JPH0920501A - Method and apparatus for producing ultra-high purity water - Google Patents
Method and apparatus for producing ultra-high purity waterInfo
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- JPH0920501A JPH0920501A JP17063895A JP17063895A JPH0920501A JP H0920501 A JPH0920501 A JP H0920501A JP 17063895 A JP17063895 A JP 17063895A JP 17063895 A JP17063895 A JP 17063895A JP H0920501 A JPH0920501 A JP H0920501A
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Abstract
(57)【要約】
【目的】 システムを単純化でき、運転管理の維持コス
トを低減できるとともに、有機物質等を含む不純物を極
限まで低減する。
【構成】 大気から隔絶された耐食性の燃焼チャンバ
1、冷却部4、凝縮部5及びトラップ部6を有し、燃焼
チャンバ1、冷却部4、凝縮部5及びトラップ部6等の
装置内部を高真空に排気し、この装置内部を不活性ガス
で置換した後、液体水素と液体酸素とを原料とする超高
純度水素ガス及び酸素ガスを所定の比率で混合しながら
燃焼チャンバ1で燃焼させることによりH2Oガスを生
成し、この高温のH2Oガスを予備冷却板3により予備
冷却された後、冷却部4で冷却して蒸気化し、凝縮部5
で凝結して超高純度水を生成する。
(57) [Summary] [Purpose] The system can be simplified, the maintenance cost of operation management can be reduced, and impurities including organic substances can be reduced to the utmost limit. [Structure] A corrosion-resistant combustion chamber 1 isolated from the atmosphere, a cooling unit 4, a condensing unit 5 and a trap unit 6 are provided, and the interior of the apparatus such as the combustion chamber 1, the cooling unit 4, the condensing unit 5 and the trap unit 6 is elevated. After evacuating to a vacuum and replacing the inside of this apparatus with an inert gas, burning in the combustion chamber 1 while mixing ultra-high-purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials at a predetermined ratio. To generate H 2 O gas, and the high temperature H 2 O gas is pre-cooled by the pre-cooling plate 3 and then cooled in the cooling unit 4 to be vaporized and then condensed in the condensing unit 5.
Condenses at to produce ultrapure water.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、超高純度水の製造
方法およびその装置に関し、さらに詳しくは、液体水素
と液体酸素を原料とする超高純度水素ガス及び酸素ガス
を所定の比率で混合して燃焼させ、その燃焼ガスを冷
却、凝縮することにより超高純度水を製造する方法およ
びその装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing ultra-high purity water and an apparatus therefor, and more specifically, it mixes liquid hydrogen and ultra-high purity hydrogen gas made from liquid oxygen as raw materials and oxygen gas at a predetermined ratio. The present invention relates to a method for producing ultra-high-purity water and an apparatus therefor by burning and burning the same, cooling and condensing the combustion gas.
【0002】[0002]
【従来の技術】DNA培養等のバイオアッセイ用の水、
医薬製造用の水及びエレクトニクス用の超精密洗浄水等
には、総有機炭素量を含む不純物の極めて少ない超高純
度水が不可欠のものである。従来、この種の超純水を製
造するに際しては、凝集、濾過、イオン交換、脱気出、
逆浸透、蒸留、紫外線分解等の単位操作を組み合わせ
て、所望の純水製造能力を有する最適なプロセスになる
ように設計し、このプロセスを利用して原水から超純水
を生成するようにしていた。Water for bioassay such as DNA culture,
Ultrahigh-purity water containing extremely few impurities including the total amount of organic carbon is indispensable for water for pharmaceutical production, ultraprecision cleaning water for electronics, and the like. Conventionally, when producing this kind of ultrapure water, coagulation, filtration, ion exchange, degassing,
By combining unit operations such as reverse osmosis, distillation, and ultraviolet decomposition to design an optimal process that has the desired pure water production capacity, this process is used to generate ultrapure water from raw water. It was
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記の
ような従来の超純水の製造プロセスでは、装置が複雑で
大掛かりになるほか、運転の維持及び管理に多くの時間
と人手を要し、装置の運転管理コストが上昇する問題が
ある。特に装置を構成する材質から溶出する金属イオン
や有機性物質等の不純物の低減には限界があり、DNA
培養等のバイオアッセイ用水や医薬製造用水などに適用
される超高純度水の製造には限界があった。However, in the above-mentioned conventional ultrapure water production process, the equipment is complicated and large-scaled, and much time and manpower are required to maintain and manage the operation. There is a problem that the operation management cost of In particular, there is a limit to the reduction of impurities such as metal ions and organic substances that are eluted from the materials that make up the device.
There has been a limit to the production of ultra-high purity water applied to water for bioassay such as culture and water for pharmaceutical production.
【0004】本発明は、前記事情に鑑みてなされたもの
で、その目的とするところは、システムを単純化でき、
運転管理の維持コストを低減できるとともに、有機物質
等を含む不純物を極限まで低減し得る超高純度水の製造
方法及びその装置を提供することにある。The present invention has been made in view of the above circumstances, and an object of the present invention is to simplify a system.
An object of the present invention is to provide a method and an apparatus for producing ultra-high-purity water, which can reduce the maintenance cost of operation management and can reduce impurities including organic substances to the utmost.
