JPH09265916A - Shadow mask and manufacture thereof - Google Patents
Shadow mask and manufacture thereofInfo
- Publication number
- JPH09265916A JPH09265916A JP8075525A JP7552596A JPH09265916A JP H09265916 A JPH09265916 A JP H09265916A JP 8075525 A JP8075525 A JP 8075525A JP 7552596 A JP7552596 A JP 7552596A JP H09265916 A JPH09265916 A JP H09265916A
- Authority
- JP
- Japan
- Prior art keywords
- hole
- shadow mask
- slot
- holes
- slot hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005304 joining Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/06—Screens for shielding; Masks interposed in the electron stream
- H01J29/07—Shadow masks for colour television tubes
- H01J29/076—Shadow masks for colour television tubes characterised by the shape or distribution of beam-passing apertures
Landscapes
- Electrodes For Cathode-Ray Tubes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、シャドウマスクに
関し、特にカラー陰極線管に使用されるスロット孔の水
平軸方向に対する断面形状に特徴を有するシャドウマス
クに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shadow mask, and more particularly to a shadow mask characterized by the sectional shape of a slot hole used in a color cathode ray tube in the horizontal axis direction.
【０００２】[0002]
【従来の技術】従来のカラー陰極線管の基本構造である
要部断面図を図４に示す。図４に示すように、一般にカ
ラー陰極線管１１は、バルブ１２の前面部を構成するフ
ェースパネル１３の内面に形成した蛍光面１４、シャド
ウマスク１５が順次配設され、バルブ１２のネック部に
配設された電子銃１６から放出される電子ビーム１７を
偏向ヨーク１８による磁界で偏向させ、シャドウマスク
１５を介して蛍光面１４を走査することにより、蛍光面
上に画像を表示するように構成されている。2. Description of the Related Art FIG. 4 shows a cross-sectional view of a main part of a basic structure of a conventional color cathode ray tube. As shown in FIG. 4, generally, in the color cathode ray tube 11, a fluorescent screen 14 and a shadow mask 15 formed on the inner surface of a face panel 13 constituting the front surface of the bulb 12 are sequentially arranged, and are arranged at the neck of the bulb 12. The electron beam 17 emitted from the provided electron gun 16 is deflected by the magnetic field generated by the deflection yoke 18, and the fluorescent screen 14 is scanned through the shadow mask 15 to display an image on the fluorescent screen. ing.
【０００３】カラー陰極線管は、画像表示装置としての
基本性能すなわちコントラストや輝度を向上させるた
め、フェースパネル１３の内面に赤、緑、青の各色蛍光
体発光画素の間を非発光吸光性物質、例えば黒鉛で埋め
たブラックマトリクス膜（図示せず、以降ＢＭ膜とす
る）を形成し、このＢＭ膜と一体的に形成した蛍光面１
４と、この蛍光面１４とは遊離した形で光を反射するア
ルミニウム膜からなるメタルバック膜（図示せず）と、
さらにシャドウマスク１５を配設した構造になってい
る。In order to improve the basic performance as an image display device, that is, the contrast and the brightness, the color cathode ray tube has a non-light-absorbing substance on the inner surface of the face panel 13 between the phosphor-emitting pixels of red, green and blue. For example, a black matrix film (not shown, hereinafter referred to as a BM film) filled with graphite is formed, and the phosphor screen 1 integrally formed with the BM film is formed.
4 and a metal back film (not shown) made of an aluminum film that reflects light in a separated form from the phosphor screen 14,
Further, the shadow mask 15 is provided.
【０００４】ここでは、本発明と対応させるため、カラ
ー陰極線管のスロット孔を有するシャドウマスクについ
てのみ説明する。シャドウマスクは電子ビームを通過さ
せる多数の矩形状のスロット孔を有している。図５は、
シャドウマスクとして形成された多数個からなる矩形状
のスロット孔配列を示す部分平面図である。図５に示す
ように、シャドウマスク１５には、垂直軸Ｖ方向に長
辺、水平軸Ｈ方向に短辺幅Ｌｓを有した多数のスロット
孔２２が形成されている。また垂直軸Ｖ方向に並んだス
ロット孔２２間に形成される部分がブリッジ部２３で、
水平軸Ｈ方向に並んだスロット孔２２間に形成される部
分が連結部２４である。In order to correspond to the present invention, only the shadow mask having the slot holes of the color cathode ray tube will be described here. The shadow mask has a large number of rectangular slot holes through which the electron beam passes. FIG.
