JPH09166558A - X-ray analysis method and apparatus - Google Patents

Abstract

(57) Abstract: An X-ray analysis method and apparatus capable of forming a microscopic focused X-ray spot, thereby enabling local analysis with higher spatial resolution. A smaller focused X-ray spot is formed by correcting the shape of the reflection surface of the focused X-ray forming optical element while observing the focused X-ray image. The focused X-ray from the optical element 3 is received by the X-ray detector 12, and the detection signal is processed by the signal processing device 14, thereby processing the spot image of the focused X-ray, the beam profile, the beam diameter, and the like. It is displayed on the monitor screen of the device 14. Based on these,
The shape correction device 16 is used to correct the reflection surface shape of the optical element 3. [Effect] The shape error of the optical element can be corrected while observing the beam profile and the beam diameter. As a result, it is possible to obtain a focused X-ray spot that is closer to the design value than could be obtained only by adjusting the position of the optical element, so that it is possible to perform X-ray analysis with higher plane resolution.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray analysis method and apparatus for analyzing various materials in a minute region by using condensed X-rays.

[0002]

2. Description of the Related Art In recent years, with higher integration and larger capacity of semiconductor integrated circuits, storage media, etc., there is an increasing need to control the physical properties (chemical bonding state, etc.) of various materials in a minute region. . Local information on the structure, chemical state, and electronic state of the material is essential for this physical property control. The local analysis technique that uses X-rays that are collected using a condensing optical element is an analysis related to a local region of a sample that suppresses irradiation damage given to a sample to be analyzed as compared with analysis techniques that use other particle beams. It is considered particularly useful because it has the advantage of being able to obtain information.

In order to obtain condensed X-rays, optical elements such as a grazing incidence reflecting mirror, a zone plate, and a Schwarzschild type reflecting mirror are generally used. Among these optical elements, the grazing incidence reflecting mirror is an optical element that utilizes the phenomenon of total internal reflection that occurs when light is incident on the reflecting surface at a shallow angle equal to or less than the critical angle. This oblique-incidence reflecting mirror has superior performances compared to other optical elements such as wide selectivity for incident light wavelength and high light-collecting efficiency. Therefore, by using the grazing incidence reflecting mirror as the optical element for condensing X-rays, it becomes possible to perform analysis with high spatial resolution by using X-rays having a wavelength optimum for analysis.

The spatial resolution of local analysis is mainly determined by the beam profile and the beam diameter of condensed X-rays. Therefore, in order to improve the spatial resolution, it is essential to form a focused X-ray having a smaller beam diameter or a beam profile with better symmetry. Therefore, it is important to improve the shape accuracy of the condensing optical element and to adjust the installation position of the optical element in the condensing optical system (for example, optical axis adjustment). Among them, as a method of adjusting the optical axis, a method of adjusting the optical axis while observing a focused spot image has been previously proposed (see Japanese Patent Application No. 06-55466).

[0005]

A typical oblique-incidence reflecting mirror for forming focused X-rays has a meridional surface whose shape is an arc, an ellipse, a parabola, a hyperbola, or a combination thereof. It is an axisymmetric reflecting mirror having the configured aspherical surface as a reflecting surface. In manufacturing such a reflecting mirror, very strict processing accuracy is required such that an allowable error between the designed reflecting surface shape and the actual reflecting surface shape is several μm or less. Even today, as ultra-precision processing technology has advanced, it is inevitable that a shape error exceeding the above-mentioned allowable range partially occurs on the reflecting surface. Since the resolution in the local X-ray analysis is determined by the beam diameter of the focused X-rays and the like, the spread of the focused X-ray beam caused by the shape error of the reflecting mirror lowers the resolution. Therefore, in order to improve the resolution, it is necessary to correct the shape error of the reflecting mirror and reduce the beam diameter of the condensed X-ray. However, with respect to the above-mentioned axisymmetric reflecting mirror, such a shape error correction technique does not exist, and thus such a shape error has not been actually corrected. Therefore, in the local X-ray analysis using the condensed X-ray, it was not possible to obtain a sufficiently satisfactory spatial resolution.

