JPH09208256A - Electrically conductive quartz glass - Google Patents

Electrically conductive quartz glass

Info

Publication number
JPH09208256A
JPH09208256A JP8022214A JP2221496A JPH09208256A JP H09208256 A JPH09208256 A JP H09208256A JP 8022214 A JP8022214 A JP 8022214A JP 2221496 A JP2221496 A JP 2221496A JP H09208256 A JPH09208256 A JP H09208256A
Authority
JP
Japan
Prior art keywords
resin
glass
dried
electrically conductive
glass body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8022214A
Other languages
Japanese (ja)
Inventor
Koichi Takei
康一 武井
Yoichi Machii
洋一 町井
Toshikatsu Shimazaki
俊勝 嶋崎
Hiroki Terasaki
裕樹 寺崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP8022214A priority Critical patent/JPH09208256A/en
Publication of JPH09208256A publication Critical patent/JPH09208256A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/14—Compositions for glass with special properties for electro-conductive glass

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a dense large-sized electrically conductive glass not losing its electric conductivity even when used in an oxidizing atmosphere at a high temp. SOLUTION: A sol prepd. by hydrolyzing a partial condensation polymer of silicon alkoxide with a base catalyst in the presence of a solvent, a resin and a salt is made gel and dried. The resultant dry gel is fired at 700-1,300 deg.C to form a porous glass body and a resin soln. is impregnated into the glass body and dried. Vitrification is then carried out by heating in an oxygen-free atmosphere to produce the objective large-sized electrically conductive glass having <=10<11> Ω electric conductivity and withstanding use in an oxidizing atmosphere at a high temp.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体製造用治具
等に好適に使用できる導電性を有する石英ガラスに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a quartz glass having conductivity which can be suitably used for a jig for manufacturing a semiconductor.

【0002】[0002]

【従来の技術】石英ガラスは高純度、低熱膨張、耐熱衝
撃性、耐熱性、耐薬品性を有することから、半導体製造
用治具の材料として多用されている。しかし、低い電気
伝導度を有するため、静電気を発生しやすく、このた
め、石英ガラスに帯電した静電気によって半導体素子が
破壊されるという問題があった。また、導電性を必要と
する用途には使用できないという制限があった。
2. Description of the Related Art Quartz glass is widely used as a material for jigs for semiconductor production because it has high purity, low thermal expansion, thermal shock resistance, heat resistance and chemical resistance. However, since it has a low electric conductivity, it is easy to generate static electricity, which causes a problem that the semiconductor element is destroyed by the static electricity charged on the quartz glass. In addition, there is a limitation that it cannot be used for applications requiring conductivity.

【0003】石英ガラスに導電性を付与することを目的
として、多孔質ガラス体にカーボンブラックを含有する
塗料を含浸させたり、あるいは炭素微粉末を灯油、有機
溶剤、水等に分散させたものを含浸させ、これを加熱、
乾燥、炭化処理してガラス中に炭素を析出させ、導電性
を発現させることが提案されている。また、高城等は残
留有機物の量を調製した湿潤ゲルを無酸素雰囲気中で加
熱することにより炭素をガラス中に含有させ、ガラスに
導電性を発現させることを提案している(特開平2−2
39122号公報)。
For the purpose of imparting conductivity to quartz glass, a porous glass body impregnated with a coating material containing carbon black, or a fine carbon powder dispersed in kerosene, an organic solvent, water or the like is used. Impregnate and heat this,
It has been proposed to dry and carbonize to deposit carbon in the glass to develop conductivity. Also, Takagi et al. Proposes that carbon is contained in glass by heating a wet gel in which the amount of residual organic matter is adjusted in an oxygen-free atmosphere so that the glass exhibits conductivity (JP-A-2- Two
39122 publication).

【0004】[0004]

【発明が解決しようとする課題】しかし、提案された方
法で作製される導電性ガラスはいずれも多孔質体であ
り、石英ガラスの特長が活かされる高温で使用した場
合、炭素が酸化によって消失し、導電性が失われるとい
う問題があった。また、湿潤ゲルを用いた場合、大形の
導電性ガラスを得ることが困難であるという問題があっ
た。本発明は、高温・酸化性雰囲気で使用しても導電性
が失われない緻密な、かつ大形の導電性石英ガラスを提
供するものである。
However, the conductive glasses produced by the proposed method are all porous bodies, and when used at a high temperature where the features of quartz glass are utilized, carbon disappears due to oxidation. However, there was a problem that the conductivity was lost. Further, when a wet gel is used, it is difficult to obtain a large conductive glass. The present invention provides a dense and large-sized conductive quartz glass which does not lose its conductivity even when used in a high temperature / oxidizing atmosphere.

