JPH0943421A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPH0943421A
JPH0943421A JP19504395A JP19504395A JPH0943421A JP H0943421 A JPH0943421 A JP H0943421A JP 19504395 A JP19504395 A JP 19504395A JP 19504395 A JP19504395 A JP 19504395A JP H0943421 A JPH0943421 A JP H0943421A
Authority
JP
Japan
Prior art keywords
film
color
color filter
temp
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19504395A
Other languages
Japanese (ja)
Inventor
Masahiko Itabashi
雅彦 板橋
Hideyuki Hashimoto
秀行 橋本
Nobuaki Takane
信明 高根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP19504395A priority Critical patent/JPH0943421A/en
Publication of JPH0943421A publication Critical patent/JPH0943421A/en
Pending legal-status Critical Current

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  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a color filter in which irregularity of colors or reduction in flatness which deteriorate the display quality of a color liquid crystal display device are relieved. SOLUTION: In the production method of a color filter by successively forming a light-shielding layer and color pixels of three colors on a transparent substrate, the temp. of a laminating roll is controlled in temp. so that the film is fluidized, and the glass substrate is maintained at temp. lower than that by 10-40 deg.C. Thus, flowing of the resist into steps of adjacent pixels is promoted, while the temp. of the film in contact with the glass substrate is decreased so that the hardness of the film is increased. Thus, collapse of the film is prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、カラー液晶表示装
置に使用されるカラーフィルタの製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

【0002】[0002]

【従来の技術】液晶ティスプレイ(以下LCDと略す)
は、薄型、小型、低消費電力などの特長を生かし、現
在、時計、電卓、TV、パソコン等の表示部に用いられ
ている。更に近年、カラーLCDが開発されOA・AV
機器を中心にナビゲーションシステム、ビュウファイン
ダーなど数多くの用途に使われ始めており、その市場は
今後、急激に拡大するものと予想されている。
2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs).
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders, mainly in equipment, and the market is expected to expand rapidly in the future.

【0003】LCDをカラー表示させるためのカラーフ
ィルタは、図1に示すように格子状パターンのBM(ブ
ラックマトリックス)1が形成されたガラス板等の基板
2上に、R(赤)G(緑)B(青)からなるカラー画素
3(約100×100×2μm)を順次形成し、その上
に透明なオーバーコート層(OC)4形成したものであ
る。5は偏光板、6はITO電極である。
As shown in FIG. 1, a color filter for displaying an LCD in color is R (red) G (green) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a lattice pattern is formed. ) B (blue) color pixels 3 (about 100 × 100 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

【0004】カラーLCDは、カラーフィルタ7をLC
D内部に設置し、バックライト光をカラーフィルタに透
過することによって表示画面をカラー化できる。8は配
向膜、9は液晶、10はシ−ル材、11はトップコ−ト
層、12はITO電極、13はガラス板等の基板、14
は偏光板である。
[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

【0005】現在、カラーフィルタは主に染色法を用い
て製造されている。しかし、この方法はガラス基板上に
透明な感光性樹脂を塗布、乾燥、露光、現像によって画
素を形成後、染料を用いて染色しその後、混色防止層を
形成するといった工程を3回繰り返し行う必要があるた
め、工程数が多くコスト高となる。また、着色剤として
染料を用いているため、カラーフィルタの重要課題であ
る信頼性(耐候性・耐熱性)が劣るという欠点がある。
そこで、着色剤として顔料を用いたカラーフィルタがい
くつか提案されており、その中に電着法、印刷法、フォ
トリソ法(フォトリソグラフィー法)がある。
At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a coloring agent, there is a disadvantage that reliability (weather resistance and heat resistance), which is an important issue of a color filter, is inferior.
Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

