JPH09197767A - Semiconductive silicone rubber roll - Google Patents
Semiconductive silicone rubber rollInfo
- Publication number
- JPH09197767A JPH09197767A JP711596A JP711596A JPH09197767A JP H09197767 A JPH09197767 A JP H09197767A JP 711596 A JP711596 A JP 711596A JP 711596 A JP711596 A JP 711596A JP H09197767 A JPH09197767 A JP H09197767A
- Authority
- JP
- Japan
- Prior art keywords
- silicone rubber
- conductive
- roll
- resistance value
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002379 silicone rubber Polymers 0.000 title claims abstract description 95
- 239000004945 silicone rubber Substances 0.000 title claims abstract description 93
- 230000002093 peripheral effect Effects 0.000 claims abstract description 20
- 239000006260 foam Substances 0.000 claims description 28
- 239000010410 layer Substances 0.000 description 49
- 229920001971 elastomer Polymers 0.000 description 41
- 239000005060 rubber Substances 0.000 description 41
- 239000003795 chemical substances by application Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 12
- 150000001451 organic peroxides Chemical class 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- 229920001875 Ebonite Polymers 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- 239000006232 furnace black Substances 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 5
- 238000005187 foaming Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 5
- 230000003014 reinforcing effect Effects 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- -1 acyl organic peroxide Chemical class 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000004088 foaming agent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000006230 acetylene black Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000011231 conductive filler Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000006235 reinforcing carbon black Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000004073 vulcanization Methods 0.000 description 2
- USVVENVKYJZFMW-ONEGZZNKSA-N (e)-carboxyiminocarbamic acid Chemical compound OC(=O)\N=N\C(O)=O USVVENVKYJZFMW-ONEGZZNKSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- 239000004604 Blowing Agent Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000004594 Masterbatch (MB) Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Dry Development In Electrophotography (AREA)
- Electrostatic Charge, Transfer And Separation In Electrography (AREA)
- Rolls And Other Rotary Bodies (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は電子写真方式を利用
した複写機、レーザ・ビーム・プリンタ（ＬＢＰ）、フ
ァクシミリ等として使用される半導電性（抵抗値が１０
2 〜１０10Ωの範囲にあるもの）シリコーンゴムロール
に係り、特に電気的特性が安定し、かつ感光体との接触
性に優れた半導電性シリコーンゴムロールに関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semi-conductive device (having a resistance value of 10) used as a copying machine utilizing an electrophotographic system, a laser beam printer (LBP), a facsimile or the like.
Relates to 2 to 10 10 Omega range Some of) the silicone rubber roll, in particular electrical characteristics relate stable and semi-conductive silicone rubber roll having excellent contact with the photosensitive member.
【０００２】[0002]
【従来の技術】従来、電子写真方式を利用した複写機、
レーザ・ビーム・プリンタ、ファクシミリ等に用いられ
る各種機器は、帯電、露光、現像、転写および定着の各
工程の繰り返しによって印刷物を得ていた。上記各工程
において、まず帯電工程では感光体の表面に均一な電荷
を付与させる、また露光工程では原稿からの反射光、レ
ーザー光、ＬＥＤ光等の照射により感光体上に静電潜像
を形成させる、さらに現像工程では帯電させたトナー等
により、静電潜像を可視化する、転写工程では可視化さ
れた像を静電的に記録紙上に転写する、また定着工程で
はトナー等を記録紙上に加熱加圧定着する、という５工
程の方法により印刷物が得られるのである。2. Description of the Related Art Conventionally, a copying machine using an electrophotographic system,
In various devices used for laser beam printers, facsimiles, etc., printed matter is obtained by repeating the steps of charging, exposing, developing, transferring and fixing. In each of the above steps, first, in the charging step, a uniform charge is applied to the surface of the photoconductor, and in the exposure step, an electrostatic latent image is formed on the photoconductor by irradiation with light reflected from the original, laser light, LED light, or the like. In addition, the electrostatic latent image is visualized by charged toner in the developing process, the visualized image is electrostatically transferred onto the recording paper in the transfer process, and the toner is heated on the recording paper in the fixing process. A printed matter can be obtained by a five-step method of fixing under pressure.
【０００３】上記各工程中、帯電工程、転写工程では、
従来、コロトロンによる非接触帯電方式が主流であった
が、電源の高電圧化、オゾン発生による環境問題等の不
利があるため、これらを解決した半導電性ロールを用い
た接触帯電方式がある。さらに現像工程では、マグネッ
トロール等による非接触現像方式、あるいは弾性を有す
る導電性ロールによる接触現像方式が利用されている。
しかし、マグネットロールを使用した場合、装置を小型
化できず、また磁性トナーを用いなければならないた
め、カラー化および高品質印字には不向きである。さら
に非磁性トナーを用いた場合は、トナーが二成分系とな
り、コストやメンテナンスの面で不利である等の問題が
あり、これらを解決できる半導電性ロールを用いた接触
現像方式が採用されている。Among the above steps, in the charging step and the transfer step,
Conventionally, a non-contact charging method using a corotron has been mainstream, but there are disadvantages such as an increase in voltage of a power source and environmental problems due to ozone generation. Therefore, there is a contact charging method using a semiconductive roll that solves these problems. Further, in the developing process, a non-contact developing method using a magnet roll or the like, or a contact developing method using an elastic conductive roll is used.
However, when a magnet roll is used, the apparatus cannot be downsized and a magnetic toner must be used, which is not suitable for colorization and high quality printing. Further, when a non-magnetic toner is used, the toner becomes a two-component system, which is disadvantageous in terms of cost and maintenance. A contact developing method using a semi-conductive roll that can solve these problems is adopted. There is.
【０００４】このように上記各工程ごとの半導電性ロー
ル（以下、単にロールとする）に対する物性的要求は、
多少異なっているが、これをまとめると以下のようにな
る。すなわち、まず帯電用のロールでは均一な帯電を得
るための表面の平滑性、また帯電効率を上げるのにニッ
プ（ロール間隙）を大きくするための低硬度が要求され
る。しかし、半導電性を発揮するために導電性のカーボ
ンブラック等の導電性フィラーを高充填することもあっ
て、低硬度化には限界がある。また装置の小型化に伴い
弾性層の薄層化が進み、同じニップを確保するにも今後
ますます低硬度化が要求される。さらに金属シャフト等
からなる導電性芯体も細くなる傾向にあり、ロールのた
わみを抑制するためにも、低硬度化が不可欠である。As described above, the physical properties required for the semiconductive roll (hereinafter, simply referred to as a roll) in each of the above steps are as follows.
It's a little different, but it's summarized as follows. That is, first, the charging roll is required to have a smooth surface so as to obtain uniform charging, and a low hardness for increasing a nip (roll gap) in order to improve charging efficiency. However, in order to exhibit semiconductivity, conductive filler such as conductive carbon black may be highly filled, so that there is a limit to lowering the hardness. In addition, with the downsizing of the equipment, the elastic layer has become thinner, and in order to secure the same nip, even lower hardness is required in the future. Further, the conductive core made of a metal shaft or the like also tends to be thin, and it is essential to reduce the hardness in order to suppress the bending of the roll.