Therefore, an object of the present invention is to provide an X-ray analysis method and an apparatus therefor capable of forming a smaller focused X-ray spot to enable local X-ray analysis with higher spatial resolution. That is. Another object of the present invention is to
It is an object of the present invention to provide a means for adjusting the reflection surface shape of a reflection type optical element for forming condensed X-rays.

[0007]

The above-mentioned object of the present invention is to irradiate a sample with X-rays condensed by using a reflective optical element for condensing X-rays to obtain the chemical state, electronic state, and Alternatively, in an X-ray analysis method for analyzing a structural state, while observing a spot image of condensed X-rays irradiated on the sample,
This is achieved by correcting the shape of the reflecting surface of the reflecting optical element for X-ray focusing based on the observation result.

Further, the above-mentioned object of the present invention is to provide an X-ray source for generating X-rays and an X-ray for condensing the generated X-rays from the X-ray source to form a focused X-ray beam. Condensing reflection optical element, X-ray irradiating means for irradiating a sample to be measured with a condensed X-ray beam formed by the X-ray converging reflecting optical element, and the sample to be measured by the X-ray irradiating means And a particle observation means for observing particles emitted from the sample to be measured by the irradiation of the condensed X-ray beam. This is achieved by adding a condensing X-ray image observing means for observing the condensing state and a reflecting surface shape correcting means for correcting the shape of the reflecting surface of the reflecting optical element for X-ray condensing. It

As the reflecting optical element for X-ray focusing, an obliquely symmetric or non-axisymmetrically grazing incidence reflecting mirror can be used. The correction of the reflection surface shape of the reflection optical element for X-ray focusing can be performed by applying external pressure to the reflection optical element to deform the reflection surface shape of the reflection optical element. The external pressure applied to the reflective optical element may be locally applied to a selected portion of the reflective optical element, and further locally applied to the selected plurality of portions. Good.

The external pressure may be applied to the grazing incidence reflecting mirror at a plurality of positions selected in the direction of the optical axis of the grazing incidence reflecting mirror. Further, when an axially symmetric oblique-incidence reflecting mirror is used as the X-ray condensing reflective optical element, the external pressure is applied to the axially symmetric oblique-incidence reflecting mirror by applying the optical axis of the axially symmetric oblique-incidence reflecting mirror. It can be performed at each of a plurality of positions in the (central axis) direction and the circumferential direction.

As a means for applying an external pressure to the reflective optical element for X-ray focusing, a fine moving mechanism constituted by using a piezoelectric element, a mechanism for converting the rotation of a screw into a fine linear movement, or the like is used. You can The means for applying an external pressure to the X-ray focusing reflective optical element is fixedly installed at a selected single or plural position in the optical axis direction of the X-ray focusing reflective optical element. Alternatively, a single or a plurality of external pressure applying means may be configured to be movable in the optical axis direction.

As described above, in the present invention, the X-ray from the X-ray source is focused on the surface of the sample by using the X-ray focusing optical element and spot irradiation is performed. As the converging optical element, an oblique incidence total reflection mirror such as an ellipsoidal mirror, a spherical mirror or a Walter type reflection mirror in which these are combined can be used. By the irradiation of this condensed X-ray, various secondary particles (charged particles such as electrons and ions or fluorescent X-rays, photons such as ultraviolet light and visible light) are emitted from the sample surface. These emitted particles are detected using an appropriate particle observation means. You may use the observation means which has the energy analysis function of a detection particle. By observing the emitted particles, it is possible to obtain knowledge about the constituent atoms on the surface of the sample or in the vicinity of the surface, the constituent ratio thereof, the chemical state such as the atomic bonding state, the electronic state, the crystal structure, and the like. further,
By observing the particles emitted from the sample surface while irradiating the sample surface with focused X-rays and using the two-dimensional minute moving means of the sample to minutely move the sample, the above-mentioned chemical state, electronic state, and crystal structure are observed. It is also possible to image and display the distribution state of the above on the sample surface.

In the present invention, an X-ray analyzer based on the above-described measurement principle is newly provided with a light collecting state observing means for observing the light collecting state of irradiated X-rays and the result of this light collecting state observation. Based on this, a reflection surface shape correcting means for correcting the reflection surface shape error of the X-ray focusing optical element is added. The condensing state observing means is a condensing X by the condensing optical element.
It is composed of an X-ray detector arranged to receive rays and a signal processing device for processing the detection signal from the X-ray detector in accordance with the purpose of observation.

