JPH09202648A - Surface treatment method - Google Patents

Surface treatment method

Info

Publication number
JPH09202648A
JPH09202648A JP8031393A JP3139396A JPH09202648A JP H09202648 A JPH09202648 A JP H09202648A JP 8031393 A JP8031393 A JP 8031393A JP 3139396 A JP3139396 A JP 3139396A JP H09202648 A JPH09202648 A JP H09202648A
Authority
JP
Japan
Prior art keywords
silicon
fluorine
containing organic
formula
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8031393A
Other languages
Japanese (ja)
Other versions
JP2860979B2 (en
Inventor
Takuya Arase
琢也 荒瀬
Yuji Tanaka
勇次 田中
Tetsuo Shimizu
哲男 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP8031393A priority Critical patent/JP2860979B2/en
Priority to PCT/JP1996/002274 priority patent/WO1997007155A1/en
Priority to US09/011,579 priority patent/US6183872B1/en
Priority to DE69624923T priority patent/DE69624923T2/en
Priority to EP19960926624 priority patent/EP0844265B1/en
Publication of JPH09202648A publication Critical patent/JPH09202648A/en
Application granted granted Critical
Publication of JP2860979B2 publication Critical patent/JP2860979B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)
  • Polyethers (AREA)
  • Paints Or Removers (AREA)

Abstract

(57)【要約】 【課題】 充分な汚染防止作用を有するとともにその作
用が永続し、更に充分な耐候性をも併せもつ基材の表面
処理方法を提供する。 【解決手段】 下記一般式(I)で表されるケイ素含有
有機含フッ素ポリマー(1)、含フッ素有機溶剤
(2)、及び、シラン化合物[ただし、ケイ素含有有機
含フッ素ポリマー(1)を除く](3)を含有してなる
処理液を基材表面に塗布する表面処理方法。 【化1】 式中、Rf は、パーフルオロアルキル基を表す。Zは、
フッ素又はトリフルオロメチル基を表す。a、b、c、
d、eは、それぞれ独立して、0又は1以上の整数を表
し、a+b+c+d+eは、少なくとも1以上であり、
a、b、c、d、eでくくられた各繰り返し単位の存在
順序は、式中において限定されない。Yは、水素又は炭
素数1〜4のアルキル基を表す。Xは、水素、臭素又は
ヨウ素を表す。R1 は、水酸基又は加水分解可能な置換
基を表す。R2 は、水素又は1価の炭化水素基を表す。
lは、0、1又は2を表す。mは、1、2又は3を表
す。nは、1以上の整数を表す。
(57) [Summary] [PROBLEMS] To provide a surface treatment method for a base material, which has a sufficient anti-staining action, has a long-lasting action, and also has sufficient weather resistance. SOLUTION: The silicon-containing organic fluorine-containing polymer (1) represented by the following general formula (I), the fluorine-containing organic solvent (2), and the silane compound (however, the silicon-containing organic fluorine-containing polymer (1) is excluded. ] A surface treatment method in which a treatment liquid containing (3) is applied to the surface of a substrate. Embedded image In the formula, Rf represents a perfluoroalkyl group. Z is
Represents a fluorine or trifluoromethyl group. a, b, c,
d and e each independently represent an integer of 0 or 1 or more, and a + b + c + d + e is at least 1 or more,
The order in which the repeating units a, b, c, d, and e are present is not limited in the formula. Y represents hydrogen or an alkyl group having 1 to 4 carbon atoms. X represents hydrogen, bromine or iodine. R 1 represents a hydroxyl group or a hydrolyzable substituent. R 2 represents hydrogen or a monovalent hydrocarbon group.
l represents 0, 1 or 2. m represents 1, 2 or 3. n represents an integer of 1 or more.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、基材表面に充分な
汚染防止効果を付与し、かつ優れた耐候性をも付与する
基材の表面処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method for a base material, which gives a sufficient anti-staining effect to the surface of the base material and also excellent weather resistance.

【0002】[0002]

【従来の技術】ガラス、樹脂等の基材は、自動車部品、
OA機器、家電製品等として汎用されている。これらの
基材表面は、車内、オフィス内、室内等に浮遊するゴミ
が付着したり、食品、機器用のオイル等に混合されてい
る拭き取り困難な油状物質が付着したり、使用中にヒト
の手により指紋が付着したりして汚染されるため、これ
らの汚染物質が付着しにくく、更には、いったん付着し
た汚染物質が容易に除去することができるような防汚の
ための工夫が必要となる。
2. Description of the Related Art Substrates such as glass and resin are used for automobile parts,
It is widely used as OA equipment, home electric appliances, etc. On the surface of these base materials, dust floating in a car, an office, a room, etc. adheres, or an oily substance that is difficult to wipe off is mixed with food, oil for equipment, etc. Since fingerprints are attached by hands and contaminated, it is difficult for these contaminants to adhere, and further, it is necessary to devise an antifouling device that can easily remove the contaminants once attached. Become.

【0003】特開平1−126244号公報等には、ガ
ラス表面の防汚処理手段として、ガラス表面にポリジメ
チルシロキサン等の高分子物質を直接塗布するか又は処
理剤に浸漬することによって塗膜を形成する技術が開示
されている。また、化学吸着法によってフッ素を含む化
学吸着単分子膜をガラス表面に形成させる技術も知られ
ている。
As a means for antifouling treatment of the glass surface, Japanese Unexamined Patent Publication (Kokai) No. 1-126244 discloses a coating film obtained by directly coating a polymer substance such as polydimethylsiloxane on the glass surface or dipping it in a treatment agent. Techniques for forming are disclosed. Further, a technique of forming a chemisorption monomolecular film containing fluorine on the glass surface by a chemisorption method is also known.

【0004】特公平7−53913号公報には、金属表
面の防汚処理手段として、亜鉛系メッキ皮覆の上層にシ
リカゾルシランカップリング剤を配合したクロメート皮
覆を形成せしめ、その上層にイソシアネート系塗料組成
物を用いて薄膜塗装をした有機複合メッキ鋼板に関する
技術が開示されている。
In Japanese Patent Publication No. 7-53913, as a means for antifouling treatment of a metal surface, a chromate skin containing a silica sol silane coupling agent is formed on an upper layer of a zinc plating skin, and an isocyanate system is formed on the upper layer. A technique relating to an organic composite plated steel sheet coated with a thin film using a coating composition is disclosed.