FIG. 6 is a partial plan view showing a rectangular slot hole array composed of a large number formed as a shadow mask. As shown in FIG. 5, the shadow mask 15 is provided with a large number of slot holes 22 each having a long side in the vertical axis V direction and a short side width Ls in the horizontal axis H direction. Further, the portion formed between the slot holes 22 arranged in the vertical axis V direction is the bridge portion 23,
The portion formed between the slot holes 22 arranged in the horizontal axis H direction is the connecting portion 24.
【０００５】シャドウマスク１５に配設された多数のス
ロット孔２２は、図示しないが、シャドウマスク素材の
表面（蛍光面側）および裏面（電子銃側）に、いずれも
矩形状のレジストパターンを形成した後、エッチングす
ることによって形成している。なお、このレジストパタ
ーンは、画面の垂直軸方向に長辺、水平軸方向に短辺を
有した矩形である。Although not shown, a large number of slot holes 22 provided in the shadow mask 15 are formed with a rectangular resist pattern on both the front surface (phosphor screen side) and the back surface (electron gun side) of the shadow mask material. After that, it is formed by etching. The resist pattern is a rectangle having a long side in the vertical axis direction of the screen and a short side in the horizontal axis direction.
【０００６】図６は、図５のＡ−Ａ方向から見たスロッ
ト孔と連結部を示す部分断面図である。図６に示すよう
に、エッチングによって、シャドウマスク１５の表面に
矩形状の大孔２２ａを、裏面に矩形状の小孔２２ｂを穿
設して所望のスロット孔２２を形成している。一般に、
このスロット孔２２を形成するにあたって、スロット孔
２２がシャドウマスク１５の中央部から周辺側方向へ離
れるに従って、設計的に小孔２２ｂの中心が大孔２２ａ
の中心に対して、段階的に微増させながら偏心させて形
成している。FIG. 6 is a partial cross-sectional view showing the slot hole and the connecting portion as viewed from the direction AA of FIG. As shown in FIG. 6, by etching, a large hole 22a having a rectangular shape is formed on the surface of the shadow mask 15 and a small hole 22b having a rectangular shape is formed on the back surface thereof to form a desired slot hole 22. In general,
In forming the slot hole 22, as the slot hole 22 moves away from the central portion of the shadow mask 15 in the peripheral direction, the center of the small hole 22b is designed to be the large hole 22a.
It is formed so as to be eccentric while slightly increasing in stages with respect to the center.
【０００７】すなわち、シャドウマスク１５の中央部で
は、大孔２２ａの中心と小孔２２ｂの中心とは一致し、
図中、Ｃ１＜Ｃ２＜Ｃ３のように、シャドウマスク１５
の中央部から最外端部にかけて小孔２２ｂの中心をシャ
ドウマスクの中央部寄りに順次段階的に微増させてい
る。これは、スロット孔２２の断面形状を変化させてス
ロット孔２２の短辺幅Ｌｓを微増させることによって、
入射角をもつ露光光線の直射光がスロット孔壁によって
不所望に反射する光量を最小にすることを狙っている。That is, in the central portion of the shadow mask 15, the center of the large hole 22a and the center of the small hole 22b coincide with each other,
In the figure, as shown by C1 <C2 <C3, the shadow mask 15
The center of the small hole 22b is gradually and gradually increased toward the center of the shadow mask from the center to the outermost end. This is because the cross-sectional shape of the slot hole 22 is changed to slightly increase the short side width Ls of the slot hole 22.
The aim is to minimize the amount of undesired reflection of the direct rays of exposure light rays having an incident angle by the wall of the slot hole.