【０００５】転写用のロールでは、転写効率を上げるの
に、ニップを大きくするための低硬度化が要求され、表
面の平滑性を犠牲にしてスポンジロールが使用される。
これは、他の２種のロールに比べると紙等の印刷媒体を
介してトナーや感光体に接するため、表面の平滑性が印
字品位に直接影響しづらいことによる。しかし、なるべ
く表面は、ある程度平滑な方がよく、スポンジのセル目
が粗くなるほど良好な転写性を発揮するための抵抗値の
範囲や外径精度の要求が厳しくなることが知られている
が、スポンジのセル目は、一般に１００μｍ以下のもの
を得るのは困難であり、スポンジでは表面の平滑性に限
界がある。最後に、現像用のロールでも、やはり現像効
率を上げるのに、ニップを大きくするための低硬度化が
要求されている。この場合、表面はある程度平滑性があ
ればよく、多少の粗さがあってもよい。これはトナーを
搬送する能力に表面粗さが関与していることによる。し
かし、その粗さの上限は、十点の平均粗さが１０μｍ以
下であり、スポンジロールとするには無理があり、また
その他の点については、帯電用のロールと同様の傾向が
ある。In order to improve the transfer efficiency, the transfer roll is required to have a low hardness for enlarging the nip, and a sponge roll is used at the sacrifice of the smoothness of the surface.
This is because, as compared with the other two types of rolls, since the toner and the photoconductor are in contact with each other via a print medium such as paper, the smoothness of the surface is hard to directly affect the print quality. However, it is known that the surface should be as smooth as possible to some extent, and the coarser the cells of the sponge are, the more severe the requirements for the range of resistance values and the accuracy of the outer diameter for exhibiting good transferability are. It is generally difficult to obtain sponges having a cell size of 100 μm or less, and sponge has a limit in the surface smoothness. Lastly, even in the case of the developing roll, in order to increase the developing efficiency, it is required to reduce the hardness to enlarge the nip. In this case, the surface may be smooth to some extent, and may have some roughness. This is because the surface roughness is involved in the ability to convey toner. However, the upper limit of the roughness is that the average roughness of ten points is 10 μm or less, which makes it unreasonable to use as a sponge roll, and in other respects, it has the same tendency as that of the charging roll.
【０００６】以上、３種類のロールに共通する物性的要
求として、低硬度化が大きな割合を占めている。硬ゴム
（非発泡）ロールは低硬度化しようとしても、導電性付
与剤の添加が必要なため、ゴム硬度４０°Ｈｓ（ＪＩＳ
Ａ）以下のロールを得るのは非常に困難である。しか
し、表面の平滑性を考えると、帯電用のロール、現像用
のロールはスポンジロール化が不可能である。また転写
用のロールに関してもスポンジロールではなく、硬ゴム
ロールで、低硬度化するのが理想的である。As a physical property requirement common to the three types of rolls, low hardness occupies a large proportion. Hard rubber (non-foamed) rolls require rubber conductivity of 40 ° Hs (JIS
A) It is very difficult to obtain the following rolls. However, considering the surface smoothness, the charging roll and the developing roll cannot be sponge rolls. Also, regarding the transfer roll, it is ideal to use a hard rubber roll instead of a sponge roll to reduce the hardness.
【０００７】このような上記問題点を解決するものとし
て、スポンジロールの上に硬ゴムを形成した２層構造の
ロールが考えられ、これにはスポンジ，硬ゴム共に半
導電性、スポンジは半導電性，硬ゴムは導電性、ス
ポンジは導電性，硬ゴムは半導電性、の３通りの組み合
わせが挙げられる。しかし、，の構成の場合、ただ
でさえロールの抵抗値をこの半導電性領域に調整するに
は、導電性カーボンブラック等の導電性フィラーの添加
量の調整が非常に難しい上に、特にこれをスポンジロー
ルにすると発泡により抵抗値の上昇をきたし、その上昇
率が発泡倍率により、大きく変動してしまい、半導電性
領域での抵抗値の制御が非常に難しくなってしまう。ま
たの構成の場合、スポンジロールの抵抗値管理は、容
易になるものの、導電性カーボンブラックを添加した導
電性シリコーンゴムではベンゾイルパーオキサイド等の
低温で分解する過酸化物加硫剤が使用できないため、付
加加硫系のものを配合することになり、その場合スコー
チによる発泡倍率の経時変化等、取扱いに微細さが要求
され、発泡倍率や硬度の不安定を誘発する、という問題
があった。As a solution to the above-mentioned problems, a roll having a two-layer structure in which hard rubber is formed on a sponge roll can be considered. In this roll, both sponge and hard rubber are semiconductive, and sponge is semiconductive. Properties, hard rubber is conductive, sponge is conductive, and hard rubber is semi-conductive. However, in the case of the constitution of and, in order to adjust the resistance value of the roll to this semiconductive region, it is very difficult to adjust the addition amount of the conductive filler such as the conductive carbon black, and in particular, this If a sponge roll is used, the resistance value increases due to foaming, and the rate of increase greatly varies depending on the foaming ratio, making it very difficult to control the resistance value in the semi-conductive region. In the case of this configuration, although the resistance value of the sponge roll can be easily controlled, a peroxide vulcanizing agent that decomposes at low temperature such as benzoyl peroxide cannot be used in the conductive silicone rubber containing conductive carbon black. However, an addition vulcanization type is to be blended, and in that case, there is a problem that fineness is required for handling, such as a change in foaming ratio due to scorch, and instability of the foaming ratio and hardness is induced.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、上記した従
来の問題点を解決するものであり、上記各工程に適用す
ることができる、表面に平滑性を有し、しかも低硬度化
ができ、なおかつ硬度、抵抗値の安定性に優れた半導電
性シリコーンゴムロール（以下、単にゴムロールとす
る）を提供する。SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems and can be applied to each of the steps described above. The surface has smoothness and the hardness can be reduced. Provided is a semiconductive silicone rubber roll (hereinafter, simply referred to as a rubber roll) having excellent hardness and stability of resistance value.
【０００９】[0009]
【課題を解決するための手段】本発明は、導電性芯体の
外周面に絶縁性シリコーンゴム発泡体層が形成され、さ
らにその外周面に導電性シリコーンゴム層が形成された
２層構造のゴムロールであって、前記絶縁性シリコーン
ゴム発泡体層の両端面に接して、かつ該絶縁性シリコー
ンゴム発泡体層よりも両端面が張り出し形成された前記
導電性シリコーンゴム層の張り出し部の内周面と前記導
電性芯体の外周面との間に、一対のリング状の半導電性
シリコーンゴムが一体に形成されてなるゴムロールを要
旨とするものである。SUMMARY OF THE INVENTION The present invention has a two-layer structure in which an insulating silicone rubber foam layer is formed on the outer peripheral surface of a conductive core, and a conductive silicone rubber layer is further formed on the outer peripheral surface thereof. A rubber roll, which is in contact with both end faces of the insulating silicone rubber foam layer and has both end faces protruding beyond the insulating silicone rubber foam layer, and the inner circumference of the protruding portion of the conductive silicone rubber layer. A gist of the present invention is a rubber roll in which a pair of ring-shaped semi-conductive silicone rubbers are integrally formed between a surface and an outer peripheral surface of the conductive core body.