【0005】更に、反射防止フィルターの防汚効果を高
める目的で、反射防止膜の上層にパーフルオロポリエー
テル化合物をシラン処理した化合物の皮膜を形成せしめ
る技術が提案されている。
Further, for the purpose of enhancing the antifouling effect of the antireflection filter, there has been proposed a technique of forming a film of a compound obtained by silanizing a perfluoropolyether compound on the antireflection film.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記の
技術は、いずれも汚染防止作用を高めるために一定の効
果を有するものではあるが、例えば、屋外暴露等の過酷
な条件においてはその効果が著しく減じられ、耐候性の
点で満足のゆくものではなかった。上記の現状に鑑み、
本発明は、充分な汚染防止作用を有するとともにその作
用が永続し、更に充分な耐候性をも併せもつ基材の表面
処理方法を提供することを目的とするものである。
However, all of the above-mentioned techniques have certain effects in order to enhance the anti-contamination action, but their effects are notable under severe conditions such as outdoor exposure. It was reduced and was not satisfactory in terms of weather resistance. In view of the above situation,
It is an object of the present invention to provide a surface treatment method for a base material which has a sufficient anti-staining action, the action is permanent, and also has sufficient weather resistance.

【0007】[0007]

【課題を解決するための手段】本発明の表面処理方法
は、下記一般式(I)で表されるケイ素含有有機含フッ
素ポリマー(1)、含フッ素有機溶剤(2)、及び、シ
ラン化合物(3)を含有してなる処理液を基材表面に塗
布することを特徴とする基材の表面処理方法である。
The surface treatment method of the present invention comprises a silicon-containing organic fluorine-containing polymer (1) represented by the following general formula (I), a fluorine-containing organic solvent (2), and a silane compound ( A method for treating a surface of a substrate, which comprises applying a treatment liquid containing 3) to the surface of the substrate.

【0008】[0008]

【化4】 Embedded image

【0009】式中、Rf は、パーフルオロアルキル基を
表す。Zは、フッ素又はトリフルオロメチル基を表す。
a、b、c、d、eは、それぞれ独立して、0又は1以
上の整数を表し、a+b+c+d+eは、少なくとも1
以上であり、a、b、c、d、eでくくられた各繰り返
し単位の存在順序は、式中において限定されない。Y
は、水素又は炭素数1〜4のアルキル基を表す。Xは、
水素、臭素又はヨウ素を表す。R1 は、水酸基又は加水
分解可能な置換基を表す。R2 は、水素又は1価の炭化
水素基を表す。lは、0、1又は2を表す。mは、1、
2又は3を表す。nは、1以上の整数を表す。以下に本
発明を詳述する。
In the formula, Rf represents a perfluoroalkyl group. Z represents a fluorine or trifluoromethyl group.
a, b, c, d, and e each independently represent 0 or an integer of 1 or more, and a + b + c + d + e is at least 1
As described above, the order in which the repeating units defined by a, b, c, d, and e are present is not limited in the formula. Y
Represents hydrogen or an alkyl group having 1 to 4 carbon atoms. X is
Represents hydrogen, bromine or iodine. R 1 represents a hydroxyl group or a hydrolyzable substituent. R 2 represents hydrogen or a monovalent hydrocarbon group. l represents 0, 1 or 2. m is 1,
Represents 2 or 3. n represents an integer of 1 or more. Hereinafter, the present invention will be described in detail.

【0010】本発明の表面処理方法は、処理液を基材表
面に塗布することよりなる。上記処理液の第一の成分
は、上記一般式(I)で表されるケイ素含有有機含フッ
素ポリマー(1)である。上記一般式(I)で表される
式中、Rf としては、通常、有機含フッ素ポリマーを構
成するパーフルオロアルキル基であれば特に限定され
ず、例えば、炭素数1〜16の直鎖状又は分岐状のもの
を挙げることができる。好ましくは、CF3−、C2
5 −、C3 7 −である。
The surface treatment method of the present invention comprises applying a treatment liquid to the surface of a substrate. The first component of the treatment liquid is the silicon-containing organic fluoropolymer (1) represented by the general formula (I). In the formula represented by the above general formula (I), Rf is not particularly limited as long as it is a perfluoroalkyl group that constitutes an organic fluoropolymer, and is, for example, a straight chain having 1 to 16 carbon atoms or Examples include branched ones. Preferably, CF 3 −, C 2 F
5 − and C 3 F 7 −.

【0011】上記一般式(I)中のZは、フッ素でもよ
いしトリフルオロメチル基でもよい。上記一般式(I)
中のa、b、c、d、eは、ケイ素含有有機含フッ素ポ
リマーの主骨格を構成するパーフルオロポリエーテル鎖
の繰り返し単位数を表し、0又は1以上の整数でありa
+b+c+d+eが1以上であれば特に限定されない
が、それぞれ独立して、0〜200が好ましく、後述す
るケイ素含有有機含フッ素ポリマーの分子量を考慮すれ
ば、より好ましくは、それぞれ独立して、0〜50であ
る。a+b+c+d+eは、好ましくは、1〜100で
ある。
Z in the above general formula (I) may be fluorine or a trifluoromethyl group. The above general formula (I)
A, b, c, d, and e represent the number of repeating units of the perfluoropolyether chain constituting the main skeleton of the silicon-containing organic fluorine-containing polymer, and are 0 or an integer of 1 or more.
Although it is not particularly limited as long as + b + c + d + e is 1 or more, it is preferably independently 0 to 200, and more preferably independently 0 to 50 in consideration of the molecular weight of the silicon-containing organic fluorine-containing polymer described later. It is. a + b + c + d + e is preferably 1 to 100.

【0012】また、a、b、c、d、eでくくられた各
繰り返し単位の存在順序は、便宜上一般式(I)中にお
いてはこの順に記載したが、通常のパーフルオロポリエ
ーテル鎖の構成に鑑み、これらの各繰り返し単位の結合
順序は、この順に限定されるものではない。
The order of existence of the repeating units surrounded by a, b, c, d, and e is described in this order in the general formula (I) for convenience, but the usual perfluoropolyether chain structure is used. In view of this, the bonding order of each of these repeating units is not limited to this order.

【0013】上記一般式(I)中のYは、水素又は炭素
数1〜4のアルキル基を表す。上記炭素数1〜4のアル
キル基としては特に限定されず、例えば、メチル、エチ
ル、プロピル、ブチル等を挙げることができ、直鎖状で
あっても分岐状であってもよい。上記一般式(I)のX
は、水素、臭素又はヨウ素を表す。Xが臭素又はヨウ素
である場合には、本発明のケイ素含有有機含フッ素ポリ
マーはラジカル反応性が高くなるので、化学結合により
他の化合物と結合させるのには好都合である。
Y in the above general formula (I) represents hydrogen or an alkyl group having 1 to 4 carbon atoms. The alkyl group having 1 to 4 carbon atoms is not particularly limited, and includes, for example, methyl, ethyl, propyl, butyl and the like, and may be linear or branched. X of the above general formula (I)
Represents hydrogen, bromine or iodine. When X is bromine or iodine, the silicon-containing organic fluorine-containing polymer of the present invention has high radical reactivity, and therefore it is convenient to bond with another compound by a chemical bond.

