JPH09227268A - Method for producing solid solution single crystal - Google Patents

Method for producing solid solution single crystal

Info

Publication number
JPH09227268A
JPH09227268A JP3200296A JP3200296A JPH09227268A JP H09227268 A JPH09227268 A JP H09227268A JP 3200296 A JP3200296 A JP 3200296A JP 3200296 A JP3200296 A JP 3200296A JP H09227268 A JPH09227268 A JP H09227268A
Authority
JP
Japan
Prior art keywords
solid solution
crystal
single crystal
producing
solution single
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3200296A
Other languages
Japanese (ja)
Other versions
JP3253005B2 (en
Inventor
Kyoichi Kinoshita
恭一 木下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP03200296A priority Critical patent/JP3253005B2/en
Publication of JPH09227268A publication Critical patent/JPH09227268A/en
Application granted granted Critical
Publication of JP3253005B2 publication Critical patent/JP3253005B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

(57)【要約】 【課題】 原料融液内の対流抑制が不完全であっても、
均一組成の混晶(固溶体単結晶)の育成を可能とする新
しい固溶体単結晶の製造方法を提供する。 【解決手段】 偏析と対流による成長結晶中の組成変動
を相殺できるように組成を前もって変動させた原料を作
製し、この原料を用いて一方向凝固により結晶を成長さ
せる。
(57) [Abstract] [Problem] Even if the convection control in the raw material melt is incomplete,
Provided is a novel method for producing a solid solution single crystal which enables growth of a mixed crystal (solid solution single crystal) having a uniform composition. SOLUTION: A raw material whose composition is changed in advance so as to offset the composition change in the grown crystal due to segregation and convection is prepared, and the crystal is grown by directional solidification using this raw material.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、均一組成で高品質
な混晶(固溶体)の単結晶を製造する方法に関するもの
である。
TECHNICAL FIELD The present invention relates to a method for producing a high quality mixed crystal (solid solution) single crystal having a uniform composition.

【0002】[0002]

【従来の技術】従来、均一組成の混晶(固溶体)を育成
する試みは数多くなされてきたが、まだ良い方法は見つ
かっていない。従来法のいくつかを、Pb1-x Snx
e(PbTeとSnTeとの混晶)を例にとって説明す
る。一方向凝固法は、最も簡便な結晶成長方法の一つと
して従来から数多くの結晶育成に用いられてきている。
この一方向凝固法を前記Pb1-x Snx Te(x=0.
2)に適用した場合の、成長結晶の軸方向SnTe濃度
を図1に示す。この軸方向に沿うSnTe濃度は、結晶
成長とともに漸次増加し、結晶のどの部分を取っても均
一な箇所がないことがわかる。これは、図2に示したP
bTe−SnTeの擬似二元系相図からも明らかなよう
に、液相線と固相線が一致しないこと(偏析)と、融液
内の対流とが原因で生じる現象である。
2. Description of the Related Art Conventionally, many attempts have been made to grow a mixed crystal (solid solution) having a uniform composition, but no good method has been found yet. Some of the conventional methods are Pb 1-x Sn x T
e (mixed crystal of PbTe and SnTe) will be described as an example. The directional solidification method has been conventionally used for many crystal growths as one of the simplest crystal growth methods.
This unidirectional solidification method is applied to the Pb 1-x Sn x Te (x = 0.
FIG. 1 shows the axial direction SnTe concentration of the grown crystal when applied to 2). It can be seen that the SnTe concentration along the axial direction gradually increases as the crystal grows, and there is no uniform portion in any part of the crystal. This is P shown in FIG.
As is clear from the bTe-SnTe pseudo-binary phase diagram, this phenomenon is caused by the fact that the liquidus and solidus lines do not match (segregation) and convection in the melt.

【0003】前記融液内対流を抑制する方法として、従
来、溶融域を狭くする帯域溶融法や磁場を印加する方
法、あるいは微小重力場を利用する方法が用いられてき
た。しかしながら、帯域溶融法では対流を抑制するに足
りる十分狭い溶融帯を形成するのが困難であるし、磁場
や微小重力を利用する方法も対流をある程度弱めるだけ
で、完全に抑制するのは困難であることがわかってい
る。
Conventionally, as a method for suppressing the convection in the melt, a zone melting method for narrowing the melting zone, a method for applying a magnetic field, or a method for utilizing a microgravity field has been used. However, in the zone melting method, it is difficult to form a sufficiently narrow melting zone sufficient to suppress convection, and the method of using a magnetic field or microgravity only weakens convection to some extent, and it is difficult to completely suppress it. I know there is.