【０００８】このように、フェースパネル１３の内面に
蛍光面１４を形成する露光工程では、シャドウマスク１
５とフェースパネル１３とを一対にして露光し、ＢＭ膜
を塗布形成している。この露光工程では、光源からシャ
ドウマスク１５のスロット孔２２への露光光線の照射角
度と、シャドウマスク１５に形成されたスロット孔２２
の短辺幅Ｌｓの影響を受けることになる。上述したよう
に、シャドウマスク１５では、全スロット孔２２は、基
本的にはＡ−Ａ方向からみ見たスロット孔２２の断面形
状を微妙に変化させて短辺幅Ｌｓを微増させ、スロット
孔壁による反射光を最小化することを図っている。As described above, in the exposure step of forming the fluorescent screen 14 on the inner surface of the face panel 13, the shadow mask 1
5 and the face panel 13 are exposed as a pair to form a BM film by coating. In this exposure step, the irradiation angle of the exposure light beam from the light source to the slot hole 22 of the shadow mask 15 and the slot hole 22 formed in the shadow mask 15
Will be affected by the short side width Ls. As described above, in the shadow mask 15, all the slot holes 22 basically slightly change the cross-sectional shape of the slot holes 22 viewed from the AA direction to slightly increase the short side width Ls, and the slot hole walls. The reflected light is minimized.
【０００９】[0009]
【発明が解決しようとする課題】しかしながら、実際の
露光工程において、シャドウマスク１５に穿設された有
孔域の最外端部となる領域、特にコーナ部に近いスロッ
ト孔２２では、通常の露光量として片側が無孔域のた
め、最外端部の一つ内側のスロット孔からのみしか露光
光線の補助光が得られず絶対的な光量不足となることが
ある。このように絶対的に光量が不足すると、ＢＭ膜の
ストライプが完全に抜け切らず、蛍光面１４のストライ
プ内に不所望なＢＭ膜が残ることに起因する蛍光面１４
のストライプ欠損、いわゆるストライプ落ちが発生す
る。そこで、本発明は上記問題点に鑑みて提案されたも
ので、その目的とするところは、ストライプ落ちを防止
する手段を提供し、蛍光面の製造品質を向上させること
を可能にしたシャドウマスクを提供することにある。However, in the actual exposure process, in the region which is the outermost end of the perforated region formed in the shadow mask 15, particularly in the slot hole 22 near the corner, the normal exposure is performed. Since one side is a non-perforated region, the auxiliary light of the exposure light beam may be obtained only from the slot hole inside one of the outermost end portions, and the absolute light amount may be insufficient. When the light quantity is absolutely insufficient in this way, the stripes of the BM film are not completely cut off, and the undesired BM film remains in the stripes of the phosphor screen 14, which causes the fluorescent screen 14 to disappear.
Stripe defect, so-called stripe drop occurs. Therefore, the present invention has been proposed in view of the above problems, and an object thereof is to provide a means for preventing stripe drop and to provide a shadow mask capable of improving the manufacturing quality of the fluorescent screen. To provide.
【００１０】[0010]
【課題を解決するための手段】本発明は、金属薄板の有
孔域に形成した表面大孔の中心に対して、裏面小孔の中
心を水平軸方向に順次微増偏心させて形成した縦列整列
のスロット孔を有するシャドウマスクにおいて、最外端
縦列スロット孔の水平軸方向短辺断面形状を偏心方向と
逆偏心構造とし、露光光線の直射光を斜光もしくは減光
し、反射孔光を通過させるようにしたシャドウマスクを
提供する。SUMMARY OF THE INVENTION According to the present invention, a columnar alignment is formed by sequentially slightly increasing and eccentricizing the center of a back surface small hole in the horizontal axis direction with respect to the center of a front surface large hole formed in a perforated area of a thin metal plate. In the shadow mask having the slot holes, the outermost vertical column slot holes have a short-axis cross-sectional shape in the horizontal axis direction opposite to the eccentric direction, and have an eccentric structure opposite to the eccentric direction. To provide a shadow mask.
【００１１】また、シャドウマスクの前記最外端縦列ス
ロット孔の水平軸方向短辺断面形状を形成する手段が前
記大孔および小孔のレジストパターンであって、小孔の
中心が他のスロット孔を形成する偏心方向に対して大孔
の中心よりシャドウマスクの外方へ逆偏心させて形成す
るシャドウマスクの製造方法を提供する。The means for forming the horizontal short side cross-sectional shape of the outermost vertical column slot holes of the shadow mask is the resist pattern of the large holes and the small holes, and the center of the small holes is another slot hole. Provided is a method for manufacturing a shadow mask, which is formed by eccentrically decentering the shadow mask from the center of a large hole toward the outside of the shadow mask.