【0005】[0005]

【課題を解決するための手段】本発明は、シリコンアル
コキシドの部分縮重合物を樹脂、溶媒及び塩の存在下で
塩基触媒を用いて加水分解してゾルとし、ゲル化し、乾
燥して得た乾燥ゲルを700−1300℃の温度で焼成
して多孔質ガラスとし、この多孔質ガラス体に樹脂溶液
を含浸し、乾燥した後、無酸素雰囲気中で加熱、ガラス
化することによって製造される1011Ω以下の電気伝導
度を有する導電性石英ガラスである。
The present invention was obtained by hydrolyzing a partially condensed polymer of a silicon alkoxide with a base catalyst in the presence of a resin, a solvent and a salt to give a sol, gelling and drying. It is produced by firing a dried gel at a temperature of 700-1300 ° C. to obtain a porous glass, impregnating this porous glass body with a resin solution, drying and then heating in an oxygen-free atmosphere to vitrify 10 It is a conductive quartz glass with an electrical conductivity of 11 Ω or less.

【0006】本発明者は、上記課題を解決する導電性ガ
ラスの製造方法を検討した結果、シリコンアルコキシド
の部分縮重合物を溶媒、樹脂及び塩の存在下で、塩基触
媒を用いて加水分解して調製したゾルをゲル化し、乾燥
して乾燥ゲルとし、700−1300℃の温度で焼成し
て多孔質ガラス体とし、この多孔質ガラス体に樹脂溶液
を含浸させ、乾燥した後、無酸素雰囲気中で加熱、ガラ
ス化することにより、高温・酸化雰囲気中での使用に耐
え、かつ大形の導電性ガラスを製造することが出来るこ
とを見出し、本発明を完成させた。
The present inventor has studied a method for producing a conductive glass which solves the above problems, and as a result, hydrolyzes a partially condensed polymer of a silicon alkoxide in the presence of a solvent, a resin and a salt using a base catalyst. The prepared sol is gelled, dried to give a dried gel, and fired at a temperature of 700 to 1300 ° C. to give a porous glass body. The porous glass body is impregnated with a resin solution, dried, and then placed in an oxygen-free atmosphere. The present invention has been completed by finding that it is possible to manufacture a large-sized conductive glass that can withstand use in a high temperature and oxidizing atmosphere by heating and vitrifying in the atmosphere.

【0007】[0007]

【発明の実施の形態】本発明で使用するシリコンアルコ
キシドの部分縮重合物としては、シリコンテトラメトキ
シド、シリコンテトラメトキシド、シリコンテトラプロ
ポキシドなどの部分縮重合物が使用できるが、原料コス
ト及び得られる導電性ガラスの大形化が容易であるとい
う点から、シリコンテトラメトキシドの部分縮重合物を
用いることが好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION As a partial condensation polymer of a silicon alkoxide used in the present invention, a partial condensation polymer such as silicon tetramethoxide, silicon tetramethoxide and silicon tetrapropoxide can be used. It is preferable to use a partially condensed polymer of silicon tetramethoxide from the viewpoint that the obtained conductive glass can be easily enlarged.

【0008】本発明で使用する溶媒としては、メタノー
ル、エタノール、プロパノールなどのアルコール類、ジ
メチルホルムアミド、ジメチルアセトアミド、テトラヒ
ドロフルフリルアルコール等の高沸点溶媒の混合溶媒の
使用が導電性ガラスの大形化を図る上で好ましい。
As the solvent used in the present invention, use of a mixed solvent of alcohols such as methanol, ethanol, propanol and the like, high boiling point solvents such as dimethylformamide, dimethylacetamide, tetrahydrofurfuryl alcohol and the like makes the conductive glass large. It is preferable for the purpose.

【0009】本発明で使用する樹脂としては、ポリ酢酸
ビニル、ポリエチレングリコール及びその誘導体、ヒド
ロキシプロピルセルロースなどが使用できる。
As the resin used in the present invention, polyvinyl acetate, polyethylene glycol and its derivatives, hydroxypropyl cellulose and the like can be used.

