JPH0935337A - Method of manufacturing stamper for optical disk - Google Patents
Method of manufacturing stamper for optical diskInfo
- Publication number
- JPH0935337A JPH0935337A JP17714795A JP17714795A JPH0935337A JP H0935337 A JPH0935337 A JP H0935337A JP 17714795 A JP17714795 A JP 17714795A JP 17714795 A JP17714795 A JP 17714795A JP H0935337 A JPH0935337 A JP H0935337A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- back surface
- master
- electroforming
- optical disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 230000003287 optical effect Effects 0.000 title claims description 16
- 238000005498 polishing Methods 0.000 claims abstract description 17
- 230000003746 surface roughness Effects 0.000 claims abstract description 12
- 238000005323 electroforming Methods 0.000 claims description 31
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 11
- 239000003566 sealing material Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 6
- 239000000696 magnetic material Substances 0.000 claims description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- 229910001453 nickel ion Inorganic materials 0.000 claims description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 claims 1
- 230000010076 replication Effects 0.000 claims 1
- 238000004506 ultrasonic cleaning Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 8
- 238000005282 brightening Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- -1 aliphatic diols Chemical class 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- KDOWHHULNTXTNS-UHFFFAOYSA-N hex-3-yne-2,5-diol Chemical compound CC(O)C#CC(C)O KDOWHHULNTXTNS-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000000820 replica moulding Methods 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
(57)【要約】
【目的】 裏面研磨を行なわなくても充分に平滑な裏面
粗さを有する複製スタンパを製造する方法を提供する。
【構成】 陰極を毎分７５〜１８０回転の回転数で回転
させながら電鋳するもの。
(57) [Summary] [Object] To provide a method for producing a duplicate stamper having a sufficiently smooth back surface roughness without back surface polishing. [Structure] A cathode is electroformed while rotating at a rotational speed of 75 to 180 rpm.
Description
【０００１】[0001]
【産業上の利用分野】本発明は光ディスクを製造する際
の金型として用いられる光ディスク用スタンパの製造方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical disk stamper used as a mold for manufacturing an optical disk.
【０００２】[0002]
【従来の技術】光ディスクは、フロッピーディスクやハ
ードディスクに比べ、高記録密度用記録媒体として注目
されている。一般に光ディスク用の樹脂基板は、上記の
優れた特徴を保持しながら、大量生産が可能なようにス
タンパを用いて射出成形によって生産されている。この
際、スタンパには、ミクロンオーダーのサイズのグルー
ブやピットが形成されており、これらが光ディスク用の
樹脂基板に転写されるようになっている。2. Description of the Related Art Optical discs are attracting attention as recording media for high recording density as compared with floppy discs and hard discs. In general, a resin substrate for an optical disc is produced by injection molding using a stamper so that it can be mass-produced while maintaining the above excellent characteristics. At this time, grooves and pits having a size of micron order are formed on the stamper, and these are transferred to the resin substrate for the optical disc.
【０００３】従って、スタンパには、原盤としての高度
な精度および射出成形の際の耐久性が要求される。この
耐久性は射出成形条件にはもちろん、スタンパの表面硬
度にも大きく依存する。これまでの光ディスク用スタン
パの製造方法は、例えば、以下に示すような方法で行わ
れている。Therefore, the stamper is required to have high precision as a master and durability in injection molding. This durability greatly depends not only on the injection molding conditions but also on the surface hardness of the stamper. The conventional method of manufacturing an optical disk stamper is performed, for example, by the following method.
【０００４】すなわち、表面研磨したガラス原盤にレジ
ストをスピンコート法で均一な厚さに塗布し、プリベー
ク後レーザーカッティングマシンで所望のパターンに露
光した後、レジストを現像してピット及び／又はグルー
ブを形成する。このピット及び／又はグルーブを有する
レジスト付きガラス原盤表面上に銀あるいはニッケルな
どを無電解めっき法、スパッタ法、あるいは真空蒸着法
などにより被覆し、導電性を賦与した後、電鋳によりニ
ッケルを析出させる。That is, a resist having a uniform thickness is applied to a glass master having a surface polished by a spin coating method, and after prebaking, a desired pattern is exposed by a laser cutting machine, and then the resist is developed to form pits and / or grooves. Form. Silver or nickel is coated on the surface of the glass substrate with resist having the pits and / or grooves by an electroless plating method, a sputtering method, a vacuum deposition method or the like to impart conductivity, and then nickel is deposited by electroforming. Let
【０００５】その後ニッケルをガラス原盤より剥離し、
スタンパ信号面に残ったレジストを溶剤により除去し、
洗浄後乾燥する。その後スタンパの裏面を研磨洗浄し次
いでスタンパの内外径を加工してマスタースタンパ（ス
タンパを複製するために用いるスタンパ）が得られる。
マスタースタンパを用いて光ディスク用スタンパを複製
する場合、マスタースタンパの表面を電解脱脂法により
洗浄した後、不働態化剥離皮膜を形成する。After that, nickel was peeled off from the glass master,
Remove the resist remaining on the signal surface of the stamper with a solvent,
Dry after washing. After that, the back surface of the stamper is polished and washed, and then the inner and outer diameters of the stamper are processed to obtain a master stamper (a stamper used for replicating the stamper).