【００１０】本発明のゴムロールに用いられる導電性芯
体は、いわゆるシャフトと呼ばれる部材であり、導電性
で、かつ種々の使用条件に耐えうる機械強度を持ってい
ればプラスチック、セラミック等、特に制限されるもの
ではないが、特にアルミニウム、ステンレス、ニッケル
メッキ鉄等のような金属シャフトが好適に用いられる。The conductive core body used in the rubber roll of the present invention is a member called a shaft, and if it is conductive and has mechanical strength capable of withstanding various usage conditions, it is particularly limited to plastics, ceramics and the like. However, a metal shaft made of aluminum, stainless steel, nickel-plated iron or the like is preferably used.
【００１１】次に、上記導電性芯体の外周面に形成され
る絶縁性シリコーンゴム発泡体層は、その材質としてビ
ニル基含有ジメチルポリシロキサン生ゴムと補強性シリ
カ充填剤からなるシリコーンゴムコンパウンドに有機過
酸化物加硫剤、有機発泡剤を添加したものが好適に用い
られる。有機過酸化物は、比較的低温で分解するアシル
系有機過酸化物と、比較的高温で分解する非アシル系有
機過酸化物とを適宜組み合わせて使用するのがスポンジ
ゴム硬度を制御する上で望ましい。アシル系有機過酸化
物としては、例えばベンゾイルパーオキサイド、ビス−
２，４−ジクロロベンゾイルパーオキサイド等が挙げら
れ、非アシル系有機過酸化物としては、例えば、ジクミ
ルパーオキサイド、ジ−ｔ−ブチルパーオキサイド、
２，５−ジメチル−２，５−ビス（ｔ−ブチルパーオキ
シ）ヘキシル等が挙げられる。有機発泡剤としては、ア
ゾジカルボン酸アミド（ＡＤＣＡ）、アゾビスイソブチ
ロニトリル（ＡＩＢＮ）等が好適に用いられ、これら有
機発泡剤の分解温度は、通常１００℃〜２００℃程度の
範囲であり、上記した低温分解の有機過酸化物と高温分
解の有機過酸化物の分解温度の範囲内にあり、発泡が安
定して行えるとともに、発泡倍率の制御も容易である。Next, the insulating silicone rubber foam layer formed on the outer peripheral surface of the conductive core is formed by adding a vinyl group-containing dimethylpolysiloxane raw rubber and a reinforcing silica filler to the silicone rubber compound as an organic material. Those to which a peroxide vulcanizing agent and an organic foaming agent have been added are preferably used. In order to control the sponge rubber hardness, it is preferable to use an organic peroxide in combination with an acyl-based organic peroxide that decomposes at a relatively low temperature and a non-acyl-based organic peroxide that decomposes at a relatively high temperature. desirable. Examples of the acyl-based organic peroxide include benzoyl peroxide and bis-
2,4-dichlorobenzoyl peroxide and the like can be mentioned. Examples of the non-acyl organic peroxide include dicumyl peroxide, di-t-butyl peroxide, and the like.
2,5-dimethyl-2,5-bis (t-butylperoxy) hexyl and the like can be mentioned. As the organic foaming agent, azodicarboxylic acid amide (ADCA), azobisisobutyronitrile (AIBN) and the like are preferably used, and the decomposition temperature of these organic foaming agents is usually in the range of about 100 ° C to 200 ° C. Within the range of the decomposition temperature of the above-mentioned low-temperature decomposing organic peroxide and high-temperature decomposing organic peroxide, the foaming can be performed stably and the expansion ratio can be easily controlled.
【００１２】本発明のゴムロールは、絶縁性シリコーン
ゴム発泡体層が直接、被接触物に接触するわけではない
ので、機械強度等はあまり関係ないが、得られるゴムロ
ールの硬度を４０°Ｈｓ（ＪＩＳ Ａ）以下とするため
には、この絶縁性シリコーンゴム発泡体層の硬度を４０
°Ｈｓ（アスカーＣ）以下となるように配合するのがよ
い。硬度を上げるには、ビニル基含有ジメチルポリシロ
キサン生ゴムのビニル基密度を上げる、補強性シリカ充
填剤の添加量を増やす、低温分解の有機過酸化物の量を
増やし発泡倍率を下げる、有機発泡剤の添加量を減らす
等の手段が挙げられ、また硬度を下げるには、前記硬度
を上げる場合とは逆の処方にすればよい。この配合物を
導電性芯体の外周面に設け、加熱することにより発泡加
硫させてシリコーンゴム発泡体層が得られる。In the rubber roll of the present invention, since the insulating silicone rubber foam layer does not directly contact the object to be contacted, mechanical strength or the like does not matter so much, but the hardness of the obtained rubber roll is 40 ° Hs (JIS. A) The hardness of the insulating silicone rubber foam layer should be 40
It is preferable to mix it so that it is not more than ° Hs (Asker C). To increase the hardness, increase the vinyl group density of vinyl group-containing dimethylpolysiloxane raw rubber, increase the amount of reinforcing silica filler added, increase the amount of low-temperature-decomposable organic peroxide, and reduce the expansion ratio. And the like. In order to lower the hardness, the formulation may be opposite to that for increasing the hardness. This compound is provided on the outer peripheral surface of the conductive core and is foamed and vulcanized by heating to obtain a silicone rubber foam layer.
【００１３】絶縁性シリコーンゴム発泡体層のさらに外
周面に形成される導電性シリコーンゴム層の材質として
は、ビニル基含有ジメチルポリシロキサン生ゴムと補強
性シリカ充填剤からなるシリコーンゴムコンパウンドに
導電性付与剤を添加したものをベースとしたものが挙げ
られる。この導電性付与剤としては、導電性アセチレン
ブラック、導電性ファーネスブラック、導電性サーマル
ブラック等の導電性カーボンブラック、グラファイト、
あるいは酸化錫、酸化チタン、酸化亜鉛等の金属酸化物
やその表面またはドープ等により内部を導電化処理した
もの、あるいはアルミニウム、ニッケル、錫、銅等の金
属微粒子、あるいは絶縁性微粒子または繊維状物の表面
または内部を導電化処理したもの等が例示され、これら
はその単独またはそれらの組み合わせで使用すればよ
い。なお、電子写真装置に用いられ、感光体ドラムに接
触させて使用する場合、感光体をキズ付けたり摩耗させ
たりすることを防止する観点からは、導電性カーボンブ
ラック、特には導電性ファーネスブラック、導電性アセ
チレンブラック等の高い導電性を有するものが、少ない
添加量で目的とするレベルの導電性にすることができる
のでより好ましい。As a material for the conductive silicone rubber layer formed on the outer peripheral surface of the insulating silicone rubber foam layer, a silicone rubber compound composed of vinyl group-containing dimethylpolysiloxane raw rubber and a reinforcing silica filler is provided with conductivity. Examples include those based on those to which agents have been added. As the conductivity-imparting agent, conductive acetylene black, conductive furnace black, conductive carbon black such as conductive thermal black, graphite,
Alternatively, metal oxides such as tin oxide, titanium oxide, and zinc oxide, and those whose surface or the inside is made conductive by doping or the like, metal fine particles such as aluminum, nickel, tin, and copper, or insulating fine particles or fibrous substances Examples thereof include those whose surface or inside is subjected to a conductive treatment, and these may be used alone or in combination. Incidentally, used in the electrophotographic apparatus, when used in contact with the photoconductor drum, from the viewpoint of preventing scratching or abrasion of the photoconductor, conductive carbon black, particularly conductive furnace black, A conductive material such as acetylene black having high conductivity is more preferable because it can achieve a target level of conductivity with a small amount of addition.