【００１２】[0012]
【発明の実施の形態】本発明の実施の形態について、図
面を参照しながら説明する。図１〜図３は、本発明によ
るシャドウマスクである。各図において、１はシャドウ
マスク、２と３０はスロット孔、２ａと３０ａは大孔、
２ｂと３０ｂは小孔、３はブリッジ部、４は連結部、Ｌ
ｓはスロット孔２の標準短辺幅、Ｌａはスロット孔３０
の標準短辺幅より若干小さい短辺幅である。また、３０
ｃと３０ｄはスロット孔３０を形成するための大孔と小
孔とのそれぞれの接合点である。Embodiments of the present invention will be described with reference to the drawings. 1 to 3 are shadow masks according to the present invention. In each figure, 1 is a shadow mask, 2 and 30 are slot holes, 2a and 30a are large holes,
2b and 30b are small holes, 3 is a bridge portion, 4 is a connecting portion, L
s is the standard short side width of the slot hole 2, and La is the slot hole 30.
The short side width is slightly smaller than the standard short side width. Also, 30
Symbols c and 30d are joint points of the large hole and the small hole for forming the slot hole 30, respectively.
【００１３】図１は、本発明による多数個からなるスロ
ット孔配列を示す部分平面図である。図１に示すよう
に、シャドウマスク１には、垂直軸Ｖ方向に長辺、水平
軸Ｈ方向に標準短辺幅Ｌｓを有する多数のスロット孔２
が形成され、最外端部に位置するスロット孔３０のみが
標準短辺幅Ｌｓよりも若干小さい短辺幅Ｌａを有する。
また垂直軸Ｖ方向に並んだスロット孔２（３０）間に形
成される部分がブリッジ部３で、水平軸Ｈ方向に並んだ
スロット孔２間およびスロット孔２とスロット孔３０間
に形成される部分が連結部４である。FIG. 1 is a partial plan view showing a slot hole array made up of a plurality of holes according to the present invention. As shown in FIG. 1, the shadow mask 1 has a large number of slot holes 2 having long sides in the vertical axis V direction and standard short side widths Ls in the horizontal axis H direction.
Is formed, and only the slot hole 30 located at the outermost end has a short side width La slightly smaller than the standard short side width Ls.
Further, a portion formed between the slot holes 2 (30) arranged in the vertical axis V direction is a bridge portion 3, which is formed between the slot holes 2 arranged in the horizontal axis H direction and between the slot holes 2 and 30. The portion is the connecting portion 4.
【００１４】図２は、図１のＡ−Ａ方向から見たスロッ
ト孔と連結部を示す部分断面図である。図２に示すよう
に、レジストパターンを形成後エッチングすることによ
って、シャドウマスク１の表面に矩形状の大孔２ａを、
裏面に矩形状の小孔２ｂを穿設して所望のスロット孔２
およびスロット孔３０を形成している。さらに、このス
ロット孔２およびスロット孔３０について説明する。FIG. 2 is a partial cross-sectional view showing the slot hole and the connecting portion as seen from the direction AA of FIG. As shown in FIG. 2, a rectangular large hole 2a is formed on the surface of the shadow mask 1 by etching after forming a resist pattern.
A rectangular small hole 2b is formed on the back surface to form a desired slot hole 2
And the slot hole 30 is formed. Further, the slot hole 2 and the slot hole 30 will be described.
【００１５】このスロット孔２（３０）の製造方法は、
金属薄板の表面に矩形状の大孔２ａ（３０ａ）形成用の
レジストパターン、裏面に矩形状の小孔２ｂ（３０ｂ）
形成用レジストパターンを形成する。このレジストパタ
ーンが形成された金属薄板の両面をエッチングすること
によって、表面に矩形状の大孔２ａ（３０ａ）、裏面に
矩形状の小孔２ｂ（３０ｂ）が穿設され、大孔２ａ（３
０ａ）と小孔２ｂ（３０ｂ）との貫通接合部が所望する
スロット孔２（３０）となる。The method of manufacturing the slot hole 2 (30) is as follows.
A resist pattern for forming a rectangular large hole 2a (30a) on the surface of the metal thin plate, and a rectangular small hole 2b (30b) on the back surface.
A resist pattern for formation is formed. By etching both surfaces of the metal thin plate on which the resist pattern is formed, a rectangular large hole 2a (30a) is formed on the front surface and a rectangular small hole 2b (30b) is formed on the back surface, and the large hole 2a (3
0a) and the small hole 2b (30b) are the through-hole joints to form the desired slot hole 2 (30).