【0014】上記一般式(I)中のlは、パーフルオロ
ポリエーテル鎖の構成する炭素とこれに結合するケイ素
との間に存在するアルキレン基の炭素数を表し、0、1
又は2であるが、より好ましくは、0である。
In the above general formula (I), 1 represents the carbon number of the alkylene group existing between the carbon constituting the perfluoropolyether chain and the silicon bonded to it, and 0, 1
Or 2, but more preferably 0.

【0015】上記一般式(I)中のmは、ケイ素に結合
する置換基R1 の結合数を表し、1、2又は3である。
置換基R1 が結合していない部分には、当該ケイ素には
2が結合する。
M in the general formula (I) represents the number of bonds of the substituent R 1 bonded to silicon, and is 1, 2 or 3.
R 2 is bonded to the silicon where the substituent R 1 is not bonded.

【0016】上記R1 は、水酸基又は加水分解可能な置
換基を表す。上記加水分解可能な置換基としては特に限
定されず、好ましいものとしては、例えば、ハロゲン、
−OR3 、−OCOR3 、−OC(R3 )=C(R4
2 、−ON=C(R3 2 、−ON=CR5 [式中、R
3 は、脂肪族炭化水素基又は芳香族炭化水素基を表し、
4 は、水素又は炭素数1〜4の脂肪族炭化水素基を表
し、R5 は、炭素数3〜6の2価の脂肪族炭化水素基を
表す。]等を挙げることができる。より好ましくは、塩
素、−OCH3 、−OC2 5 である。
R 1 represents a hydroxyl group or a hydrolyzable substituent. The hydrolyzable substituent is not particularly limited, and is preferably, for example, halogen,
-OR 3 , -OCOR 3 , -OC (R 3 ) = C (R 4 )
2, -ON = C (R 3 ) 2, -ON = CR 5 [ wherein, R
3 represents an aliphatic hydrocarbon group or an aromatic hydrocarbon group,
R 4 represents hydrogen or an aliphatic hydrocarbon group having 1 to 4 carbon atoms, and R 5 represents a divalent aliphatic hydrocarbon group having 3 to 6 carbon atoms. ] Etc. can be mentioned. More preferably, chlorine, -OCH 3, is -OC 2 H 5.

【0017】上記R2 は、水素又は1価の炭化水素基を
表す。上記1価の炭化水素基としては特に限定されず、
好ましいものとしては、例えば、メチル、エチル、プロ
ピル、ブチル等を挙げることができ、直鎖状であっても
分岐状であってもよい。
R 2 represents hydrogen or a monovalent hydrocarbon group. The monovalent hydrocarbon group is not particularly limited,
Preferred examples include methyl, ethyl, propyl, butyl and the like, which may be linear or branched.

【0018】上記一般式(I)中のnは、1以上の整数
を表し、特に上限はないが、本発明の目的を達するため
には、1〜10の整数であることが好ましい。上記n
は、一般式(I)中においては整数を表すが、このよう
な整数nを有する一般式(I)で表されるポリマーの混
合物として本発明に係るケイ素含有有機含フッ素ポリマ
ーが存在していてもよい。このように混合物としてケイ
素含有有機含フッ素ポリマーが存在する場合には、上記
nは、当該混合物中において平均値として表すことがで
き、当該ケイ素含有有機含フッ素ポリマーが混合物とし
て存在する場合には、本発明の目的を考慮すれば、nの
平均値は、1.3〜3が好ましく、1.5〜2.5が特
に好ましい。
In the general formula (I), n represents an integer of 1 or more, and there is no particular upper limit, but it is preferably an integer of 1 to 10 in order to achieve the object of the present invention. The above n
Represents an integer in the general formula (I), and the silicon-containing organic fluoropolymer according to the present invention exists as a mixture of the polymer represented by the general formula (I) having such an integer n. Is also good. As described above, when the silicon-containing organic fluoropolymer is present as a mixture, the above n can be represented as an average value in the mixture, and when the silicon-containing organic fluoropolymer is present as a mixture, In consideration of the object of the present invention, the average value of n is preferably 1.3 to 3, and particularly preferably 1.5 to 2.5.

【0019】上記ケイ素含有有機含フッ素ポリマーの分
子量は、5×102 〜1×105 が好ましい。5×10
2 未満では、本発明の効果を発揮せず、1×105 を超
えると加工性に乏しくなる。より好ましくは、1×10
3 〜1×104 である。
The molecular weight of the silicon-containing organic fluorine-containing polymer is preferably 5 × 10 2 to 1 × 10 5 . 5 x 10
If it is less than 2 , the effect of the present invention will not be exhibited, and if it exceeds 1 × 10 5 , processability will be poor. More preferably, 1 × 10
It is 3 to 1 × 10 4 .

【0020】上記ケイ素含有有機含フッ素ポリマーの好
ましいものとして、例えば、下記一般式(II)で表さ
れるもの等を挙げることができる。
Preferred examples of the above silicon-containing organic fluorine-containing polymer include those represented by the following general formula (II).

【0021】[0021]

【化5】 Embedded image

【0022】式中、pは、1以上の整数を表す。Y、
X、R1 、R2 、l、m、nは、前記と同じ。上記一般
式(II)中のpは、1以上の整数であれば特に限定さ
れないが、1〜200が好ましく、本発明のケイ素含有
有機含フッ素ポリマーの分子量を考慮すれば、より好ま
しくは、1〜50である。
In the formula, p represents an integer of 1 or more. Y,
X, R 1 , R 2 , l, m, and n are the same as described above. P in the general formula (II) is not particularly limited as long as it is an integer of 1 or more, but is preferably 1 to 200, and more preferably 1 in consideration of the molecular weight of the silicon-containing organic fluoropolymer of the present invention. ~ 50.

【0023】上記ケイ素含有有機含フッ素ポリマーの分
子量は、5×102 〜1×105 が好ましい。5×10
2 未満では、本発明の効果を発揮せず、1×105 を超
えると加工性に乏しくなる。より好ましくは、1×10
3 〜1×104 である。
The molecular weight of the silicon-containing organic fluorine-containing polymer is preferably 5 × 10 2 to 1 × 10 5 . 5 x 10
If it is less than 2 , the effect of the present invention will not be exhibited, and if it exceeds 1 × 10 5 , processability will be poor. More preferably, 1 × 10
It is 3 to 1 × 10 4 .