The above-mentioned X-ray detector is a position detection type X-ray detector having a two-dimensional position resolution, that is, an X-ray detection signal corresponding to the X-ray intensity distribution on the light receiving surface of the X-ray detector. It is desirable that the X-ray detector has a function of outputting As this type of X-ray detector, for example, a PSD (position-sensitive detector) using a microchannel plate, a CCD (charge-coupled device), or a combination of a fluorescent screen and a television camera can be used. it can. The observation of the spot image of the condensed X-ray is carried out by using a minute hole or a slit formed in the X-ray opaque plate or by using a sharp end (knife edge) of the X-ray opaque plate itself. A method of measuring a two-dimensional intensity distribution in the image plane of a focused X-ray spot image by measuring the intensity of transmitted X-rays when the focused X-ray beams are relatively moved while blocking a part of them. You can also do

In the above signal processing device, the X-ray on the X-ray receiving surface of the X-ray detector is based on the signal from the X-ray detector.
A spot image of condensed X-rays having a luminance distribution according to the line intensity distribution is formed, and the spot image is displayed on the monitor screen. Furthermore, the brightness (brightness) of each part of this spot image
To X at any cross section (cut) on the X-ray receiving surface
The line intensity distribution (beam profile) can be obtained, and the result can be displayed on the monitor screen together with (or independently of) the spot image if necessary.

When observing the condensed state of X-rays, the above X
It is desirable to install the X-ray receiving surface of the line detector at the focal position of the X-ray focusing optical element. In that case, the sample and the sample holding means are moved to a position that does not hinder the observation, and the X-ray receiving surface is set at the focal position. As a result, as described above, the beam profile of the condensed X-ray can be observed on the monitor screen of the signal processing device. Further, even when the light receiving surface of the X-ray detector is installed at a position other than the focal position of the X-ray, the correspondence between the spot image of the focused X-ray at a position other than this focal position and the spot image of the focused X-ray at the focal position. By measuring or calculating in advance, it is possible to judge the quality of the X-ray focusing state at the focal position based on the observation result of the focused X-ray image at a position other than the focal position.

In the present invention, while observing the X-ray focusing state by the X-ray focusing optical element using the above-mentioned focusing state observing means, the reflection of the X-ray focusing optical element is based on the observation result. Performs surface shape error correction. When the X-ray focusing optical element is a grazing incidence reflecting mirror, an error (deviation from the design shape) of the reflecting surface shape within the meridional plane of the grazing incidence reflecting mirror is spread over the entire length of the reflecting mirror. It is not distributed finely and randomly, but changes gradually over a length range of about 1 cm. Further, the error amount to be corrected is small, about several μm.
Therefore, if a positive or negative external pressure is locally applied to the reflecting mirror at several points along the entire length of the reflecting mirror, the shape of the reflecting surface can be changed over a range of several mm around each pressure applying point. Therefore, it is possible to correct the error in the shape of the reflecting surface over the entire length of the reflecting mirror. The external pressure may be applied to the reflecting mirror either on the reflecting surface side of the reflecting mirror or on the back surface (outer peripheral surface) side. However, when applying an external pressure to the reflecting surface side, it goes without saying that the external pressure applying means for that purpose should be arranged at a position that does not interfere with the entrance and exit of X-rays.

As a means for applying an external pressure to the above-mentioned X-ray focusing optical element (reflecting mirror), for example, a pressing mechanism utilizing the minute expansion and contraction function of a piezoelectric element or a system for converting the rotation of a screw into a minute linear movement. If a pressure mechanism or the like is used, the applied pressure can be finely controlled, and a minute shape error of the reflecting surface can be corrected. Further, if the pressurizing mechanism and the reflecting mirror are arranged on the moving mechanism at the same time, the optical axis can be adjusted together with the above-mentioned correction of the reflecting surface shape.

As described above, according to the present invention, the shape of the reflecting surface of the condensing reflecting mirror is adjusted so that the optimum condensing state can be obtained while observing the condensing X-ray image by the condensing reflecting mirror. Can be corrected, so that it is possible to obtain a focused X-ray beam that is closer to the design value than was previously possible only by adjusting the optical axis of the focusing mirror, and the spatial resolution of local X-ray analysis can be obtained. Can be dramatically improved.