【００１４】導電性カーボンブラックの添加量は、シリ
コーンゴムコンパウンド１００重量部に対して、３〜１
０重量部の範囲にするのが好ましく、３重量部より少な
いと表層のシリコーンゴムの抵抗値が十分に導電性領域
に入らず、半導電性領域となってしまい、導電性カーボ
ンブラックの僅かな添加量の変動でも大きく抵抗値が変
動してしまい、本発明の課題の１つでもある抵抗値の安
定に関し不利となり、また１０重量部を超えると抵抗値
は十分導電性領域で安定するが、高充填によりゴム硬度
が上がってしまい、本発明の課題である低硬度化に関し
不利となる。The amount of conductive carbon black added is 3 to 1 with respect to 100 parts by weight of the silicone rubber compound.
The content is preferably in the range of 0 parts by weight, and when it is less than 3 parts by weight, the resistance value of the silicone rubber in the surface layer does not sufficiently enter the conductive region and becomes a semi-conductive region, so that a slight amount of the conductive carbon black is present. Even if the amount of addition changes, the resistance value greatly changes, which is disadvantageous in terms of stability of the resistance value which is one of the problems of the present invention, and when it exceeds 10 parts by weight, the resistance value is sufficiently stable in the conductive region, The high filling increases the rubber hardness, which is disadvantageous with respect to the low hardness which is the subject of the present invention.
【００１５】また上記導電性シリコーンゴム層のゴム硬
度は５０°Ｈｓ（ＪＩＳ Ａ）以下とするのが良い。５
０°Ｈｓ（ＪＩＳ Ａ）を超えると得られるロールの低
硬度化に不利になる。これは導電性付与剤の添加量を３
〜１０重量部とするとともに、補強性シリカ、補強性カ
ーボンブラック（このものは添加しても導電性を付与す
るものではない）等の充填剤の添加量を５〜２０重量部
とすることにより調整される。補強性充填剤の添加量が
５重量部より少ないと感光体ドラムに接触させて使用す
る場合、表面が磨滅してしまいやすいという不利があ
り、２０重量部を超えると十分な導電性とするに足りる
導電性付与剤を添加したときに、ゴム硬度が５０°Ｈｓ
を超えてしまうおそれがある。この導電性シリコーンゴ
ム層に用いられる加硫剤としては、導電性カーボンブラ
ックによる加硫阻害をうけるアシル系有機過酸化物以外
の非アシル系有機過酸化物、あるいは１分子中に珪素原
子と結合する水素原子を２個以上有するオルガノハイド
ロジェンポリシロキサンをビニル基含有ジメチルポリシ
ロキサン生ゴム１００重量部に対して１〜１０重量部
と、触媒有効量の白金系触媒とを添加して付加加硫型と
するのが好ましい。このオルガノハイドロジェンポリシ
ロキサンの添加量は、１重量部より少ないと十分なゴム
弾性を得られず、１０重量部より多くてもゴム弾性ある
いは強度は向上せず経済的でなく、場合によってはそれ
ら物性値の低下をきたす虞れがある。また常温でのスコ
ーチを防止する目的で、この他に反応制御剤を適宜添加
してもよい。The rubber hardness of the conductive silicone rubber layer is preferably 50 ° Hs (JIS A) or less. 5
If it exceeds 0 ° Hs (JIS A), it is disadvantageous in reducing the hardness of the roll obtained. This is because the amount of conductivity-imparting agent added is 3
10 to 10 parts by weight, and 5 to 20 parts by weight of the filler such as reinforcing silica and reinforcing carbon black (which does not impart conductivity even if added). Adjusted. If the amount of the reinforcing filler added is less than 5 parts by weight, there is a disadvantage that the surface is apt to be worn away when used in contact with the photoconductor drum, and if it exceeds 20 parts by weight, sufficient conductivity is obtained. Rubber hardness of 50 ° Hs when sufficient conductivity-imparting agent is added
May exceed. The vulcanizing agent used in this conductive silicone rubber layer is a non-acyl organic peroxide other than an acyl organic peroxide that is vulcanized by conductive carbon black, or a silicon atom in a molecule. Addition vulcanization type by adding 1 to 10 parts by weight of an organohydrogenpolysiloxane having two or more hydrogen atoms to 100 parts by weight of vinyl group-containing dimethylpolysiloxane raw rubber, and a catalytically effective amount of a platinum-based catalyst. Is preferred. If the addition amount of this organohydrogenpolysiloxane is less than 1 part by weight, sufficient rubber elasticity cannot be obtained, and if it is more than 10 parts by weight, rubber elasticity or strength is not improved and it is not economical. There is a possibility that the physical property values may deteriorate. Further, in order to prevent scorch at room temperature, a reaction control agent may be appropriately added in addition to the above.
【００１６】このような組成からなる導電性シリコーン
ゴム層は、前記絶縁性シリコーンゴム発泡体層より、そ
の両端が僅かに張り出して形成されている。この張り出
し部において、導電性シリコーンゴム層の内周面と前記
導電性芯体の外周面との間で、かつ上記絶縁性シリコー
ンゴム発泡体層の両側には、一対のリング状の半導電性
シリコーンゴムが一体に形成されている。このリング状
の半導電性シリコーンゴムの厚さは、５ｍｍ以上あれ
ば、より安定した抵抗値を得ることができ、また導電性
シリコーンゴム層を研磨するときに強度不足から引きち
ぎられてしまったりする心配がなくなり、この厚さが１
０ｍｍを超えると、通常の電子写真方式の現像装置に用
いられるロールは感光体ドラムより両端が約１０ｍｍず
つはみ出して使用されているが、このリング状の半導電
性シリコーンゴムが内部に存在するところが感光体ドラ
ムに接触してしまい、その両端部で充分なニップ幅が確
保できなくなるおそれがあるため、通常、厚さ５〜１０
ｍｍとされる。また、その材質としては、ビニル基含有
ジメチルポリシロキサン生ゴムと補強性シリカ、補強性
カーボンブラック等の充填剤からなるシリコーンゴムコ
ンパウンドに、導電性シリコーゴム層に例示したものと
同様の導電性付与剤を添加したものをベースとしたもの
が挙げられるが、このリング状の半導電性シリコーンゴ
ムは直接感光体に接触しないので、添加する導電性付与
剤は、導電性カーボンブラック以外のものを使用するこ
とができる。添加量はリング状の半導電性シリコーンゴ
ムを半導電性（１０2 〜１０10Ω）とするのに適した量
とすればよく、例えば導電性カーボンブラックの場合、
シリコーンゴムコンパウンド１００重量部に対し、１〜
３重量部程度である。しかし、抵抗値を半導電性領域で
制御するのは非常に難しく、後述するように導電性付与
剤の高濃度マスターバッチと絶縁材により微調整しなが
ら製造するのが望ましい。The conductive silicone rubber layer having such a composition is formed such that both ends thereof slightly project from the insulating silicone rubber foam layer. In this overhanging portion, a pair of ring-shaped semi-conductive materials are provided between the inner peripheral surface of the conductive silicone rubber layer and the outer peripheral surface of the conductive core body and on both sides of the insulating silicone rubber foam layer. Silicone rubber is integrally formed. If the thickness of this ring-shaped semi-conductive silicone rubber is 5 mm or more, a more stable resistance value can be obtained, and when the conductive silicone rubber layer is polished, it may be torn off due to insufficient strength. Don't worry, this thickness is 1
If it exceeds 0 mm, the roll used in a general electrophotographic developing device is used with both ends protruding from the photosensitive drum by about 10 mm, but this ring-shaped semiconductive silicone rubber is present inside. Since the photosensitive drum may come into contact with the photosensitive drum and a sufficient nip width may not be ensured at both ends thereof, the thickness is usually 5 to 10
mm. Further, as the material thereof, a silicone rubber compound composed of a vinyl group-containing dimethylpolysiloxane raw rubber and a reinforcing silica, a filler such as a reinforcing carbon black, and a conductivity imparting agent similar to those exemplified in the conductive silicone rubber layer are used. Although the one based on the added one is mentioned, this ring-shaped semi-conductive silicone rubber does not come into direct contact with the photoreceptor, so the conductivity imparting agent to be added should be something other than conductive carbon black. You can The addition amount may be an amount suitable for making the ring-shaped semiconductive silicone rubber semiconductive (10 2 to 10 10 Ω). For example, in the case of conductive carbon black,
1 to 100 parts by weight of silicone rubber compound
It is about 3 parts by weight. However, it is very difficult to control the resistance value in the semi-conductive region, and it is desirable to manufacture it while finely adjusting it with a high-concentration master batch of a conductivity-imparting agent and an insulating material, as described later.