【0024】上記ケイ素含有有機含フッ素ポリマーは、
通常市販されているパーフルオロポリエーテルを原料と
して用い、末端に例えば、ヨウ素を導入した後、これ
に、例えば、下記一般式[式中、Y、R1 、R2 、l、
mは、前記と同じ。]で表されるビニルシラン化合物を
反応させること等により得ることができる。
The above silicon-containing organic fluorine-containing polymer is
Usually, commercially available perfluoropolyether is used as a raw material and, for example, iodine is introduced into the terminal, and then, for example, the following general formula [wherein, Y, R 1 , R 2 , l,
m is the same as above. For example, by reacting a vinylsilane compound represented by the formula

【0025】[0025]

【化6】 [Chemical 6]

【0026】本発明の表面処理方法に使用する上記処理
液を構成する第二の成分は、含フッ素有機溶剤(2)で
ある。上記含フッ素有機溶剤(2)としては特に限定さ
れず、例えば、パーフルオロヘキサン、パーフルオロメ
チルシクロヘキサン、パーフルオロ−1,3―ジメチル
シクロヘキサン、HCFC225等を挙げることができ
る。なかでも、上記ケイ素含有有機含フッ素ポリマー
(1)を容易に溶解することができ、また、入手しやす
いことから、HCFC225が好ましい。
The second component constituting the above treatment liquid used in the surface treatment method of the present invention is the fluorine-containing organic solvent (2). The fluorine-containing organic solvent (2) is not particularly limited, and examples thereof include perfluorohexane, perfluoromethylcyclohexane, perfluoro-1,3-dimethylcyclohexane and HCFC225. Among them, HCFC225 is preferable because it can easily dissolve the silicon-containing organic fluoropolymer (1) and is easily available.

【0027】本発明の表面処理方法に使用する上記処理
液を構成する第三の成分は、シラン化合物(3)であ
る。上記シラン化合物(3)としては特に限定されず、
例えば、一般式(III) Si(OR114 (III) [式中、R11は、脂肪族炭化水素基を表し、その炭素数
は特に限定されない。]で表されるケイ素のアルコキシ
ド化合物、一般式(III)で表される化合物の部分加
水分解縮合生成物等を挙げることができる。なかでも、
入手容易であることから、テトラエトキシシランが好ま
しい。
The third component constituting the above treatment liquid used in the surface treatment method of the present invention is a silane compound (3). The silane compound (3) is not particularly limited,
For example, general formula (III) Si (OR 11 ) 4 (III) [In the formula, R 11 represents an aliphatic hydrocarbon group, and the carbon number thereof is not particularly limited. Alkoxide compounds of silicon represented by the general formula (III), and partial hydrolysis condensation products of the compounds represented by the general formula (III). Above all,
Tetraethoxysilane is preferred because it is easily available.

【0028】本発明の表面処理方法に使用する上記処理
液を構成する(1)、(2)及び(3)の各成分の構成
量比は特に限定されないが、(1):(2)は、重量比
1:1〜1:10000であることが好ましい。(1)
成分が多すぎると、液粘度が上昇するため作業性を損な
い、少なすぎると、汚染防止効果が不充分なものとな
る。より好ましくは、1:4〜1:1000である。ま
た、(1):(3)は、重量比10:1〜1:100で
あることが好ましい。(1)成分が多すぎると、耐候性
向上の効果が不充分なものとなり、少なすぎると、汚染
防止効果が不充分なものとなる。より好ましくは、5:
1〜1:10である。
The constituent ratios of the respective components (1), (2) and (3) constituting the above-mentioned treatment liquid used in the surface treatment method of the present invention are not particularly limited, but (1) :( 2) is It is preferable that the weight ratio is 1: 1 to 1: 10000. (1)
If the amount of the component is too large, the viscosity of the liquid increases, which impairs workability, and if it is too small, the effect of preventing contamination becomes insufficient. More preferably, it is 1: 4 to 1: 1000. The weight ratio of (1) :( 3) is preferably 10: 1 to 1: 100. If the amount of component (1) is too large, the effect of improving the weather resistance will be insufficient, and if it is too small, the effect of preventing contamination will be insufficient. More preferably 5:
1 to 1:10.

【0029】本発明の上記処理液を適用するにあたって
は、例えば、シリカ、アルミナ、酸化チタン、カーボ
ン、セメント等の微粉末充填剤、チタン、アルミニウム
等のアルコキシド、その他の低分子量ポリテトラフルオ
ロエチレン、テトラフルオロエチレン/ヘキサフルオロ
プロピレン共重合体等のフッ素樹脂の微粉末等を、硬度
調整剤又は増量剤等として添加することができる。ま
た、通常の架橋剤や水、塩酸、硫酸、カルボン酸、スル
ホン酸等の硬化触媒を更に加えて、硬度調整を行うこと
もできる。
In applying the treatment liquid of the present invention, for example, fine powder fillers such as silica, alumina, titanium oxide, carbon and cement, alkoxides such as titanium and aluminum, and other low molecular weight polytetrafluoroethylene, A fine powder of a fluororesin such as a tetrafluoroethylene / hexafluoropropylene copolymer can be added as a hardness adjusting agent or a bulking agent. Further, the hardness can be adjusted by further adding a usual crosslinking agent or a curing catalyst such as water, hydrochloric acid, sulfuric acid, carboxylic acid, sulfonic acid and the like.

【0030】本発明の上記処理液を適用するにあたって
は、対象となる基材の表面に、上記処理液を塗布する方
法を採ることができる。上記塗布方法としては、例え
ば、刷毛塗り、スプレー塗装、スピン塗装、浸漬塗装、
ロールコート塗装、グラビアコート塗装、カーテンフロ
ー塗装等を挙げることができる。
In applying the treatment liquid of the present invention, a method of applying the treatment liquid on the surface of a target substrate can be adopted. Examples of the coating method include brush coating, spray coating, spin coating, dip coating,
Roll coating, gravure coating, curtain flow coating and the like can be mentioned.

【0031】本発明の表面処理方法においては、上記処
理液により形成される層の厚みは特に限定されるもので
はないが、0.001〜0.03μmが好ましい。0.
001μm未満であると汚染防止作用が乏しくなり、
0.03μmを超えると層が厚すぎて使用に障害が生じ
るので好ましくない。
In the surface treatment method of the present invention, the thickness of the layer formed by the treatment liquid is not particularly limited, but is preferably 0.001 to 0.03 μm. 0.
If it is less than 001 μm, the antifouling effect becomes poor,
When it exceeds 0.03 μm, the layer is too thick and the use is impaired, which is not preferable.

【0032】第二の本発明の表面処理方法は、一般式
(1)で表されるケイ素含有有機含フッ素ポリマー
(1)、及び、含フッ素有機溶剤(2)を含有してなる
処理液(M)を、シラン化合物[ただし、ケイ素含有有
機含フッ素ポリマー(1)を除く](3)を含有してな
る処理液(N)を用いて表面に下地層を形成させた基材
表面に塗布することよりなる。
The second surface treatment method of the present invention is a treatment liquid containing a silicon-containing organic fluoropolymer (1) represented by the general formula (1) and a fluorine-containing organic solvent (2). M) is applied to the surface of a base material having an underlayer formed on the surface using a treatment liquid (N) containing a silane compound [excluding the silicon-containing organic fluorine-containing polymer (1)] (3). It consists of doing.

