JPH09241832A - Method for coating metallic surface - Google Patents
Method for coating metallic surfaceInfo
- Publication number
- JPH09241832A JPH09241832A JP7119196A JP7119196A JPH09241832A JP H09241832 A JPH09241832 A JP H09241832A JP 7119196 A JP7119196 A JP 7119196A JP 7119196 A JP7119196 A JP 7119196A JP H09241832 A JPH09241832 A JP H09241832A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- amorphous alloy
- film
- excimer laser
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims description 25
- 239000011248 coating agent Substances 0.000 title claims description 19
- 238000000034 method Methods 0.000 title claims description 19
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000007740 vapor deposition Methods 0.000 claims abstract description 12
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 239000013077 target material Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000000843 powder Substances 0.000 claims description 6
- 229910004353 Ti-Cu Inorganic materials 0.000 claims description 2
- 229910017112 Fe—C Inorganic materials 0.000 claims 1
- 229910018487 Ni—Cr Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 14
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 239000013076 target substance Substances 0.000 abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 17
- 239000007769 metal material Substances 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000000608 laser ablation Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052755 nonmetal Inorganic materials 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910017060 Fe Cr Inorganic materials 0.000 description 1
- 229910002544 Fe-Cr Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011011 black crystal Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VMJRMGHWUWFWOB-UHFFFAOYSA-N nickel tantalum Chemical compound [Ni].[Ta] VMJRMGHWUWFWOB-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は基材表面の被覆方法
に関するものである。さらに詳しくいえば、本発明は、
レーザアブレーション現象を利用して、金属や非金属の
表面に密着性のよいアモルファス合金被膜を効率よく形
成させる基材表面の被覆方法に関するものである。TECHNICAL FIELD The present invention relates to a method for coating a surface of a substrate. More specifically, the present invention
The present invention relates to a method for coating a surface of a base material which efficiently forms an amorphous alloy coating film having good adhesion on a metal or non-metal surface by utilizing a laser ablation phenomenon.
【０００２】[0002]
【従来の技術】従来、金属や合金などの金属材料やケイ
素のような非金属材料を各種機械部品や電子部品などに
用いる場合、耐食性、耐候性などの物性を付与するため
に、その表面に被覆を形成させることが通常行われてい
る。2. Description of the Related Art Conventionally, when a metal material such as a metal or an alloy or a non-metal material such as silicon is used for various mechanical parts or electronic parts, in order to impart physical properties such as corrosion resistance and weather resistance to the surface, It is common practice to form a coating.
【０００３】この表面被覆法の代表的なものは、金属系
材料の表面に異種金属やセラミックスなど所望の特性を
有する被膜を、真空蒸着法、スパッタリング法、イオン
プレーティング法などにより形成させる方法である。し
かしながら、セラミックス被膜は、金属系材料との熱的
特性や機械的特性の違いから、密着性が不十分であるた
め、剥離や、き裂が発生したりするという欠点がある。
一方、金属系材料との密着性及び靱性に優れ、耐食性を
大幅に向上させる被膜としてアモルファス合金被膜が知
られているが、パイプ内面などの複雑形状部材について
は被覆しにくいという欠点を有している。A typical example of this surface coating method is a method of forming a coating film having desired characteristics such as different metals or ceramics on the surface of a metallic material by a vacuum vapor deposition method, a sputtering method, an ion plating method or the like. is there. However, the ceramic coating has insufficient adhesiveness due to the difference in thermal characteristics and mechanical characteristics from the metal-based material, and thus has a defect that peeling or cracking occurs.
On the other hand, an amorphous alloy film is known as a film that is excellent in adhesion and toughness with a metal-based material and greatly improves corrosion resistance, but it has a drawback that it is difficult to cover a complicated shape member such as a pipe inner surface. There is.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、このような
従来の基材の表面被覆方法のもつ欠点を克服し、耐食
性、耐候性などを付与するために、パイプ内面などの複
雑形状部材に対しても適用可能な、密着性のよいアモル
ファス合金被膜を形成しうる金属基材表面の被覆方法を
提供することを目的としてなされたものである。DISCLOSURE OF THE INVENTION The present invention overcomes the drawbacks of the conventional surface coating method for a substrate and imparts corrosion resistance, weather resistance and the like to a member having a complicated shape such as an inner surface of a pipe. The object of the present invention is to provide a method for coating a surface of a metal base material which can be applied to an amorphous alloy coating film having good adhesion.