When a master stamper is used to duplicate an optical disk stamper, the surface of the master stamper is cleaned by electrolytic degreasing and then a passivation release film is formed.
【０００６】次いで、マスタースタンパを電極としてニ
ッケル電鋳を行い、所定の厚さまでニッケルを付着（析
出）させた後、マスタースタンパから剥離することによ
ってマスタースタンパと逆の凹凸パターンを有するマザ
ースタンパ（以下、マスタースタンパから複製されたス
タンパをマザースタンパという。）を得る。マザースタ
ンパの表面を電解脱脂法により洗浄した後、不働態化処
理を行ないマザースタンパ上に剥離皮膜を形成するこの
マザースタンパを電極としてニッケル電鋳を行うと、マ
スタースタンパと同じ凹凸パターンを有するサンスタン
パ（以下、マザースタンパから複製されたスタンパをサ
ンスタンパという。）が得られる。Next, nickel electroforming is performed using the master stamper as an electrode to deposit (precipitate) nickel to a predetermined thickness, and then the master stamper is peeled off to form a mother stamper (hereinafter referred to as a mother stamper having an uneven pattern opposite to that of the master stamper). , A stamper duplicated from a master stamper is called a mother stamper). After the surface of the mother stamper is cleaned by electrolytic degreasing, passivation treatment is performed to form a release film on the mother stamper.When this nickel stamper is used as an electrode, the sun stamper has the same uneven pattern as the master stamper. (Hereinafter, a stamper duplicated from a mother stamper is called a sun stamper).
【０００７】[0007]
【発明が解決しようとする課題】上記の従来の技術によ
る複製方法では、通常の電鋳浴を用いるために得られる
スタンパの裏面粗さが大きいため、裏面研磨が不可欠と
なる。裏面粗さを小さくするために、通常の電鋳浴に光
沢剤を添加することが試みられている。しかしながら、
光沢剤を添加した所謂光沢浴において複製されたスタン
パ（マザースタンパやサンスタンパ）の裏面に電鋳時に
おける陰極の回転に対応した渦巻き模様が出現するた
め、この渦巻き模様の消去と平坦度を得るために裏面研
磨が必要であった。この裏面研磨工程が省略できればス
タンパ製造コストが大幅に引き下げられ、製造上極めて
有利である。本発明の目的は、上記問題点を解決し、裏
面研磨なしでしかも歩留まりの良好な光ディスク用スタ
ンパを製造するための電鋳方法を提供することにある。In the copying method according to the above-mentioned conventional technique, since the back surface roughness of the stamper obtained by using the usual electroforming bath is large, back surface polishing is indispensable. Attempts have been made to add a brightening agent to an ordinary electroforming bath in order to reduce the back surface roughness. However,
Since a spiral pattern corresponding to the rotation of the cathode during electroforming appears on the back surface of the stamper (mother stamper or sun stamper) duplicated in a so-called gloss bath to which a brightener is added, in order to eliminate this spiral pattern and obtain flatness. Back polishing was required. If this back surface polishing step can be omitted, the stamper manufacturing cost can be significantly reduced, which is extremely advantageous in manufacturing. An object of the present invention is to solve the above problems and to provide an electroforming method for manufacturing an optical disk stamper which does not require back surface polishing and has a good yield.
【０００８】[0008]
【課題を解決するための手段】本発明者らは、上記問題
点を解決するために鋭意検討を行った結果、電鋳により
光ディスク用スタンパを複製する際の陰極の回転数を最
適化することにより、裏面の渦巻き模様を消失させ均一
でしかも小さな裏面粗さを有し、裏面研磨なしで充分使
用可能なスタンパを得られることを見出し、本発明を完
成するに至った。すなわち、本発明の要旨は、凹凸状の
信号または溝を形成したマスタースタンパまたはマザー
スタンパから電気めっきによりニッケルスタンパを製造
する方法であって、マスタースタンパまたはマザースタ
ンパを保持するベースを非磁性材料とし、光沢剤として
炭素−炭素二重結合あるいは三重結合を有する脂肪族ジ
オール類を含有する電解液中で、ニッケルイオンを供給
する側を陽極、スタンパを陰極とし、陰極を毎分７５〜
１８０回転の範囲で回転させながら電鋳することを特徴
とする光ディスク用スタンパの製造方法に存する。As a result of intensive studies to solve the above problems, the inventors of the present invention have optimized the number of rotations of the cathode when duplicating an optical disk stamper by electroforming. As a result, it was found that a stamper which has a uniform and small back surface roughness by eliminating the spiral pattern on the back surface and which can be sufficiently used without polishing the back surface, has completed the present invention. That is, the gist of the present invention is a method for manufacturing a nickel stamper by electroplating from a master stamper or a mother stamper on which uneven signals or grooves are formed. In an electrolytic solution containing an aliphatic diol having a carbon-carbon double bond or a triple bond as a brightening agent, the side supplying nickel ions is the anode, the stamper is the cathode, and the cathode is 75-min.
The present invention resides in a method of manufacturing a stamper for an optical disk, which is characterized in that electroforming is performed while rotating in a range of 180 rotations.