【００１６】なお、形成したスロット孔２がシャドウマ
スク１の中央部から周辺側方向へ離れるに従って、設計
的に小孔２ｂの中心が大孔２ａの中心に対して、段階的
にシャドウマスク１の中央部寄りに微増偏心させて形成
している。すなわち、シャドウマスク１の中央部では、
大孔２ａの中心と小孔２ｂの中心とは一致し、図中、Ｄ
１＜Ｄ２のように小孔２ｂの中心をシャドウマスク１の
中央部寄りに順次段階的に微増偏心させている。これ
は、スロット孔２を光源からパネル方向に見たときの断
面形状をほぼ一定にすることを狙っている。As the formed slot hole 2 is separated from the central portion of the shadow mask 1 in the peripheral direction, the center of the small hole 2b is designed to be stepwise with respect to the center of the large hole 2a. It is formed by slightly increasing the eccentricity toward the center. That is, in the central portion of the shadow mask 1,
The center of the large hole 2a coincides with the center of the small hole 2b, and in the figure, D
As 1 <D2, the center of the small hole 2b is gradually and gradually decentered toward the central portion of the shadow mask 1 in a stepwise manner. This aims at making the cross-sectional shape of the slot hole 2 as viewed from the light source in the panel direction substantially constant.
【００１７】このように、スロット２がシャドウマスク
１の中央部より外方の無孔域の周辺側へ離れるに従っ
て、設計的に大孔２ａの中心に対して小孔２ｂの中心が
段階的に微増偏心させることは、最外端部のスロット孔
３０を除いては従来技術と同様である。しかし、最外端
部のスロット孔３０のみは、スロット孔２の偏心方向と
は逆に表面の大孔３０ａの中心に対して裏面の小孔３０
ｂの中心がシャドウマスク１の無孔域寄りに偏心させて
形成している。As described above, as the slot 2 moves away from the central portion of the shadow mask 1 toward the outer peripheral side of the non-perforated area, the center of the small hole 2b is designed stepwise with respect to the center of the large hole 2a. The slightly increased eccentricity is the same as in the prior art except for the slot hole 30 at the outermost end. However, only the slot hole 30 at the outermost end is opposite to the eccentric direction of the slot hole 2, and the small hole 30 on the back surface is opposite to the center of the large hole 30a on the front surface.
The center of b is eccentrically formed near the non-hole area of the shadow mask 1.
【００１８】ここで、本発明の主眼となる最外端部のス
ロット孔３０の詳細について説明する。最外端部のスロ
ット孔３０は、他のスロット孔２の偏心とは逆方向、す
なわち、表面の大孔３０ａの中心に対して裏面の小孔３
０ｂの中心がシャドウマスク１の外方すなわち無孔域寄
りに偏心さて形成する。Here, details of the slot hole 30 at the outermost end, which is the main point of the present invention, will be described. The slot hole 30 at the outermost end is in the direction opposite to the eccentricity of the other slot holes 2, that is, the small hole 3 on the back surface with respect to the center of the large hole 30a on the front surface.
The center of 0b is eccentrically formed outside the shadow mask 1, that is, near the non-hole area.
【００１９】図２に示すように、偏心量Ｄ３は無孔域寄
りに移動偏心させたことから断面形状が大きく変化す
る。エッチングによって表面の大孔３０ａと裏面の小孔
３０ｂとを穿設することによって、最外端部のスロット
孔３０は、大孔３０ａと小孔３０ｂとのそれぞれの接合
点が３０ｃと３０ｄとを有する断面形状になる。As shown in FIG. 2, since the eccentric amount D3 is moved and eccentric toward the non-hole area, the cross-sectional shape changes greatly. By forming the large hole 30a on the front surface and the small hole 30b on the rear surface by etching, the slot hole 30 at the outermost end has the joining points 30c and 30d of the large hole 30a and the small hole 30b. It becomes the cross-sectional shape that it has.
【００２０】なお、本発明は、露光工程において、最外
端部のスロット孔が露光光線の直射光を遮光または減光
し露光装置の筐体等からの反射光を通過させることが目
的であることから、シャドウマスクの板厚の関係等の諸
条件等により、上述した内容とは逆方法となる手段とし
て表面を小孔に、裏面を大孔にして断面構造を確保して
もよい。It is an object of the present invention that, in the exposure step, the slot hole at the outermost end blocks or diminishes the direct light of the exposure light and allows the light reflected from the housing of the exposure apparatus to pass through. Therefore, depending on various conditions such as the relationship between the thickness of the shadow mask and the like, the cross-sectional structure may be secured by making the front surface a small hole and the back surface a large hole as a means that is the reverse of the above method.