【0005】[0005]
【課題を解決するための手段】前記目的を達成するため
に請求項1の発明は、超高純度水の製造方法であって、
大気から隔絶された燃焼チャンバ内に液体水素と液体酸
素を原料とする超高純度水素ガス及び酸素ガスを所定の
比率で混合しながら供給して燃焼させることによりH2
Oガスを生成し、このH2Oガスを大気から隔絶された
冷却部で冷却して蒸気化した後、このH2O蒸気を大気
から隔絶された凝縮部で凝結して超高純度水を生成する
ことを特徴とする。In order to achieve the above object, the invention of claim 1 is a method for producing ultra high purity water,
H 2 is produced by mixing and supplying ultra-high purity hydrogen gas and oxygen gas, which are liquid hydrogen and liquid oxygen as raw materials, in a combustion chamber isolated from the atmosphere at a predetermined ratio and burning the mixture.
O gas is generated, and this H 2 O gas is cooled in a cooling section isolated from the atmosphere to be vaporized, and then this H 2 O vapor is condensed in a condensation section isolated from the atmosphere to obtain ultra-high purity water. It is characterized by generating.
【0006】請求項2の発明は、超高純度水の製造方法
おいて、大気から隔絶された燃焼チャンバ、冷却部及び
凝縮部を有し、前記燃焼チャンバ、冷却部及び凝縮部の
内部を高真空に排気し、その後、該燃焼チャンバ、冷却
部及び凝縮部内に不活性ガスを導入して内部を不活性ガ
スにより置換し、しかる後、前記燃焼チャンバ内に液体
水素と液体酸素を原料とする超高純度水素ガス及び酸素
ガスを所定の比率で混合しながら供給して燃焼させるこ
とによりH2Oガスを生成し、このH2Oガスを前記冷却
部で冷却して蒸気化し、このH2O蒸気を前記凝縮部で
凝結して超高純度水を生成することを特徴とする。According to a second aspect of the present invention, there is provided a method for producing ultra-high purity water, comprising a combustion chamber, a cooling section and a condenser section which are isolated from the atmosphere, and the inside of the combustion chamber, the cooling section and the condenser section is elevated. After exhausting to a vacuum, an inert gas is introduced into the combustion chamber, the cooling unit, and the condensing unit to replace the inside with the inert gas, and thereafter, liquid hydrogen and liquid oxygen are used as raw materials in the combustion chamber. generating H 2 O gas by feeding and burning with mixing ultrahigh purity hydrogen gas and oxygen gas at a predetermined ratio, vaporized the the H 2 O gas is cooled by the cooling section, the H 2 It is characterized in that O vapor is condensed in the condensing section to generate ultra-high purity water.
【0007】請求項3の発明は、請求項1または2記載
の超高純度水の製造方法において、前記燃焼チャンバ、
冷却部及び凝縮部を耐蝕性の金属から構成し、かつこれ
ら燃焼チャンバ、冷却部及び凝縮部の内壁面を0.05μ
以下の面粗度に仕上げたことを特徴とする。請求項4の
発明は、請求項1または2記載の超高純度水の製造方法
において、前記燃焼チャンバ、冷却部及び凝縮部は冷媒
が循環される冷却ジャケットを有するものである。According to a third aspect of the present invention, in the method for producing ultra-high purity water according to the first or second aspect, the combustion chamber,
The cooling part and the condensing part are made of corrosion-resistant metal, and the inner wall surfaces of these combustion chamber, cooling part and condensing part are 0.05 μm.
It is characterized by finishing to the following surface roughness. According to a fourth aspect of the present invention, in the method for producing ultra-high purity water according to the first or second aspect, the combustion chamber, the cooling unit and the condensing unit have a cooling jacket through which a refrigerant is circulated.
【0008】請求項5の発明は、超高純度水の製造装置
であって、冷却ジャケット付きの燃焼チャンバと、前記
燃焼チャンバ内に突出して設けられ、液体水素供給源及
び液体酸素供給源から供給される液体水素及び液体酸素
を原料とする超高純度水素ガス及び酸素ガスを所定の比
率で混合しながら燃焼させる耐蝕、耐熱性の燃焼バーナ
と、前記燃焼チャンバ内に前記燃焼バーナによる燃焼炎
の前方に位置して配置され、前記燃焼バーナから発生す
る高温のH2Oガスを予備冷却する耐蝕性の予備冷却板
と、前記燃焼チャンバのH2Oガス流出側に連結され、
H2Oガスを冷却して蒸気化する冷却ジャケット付きの
冷却部と、前記冷却部の蒸気化ガス流出側に連結され、
蒸気化されたH2Oガスを凝結する冷却ジャケット付き
の凝縮部と、前記凝縮部で凝結された超高純度水を分離
して捕集するトラップ部とを備えてなるものである。According to a fifth aspect of the present invention, there is provided an apparatus for producing ultra-high purity water, which comprises a combustion chamber with a cooling jacket, a projection provided in the combustion chamber, and a liquid hydrogen supply source and a liquid oxygen supply source. Corrosion-resistant and heat-resistant combustion burner that burns while mixing ultra-high-purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials at a predetermined ratio, and a combustion flame of the combustion burner in the combustion chamber. A corrosion-resistant pre-cooling plate, which is disposed in front and pre-cools the high-temperature H 2 O gas generated from the combustion burner, and is connected to the H 2 O gas outflow side of the combustion chamber,
A cooling part with a cooling jacket for cooling and vaporizing H 2 O gas, and a cooling gas outflow side of the cooling part,
It comprises a condensing section with a cooling jacket for condensing vaporized H 2 O gas, and a trap section for separating and collecting ultra-high purity water condensed in the condensing section.