【0033】上記シラン化合物(3)は、メチルアルコ
ール、エチルアルコール、イソプロピルアルコール、酢
酸エチル、アセトン等の有機溶媒又は水溶媒によって所
定濃度の処理液(N)とする。この濃度は特に限定され
ないが、2〜80重量%の範囲内にあることが好まし
い。2重量%未満であると、シリカゾルの形成に長時間
を要し、80重量%を超えると、液粘度が高くなりすぎ
て作業性を損なうので好ましくない。上記処理液(N)
に通常の触媒、例えば、塩酸を加えて所定時間静置して
シリカゾルとなした後、塗布作業に適した濃度まで上記
溶媒を用いて希釈する。静置時間は特に限定されない
が、例えば、2〜10日である。希釈濃度は所望する下
地層の厚さによって異なるが、例えば、0.2〜2重量
%の範囲内である。
The silane compound (3) is treated with an organic solvent such as methyl alcohol, ethyl alcohol, isopropyl alcohol, ethyl acetate or acetone or a water solvent to give a treatment liquid (N) having a predetermined concentration. This concentration is not particularly limited, but it is preferably in the range of 2 to 80% by weight. If it is less than 2% by weight, it takes a long time to form the silica sol, and if it exceeds 80% by weight, the liquid viscosity becomes too high and the workability is impaired. Treatment liquid (N)
After adding an ordinary catalyst, for example, hydrochloric acid, to the silica sol by allowing it to stand for a predetermined time, it is diluted with the above solvent to a concentration suitable for the coating operation. The standing time is not particularly limited, but is, for example, 2 to 10 days. The dilution concentration varies depending on the desired thickness of the underlayer, but is, for example, in the range of 0.2 to 2% by weight.

【0034】次に、希釈した処理液(N)を基材表面に
塗布する。塗布方法としては、例えば、刷毛塗り、スプ
レー塗装、スピン塗装、浸漬塗装、ロールコート塗装、
グラビアコート塗装、カーテンフロー塗装等を挙げるこ
とができる。上記操作によって、基材表面にシラノール
ポリマーのゲル層が形成される。
Next, the diluted treatment liquid (N) is applied to the surface of the base material. As the coating method, for example, brush coating, spray coating, spin coating, dip coating, roll coating,
Examples include gravure coat painting and curtain flow painting. By the above operation, a gel layer of silanol polymer is formed on the surface of the base material.

【0035】次に、上記基材を加熱することにより、酸
化ケイ素を主成分とする下地層を形成することができ
る。加熱温度は基材によって異なるが、例えば、100
〜300℃の範囲である。加熱時間は特に限定されない
が、例えば、10分〜3時間の範囲内である。形成され
る下地層の厚さは特に限定されないが、通常、0.05
〜0.1μmの範囲内である。
Next, by heating the above-mentioned base material, a base layer containing silicon oxide as a main component can be formed. The heating temperature varies depending on the substrate, but for example, 100
~ 300 ° C. The heating time is not particularly limited, but is, for example, in the range of 10 minutes to 3 hours. The thickness of the underlying layer formed is not particularly limited, but is usually 0.05.
Is in the range of 0.1 μm.

【0036】しかる後、上記処理液(M)を上記の表面
に下地層を形成させた基材表面に塗布する。塗布方法と
しては、例えば、刷毛塗り、スプレー塗装、スピン塗
装、浸漬塗装、ロールコート塗装、グラビアコート塗
装、カーテンフロー塗装等を挙げることができる。
Thereafter, the treatment liquid (M) is applied to the surface of the base material having the underlayer formed on the surface. Examples of the coating method include brush coating, spray coating, spin coating, dip coating, roll coating, gravure coating, curtain flow coating, and the like.

【0037】本発明の表面処理方法においては、上記処
理液(M)により形成される層の厚みは特に限定される
ものではないが、0.001〜0.03μmが好まし
い。0.001μm未満であると汚染防止作用が乏しく
なり、0.03μmを超えると層が厚すぎて使用に障害
が生じるので好ましくない。
In the surface treatment method of the present invention, the thickness of the layer formed by the treatment liquid (M) is not particularly limited, but is preferably 0.001 to 0.03 μm. If it is less than 0.001 μm, the anti-contamination action becomes poor, and if it exceeds 0.03 μm, the layer is too thick to cause trouble in use, which is not preferable.

【0038】本発明の表面処理方法を適用することがで
きる基材としては、例えば、以下に掲げるもの等の汚染
されやすい部分等を挙げることができる。ネクタイピ
ン、ネックレス、ピアス等の装飾品;水道蛇口、金管楽
器、木管楽器、ゴルフクラブ、扉の取っ手、ダンベル、
刃物等の金属又はメッキ製品;碍子、タイル、衛生陶
器、食器、屋根瓦等のセラミック材料;墓石、碁石、大
理石等の石材;壁紙、ふすま紙、書籍、ポスター、写真
等の紙製品;財布、靴、鞄、時計バンド、野球用グロー
ブ等の皮革製品。
The substrate to which the surface treatment method of the present invention can be applied includes, for example, the easily polluted portions such as those listed below. Tie pins, necklaces, earrings and other ornaments; water faucets, brass instruments, woodwind instruments, golf clubs, door handles, dumbbells,
Metal or plated products such as blades; ceramic materials such as insulators, tiles, sanitary ware, tableware, roof tiles; stone materials such as gravestones, go stones, marble; paper products such as wallpaper, bran paper, books, posters, photographs; wallets, Leather products such as shoes, bags, watch bands, and baseball gloves.

【0039】扇風機の羽根、電子レンジの扉、冷蔵庫の
表面等の家電製品;コピー機のコンタクトガラス、OH
P本体のミラー、OHPシート、キーボード、電話機、
事務机等の事務関連用品;グラス、食器棚の扉、鏡、窓
ガラス、電灯の傘、シャンデリア等の家庭用品;ショー
ウインド、電話ボックス、水槽のガラス等の建築材料;
車両ガラス、車体の塗装面等の車両部品;メガネフレー
ム、水中メガネのガラス、ゴーグル、ヘルメット、時計
の文字盤のカバーガラス等の装身具;パチンコ台のガラ
ス、トランプ、麻雀パイ等の遊具;家具、ピアノ等の塗
装面。
Home appliances such as fan blades, microwave oven doors, refrigerator surfaces, etc .; contact glass for copy machines, OH
P body mirror, OHP sheet, keyboard, telephone,
Office-related items such as office desks; household items such as glasses, cupboard doors, mirrors, window glasses, light umbrellas, chandeliers; building materials such as show windows, telephone boxes, and aquarium glasses;
Vehicle glass, vehicle parts such as painted surface of vehicle body; glasses frame, underwater glasses glass, goggles, helmet, cover glass for watch dial, pachinko machine glass, playing cards, mahjong pie, etc .; furniture, Painted surface such as piano.