[0020]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<Embodiment 1> FIG. 1 shows the basic construction of an X-ray analyzer according to an embodiment of the present invention. The X-ray analysis apparatus according to the present embodiment mainly includes an X-ray source section, an X-ray focusing section, an optical element shape correction system, a sample control system, and a particle observation system. In order to avoid absorption of X-rays generated in the X-ray source part by the atmosphere and surface contamination of the sample, as shown in FIG.
The main components of the device are installed in the vacuum chamber 1.

In FIG. 1, the X-ray emitted from the X-ray source 2 is condensed by the condensing optical element 3. The aperture 4 may be installed as needed to determine the diameter of the X-ray source.
The collected X-rays are applied to the sample 5. The particles emitted from the sample 5 by the irradiation of the condensed X-rays are detected by the particle observation device 6. The particle observation device 6 is a detector capable of detecting photons such as electrons, ions, or fluorescent X-rays, and can perform energy analysis of these particles as needed. The signal from the particle observation device 6 is processed by the signal processing device 7 and stored in the computer 8. The accumulated data is displayed there as image data. The sample 5 is installed on the sample table 9, and the moving mechanism 10 is attached to the sample table 9. The moving mechanism 10 is controlled by the computer 8 via the controller 11. The moving mechanism 10 can be finely moved in a direction parallel to the optical axis of the optical element 3 and a direction perpendicular to the optical axis. By using this moving mechanism 10 to perform minute movement (scanning) of the sample 5 during irradiation of the focused X-ray, the distribution of the chemical state and electronic state of the surface of the sample 5 and the vicinity of the surface can be observed. .

The X-ray detector 1 measures the beam profile of condensed X-rays for adjusting the reflection surface shape of the condensing optical element 3.
2 is used. The condensed X-rays from the condensing optical element 3 enter the X-ray detector 12. The detection signal from the X-ray detector 12 is input to the signal processing device 14 via the controller 13. In the signal processing device 14, the beam profile image of the condensed X-rays on the detection surface of the X-ray detector 12 is video-displayed on the monitor screen based on the input signal. Further, the X-ray detector 12 is configured to be able to move out of the optical path of the condensed X-ray during sample analysis so as not to interfere with sample analysis.

The correction of the reflection surface shape of the converging optical element 3 is performed by
This is performed by observing the beam profile image displayed on the monitor screen of the signal processing device 14 and adjusting the reflection surface shape using the optical element shape correction device 15 so that the beam profile becomes optimum. A controller 16 for correction control is used to control the correction device 15. By using these optical element shape correction systems, the reflection surface shape of the optical element 3 can be corrected from outside the vacuum. Both the optical element 3 and the correction device 15 are installed on the moving mechanism 17, and by slightly moving the moving mechanism 17, the optical axis of the focused X-ray can be adjusted at the same time as the shape correction described above.

According to this embodiment, while observing the beam profile image of the focused X-ray, the shape of the reflecting surface of the focusing optical element 3 is adjusted so that the focused X-ray beam in the optimum focused state can be obtained. Can be corrected. Therefore, the condensing X closer to the design value, which cannot be obtained only by adjusting the optical axis of the conventional reflecting surface,
A line beam can be obtained, and the spatial resolution of local X-ray analysis can be further improved.

<Embodiment 2> FIG. 2 shows a structural example of the optical element shape correction device 15. In this example, as the optical element 3 for converging the incident X-ray 30, an axially symmetric oblique incidence reflecting mirror manufactured by the replica method is used. Axisymmetric grazing incidence reflector 3
Is installed in the case 19. The figure shows a sectional structure including the central axis X of the reflecting mirror 3. A ring-shaped pressing mechanism 20 is fitted between the reflecting mirror 3 and the case 19 at several points in the axial direction. The pressurizing mechanism 20 is composed of, for example, a ring-shaped piezoelectric element, and is configured to make a minute expansion / contraction motion in the radial direction (direction of arrow R). By appropriately controlling the position, direction, and expansion / contraction amount of the expansion / contraction movement by the pressing mechanism 20, the reflection surface shape of the reflection mirror 3 can be corrected. The pressing mechanism 20 may be integrally fixed to the reflecting mirror 3 or both the reflecting mirror 3 and the case 19 to form a reflecting mirror with a shape correcting mechanism.
The case 19 may be directly configured as a holder for the reflecting mirror 3. A spacer may be provided between the reflecting mirror 3 and the pressing mechanism 20 for adjusting the area where they are in contact with each other.
By this pressurizing mechanism 20, positive and negative radial pressures can be applied to the outer peripheral surface of the reflecting mirror 3, whereby the reflecting surface shape of the reflecting mirror can be adjusted.