【0009】請求項6の発明は、請求項5記載の超高純
度水の製造装置において、前記燃焼チャンバ、冷却部及
び凝縮部を耐蝕性の金属から構成し、かつこれら燃焼チ
ャンバ、冷却部及び凝縮部の内壁面を0.05μ以下の面
粗度に仕上げたものである。請求項7の発明は、請求項
5記載の超高純度水の製造装置において、前記凝縮部の
前記トラップ部側から流出する未処理ガスを無害化処理
して大気に放出する排気処理装置を更に備えてなるもの
である。According to a sixth aspect of the present invention, in the apparatus for producing ultra-high purity water according to the fifth aspect, the combustion chamber, the cooling unit and the condensing unit are made of a corrosion resistant metal, and these combustion chamber, cooling unit and The inner wall surface of the condenser is finished to have a surface roughness of 0.05 μ or less. The invention of claim 7 is the apparatus for producing ultra-high purity water according to claim 5, further comprising an exhaust treatment device for detoxifying the untreated gas flowing out from the trap portion side of the condenser portion and discharging it to the atmosphere. Be prepared.
【0010】請求項8の発明は、請求項5記載の超高純
度水の製造装置において、前記燃焼チャンバ、冷却部、
凝縮部及びトラップ部の内部を高真空に排気して不活性
ガスで置換した後、超高純度水の生成処理に移行される
ようにしたものである。According to an eighth aspect of the invention, in the apparatus for producing ultra-high purity water according to the fifth aspect, the combustion chamber, the cooling unit,
The inside of the condensing part and the trap part is evacuated to a high vacuum, and after being replaced with an inert gas, the process is shifted to a generation process of ultra-high purity water.
【0011】上記のように構成された本発明において
は、液体水素と液体酸素とを原料とする超高純度水素ガ
ス及び酸素ガスを所定の比率で混合しながら燃焼チャン
バで燃焼させることによりH2Oガスを生成し、このH2
Oガスを冷却して蒸気化した後、凝縮部で凝結するか
ら、有機物質等を含む不純物を極限まで低減した超高純
度水を得ることができる。In the present invention configured as described above, H 2 is produced by burning in the combustion chamber while mixing ultra-high-purity hydrogen gas and oxygen gas, which are liquid hydrogen and liquid oxygen as raw materials, at a predetermined ratio. O gas is generated and this H 2
After the O gas is cooled and vaporized, it is condensed in the condensing section, so that it is possible to obtain ultra-high-purity water in which impurities including organic substances are reduced to the utmost limit.
【0012】また、本発明においては、燃焼チャンバ、
冷却部、凝縮部及びトラップ部等の装置内部を高真空に
排気し、この装置内部を不活性ガスで置換した後、超高
純度水の生成処理を行うから、装置内からの有機物質等
を含む不純物の発生が抑制され、更に有機物質等を含む
不純物を極限まで低減した超高純度水を得ることができ
る。Further, in the present invention, the combustion chamber,
After exhausting the inside of the device such as the cooling part, the condensing part, and the trap part to a high vacuum and replacing the inside of this device with an inert gas, the ultra high-purity water generation process is performed. It is possible to obtain ultra-high-purity water in which the generation of impurities containing is suppressed and the impurities containing organic substances are reduced to the utmost limit.
【0013】また、本発明においては、燃焼チャンバ、
冷却部及び凝縮部等を耐蝕性の金属から構成し、これら
燃焼チャンバ、冷却部及び凝縮部等の内壁面を0.05μ
以下の面粗度に仕上げることにより、装置内面に有機物
質等を含む不純物が付着するのを大幅に抑制でき、かつ
装置内面から金属イオン等が溶出するのを大幅に抑制で
きる。Further, in the present invention, the combustion chamber,
The cooling and condensing parts are made of corrosion-resistant metal, and the inner wall surfaces of these combustion chambers, cooling and condensing parts are
By finishing the surface roughness as described below, it is possible to significantly suppress the adhesion of impurities including an organic substance and the like to the inner surface of the device, and to significantly suppress the elution of metal ions and the like from the inner surface of the device.
【0014】また、本発明においては、排気処理装置を
設けることにより、装置内で液化されない未処理ガスを
無害化処理して大気に放出することができる。Further, in the present invention, by providing the exhaust treatment device, the untreated gas which is not liquefied in the device can be detoxified and released to the atmosphere.
【0015】[0015]
【発明の実施の形態】以下、本発明の実施例を図面に基
づいて説明する。図1は、本発明方法を適用した超高純
度水の製造装置の一例を示す全体の構成図である。図1
において、超高純度水の製造装置は、H2Oガスを生成
する燃焼チャンバ1、燃焼バーナ2、予備冷却板3、冷
却部4、凝縮部5、トラップ部6及び排気処理装置7を
備える。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an overall configuration diagram showing an example of an apparatus for producing ultra-high purity water to which the method of the present invention is applied. FIG.
In the above, the apparatus for producing ultra-high purity water includes a combustion chamber 1 for generating H 2 O gas, a combustion burner 2, a precooling plate 3, a cooling unit 4, a condensing unit 5, a trap unit 6 and an exhaust treatment device 7.