【0006】しかし、電着法は電極パターンを形成する
必要があるため(1)パターンの自由度が少ない、
(2)コストが高い、また印刷法は(1)大型基板の位
置合わせが難しく解像度が低いため微細化の対応が困
難、(2)パターンの平坦性が劣る、などの問題があ
り、現状ではフォトリソ法が主流と考えられている。フ
ォトリソ法には、液状レジストとフィルムが考えられ
る。液状レジストは、感光性樹脂中に顔料を分散させた
ワニスをスピナーでガラス基板上に塗布、乾燥後、露
光、現像によってカラー画素が形成される。一方、フィ
ルムは、プリント板用感光性フィルムと同様にワニスを
フィルム化したものであり、基板にラミネート後、露
光、現像によってカラー画素が形成される。
However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
(2) The cost is high, and the printing method has problems such as (1) it is difficult to align a large substrate and the resolution is low, so it is difficult to cope with miniaturization, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

【0007】[0007]

【発明が解決しようとする課題】フィルム法を用いたカ
ラー液晶表示装置用カラーフィルタの製造方法において
は、2色目以降の画素を形成する際、既に形成されてい
る画素の凹凸の上に着色感光性樹脂層を形成するため、
「J字型」、「M字型」といった膜厚の不均一な形状が
発生し、カラ−液晶表示装置の表示品質の低下させる
「色むら」や「平坦性の低さ」の原因となっている。本
発明は、カラ−液晶表示装置の表示品質の低下させる
「色むら」や「平坦性の低さ」を軽減するカラーフィル
タの製造法を提供するものである。
In a method of manufacturing a color filter for a color liquid crystal display device using a film method, when forming pixels for the second and subsequent colors, a colored photosensitive material is formed on the unevenness of pixels already formed. To form a conductive resin layer,
An uneven film thickness such as “J-shaped” or “M-shaped” occurs, which causes “color unevenness” or “low flatness” that deteriorates the display quality of the color liquid crystal display device. ing. The present invention provides a method for manufacturing a color filter that reduces “color unevenness” and “low flatness” that deteriorate the display quality of a color liquid crystal display device.

【0008】[0008]

【課題を解決するための手段】本発明は、透明基板上に
遮光層、3色の着色画素を順時形成するカラーフィルタ
の製造法において、着色感光性樹脂フィルムをラミネ−
トするラミネ−トロ−ル温度はフルムが流動する温度と
し、透明基板はそれより10〜40℃低く設定すること
を特徴とするカラーフィルタの製造法である。
SUMMARY OF THE INVENTION The present invention is a method of manufacturing a color filter in which a light shielding layer and three colored pixels are sequentially formed on a transparent substrate.
In the method for producing a color filter, the temperature of the laminator roll is set to a temperature at which the flume flows and the temperature of the transparent substrate is set to 10 to 40 ° C. lower than that.

【0009】[0009]

【発明の実施の形態】すなわち、本発明はフィルムの物
性より、ラミネ−トロ−ル、基板ガラスの温度をコント
ロ−ルして2色目以降のラミネ−ト時にフィルムの潰れ
を防止して画祖を平坦化するものである。一般にレジス
トフィルムは、ある温度を過ぎて高温になる程硬度(粘
度)が低下する熱可塑性を有している。ラミネ−ト時フ
ィルムとガラスの密着力を得るためにはガラス転移点以
上の加熱が必要となり、また隣の画素の段差を空気の巻
き込み無しにレジストで埋めるためにはレジストが流動
する程度まで硬度(粘度)低下させる加熱が必要とな
る。一方、このように硬度が低下した状態では既に形成
された画素間のガラス上のフィルムはラミネ−トロ−ル
の圧力により押し潰され膜厚が薄くなってしまう。本発
明では、ラミネ−トロ−ル温度はフルムが流動する温度
とし、ガラス基板はそれより10〜40℃(以上)低く
設定することにより、隣の画素段差へのレジストの流れ
込みを促しカラス基板に触れた部分のフィルムは温度低
下により硬度が増すためフィルムの潰れを防止するよう
にしたものである。
BEST MODE FOR CARRYING OUT THE INVENTION In view of the physical properties of the film, the present invention controls the temperature of the laminator roll and the substrate glass to prevent the film from collapsing during the second and subsequent laminae, and is an image generator. Is to be flattened. Generally, the resist film has a thermoplasticity in which the hardness (viscosity) decreases as the temperature rises above a certain temperature. In order to obtain adhesion between the film and glass during lamination, it is necessary to heat above the glass transition point, and in order to fill the step between adjacent pixels with resist without entrainment of air, the hardness must be high enough for the resist to flow. Heating to reduce (viscosity) is required. On the other hand, when the hardness is lowered in this way, the film already formed on the glass between the pixels is crushed by the pressure of the laminar roll and the film thickness becomes thin. In the present invention, the laminator roll temperature is set to a temperature at which the flume flows, and the glass substrate is set to be 10 to 40 ° C. (or higher) lower than that to promote the flow of the resist into the adjacent pixel step, and to make the glass substrate. Since the hardness of the touched portion of the film increases as the temperature decreases, the film is prevented from being crushed.