【0040】本発明の表面処理方法は、汚染防止作用が
永続すること、及び、充分の耐候性を有すること、が特
徴であるので、本発明の表面処理方法を適用するのに適
したものとしては、上記各種の基材のなかでも、例え
ば、以下に掲げるものが好ましい。扉の取っ手;屋根瓦
等のセラミック材料;墓石、碁石、大理石等の石材;コ
ピー機のコンタクトガラス;窓ガラス;車両ガラス、車
体の塗装面等の車両部品;パチンコ台のガラス、トラン
プ、麻雀パイ等の遊具。
The surface treatment method of the present invention is characterized in that the anti-contamination action is permanent and that it has sufficient weather resistance. Therefore, it is suitable for applying the surface treatment method of the present invention. Among the above various base materials, for example, the following are preferable. Door handles; ceramic materials such as roof tiles; stone materials such as tombstones, go stones, marbles; contact glass for copy machines; window glass; vehicle parts such as vehicle glass and painted surfaces of car bodies; pachinko glass, playing cards, mahjong pie Playground equipment such as.

【0041】[0041]

【実施例】以下に実施例を掲げて本発明を更に詳しく説
明するが、本発明はこれら実施例のみに限定されるもの
ではない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

【0042】合成例1 攪拌機、滴下ロート、還流冷却器及び温度計を備えた
2.0L4つ口フラスコ中に2617g(10.3モ
ル)のヨウ素、213.2g(1.54モル)の炭酸カ
リウム、及び、9000gのヘキサクロロ−1,3−ブ
タジエンを仕込み、系の温度を160℃に維持しながら
窒素気流下に、化学式F−(CF2 CF2 CF2 O)n
−CF2 CF2 COFで表されるω−フルオロポリパー
フルオロオキセタンアシルフルオライド(平均分子量3
900)4000g(1.03モル)を10mL/分の
速度で滴下した。
Synthesis Example 1 2617 g (10.3 mol) iodine, 213.2 g (1.54 mol) potassium carbonate in a 2.0 L four-necked flask equipped with a stirrer, dropping funnel, reflux condenser and thermometer. , And 9000 g of hexachloro-1,3-butadiene were charged, and the chemical formula F- (CF 2 CF 2 CF 2 O) n was added under a nitrogen stream while maintaining the system temperature at 160 ° C.
Ω-fluoropolyperfluorooxetane acylfluoride represented by —CF 2 CF 2 COF (average molecular weight 3
900) 4000 g (1.03 mol) was added dropwise at a rate of 10 mL / min.

【0043】滴下終了後、反応温度を185℃に上昇さ
せ、20時間反応させた。反応終了後、系を冷却したの
ちカリウム塩を濾別し、2層に分離した液相から分液ロ
ートを用いて下層を分取した。これをアセトンを用いて
数回洗浄したのち、1Lのパーフルオロヘキサンに溶解
し、ガラスフイルターによって微細な不溶物を濾別し
た。得られた溶液から減圧下揮発分を完全に留去するこ
とによって3890g(収率95%)の化学式F−(C
2 CF2 CF2 O)n −CF2 CF2 Iで表されるω
−フルオロポリパーフルオロオキセタンヨウ素化物を得
た。赤外吸収スペクトルより、1890cm-1の−C
(=O)Fの吸収が完全に消失し、910cm-1に新た
に−CF2 Iの吸収が生じた。トリクロロフルオロメタ
ン(CFC−11)を標準とする19F−NMRより、2
0.7ppmの−C(=O)Fの吸収が完全に消失し、
新たに−66.7ppmに、−OCF2 2 Iに由来
する吸収が生じ、−87.6ppmに、−OC2 CF
2 Iに由来する吸収が生じた。積分値より、転化率は1
00%と計算された。
After completion of dropping, the reaction temperature was raised to 185 ° C. and the reaction was carried out for 20 hours. After completion of the reaction, the system was cooled, potassium salts were filtered off, and the lower layer was separated from the liquid phase separated into two layers using a separating funnel. This was washed several times with acetone, then dissolved in 1 L of perfluorohexane, and fine insoluble matter was filtered off with a glass filter. By completely distilling off volatile components from the obtained solution under reduced pressure, 3890 g (yield 95%) of the formula F- (C
F 2 CF 2 CF 2 O) ω represented by n -CF 2 CF 2 I
-Fluoropolyperfluorooxetane iodide was obtained. From infrared absorption spectrum, -C at 1890 cm -1
(= O) absorption of F had completely disappeared, resulting newly absorbed -CF 2 I to 910 cm -1. From 19 F-NMR using trichlorofluoromethane (CFC-11) as a standard, 2
The absorption of 0.7 ppm of -C (= O) F disappeared completely,
New to -66.7Ppm, cause absorption derived from -OCF 2 C F 2 I, in -87.6ppm, -OC F 2 CF
Absorption due to 2 I occurred. From the integrated value, the conversion rate is 1
It was calculated to be 00%.

【0044】合成例2 攪拌機、滴下ロート、還流冷却器及び温度計を備えた2
00mL4つ口フラスコ中に合成例1にて合成した化学
式F−(CF2 CF2 CF2 O)n −CF2 CF2 Iで
表されるω−フルオロポリパーフルオロオキセタンヨウ
素化物40gをダイフロンソルベントS−316(ダイ
キン工業社製)80gに溶解したもの、及び、ジt−ブ
チルパーオキシド1.5g(1×10-2モル)を仕込
み、充分に系内を窒素置換したのち、窒素気流下滴下ロ
ートよりビニルトリクロロシラン16.1g(0.10
モル)を滴下した。滴下終了後系内の温度を120℃に
昇温させ、4時間反応させた。反応終了後減圧下揮発分
を完全に留去することによって末端にヨウ素を有するケ
イ素含有有機含フッ素ポリマー(A)38.7g(収率
90%)を得た。CFC−11を標準とする19F−NM
Rより、−66.7ppm、−87.6ppmの吸収は
完全に消失し、−89.2〜−90.0ppmに幅広い
吸収帯が現れた。また、 1H−NMRより、1.4〜
3.0ppmに幅広い吸収帯が現れたが、内部標準とし
て化学式F−(CF2 CF2 CF2 O)n −CF2 CF
2 Hで表されるω−フルオロポリパーフルオロオキセタ
ン水素化物5.0モル%を添加することにより、トリク
ロロビニルシランの重合度を計算すると、2.0であっ
た。
Synthesis Example 2 2 equipped with a stirrer, dropping funnel, reflux condenser and thermometer
00mL4 one during neck flask was synthesized in Synthesis Example 1 formula F- (CF 2 CF 2 CF 2 O) represented by n -CF 2 CF 2 I ω- fluoropolyether perfluoro oxetane iodide 40g die chlorofluorocarbon solvent What was dissolved in 80 g of S-316 (manufactured by Daikin Industries, Ltd.) and 1.5 g of di-t-butyl peroxide (1 × 10 -2 mol) were charged, and the system was sufficiently replaced with nitrogen, and then under a nitrogen stream. From the dropping funnel, 16.1 g (0.10 g) of vinyltrichlorosilane
Mol) was added dropwise. After completion of dropping, the temperature in the system was raised to 120 ° C. and the reaction was carried out for 4 hours. After completion of the reaction, the volatile matter was completely distilled off under reduced pressure to obtain 38.7 g (yield 90%) of a silicon-containing organic fluoropolymer (A) having iodine at the terminal. 19 F-NM with CFC-11 as standard
From R, the absorption at -66.7 ppm and -87.6 ppm disappeared completely, and a wide absorption band appeared at -89.2 to -90.0 ppm. Moreover, from 1 H-NMR, 1.4-
Although broad absorption band appeared at 3.0 ppm, the chemical formula as an internal standard F- (CF 2 CF 2 CF 2 O) n -CF 2 CF
The degree of polymerization of trichlorovinylsilane was calculated by adding 5.0 mol% of ω-fluoropolyperfluorooxetane hydride represented by 2 H, and it was 2.0.