【0016】燃焼チャンバ1は、水素と酸素を燃焼させ
てH2Oガスを生成するもので、ステンレス、金または
プラチナ等の耐蝕性金属、もしくは全内壁面を金または
プラチナ等の耐蝕性金属層でコーテングしたものから構
成され、更にその全内壁面は0.05μ以下の面粗度に仕
上げられているとともに、その外周囲には冷媒を強制循
環できる周知の冷却ジャケット(図示省略)が設けられ
ている。また、燃焼チャンバ1には、ヘリウム等の不活
性ガスを導入するための不活性ガス導入口8が設けら
れ、この不活性ガス導入口8には開閉弁9を介して不活
性ガス供給源10が接続されている。The combustion chamber 1 burns hydrogen and oxygen to produce H 2 O gas, and is made of a corrosion-resistant metal such as stainless steel, gold or platinum, or a metal-corrosion-resistant metal layer such as gold or platinum on the entire inner wall surface. The entire inner wall surface is finished to a surface roughness of 0.05μ or less, and a well-known cooling jacket (not shown) that can forcibly circulate the refrigerant is provided on the outer periphery of the inner wall surface. ing. Further, the combustion chamber 1 is provided with an inert gas introduction port 8 for introducing an inert gas such as helium, and the inert gas introduction port 8 is provided with an inert gas supply source 10 through an opening / closing valve 9. Are connected.
【0017】燃焼バーナ2は、流量調整弁11,12を
介して液体水素供給源13及び液体酸素供給源14から
供給される液体水素及び液体酸素を原料とする超高純度
水素ガス及び酸素ガスを所定の比率で混合しながら燃焼
させるもので、その一部は燃焼チャンバ1内に突出して
気密に設けられている。また、この燃焼バーナ2はプラ
チナ等の耐蝕,耐熱性に富む材料から成形されている。The combustion burner 2 supplies liquid hydrogen and ultra-high purity hydrogen gas and oxygen gas, which are liquid oxygen supplied from the liquid hydrogen supply source 13 and the liquid oxygen supply source 14 via the flow rate adjusting valves 11 and 12, respectively. Combustion is carried out while mixing at a predetermined ratio, and a part thereof is projected into the combustion chamber 1 and is provided in an airtight manner. Further, the combustion burner 2 is formed of a material such as platinum which is highly resistant to corrosion and heat.
【0018】予備冷却板3は、燃焼チャンバ1内に燃焼
バーナ2の燃焼炎の前方に位置して配置され、燃焼バー
ナ2から発生する高温のH2Oガスを予備冷却するもの
で、ステンレス、金またはプラチナ等の耐蝕性金属、も
しくは全内壁面を金またはプラチナ等の耐蝕性金属層で
コーテングしたものから構成され、更にその表面は、0.
05μ以下の面粗度に仕上げられている。また、この予
備冷却板3は、図示省略してあるが、燃焼チャンバ1の
外側から予備冷却板3の内部に冷媒を循環させることに
より強制冷却できる構成になっている。The pre-cooling plate 3 is arranged in the combustion chamber 1 in front of the combustion flame of the combustion burner 2 and pre-cools the high temperature H 2 O gas generated from the combustion burner 2. It is composed of a corrosion-resistant metal such as gold or platinum, or one whose inner wall surface is coated with a corrosion-resistant metal layer such as gold or platinum, and the surface of which is 0.
Finished to a surface roughness of 05 μ or less. Although not shown, the preliminary cooling plate 3 is configured to be forcibly cooled by circulating a refrigerant from the outside of the combustion chamber 1 into the preliminary cooling plate 3.
【0019】冷却部4は、予備冷却板3で予備冷却され
たH2Oガスを更に冷却して蒸気化するもので、そのH2
Oガス導入側は燃焼チャンバ1のH2Oガス流出側に連
結されている。また、この冷却部4は、ステンレス、金
またはプラチナ等の耐蝕性金属、もしくは全内壁面を金
またはプラチナ等の耐蝕性金属層でコーテングしたもの
から構成され、更にその全内壁面は0.05μ以下の面粗
度に仕上げられているとともに、その外周囲には冷媒を
強制循環できる周知の冷却ジャケット(図示省略)が設
けられている。The cooling unit 4 is for further vaporized by cooling the precooled the H 2 O gas in the pre-cooling plate 3, Part H 2
The O gas introduction side is connected to the H 2 O gas outflow side of the combustion chamber 1. The cooling unit 4 is composed of a corrosion-resistant metal such as stainless steel, gold or platinum, or a whole inner wall surface coated with a corrosion-resistant metal layer such as gold or platinum, and the entire inner wall surface is 0.05 μm. In addition to being finished to the following surface roughness, a well-known cooling jacket (not shown) that can forcibly circulate the refrigerant is provided on the outer periphery thereof.
【0020】凝縮部5は、冷却部4で蒸気化されたH2
Oガスを更に冷却して凝結することにより超高純度水を
生成するもので、その蒸気ガス導入側は冷却部4の蒸気
ガス流出側に連結されている。また、この凝縮部5は、
ステンレス、金またはプラチナ等の耐蝕性金属、もしく
は全内壁面を金またはプラチナ等の耐蝕性金属層でコー
テングしたものから構成され、更にその全内壁面は0.0
5μ以下の面粗度に仕上げられているとともに、その外
周囲には冷媒を強制循環できる周知の冷却ジャケット
(図示省略)が設けられている。The condensing section 5 contains H 2 vaporized in the cooling section 4.
Ultra-high purity water is produced by further cooling and condensing the O gas, and its steam gas introduction side is connected to the steam gas outflow side of the cooling unit 4. In addition, the condenser 5
It is made of corrosion-resistant metal such as stainless steel, gold or platinum, or the whole inner wall surface coated with a corrosion-resistant metal layer such as gold or platinum, and the entire inner wall surface is 0.0
The surface roughness is 5 μm or less, and a well-known cooling jacket (not shown) capable of forcibly circulating the refrigerant is provided on the outer periphery thereof.