【０００９】以下、本発明を詳細に説明する。図１は本
発明方法に用いて好適な陰極の一例を示す縦断面図であ
る。図中１はベース、２は原盤スタンパ、３はシール部
材、４は固定部材、５は可撓性シール材、６は可撓性シ
ール材、７は位置決め用ピン、８はピン受け入れ穴、９
は回転軸をそれぞれ示す。Hereinafter, the present invention will be described in detail. FIG. 1 is a vertical sectional view showing an example of a cathode suitable for use in the method of the present invention. In the figure, 1 is a base, 2 is a master stamper, 3 is a sealing member, 4 is a fixing member, 5 is a flexible sealing material, 6 is a flexible sealing material, 7 is a positioning pin, 8 is a pin receiving hole, and 9
Indicates the axes of rotation, respectively.
【００１０】本発明の装置は、原盤となるスタンパ２を
ベース１に取り付け、これを陰極としてメッキ浴中に入
れ、回転軸９により回転させながら原盤スタンパ２の表
面に電鋳によりニッケル等を析出させる。この後、原盤
スタンパ２から複製されたスタンパを剥離し、マザーや
サンスタンパを得ることとなる。In the apparatus of the present invention, a stamper 2 serving as a master is mounted on a base 1, which is placed as a cathode in a plating bath, and nickel or the like is deposited on the surface of the master stamper 2 by electroforming while rotating by a rotating shaft 9. Let After that, the duplicate stamper is peeled off from the master stamper 2 to obtain a mother or a sun stamper.
【００１１】本願発明においては、好ましくは、原盤ス
タンパ２をベース１に取り付けるに当り、特殊の構造の
シール部材３により原盤スタンパ２を固定する。シール
部材３は、原盤スタンパ２の外周の形状に合致したリン
グ状とされており、その表面には可撓性材料からなるシ
ール材５，６が環状に設けられている。可撓性シール材
５，６の設けられる位置は、原盤スタンパ２にシール部
材３を押し付けた際に原盤スタンパ２の外周部の内側表
面と原盤スタンパ２の外周部の外側のベース１の表面に
接する位置とされる。In the present invention, preferably, when mounting the master stamper 2 on the base 1, the master stamper 2 is fixed by a seal member 3 having a special structure. The seal member 3 has a ring shape conforming to the shape of the outer periphery of the master stamper 2, and seal members 5 and 6 made of a flexible material are annularly provided on the surface thereof. The flexible seal members 5 and 6 are provided on the inner surface of the outer periphery of the master stamper 2 and the outer surface of the base 1 of the outer periphery of the master stamper 2 when the seal member 3 is pressed against the master stamper 2. It is set as the contact position.
【００１２】すなわち、シール部材３と２本の可撓性シ
ール材５，６により原盤スタンパ２の外周部を密閉した
状態で固定する構造とされる。ベース１の表面から突出
して設けられた位置決め用ピン７はシール部材３に形成
されたピン受け入れ用穴８と合わさって、位置を正確に
するものである。また、固定部材４は、ベース１に螺合
等によって取付けられ、シール部材３（可撓性シール材
５，６）を原盤スタンパ２とベース１の表面に押し付け
る役をなすものである。That is, the seal member 3 and the two flexible seal members 5 and 6 fix the outer peripheral portion of the master stamper 2 in a sealed state. The positioning pin 7 provided so as to project from the surface of the base 1 is combined with the pin receiving hole 8 formed in the seal member 3 to make the position accurate. The fixing member 4 is attached to the base 1 by screwing or the like, and serves to press the sealing member 3 (flexible sealing materials 5 and 6) against the surfaces of the master stamper 2 and the base 1.
【００１３】ベース１、シール部材３、固定部材等は通
常合成樹脂等により作成され、また可撓性シール材５，
６は通常、フッ素ゴム、シリコンゴム等が用いられる。
このようにして原盤スタンパ２の外周部は密閉状態に固
定され、メッキ浴中に入れられ回転軸９により回転され
るから電鋳（電気メッキ）が行なわれ、通常はニッケル
膜が形成される。The base 1, the sealing member 3, the fixing member, etc. are usually made of synthetic resin, and the flexible sealing material 5,
Fluorine rubber, silicone rubber or the like is usually used for 6.
In this way, the outer peripheral portion of the master stamper 2 is fixed in a hermetically sealed state, placed in a plating bath and rotated by the rotating shaft 9, so that electroforming (electroplating) is performed, and usually a nickel film is formed.