【0045】合成例3 攪拌機、滴下ロート、還流冷却器及び温度計を備えた2
00mL4つ口フラスコ中に合成例2にて合成したケイ
素含有有機含フッ素ポリマー(A)34.4g(8×1
-3モル)をパーフルオロヘキサン50gに溶解したも
のを仕込み、亜鉛2.1g(3.2×10-2モル)を強
攪拌下分散させた。氷水浴で系を冷却し、窒素気流下無
水メタノール10gを滴下した。滴下終了後氷水浴を取
り除き、加熱還流下2時間反応させた。反応終了後不溶
物を濾別し、2層に分離した液相から分液ロートを用い
て下層を分取した。得られた溶液を無水メタノールを用
いて3回洗浄したのち、減圧下揮発分を完全に留去する
ことによって、末端が水素化されたケイ素含有有機含フ
ッ素ポリマー(B)31.6g(収率92%)を得た。
1H−NMRより、3.5ppmにSi−OCH3 の吸
収が現れた。内部標準として化学式F−(CF2 CF2
CF2 O)n −CF2 CF2 Hで表されるω−フルオロ
ポリパーフルオロオキセタン水素化物5.0モル%を添
加し、1.2〜3.0ppmの幅広い吸収帯の積分強度
が16.0%増していること、3.5ppmの吸収帯と
の強度比から、重合度が2.0であることを確認した。
Synthesis Example 3 2 equipped with a stirrer, dropping funnel, reflux condenser and thermometer
34.4 g (8 × 1) of the silicon-containing organic fluoropolymer (A) synthesized in Synthesis Example 2 in a 00 mL four-necked flask.
0 -3 mol) were charged which was dissolved in perfluorohexane 50 g, it was strong by stirring dispersing zinc 2.1g (3.2 × 10 -2 mol). The system was cooled in an ice water bath, and 10 g of anhydrous methanol was added dropwise under a nitrogen stream. After completion of dropping, the ice-water bath was removed, and the mixture was reacted under heating under reflux for 2 hours. After completion of the reaction, insoluble matter was filtered off, and the lower layer was separated from the liquid phase separated into two layers using a separating funnel. The obtained solution was washed three times with anhydrous methanol, and the volatile matter was completely distilled off under reduced pressure to give 31.6 g of a silicon-containing organic fluoropolymer (B) having a hydrogenated end (yield: 92%).
From 1 H-NMR, absorption of Si—OCH 3 appeared at 3.5 ppm. As an internal standard, the chemical formula F- (CF 2 CF 2
5.0 mol% of ω-fluoropolyperfluorooxetane hydride represented by CF 2 O) n-CF 2 CF 2 H is added, and the integrated intensity of a wide absorption band of 1.2 to 3.0 ppm is 16. It was confirmed that the degree of polymerization was 2.0 from the fact that it increased by 0% and the intensity ratio with the absorption band of 3.5 ppm.

【0046】実施例1 合成例3で得たケイ素含有有機含フッ素ポリマー(B)
0.1重量%に、HCFC225を99.8重量%、テ
トラエトキシシラン0.1重量%を混合して処理液を調
製した。ガラス板を、使用前に水洗し、その後にメタノ
ールとアセトンを用いて充分に洗浄した。このようにし
て準備したガラス板を上記処理液に1分間ディッピング
し、引き上げた後、60℃、80%RHの条件下で60
分間放置した。ついでHCFC225にて充分に洗浄し
て過剰の処理液分子を除去した。このようにして作成し
た検体を、サンシャインウェザオメーター(岩崎電気社
製、SUV−W13)中にて16時間(3.3年相当)
の促進耐候性試験にかけ、その前後で対水接触角を比較
した。対水接触角は、接触角計(協和界面科学機械社製
CA−DT型)を用いて測定した。結果を表1に示し
た。
Example 1 Silicon-containing organic fluorine-containing polymer (B) obtained in Synthesis Example 3
0.1 wt% was mixed with 99.8 wt% of HCFC225 and 0.1 wt% of tetraethoxysilane to prepare a treatment liquid. The glass plate was washed with water before use and then thoroughly washed with methanol and acetone. The glass plate thus prepared was dipped in the above treatment solution for 1 minute and pulled up, and then 60 ° C. under the condition of 80% RH.
Let stand for minutes. Then, it was thoroughly washed with HCFC225 to remove excess molecules of the treatment liquid. The sample prepared in this manner was placed in a sunshine weatherometer (SUV-W13, manufactured by Iwasaki Electric Co., Ltd.) for 16 hours (equivalent to 3.3 years).
Was subjected to the accelerated weathering resistance test, and the contact angles with water before and after the test were compared. The contact angle with water was measured using a contact angle meter (CA-DT type manufactured by Kyowa Interface Science Machine Co., Ltd.). The results are shown in Table 1.

【0047】比較例1 合成例3で得たケイ素含有有機含フッ素ポリマー(B)
0.1重量%に、HCFC225を99.9重量%を混
合して処理液を調製したこと以外は、実施例1と同様に
して処理液を調製し、同様に試験に供した。結果を表1
に示した。
Comparative Example 1 Silicon-containing organic fluorine-containing polymer (B) obtained in Synthesis Example 3
A treatment liquid was prepared in the same manner as in Example 1 except that 0.19 wt% of HCFC225 was mixed with 99.9 wt% to prepare a treatment liquid, and the test liquid was subjected to the same test. Table 1 shows the results
It was shown to.