【0004】図3には、スペースシャトルを利用して1
-4gの微小重力で結晶を育成した場合の成長軸方向の
SnTe濃度分布を示した。長さ33mmから43mm
にかけて、約10mmの均一組成領域が実現している
が、対流が完全に抑制された場合に実現すると予想され
る組成分布(図中に破線で示す)と比較すると、均一組
成領域の長さはまだまだ短い。これは、上でも述べたよ
うに、10-4gの微小重力下においても融液内対流が抑
制しきれていないためである。
In FIG. 3, a space shuttle is used to
The SnTe concentration distribution in the growth axis direction is shown when a crystal was grown with a microgravity of 0 -4 g. Length from 33mm to 43mm
Although a uniform composition region of about 10 mm was realized over the period of time, compared with the composition distribution expected to be realized when convection was completely suppressed (shown by the broken line in the figure), the length of the uniform composition region was It's still short. This is because, as described above, the convection in the melt is not sufficiently suppressed even under the microgravity of 10 −4 g.

【0005】[0005]

【発明が解決しようとする課題】本発明は、前記事情に
鑑みてなされたもので、原料融液内の対流抑制が不完全
であっても、均一組成の混晶(固溶体単結晶)の育成を
可能とする新しい固溶体単結晶の製造方法を提供するこ
とを課題とする。
DISCLOSURE OF THE INVENTION The present invention has been made in view of the above circumstances, and grows a mixed crystal (solid solution single crystal) having a uniform composition even if the convection suppression in the raw material melt is incomplete. An object of the present invention is to provide a new method for producing a solid solution single crystal that enables the above.

【0006】[0006]

【課題を解決するための手段】従来の単結晶の製造方法
は、均一組成の多結晶原料を出発原料として、結晶成長
させていた。これに対し、本発明の固溶体単結晶の製造
方法は、予め一方向凝固法等により軸方向に沿って溶質
濃度を連続的に変化させた結晶原料を作製し、この原料
を用いて、固溶体単結晶を成長させることを、最も主要
な特徴とする。
In the conventional method for producing a single crystal, a polycrystalline raw material having a uniform composition was used as a starting raw material for crystal growth. On the other hand, in the method for producing a solid solution single crystal of the present invention, a crystal raw material in which the solute concentration is continuously changed along the axial direction by a unidirectional solidification method or the like is prepared in advance, and a solid solution single crystal is produced using this raw material. Growing crystals is the most important feature.

【0007】すなわち、本発明の請求項1の固溶体単結
晶の製造方法は、その組成が全体として目的とする固溶
体の組成と一致し、かつ、その構成混合物質の濃度分布
が軸方向に沿って連続的に変化している結晶試料を出発
原料とし、該結晶試料に対し、その構成混合物質のうち
偏析係数が1より小さい物質がより高濃度となっている
端面側から前記物質がより低濃度となっている他の一端
に向けて、一方向凝固を行うことによって、目的とする
固溶体単結晶を得ることを特徴とする。
That is, in the method for producing a solid solution single crystal according to claim 1 of the present invention, the composition as a whole agrees with the composition of the intended solid solution, and the concentration distribution of the constituent mixed substances is along the axial direction. A continuously changing crystal sample is used as a starting material, and a substance having a segregation coefficient smaller than 1 among the constituent mixed substances of the crystal sample has a higher concentration. It is characterized in that the intended solid solution single crystal is obtained by unidirectionally solidifying toward the other end.

【0008】また、本発明の請求項2の固溶体単結晶の
製造方法は、その組成が全体として目的とする固溶体の
組成と一致する原料を電気炉内に長手形状に充填し、こ
の原料の長手方向に沿う第1の方向に一方向凝固を行っ
て結晶試料を作製し、該結晶試料の先端と後端とを入れ
替えて前記電気炉内に再装填し、前記第1の一方向凝固
で最後に固化した部分が最初に固化する第2の方向に一
方向凝固を行うことによって、目的とする固溶体単結晶
を得ることを特徴とする。
In the method for producing a solid solution single crystal according to claim 2 of the present invention, a raw material whose composition as a whole matches the composition of the intended solid solution is filled in an electric furnace in a longitudinal shape, and the length of the raw material is increased. Directional solidification is performed in a first direction along the direction to prepare a crystal sample, the front end and the rear end of the crystal sample are exchanged and reloaded into the electric furnace, and the first unidirectional solidification is performed. It is characterized in that the intended solid solution single crystal is obtained by unidirectionally solidifying in the second direction in which the solidified portion first solidifies.