【００１４】この際、原盤スタンパ２の外周部は密閉状
態とされており、メッキ液がこの部分に達することはな
いので、原盤スタンパの外周部にはニッケル膜が析出す
ることはない。メッキ終了後に原盤スタンパ２から析出
したニッケル膜を剥離し、マザー又はサンスタンパとし
て用いる。また、原盤スタンパは洗浄され、再度原盤ス
タンパ２として用いることとなるが、この際原盤スタン
パ２の外周部に余分なニッケル膜等が付着していないの
で、効率的に洗浄、再生が行ない得る。上述の説明はシ
ール部材３の表面に二重に可撓性シール材５，６を設け
た構造で説明したが、幅の広い可撓性シール材を一本設
けて原盤スタンパ２の外周部を覆い、水密状態（密閉状
態）としても良いことは勿論である。At this time, since the outer peripheral portion of the master stamper 2 is hermetically sealed and the plating solution does not reach this portion, no nickel film is deposited on the outer peripheral portion of the master stamper. After plating, the nickel film deposited from the master stamper 2 is peeled off and used as a mother or a sun stamper. Further, the master stamper is washed and used again as the master stamper 2, but at this time, since an extra nickel film or the like is not attached to the outer peripheral portion of the master stamper 2, cleaning and regeneration can be efficiently performed. In the above description, the structure in which the flexible sealing materials 5 and 6 are doubly provided on the surface of the sealing member 3 has been explained, but one flexible sealing material having a wide width is provided to cover the outer peripheral portion of the master stamper 2. Needless to say, the cover may be in a watertight state (sealed state).
【００１５】本発明の方法では、特定の光沢剤を用い、
かつ電鋳時の陰極の回転数を特定の範囲とすることによ
り、陰極回転の遠心力作用及び光沢剤の析出制御作用に
よりニッケル析出粒子が回転面中心から外側に向って放
物線状の弧を描きながら堆積し、裏面に渦巻き模様とな
って現われるのを防止する。すなわち、電鋳浴組成とし
ては例えばスルファミン酸ニッケル、塩化ニッケル、及
びほう酸が用いられ、これに光沢剤が混合される。ニッ
ケルイオンを供給する電極バスケットを陽極、スタンパ
を陰極とし、該陰極が回転機構を有し、その回転数を毎
分７５回転から毎分１８０回転の範囲で回転させながら
電鋳する。このように光沢剤と特定の回転数によりスタ
ンパ裏面の平滑度が極めて向上する。The method of the present invention uses a specific brightener,
Moreover, by setting the number of revolutions of the cathode during electroforming to a specific range, the centrifugal force of the cathode rotation and the action of controlling the precipitation of the brightener cause the nickel precipitation particles to draw a parabolic arc outward from the center of the rotation surface. While depositing, it prevents the appearance of a spiral pattern on the back surface. That is, for example, nickel sulfamate, nickel chloride, and boric acid are used as an electroforming bath composition, and a brightening agent is mixed therein. An electrode basket for supplying nickel ions is used as an anode and a stamper is used as a cathode. The cathode has a rotating mechanism, and electroforming is performed while rotating the rotating speed in the range of 75 rpm to 180 rpm. In this way, the smoothness of the back surface of the stamper is significantly improved by the brightener and the specific rotation speed.
【００１６】上記の回転数の範囲内であれば、最初は低
速回転にし直線的に回転数を増加させても良いし、逆に
最初高速回転にし直線的に回転数を減少しても何ら問題
ない。また本請求の範囲内であれば回転数を段階的に増
加または減少しても良く、さらに増加及び減少を繰り返
しながら任意に変化させてもよい。回転数が本発明の範
囲外とすると良好な複製スタンパは得られない。Within the above range of rotation speed, the rotation speed may be initially set to a low speed and the rotation speed may be linearly increased, or conversely, the rotation speed may be set to a high speed and the rotation speed may be linearly reduced. Absent. Further, the number of revolutions may be increased or decreased stepwise within the scope of the claims, and may be arbitrarily changed by repeating increase and decrease. If the rotation speed is outside the range of the present invention, a good duplication stamper cannot be obtained.
【００１７】回転が７５ｒｐｍ以下の場合は、渦巻き模
様は発生しないがスタンパの外周側に円周状の模様が発
生しさらに膜厚分布が不良となるためスタンパとして使
用できない。また１８０ｒｐｍ以上の場合は渦巻き模様
が強調されるため裏面研磨なしではスタンパとして使用
できない。また本発明で使用する薬品類の純度は不純物
イオン濃度の低いものが好ましいが、電子部品用のめっ
きに用いられるグレードで十分である。When the rotation speed is 75 rpm or less, a spiral pattern does not occur, but a circumferential pattern is generated on the outer peripheral side of the stamper and the film thickness distribution becomes poor, so that the stamper cannot be used. Further, when the rotation speed is 180 rpm or more, the spiral pattern is emphasized, so that it cannot be used as a stamper without polishing the back surface. The chemicals used in the present invention preferably have a low impurity ion concentration, but a grade used for plating for electronic parts is sufficient.
【００１８】本発明において使用される光沢剤としては
炭素−炭素二重結合あるいは三重結合を有する脂肪族ジ
オール類が用いられる。特に好ましい具体例としては２
−ブチン１，４−ジオール、３−ヘキシン２，５−ジオ
ールが挙げられる。これらの添加量としては０．０００
１ｍｏｌ／ｌ〜０．０１ｍｏｌ／ｌの濃度範囲が好まし
い。As the brightening agent used in the present invention, aliphatic diols having a carbon-carbon double bond or a triple bond are used. As a particularly preferred specific example, 2
-Butyne 1,4-diol, 3-hexyne 2,5-diol. The addition amount of these is 0.000
A concentration range of 1 mol / l to 0.01 mol / l is preferred.