【0021】トラップ部6は、凝縮部5で凝結された超
高純度水を分離して捕集するするもので、このトラップ
部6の一端は、高真空排気口15a及び未処理ガス流出
口15bを有する連結管15を介して凝縮部5の超高純
度水流出側に連結され、トラップ部6の他端には超高純
度水取りだし用の開閉弁16が設けられている。また、
このトラップ部6は、ステンレス、金またはプラチナ等
の耐蝕性金属、もしくは全内壁面を金またはプラチナ等
の耐蝕性金属層でコーテングしたものから構成され、更
にその全内壁面は0.05μ以下の面粗度に仕上げられて
いる。更に、連結管14も同様にステンレス、金または
プラチナ等の耐蝕性金属、もしくは全内壁面を金または
プラチナ等の耐蝕性金属層でコーテングしたものから構
成され、更にその全内壁面は0.05μ以下の面粗度に仕
上げられている。The trap portion 6 separates and collects the ultra-high purity water condensed in the condenser portion 5. One end of the trap portion 6 has a high vacuum exhaust port 15a and an untreated gas outlet port 15b. Is connected to the outflow side of the ultra-high-purity water of the condensing part 5 via a connecting pipe 15 having the above, and an opening / closing valve 16 for taking out the ultra-high-purity water is provided at the other end of the trap part 6. Also,
The trap portion 6 is composed of a corrosion-resistant metal such as stainless steel, gold or platinum, or a whole inner wall surface coated with a corrosion-resistant metal layer such as gold or platinum, and the entire inner wall surface is 0.05 μm or less. It is finished to surface roughness. Further, the connecting pipe 14 is also composed of a corrosion resistant metal such as stainless steel, gold or platinum, or a whole inner wall surface coated with a corrosion resistant metal layer such as gold or platinum, and the entire inner wall surface is 0.05 μm. The surface roughness is as follows.
【0022】前記連結管15の高真空排気口15aに
は、開閉弁17を介して真空ポンプ18が接続され、ま
た、連結管15の未処理ガス流出口15bには、開閉弁
19を介して未処理ガスを無害化処理する排気処理装置
7が接続されている。A vacuum pump 18 is connected to the high vacuum exhaust port 15a of the connecting pipe 15 via an opening / closing valve 17, and an unprocessed gas outlet 15b of the connecting pipe 15 is connected via an opening / closing valve 19. An exhaust treatment device 7 for detoxifying the untreated gas is connected.
【0023】次に、上記のように構成された本実施例に
よる超高純度水の生成処理について説明する。超高純度
水の生成に際しては、まず、開閉弁9、流量調整弁1
1, 2、開閉弁16,19を閉じ、開閉弁17開いた
状態で真空ポンプ18を起動し、燃焼チャンバ1、冷却
部4及び凝縮部5、連結管15及びトラップ部6の内部
を10-6Pa以下の高真空に排気することにより、内部
の大気及び不純物を除去し、真空ポンプ18を停止して
開閉弁17を閉じる。しかる後、開閉弁9を開き、不活
性ガス供給源10から不活性ガス導入口8を通してヘリ
ウム等の不活性ガスを燃焼チャンバ1、冷却部4及び凝
縮部5、連結管15及びトラップ部6の内部に大気圧に
なるまで導入し、これらの内部を不活性ガスにより置換
する。Next, the process for producing ultra-high purity water according to this embodiment having the above-mentioned structure will be described. When generating ultra-high purity water, first the on-off valve 9 and the flow rate adjustment valve 1
1, 2, off valves 16 and 19 closed, to start the vacuum pump 18 in a state of open close valve 17, the combustion chamber 1, the cooling unit 4 and the condenser 5, the connection pipe 15 and the interior 10 of the trap portion 6 - By exhausting to a high vacuum of 6 Pa or less, the atmosphere and impurities inside are removed, the vacuum pump 18 is stopped, and the on-off valve 17 is closed. After that, the on-off valve 9 is opened, and an inert gas such as helium is supplied from the inert gas supply source 10 through the inert gas inlet 8 to the combustion chamber 1, the cooling unit 4, the condensing unit 5, the connecting pipe 15, and the trap unit 6. It is introduced into the interior until the atmospheric pressure is reached, and these interiors are replaced with an inert gas.
【0024】その後、開閉弁19を開き、かつ流量調整
弁11、12を開いて液体水素供給源13及び液体酸素
供給源14から液体水素及び液体酸素を原料とする超高
純度水素ガス及び酸素ガスを所定の比率、例えば2:1
の比率、さらに詳しくは、この比率より液体酸素を原料
とする酸素ガスを多めにした比率で燃焼バーナ2に供給
し、この液体水素と液体酸素を原料とする超高純度水素
ガス及び酸素ガスを混合して燃焼させる。この時の燃焼
チャンバ1内燃焼ガス温度は、1500℃〜2500℃
である。After that, the on-off valve 19 is opened, and the flow rate adjusting valves 11 and 12 are opened so that the liquid hydrogen supply source 13 and the liquid oxygen supply source 14 supply ultra-high purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials. A predetermined ratio, for example 2: 1
More specifically, the oxygen gas containing liquid oxygen as a raw material is supplied to the combustion burner 2 at a ratio higher than this ratio, and the liquid hydrogen and the ultra-high purity hydrogen gas and oxygen gas containing liquid oxygen as raw materials are supplied. Mix and burn. The combustion gas temperature in the combustion chamber 1 at this time is 1500 ° C to 2500 ° C.
It is.