【0048】[0048]

【表1】 [Table 1]

【0049】[0049]

【発明の効果】本発明の表面処理方法は、上述の構成よ
りなるので、充分な汚染防止作用を有するとともにその
作用が永続し、更に充分な耐候性をも併せもち、特に屋
外暴露等の過酷な条件における汚染防止作用が必要な基
材に好適に用いることができる。
Since the surface treatment method of the present invention has the above-mentioned constitution, it has a sufficient anti-contamination action, the action is permanent, and also has sufficient weather resistance, especially in the severe conditions such as outdoor exposure. It can be suitably used for a base material that requires a pollution prevention action under various conditions.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(I)で表されるケイ素含有
有機含フッ素ポリマー(1)、含フッ素有機溶剤
(2)、及び、シラン化合物[ただし、ケイ素含有有機
含フッ素ポリマー(1)を除く](3)を含有してなる
処理液を基材表面に塗布することを特徴とする基材の表
面処理方法。 【化1】 式中、Rf は、パーフルオロアルキル基を表す。Zは、
フッ素又はトリフルオロメチル基を表す。a、b、c、
d、eは、それぞれ独立して、0又は1以上の整数を表
し、a+b+c+d+eは、少なくとも1以上であり、
a、b、c、d、eでくくられた各繰り返し単位の存在
順序は、式中において限定されない。Yは、水素又は炭
素数1〜4のアルキル基を表す。Xは、水素、臭素又は
ヨウ素を表す。R1 は、水酸基又は加水分解可能な置換
基を表す。R2 は、水素又は1価の炭化水素基を表す。
lは、0、1又は2を表す。mは、1、2又は3を表
す。nは、1以上の整数を表す。
1. A silicon-containing organic fluorine-containing polymer (1) represented by the following general formula (I), a fluorine-containing organic solvent (2), and a silane compound (provided that the silicon-containing organic fluorine-containing polymer (1) is Excluding] A method for treating a surface of a substrate, which comprises applying a treatment liquid containing (3) to the surface of the substrate. Embedded image In the formula, Rf represents a perfluoroalkyl group. Z is
Represents a fluorine or trifluoromethyl group. a, b, c,
d and e each independently represent an integer of 0 or 1 or more, and a + b + c + d + e is at least 1 or more,
The order in which the repeating units a, b, c, d, and e are present is not limited in the formula. Y represents hydrogen or an alkyl group having 1 to 4 carbon atoms. X represents hydrogen, bromine or iodine. R 1 represents a hydroxyl group or a hydrolyzable substituent. R 2 represents hydrogen or a monovalent hydrocarbon group.
l represents 0, 1 or 2. m represents 1, 2 or 3. n represents an integer of 1 or more.
【請求項2】 シラン化合物[ただし、下記一般式
(1)で表されるケイ素含有有機含フッ素ポリマー
(1)を除く](3)を含有してなる処理液(N)を基
材表面に塗布して下地層を形成させた後、下記一般式
(1)で表されるケイ素含有有機含フッ素ポリマー
(1)、及び、含フッ素有機溶剤(2)を含有してなる
処理液(M)を、前記下地層の上に塗布することを特徴
とする基材の表面処理方法。 【化2】 式中、Rf は、パーフルオロアルキル基を表す。Zは、
フッ素又はトリフルオロメチル基を表す。a、b、c、
d、eは、それぞれ独立して、0又は1以上の整数を表
し、a+b+c+d+eは、少なくとも1以上であり、
a、b、c、d、eでくくられた各繰り返し単位の存在
順序は、式中において限定されない。Yは、水素又は炭
素数1〜4のアルキル基を表す。Xは、水素、臭素又は
ヨウ素を表す。R1 は、水酸基又は加水分解可能な置換
基を表す。R2 は、水素又は1価の炭化水素基を表す。
lは、0、1又は2を表す。mは、1、2又は3を表
す。nは、1以上の整数を表す。
2. A treatment liquid (N) containing a silane compound [excluding the silicon-containing organic fluorine-containing polymer (1) represented by the following general formula (1)] (3) on the surface of the substrate. After coating to form a base layer, a treatment liquid (M) containing a silicon-containing organic fluorine-containing polymer (1) represented by the following general formula (1) and a fluorine-containing organic solvent (2). Is applied on the base layer. Embedded image In the formula, Rf represents a perfluoroalkyl group. Z is
Represents a fluorine or trifluoromethyl group. a, b, c,
d and e each independently represent an integer of 0 or 1 or more, and a + b + c + d + e is at least 1 or more,
The order in which the repeating units a, b, c, d, and e are present is not limited in the formula. Y represents hydrogen or an alkyl group having 1 to 4 carbon atoms. X represents hydrogen, bromine or iodine. R 1 represents a hydroxyl group or a hydrolyzable substituent. R 2 represents hydrogen or a monovalent hydrocarbon group.
l represents 0, 1 or 2. m represents 1, 2 or 3. n represents an integer of 1 or more.
【請求項3】 ケイ素含有有機含フッ素ポリマーが、分
子量5×102 〜1×105 であるものである請求項1
又は2記載の表面処理方法。
3. The silicon-containing organic fluorine-containing polymer has a molecular weight of 5 × 10 2 to 1 × 10 5.
Or the surface treatment method described in 2.
【請求項4】 ケイ素含有有機含フッ素ポリマー(1)
が、下記一般式(II)で表されるケイ素含有有機含フ
ッ素ポリマーである請求項1又は2記載の表面処理方
法。 【化3】 式中、pは、1以上の整数を表す。Yは、水素又は炭素
数1〜4のアルキル基を表す。Xは、水素、臭素又はヨ
ウ素を表す。R1 は、水酸基又は加水分解可能な置換基
を表す。R2 は、水素又は1価の炭化水素基を表す。l
は、0、1又は2を表す。mは、1、2又は3を表す。
nは、1以上の整数を表す。
4. A silicon-containing organic fluorine-containing polymer (1)
Is a silicon-containing organic fluorine-containing polymer represented by the following general formula (II), The surface treatment method according to claim 1 or 2. Embedded image In the formula, p represents an integer of 1 or more. Y represents hydrogen or an alkyl group having 1 to 4 carbon atoms. X represents hydrogen, bromine or iodine. R 1 represents a hydroxyl group or a hydrolyzable substituent. R 2 represents hydrogen or a monovalent hydrocarbon group. l
Represents 0, 1 or 2. m represents 1, 2 or 3.
n represents an integer of 1 or more.
【請求項5】 ケイ素含有有機含フッ素ポリマーが、分
子量5×102 〜1×105 であるものである請求項4
記載の表面処理方法。
5. The silicon-containing organic fluorine-containing polymer has a molecular weight of 5 × 10 2 to 1 × 10 5.
The surface treatment method described.
JP8031393A 1995-08-11 1996-01-24 Surface treatment method Expired - Fee Related JP2860979B2 (en)

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JP8031393A JP2860979B2 (en) 1996-01-24 1996-01-24 Surface treatment method
PCT/JP1996/002274 WO1997007155A1 (en) 1995-08-11 1996-08-12 Silicon-containing organic fluoropolymers and use of the same
US09/011,579 US6183872B1 (en) 1995-08-11 1996-08-12 Silicon-containing organic fluoropolymers and use of the same
DE69624923T DE69624923T2 (en) 1995-08-11 1996-08-12 ORGANIC FLUORINE POLYMERS CONTAINING SILICON AND THEIR USE
EP19960926624 EP0844265B1 (en) 1995-08-11 1996-08-12 Silicon-containing organic fluoropolymers and use of the same

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