【００１９】また本願発明に用いるマスタースタンパま
たはマザースタンパを保持するためのベースの材料は非
磁性材料とされる。何故ならばベース材料が磁性材料で
あると、電鋳時にマスタースタンパ、マザースタンパの
信号記録面に電鋳浴中に浮遊している磁性粒子、磁性屑
（例えばニッケル薄片等）が吸着してしまい、欠陥発生
の原因となるからである。本発明の非磁性材料の具体例
としてはプラスチックス、ガラス、セラミックス等が挙
げられるが、中でもポリプロピレン樹脂、塩化ビニル樹
脂等のプラスチックス材料が好適に使用し得る。The base material for holding the master stamper or mother stamper used in the present invention is a non-magnetic material. If the base material is a magnetic material, magnetic particles and magnetic debris (such as nickel flakes) floating in the electroforming bath will be adsorbed on the signal recording surface of the master stamper and mother stamper during electroforming. This is a cause of defects. Specific examples of the non-magnetic material of the present invention include plastics, glass, ceramics, etc. Among them, plastics materials such as polypropylene resin and vinyl chloride resin can be preferably used.
【００２０】また本発明は複製を行う前の洗浄として超
音波または高周波洗浄を行うのが好ましい。超音波また
は高周波洗浄の処理条件としては、周波数帯域として通
常２８ｋＨｚ〜２０００ｋＨｚの範囲が用いられ、一般
的には最初に２８ｋＨｚ〜１００ｋＨｚの低周波数帯域
で洗浄し、次いで高周波数帯域で行うことが清浄化の観
点から好ましい。洗浄時間としては清浄度との関係で決
定されるが通常３分〜１５分の範囲が好ましい。In the present invention, it is preferable to perform ultrasonic or high frequency cleaning as the cleaning before the copying. As a processing condition for ultrasonic or high frequency cleaning, a range of 28 kHz to 2000 kHz is usually used as a frequency band. Generally, cleaning is first performed in a low frequency band of 28 kHz to 100 kHz and then performed in a high frequency band. From the viewpoint of conversion, it is preferable. The washing time is determined in relation to the cleanliness, but is usually preferably in the range of 3 minutes to 15 minutes.
【００２１】本発明の方法により製造されたスタンパは
裏面研磨なしの状態で該スタンパ裏面の表面粗さが充分
に小さいため、裏面研磨工程を省略できる。すなわち、
本発明方法で得られるスタンパの裏面粗さはＲａで０．
０５μｍ以下、Ｒmax で１．０μｍ以下であり、この裏
面粗さは裏面研磨品と比べて同等以下の数値であり、こ
のままの状態で好適に使用し得るものである。また裏面
研磨は通常、研磨テープ遊離砥粒を用いる機械的方法で
あるため、研磨面が均一性に欠けるが、本発明の方法に
より製造されたスタンパは極めて均一性が前記のような
機械的方法でないため良好である。また、光ディスク用
スタンパの厚さ分布は厳密にコントロールされ、通常
０．３ｍｍの厚さに対して±５μｍの範囲で管理される
が、本発明の製造方法により製造されたスタンパの膜厚
分布は裏面研磨なしの状態で３％以内の膜厚分布であ
り、極めて良好である。さらに本発明の方法により製造
されたスタンパの裏面硬度はＨｖで２５０以上であり、
これは電鋳浴に添加されている光沢剤の影響により電析
した皮膜の結晶構造が緻密化する結果と考えられ、スタ
ンパ寿命に好影響を与えているものと考えられる。Since the stamper manufactured by the method of the present invention has a sufficiently small surface roughness on the back surface of the stamper without back surface polishing, the back surface polishing step can be omitted. That is,
The back surface roughness of the stamper obtained by the method of the present invention is Ra of 0.
The back surface roughness is not more than 05 μm and Rmax is not more than 1.0 μm, and the back surface roughness is a value equal to or less than that of the back surface polished product, and can be suitably used as it is. Further, since the back surface polishing is usually a mechanical method using abrasive tape loose abrasive grains, the polishing surface lacks uniformity, but the stamper manufactured by the method of the present invention has a very uniform mechanical method as described above. It is good because it is not. Further, the thickness distribution of the stamper for an optical disc is strictly controlled and normally controlled within a range of ± 5 μm with respect to the thickness of 0.3 mm, but the film thickness distribution of the stamper manufactured by the manufacturing method of the present invention is The film thickness distribution is 3% or less without polishing the back surface, which is extremely good. Further, the backside hardness of the stamper manufactured by the method of the present invention is 250 or more in Hv,
This is considered to be the result of the crystal structure of the electrodeposited film being densified due to the effect of the brightener added to the electroforming bath, and is considered to have a favorable effect on the stamper life.