【0010】本発明で使用する塩としては、水酸化アン
モニウム、水酸化テトラメチルアンモニウム、水酸化テ
トラエチルアンモニウム、水酸化テトラプロピルアンモ
ニウム、水酸化トリメチルエチルアンモニウム(コリ
ン)などの塩基と硝酸、塩酸などの酸との塩が使用でき
る。
The salts used in the present invention include bases such as ammonium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, trimethylethylammonium hydroxide (choline) and nitric acid, hydrochloric acid and the like. Salts with acids can be used.

【0011】本発明で使用する塩基触媒としては、水酸
化テトラメチルアンモニウム、水酸化テトラメチルアン
モニウム、水酸化テトラエチルアンモニウム、水酸化テ
トラプロピルアンモニウム、水酸化トリメチルエチルア
ンモニウム(コリン)が使用できる。
As the base catalyst used in the present invention, tetramethylammonium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, trimethylethylammonium hydroxide (choline) can be used.

【0012】以上の成分を用いて調製したゾルを容器に
注入し、静置してゲル化し、乾燥して乾燥ゲルを作製す
る。ゲルの乾燥には、公知のガス透過性フイルムを用い
る方法、またピンホールを用いる方法のいずれも使用で
きる。
The sol prepared by using the above components is poured into a container, allowed to stand, gelated, and dried to prepare a dried gel. For drying the gel, either a method using a known gas permeable film or a method using a pinhole can be used.

【0013】次いで、作製した乾燥ゲルを700−13
00℃の温度で焼成して多孔質ガラス体とし、これに樹
脂溶液を含浸させ、乾燥した後、無酸素雰囲気中で13
00−1500℃の温度で加熱することにより、シリカ
と炭素との緻密な複合体とすることができる。乾燥ゲル
を多孔質ガラス体とする温度は、700℃未満では多孔
質ガラス体の強度が低く、樹脂溶液含浸作業中に多孔質
体が破壊されるので好ましくない。一方、1300℃を
越えると多孔質体の緻密化が進み、樹脂含浸が困難とな
るので好ましくない。樹脂としては、熱分解後に残留す
る炭素分が大きいものであれば基本的にはどのようなも
のでも用いることが出来るが、フエノール系、フラン
系、エポキシ系、セルローズ系、ポリアクリロニトリル
系、ポリビニルアルコール系樹脂などが使用できる。こ
れらの樹脂を溶解する溶媒は、樹脂を溶解できる溶媒で
あれば基本的にどのようなものでも使用できる。含浸の
際には、真空、加圧など公知の方法を使用できるし、含
浸作業は適正な炭素含有量、結果として完全な炭化珪素
化を実現するため複数回繰り返してもよい。樹脂を含浸
させた多孔質ガラス体を加熱し、緻密化する温度は13
00−1500℃であることが好ましい。1300℃未
満の温度では、得られる導電性シリカ/炭素複合体の緻
密化が不十分となり、導電性シリカ/炭素複合体を高温
・酸化雰囲気で使用した場合、炭素の酸化が起こりやす
く、導電性の低下が生じ易い。樹脂を含浸させた多孔質
ガラス体を焼成する際に使用する無酸素雰囲気として
は、窒素、アルゴン、ヘリウム、真空などが使用でき
る。
Then, the dried gel thus prepared was subjected to 700-13.
It is baked at a temperature of 00 ° C. to obtain a porous glass body, which is impregnated with a resin solution, dried, and then dried in an oxygen-free atmosphere.
By heating at a temperature of 00-1500 ° C, a dense composite of silica and carbon can be obtained. If the temperature at which the dried gel is made into a porous glass body is lower than 700 ° C., the strength of the porous glass body is low and the porous body is destroyed during the impregnation with the resin solution, which is not preferable. On the other hand, if the temperature exceeds 1300 ° C., the porous body is densified and the resin impregnation becomes difficult, which is not preferable. As the resin, basically any resin can be used as long as it has a large carbon content remaining after thermal decomposition, but phenol-based, furan-based, epoxy-based, cellulose-based, polyacrylonitrile-based, polyvinyl alcohol Resins and the like can be used. As a solvent for dissolving these resins, basically any solvent can be used as long as it can dissolve the resin. A known method such as vacuum or pressure can be used for the impregnation, and the impregnation operation may be repeated a plurality of times in order to achieve an appropriate carbon content and, as a result, complete silicon carbide formation. The temperature at which the porous glass body impregnated with the resin is heated and densified is 13
It is preferably from 00 to 1500 ° C. At a temperature lower than 1300 ° C., the resulting conductive silica / carbon composite is insufficiently densified, and when the conductive silica / carbon composite is used in a high temperature / oxidizing atmosphere, oxidation of carbon is likely to occur, resulting in conductivity. Is likely to decrease. As the oxygen-free atmosphere used when firing the porous glass body impregnated with resin, nitrogen, argon, helium, vacuum or the like can be used.