【0009】本発明の請求項3の固溶体単結晶の製造方
法は、前記請求項2の固溶体単結晶の製造方法におい
て、第2の一方向凝固を実施する時に、電気炉内に磁場
を印加することを特徴とする。
The method for producing a solid solution single crystal according to claim 3 of the present invention is the method for producing a solid solution single crystal according to claim 2, wherein a magnetic field is applied in the electric furnace when the second unidirectional solidification is carried out. It is characterized by

【0010】本発明の請求項4の固溶体単結晶の製造方
法は、前記請求項2の固溶体単結晶の製造方法におい
て、第2の一方向凝固を行う方法として、一方向に掃引
する帯域溶融法を用いることを特徴とする。
A method for producing a solid solution single crystal according to a fourth aspect of the present invention is the method for producing a solid solution single crystal according to the second aspect, in which a unidirectional sweep zone melting method is used as the second unidirectional solidification method. Is used.

【0011】また、本発明の請求項5の固溶体単結晶の
製造方法は、種子結晶と、組成が全体として目的とする
固溶体の組成と一致するとともにその構成混合物質の濃
度分布が軸方向に沿って連続的に変化している結晶試料
とを原料として用い、前記結晶試料内の混合物質のうち
偏析係数が1より小なる物質がより高濃度となっている
該結晶試料の端面側に前記種子結晶を配置し、該種子結
晶の一部を融解させた後、該融解部分を含む前記結晶試
料の前記高濃度側端面から他の一端に向けて一方向凝固
を行うことによって、目的とする固溶体単結晶を得るこ
とを特徴とする。
Further, in the method for producing a solid solution single crystal according to claim 5 of the present invention, the seed crystal and the composition as a whole coincide with the intended composition of the solid solution, and the concentration distribution of the constituent mixed substances is along the axial direction. And a continuously changing crystal sample are used as raw materials, and among the mixed substances in the crystal sample, a substance having a segregation coefficient smaller than 1 has a higher concentration, and the seed is provided on the end face side of the crystal sample. After arranging a crystal and melting a part of the seed crystal, unidirectional solidification is performed from the high-concentration side end face of the crystal sample including the melted part toward the other end, thereby obtaining a target solid solution. A feature is that a single crystal is obtained.

【0012】本発明の請求項6の固溶体単結晶の製造方
法は、前記請求項5の固溶体単結晶の製造方法におい
て、一方向凝固を実施する時に、電気炉内に磁場を印加
することを特徴とする。
The method for producing a solid solution single crystal according to claim 6 of the present invention is characterized in that, in the method for producing a solid solution single crystal according to claim 5, a magnetic field is applied in an electric furnace when unidirectional solidification is carried out. And

【0013】本発明の請求項7の固溶体単結晶の製造方
法は、前記請求項5の固溶体単結晶の製造方法におい
て、一方向凝固を行う方法として、一方向に掃引する帯
域溶融法を用いることを特徴とする。
In the method for producing a solid solution single crystal according to claim 7 of the present invention, in the method for producing a solid solution single crystal according to claim 5, a unidirectional sweep zone melting method is used as the method for unidirectional solidification. Is characterized by.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施の形態を示
し、本発明をさらに詳しく説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail with reference to embodiments of the present invention.

【0015】(第1の実施の形態)それぞれ純度99.
9999%のPb,Sn,Teを使用して、Pb0.8
0.2 Teの組成となるよう秤量した後、石英管に真空
封入した。該石英管を電気炉内において約1000℃に
まで加熱してPb0.8 Sn0.2 Te組成の融液を作製し
た後、該石英管を電気炉より取り出し、水中に浸して急
冷し、Pb0.2 Sn0.2 Te組成の多結晶体を合成し
た。その後、該多結晶体を別な石英容器に真空封入し直
し、温度勾配炉中で高温部を約1000℃、低温部を約
600℃に加熱して形成した約60℃/cmの温度勾配
域を利用して、約5mm/hの固化速度で、一方向凝固
させた。得られた結晶中のSnTe濃度分布は、図1に
示す通りであった。すなわち、SnTe濃度は、結晶成
長軸方向に漸次増加し、均一組成領域はどこにも見当た
らない。
(First Embodiment) Purity of 99.
Using 9999% Pb, Sn, Te, Pb 0.8 S
After weighing so as to have a composition of n 0.2 Te, it was vacuum-sealed in a quartz tube. After heating the quartz tube to about 1000 ° C. in an electric furnace to prepare a melt having a Pb 0.8 Sn 0.2 Te composition, the quartz tube was taken out of the electric furnace, immersed in water and rapidly cooled to obtain Pb 0.2 Sn 0.2. A polycrystal having a Te composition was synthesized. Then, the polycrystalline body was vacuum-sealed in another quartz container again, and a high temperature part was heated to about 1000 ° C. and a low temperature part was heated to about 600 ° C. in a temperature gradient furnace to form a temperature gradient region of about 60 ° C./cm. Was used to unidirectionally solidify at a solidification rate of about 5 mm / h. The SnTe concentration distribution in the obtained crystal was as shown in FIG. That is, the SnTe concentration gradually increases in the crystal growth axis direction, and no uniform composition region is found anywhere.

