JPH09329742A - 光学系の収差補正方法および収差補正光学系を備えた投影露光装置 - Google Patents

光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Info

Publication number
JPH09329742A
JPH09329742A JP8170609A JP17060996A JPH09329742A JP H09329742 A JPH09329742 A JP H09329742A JP 8170609 A JP8170609 A JP 8170609A JP 17060996 A JP17060996 A JP 17060996A JP H09329742 A JPH09329742 A JP H09329742A
Authority
JP
Japan
Prior art keywords
optical system
aberration correction
aberration
power
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8170609A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09329742A5 (2
Inventor
Koji Shigematsu
幸二 重松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8170609A priority Critical patent/JPH09329742A/ja
Publication of JPH09329742A publication Critical patent/JPH09329742A/ja
Publication of JPH09329742A5 publication Critical patent/JPH09329742A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8170609A 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置 Pending JPH09329742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8170609A JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8170609A JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Publications (2)

Publication Number Publication Date
JPH09329742A true JPH09329742A (ja) 1997-12-22
JPH09329742A5 JPH09329742A5 (2) 2004-11-04

Family

ID=15908033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8170609A Pending JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Country Status (1)

Country Link
JP (1) JPH09329742A (2)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6674513B2 (en) 1999-09-29 2004-01-06 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
WO2005001544A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 光学ユニット、結像光学系、結像光学系の収差調整方法、投影光学系、投影光学系の製造方法、露光装置、および露光方法
US6912094B2 (en) 2001-03-27 2005-06-28 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method
JP2010541292A (ja) * 2007-10-09 2010-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
CN113974957A (zh) * 2021-11-02 2022-01-28 北京鹰瞳科技发展股份有限公司 用于眼底按摩装置的镜筒和眼底按摩装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6606144B1 (en) 1999-09-29 2003-08-12 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6674513B2 (en) 1999-09-29 2004-01-06 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6864961B2 (en) 1999-09-29 2005-03-08 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6912094B2 (en) 2001-03-27 2005-06-28 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method
WO2005001544A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 光学ユニット、結像光学系、結像光学系の収差調整方法、投影光学系、投影光学系の製造方法、露光装置、および露光方法
JPWO2005001544A1 (ja) * 2003-06-26 2006-08-10 株式会社ニコン 光学ユニット、結像光学系、結像光学系の収差調整方法、投影光学系、投影光学系の製造方法、露光装置、および露光方法
JP2010541292A (ja) * 2007-10-09 2010-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
US8773638B2 (en) 2007-10-09 2014-07-08 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus with correction optical system that heats projection objective element
CN113974957A (zh) * 2021-11-02 2022-01-28 北京鹰瞳科技发展股份有限公司 用于眼底按摩装置的镜筒和眼底按摩装置
CN113974957B (zh) * 2021-11-02 2023-11-17 北京鹰瞳科技发展股份有限公司 用于眼底按摩装置的镜筒和眼底按摩装置

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