【0014】[0014]

【実施例】【Example】

実施例1 シリコンテトラメトキシドの部分縮重合物100重量
部、メタノール500重量部、ジメチルホルムアミド3
60重量部、テトラヒドロフルフリルアルコール266
重量部、ポリ酢酸ビニル(重合度:1800)2.5重
量部を混合した。これに1M硝酸コリン水溶液をシリコ
ンテトラメトキシドの部分縮重合物100g当たり5x
10-4mol添加し、さらに1Mコリンメタノール溶液
をシリコンテトラメトキシドの部分縮重合物100g当
たり1.2x10-4mol添加し、ついで溶液を攪拌し
ながら水390重量部を滴下し、さらに攪拌を行ってゾ
ルを調製した。得られたゾル4.5kgをテフロンコー
テイングした480mm角のステンレス製容器に注入
し、直径1mmのピンホールを2個開けた蓋をした。容
器を静置してゾルをゲル化した後、50℃から180℃
の温度まで徐々に加熱してゲルを乾燥させた。乾燥時間
は約10日とした。得られた乾燥ゲルを窒素雰囲気中で
1000℃まで加熱し、1時間保持して多孔質ガラス体
を得た。多孔質ガラス体をパレット(500mm角)に
入れ、真空デシケーター中で排気した後、ノボラック型
フエノール樹脂のメタノール溶液をパレットに注入し、
多孔質ガラス体に樹脂を含浸させ、ついで多孔質体中の
溶媒を乾燥した。得られた樹脂含浸多孔質ガラス体を窒
素雰囲気中で1000℃まで加熱し、ついで雰囲気をヘ
リウムに変えて1450℃まで昇温し、2時間保持して
緻密化を行った。こうして約220mm角、厚さ8mm
の割れのない緻密なシリカと炭素が複合化したガラスを
得た。選られたシリカ/炭素複合ガラスの電気抵抗を測
定したところ、108Ωであった。
Example 1 100 parts by weight of a partially condensed polymer of silicon tetramethoxide, 500 parts by weight of methanol, dimethylformamide 3
60 parts by weight, tetrahydrofurfuryl alcohol 266
By weight, 2.5 parts by weight of polyvinyl acetate (degree of polymerization: 1800) were mixed. An aqueous solution of 1 M choline nitrate was added to this, and 5x per 100 g of the partially condensed polymer of silicon tetramethoxide.
10 -4 mol was added, further 1M choline methanol solution was added portion polycondensate 100g per 1.2x10 -4 mol of silicon tetramethoxide, then the solution was added dropwise to water 390 parts by weight with stirring, a further agitation Done to prepare a sol. 4.5 kg of the obtained sol was poured into a 480 mm square stainless steel container coated with Teflon, and a lid having two pinholes with a diameter of 1 mm was opened. After leaving the container to stand and gelling the sol, 50 ℃ to 180 ℃
The gel was dried by gradually heating to the temperature of. The drying time was about 10 days. The obtained dried gel was heated to 1000 ° C. in a nitrogen atmosphere and kept for 1 hour to obtain a porous glass body. Put the porous glass body in a pallet (500 mm square), evacuate in a vacuum desiccator, then pour a methanol solution of novolac-type phenol resin into the pallet,
The porous glass body was impregnated with a resin, and then the solvent in the porous body was dried. The obtained resin-impregnated porous glass body was heated to 1000 ° C. in a nitrogen atmosphere, then the atmosphere was changed to helium, the temperature was raised to 1450 ° C., and the temperature was maintained for 2 hours for densification. In this way about 220 mm square, thickness 8 mm
A dense silica-carbon composite glass without cracks was obtained. The electrical resistance of the selected silica / carbon composite glass was measured and found to be 10 8 Ω.