【0016】次に、前述のようにして作製した結晶試料
をさらに別な結晶成長用石英容器内に真空封入し直し、
最終段階の結晶成長を行った。図4は、この段階におけ
る結晶成長用容器の断面図である。
Next, the crystal sample prepared as described above was vacuum-sealed in another quartz container for crystal growth,
The final stage of crystal growth was performed. FIG. 4 is a cross-sectional view of the crystal growth container at this stage.

【0017】石英容器1は、先端がコニカル状に加工さ
れており、コニカル部2の形成は1つの結晶核だけを生
成させて、単結晶化するための手段である。予め一方向
凝固させた結晶試料3は、SnTe濃度が一方の端面4
から他方の端面5にかけて減少しており、このSnTe
濃度がより高い方の端面4がコニカル部2の方向を向く
ように、石英容器1内に真空封入する。
The quartz container 1 has its tip processed into a conical shape, and the conical portion 2 is a means for producing only one crystal nucleus to form a single crystal. The crystal sample 3 preliminarily unidirectionally solidified has a SnTe concentration of one end face 4
From the other end face 5, the SnTe
The quartz container 1 is vacuum-sealed so that the end surface 4 having the higher concentration faces the direction of the conical portion 2.

【0018】図5は、本段階における結晶成長の概要を
示すグラフであり、炉内温度分布を示す曲線6と石英容
器1の配置関係も併せて示したものである。すなわち、
電気炉は、縦型炉で下部が低温領域、上部が高温領域と
なるよう加熱する。この温度分布では、低温の比重の高
い融液が下部へ来ることになり、熱対流は抑制される。
しかし、これはあくまで理想論であって、現実には石英
容器内の融液の径方向温度分布を完全に軸対称にするこ
とが難しい。そのため、ある程度の局所的な熱対流の発
生は避けられない。
FIG. 5 is a graph showing the outline of the crystal growth at this stage, and also shows the curve 6 showing the temperature distribution in the furnace and the arrangement relationship of the quartz container 1. That is,
The electric furnace is a vertical furnace and is heated so that the lower part has a low temperature region and the upper part has a high temperature region. In this temperature distribution, the low-temperature melt having a high specific gravity comes to the lower part, and the thermal convection is suppressed.
However, this is only an ideal theory, and it is difficult to make the radial temperature distribution of the melt in the quartz container completely axisymmetric in reality. Therefore, generation of local thermal convection to some extent is inevitable.

【0019】図6には、加熱前の結晶試料中のSnTe
濃度分布を示す曲線7と、1000℃で溶融した場合の
1時間後のSnTe濃度分布を示す曲線8を示した。拡
散による濃度分布の均一化とともに局所的な熱対流によ
る攪拌効果のため、SnTe濃度分布はなまっている。
このような状態から結晶化を開始させ、5mm/hで一
方向凝固させた場合のSnTe濃度分布を示す曲線9も
図6に併せて示した。SnTe濃度の高い方から固化が
始まるため、結晶中へ取り込まれるSnTeの割合が1
より小さい偏析作用を相殺し、比較的均一組成の結晶が
成長しているのがわかる。
FIG. 6 shows SnTe in a crystal sample before heating.
A curve 7 showing the concentration distribution and a curve 8 showing the SnTe concentration distribution after 1 hour when melted at 1000 ° C. are shown. The SnTe concentration distribution is blunted due to the uniform concentration distribution due to diffusion and the stirring effect due to local thermal convection.
Also shown in FIG. 6 is a curve 9 showing the SnTe concentration distribution when crystallization is started from such a state and unidirectionally solidified at 5 mm / h. Since solidification starts from the higher SnTe concentration, the ratio of SnTe incorporated into the crystal is 1
It can be seen that the smaller segregation effect is canceled out and that a crystal having a relatively uniform composition is growing.