According to the present embodiment, even in the case of a reflecting mirror partially having a reflection surface shape error, the shape error can be corrected, so that excellent condensing characteristics can be obtained.

<Embodiment 3> FIG. 3 shows another example of the configuration of the optical element shape correction device 15. In the above-mentioned second embodiment, the portion where pressure is applied to the reflecting mirror 3 from the outer periphery is fixed. In order to obtain better light condensing characteristics, it is better to be able to arbitrarily select the location (axial position) to which this pressure is applied. Therefore, in this example, the linear movement mechanism 21 is added so that the pressure mechanism 20 can move in the axial direction. In this case, since it becomes difficult to hold the reflecting mirror 3 only by the pressing mechanism 20, the reflecting mirror 3 is fixedly held by the axially opposite end walls of the case 19 in the figure. However, the fixed holding position of the reflecting mirror 3 is
In particular, it may not be at both ends of the reflecting mirror 3. Also, case 19
Between the pressing mechanism 20 and the reflecting mirror 3 so that the pressing mechanism 20 can be easily moved in the axial direction between the reflecting mirror 3 and the reflecting mirror 3.
Alternatively, a suitable spacer 22 may be provided between the pressure mechanism 20 and the case 19. Further, although only one pressurizing mechanism 20 is installed in the figure, a plurality of pressurizing mechanisms are arranged side by side in the axial direction, and each pressurizing mechanism can be individually moved in the axial direction. It goes without saying that it is okay.

As the linear movement mechanism 21, a linear movement mechanism for expanding and contracting a rod connected to the pressurizing mechanism by rotation of a screw, or a linear movement mechanism composed of a single piezoelectric element or a combination of a plurality of piezoelectric elements is used. Can be used. The linear movement mechanism 21 is usually installed so as to move the pressure mechanism 20 with respect to an arbitrary fixed end (one axial end wall of the case 19 in the figure).
As described above, when a plurality of pressure mechanisms are installed in parallel,
A linear movement mechanism may be installed between the pressure mechanisms. Further, the fixedly arranged pressure mechanism shown in the second embodiment and the movablely arranged pressure mechanism shown in this embodiment may be mixed.

In the case of the present embodiment, since the pressing mechanism 20 is movable and cannot be fixed to the outer peripheral surface of the reflecting mirror 3, the outer peripheral surface of the reflecting mirror 3 cannot be pulled outward. However, in consideration of using the movable arrangement type pressurizing mechanism according to this example, it should be manufactured in advance so that the inner diameter of the reflecting mirror 3 (reflecting surface inner diameter) has a slightly positive tolerance with respect to its design value. For example, it is possible to sufficiently correct the shape of the reflecting surface of the reflecting mirror 3 by applying only a pressing force inward to the outer peripheral surface of the reflecting mirror 3 by the pressing mechanism 20.

According to this embodiment, it is possible to correct the reflection surface shape error at any position in the axial direction of the reflecting mirror.

<Embodiment 4> FIG. 4 shows still another example of the configuration of the optical element shape correction device 15. The outer diameter of the axisymmetric oblique incidence reflecting mirror 3 is at least 1 mm along the axial direction of the reflecting mirror 3.
In the case of the third embodiment, when the pressing mechanism 20 is moved in the axial direction, the required expansion / contraction amount of the pressing mechanism 20 in the radial direction is changed. It may happen that the expansion and contraction ability range of the above is exceeded. Therefore, in this example, a spacer 23 having a substantially uniform outer diameter is inserted and installed between the pressing mechanism 20 and the reflecting mirror 3 along the entire axial length, so that the pressing mechanism 20 moves in the axial direction. The required expansion / contraction range of the pressure mechanism 20 in the radial direction is set so as not to change so much. In the figure, only one pressing mechanism 20 is installed over the entire length in the axial direction, but it goes without saying that a plurality of pressing mechanisms 20 may be installed in the axial direction.