【００２２】[0022]
【実施例】以下本発明の実施例を示すが、本発明は、そ
の要旨を越えない限り以下の実施例に限定されるもので
はない。 実施例１ スルファミン酸ニッケル６００ｇ／ｌ、塩化ニッケル５
ｇ／ｌ、ほう酸２５ｇ／ｌ及び光沢剤としてブチンジオ
ール０．０９ｇ／ｌ（１．０×１０-3ｍｏｌ／ｌ）、ヘ
キサンジオール０．１ｇ／ｌ（１．０×１０-3ｍｏｌ／
ｌ）からなる電鋳浴を用意し、陰極回転部のベース材料
が非磁性材料のポリプロピレン樹脂からなる先端治具
に、前処理として電解洗浄処理及び超音波洗浄処理を施
したマザースタンパを２本の可撓性シール材を有するシ
ールド板を用いて固定した。次いで陰極回転部を電鋳浴
中に浸漬し、陰極回転数を７５ｒｐｍに設定し通電し
た。所定時間電析後、先端治具からマザースタンパ及び
複製されたスタンパをとり出し両者を洗浄後剥離した。
複製スタンパの裏面状態は光沢を有し渦巻き模様も認め
られず良好であった。乾燥後裏面粗さを三豊社製サーフ
テスト４０２を用いて測定した結果、Ｒａ０．０２５μ
ｍ、Ｒmax ０．２３μｍであり、裏面研磨を施したスタ
ンパと比較してＲａで１７％、Ｒmax で５４％低い裏面
粗さを有することが分った。また、マイクロビッカース
硬度計を用いてスタンパ硬度を測定した結果Ｈｖで２８
０であった。さらにスタンパの膜厚を測定した結果は２
０点の平均値は２９５μｍであり、最小値は２９２μ
ｍ、最大値２９８μｍであり、良好な膜厚分布を有して
いることが分った。裏面研磨なしでレプリカを成形した
が実用上全く問題がなかった。EXAMPLES Examples of the present invention will be shown below, but the present invention is not limited to the following examples as long as the gist thereof is not exceeded. Example 1 600 g / l nickel sulfamate, 5 nickel chloride
g / l, butynediol 0.09g / l (1.0 × 10 -3 mol / l) as boric acid 25 g / l and a brightening agent, hexanediol 0.1g / l (1.0 × 10 -3 mol /
2) Prepare an electroforming bath consisting of 1), and use two mother stampers that are electrolytically cleaned and ultrasonically cleaned as a pretreatment on a tip jig made of polypropylene resin whose base material for the cathode rotating part is a non-magnetic material. It was fixed using a shield plate having a flexible sealing material of. Next, the cathode rotating part was immersed in an electroforming bath, and the cathode rotating speed was set to 75 rpm to energize. After the electrodeposition for a predetermined time, the mother stamper and the duplicate stamper were taken out from the tip jig, and both were washed and peeled off.
The back surface of the duplicate stamper was glossy and good with no spiral pattern. After drying, the back surface roughness was measured using a surf test 402 manufactured by Mitoyo Co., Ltd., and Ra 0.025 μm was obtained.
m, Rmax 0.23 μm, and it was found that the back surface roughness was 17% lower in Ra and 54% lower in Rmax than that of the stamper with the back surface polished. In addition, the stamper hardness was measured using a micro Vickers hardness tester and found to be 28 Hv.
It was 0. Furthermore, the result of measuring the film thickness of the stamper is 2
The average value of 0 points is 295 μm, and the minimum value is 292 μm.
m, and the maximum value was 298 μm, and it was found that the film thickness distribution was excellent. A replica was molded without polishing the back surface, but there was no problem in practice.
【００２３】実施例２ 実施例１において陰極回転数を１２０ｒｐｍとした以外
は同様な方法で電鋳した。電鋳終了後裏面状態を観察し
た結果、複製スタンパの裏面は光沢を有し、渦巻き模様
は認められず良好であった。洗浄乾燥後裏面粗さを測定
した結果Ｒａ０．０２１μｍ、Ｒmax ０．２１μｍであ
り、裏面研磨を施したスタンパと比較してＲａで３０
％、Ｒmax で５８％低い裏面粗さを有することが分っ
た。またマイクロビッカース硬度を測定した結果Ｈｖ３
００であった。さらにスタンパの膜厚を２０点測定した
平均値は２９６μｍであった。最小値は２９３μｍ、最
大値２９９μｍであり、良好な膜厚分布を有しているこ
とが分った。Example 2 Electroforming was carried out in the same manner as in Example 1 except that the cathode rotation speed was 120 rpm. As a result of observing the state of the back surface after the completion of electroforming, the back surface of the duplicate stamper had gloss and was good in that no spiral pattern was observed. After cleaning and drying, the roughness of the back surface was measured and found to be Ra 0.021 μm and Rmax 0.21 μm, which is 30 in Ra as compared with the stamper with the back surface polished.
%, Rmax was found to be 58% lower backside roughness. In addition, as a result of measuring the micro Vickers hardness, Hv3
It was 00. Further, the average value of 20 points of the film thickness of the stamper was 296 μm. The minimum value was 293 μm and the maximum value was 299 μm, and it was found that the film thickness distribution was excellent.