【0020】(第2の実施の形態)図7は、本発明の第
2の実施形態において育成したPb1-x Snx Te単結
晶の軸方向のSnTe濃度分布を示したものである。本
実施の形態では、前記第1の実施の形態と同様な手法で
結晶成長させたが、後工程の再度の一方向凝固時に20
00ガウスの磁場を印加して融液内対流をさらに抑制し
た点が異なる。図から明らかなように、成長した結晶の
SnTe濃度分布の均一性がさらに向上している。これ
は対流抑制によって融液の攪拌が一層少なくなったため
である。
(Second Embodiment) FIG. 7 shows the SnTe concentration distribution in the axial direction of the Pb 1 -x Sn x Te single crystal grown in the second embodiment of the present invention. In the present embodiment, the crystal growth was performed by the same method as in the first embodiment, but the crystal was grown at the time of unidirectional solidification again in the subsequent step.
The difference is that a magnetic field of 00 Gauss was applied to further suppress convection in the melt. As is clear from the figure, the uniformity of SnTe concentration distribution in the grown crystal is further improved. This is because the convection was suppressed and the stirring of the melt was further reduced.

【0021】(第3の実施の形態)図8は、本発明の第
3の実施の形態における最終段階の結晶成長方法の概要
を示した線図である。電気炉加熱部は3ゾーンとなって
おり、炉内温度分布曲線10に示すように、中央加熱部
の温度を高くして帯域溶融を行う。この方法によりPb
1-x Snx Teの結晶成長を行ったところ、図7と良く
似た組成分布の単結晶を得ることができた。この実施の
形態においても溶質濃度の高い方から結晶化させるとい
う本発明の効果と溶融帯の幅を狭くしたことによる溶融
内対流抑制効果がうまくかみ合って、組成均一性に優れ
たPb1-x Snx Te単結晶が得られた。
(Third Embodiment) FIG. 8 is a diagram showing an outline of a crystal growth method at the final stage in the third embodiment of the present invention. The electric furnace heating section has three zones, and as shown in the furnace temperature distribution curve 10, the temperature of the central heating section is raised to perform zone melting. By this method Pb
When crystal growth of 1-x Sn x Te was performed, a single crystal having a composition distribution very similar to that of FIG. 7 could be obtained. Also in this embodiment, the effect of the present invention of crystallizing from the higher solute concentration and the effect of suppressing convection in the melt by narrowing the width of the melting zone are well meshed, and Pb 1-x excellent in composition uniformity is obtained. A Sn x Te single crystal was obtained.

【0022】(第4の実施の形態)図9は、本発明の第
4の実施の形態における結晶成長用容器12の断面図で
ある。容器12内の種子結晶16側には予め一方向凝固
させて作製した多結晶原料13のSnTe濃度が高い端
面14が接するよう配置されている。種子結晶16に
は、別な方法で作製されたPb0.8 Sn0.2 Te組成に
近い単結晶が使われている。このような構成において、
種子結晶の中央部が約890℃となるよう、温度勾配炉
中で加熱すると、種子結晶16は約半分を残して熔け、
結晶原料13は全部が溶けた溶融状となる。この状態か
ら結晶成長用容器12を低温側へ5mm/hの速度で移
動させると、溶け残った種子結晶から融液側へ向かって
固化が始まり、やがて全体が大きな単結晶へと成長し
た。
(Fourth Embodiment) FIG. 9 is a sectional view of a crystal growth container 12 according to a fourth embodiment of the present invention. The end face 14 having a high SnTe concentration of the polycrystalline raw material 13 produced by unidirectionally solidifying in advance is arranged on the seed crystal 16 side in the container 12 so as to be in contact therewith. For the seed crystal 16, a single crystal having a Pb 0.8 Sn 0.2 Te composition close to that produced by another method is used. In such a configuration,
When the seed crystal 16 was heated in a temperature gradient furnace so that the central portion of the seed crystal was at about 890 ° C., the seed crystal 16 melted leaving about half of it.
The crystal raw material 13 is in a molten state in which the whole is melted. When the crystal growth container 12 was moved from this state to the low temperature side at a speed of 5 mm / h, solidification started from the undissolved seed crystal toward the melt side, and eventually the whole grew into a large single crystal.

【0023】図10は、本実施の形態における結晶成長
の後の結晶の軸方向SnTe濃度分布を示したものであ
る。この図から、得られた結晶は、ほぼ均一なSnTe
濃度分布をしていることがわかる。
FIG. 10 shows the axial direction SnTe concentration distribution of the crystal after the crystal growth in the present embodiment. From this figure, the obtained crystals show almost uniform SnTe.
It can be seen that there is a concentration distribution.

【0024】以上、前記実施の形態においては、IV−VI
族化合物半導体PbTeとSnTeの均一混晶(固溶
体)を例にとって説明したが、本発明の原理は、上記物
質に限られるものではなく、SiとGeのような元素同
士の固溶体単結晶や、III −V族化合物半導体のInA
sとGaAsの固溶体単結晶、あるいはII−VI族化合物
半導体のCdTe−HgTeの固溶体単結晶の製造に適
用できることは、自明である。
As described above, in the above embodiment, IV-VI
Although a homogeneous mixed crystal (solid solution) of the group compound semiconductors PbTe and SnTe has been described as an example, the principle of the present invention is not limited to the above substances, but a solid solution single crystal of elements such as Si and Ge, or III InA of group V compound semiconductor
It is obvious that the present invention can be applied to the production of a solid solution single crystal of s and GaAs or a CdTe-HgTe solid solution single crystal of a II-VI group compound semiconductor.