【００１７】[0017]
【発明の実施の形態】次に、本発明の実施の形態につい
て、限定ではなく単なる例示として添付図面を基に説明
する。図１は、本発明のゴムロールの一例を示す断面説
明図であり、ゴムロール１は、このゴムロール１の中心
に位置し、通常、金属シャフトからなる導電性芯体２、
この外周面に設けられた絶縁性シリコーンゴム発泡体層
３、これよりもその両端が僅かに張り出して形成されて
いる導電性シリコーンゴム層４、張り出し部において、
導電性シリコーンゴム層４の内周面と導電性芯体２の外
周面との間で、かつ上記絶縁性シリコーンゴム発泡体層
３の両側に設けられた一体のリング状の半導電性シリコ
ーンゴム板（以下、単にゴム板とする）５とから構成さ
れている。BEST MODE FOR CARRYING OUT THE INVENTION Next, embodiments of the present invention will be described based on the accompanying drawings by way of illustration only and not by way of limitation. FIG. 1 is a cross-sectional explanatory view showing an example of the rubber roll of the present invention. The rubber roll 1 is located at the center of the rubber roll 1 and is usually a conductive core body 2 made of a metal shaft.
The insulating silicone rubber foam layer 3 provided on the outer peripheral surface, the conductive silicone rubber layer 4 formed by slightly projecting both ends thereof from the insulating silicone rubber foam layer 4, and the projecting portion,
An integral ring-shaped semiconductive silicone rubber provided between the inner peripheral surface of the conductive silicone rubber layer 4 and the outer peripheral surface of the conductive core body 2 and on both sides of the insulating silicone rubber foam layer 3. And a plate (hereinafter, simply referred to as a rubber plate) 5.
【００１８】このゴムロールの製造方法は、接着性を改
良する目的でプライマーを塗布した導電性芯体の外周面
にまず未発泡、未硬化の絶縁性シリコーンゴム発泡体用
組成物を押出しにより一体成形した後、加熱硬化させて
行うが、この加熱手段としては、熱風乾燥炉、赤外線加
熱炉、高周波（ＵＨＦ）加熱炉等の加熱装置を用いるこ
とができる。また予めチューブ状に押出しを行ない、上
記加熱手段によってスポンジチューブとした後、導電性
芯体を圧入してもよい。この場合は導電性芯体とスポン
ジチューブとの接着のために、予めＲＴＶ等の接着剤を
導電性芯体の外周面および／またはスポンジチューブ内
周面に塗布するのが好ましい。In this method for producing a rubber roll, an unfoamed and uncured insulating silicone rubber foam composition is first integrally molded on the outer peripheral surface of a conductive core body coated with a primer for the purpose of improving adhesion. After that, it is cured by heating, and as the heating means, a heating device such as a hot air drying furnace, an infrared heating furnace, a high frequency (UHF) heating furnace or the like can be used. Alternatively, it may be extruded into a tube shape in advance, a sponge tube may be formed by the above heating means, and then the conductive core may be press-fitted. In this case, in order to bond the conductive core and the sponge tube, it is preferable to previously apply an adhesive such as RTV to the outer peripheral surface of the conductive core and / or the inner peripheral surface of the sponge tube.
【００１９】次に、前記絶縁性シリコーンゴム発泡体層
の両端に接触して形成されるゴム板は、予め半導電性シ
リコーンゴム組成物を、押出し、プレス等によりチュー
ブ状に成形し、これを所定厚さの板状にカットして使用
するが、寸法精度を高くするには、チューブを導電性芯
体と同じ外径を有する芯体に圧入した後、研磨するのが
よい。ゴム板の抵抗値は、所定の半導電性シリコーンゴ
ム組成物でチューブ状に成形を行ない、テスター等によ
り抵抗値を測定し、この抵抗値が所望の値より高い場合
には、原料に導電性付与剤を５０〜１００％多く添加し
た導電性シリコーンゴム組成物を添加し、この抵抗値が
所望の値より低い場合には、導電性付与剤を含有してい
ないシリコーンゴムコンパウンドを添加する。なおこれ
らの添加量は予め、抵抗値が高い場合と低い場合につい
て検量線を作成し、これに従って決定すればよい。Next, the rubber plate formed by contacting both ends of the insulating silicone rubber foam layer is formed by extruding a semiconductive silicone rubber composition in advance and molding it into a tube shape by pressing or the like. It is used by cutting it into a plate having a predetermined thickness, but in order to improve the dimensional accuracy, it is preferable to press-fit the tube into a core having the same outer diameter as the conductive core and then polish it. For the resistance value of the rubber plate, a predetermined semiconductive silicone rubber composition is used to form a tube, and the resistance value is measured with a tester or the like. If this resistance value is higher than the desired value, the material is made conductive. A conductive silicone rubber composition containing 50 to 100% more of the imparting agent is added. When the resistance value is lower than a desired value, a silicone rubber compound containing no conductivity imparting agent is added. It should be noted that the addition amount of these may be determined in advance by preparing a calibration curve for a case where the resistance value is high and a case where the resistance value is low.
【００２０】このようにして所望の抵抗値に調整された
ゴム板は、導電性芯体に圧入して用いる場合には、内径
は導電性芯体より１〜２ｍｍ程度小さくすると、回転ト
ルクの点で有利である。また外径は導電性芯体に圧入し
た状態で、所望の最終製品外径より導電性シリコーンゴ
ム層の厚さを差し引いた値とすればよい。また外径精度
を高くするには、予め研磨してもよいし、チューブをリ
ング状にカットしたのち圧入後に絶縁性シリコーンゴム
発泡体層とともに研磨するのがさらに好ましい。この段
階で外径は、最終製品外径より導電性シリコーンゴム層
の厚さを差し引いた値になっている。When the rubber plate adjusted to have a desired resistance value as described above is used by being press-fitted into the conductive core, if the inner diameter is made smaller than the conductive core by 1 to 2 mm, the rotational torque is reduced. Is advantageous. Further, the outer diameter may be a value obtained by subtracting the thickness of the conductive silicone rubber layer from the desired outer diameter of the final product in a state of being press-fitted into the conductive core body. Further, in order to improve the accuracy of the outer diameter, it may be ground in advance, or it is more preferable to cut the tube into a ring shape and then press-fit and then grind it together with the insulating silicone rubber foam layer. At this stage, the outer diameter has a value obtained by subtracting the thickness of the conductive silicone rubber layer from the outer diameter of the final product.