【００２４】実施例３ 実施例１において陰極回転数を１５０ｒｐｍとした以外
は同様な方法で電鋳した。電鋳終了後裏面状態を観察し
た結果、複製スタンパの裏面は光沢を有し、渦巻き模様
は認められず良好であった。洗浄乾燥後裏面粗さを測定
した結果Ｒａ０．０１７μｍ、Ｒmax ０．１４μｍであ
り、裏面研磨を施したスタンパと比較してＲａで４３
％、Ｒmax で７２％低い裏面粗さを有することが分っ
た。またマイクロビッカース硬度を測定した結果Ｈｖ３
００であった。さらにスタンパの膜厚を２０点測定した
平均値は２９５μｍであった。最小値は２９３μｍ、最
大値は２９８μｍであり、良好な膜厚分布を有している
ことが分った。Example 3 Electroforming was carried out in the same manner as in Example 1 except that the cathode rotation speed was 150 rpm. As a result of observing the state of the back surface after the completion of electroforming, the back surface of the duplicate stamper had gloss and was good in that no spiral pattern was observed. After cleaning and drying, the roughness of the back surface was measured to be Ra 0.017 μm and Rmax 0.14 μm, which was 43 in Ra as compared with the stamper with the back surface polished.
%, Rmax was found to be 72% lower backside roughness. In addition, as a result of measuring the micro Vickers hardness, Hv3
It was 00. Further, the average value of 20 points of the film thickness of the stamper was 295 μm. The minimum value was 293 μm and the maximum value was 298 μm, and it was found that the film thickness distribution was good.
【００２５】実施例４ 実施例１において陰極回転数を１８０ｒｐｍとした以外
は同じ方法で電鋳した。電鋳終了後裏面状態を観察した
結果、複製スタンパの裏面は光沢を有し渦巻き模様は認
められず、良好であった。洗浄乾燥後裏面粗さを測定し
た結果Ｒａ０．０２２μｍ、Ｒmax ０．２０μｍであ
り、裏面研磨を施したスタンパと比較してＲａで２７
％、Ｒmax で６０％低い裏面粗さを有することが分っ
た。マイクロビッカース硬度を測定した結果Ｈｖ２９０
であった。さらにスタンパの膜厚を２０点測定した平均
値は２９７μｍであった。最小値は２９２μｍ、最大値
は２９９μｍであり、良好な膜厚分布を有していた。Example 4 Electroforming was carried out by the same method as in Example 1 except that the cathode rotation speed was 180 rpm. As a result of observing the state of the back surface after the completion of electroforming, the back surface of the duplicate stamper was glossy and good in that no spiral pattern was observed. After cleaning and drying, the results of measuring the roughness of the back surface were Ra 0.022 μm and Rmax 0.20 μm, which were Ra 27 compared with the stamper with the back surface polished.
%, Rmax was found to be 60% lower backside roughness. Microvickers hardness measurement result Hv290
Met. Furthermore, the average value of 20 points of the film thickness of the stamper was 297 μm. The minimum value was 292 μm and the maximum value was 299 μm, and the film thickness distribution was excellent.
【００２６】比較例１ 実施例１において陰極回転数を５０ｒｐｍとした以外は
同じ方法で電鋳した。電鋳終了後裏面状態を観察した結
果、複製スタンパの裏面は光沢を有し、渦巻き模様は認
められなかったが、スタンパ外周部より内側約２０ｍｍ
付近に光沢の異なる領域が認められたため、スタンパの
半径方向の膜厚分布測定した結果、内周部に比べ外周部
が厚くなる膜厚分布を有していた。２０点の平均値は３
００μｍであったが最小値２８７μｍ、最大値３１０μ
ｍであり不良であった。Comparative Example 1 Electroforming was carried out by the same method as in Example 1 except that the cathode rotation speed was 50 rpm. As a result of observing the state of the back surface after completion of electroforming, the back surface of the duplicate stamper had gloss and no spiral pattern was observed, but about 20 mm inside from the outer periphery of the stamper.
Since a region having different gloss was found in the vicinity, the film thickness distribution in the radial direction of the stamper was measured, and as a result, the film thickness distribution was such that the outer peripheral portion was thicker than the inner peripheral portion. The average of 20 points is 3
The minimum value was 287 μm and the maximum value was 310 μm
m was bad.
【００２７】比較例２ 実施例１において陰極回転数を３００ｒｐｍとした以外
は同じ方法で電鋳した。電鋳終了後裏面状態を観察した
結果、複製スタンパの裏面は渦巻き模様が顕著に現われ
通常の研磨量では該渦巻き模様を消失させるのは困難で
あり、明らかに不良であった。Comparative Example 2 Electroforming was carried out in the same manner as in Example 1 except that the cathode rotation speed was 300 rpm. As a result of observing the state of the back surface after the completion of electroforming, a swirl pattern remarkably appeared on the back surface of the duplicate stamper, and it was difficult to eliminate the swirl pattern with a normal polishing amount, and it was clearly defective.
【００２８】[0028]
【発明の効果】本発明の方法を用いることにより、裏面
研磨なしで充分に低い裏面粗さを有する複製スタンパが
得られるため、裏面研磨工程を省略できる。また本発明
の複製スタンパは高い裏面硬度を有しているため、スタ
ンパの耐久性が増加し、スタンパ寿命が向上する。上記
の如く、スタンパ製造コスト及びレプリカ成形コストが
引き下げられるため、工業的価値は充分高い。By using the method of the present invention, since a duplicate stamper having a sufficiently low back surface roughness can be obtained without back surface polishing, the back surface polishing step can be omitted. Further, since the duplicate stamper of the present invention has a high back surface hardness, the durability of the stamper is increased and the stamper life is improved. As described above, since the stamper manufacturing cost and the replica molding cost are reduced, the industrial value is sufficiently high.