【００２１】図３は、本発明によるシャドウマスクのス
ロット孔と通過光量の関係を示す説明図である。図３に
示すように、シャドウマスク１の中央部では、露光光線
の直射光はスロット孔２の短辺幅Ｌｓを通過するため光
量は大きい。一方、最端部では、直射光は角度θをもつ
ことから、実際に通過する光量は、大孔３０ａと小孔３
０ｂの接合点である３０ｄと大孔３０ａのエッジ部３０
ｅとによって遮光もしくは減光される。しかしながら露
光装置の筐体等からの反射光は通過可能である。このス
ロット孔３０を通過する反射光は、露光工程において最
外端部より内側の１列目に位置するスロット孔２を通過
する正規の光量に重畳されることになり補助光として重
要な作用として働く。FIG. 3 is an explanatory diagram showing the relationship between the slot holes of the shadow mask according to the present invention and the amount of passing light. As shown in FIG. 3, in the central portion of the shadow mask 1, the direct light of the exposure light beam passes through the short side width Ls of the slot hole 2, so that the light amount is large. On the other hand, at the extreme end, since the direct light has an angle θ, the amount of light that actually passes is the large hole 30a and the small hole 3
30d, which is the joining point of 0b, and the edge portion 30 of the large hole 30a.
The light is shielded or dimmed by e. However, the reflected light from the housing of the exposure apparatus can pass through. The reflected light passing through the slot hole 30 is superposed on the regular amount of light passing through the slot hole 2 located in the first row inside the outermost end portion in the exposure process, which is an important function as auxiliary light. work.
【００２２】[0022]
【発明の効果】上述したように、本発明のシャドウマス
クとその製造方法によれば、大孔および小孔の相互作用
によって形成する最外端部に位置するスロット孔の水平
軸方向の断面形状が露光光線の直射光を遮光もしくは減
光し、露光装置の筐体等からの反射光を通過させる。従
って、露光工程において、最外端部では絶対的な露光量
が極端に減少することから、最外端部、特にコーナ部で
の露光量不足によりストライプ落ちが発生しなくなり、
蛍光面の製造品質が向上する。なお、反射光を通過させ
ることから最外端部から一つ内側の縦列スロットに対し
ては従来通りの露光量が得られことから影響を与えな
い。As described above, according to the shadow mask and the method of manufacturing the same of the present invention, the cross-sectional shape in the horizontal axis direction of the slot hole located at the outermost end formed by the interaction of the large hole and the small hole. Intercepts or diminishes the direct light of the exposure light and allows the light reflected from the housing of the exposure apparatus to pass through. Therefore, in the exposure step, since the absolute exposure amount is extremely reduced at the outermost end portion, stripe loss does not occur due to insufficient exposure amount at the outermost end portion, especially the corner portion,
The manufacturing quality of the phosphor screen is improved. It should be noted that since the reflected light is allowed to pass through, the column slot located one inward from the outermost end portion will not be affected because the conventional exposure amount can be obtained.
【図１】 本発明によるスロット孔配列を示す部分平面
図FIG. 1 is a partial plan view showing a slot hole array according to the present invention.
【図２】 図１のＡ−Ａ線より見たスロット孔と連結部
を示す部分断面図FIG. 2 is a partial cross-sectional view showing a slot hole and a connecting portion viewed from the line AA of FIG.
【図３】 本発明によるシャドウマスクのスロット孔と
通過光量の関係を示す説明図FIG. 3 is an explanatory diagram showing a relationship between a slot hole of a shadow mask according to the present invention and a passing light amount.
【図４】 カラー陰極線管の基本構造を示す要部断面図FIG. 4 is a sectional view of an essential part showing the basic structure of a color cathode ray tube.
【図５】 従来のスロット孔配列を示す部分平面図FIG. 5 is a partial plan view showing a conventional slot hole arrangement.
【図６】 図５のＡ−Ａ方向から見たスロット孔と連結
部を示す部分断面図6 is a partial cross-sectional view showing a slot hole and a connecting portion as viewed from the direction AA of FIG.