【００２１】次に、このようにして得られた導電性芯体
と絶縁性シリコーンゴム発泡体層およびゴム板の一体物
の外周面に、クロスヘッドを用いた押出し機により未加
硫の導電性シリコーンゴム層を最外層となるように押出
し、これを前述した加熱装置を用い、加熱加硫して導電
性シリコーンゴム層を形成する。この導電性シリコーン
ゴム層は表面を研磨することにより外径値を所望の値に
することもでき、表面の粗さも所望の値にすることもで
きるが、この層の厚さは０．５〜２ｍｍの範囲とするの
が好適であり、０．５ｍｍ未満では表面が内層の絶縁性
シリコーンゴム発泡体層のセル目の影響を受けて平滑性
が悪くなりやすく、また２ｍｍを超えると低硬度化に不
利となりやすい。さらに、感光体の汚染を防止するため
に、この導電性シリコーンゴム層の表面にウレタン、フ
ッ素、ナイロン樹脂等をコーティングしてもよい。Next, the unvulcanized conductive material is formed on the outer peripheral surface of the integrally formed conductive core, insulating silicone rubber foam layer and rubber plate thus obtained by an extruder using a crosshead. The silicone rubber layer is extruded to be the outermost layer, and this is heated and vulcanized by using the above-mentioned heating device to form a conductive silicone rubber layer. The surface of the conductive silicone rubber layer can be polished to a desired outer diameter value and the surface roughness can be adjusted to a desired value. A range of 2 mm is preferable, and if it is less than 0.5 mm, the surface is likely to be deteriorated in smoothness due to the influence of the cells of the insulating silicone rubber foam layer of the inner layer, and if it exceeds 2 mm, the hardness is lowered. Is prone to disadvantages. Further, in order to prevent the contamination of the photoreceptor, the surface of this conductive silicone rubber layer may be coated with urethane, fluorine, nylon resin or the like.
【００２２】本発明のゴムロールは、上記したように、
表面が非発泡シリコーンゴムであるため平滑性に優れて
おり、その内層が絶縁性シリコーンゴム発泡体層である
ため低硬度化が可能である。さらに、導電性スポンジの
場合は発泡倍率により抵抗値が変動してしまうため、安
定した抵抗値を得られないのに対し、本願発明では内層
が絶縁性シリコーンゴム発泡体層であるため抵抗値の調
整が必要なく、非発泡のゴム板（リング状の半導電性シ
リコーンゴム）の抵抗値、またはその厚さを調整すれば
よいのであるから極めて容易にこのような問題点を解決
できる。The rubber roll of the present invention, as described above,
Since the surface is a non-foamed silicone rubber, it has excellent smoothness, and since the inner layer is an insulating silicone rubber foam layer, the hardness can be lowered. Further, in the case of a conductive sponge, the resistance value varies depending on the expansion ratio, so that a stable resistance value cannot be obtained, whereas in the present invention, since the inner layer is an insulating silicone rubber foam layer, the resistance value Since adjustment is not required and the resistance value of the non-foamed rubber plate (ring-shaped semiconductive silicone rubber) or its thickness may be adjusted, such a problem can be solved very easily.
【００２３】[0023]
（実施例１〜１２）導電性芯体は、予め表面をプライマ
ー処理した直径１０ｍｍ、長さ２６０ｍｍのステンレス
製芯体を使用する。絶縁性シリコーンゴム発泡体は、シ
リコーンゴムコンパウンドＫＥ１５１Ｕ（信越化学工業
社製、商品名）１００重量部に、低温分解型の有機過酸
化物加硫剤Ｃ−１（信越化学工業社製、商品名）を夫々
０．３、０．５、０．７重量部、高温分解型の有機過酸
化物加硫剤Ｃ−３（信越化学工業社製、商品名）３重量
部、有機発泡剤ＫＥＰ−１３（信越化学工業社製、商品
名）２重量部を２本ロールにてよく混合し、押出し機を
使用してステンレス製芯体上に直径１５ｍｍに一体分出
しした。その後、２５０℃、３０分の条件で熱風加熱炉
にて加熱加硫発泡させた。これを２００℃、４時間で後
処理した後、円筒研削盤にて研磨し、外径１８．５、１
９．０、１９．５ｍｍとした。絶縁性シリコーンゴム発
泡体層の端部はカッターでサイドカットし平坦に仕上げ
た。(Examples 1 to 12) As the conductive core body, a stainless steel core body having a diameter of 10 mm and a length of 260 mm, the surface of which is preliminarily treated with a primer, is used. The insulating silicone rubber foam comprises 100 parts by weight of silicone rubber compound KE151U (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.) and low-temperature decomposable organic peroxide vulcanizing agent C-1 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.). ) Respectively 0.3, 0.5, 0.7 parts by weight, high temperature decomposition type organic peroxide vulcanizing agent C-3 (manufactured by Shin-Etsu Chemical Co., Ltd., trade name) 3 parts by weight, organic blowing agent KEP- 2 parts by weight of 13 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.) were well mixed with a two-roll mill, and were integrally dispensed onto a stainless steel core body with a diameter of 15 mm using an extruder. Then, it was heated and vulcanized and foamed in a hot air heating furnace under the conditions of 250 ° C. and 30 minutes. This was post-treated at 200 ° C. for 4 hours and then polished with a cylindrical grinder to give an outer diameter of 18.5, 1
It was set to 9.0 and 19.5 mm. The end of the insulating silicone rubber foam layer was side-cut with a cutter and finished flat.
【００２４】ゴム板の調整は、まずシリコーンゴムコン
パウンドＫＥ１５１Ｕ（同前）１００重量部に、導電性
ファーネスブラック３重量部を加えて導電性シリコーン
ゴムコンパウンドを調整する。これに有機過酸化物加硫
剤Ｃ−３（同前）２重量部、オルガノハイドロジェンポ
リシロキサン３重量部、触媒としてＣＡＴ−ＰＬ−２
（信越化学工業社製、商品名）０．１重量部、反応制御
剤Ｒ−１５３Ａ（信越化学工業社製、商品名）を１重量
部加え、押出し機で外径２０．５ｍｍ、内径９ｍｍのチ
ューブを押出しし、３００℃の熱風加熱炉で加熱硬化さ
せた。The rubber plate is prepared by first adding 100 parts by weight of the silicone rubber compound KE151U (same as above) with 3 parts by weight of the conductive furnace black to adjust the conductive silicone rubber compound. 2 parts by weight of an organic peroxide vulcanizing agent C-3 (same as above), 3 parts by weight of organohydrogenpolysiloxane, and CAT-PL-2 as a catalyst.
