹脂又は化合物である請求項
1〜5何れか記載の電子部品封止用エポキシ樹脂成形材
料。6. The electron according to claim 1, wherein the epoxy resin of component (A) or the compound having a phenolic hydroxyl group of component (B) is an epoxy resin or compound having a saturated aliphatic ring in the molecule. Epoxy resin molding material for component encapsulation.
素化エポキシ樹脂を含有する請求項1〜6何れか記載の
電子部品封止用エポキシ樹脂成形材料。7. The epoxy resin molding material for encapsulating electronic components according to claim 1, further comprising a brominated epoxy resin as the epoxy resin as the component (A).
〜7何れか記載の電子部品封止用エポキシ樹脂成形材料
の封止樹脂からなる半導体装置。8. A semiconductor element and a method of encapsulating the same.
7. A semiconductor device comprising an encapsulating resin of the epoxy resin molding material for encapsulating an electronic component according to any one of 7 to 7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30417095A JP3624499B2 (en) | 1995-11-22 | 1995-11-22 | Epoxy resin molding material for sealing electronic parts and semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30417095A JP3624499B2 (en) | 1995-11-22 | 1995-11-22 | Epoxy resin molding material for sealing electronic parts and semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09143251A true JPH09143251A (en) | 1997-06-03 |
| JP3624499B2 JP3624499B2 (en) | 2005-03-02 |
Family
ID=17929892
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30417095A Expired - Fee Related JP3624499B2 (en) | 1995-11-22 | 1995-11-22 | Epoxy resin molding material for sealing electronic parts and semiconductor device |
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| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001031941A (en) * | 1999-07-19 | 2001-02-06 | Hitachi Chem Co Ltd | Nonconductive resin paste composition and semiconductor device using same |
| JP2004156051A (en) * | 1999-09-17 | 2004-06-03 | Hitachi Chem Co Ltd | Epoxy resin composition for sealing and electronic component device |
-
1995
- 1995-11-22 JP JP30417095A patent/JP3624499B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001031941A (en) * | 1999-07-19 | 2001-02-06 | Hitachi Chem Co Ltd | Nonconductive resin paste composition and semiconductor device using same |
| JP2004156051A (en) * | 1999-09-17 | 2004-06-03 | Hitachi Chem Co Ltd | Epoxy resin composition for sealing and electronic component device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3624499B2 (en) | 2005-03-02 |
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