【0025】液体水素と液体酸素を原料とする超高純度
水素ガス及び酸素ガスの燃焼により生成される高温のH
2Oガスは予備冷却板3により予備冷却された後、その
H2Oガスは冷却部4へ流動し、この冷却部4を通過す
る間に冷却されて蒸気化される。H2Oガスを含むH2O
蒸気は更に凝縮部5へ流動し、この凝縮部5を通過する
間に凝結されて液化し、この液化による超高純度水20
はH2Oガスと分離されたトラップ部6に捕集される。High-temperature H produced by combustion of ultra-high-purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials
The 2 O gas is pre-cooled by the pre-cooling plate 3, and then the H 2 O gas flows into the cooling section 4 and is cooled and vaporized while passing through the cooling section 4. H 2 O containing H 2 O gas
The vapor further flows to the condensing part 5, is condensed and liquefied while passing through the condensing part 5, and the ultra-high-purity water 20 resulting from this liquefaction is obtained.
Are collected in the trap portion 6 separated from the H 2 O gas.
【0026】一方、液化されないH2Oガス等の未処理
ガスは未処理ガス流出口15b及び開閉弁19を通して
排気処理装置7に送られ、この排気処理装置7で無害化
処理して大気に放出される。On the other hand, untreated gas such as H 2 O gas which is not liquefied is sent to the exhaust treatment device 7 through the untreated gas outlet 15b and the on-off valve 19, and is detoxified by the exhaust treatment device 7 and released to the atmosphere. To be done.
【0027】このような本実施例においては、燃焼チャ
ンバ1、冷却部4、凝縮部5及びトラップ部6等の装置
内部を高真空に排気し、この装置内部を不活性ガスで置
換した後、液体水素と液体酸素とを原料とする超高純度
水素ガス及び酸素ガスを所定の比率で混合しながら燃焼
チャンバ1で燃焼させることによりH2Oガスを生成
し、この高温のH2Oガスを予備冷却板3により予備冷
却された後、冷却部4で冷却して蒸気化し、凝縮部5で
凝結して超高純度水の生成するから、従来のように原水
から超純水を生成する場合と異なり、有機物質等を含む
不純物を極限まで低減した超高純度水を得ることができ
るほか、従来のように、凝集、濾過、イオン交換、脱気
出、逆浸透、蒸留、紫外線分解等の単位装置が不要にる
ため、装置が簡単になり、装置の運転管理、保守、維持
が簡便になって低コスト化できる。In this embodiment, the inside of the apparatus such as the combustion chamber 1, the cooling section 4, the condenser section 5 and the trap section 6 is evacuated to a high vacuum and the inside of the apparatus is replaced with an inert gas. a liquid hydrogen and liquid oxygen to produce H 2 O gas by combusting the ultra-high purity hydrogen gas and oxygen gas as a raw material in the combustion chamber 1 while mixing at a predetermined ratio, H 2 O gas in the high-temperature After being pre-cooled by the pre-cooling plate 3, it is cooled and vaporized in the cooling unit 4 and condensed in the condensing unit 5 to generate ultra-high-purity water. In addition to being able to obtain ultra-high-purity water in which impurities including organic substances are reduced to the limit, unlike conventional methods, such as coagulation, filtration, ion exchange, degassing, reverse osmosis, distillation, and UV decomposition can be performed. Easy to use because no unit is required Ri, operation management apparatus, maintenance, maintenance can be cost becomes easy.
【0028】また、本実施例においては、燃焼チャンバ
1、冷却部4及び凝縮部5及びトラップ部6等を耐蝕性
の金属から構成し、これら燃焼チャンバ、冷却部、凝縮
部及びトラップ部6等の内壁面を0.05μ以下の面粗度
に仕上げることにより、装置内面に有機物質等を含む不
純物が付着するのを大幅に抑制でき、かつ装置内面から
金属イオン等が溶出するのを大幅に抑制できる。Further, in the present embodiment, the combustion chamber 1, the cooling unit 4, the condensing unit 5, the trap unit 6 and the like are made of corrosion-resistant metal, and the combustion chamber, the cooling unit, the condensing unit and the trap unit 6 and the like are provided. By finishing the inner wall surface of the machine to a surface roughness of 0.05μ or less, it is possible to greatly suppress the adhesion of impurities including organic substances to the inner surface of the device and to significantly elute metal ions, etc. from the inner surface of the device. Can be suppressed.
【0029】また、本実施例においては、排気処理装置
7により、装置内で液化されない未処理ガスを無害化処
理して大気に放出することができる。Further, in the present embodiment, the exhaust treatment device 7 can detoxify untreated gas that is not liquefied in the device and release it to the atmosphere.
【0030】なお、上記実施例では、燃焼チャンバ1、
冷却部4、凝縮部5及びトラップ部6等の装置内部を高
真空に排気し、この装置内部を不活性ガスで置換した
後、超高純度水の生成に移行する場合について説明した
が、本発明はこれに限定されず、上述する装置内の高真
空排気工程による装置内部の不活性ガス置換工程を省略
し、常圧にて長時間不活性ガスによる置換工程のみでも
よい。In the above embodiment, the combustion chamber 1,
The case of evacuating the inside of the device such as the cooling part 4, the condensing part 5 and the trap part 6 to a high vacuum, replacing the inside of the device with an inert gas, and then shifting to the generation of ultra-high purity water has been described. The invention is not limited to this, and the inert gas replacement step inside the apparatus by the high vacuum evacuation step inside the apparatus described above may be omitted and only the replacement step with the inert gas at normal pressure for a long time may be performed.