(Shin-Etsu Chemical Co., Ltd., trade name) 0.1 parts by weight, and reaction control agent R-153A (Shin-Etsu Chemical Co., Ltd., trade name) 1 part by weight were added, and the extruder had an outer diameter of 20.5 mm and an inner diameter of 9 mm. The tube was extruded and heat-cured in a hot air heating oven at 300 ° C.
【００２５】これを１０００ｍｍほどの長さに押し出し
た時に一度押し出し機を停止し、１００ｍｍの長さにカ
ットし、直径１０ｍｍ、長さ１４０ｍｍのステンレスシ
ャフトに圧入し、図２に示す方法で抵抗値を測定した。
図２に示す方法は、抵抗値被測定物６の両端部に突出し
た導電性芯体２に１００ｇずつの荷重をかけ、抵抗値被
測定物６と、金属等の導電性板状物からなる電極８を圧
接し、導電性芯体２と電極８との間の抵抗値、すなわち
抵抗値被測定物６の抵抗値を測定できるように抵抗測定
器７を接続してなる装置を用いる方法である。また環境
条件により測定値が変動するので、２０℃、５０％ＲＨ
に１０分間置いてから測定する。抵抗値が低い場合はＫ
Ｅ１５１Ｕ（同前）を残った原料に添加し抵抗値を上げ
る。抵抗値が高い場合は予めＫＥ１５１Ｕ（同前）に導
電性ファーネスブラック１０重量部を添加した抵抗値調
整用導電性シリコーンゴムコンパウンドを残った原料に
添加し抵抗値を下げる。When this was extruded to a length of about 1000 mm, the extruder was once stopped, cut to a length of 100 mm, pressed into a stainless steel shaft having a diameter of 10 mm and a length of 140 mm, and the resistance value was measured by the method shown in FIG. Was measured.
In the method shown in FIG. 2, a load of 100 g is applied to each of the conductive core bodies 2 protruding from both ends of the resistance value measured object 6 to form the resistance value measured object 6 and a conductive plate-like object such as a metal. A method using a device in which a resistance measuring device 7 is connected so that the resistance value between the conductive core body 2 and the electrode 8, that is, the resistance value of the DUT 6 can be measured by pressing the electrode 8 is there. In addition, the measured value fluctuates depending on environmental conditions, so 20 ° C and 50% RH
Let stand for 10 minutes before measuring. K when resistance is low
E151U (same as above) is added to the remaining raw material to increase the resistance value. If the resistance value is high, the resistance value-adjusting conductive silicone rubber compound prepared by adding 10 parts by weight of conductive furnace black to KE151U (same as above) is added to the remaining raw material to lower the resistance value.
【００２６】このような方法で抵抗値を８×１０4 〜
１．５×１０5 Ωの範囲、すなわち約１×１０5 Ωにな
るように調整し、その後、連続的に押出し成形した。次
に、これを２００℃、４時間で後処理した後、１００ｍ
ｍの長さにカットし、直径１０ｍｍのステンレスシャフ
トに圧入した後、上記絶縁性シリコーンゴム発泡体層と
外径値を合わせるため円筒研削盤にて研磨し、外径１
８．５、１９．０、１９．５ｍｍとした。同様にして、
図２に示す方法で抵抗値を測定した時、８×１０3 〜
１．５×１０4 Ωの範囲、すなわち約１×１０4 Ωとな
るような半導電性シリコーンゴムを作製した。これを厚
さ５ｍｍにカットしてゴム板とした。With such a method, the resistance value is 8 × 10 4 to
It was adjusted to be in the range of 1.5 × 10 5 Ω, that is, about 1 × 10 5 Ω, and then continuously extruded. Next, after post-treatment of this at 200 ° C. for 4 hours, 100 m
After being cut into a length of m and press-fitted onto a stainless steel shaft having a diameter of 10 mm, the outer diameter of the insulating silicone rubber foam layer was polished by a cylindrical grinder to match the outer diameter with an outer diameter of 1
It was set to 8.5, 19.0, and 19.5 mm. Similarly,
When the resistance value is measured by the method shown in FIG. 2, 8 × 10 3 to
A semiconductive silicone rubber having a range of 1.5 × 10 4 Ω, that is, about 1 × 10 4 Ω was prepared. This was cut into a rubber plate having a thickness of 5 mm.
【００２７】上記した絶縁性シリコーンゴム発泡体層の
両端部に、このゴム板が接触するように、上記ステンレ
ス製芯体を圧入し、次いでこれらの上にクロスヘッドを
備えた押出し機によって、ＫＥ１５１Ｕ（同前）とビニ
ル基含有ジメチルポリシロキサン生ゴムを夫々１：０、
２：１、１：１の比率で混合したものを１００重量部と
し、導電性ファーネスブラック１０重量部を添加し、こ
れに有機過酸化物加硫剤Ｃ−３（同前）２重量部、オル
ガノハイドロジェンポリシロキサン３重量部、触媒とし
てＣＡＴ−ＰＬ−２（同前）０．１重量部、反応制御剤
Ｒ−１５３Ａ（同前）１重量部を加え、２本ロールで混
練し組成物からなる導電性シリコーンゴム層を、外径２
１ｍｍになるように設けた。このようにしてできた、上
記外径２１ｍｍのロールを円筒研削盤で研磨し、外径２
０ｍｍに仕上げた。その後端部のバリを処理して、各種
ゴムロールを得た。上記実施例中の各構成の組合せを表
１に示した。The stainless steel core is press-fitted into both ends of the above-mentioned insulating silicone rubber foam layer so that the rubber plate comes into contact, and then an KE151U extruder is equipped with a crosshead. (Same as above) and vinyl group-containing dimethylpolysiloxane raw rubber 1: 0 respectively,
Mixing in a ratio of 2: 1, 1: 1 was 100 parts by weight, 10 parts by weight of conductive furnace black was added, and 2 parts by weight of an organic peroxide vulcanizing agent C-3 (same as above), 3 parts by weight of organohydrogenpolysiloxane, 0.1 part by weight of CAT-PL-2 (same as above) as a catalyst, and 1 part by weight of reaction control agent R-153A (same as above) were added, and the mixture was kneaded with a two-roll mill. A conductive silicone rubber layer consisting of
It was provided so as to be 1 mm. The roll having an outer diameter of 21 mm thus produced was polished by a cylindrical grinder to give an outer diameter of 2 mm.
Finished to 0 mm. After that, burrs at the ends were processed to obtain various rubber rolls. Table 1 shows the combinations of the respective configurations in the above-mentioned examples.
【００２８】[0028]
【表１】 上記した表１中、実施例６の構成で、ゴム板の抵抗値を
１×１０4 Ω（図２に示した測定方法による）としたも
のも作製し、実施例１２とした。それぞれのゴムロール
に対して硬度（ＪＩＳ Ａ）、平均抵抗値、１０本成形
したときの平均抵抗値の最大値／最小値、を表２に示し
た。ただし、抵抗値の測定方法は、図２に示す方法によ
り角度を９０°ずつ回転させて測定し、平均抵抗値はこ
の４点のデータの平均値とした。[Table 1] In Example 12 in Table 1 described above, a rubber plate having a resistance value of 1 × 10 4 Ω (according to the measuring method shown in FIG. 2) was also prepared, and was set as Example 12. Table 2 shows the hardness (JIS A), the average resistance value, and the maximum / minimum value of the average resistance value after molding 10 rolls for each rubber roll. However, the resistance value was measured by rotating the angle by 90 ° by the method shown in FIG. 2, and the average resistance value was the average value of the data at these four points.