【0015】実施例2 実施例1と同様にして作製した多孔質ガラス体をパレッ
ト(500mm角)に入れ、真空デシケーター中で排気
した後、フラン樹脂のメタノール溶液をパレットに注入
し、多孔質ガラス体に樹脂を含浸させ、ついで多孔質体
中の溶媒を乾燥した。得られた樹脂含浸多孔質ガラス体
を実施例1と同様にして焼成、緻密化したところ、割れ
のない緻密なシリカと炭素が複合化したガラスが得られ
た。得られたシリカ/炭素複合ガラスの電気抵抗を測定
したところ、108Ωであった。
Example 2 A porous glass body produced in the same manner as in Example 1 was placed in a pallet (500 mm square), and after being evacuated in a vacuum desiccator, a methanol solution of furan resin was poured into the pallet to obtain a porous glass. The body was impregnated with resin and then the solvent in the porous body was dried. When the obtained resin-impregnated porous glass body was fired and densified in the same manner as in Example 1, a dense silica-carbon composite glass without cracks was obtained. The electrical resistance of the obtained silica / carbon composite glass was measured and found to be 10 8 Ω.

【0016】比較例 実施例1と同様にして作製した乾燥ゲルを窒素雰囲気中
1000℃まで昇温し、ついで雰囲気をヘリウムに変え
て1450℃まで昇温し、2時間保持して緻密化を行っ
た。得られたガラスは黒色で炭素を含有した石英ガラス
であるが、電気抵抗を測定したところ1013Ωであり、
絶縁体であった。
Comparative Example A dry gel prepared in the same manner as in Example 1 was heated to 1000 ° C. in a nitrogen atmosphere, then changed to helium and heated to 1450 ° C., and held for 2 hours for densification. It was The obtained glass was a black quartz glass containing carbon, and its electric resistance was measured to be 10 13 Ω.
It was an insulator.

【000】[000]

【発明の効果】本発明によれば、高温酸化雰囲気での使
用に耐えられる緻密かつ大形のシリカ/炭素複合導電性
ガラスが容易に得られる。得られた導電性ガラスは、高
純度、低熱膨張、高耐熱衝撃性、耐薬品性などの石英ガ
ラスの優れた特長を有し、かつ導電性を有することか
ら、半導体製造用治具の中の静電気を嫌う製品の材料と
して好適に使用でき、また本発明によればガラス中の炭
素含有量を制御することにより導電性を制御することが
可能であるため、適当な導電性を付与することにより静
電チャック、エッチング電極、発熱体などの用途にも適
用可能である。
According to the present invention, a dense and large-sized silica / carbon composite conductive glass which can withstand use in a high temperature oxidizing atmosphere can be easily obtained. The obtained conductive glass has the excellent features of quartz glass such as high purity, low thermal expansion, high thermal shock resistance, and chemical resistance, and since it has conductivity, it is It can be suitably used as a material for products that dislike static electricity, and according to the present invention, the conductivity can be controlled by controlling the carbon content in glass. It can also be applied to applications such as electrostatic chucks, etching electrodes, and heating elements.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 寺崎 裕樹 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroki Terasaki 48 Wadai, Tsukuba City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Tsukuba Development Laboratory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 シリコンアルコキシドの部分縮重合物を
樹脂、溶媒及び塩の存在下で塩基触媒を用いて加水分解
してゾルとし、ゲル化し、乾燥して得た乾燥ゲルを70
0−1300℃の温度で焼成して多孔質ガラスとし、こ
の多孔質ガラス体に樹脂溶液を含浸し、乾燥した後、無
酸素雰囲気中で加熱、ガラス化することによって製造さ
れる1011Ω以下の電気伝導度を有する導電性石英ガラ
ス。
1. A dry gel obtained by hydrolyzing a partially polycondensed product of a silicon alkoxide with a base catalyst in the presence of a resin, a solvent and a salt to give a sol, gelling and drying.
10 11 Ω or less produced by firing at a temperature of 0 to 1300 ° C. to obtain porous glass, impregnating this porous glass body with a resin solution, drying, and then heating and vitrifying in an oxygen-free atmosphere. Conductive quartz glass having the electric conductivity of.
JP8022214A 1996-02-08 1996-02-08 Electrically conductive quartz glass Pending JPH09208256A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8022214A JPH09208256A (en) 1996-02-08 1996-02-08 Electrically conductive quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8022214A JPH09208256A (en) 1996-02-08 1996-02-08 Electrically conductive quartz glass

Publications (1)

Publication Number Publication Date
JPH09208256A true JPH09208256A (en) 1997-08-12

Family

ID=12076562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8022214A Pending JPH09208256A (en) 1996-02-08 1996-02-08 Electrically conductive quartz glass

Country Status (1)

Country Link
JP (1) JPH09208256A (en)

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