【0031】[0031]
【発明の効果】以上説明したように本発明によれば、液
体水素と液体酸素とを原料とする超高純度水素ガス及び
酸素ガスを所定の比率で混合しながら燃焼チャンバで燃
焼させることによりH2Oガスを生成し、このH2Oガス
を冷却して蒸気化した後、凝縮部で凝結するから、有機
物質等を含む不純物を極限まで低減した超高純度水を得
ることができる。As described above, according to the present invention, the ultra-high purity hydrogen gas and the oxygen gas, which are made of liquid hydrogen and liquid oxygen as raw materials, are mixed in a predetermined ratio and burned in the combustion chamber. Since 2 O gas is generated, and this H 2 O gas is cooled and vaporized and then condensed in the condensing part, it is possible to obtain ultra-high purity water in which impurities including organic substances and the like are reduced to the utmost limit.
【0032】また、本発明によれば、燃焼チャンバ、冷
却部、凝縮部及びトラップ部等の装置内部を高真空に排
気し、この装置内部を不活性ガスで置換した後、超高純
度水の生成処理を行うから、装置内からの有機物質等を
含む不純物の発生が抑制され、更に有機物質等を含む不
純物を極限まで低減した超高純度水を得ることができ
る。Further, according to the present invention, the inside of the apparatus such as the combustion chamber, the cooling section, the condenser section and the trap section is evacuated to a high vacuum, the inside of the apparatus is replaced with an inert gas, and then ultra-high purity water is added. Since the generation treatment is performed, generation of impurities containing an organic substance or the like from the inside of the apparatus is suppressed, and ultrapure water in which impurities containing an organic substance or the like are reduced to the utmost limit can be obtained.
【0033】また、本発明によれば、燃焼チャンバ、冷
却部及び凝縮部等を耐蝕性の金属から構成し、これら燃
焼チャンバ、冷却部及び凝縮部等の内壁面を0.05μ以
下の面粗度に仕上げることにより、装置内面に有機物質
等を含む不純物が付着するのを大幅に抑制でき、かつ装
置内面から金属イオン等が溶出するのを大幅に抑制でき
るほか、装置が簡単になり、装置の運転管理、保守、維
持が簡便になる。Further, according to the present invention, the combustion chamber, the cooling part, the condensing part, etc. are made of a corrosion-resistant metal, and the inner wall surfaces of the combustion chamber, the cooling part, the condensing part, etc. have a surface roughness of 0.05 μm or less. By gradually finishing, impurities such as organic substances can be largely prevented from adhering to the inner surface of the device, and elution of metal ions from the inner surface of the device can be greatly suppressed. The operation management, maintenance, and maintenance will be simplified.
【0034】また、本発明にによれば、排気処理装置を
設けることにより、装置内で液化されない未処理ガスを
無害化処理して大気に放出することができるいう効果を
有する。Further, according to the present invention, by providing the exhaust treatment device, the untreated gas which is not liquefied in the device can be detoxified and released to the atmosphere.
【図1】本発明方法を適用した超高純度水の製造装置の
一例を示す全体の構成図である。FIG. 1 is an overall configuration diagram showing an example of an apparatus for producing ultra-high purity water to which the method of the present invention is applied.
1 燃焼チャンバ 2 燃焼バーナ 3 予備冷却板 4 冷却部 5 凝縮部 6 トラップ部 7 排気処理装置 8 不活性ガス導入口 10 不活性ガス供給源 13 液体水素供給源 14 液体酸素供給源 18 真空ポンプ DESCRIPTION OF SYMBOLS 1 Combustion chamber 2 Combustion burner 3 Precooling plate 4 Cooling part 5 Condensing part 6 Trap part 7 Exhaust treatment device 8 Inert gas introduction port 10 Inert gas supply source 13 Liquid hydrogen supply source 14 Liquid oxygen supply source 18 Vacuum pump
Claims (8)
体水素と液体酸素を原料とする超高純度水素ガス及び酸
素ガスを所定の比率で混合しながら供給して燃焼させる
ことによりH2Oガスを生成し、このH2Oガスを大気か
ら隔絶された冷却部で冷却して蒸気化した後、このH2
O蒸気を大気から隔絶された凝縮部で凝結して超高純度
水を生成することを特徴とする超高純度水の製造方法。1. An H 2 O gas is produced by mixing and supplying ultra-high-purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials in a combustion chamber isolated from the atmosphere while mixing them at a predetermined ratio. generates, after vaporized this the H 2 O gas is cooled in a cooling unit which is isolated from the atmosphere, the H 2
A method for producing ultra-high-purity water, which comprises producing ultra-high-purity water by condensing O vapor in a condensing section isolated from the atmosphere.
部及び凝縮部を有し、前記燃焼チャンバ、冷却部及び凝
縮部の内部を高真空に排気し、その後、該燃焼チャン
バ、冷却部及び凝縮部内に不活性ガスを導入して内部を
不活性ガスにより置換し、しかる後、前記燃焼チャンバ
内に液体水素と液体酸素を原料とする超高純度水素ガス
及び酸素ガスを所定の比率で混合しながら供給して燃焼
させることによりH2Oガスを生成し、このH2Oガスを
前記冷却部で冷却して蒸気化し、このH2O蒸気を前記
凝縮部で凝結して超高純度水を生成することを特徴とす
る超高純度水の製造方法。2. A combustion chamber, a cooling unit and a condensing unit which are isolated from the atmosphere, the inside of the combustion chamber, the cooling unit and the condensing unit is evacuated to a high vacuum, and then the combustion chamber, the cooling unit and the condensing unit. An inert gas is introduced into the part to replace the inside with the inert gas, and then, ultra-high purity hydrogen gas and oxygen gas using liquid hydrogen and liquid oxygen as raw materials are mixed in a predetermined ratio in the combustion chamber. While being supplied and burned, H 2 O gas is generated, the H 2 O gas is cooled in the cooling unit to be vaporized, and the H 2 O vapor is condensed in the condensation unit to produce ultra-high purity water. A method for producing ultra-high-purity water, which comprises producing water.