【０００５】[0005]
【課題を解決するための手段】本発明者らは、基材表面
に密着性のよいアモルファス合金被膜を形成させる被覆
方法について鋭意研究を重ねた結果、ミラーやレンズな
どの光学部品により自由に伝送できるエキシマレーザを
熱源とし、このエキシマレーザを蒸着用ターゲット物質
に照射し、レーザアブレーション現象を利用して、金属
基材表面にアモルファス合金被膜を蒸着することによ
り、前記目的を達成しうることを見出し、この知見に基
づいて本発明を完成するに至った。Means for Solving the Problems The inventors of the present invention have conducted earnest studies on a coating method for forming an amorphous alloy coating film having good adhesion on the surface of a base material, and as a result, transmitted freely through optical parts such as mirrors and lenses. It was found that the above object can be achieved by using an excimer laser as a heat source, irradiating the target material for vapor deposition with this excimer laser, and utilizing the laser ablation phenomenon to deposit an amorphous alloy film on the surface of a metal substrate. The present invention has been completed based on this finding.
【０００６】すなわち、本発明は、真空帯域内におい
て、アモルファス組成の混合金属粉末焼結体又はアモル
ファス合金から成る蒸着用ターゲット物質の少なくとも
１種をエキシマレーザを照射してアブレーションするこ
とにより、基材表面にアモルファス合金被膜を形成させ
ることを特徴とする金属表面被覆方法を提供するもので
ある。That is, the present invention irradiates an excimer laser for ablation of at least one target material for vapor deposition consisting of a mixed metal powder sintered body having an amorphous composition or an amorphous alloy in a vacuum zone to form a base material. The present invention provides a method for coating a metal surface, which comprises forming an amorphous alloy coating film on the surface.
【０００７】[0007]
【発明の実施の形態】本発明方法により被覆される基材
の材料については特に制限はなく、通常の蒸着法により
被覆されるもの例えば鉄、ニッケル、アルミニウムなど
の金属材料、ステンレス鋼、炭素鋼、アルミニウム合金
などの合金、ケイ素などの非金属材料などを用いること
ができる。BEST MODE FOR CARRYING OUT THE INVENTION There is no particular limitation on the material of the substrate coated by the method of the present invention, and those coated by a conventional vapor deposition method, for example, metallic materials such as iron, nickel and aluminum, stainless steel, carbon steel. Alloys such as aluminum alloys and non-metal materials such as silicon can be used.
【０００８】これらの基体は、蒸着処理を施す前に、予
め表面酸化物膜を、エキシマレーザ照射やアルゴンイオ
ンビーム照射などにより、除去しておくことが、密着性
に優れるアモルファス合金被膜が得られる点から有利で
ある。Before these substrates are subjected to a vapor deposition process, the surface oxide film is removed by excimer laser irradiation, argon ion beam irradiation or the like in advance to obtain an amorphous alloy film having excellent adhesion. It is advantageous from the point.
【０００９】本発明方法においては、真空帯域内におい
て、蒸着用ターゲット物質にエキシマレーザを照射して
アブレーションする。In the method of the present invention, the target material for vapor deposition is irradiated with an excimer laser to ablate within the vacuum zone.
【００１０】この際、蒸着用ターゲット物質としては、
アモルファス組成の混合金属粉末焼結体から成るものを
用いてもよいし、アモルファス合金から成るものを用い
てもよい。また、組成の異なる複数のターゲット物質を
用い、同時にアブレーションして均一なアモルファス合
金を蒸着させてもよい。これらのターゲットの形状につ
いては特に制限はないが、通常は板状又は粉末成形体の
形で用いられる。At this time, as the target material for vapor deposition,
A mixed metal powder sintered body having an amorphous composition may be used, or an amorphous alloy may be used. Alternatively, a plurality of target materials having different compositions may be used and ablated at the same time to deposit a uniform amorphous alloy. Although the shape of these targets is not particularly limited, they are usually used in the form of a plate or a powder compact.
【００１１】また、ターゲット物質は、レーザアブレー
ションにより金属系材料表面にアモルファス合金被膜が
形成されるように選べばよい。このアモルファス合金被
膜としては、特に制限はなく、例えばＴａ−Ｎｉ系、Ｎ
ｉ−Ｃｒ系、Ｔｉ−Ｃｕ系、Ｚｒ−Ｃｕ系、Ｆｅ−Ｃｒ
系、Ｃｏ−Ｃｒ系などアモルファス合金から成る被膜を
挙げることができる。Further, the target material may be selected so that an amorphous alloy film is formed on the surface of the metallic material by laser ablation. The amorphous alloy film is not particularly limited, and may be, for example, Ta-Ni system, N
i-Cr system, Ti-Cu system, Zr-Cu system, Fe-Cr
Examples thereof include coatings made of amorphous alloys such as Co-based and Co-Cr based.