According to the present embodiment, even for a reflecting mirror having a large change in the outer diameter in the axial direction, it is possible to correct the error of the reflecting surface shape at an arbitrary position in the axial direction of the reflecting mirror.

<Embodiment 5> FIG. 5 shows still another configuration example of the optical element shape correction device 15. In the above examples, a ring-shaped pressing mechanism was used. In the ring-shaped pressurizing mechanism, the amount of expansion and contraction in the radial direction cannot be set so large that the correctable range may be limited. Therefore, in the present embodiment, the pressurizing mechanism is configured by using the expanding / contracting mechanism that can expand / contract only in the one-axis direction (the amount of expansion / contraction can be large). That is, as shown in FIG. 5, a plurality of expansion / contraction mechanisms 24 that expand / contract only in one direction (radial direction) are arranged in parallel along the inner peripheral surface of the cylindrical outer frame 25, and are arranged on the outer peripheral surface of the reflecting mirror 3. It is configured so that radial pressure can be applied. This one
As the direction expansion / contraction mechanism 24, a unidirectional expansion / contraction piezoelectric element, a linear motion mechanism for expanding / contracting a rod by rotating a screw, or the like can be used. The installation position and installation method of the pressing mechanism using the one-way expansion / contraction mechanism 24 are the same as those in the above-described embodiments.

The unidirectional expansion / contraction mechanism 24 is provided with an adjusting tool 2 for uniformly applying pressure to the outer peripheral surface of the reflecting mirror 3.
6 are provided. The adjusting tool 26 may be fixed to the outer peripheral surface of the reflecting mirror 3, or may not be fixed when the pressing mechanism is moved in the axial direction. Further, in the drawing, the outer peripheral surface of the reflecting mirror 3 is configured to be pressed from four directions, but it is also possible to adopt a configuration in which pressure is applied from a greater number of directions. If the pressure can be applied from a sufficient number of directions, the adjusting tool 26 is not necessarily provided.

According to this embodiment, the amount of pressure applied to the reflecting mirror 3 can be increased, and the amount of correction of the reflecting surface can be increased accordingly. Further, by independently controlling the amount of pressure applied to the reflecting mirror 3 from each direction, a non-axisymmetric shape error can be corrected, and at the same time, it can be used for aligning the optical axis of the reflecting mirror 3. .

<Embodiment 6> FIG. 6 shows still another example of the configuration of the optical element shape correction device 15. In the above embodiments, the shape of the axially symmetric oblique incidence reflecting mirror 3 is corrected over the entire circumference around the axis. However, when the divergence angle of the incident X-ray from the X-ray source 2 is small, it is not the entire inner peripheral surface of the reflecting mirror 3 that is actually used as the reflecting surface of the X-ray but a limited part thereof. Sometimes there is. In FIG. 6, a hatched portion A on the inner peripheral surface of the reflecting mirror 3 is a portion on which X-rays are actually incident. The reflecting mirror 3 is supported by the holder 27. Between the outer peripheral portion of the reflecting mirror 3 corresponding to the X-ray incident portion A and the holder 27, the one-way retractable mechanism 24 similar to that used in the fifth embodiment is installed. This one
If necessary, a plurality of direction expansion / contraction mechanisms 24 may be installed along the central axis of the reflecting mirror 3. Also, the one-way expansion / contraction mechanism 2
4 may be fixed to the holder 27 and the reflecting mirror 3, but may not be fixed when the expanding / contracting mechanism 24 is moved in the central axis direction of the reflecting mirror 3. When the one-way expansion / contraction mechanism 24 is moved in the axial direction, in order to facilitate the axial movement of the spacer and the expansion / contraction mechanism for correcting the axial change of the outer diameter of the reflecting mirror 3, as in the fourth embodiment. A supplementary spacer or the like may be installed.