【0025】[0025]

【発明の効果】以上説明したように、本発明の方法によ
れば、偏析と対流による成長結晶中の組成変動を前もっ
て相殺できるように組成を変動させた原料を用いるの
で、溶融内の対流をある程度抑制すれば、固溶体(均一
性に優れた混晶)の単結晶を得ることができるという利
点がある。
As described above, according to the method of the present invention, since the raw material whose composition is varied so as to cancel the composition variation in the grown crystal due to the segregation and the convection in advance is used, the convection in the melt is prevented. If it is suppressed to some extent, there is an advantage that a single crystal of a solid solution (mixed crystal excellent in uniformity) can be obtained.

【0026】本発明の方法は、特定の材料に限定される
ものではなく、広く一般の固溶体結晶に応用できる方法
であるが、特にPbTe−SnTeやInAs−GaA
sなどの化合物の固溶体半導体は、レーザダイオードの
作製等のために高品質化や均一組成化が要求されるの
で、本発明の有望な応用分野である。
The method of the present invention is not limited to a particular material and can be widely applied to general solid solution crystals. In particular, PbTe-SnTe and InAs-GaA are applicable.
A solid solution semiconductor of a compound such as s is a promising application field of the present invention because high quality and uniform composition are required for producing a laser diode or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】Pb0.8 Sn0.2 Teの均一組成多結晶原料を
出発原料として、一方向凝固させた場合のSnTeの成
長軸方向濃度分布を示すグラフである。
FIG. 1 is a graph showing the concentration distribution of SnTe in the growth axis direction in the case of unidirectionally solidifying a polycrystalline raw material having a uniform composition of Pb 0.8 Sn 0.2 Te as a starting material.

【図2】PbTe−SnTe擬似二元系の状態図であ
る。
FIG. 2 is a state diagram of a PbTe-SnTe pseudo binary system.

【図3】10-4gの微小重力下で、Pb0.8 Sn0.2
e均一組成原料から一方向凝固法により育成された結晶
の成長軸方向のSnTe濃度分布を示すグラフである。
FIG. 3 shows Pb 0.8 Sn 0.2 T under microgravity of 10 −4 g.
e is a graph showing SnTe concentration distribution in the growth axis direction of a crystal grown by a unidirectional solidification method from a raw material of uniform composition.

【図4】本発明の固溶体単結晶の製造方法の第1の実施
の形態を説明するための図であり、実施に用いた結晶成
長用容器の断面構成図である。
FIG. 4 is a diagram for explaining the first embodiment of the method for producing a solid solution single crystal of the present invention, and is a cross-sectional configuration diagram of the crystal growth container used for the implementation.

【図5】本発明の第1の実施の形態の単結晶製造方法を
説明するための図であり、試料への印加温度の分布を示
すグラフである。
FIG. 5 is a diagram for explaining the single crystal manufacturing method according to the first embodiment of the present invention, and is a graph showing a distribution of an applied temperature to a sample.

【図6】原料に対する各種処理によるSnTe濃度分布
の違いを示すグラフである。
FIG. 6 is a graph showing a difference in SnTe concentration distribution due to various treatments on raw materials.

【図7】本発明の第2の実施の形態における単結晶の成
長軸方向に沿うSnTe濃度分布を示すグラフである。
FIG. 7 is a graph showing SnTe concentration distribution along the growth axis direction of a single crystal according to the second embodiment of the present invention.

【図8】本発明の第3の実施の形態における単結晶の成
長軸方向に沿うSnTe濃度分布を示すグラフである。
FIG. 8 is a graph showing SnTe concentration distribution along the growth axis direction of a single crystal according to a third embodiment of the present invention.

【図9】本発明の第4の実施の形態において用いた結晶
成長用容器の断面構成図である。
FIG. 9 is a sectional configuration diagram of a crystal growth container used in a fourth embodiment of the present invention.