【００１２】本発明方法においては、ターゲットに照射
するエキシマレーザとしては、例えばＡｒＦ、ＫｒＦ、
ＸｅＦ、ＸｅＣｌなどが用いられる。In the method of the present invention, as the excimer laser for irradiating the target, for example, ArF, KrF,
XeF, XeCl or the like is used.
【００１３】次に、添付図面に従って本発明方法を説明
する。図１は本発明方法を実施するのに好適な蒸着装置
の例を示す略解断面図であって、内部を真空に保持する
ための排気口２を有する密閉容器１内には、エキシマレ
ーザビーム３を基材８に照射するための凹面鏡５、エキ
シマレーザビーム３を集光するためのレンズ６、エキシ
マレーザが照射されるターゲット物質７が設置されてい
る。なお、４は石英ウインドーである。Next, the method of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a schematic sectional view showing an example of a vapor deposition apparatus suitable for carrying out the method of the present invention. An excimer laser beam 3 is provided in a closed container 1 having an exhaust port 2 for keeping the inside vacuum. A concave mirror 5 for irradiating the substrate 8 with the light, a lens 6 for converging the excimer laser beam 3, and a target material 7 with which the excimer laser is irradiated are installed. In addition, 4 is a quartz window.
【００１４】まず、密閉容器１内に基材８を装着したの
ち、排気口２で密閉容器内の真空度を５×１０-6Ｔｏｒ
ｒ程度まで排気後、エキシマレーザビーム３を凹面鏡５
により基材８に照射して、表面酸化膜を除去する。次い
で、エキシマレーザビーム３をレンズ６で集光してター
ゲット物質７に照射して、ターゲット物質７を蒸発さ
せ、基材８に蒸着させる。First, after mounting the base material 8 in the closed container 1, the degree of vacuum in the closed container is set to 5 × 10 -6 Tor by the exhaust port 2.
After exhausting to about r, the excimer laser beam 3 is changed to the concave mirror 5
Then, the base material 8 is irradiated with to remove the surface oxide film. Then, the excimer laser beam 3 is condensed by the lens 6 and irradiated on the target material 7, and the target material 7 is evaporated and deposited on the base material 8.
【００１５】このようにして、基材表面に、アモルファ
ス合金から成る膜厚０．１〜１０μｍ程度の蒸着膜が密
着性よく形成される。In this way, a vapor deposition film made of an amorphous alloy and having a thickness of about 0.1 to 10 μm is formed on the surface of the base material with good adhesion.
【００１６】[0016]
【発明の効果】本発明方法によれば、パイプ内面などの
複雑形状部材の基材表面に、耐食性、耐候性などに優れ
るアモルファス合金被膜を密着性よく形成することがで
きる。このような表面が改質された基材は、例えば機械
部品や電子部品などの材料として好適に用いられる。According to the method of the present invention, an amorphous alloy film having excellent corrosion resistance and weather resistance can be formed on the surface of a base material of a member having a complicated shape such as the inner surface of a pipe with good adhesion. Such a surface-modified base material is suitably used as a material for, for example, mechanical parts and electronic parts.
【００１７】[0017]
【実施例】次に実施例により本発明をさらに詳細に説明
するが、本発明は、これらの例によってなんら限定され
るものではない。The present invention will be described in more detail by way of examples, which should not be construed as limiting the invention thereto.
【００１８】実施例１ 図１に示す装置を用いて、蒸着膜を形成した。まず、密
閉容器１内の真空度を５×１０-6Ｔｏｒｒ程度まで排気
したのち、ＫｒＦエキシマレーザを焦点距離１５ｃｍの
凹面鏡５で平均エネルギー密度を１パルス当り８０ｋＪ
／ｍ2に絞り、１００パルスをシリコン基板８に照射
し、表面酸化膜の除去処理を行った。次いで、ＫｒＦエ
キシマレーザを溶融石英レンズ６で平均エネルギー密度
を１パルス当り２００及び２８０ｋＪ／ｍ2に絞り、毎
秒１０Ｈｚの繰り返し数で、タンタル、ニッケル又はこ
れらの混合金属粉末焼結体から成るターゲット物質７に
照射し、約３０ｍｍ離れたシリコン基板８の表面に、厚
さ約０．５μｍのタンタル、ニッケル又はタンタル‐ニ
ッケル合金被膜を蒸着、形成させた。Example 1 A vapor deposition film was formed using the apparatus shown in FIG. First, after evacuating the degree of vacuum in the closed container 1 to about 5 × 10 −6 Torr, a KrF excimer laser is used with a concave mirror 5 having a focal length of 15 cm to obtain an average energy density of 80 kJ per pulse.