【図１】本発明の方法に用いる装置の一例の縦断面図FIG. 1 is a vertical sectional view of an example of an apparatus used in the method of the present invention.
１ ベース ２ スタンパ ３ シール部材 ４ 固定部材 ５ シール材 ６ シール材 ９ 回転軸 1 Base 2 Stamper 3 Sealing member 4 Fixing member 5 Sealing material 6 Sealing material 9 Rotating shaft
Claims (5)
ースタンパまたはマザースタンパから電気めっきにより
ニッケルスタンパを製造する方法であって、マスタース
タンパまたはマザースタンパを保持するベースを非磁性
材料とし、光沢剤として炭素−炭素二重結合あるいは三
重結合を有する脂肪族ジオール類を含有する電解液中
で、ニッケルイオンを供給する側を陽極、スタンパを陰
極とし、陰極を毎分７５〜１８０回転の範囲で回転させ
ながら電鋳することを特徴とする光ディスク用スタンパ
の製造方法。1. A method of manufacturing a nickel stamper from a master stamper or a mother stamper on which uneven signals or grooves are formed by electroplating, wherein a base holding the master stamper or the mother stamper is made of a non-magnetic material, and a brightener is used. In an electrolyte containing an aliphatic diol having a carbon-carbon double bond or a triple bond, the nickel ion supplying side is the anode, the stamper is the cathode, and the cathode is rotated in the range of 75 to 180 rpm. A method for manufacturing a stamper for an optical disk, which comprises performing electroforming while performing.
たはマザースタンパを超音波洗浄処理することを特徴と
する請求項１に記載の光ディスク用スタンパの製造方
法。2. The method for manufacturing an optical disk stamper according to claim 1, wherein a master stamper or a mother stamper is subjected to ultrasonic cleaning as a pretreatment for electroforming.
タンパの外周外側に沿った位置に可撓性材料からなるシ
ール材を備えたリング状のシール部材をスタンパに押し
付けた状態で固定することを特徴とする請求項１に記載
のスタンパ複製用電鋳装置。3. A ring-shaped sealing member having a sealing material made of a flexible material is fixed to the stamper at a position along the inner circumference of the stamper and a position along the outer circumference of the stamper. The stamper replication electroforming apparatus according to claim 1, wherein
転である請求項１乃至３のいずれかに記載の光ディスク
用スタンパの製造方法。4. The method for manufacturing an optical disk stamper according to claim 1, wherein the number of rotations of the cathode is 120 to 180 rpm.
製造されたスタンパであって裏面研磨なしの状態で該ス
タンパ裏面の表面粗さがＲａで０．０５μｍ以下、Ｒma
x で１．０μｍ以下であり、硬度がＨｖで２５０以上で
あり、また信号面全域の膜厚分布が３％以内であること
を特徴とする光ディスク用スタンパ。5. A stamper manufactured by the method according to any one of claims 1 to 4, wherein the surface roughness of the back surface of the stamper is Ra of 0.05 μm or less and Rma in the state without polishing the back surface.
An optical disk stamper, wherein x is 1.0 μm or less, hardness is 250 or more in Hv, and a film thickness distribution over the entire signal surface is 3% or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17714795A JPH0935337A (en) | 1995-07-13 | 1995-07-13 | Method of manufacturing stamper for optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17714795A JPH0935337A (en) | 1995-07-13 | 1995-07-13 | Method of manufacturing stamper for optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0935337A true JPH0935337A (en) | 1997-02-07 |
Family
ID=16026018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17714795A Pending JPH0935337A (en) | 1995-07-13 | 1995-07-13 | Method of manufacturing stamper for optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0935337A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010525170A (en) * | 2007-06-18 | 2010-07-22 | ヴァーレ、インコ、リミテッド | Method for improving cathode structure |
| US8052810B2 (en) | 2003-04-16 | 2011-11-08 | Sumitomo Electric Industries, Ltd. | Metal structure and fabrication method thereof |
| JP2017070705A (en) * | 2015-10-06 | 2017-04-13 | 富士フイルム株式会社 | Method for producing transdermal absorption sheet |
| WO2017061310A1 (en) * | 2015-10-06 | 2017-04-13 | 富士フイルム株式会社 | Percutaneous absorption sheet production method |
-
1995
- 1995-07-13 JP JP17714795A patent/JPH0935337A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8052810B2 (en) | 2003-04-16 | 2011-11-08 | Sumitomo Electric Industries, Ltd. | Metal structure and fabrication method thereof |
| JP2010525170A (en) * | 2007-06-18 | 2010-07-22 | ヴァーレ、インコ、リミテッド | Method for improving cathode structure |
| JP2017070705A (en) * | 2015-10-06 | 2017-04-13 | 富士フイルム株式会社 | Method for producing transdermal absorption sheet |
| WO2017061310A1 (en) * | 2015-10-06 | 2017-04-13 | 富士フイルム株式会社 | Percutaneous absorption sheet production method |
| US10814527B2 (en) | 2015-10-06 | 2020-10-27 | Fujifilm Corporation | Method of producing transdermal absorption sheet |
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