【図10】本発明の第4の実施の形態において得た単結
晶の成長軸方向SnTe濃度分布を示すグラフである。
FIG. 10 is a graph showing SnTe concentration distribution in the growth axis direction of the single crystal obtained in the fourth embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 石英容器 2 先端コニカル部 3 結晶試料 4 SnTe濃度の最も高い端面 5 SnTe濃度の最も低い端面 6 炉内温度分布を示す曲線 7 加熱前の結晶試料中のSnTe濃度分布を示す曲線 8 1000℃で溶融し、1時間経過後急冷した試料の
軸方向に沿うSnTe濃度分布を示す曲線 9 第1の実施の形態で得た単結晶の成長軸方向に沿う
SnTe濃度分布を示す曲線 10 帯域炉内温度分布を示す曲線 11 結晶成長試料 12 結晶成長用容器 13 多結晶原料 14 SnTe濃度の最も高い端面 15 SnTe濃度の最も低い端面 16 種子結晶
1 Quartz container 2 Tip conical part 3 Crystal sample 4 End face with the highest SnTe concentration 5 End face with the lowest SnTe concentration 6 Curve showing the temperature distribution in the furnace 7 Curve showing the SnTe concentration distribution in the crystal sample before heating 8 At 1000 ° C Curve 9 showing SnTe concentration distribution along the axial direction of the sample melted and rapidly cooled after 1 hour 9 Curve showing SnTe concentration distribution along the growth axis direction of the single crystal obtained in the first embodiment 10 Zone furnace temperature Curve showing distribution 11 Crystal growth sample 12 Crystal growth container 13 Polycrystalline raw material 14 End face with highest SnTe concentration 15 End face with lowest SnTe concentration 16 Seed crystal

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 その組成が全体として目的とする固溶体
の組成と一致し、かつ、その構成混合物質の濃度分布が
軸方向に沿って連続的に変化している結晶試料を出発原
料とし、該結晶試料に対し、その構成混合物質のうち偏
析係数が1より小さい物質がより高濃度となっている端
面側から前記物質がより低濃度となっている他の一端に
向けて、一方向凝固を行うことによって、目的とする固
溶体単結晶を得ることを特徴とする固溶体単結晶の製造
方法。
1. A starting material is a crystal sample, the composition of which is the same as that of the target solid solution as a whole, and the concentration distribution of the constituent mixed substances thereof continuously changes along the axial direction. One-way solidification is performed on the crystal sample from the end face side where the substance having a segregation coefficient smaller than 1 is higher in concentration among the constituent mixed substances toward the other end where the substance is lower in concentration. A method for producing a solid solution single crystal, characterized in that the intended solid solution single crystal is obtained by carrying out.
【請求項2】 その組成が全体として目的とする固溶体
の組成と一致する原料を電気炉内に長手形状に充填し、
この原料の長手方向に沿う第1の方向に一方向凝固を行
って結晶試料を作製し、該結晶試料の先端と後端とを入
れ替えて前記電気炉内に再装填し、前記第1の一方向凝
固で最後に固化した部分が最初に固化する第2の方向に
一方向凝固を行うことによって、目的とする固溶体単結
晶を得ることを特徴とする固溶体単結晶の製造方法。
2. A raw material whose composition as a whole matches the composition of a desired solid solution is charged into an electric furnace in a longitudinal shape,
The raw material is unidirectionally solidified in a first direction along the longitudinal direction to produce a crystal sample, and the front end and the rear end of the crystal sample are exchanged and reloaded into the electric furnace, and the first A method for producing a solid solution single crystal, comprising obtaining a desired solid solution single crystal by carrying out unidirectional solidification in a second direction in which a portion solidified last by directional solidification first solidifies.
【請求項3】 前記第2の一方向凝固を実施する時に、
電気炉内に磁場を印加することを特徴とする請求項2に
記載の固溶体単結晶の製造方法。
3. When performing the second unidirectional solidification,
The method for producing a solid solution single crystal according to claim 2, wherein a magnetic field is applied in the electric furnace.
【請求項4】 前記第2の一方向凝固を行う方法とし
て、一方向に掃引する帯域溶融法を用いることを特徴と
する請求項2に記載の固溶体単結晶の製造方法。
4. The method for producing a solid solution single crystal according to claim 2, wherein a zone melting method of sweeping in one direction is used as the method for performing the second unidirectional solidification.
【請求項5】 種子結晶と、組成が全体として目的とす
る固溶体の組成と一致するとともにその構成混合物質の
濃度分布が軸方向に沿って連続的に変化している結晶試
料とを原料として用い、前記結晶試料内の混合物質のう
ち偏析係数が1より小なる物質がより高濃度となってい
る該結晶試料の端面側に前記種子結晶を配置し、該種子
結晶の一部を融解させた後、該融解部分を含む前記結晶
試料の前記高濃度側端面から他の一端に向けて一方向凝
固を行うことによって、目的とする固溶体単結晶を得る
ことを特徴とする固溶体単結晶の製造方法。
5. A seed crystal and a crystal sample whose composition as a whole coincides with the composition of a target solid solution and whose concentration distribution of its constituent mixed substances continuously changes along the axial direction are used as raw materials. The seed crystal is placed on the end face side of the crystal sample in which the substance having a segregation coefficient of less than 1 has a higher concentration among the mixed substances in the crystal sample, and a part of the seed crystal is melted. After that, the solid solution single crystal of interest is obtained by unidirectionally solidifying the crystal sample including the melted portion from the end surface on the high concentration side toward the other end. .
【請求項6】 前記一方向凝固を実施する時に、電気炉
内に磁場を印加することを特徴とする請求項5に記載の
固溶体単結晶の製造方法。
6. The method for producing a solid solution single crystal according to claim 5, wherein a magnetic field is applied in an electric furnace when the unidirectional solidification is performed.
【請求項7】 前記一方向凝固を行う方法として、一方
向に掃引する帯域溶融法を用いることを特徴とする請求
項5に記載の固溶体単結晶の製造方法。
7. The method for producing a solid solution single crystal according to claim 5, wherein a zone melting method of sweeping in one direction is used as the method for performing the unidirectional solidification.
JP03200296A 1996-02-20 1996-02-20 Method for producing solid solution single crystal Expired - Fee Related JP3253005B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03200296A JP3253005B2 (en) 1996-02-20 1996-02-20 Method for producing solid solution single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03200296A JP3253005B2 (en) 1996-02-20 1996-02-20 Method for producing solid solution single crystal