【００２９】[0029]
【表２】 上記表２の結果から明らかなように硬度が４０°Ｈｓ以
下で任意に変更可能であり、なおかつ硬度を変えても抵
抗値は一定の物が得られ、１０本成形したときのその最
大値と最小値の幅も１．２倍以下となり、好ましい結果
が得られた。[Table 2] As is clear from the results in Table 2 above, the hardness can be arbitrarily changed at 40 ° Hs or less, and a constant resistance value can be obtained even if the hardness is changed. The width of the minimum value was 1.2 times or less, and favorable results were obtained.
【００３０】（比較例）比較例として、上記実施例中の
半導電性シリコーンゴムに替えて、導電性シリコーンゴ
ムを使用した。この導電性シリコーンゴムは、シリコー
ンゴムコンパウンドＫＥ１５１Ｕ（同前）１００重量部
と、導電性ファーネスブラック２．５重量部を添加し、
これに有機過酸化物加硫剤Ｃ−３（同前）２重量部、オ
ルガノハイドロジェンポリシロキサン５重量部、触媒と
して塩化白金酸０．１重量部、反応制御剤１重量部を加
えたものを使用した。この導電性シリコーンゴムは、抵
抗値を１×１０5 Ωとし、上記実施例と同様に、ロール
に対する硬度（ＪＩＳ Ａ）、平均抵抗値、１０本成形
したときの平均抵抗値の最大値／最小値を表２に示し
た。この結果から明らかなように、抵抗値が安定せず、
また低硬度化が当然得られず、実用上望ましくなかっ
た。(Comparative Example) As a comparative example, a conductive silicone rubber was used instead of the semiconductive silicone rubber in the above-mentioned examples. To this conductive silicone rubber, 100 parts by weight of silicone rubber compound KE151U (same as above) and 2.5 parts by weight of conductive furnace black were added,
2 parts by weight of an organic peroxide vulcanizing agent C-3 (same as above), 5 parts by weight of organohydrogenpolysiloxane, 0.1 part by weight of chloroplatinic acid as a catalyst, and 1 part by weight of a reaction control agent. It was used. This conductive silicone rubber has a resistance value of 1 × 10 5 Ω, and has a hardness (JIS A) with respect to a roll, an average resistance value, and a maximum / minimum value of the average resistance value when 10 rolls are formed, as in the above-mentioned embodiment. The values are shown in Table 2. As is clear from this result, the resistance value is not stable,
Further, it was naturally not possible to obtain a low hardness, which was not desirable in practical use.
【００３１】[0031]
【発明の効果】本発明のゴムロールは、電気的特性が非
常に安定しているとともに、表面の平滑性を有している
ため、感光体との接触性に優れており、さらに硬度や抵
抗値の調整も容易であり、産業上の利用価値のきわめて
高いゴムロールを提供することができる。EFFECTS OF THE INVENTION The rubber roll of the present invention has very stable electric characteristics and smoothness of the surface, so that it is excellent in contact with the photoconductor and further has a hardness and a resistance value. Can be easily adjusted, and a rubber roll having an extremely high industrial utility value can be provided.
【図１】本発明のゴムロールの一例を示す断面説明図。FIG. 1 is a sectional explanatory view showing an example of a rubber roll of the present invention.
【図２】抵抗値被測定物の抵抗値測定方法を示す説明
図。FIG. 2 is an explanatory diagram showing a resistance value measuring method of a resistance value measured object.
１…ゴムロール ２…導電性芯体 ３…絶縁性シリコーンゴム発泡体層 ４…導電性シリコーンゴム層 ５…ゴム板（半導電性シリコーンゴム） ６…抵抗値被測定物 ７…抵抗測定器 ８…電極 DESCRIPTION OF SYMBOLS 1 ... Rubber roll 2 ... Conductive core 3 ... Insulating silicone rubber foam layer 4 ... Conductive silicone rubber layer 5 ... Rubber plate (semi-conductive silicone rubber) 6 ... Resistance measured object 7 ... Resistance measuring device 8 ... electrode
Claims (1)
ゴム発泡体層が形成され、さらにその外周面に導電性シ
リコーンゴム層が形成された２層構造のシリコーンゴム
ロールであって、前記絶縁性シリコーンゴム発泡体層の
両端面に接して、かつ該絶縁性シリコーンゴム発泡体層
よりも両端面が張り出し形成された前記導電性シリコー
ンゴム層の張り出し部の内周面と前記導電性芯体の外周
面との間に、一対のリング状の半導電性シリコーンゴム
が一体に形成されてなることを特徴とする半導電性シリ
コーンゴムロール。1. A silicone rubber roll having a two-layer structure, wherein an insulating silicone rubber foam layer is formed on the outer peripheral surface of a conductive core body, and a conductive silicone rubber layer is further formed on the outer peripheral surface thereof. Inner surface of the protruding portion of the conductive silicone rubber layer formed in contact with both end surfaces of the conductive silicone rubber foam layer and having both end surfaces protruding from the insulating silicone rubber foam layer and the conductive core body. A pair of ring-shaped semiconductive silicone rubbers are integrally formed with the outer peripheral surface of the semiconductive silicone rubber roll.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP711596A JP3765431B2 (en) | 1996-01-19 | 1996-01-19 | Semiconductive silicone rubber roll |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP711596A JP3765431B2 (en) | 1996-01-19 | 1996-01-19 | Semiconductive silicone rubber roll |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09197767A true JPH09197767A (en) | 1997-07-31 |
| JP3765431B2 JP3765431B2 (en) | 2006-04-12 |
Family
ID=11657100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP711596A Expired - Fee Related JP3765431B2 (en) | 1996-01-19 | 1996-01-19 | Semiconductive silicone rubber roll |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3765431B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007264491A (en) * | 2006-03-29 | 2007-10-11 | Tokai Rubber Ind Ltd | Charging roll |
| JP2010072269A (en) * | 2008-09-18 | 2010-04-02 | Shin Etsu Polymer Co Ltd | Elastic roller and fixing unit |
| JP2010151893A (en) * | 2008-12-24 | 2010-07-08 | Fuji Xerox Co Ltd | Elastic roll, method for manufacturing the same, charger, process cartridge, and image forming apparatus |
| US20120003011A1 (en) * | 2010-06-30 | 2012-01-05 | Static Control Components, Inc. | Systems and Methods for a Charging Roller |
-
1996
- 1996-01-19 JP JP711596A patent/JP3765431B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007264491A (en) * | 2006-03-29 | 2007-10-11 | Tokai Rubber Ind Ltd | Charging roll |
| JP2010072269A (en) * | 2008-09-18 | 2010-04-02 | Shin Etsu Polymer Co Ltd | Elastic roller and fixing unit |
| JP2010151893A (en) * | 2008-12-24 | 2010-07-08 | Fuji Xerox Co Ltd | Elastic roll, method for manufacturing the same, charger, process cartridge, and image forming apparatus |
| US20120003011A1 (en) * | 2010-06-30 | 2012-01-05 | Static Control Components, Inc. | Systems and Methods for a Charging Roller |
| US8478168B2 (en) * | 2010-06-30 | 2013-07-02 | Static Control Components, Inc. | Charging roller for an imaging device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3765431B2 (en) | 2006-04-12 |
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