耐蝕性の金属から構成され、かつこれら燃焼チャンバ、
冷却部及び凝縮部の内壁面は0.05μ以下の面粗度に仕
上げられていることを特徴とする請求項1または2記載
の超高純度水の製造方法。3. The combustion chamber, the cooling unit and the condensing unit are made of a corrosion resistant metal, and the combustion chamber,
The method for producing ultra-high purity water according to claim 1 or 2, wherein the inner wall surfaces of the cooling section and the condensation section are finished to have a surface roughness of 0.05 µ or less.
冷却水が循環される冷却ジャケットを有する請求項1ま
たは2記載の超高純度水の製造方法。4. The method for producing ultra-high purity water according to claim 1, wherein the combustion chamber, the cooling unit and the condensing unit have a cooling jacket through which cooling water is circulated.
前記燃焼チャンバ内に突出して設けられ、液体水素供給
源及び液体酸素供給源から供給される液体水素及び液体
酸素を原料とする超高純度水素ガス及び酸素ガスを所定
の比率で混合しながら燃焼させる耐蝕、耐熱性の燃焼バ
ーナと、前記燃焼チャンバ内に前記燃焼バーナの燃焼炎
の前方に位置して配置され、前記燃焼バーナから発生す
る高温のH2Oガスを予備冷却する耐蝕性の予備冷却板
と、前記燃焼チャンバのH2Oガス流出側に連結され、
H2Oガスを冷却して蒸気化する冷却ジャケット付きの
冷却部と、前記冷却部の蒸気化ガス流出側に連結され、
蒸気化されたH2Oガスを凝結する冷却ジャケット付き
の凝縮部と、前記凝縮部で凝結された超高純度水を分離
して捕集するトラップ部とを備えてなる超高純度水の製
造装置。5. A combustion chamber with a cooling jacket,
The ultra-high-purity hydrogen gas and oxygen gas, which are provided from the liquid hydrogen supply source and the liquid oxygen supply source and are made of liquid hydrogen and liquid oxygen as raw materials, are burned while being mixed at a predetermined ratio. A corrosion-resistant and heat-resistant combustion burner, and a corrosion-resistant precooling which is disposed in front of the combustion flame of the combustion burner in the combustion chamber and precools high-temperature H 2 O gas generated from the combustion burner. A plate connected to the H 2 O gas outlet side of the combustion chamber,
A cooling part with a cooling jacket for cooling and vaporizing H 2 O gas, and a cooling gas outflow side of the cooling part,
Production of ultra-high-purity water comprising a condensing section with a cooling jacket for condensing vaporized H 2 O gas and a trap section for separating and collecting ultra-high-purity water condensed in the condensing section apparatus.
耐蝕性の金属から構成され、かつこれら燃焼チャンバ、
冷却部及び凝縮部の内壁面は0.05μ以下の面粗度に仕
上げられている請求項5記載の超高純度水の製造装置。6. The combustion chamber, the cooling unit and the condensing unit are made of a corrosion resistant metal, and the combustion chamber,
The apparatus for producing ultra-high purity water according to claim 5, wherein the inner wall surfaces of the cooling section and the condensation section are finished to have a surface roughness of 0.05 μ or less.
される未処理ガスを無害化処理して大気に放出する排気
処理装置を更に備える請求項5記載の超高純度水の製造
装置。7. The apparatus for producing ultra-high purity water according to claim 5, further comprising an exhaust treatment device that detoxifies the untreated gas flowing out from the trap portion side of the condenser portion and discharges it to the atmosphere.
トラップ部の内部を高真空に排気して不活性ガスで置換
した後、超高純度水の生成処理に移行される請求項5記
載の超高純度水の製造装置。8. The process according to claim 5, wherein the inside of the combustion chamber, the cooling unit, the condensing unit, and the trap unit is evacuated to a high vacuum and replaced with an inert gas, and then the process of generating ultra-high purity water is performed. Ultra high purity water production equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17063895A JPH0920501A (en) | 1995-07-06 | 1995-07-06 | Method and apparatus for producing ultra-high purity water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17063895A JPH0920501A (en) | 1995-07-06 | 1995-07-06 | Method and apparatus for producing ultra-high purity water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0920501A true JPH0920501A (en) | 1997-01-21 |
Family
ID=15908589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17063895A Pending JPH0920501A (en) | 1995-07-06 | 1995-07-06 | Method and apparatus for producing ultra-high purity water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0920501A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6524934B1 (en) | 1999-10-28 | 2003-02-25 | Lorimer D'arcy H. | Method of manufacture for generation of high purity water vapor |
| US7144826B2 (en) | 2001-04-23 | 2006-12-05 | Mattson Thermal Products | Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment |
-
1995
- 1995-07-06 JP JP17063895A patent/JPH0920501A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6524934B1 (en) | 1999-10-28 | 2003-02-25 | Lorimer D'arcy H. | Method of manufacture for generation of high purity water vapor |
| US7144826B2 (en) | 2001-04-23 | 2006-12-05 | Mattson Thermal Products | Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment |
| DE10119741B4 (en) * | 2001-04-23 | 2012-01-19 | Mattson Thermal Products Gmbh | Method and apparatus for treating semiconductor substrates |
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