According to the present embodiment, when the incident X-ray is irradiated only on a limited part of the inner peripheral surface of the reflecting mirror 3, the reflecting surface shape of the reflecting mirror 3 is limited to only the irradiated portion. You can correct it.

<Embodiment 7> FIG. 7 shows still another example of the configuration of the optical element shape correction device 15. In the above embodiments, the case where the axially symmetric oblique-incidence reflecting mirror is used has been described, but in the present embodiment, an example of the method of correcting the reflection surface shape when the non-axially symmetric oblique-incidence reflecting mirror is used is shown. As shown in the figure, a pressure mechanism 29 is installed on the reflecting surface side of the oblique incidence reflecting mirror 28 which is not axially symmetric. In the present embodiment, the shape of the reflecting surface is corrected by pressurizing the portion of the grazing incidence reflecting mirror 28 on the reflecting surface side where the incident X-rays 30 do not enter, but from the back surface side of the reflecting mirror as in the previous embodiments. You may make it pressurize. The correction of the reflection surface shape error is performed by adjusting the pressure applied by the pressing mechanism 29 while detecting the condensed image by the reflecting mirror 28, as in the previous embodiments. In addition, the pressure mechanism 2
A plurality of 9 may be installed along the optical axis of the reflecting mirror 28.

According to this embodiment, it is possible to correct the shape error of the reflecting surface even in the oblique-incidence reflecting mirror which is not axially symmetric, and it is possible to obtain excellent condensing characteristics.

Although some embodiments have been described above, the reflecting surface shape correcting means shown in these embodiments may be used in various combinations, and such combinations are also included in the present invention. It goes without saying that it is a thing.

[0042]

According to the present invention, the shape of the reflecting surface of the optical element for forming condensed X-rays can be adjusted while observing the beam profile and the beam diameter of the condensed X-rays. Therefore, a smaller focused X-ray spot can be obtained, and high-resolution X-ray analysis can be performed.

[Brief description of the drawings]

FIG. 1 is a diagram showing a basic configuration of an X-ray analysis apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing a configuration of an optical element shape correction device according to an embodiment of the present invention.

FIG. 3 is a diagram showing a configuration of an optical element shape correction device according to another embodiment of the present invention.

FIG. 4 is a diagram showing a configuration of an optical element shape correction device according to still another embodiment of the present invention.

FIG. 5 is a diagram showing a configuration of an optical element shape correction device according to still another embodiment of the present invention.

FIG. 6 is a diagram showing a configuration of an optical element shape correction device according to still another embodiment of the present invention.

FIG. 7 is a diagram showing a configuration of an optical element shape correction device according to still another embodiment of the present invention.

[Explanation of symbols]

1: Vacuum chamber 2: X-ray source 3: Optical element 4: Aperture 5: Sample 6: Particle observation device 7: Signal processing device 8: Computer 9: Sample stage 10: Moving mechanism 11: Controller 12: X-ray detector 13 : Controller 14: Signal processing device 15: Optical element shape correction device 16: Controller 17: Moving mechanism 18: Controller 19: Case 20: Pressing mechanism 21: Straight moving mechanism 22: Spacer 23: Spacer 24: 1-way expansion / contraction mechanism 25 : Outer frame 26: Adjusting tool 27: Holder 28: Oblique incidence reflecting mirror 29: Pressing mechanism 30: Incident light.

Claims (22)