Publications (2)

Publication Number Publication Date
JPH09227268A true JPH09227268A (en) 1997-09-02
JP3253005B2 JP3253005B2 (en) 2002-02-04

Family

ID=12346701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03200296A Expired - Fee Related JP3253005B2 (en) 1996-02-20 1996-02-20 Method for producing solid solution single crystal

Country Status (1)

Country Link
JP (1) JP3253005B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001048691A (en) * 1999-08-11 2001-02-20 Ishikawajima Harima Heavy Ind Co Ltd Arbitrary concentration distribution sample and its preparation method
JP2001072487A (en) * 1999-09-02 2001-03-21 Natl Space Development Agency Of Japan Production of solid solution
WO2007126114A1 (en) 2006-04-25 2007-11-08 Ebis Corporation Casting method and apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001048691A (en) * 1999-08-11 2001-02-20 Ishikawajima Harima Heavy Ind Co Ltd Arbitrary concentration distribution sample and its preparation method
JP2001072487A (en) * 1999-09-02 2001-03-21 Natl Space Development Agency Of Japan Production of solid solution
WO2007126114A1 (en) 2006-04-25 2007-11-08 Ebis Corporation Casting method and apparatus

Also Published As

Publication number Publication date
JP3253005B2 (en) 2002-02-04

Similar Documents

Publication Publication Date Title
EP0751242B1 (en) Process for bulk crystal growth
JP3253005B2 (en) Method for producing solid solution single crystal
EP0266227B1 (en) Method for growing compound semiconductor crystals
JP4576571B2 (en) Method for producing solid solution
JP2004277266A (en) Method for producing compound semiconductor single crystal
JP2001072488A (en) Method for producing solid solution single crystal
JP2001322890A (en) Method for producing solid solution single crystal
JP3435118B2 (en) Method for growing compound semiconductor bulk crystal and method for manufacturing compound semiconductor device
JP4239065B2 (en) Method for producing solid solution single crystal
JP3419208B2 (en) Single crystal manufacturing method
JP3633212B2 (en) Single crystal growth method
JP2810975B2 (en) Single crystal manufacturing method
JP2007045640A (en) Method for producing semiconductor bulk crystal
JPH07108837B2 (en) Beta barium borate single crystal growth method
JPH01138199A (en) Lead-tin-tellurium based semiconductor single crystal
JPH0725533B2 (en) Method for producing silicon polycrystalline ingot
JPH06199600A (en) Method for growing beta-barium borate single crystal
JPH09249479A (en) Compound semiconductor single crystal growth method
JPS5917079B2 (en) How to grow single crystals
JPH07172973A (en) Method for producing mixed crystal single crystal
JPH07133183A (en) Production of znse single crystal
JP2000178095A (en) Crystal growth method
JPH0729870B2 (en) Method and apparatus for crystal growth of compound semiconductor
JPH0977587A (en) Method for growing single crystal
JPH05178684A (en) Production of semiconductor single crystal

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20071122

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 7

Free format text: PAYMENT UNTIL: 20081122

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091122

Year of fee payment: 8

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101122

Year of fee payment: 9

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 9

Free format text: PAYMENT UNTIL: 20101122

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111122

Year of fee payment: 10

LAPS Cancellation because of no payment of annual fees