/ M 2 , and the silicon substrate 8 was irradiated with 100 pulses to remove the surface oxide film. Then, the KrF excimer laser was focused on the fused silica lens 6 to an average energy density of 200 and 280 kJ / m 2 per pulse, and a target material made of tantalum, nickel, or a mixed metal powder of these at a repetition rate of 10 Hz per second. 7 was irradiated to deposit a tantalum, nickel or tantalum-nickel alloy coating film having a thickness of about 0.5 μm on the surface of the silicon substrate 8 separated by about 30 mm.
【００１９】このようにして形成された被膜のＸ線回折
結果を図２に示す。なお、ターゲット物質の組成は、純
Ｔａ、Ｔａ‐４０原子％Ｎｉ、Ｔａ‐６０原子％Ｎｉ、
Ｔａ‐８０原子％Ｎｉ及び、純Ｎｉの５種類とした。The X-ray diffraction results of the coating film thus formed are shown in FIG. The composition of the target material is pure Ta, Ta-40 atomic% Ni, Ta-60 atomic% Ni,
There are five kinds of Ta-80 atomic% Ni and pure Ni.
【００２０】図２から分かるように、純Ｔａ及び純Ｎｉ
ターゲットで成膜した膜は結晶化しているのに対し、Ｔ
ａ‐Ｎｉ粉末の混合ターゲットで成膜した膜はブロード
なＸ線回折パターンを示し、アモルファス化している。
すなわち、Ｔａ‐４０原子％Ｎｉ〜Ｔａ‐８０原子％Ｎ
ｉの広い組成範囲でアモルファス化が可能である。As can be seen from FIG. 2, pure Ta and pure Ni
The film formed by the target is crystallized, whereas T
The film formed with the mixed target of a-Ni powder shows a broad X-ray diffraction pattern and is amorphized.
That is, Ta-40 atomic% Ni to Ta-80 atomic% N
Amorphization is possible in a wide composition range of i.
【００２１】図３に、前記図２のＸ線回折パターンの最
強ピークの半価幅から見積もった微結晶サイズと組成と
の関係をグラフで示す。FIG. 3 is a graph showing the relationship between the crystallite size and the composition estimated from the full width at half maximum of the strongest peak of the X-ray diffraction pattern shown in FIG.
【００２２】図３から分かるように、Ｘ線回折パターン
から見積もった合金膜の微結晶サイズは、純金属の７ｎ
ｍ（Ｔａ）及び１５ｎｍ（Ｎｉ）に比べてかなり小さ
く、１．２〜１．９ｎｍである。この値は液体金属のそ
れに相当するため、合金膜はアモルファスであるとみな
される。なお、図３中に、スプラッシュ‐クエンチング
法（通常の急冷法）で作成した薄片の微結晶サイズを黒
正方形印で示した。レーザアブレーション法により、通
常の急冷法よりも大きな冷却速度でアモルファス合金化
できることが分かる。As can be seen from FIG. 3, the crystallite size of the alloy film estimated from the X-ray diffraction pattern is 7n of pure metal.
It is considerably smaller than m (Ta) and 15 nm (Ni), and is 1.2 to 1.9 nm. Since this value corresponds to that of liquid metal, the alloy film is considered to be amorphous. In FIG. 3, the black crystal marks indicate the crystallite size of flakes prepared by the splash-quenching method (normal quenching method). It can be seen that the laser ablation method enables the amorphous alloy to be formed at a higher cooling rate than the normal quenching method.
【００２３】図４に、ターゲット物質の組成と被膜の組
成との関係をグラフで示す。レーザフルエンスが小さい
場合には、沸点の低いＮｉが優先的にアブレーションさ
れ、ターゲットに比べてＮｉリッチの合金膜が形成され
る。レーザフルエンスを、沸点の高いＴａも十分にアブ
レーションされるほど大きくすることにより、ターゲッ
トとほぼ同一組成の被膜が得られる。FIG. 4 is a graph showing the relationship between the composition of the target material and the composition of the coating film. When the laser fluence is small, Ni having a low boiling point is preferentially ablated, and a Ni-rich alloy film is formed as compared with the target. By increasing the laser fluence so that Ta having a high boiling point is sufficiently ablated, a coating having almost the same composition as the target can be obtained.