【図７】 従来のシャドウマスクと通過光量の関係を示
す説明図FIG. 7 is an explanatory diagram showing a relationship between a conventional shadow mask and the amount of passing light.
１ シャドウマスク ２，３０ スロット孔 ２ａ，３０ａ 表面の大孔 ２ｂ，３０ｂ 裏面の小孔 ３０ｅ，３０ｄ 大孔と小孔の接合点 ３０ｅ 大孔のエッジ部 ３ ブリッジ部 ４ 連結部 Ｄ１，Ｄ２，Ｄ３ 大孔に対する小孔の偏心量 1 Shadow Mask 2, 30 Slot Holes 2a, 30a Large Holes on Front Surface 2b, 30b Small Holes on Back Side 30e, 30d Joining Point of Large Holes and Small Holes 30e Edge of Large Holes 3 Bridge 4 Connections D1, D2, D3 Eccentricity of small holes with respect to large holes
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成８年６月１８日[Submission date] June 18, 1996
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Correction target item name] Brief description of drawings
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【図面の簡単な説明】[Brief description of drawings]
【図１】 本発明によるスロット孔配列を示す部分平面
図FIG. 1 is a partial plan view showing a slot hole array according to the present invention.
【図２】 図１のＡ−Ａ線より見たスロット孔と連結部
を示す部分断面図FIG. 2 is a partial cross-sectional view showing a slot hole and a connecting portion viewed from the line AA of FIG.
【図３】 本発明によるシャドウマスクのスロット孔と
通過光量の関係を示す説明図FIG. 3 is an explanatory diagram showing a relationship between a slot hole of a shadow mask according to the present invention and a passing light amount.
【図４】 カラー陰極線管の基本構造を示す要部断面図FIG. 4 is a sectional view of an essential part showing the basic structure of a color cathode ray tube.
【図５】 従来のスロット孔配列を示す部分平面図FIG. 5 is a partial plan view showing a conventional slot hole arrangement.
【図６】 図５のＡ−Ａ方向から見たスロット孔と連結
部を示す部分断面図6 is a partial cross-sectional view showing a slot hole and a connecting portion as viewed from the direction AA of FIG.
【符号の説明】 １ シャドウマスク ２，３０ スロット孔 ２ａ，３０ａ 表面の大孔 ２ｂ，３０ｂ 裏面の小孔 ３０ｃ，３０ｄ 大孔と小孔の接合点 ３０ｅ 大孔のエッジ部 ３ ブリッジ部 ４ 連結部 Ｄ１，Ｄ２，Ｄ３ 大孔に対する小孔の偏心量[Explanation of reference symbols] 1 shadow mask 2,30 slot holes 2a, 30a large holes on the front surface 2b, 30b small holes on the back surface 30c, 30d joining point between large holes and small holes 30e edge part of large hole 3 bridge part 4 connecting part D1, D2, D3 Eccentricity of small holes with respect to large holes
Claims (2)
心に対して、裏面小孔の中心を水平軸方向に順次微増偏
心させて形成した縦列整列のスロット孔を有するシャド
ウマスクにおいて、最外端縦列スロット孔の水平軸方向
短辺断面形状を前記偏心方向と逆偏心構造とし、露光光
線の直射光を斜光もしくは減光し、反射孔光を通過させ
るようにしたことを特徴とするシャドウマスク。Claims: 1. A shadow mask having slot holes arranged in tandem, wherein the centers of rear surface small holes are slightly slightly decentered in the horizontal axis direction with respect to the center of front surface large holes formed in a perforated area of a thin metal plate. The outermost vertical column slot hole has a short-axis cross-sectional shape in the horizontal axis direction which is an eccentric structure opposite to the eccentric direction, and the direct light of the exposure light beam is obliquely or dimmed to allow the light of the reflection hole to pass. A shadow mask to do.