【0010】[0010]

【実施例】以下本発明を実施例に基づいて説明する。2
−2’−ビス[4−メタクリロキシ、ポリエトキシフェ
ニル]プロパン35重量部、γ−クロロ−β−ヒドロキ
シプロピル−β’−メタクリロイルオキシエチル−o−
フタレート15重量部、メタクリル酸/エチルアクリレ
ート/エチルアクリレート(18/30/53重量比)
共重合樹脂50重量部、1,7ビス(9−アクリジニ
ル)ヘプタン2重量部、ヘキサメトキシメチルメラミ
ン、メチルエチルケトンと、アンスラキノン(赤)、ハ
ロゲン化銅フタロシアニン(緑)、銅フタロシアニン
(青)の各成分を均一にして感光性樹脂層塗工溶液を得
た。該溶液を厚さ6μmのポリエチレンテレフタレート
フィルム上にグラビア塗工機(平野精機社製)で塗工し
保護フィルムとして30μmのポリエチレンフィルムを
貼り合わせて感光性フィルムを得る。着色感光性樹脂層
の厚さは1.5μmであった。次にクロム膜(膜厚0.
1μm)付きガラス基板(1.1mm×200mm×3
00mm、ジオマテック社製)でブラックマトリックス
を形成したガラス基板に、ロールラミネータHLM15
00(日立化成テクノプラント社製)を用いて、基板温
度90℃、ロール温度110℃、ロール圧力6kg/c
m2、速度0.5m/分で、感光性フィルムを着色感光
性樹脂が前記基板に面するようにラミネートし、所定の
ネガマスクを通して、平行光露光機MAP1200L
(大日本スクリーン社製)を用いて100mJ/cm2
露光、次いでポリエチレンテレフタレートフィルムを除
去し、スプレー式現像装置DVW911(大日本スクリ
ーン社製)を用いて、25℃で0.2重量%Na2B2
O5水溶液で20秒間スプレー現像して未露光部を除去
し、クリーンオーブンCSO−402(楠本化成製)で
150℃に加熱、硬化を行って1色の着色パターンを形
成する。この着色パターン形成工程において2色目3色
目のラミネ−ト方向を既存パタ−ンと平行方向で繰り返
し行い、3色のパタ−ンを形成する。2色目以降のガラ
ス上フィルムの膜厚は、1.4μm以上となりほとんど
膜厚の減少がみられなっかた。
EXAMPLES The present invention will be described below based on examples. Two
35 parts by weight of 2'-bis [4-methacryloxy, polyethoxyphenyl] propane, γ-chloro-β-hydroxypropyl-β'-methacryloyloxyethyl-o-
Phthalate 15 parts by weight, methacrylic acid / ethyl acrylate / ethyl acrylate (18/30/53 weight ratio)
Copolymer resin 50 parts by weight, 1,7 bis (9-acridinyl) heptane 2 parts by weight, hexamethoxymethylmelamine, methyl ethyl ketone, anthraquinone (red), halogenated copper phthalocyanine (green), copper phthalocyanine (blue) The components were made uniform to obtain a photosensitive resin layer coating solution. The solution is coated on a polyethylene terephthalate film having a thickness of 6 μm by a gravure coater (manufactured by Hirano Seiki Co., Ltd.) and a 30 μm polyethylene film is laminated as a protective film to obtain a photosensitive film. The colored photosensitive resin layer had a thickness of 1.5 μm. Next, a chrome film (film thickness 0.
1 μm) attached glass substrate (1.1 mm × 200 mm × 3)
Roll laminator HLM15 on a glass substrate on which a black matrix is formed with (00 mm, made by Geomatec).
00 (manufactured by Hitachi Chemical Techno Plant Co., Ltd.), substrate temperature 90 ° C., roll temperature 110 ° C., roll pressure 6 kg / c
A photosensitive film is laminated so that the colored photosensitive resin faces the substrate at m2 and a speed of 0.5 m / min, and a parallel light exposure machine MAP1200L is passed through a predetermined negative mask.
(Manufactured by Dainippon Screen Co., Ltd.) using 100 mJ / cm2
After exposure, the polyethylene terephthalate film was removed, and 0.2 wt% Na2B2 was added at 25 ° C. using a spray type developing device DVW911 (manufactured by Dainippon Screen).
An unexposed portion is removed by spray development with an O5 aqueous solution for 20 seconds, and heated at 150 ° C. in a clean oven CSO-402 (manufactured by Kusumoto Kasei) to be cured to form a colored pattern of one color. In this coloring pattern forming step, the laminating direction of the second color and the third color is repeated in parallel with the existing pattern to form a pattern of three colors. The film thickness on the glass after the second color was 1.4 μm or more, and almost no decrease in film thickness was observed.