[Claims] 1. An X-ray analysis method for irradiating a sample with X-rays collected by using a reflection optical element for collecting X-rays to analyze the chemical state, electronic state, or structural state of the sample. A step of observing a spot image of condensed X-rays irradiated on the sample, and correcting the shape of the reflecting surface of the reflective optical element for X-ray condensing based on the observation result. X-ray analysis method. 2. An X-ray analysis method for irradiating a sample with X-rays collected by using a reflection optical element for collecting X-rays to analyze the chemical state, electronic state or structural state of the sample, A step of observing a beam profile of a spot image of condensed X-rays irradiated on the sample, and correcting the reflection surface shape of the reflection optical element for X-ray condensing based on the observation result. An X-ray analysis method characterized by: 3. The X-ray analysis method according to claim 1, wherein the reflection optical element for collecting X-rays is an oblique-incidence reflecting mirror. 4. The X-ray analysis method according to claim 3, wherein the oblique-incidence reflecting mirror is an axially symmetric oblique-incidence reflecting mirror. 5. The X-ray analysis method according to claim 3, wherein the oblique-incidence reflecting mirror is a non-axisymmetric oblique-incidence reflecting mirror. 6. The correction of the reflection surface shape of the reflection optical element for X-ray focusing is performed by applying an external pressure to the reflection optical element for X-ray focusing so as to adjust the reflection optical element for X-ray focusing. The X-ray analysis method according to claim 1, wherein the X-ray analysis method is performed by deforming the shape of the reflecting surface. 7. An external pressure is applied to the X-ray focusing reflective optical element locally to a selected single portion of the X-ray focusing reflective optical element. The X-ray analysis method according to claim 6. 8. The application of external pressure to the X-ray focusing reflective optical element is locally performed on each of a plurality of selected portions of the X-ray focusing reflective optical element. The X-ray analysis method according to claim 6, which is characterized in that. 9. The method according to claim 6, wherein the external pressure is applied to the axially symmetric oblique-incidence reflecting mirror at a plurality of positions in the central axis direction of the axially symmetric oblique-incidence reflecting mirror. X-ray analysis method. 10. The method according to claim 6, wherein the external pressure is applied to the axially symmetric oblique-incidence reflecting mirror at a plurality of positions in the circumferential direction of the axially symmetric oblique-incidence reflecting mirror. X-ray analysis method. 11. The application of external pressure to the reflective optical element for collecting X-rays is performed by using a pressure mechanism including a piezoelectric element. X
Line analysis method. 12. An X-ray source for generating X-rays, an X-ray focusing reflective optical element for focusing the generated X-rays from the X-ray source to form a focused X-ray beam, X-ray irradiation means for irradiating the sample to be measured with the condensed X-ray beam formed by the reflection optical element for condensing the X-rays, and the condensed X-ray beam to the sample to be measured by the X-ray irradiation means. In an X-ray analyzer comprising a particle observation means for observing particles emitted from the sample to be measured by irradiation, for observing the condensed state of the condensed X-ray beam with which the sample is irradiated. The X-ray analysis apparatus, further comprising: a condensed X-ray image observing means, and a reflecting surface shape correcting means for correcting the shape of the reflecting surface of the reflecting optical element for X-ray focusing. . 13. The focused X-ray image observing means comprises the focused X-ray.
The X-ray analysis apparatus according to claim 12, further comprising a function of measuring and displaying a beam profile of a line beam. 14. The X-ray analysis apparatus according to claim 12, wherein the reflection optical element for collecting X-rays is an oblique incidence reflection mirror. 15. The X-ray analysis apparatus according to claim 14, wherein the grazing incidence reflecting mirror is an axially symmetric grazing incidence reflecting mirror. 16. The X according to claim 14, wherein the oblique-incidence reflecting mirror is a non-axisymmetric oblique-incidence reflecting mirror.
Line analyzer. 17. The reflection surface shape correction means applies external pressure to the reflection optical element for collecting X-rays to deform the reflection surface shape of the reflection optical element for collecting X-rays. The X-ray analysis apparatus according to claim 12, wherein the X-ray analysis apparatus is of a system that corrects a surface shape. 18. The application of external pressure to the X-ray focusing reflective optical element is performed locally on a selected single portion of the X-ray focusing reflective optical element. The X-ray analysis apparatus according to claim 17, wherein: 19. The application of external pressure to the X-ray focusing reflective optical element is locally performed on each of a plurality of selected portions of the X-ray focusing reflective optical element. The X-ray analysis apparatus according to claim 17, wherein: 20. The external pressure is applied to the axially symmetric oblique-incidence reflecting mirror at a plurality of positions in the central axis direction of the axially symmetric oblique-incidence reflecting mirror. X-ray analyzer. 21. The external pressure is applied to the axially symmetric oblique-incidence reflecting mirror at a plurality of positions in the circumferential direction of the axially symmetric oblique-incidence reflecting mirror. X-ray analyzer. 22. The X-ray according to claim 17, wherein the external pressure is applied to the X-ray condensing reflective optical element by a pressure mechanism including a piezoelectric element. Analysis equipment.