端縦列スロット孔の水平軸方向短辺断面形状を形成する
手段が前記大孔および小孔のレジストパターンであっ
て、前記小孔の中心が他のスロット孔を形成する偏心方
向に対して前記大孔の中心よりシャドウマスクの外方へ
逆偏心させて形成することを特徴とするシャドウマスク
の製造方法。2. The shadow mask according to claim 1, wherein the means for forming the cross-sectional shape in the horizontal axis direction of the outermost vertical column slot holes is a resist pattern of the large holes and the small holes, A method of manufacturing a shadow mask, wherein the center is formed so as to be decentered from the center of the large hole to the outside of the shadow mask in an eccentric direction forming another slot hole.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8075525A JPH09265916A (en) | 1996-03-29 | 1996-03-29 | Shadow mask and manufacture thereof |
| US08/824,609 US5856725A (en) | 1996-03-29 | 1997-03-27 | Shadow mask with edge slots configuration |
| KR1019970011275A KR100239187B1 (en) | 1996-03-29 | 1997-03-28 | Shadow mask for a color crt and method of producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8075525A JPH09265916A (en) | 1996-03-29 | 1996-03-29 | Shadow mask and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09265916A true JPH09265916A (en) | 1997-10-07 |
Family
ID=13578741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8075525A Pending JPH09265916A (en) | 1996-03-29 | 1996-03-29 | Shadow mask and manufacture thereof |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5856725A (en) |
| JP (1) | JPH09265916A (en) |
| KR (1) | KR100239187B1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6388370B1 (en) | 1999-07-15 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube |
| US6566795B2 (en) | 2000-01-13 | 2003-05-20 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube having apertured shadow mask |
| US6577047B2 (en) | 1999-12-21 | 2003-06-10 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube |
| KR100515022B1 (en) * | 2002-05-29 | 2005-09-15 | 엘지.필립스 디스플레이 주식회사 | A Flat Tension Mask For The Flat Broun Tube |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10241596A (en) * | 1997-02-26 | 1998-09-11 | Nec Kansai Ltd | Shadow mask and its manufacture |
| JP3353712B2 (en) * | 1998-07-16 | 2002-12-03 | 関西日本電気株式会社 | Color cathode ray tube |
| JP4124387B2 (en) * | 1999-01-26 | 2008-07-23 | 大日本印刷株式会社 | CRT shadow mask |
| KR100388903B1 (en) | 1999-12-10 | 2003-06-25 | 삼성에스디아이 주식회사 | Shadow mask frame assembly for the flat CRT |
| JP2001196003A (en) * | 2000-01-11 | 2001-07-19 | Hitachi Ltd | Color cathode ray tube |
| KR20010097161A (en) * | 2000-04-20 | 2001-11-08 | 김순택 | Tension mask for color picture tube and method of manufacturing the same and exposure mask for making the tension mask |
| KR100683647B1 (en) | 2000-04-21 | 2007-02-15 | 삼성에스디아이 주식회사 | Tension mask frame assembly of color cathode ray tube |
| KR20020018278A (en) * | 2000-09-01 | 2002-03-08 | 김순택 | Shadow-mask for color picture tube and method of manufacturing the same and exposure mask for making the shadow-mask |
| JP2002110063A (en) * | 2000-09-28 | 2002-04-12 | Dainippon Printing Co Ltd | Shadow mask |
| KR100351865B1 (en) * | 2000-11-02 | 2002-09-11 | 엘지전자주식회사 | Shadow mask for color CRT |
| KR100730101B1 (en) * | 2000-12-04 | 2007-06-19 | 삼성에스디아이 주식회사 | Tension mask for flat cathode ray tube |
| KR100730100B1 (en) * | 2000-12-04 | 2007-06-19 | 삼성에스디아이 주식회사 | Tension mask for planar cathode ray tube and its manufacturing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0641009B1 (en) * | 1993-08-25 | 2000-01-05 | Kabushiki Kaisha Toshiba | Color cathode ray tube and method of manufacturing the same |
-
1996
- 1996-03-29 JP JP8075525A patent/JPH09265916A/en active Pending
-
1997
- 1997-03-27 US US08/824,609 patent/US5856725A/en not_active Expired - Fee Related
- 1997-03-28 KR KR1019970011275A patent/KR100239187B1/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6388370B1 (en) | 1999-07-15 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube |
| US6577047B2 (en) | 1999-12-21 | 2003-06-10 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube |
| US6566795B2 (en) | 2000-01-13 | 2003-05-20 | Matsushita Electric Industrial Co., Ltd. | Cathode ray tube having apertured shadow mask |
| KR100515022B1 (en) * | 2002-05-29 | 2005-09-15 | 엘지.필립스 디스플레이 주식회사 | A Flat Tension Mask For The Flat Broun Tube |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100239187B1 (en) | 2000-01-15 |
| US5856725A (en) | 1999-01-05 |
| KR970067505A (en) | 1997-10-13 |
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