【図１】 本発明方法を好適に実施するための装置の１
例の略解断面図。FIG. 1 is an apparatus 1 for suitably carrying out the method of the present invention.
FIG.
【図２】 実施例１で形成された被膜のＸ線回折パター
ン。2 is an X-ray diffraction pattern of the film formed in Example 1. FIG.
【図３】 図２のＸ線回折パターンの最強ピークの半価
幅から見積もった微結晶サイズと組成との関係を示すグ
ラフ。3 is a graph showing the relationship between the crystallite size and the composition estimated from the full width at half maximum of the strongest peak in the X-ray diffraction pattern of FIG.
【図４】 実施例１で形成された被膜の組成とターゲッ
ト物質の組成との関係を示すグラフ。FIG. 4 is a graph showing the relationship between the composition of the coating film formed in Example 1 and the composition of the target substance.
１ 密閉容器 ２ 排気口 ３ エキシマレーザビーム ４ 石英ウインドー ５ 凹面鏡 ６ 集光レンズ ７ ターゲット物質 ８ 基材 1 Airtight container 2 Exhaust port 3 Excimer laser beam 4 Quartz window 5 Concave mirror 6 Focusing lens 7 Target material 8 Base material
───────────────────────────────────────────────────── フロントページの続き (72)発明者 勝村 宗英 香川県高松市林町2217番14 工業技術院四 国工業技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Munehide Katsumura 2217-14 Hayashi-cho, Takamatsu-shi, Kagawa Prefectural Institute of Industrial Technology Shikoku Institute of Industrial Technology
Claims (3)
の混合金属粉末焼結体又はアモルファス合金から成る蒸
着用ターゲット物質の少なくとも１種にエキシマレーザ
を照射してアブレーションすることにより、基材表面に
アモルファス合金被膜を形成させることを特徴とする金
属表面被覆方法。1. An amorphous alloy is applied to the surface of a substrate by irradiating at least one target material for vapor deposition consisting of a mixed metal powder sintered body having an amorphous composition or an amorphous alloy with an excimer laser to ablate in a vacuum zone. A method for coating a metal surface, which comprises forming a coating film.
２種以上である請求項１記載の被覆方法。2. The coating method according to claim 1, wherein the target materials for vapor deposition are two or more kinds having different compositions.
Ｎｉ−Ｃｒ系、Ｔｉ−Ｃｕ系、Ｚｒ−Ｃｕ系、Ｆｅ−Ｃ
ｒ系又はＣｏ−Ｃｒ系のアモルファス合金被膜である請
求項１又は２記載の金属表面被覆方法。3. The amorphous alloy coating is a Ta—Ni system,
Ni-Cr system, Ti-Cu system, Zr-Cu system, Fe-C
The metal surface coating method according to claim 1 or 2, which is an r-type or Co-Cr type amorphous alloy film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7119196A JP2913015B2 (en) | 1996-03-01 | 1996-03-01 | Surface coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7119196A JP2913015B2 (en) | 1996-03-01 | 1996-03-01 | Surface coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09241832A true JPH09241832A (en) | 1997-09-16 |
| JP2913015B2 JP2913015B2 (en) | 1999-06-28 |
Family
ID=13453538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7119196A Expired - Lifetime JP2913015B2 (en) | 1996-03-01 | 1996-03-01 | Surface coating method |
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| Country | Link |
|---|---|
| JP (1) | JP2913015B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021529890A (en) * | 2018-08-14 | 2021-11-04 | アトメタル テック ピーティーイー エルティーディーＡｔｔｏｍｅｔａｌ Ｔｅｃｈ Ｐｔｅ． Ｌｔｄ． | A pipe with an amorphous coated inner surface and its manufacturing method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10872701B2 (en) * | 2016-06-10 | 2020-12-22 | Westinghouse Electric Company Llc | Zirconium-coated silicon carbide fuel cladding for accident tolerant fuel application |
-
1996
- 1996-03-01 JP JP7119196A patent/JP2913015B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021529890A (en) * | 2018-08-14 | 2021-11-04 | アトメタル テック ピーティーイー エルティーディーＡｔｔｏｍｅｔａｌ Ｔｅｃｈ Ｐｔｅ． Ｌｔｄ． | A pipe with an amorphous coated inner surface and its manufacturing method |
| US12129955B2 (en) | 2018-08-14 | 2024-10-29 | Atometal Tech Pte. Ltd. | Amorphous inner-coated pipe and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2913015B2 (en) | 1999-06-28 |
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