【0011】[0011]

【発明の効果】本発明により得られたカラ−フィルタ
は、カラ−液晶表示装置の表示品質の低下させる「色む
ら」や「平坦性の低さ」が軽減する。
The color filter obtained according to the present invention reduces "color unevenness" and "low flatness" which deteriorate the display quality of a color liquid crystal display device.

【図面の簡単な説明】[Brief description of drawings]

【図1】液晶ティスプレイの断面図。FIG. 1 is a sectional view of a liquid crystal display.

【符号の説明】[Explanation of symbols]

1.BM(ブラックマトリックス) 2.ガラス基板 3.カラー画素 4.オーバーコート層(OC) 5.偏光板 6.ITO電極 7.カラーフィルタ 8.配向膜 9.液晶 10.シ−ル材 11.トップコ−ト層 12.ITO電極 13.ガラス基板 14.偏光板 1. 1. BM (black matrix) Glass substrate 3. Color pixels 4. 4. Overcoat layer (OC) Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に遮光層、3色の着色画素を
順時形成するカラーフィルタの製造法において、着色感
光性樹脂フィルムをラミネ−トするラミネ−トロ−ル温
度はフルムが流動する温度とし、透明基板はそれより1
0〜40℃低く設定することを特徴とするカラーフィル
タの製造法。
1. In a method of manufacturing a color filter in which a light-shielding layer and three colored pixels are sequentially formed on a transparent substrate, the lamine roll temperature for laminating a colored photosensitive resin film is such that flume flows. Temperature, transparent substrate 1
A method for manufacturing a color filter, which is set at 0 to 40 ° C. lower.
JP19504395A 1995-07-31 1995-07-31 Production of color filter Pending JPH0943421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19504395A JPH0943421A (en) 1995-07-31 1995-07-31 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19504395A JPH0943421A (en) 1995-07-31 1995-07-31 Production of color filter

Publications (1)

Publication Number Publication Date
JPH0943421A true JPH0943421A (en) 1997-02-14

Family

ID=16334600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19504395A Pending JPH0943421A (en) 1995-07-31 1995-07-31 Production of color filter

Country Status (1)

Country Link
JP (1) JPH0943421A (en)

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